CN116130448A - Electronic package and package substrate thereof - Google Patents
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- CN116130448A CN116130448A CN202210013291.2A CN202210013291A CN116130448A CN 116130448 A CN116130448 A CN 116130448A CN 202210013291 A CN202210013291 A CN 202210013291A CN 116130448 A CN116130448 A CN 116130448A
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- 239000000758 substrate Substances 0.000 title claims abstract description 71
- 239000010410 layer Substances 0.000 claims description 111
- 239000013078 crystal Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 239000000796 flavoring agent Substances 0.000 claims 1
- 235000019634 flavors Nutrition 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- 230000008602 contraction Effects 0.000 abstract description 5
- 238000004806 packaging method and process Methods 0.000 description 37
- 239000004065 semiconductor Substances 0.000 description 9
- 239000012792 core layer Substances 0.000 description 7
- 239000003989 dielectric material Substances 0.000 description 6
- 239000011295 pitch Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 238000012858 packaging process Methods 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
- H01L23/49894—Materials of the insulating layers or coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
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- General Physics & Mathematics (AREA)
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- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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- Production Of Multi-Layered Print Wiring Board (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
技术领域technical field
本发明涉及一种半导体封装,尤其涉及一种具嵌埋型线路(Embedded Trace)的封装基板及其后续所制作成的电子封装件。The invention relates to a semiconductor package, in particular to a package substrate with embedded traces and an electronic package made thereafter.
背景技术Background technique
随着电子产业的蓬勃发展,电子产品在型态上趋于轻薄短小,在功能上则朝高性能、高功能、高速化的研发方向。因此,为满足半导体装置的高集成度(Integration)及微型化(Miniaturization)需求,故于封装工艺中,常常采用具有高密度及细间距的线路的封装基板。With the vigorous development of the electronic industry, electronic products tend to be thinner and smaller in form, and are developing toward high-performance, high-function, and high-speed research and development in terms of function. Therefore, in order to meet the requirements of high integration and miniaturization of semiconductor devices, packaging substrates with high-density and fine-pitch circuits are often used in the packaging process.
如图1A所示,现有封装基板1a包含一具有多个导电柱100的核心层10、分别设于该核心层10相对两侧的多个介电层11及设于各该介电层11上的线路层12,以借由该多个导电柱100电性导通位于该核心层10相对两侧的多个所述线路层12。As shown in FIG. 1A, the conventional package substrate 1a includes a core layer 10 having a plurality of
然而,现有封装基板1a包含核心层10,因而难以符合轻薄短小的需求,故遂发展出无核心层(coreless)实施例的封装基板1b,如图1B所示,其包含多个层叠而成的介电层11及设于各该介电层11上的线路层12。However, the existing packaging substrate 1a includes a core layer 10, so it is difficult to meet the requirements of lightness, thinness and shortness. Therefore, a
然而,现有封装基板1b中,各该介电层11的材质及厚度均相同,故于封装过程中,该封装基板1于温度循环(temperature cycle)时,其容易因厚度过薄而发生翘曲(warpage),导致于后续接置半导体芯片或电路板时,会发生不沾锡(non-wetting)的问题,造成电性连接不佳的问题。However, in the existing
另一方面,若增加该介电层11的厚度,虽可减缓翘曲的情况,但会增加该封装基板1b的厚度,致使无法符合轻薄短小的需求。On the other hand, if the thickness of the
因此,如何克服上述现有技术的种种问题,实已成目前亟欲解决的课题。Therefore, how to overcome the various problems of the above-mentioned prior art has become an urgent problem to be solved at present.
发明内容Contents of the invention
鉴于上述现有技术的种种缺陷,本发明的目的在于提供一种电子封装件及其封装基板,可减少封装基板翘曲的形变量。In view of the various defects of the above-mentioned prior art, the object of the present invention is to provide an electronic package and its package substrate, which can reduce the warping deformation of the package substrate.
本发明的封装基板,包括:一包含至少一第一绝缘层的第一绝缘部;一包含至少一第二绝缘层的第二绝缘部,其叠合于该第一绝缘部上以形成绝缘结构,且该绝缘结构具有相对的置晶侧与外接侧,以令该第一绝缘层对应配置于该置晶侧,而该第二绝缘层对应配置于该外接侧,其中,该第一绝缘部的热膨胀系数大于该第二绝缘部的热膨胀系数;以及线路层,其以嵌埋方式配置于该第一绝缘部与第二绝缘部中。The packaging substrate of the present invention includes: a first insulating portion comprising at least one first insulating layer; a second insulating portion comprising at least one second insulating layer, which is stacked on the first insulating portion to form an insulating structure , and the insulating structure has opposite crystal placement side and outer connection side, so that the first insulating layer is correspondingly disposed on the crystal placement side, and the second insulating layer is correspondingly disposed on the outer connection side, wherein the first insulating portion The coefficient of thermal expansion is greater than the coefficient of thermal expansion of the second insulating part; and the circuit layer is embedded in the first insulating part and the second insulating part.
前述的封装基板中,该第二绝缘部具有多个该第二绝缘层。例如,多个该第二绝缘层的至少二者的热膨胀系数为相同或不相同。或者,多个该第二绝缘层的热膨胀系数朝向该外接侧递减或递增。In the aforementioned packaging substrate, the second insulating portion has a plurality of second insulating layers. For example, the coefficients of thermal expansion of at least two of the plurality of second insulating layers are the same or different. Alternatively, the coefficients of thermal expansion of the plurality of second insulating layers decrease or increase towards the outer side.
前述的封装基板中,形成该第一绝缘层的材质为味之素增层膜。In the aforementioned packaging substrate, the material forming the first insulating layer is an Ajinomoto build-up film.
前述的封装基板中,形成该第二绝缘层的材质为预浸材。In the aforementioned packaging substrate, the material forming the second insulating layer is a prepreg.
前述的封装基板中,该第一绝缘层与第二绝缘层的厚度为相同或相异。In the aforementioned packaging substrate, the thicknesses of the first insulating layer and the second insulating layer are the same or different.
前述的封装基板中,还包括设于该第一及/或第二绝缘部上并外露部分该线路层的绝缘保护层。The aforementioned packaging substrate further includes an insulating protection layer disposed on the first and/or second insulating portion and exposing part of the circuit layer.
本发明还提供一种电子封装件,包括:一前述的封装基板;以及电子元件,其设于该置晶侧上且电性连接该线路层。The present invention also provides an electronic package, comprising: the aforementioned package substrate; and an electronic component, which is disposed on the die-mounting side and electrically connected to the circuit layer.
前述的电子封装件中,该外接侧上配置有多个电性连接该线路层的导电元件。In the aforementioned electronic package, a plurality of conductive elements electrically connected to the circuit layer are disposed on the external side.
由上可知,本发明的封装基板,主要借由该第一绝缘层的热膨胀系数大于该第二绝缘层的热膨胀系数,使位于该置晶侧的第一绝缘层的伸缩量可用于调整该封装基板的翘曲程度,故相较于现有技术,本发明的封装基板无需增加该各绝缘层的厚度,即可减少该封装基板翘曲的形变量,因而不仅能提高产品良率,且能符合轻薄短小的需求。It can be seen from the above that the packaging substrate of the present invention mainly uses the coefficient of thermal expansion of the first insulating layer to be greater than that of the second insulating layer, so that the expansion and contraction of the first insulating layer on the side where the die is placed can be used to adjust the package. The degree of warpage of the substrate, so compared with the prior art, the packaging substrate of the present invention does not need to increase the thickness of the insulating layers, and can reduce the deformation of the packaging substrate warping, thus not only improving the product yield, but also Meet the needs of thin and light.
附图说明Description of drawings
图1A为现有封装基板的剖面示意图。FIG. 1A is a schematic cross-sectional view of a conventional packaging substrate.
图1B为现有另一封装基板的剖面示意图。FIG. 1B is a schematic cross-sectional view of another conventional packaging substrate.
图2A为本发明的封装基板的剖视示意图。FIG. 2A is a schematic cross-sectional view of the packaging substrate of the present invention.
图2B为本发明的电子封装件的剖视示意图。2B is a schematic cross-sectional view of the electronic package of the present invention.
图3为本发明的封装基板的另一实施例的剖视示意图。FIG. 3 is a schematic cross-sectional view of another embodiment of the packaging substrate of the present invention.
附图标记如下:The reference signs are as follows:
1a,1b,2,3:封装基板1a, 1b, 2, 3: package substrate
10:核心层10: Core layer
100:导电柱100: Conductive column
11:介电层11: Dielectric layer
12,20:线路层12,20: line layer
2a,3a:第一绝缘部2a, 3a: first insulating part
2b:第二绝缘部2b: Second insulating part
20a:置晶侧20a: crystal side
20b:外接侧20b: External side
201:导电迹线201: Conductive trace
202:导电盲孔202: Conductive blind hole
203:电性连接垫203: Electrical connection pad
204:焊垫204: welding pad
21:第一绝缘层21: The first insulating layer
22,23,24,25:第二绝缘层22,23,24,25: second insulating layer
26a:第一绝缘保护层26a: the first insulation protection layer
26b:第二绝缘保护层26b: the second insulation protection layer
30:半导体芯片30: Semiconductor chip
30a:作用面30a: Action surface
30b:非作用面30b: Non-active surface
300:电极垫300: electrode pad
31:导电凸块31: Conductive bump
32:导电元件32: Conductive element
t:厚度t: thickness
具体实施方式Detailed ways
以下借由特定的具体实施例说明本发明的实施方式,本领域技术人员可由本说明书所公开的内容轻易地了解本发明的其他优点及功效。The implementation of the present invention will be described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.
须知,本说明书所附附图所示出的结构、比例、大小等,均仅用以配合说明书所公开的内容,以供本领域技术人员的了解与阅读,并非用以限定本发明可实施的限定条件,故不具技术上的实质意义,任何结构的修饰、比例关系的改变或大小的调整,在不影响本发明所能产生的功效及所能达成的目的下,均应仍落在本发明所公开的技术内容得能涵盖的范围内。同时,本说明书中所引用的如“上”、“第一”、“第二”及“一”等的用语,亦仅为便于叙述的明了,而非用以限定本发明可实施的范围,其相对关系的改变或调整,在无实质变更技术内容下,当亦视为本发明可实施的范畴。It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. Limiting conditions, so there is no technical substantive meaning, any modification of structure, change of proportional relationship or adjustment of size, without affecting the effect and purpose of the present invention, should still fall within the scope of the present invention. The disclosed technical content must be within the scope covered. At the same time, terms such as "above", "first", "second" and "one" quoted in this specification are only for the convenience of description and are not used to limit the scope of the present invention. The change or adjustment of the relative relationship shall also be regarded as the implementable scope of the present invention without substantive change of the technical content.
图2A为本发明的封装基板2的剖面示意图。如图2A所示,该封装基板2为无核心层(coreless)实施例,其包括:一第一绝缘部2a、一叠合于该第一绝缘部2a上的第二绝缘部2b、以及至少一线路层20,且该第一绝缘部2a包含至少一第一绝缘层,该第二绝缘部2b包含至少一第二绝缘层,在本实施实施例中,具有一层第一绝缘层21及层叠排设的四层第二绝缘层22,23,24,25,以形成绝缘结构。FIG. 2A is a schematic cross-sectional view of the
所述的第一绝缘部2a作为该绝缘结构的置晶侧20a,而该第二绝缘部2b作为该绝缘结构的外接侧20b,即该第一绝缘层21对应配置于该置晶侧20a,而该第二绝缘层22,23,24,25对应配置于该外接侧20b,其中,该第一绝缘部2a(或第一绝缘层21)的热膨胀系数(如至少4ppm/℃)大于该第二绝缘部2b(或多个第二绝缘层22,23,24,25)的热膨胀系数(如至多2ppm/℃)。The first
于本实施例中,该第二绝缘部2b具有多个该第二绝缘层22,23,24,25,其热膨胀系数可相同或相异,但均小于该第一绝缘部2a(或第一绝缘层21)的热膨胀系数。例如,多个第二绝缘层22,23,24,25的CTE可朝向该外接侧20b递减或递增。In this embodiment, the second insulating
再者,形成该第一绝缘层21的材质为如味之素增层膜(Ajinomoto Build-upFilm,简称ABF)或其它高CTE的介电材,且形成该第二绝缘层22,23,24,25的材质为如预浸材(Prepreg,简称PP)或其它低CTE的介电材。Furthermore, the material for forming the first insulating
另外,该封装基板2可包括如防焊层的绝缘保护层,其设于该第一与第二绝缘部2a,2b上并外露该线路层20,以供该线路层20结合其它元件。例如,将第一绝缘保护层26a设于该第一绝缘层21上并外露该线路层20的部分表面,且将第二绝缘保护层26b设于该第二绝缘层25上并外露该线路层20的部分表面。In addition, the
另外,该第一绝缘层21与第二绝缘层22,23,24,25的厚度t可依需求调整,且各层绝缘层的厚度t可相同或相异,而其绝缘层的数量可为单数或偶数,并无特别限制。In addition, the thickness t of the first insulating
所述的线路层20以嵌埋方式配置于该第一绝缘层21与第二绝缘层22,23,24,25中,且包含多个导电迹线201与电性导通各层导电迹线201的导电盲孔202。换言之,各该导电迹线201与导电盲孔202未凸出包埋该二者的该第一绝缘层21与第二绝缘层22,23,24,25。The
于本实施例中,该线路层20于对应该置晶侧20a处配置有多个电性连接垫203,且于对应该外接侧20b处配置有多个焊垫204,以令多个电性连接垫203外露于该第一绝缘保护层26a,且多个焊垫204外露于该第二绝缘保护层26b。In this embodiment, the
因此,本发明的封装基板2借由该第一绝缘层21的热膨胀系数大于该第二绝缘层22,23,24,25的热膨胀系数,故于封装过程中,该封装基板2于温度循环时,该第一绝缘层21与第二绝缘层22,23,24,25的伸缩量不同,借以调整翘曲的方向而平衡该封装基板2的翘曲程度(例如,该封装基板2可减少图1B所示的翘曲变形量10%至60%),使该封装基板2于温度升降过程中大幅减缓翘曲程度。Therefore, in the
再者,由于该封装基板2的翘曲程度大幅减缓,使得各该导电迹线201不会因翘曲而过于靠近,因而该线路层20有利于细间距/细线路的设计,故该导电盲孔202、电性连接垫203及焊垫204能依需求设计为细间距/细线路的规格,以满足半导体芯片的高密度接点数的需求。Furthermore, since the warping of the
另外,由于该线路层20能符合细间距/细线路的需求,故于相同布线数量下,该封装基板2用于制作该线路层20的金属材用量少于现有封装基板1b用于制作该线路层12的金属材用量,因而能减少该封装基板2的制作成本。In addition, since the
另外,由于CTE较大的介电材较为便宜,故于该置晶侧20a处选择CTE较大的介电材作为第一绝缘层21,亦能有效降低该封装基板2的制作成本。In addition, since the dielectric material with a larger CTE is relatively cheap, choosing a dielectric material with a larger CTE as the first insulating
如图2B所示,于后续应用中,该封装基板2可于该多个电性连接垫203上接合至少一半导体芯片30,且于多个焊垫204上结合如焊球或其它金属凸块的导电元件32,以形成电子封装件,且该电子封装件借由多个导电元件32接置于一电路板(图略)上。As shown in FIG. 2B , in subsequent applications, the
所述的电子元件30为有源元件、无源元件或其组合,其中,该有源元件例如为半导体芯片,且该无源元件例如为电阻、电容及电感。The
于本实施例中,该电子元件30为半导体芯片,其具有相对的作用面30a与非作用面30b,该作用面30a上具有多个电极垫300,且该电子元件30以其电极垫300借由多个导电凸块31倒装芯片结合并电性连接该电性连接垫203,再以底胶(图略)形成于该电子元件30与该置晶侧20a之间以包覆多个导电凸块31;或者,该电子元件30的电极垫300可借由多个焊线(图略)以打线方式电性连接该电性连接垫203。亦或,该电子元件30的电极垫300可在没有第一绝缘保护层26a的情况下直接接触该电性连接垫203。然而,有关该电子元件30电性连接该线路层20的方式不限于上述。In this embodiment, the
所述的导电元件32电性连接该线路层20与该电路板。The
图3为本发明的封装基板3的另一实施例的剖面示意图。如图3所示,本实施例的封装基板3为无核心层(coreless)实施例,其第一绝缘部3a包含多个层叠排设的第一绝缘层21。FIG. 3 is a schematic cross-sectional view of another embodiment of the
因此,本发明的封装基板3借由该第一绝缘部3a的热膨胀系数大于该第二绝缘部2b的热膨胀系数,故于封装过程中,该封装基板3于温度循环时,该第一绝缘部3a与第二绝缘部2b的伸缩量不同,借以调整翘曲的方向而平衡该封装基板3的翘曲程度,使该封装基板3于温度升降过程中大幅减缓翘曲程度。Therefore, in the
再者,由于该封装基板3的翘曲程度大幅减缓,使得各该导电迹线201不会因翘曲而过于靠近,因而该线路层20有利于细间距/细线路的设计,以满足半导体芯片的高密度接点数的需求。Furthermore, since the warpage of the
另外,由于该线路层20能符合细间距/细线路的需求,故于相同布线数量下,该封装基板3用于制作该线路层20的金属材用量少于现有封装基板1b用于制作该线路层12的金属材用量,因而能减少该封装基板3的制作成本。In addition, since the
另外,由于CTE较大的介电材较为便宜,故于该置晶侧20a处选择CTE较大的介电材作为第一绝缘部2a,亦能有效降低该封装基板3的制作成本。In addition, since the dielectric material with a larger CTE is relatively cheap, choosing a dielectric material with a larger CTE as the first insulating
应可理解地,有关该第一绝缘部的层数与第二绝缘部的层数可依需求配置,并无特别限制。It should be understood that the number of layers of the first insulating part and the number of layers of the second insulating part can be configured according to requirements, and there is no special limitation.
综上所述,本发明的封装基板借由该第一绝缘部的热膨胀系数大于该第二绝缘部的热膨胀系数,使位于该置晶侧的第一绝缘部的伸缩量能用于调整该封装基板的翘曲程度,故相较于现有技术,本发明的封装基板无需增加该各绝缘层的厚度,即可减少该封装基板翘曲的形变量,因而不仅能提高产品良率,且能符合轻薄短小的需求。To sum up, in the package substrate of the present invention, the thermal expansion coefficient of the first insulating part is greater than that of the second insulating part, so that the expansion and contraction of the first insulating part on the die placement side can be used to adjust the packaging The degree of warpage of the substrate, so compared with the prior art, the packaging substrate of the present invention does not need to increase the thickness of the insulating layers, and can reduce the deformation of the packaging substrate warping, thus not only improving the product yield, but also Meet the needs of thin and light.
上述实施例仅用以例示性说明本发明的原理及其功效,而非用于限制本发明。本领域技术人员均可在不违背本发明的精神及范畴下,对上述实施例进行修改。因此本发明的权利保护范围,应如权利要求书所列。The above-mentioned embodiments are only used to illustrate the principles and effects of the present invention, but not to limit the present invention. Those skilled in the art can modify the above embodiments without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention should be listed in the claims.
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