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CN113808775B - Linear accelerator heavy ion microporous membrane irradiation device - Google Patents

Linear accelerator heavy ion microporous membrane irradiation device Download PDF

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Publication number
CN113808775B
CN113808775B CN202111097055.5A CN202111097055A CN113808775B CN 113808775 B CN113808775 B CN 113808775B CN 202111097055 A CN202111097055 A CN 202111097055A CN 113808775 B CN113808775 B CN 113808775B
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vacuum
irradiation
heavy ion
microporous membrane
linear accelerator
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CN113808775A (en
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夏佳文
莫丹
杨雅清
殷学军
杨胜利
胡正国
李运杰
武军霞
曹云
姚庆高
高大庆
许哲
李忠汕
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Institute of Modern Physics of CAS
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    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • G21K5/04Irradiation devices with beam-forming means
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10Scattering devices; Absorbing devices; Ionising radiation filters
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • G21K5/10Irradiation devices with provision for relative movement of beam source and object to be irradiated

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Particle Accelerators (AREA)

Abstract

本发明涉及一种直线加速器重离子微孔膜辐照装置,包括直线加速器装置、束流散射装置、真空差分装置和重离子微孔膜真空辐照终端;直线加速器装置,被配置为产生重离子束流;束流散射装置,被配置为使重离子束流在束流管道传输中扩散及空间分布均匀;真空差分装置,被配置为逐级降低束流管道的真空度;重离子微孔膜真空辐照终端,密封连接真空差分装置被配置为使得处于真空环境的辐照原膜在重离子束流轰击下形成重离子微孔膜。本发明可以实现重离子微孔膜的高密度辐照生产。

The invention relates to a linear accelerator heavy ion microporous membrane irradiation device, which includes a linear accelerator device, a beam scattering device, a vacuum differential device and a heavy ion microporous membrane vacuum irradiation terminal; the linear accelerator device is configured to generate heavy ions Beam; beam scattering device, configured to make the heavy ion beam diffuse and spatially distributed uniformly in the beam pipeline transmission; vacuum differential device, configured to gradually reduce the vacuum degree of the beam pipeline; heavy ion microporous membrane The vacuum irradiation terminal and the sealed connection vacuum differential device are configured so that the irradiated original film in a vacuum environment forms a heavy ion microporous film under the bombardment of heavy ion beams. The invention can realize high-density irradiation production of heavy ion microporous membranes.

Description

直线加速器重离子微孔膜辐照装置Linear accelerator heavy ion microporous membrane irradiation device

技术领域Technical field

本发明是关于一种直线加速器重离子微孔膜辐照装置,涉及重离子微孔膜生产技术领域。The invention relates to a linear accelerator heavy ion microporous membrane irradiation device and relates to the technical field of heavy ion microporous membrane production.

背景技术Background technique

重离子微孔膜是世界上最精密的微孔过滤膜,它是一种多孔的塑料薄膜,膜上面有密密麻麻的小孔,每一个小孔形状和尺寸几乎相同。重离子微孔膜有很多规格,膜厚范围5微米到60微米,孔径范围0.2微米到15微米,孔密度范围每平方厘米1-10的9次方个。Heavy ion microporous membrane is the world's most sophisticated microporous filtration membrane. It is a porous plastic film with densely packed pores, each of which has almost the same shape and size. Heavy ion microporous membranes have many specifications, with film thickness ranging from 5 microns to 60 microns, pore diameters ranging from 0.2 microns to 15 microns, and pore density ranging from 1-10 to the 9th power per square centimeter.

重离子微孔膜通常采用高能加速器提供的重离子打孔,重离子打孔是重离子微孔膜生产工艺中最为关键的一环,所以在重离子微孔膜的生产中离子束辐照是非常重要的一个生产步骤。Heavy ion microporous membranes usually use heavy ion drilling provided by high-energy accelerators. Heavy ion drilling is the most critical part of the heavy ion microporous membrane production process, so ion beam irradiation is the most important factor in the production of heavy ion microporous membranes. A very important production step.

在目前的辐照生产中,由于没有专用的用于生产的重离子微孔膜辐照装置,生产出的重离子微孔膜密度和质量均不高。主要原因是由于加速器不是专用的缘故,它所面对的是各种各样的重离子,所以每次辐照都要花费大量的精力去调成辐照重离子微孔膜所需要的离子束,这就会造成离子束的品质不高,也直接导致所辐照的膜的密度和质量不高。另外,大气中辐照由于束流能量损失比较大,所以不能辐照高密度的重离子微孔膜。In the current irradiation production, since there is no dedicated heavy ion microporous membrane irradiation device for production, the density and quality of the heavy ion microporous membrane produced are not high. The main reason is that the accelerator is not dedicated and faces a variety of heavy ions. Therefore, a lot of energy is spent on adjusting the ion beam required to irradiate the heavy ion microporous membrane for each irradiation. , which will cause the quality of the ion beam to be low, and also directly lead to the density and quality of the irradiated film to be low. In addition, irradiation in the atmosphere cannot irradiate high-density heavy ion microporous membranes due to relatively large beam energy loss.

发明内容Contents of the invention

针对上述问题,本发明的目的是提供一种能够有效提高重离子微孔膜密度和质量的直线加速器重离子微孔膜辐照装置。In view of the above problems, the purpose of the present invention is to provide a linear accelerator heavy ion microporous membrane irradiation device that can effectively improve the density and quality of heavy ion microporous membranes.

为实现上述目的,本发明采取以下技术方案:一种直线加速器重离子微孔膜辐照装置,包括直线加速器装置、束流散射装置、真空差分装置和重离子微孔膜真空辐照终端;In order to achieve the above object, the present invention adopts the following technical solutions: a linear accelerator heavy ion microporous membrane irradiation device, including a linear accelerator device, a beam scattering device, a vacuum differential device and a heavy ion microporous membrane vacuum irradiation terminal;

所述直线加速器装置,被配置为产生重离子束流;The linear accelerator device is configured to generate a heavy ion beam;

所述束流散射装置,被配置为使重离子束流在束流管道传输中扩散及空间分布均匀;The beam scattering device is configured to diffuse and uniformly distribute the heavy ion beam in the beam pipeline transmission;

所述真空差分装置,被配置为逐级降低束流管道的真空度;The vacuum differential device is configured to gradually reduce the vacuum degree of the beam pipeline;

所述重离子微孔膜真空辐照终端,密封连接所述真空差分装置被配置为使得处于真空环境的辐照原膜在重离子束流轰击下形成重离子微孔膜。The heavy ion microporous membrane vacuum irradiation terminal is sealed and connected to the vacuum differential device, which is configured so that the irradiated original membrane in a vacuum environment forms a heavy ion microporous membrane under heavy ion beam bombardment.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述直线加速器装置包括ECR离子源、低能束流传输线、射频四极加速器、中能束流匹配段、漂移管直线加速器和高能注入线;The linear accelerator heavy ion microporous membrane irradiation device, further, the linear accelerator device includes an ECR ion source, a low energy beam transmission line, a radio frequency quadrupole accelerator, a medium energy beam matching section, a drift tube linear accelerator and a high energy injection line;

所述ECR离子源产生强流重离子束流,强流重离子束流经过所述低能束流传输线进行束流横向匹配,经过横向匹配的束流注入到所述射频四极加速器进行加速,经所述射频四极加速器出射的束流经过所述中能束流匹配段对束流横向和纵向相空间进行匹配,经过横向和纵向相空间匹配后的束流注入到所述漂移管直线加速器进一步加速,加速后的重离子束流通过所述高能注入线注入到所述束流散射装置,其中,所述高能注入线包括第一真空束流管道和四极磁铁,所述第一真空束流管道穿过所述四极磁铁,使得重离子束流在所述第一真空束流管道进行传输。The ECR ion source generates a strong heavy ion beam. The strong heavy ion beam passes through the low-energy beam transmission line for beam transverse matching. The transversely matched beam is injected into the radio frequency quadrupole accelerator for acceleration. The beam emitted from the radio frequency quadrupole accelerator passes through the medium-energy beam matching section to match the beam transverse and longitudinal phase spaces, and the beam after matching the transverse and longitudinal phase spaces is injected into the drift tube linear accelerator for further Accelerate, and the accelerated heavy ion beam is injected into the beam scattering device through the high-energy injection line, wherein the high-energy injection line includes a first vacuum beam pipe and a quadrupole magnet, and the first vacuum beam The pipeline passes through the quadrupole magnet so that the heavy ion beam is transmitted in the first vacuum beam pipeline.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述束流散射装置包括第二真空束流管道、预散焦四极磁铁、八极磁铁和末端散焦四极磁铁;The linear accelerator heavy ion microporous membrane irradiation device, further, the beam scattering device includes a second vacuum beam pipeline, a pre-defocused quadrupole magnet, an octupole magnet and an end defocused quadrupole magnet;

所述预散焦四极磁铁穿过所述第二真空束流管道入口,使得经所述高能注入线注入的重离子束流在水平方向上剖面开始增大,在垂直方向剖面开始汇聚;The pre-defocused quadrupole magnet passes through the inlet of the second vacuum beam pipeline, so that the heavy ion beam injected through the high-energy injection line begins to increase in profile in the horizontal direction and begins to converge in the vertical direction;

所述八极磁铁设置在重离子束流到达垂直方向的束腰位置,使重离子束流在水平方向上为均匀分布;The eight-pole magnet is arranged at the beam waist position where the heavy ion beam reaches the vertical direction, so that the heavy ion beam is evenly distributed in the horizontal direction;

所述末端散焦四极磁铁穿过所述第二真空束流管道出口,使重离子束流水平方向上的发散角增大。The terminal defocused quadrupole magnet passes through the second vacuum beam pipe outlet, which increases the divergence angle of the heavy ion beam in the horizontal direction.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述真空差分装置包括依次连接的若干真空室和第三真空束流管道,所述若干真空室通过所述第三真空束流管道依次连接,最后一级真空室的出口通过束流喇叭形传输管道连接所述重离子微孔膜真空辐照终端,其中,真空度在所述真空差分装置内采用逐级降低的方式,完成真空度的逐级过渡。In the linear accelerator heavy ion microporous membrane irradiation device, further, the vacuum differential device includes a plurality of vacuum chambers and a third vacuum beam pipeline connected in sequence, and the plurality of vacuum chambers pass through the third vacuum beam. The pipelines are connected in sequence, and the outlet of the last stage of the vacuum chamber is connected to the heavy ion microporous membrane vacuum irradiation terminal through a beam horn transmission pipeline, where the vacuum degree is gradually reduced in the vacuum differential device to complete Gradual transition of vacuum degree.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述重离子微孔膜真空辐照终端包括至少一台卷绕辐照设备、滑轨、驱动设备和控制设备;The linear accelerator heavy ion microporous membrane irradiation device, further, the heavy ion microporous membrane vacuum irradiation terminal includes at least one winding irradiation equipment, slide rails, driving equipment and control equipment;

所述滑轨设置在所述真空差分装置的外侧;The slide rail is arranged outside the vacuum differential device;

所述驱动设备设置在所述滑轨上,所述驱动设备通过所述控制设备控制牵引所述卷绕辐照设备沿着所述滑轨横向和/或纵向往复循环运动,并能够将所述卷绕辐照设备牵引至离子束流出口进行辐照加工。The driving device is arranged on the slide rail, and is controlled by the control device to pull the winding irradiation device to reciprocate laterally and/or longitudinally along the slide rail, and can move the The winding irradiation equipment is pulled to the ion beam outlet for irradiation processing.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述卷绕辐照设备包括真空腔体;The linear accelerator heavy ion microporous membrane irradiation device, further, the winding irradiation equipment includes a vacuum chamber;

所述真空腔体的进口处设置有密封装置,用于对所述真空腔体与束流出口的连接处进行密封;A sealing device is provided at the inlet of the vacuum chamber for sealing the connection between the vacuum chamber and the beam outlet;

所述真空腔体内设置有卷膜装置;A film rolling device is provided in the vacuum chamber;

所述真空腔体一侧设置有开关门用于进行辐照原膜的安放和收取。A switch door is provided on one side of the vacuum chamber for placing and collecting the irradiated original film.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述卷膜装置包括至少一个放料电机、放料轴、传动轴、收料轴和收料电机;The linear accelerator heavy ion microporous membrane irradiation device, further, the film rolling device includes at least one unwinding motor, unwinding shaft, transmission shaft, rewinding shaft and rewinding motor;

所述真空腔体内设置有至少一个所述放料轴,每一所述放料轴连接有用于对辐照原膜进行放料的所述放料电机;At least one discharging shaft is provided in the vacuum chamber, and each discharging shaft is connected to the discharging motor for discharging the irradiated original film;

所述真空腔体内的底部设置有至少一个所述收料轴,所述收料轴连接有用于对辐照原膜进行收料的所述收料电机;At least one rewinding shaft is provided at the bottom of the vacuum chamber, and the rewinding shaft is connected with the rewinding motor for retracting the irradiated original film;

所述传动轴设置在所述放料轴与所述收料轴之间,用于对辐照原膜进行传动。The transmission shaft is arranged between the unwinding shaft and the rewinding shaft and is used to drive the irradiation original film.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述放料轴与所述收料轴之间间隔设置有放料张力监测轴和收料张力监测轴,所述放料张力监测轴和收料张力监测轴上还设置有张力传感器,用于监测对应监测轴上膜材料的张力。In the linear accelerator heavy ion microporous membrane irradiation device, further, a discharging tension monitoring axis and a receiving tension monitoring axis are provided at intervals between the discharging axis and the receiving axis, and the discharging tension The monitoring shaft and the rewinding tension monitoring shaft are also provided with tension sensors for monitoring the tension of the film material on the corresponding monitoring shaft.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述密封装置包括若干个限位开关、真空腔体密封圈和束流出口密封圈;In the linear accelerator heavy ion microporous membrane irradiation device, further, the sealing device includes several limit switches, vacuum chamber sealing rings and beam outlet sealing rings;

所述限位开关用于对所述真空腔体的运动位置进行限位,当所述真空腔体运动到预定的位置触发所述限位开关,所述控制设备收到触发信号使得所述真空腔体停止运动;The limit switch is used to limit the movement position of the vacuum chamber. When the vacuum chamber moves to a predetermined position, the limit switch is triggered, and the control device receives a trigger signal to cause the vacuum chamber to move to a predetermined position. The cavity stops moving;

当所述真空腔体运动到工作位置,所述真空腔体密封圈和束流出口密封圈配合完成密封。When the vacuum chamber moves to the working position, the vacuum chamber sealing ring and the beam outlet sealing ring cooperate to complete the sealing.

所述的直线加速器重离子微孔膜辐照装置,进一步地,所述真空腔体密封圈周向间隔向外延伸设置有橡胶柱,相应地,所述束流出口密封圈上设置有与所述橡胶柱相匹配的橡胶孔,所述真空腔体密封圈的橡胶柱插入到所述束流出口密封圈的橡胶孔完成密封;优选地,所述开关门上设置有卷膜观察窗或视觉观察系统,用于对所述真空腔体内的工作进行查看。In the linear accelerator heavy ion microporous membrane irradiation device, further, the vacuum chamber sealing ring is provided with rubber columns extending outward at circumferential intervals. Correspondingly, the beam outlet sealing ring is provided with The rubber column matches the rubber hole, and the rubber column of the vacuum chamber sealing ring is inserted into the rubber hole of the beam outlet sealing ring to complete the sealing; preferably, the switch door is provided with a rolling film observation window or visual inspection window. An observation system is used to observe the work in the vacuum chamber.

本发明由于采取以上技术方案,其具有以下优点:Since the present invention adopts the above technical solutions, it has the following advantages:

1、本发明设置的重离子微孔膜真空辐照终端包括卷绕辐照设备、滑轨、驱动设备和控制设备,驱动设备通过控制设备控制牵引卷绕辐照设备沿着滑轨横向和/或纵向往复循环运动,并能够将卷绕辐照设备牵引至离子束流出口进行辐照加工,卷绕辐照设备包括真空腔体,真空腔体的进口处设置有密封装置,真空腔体内设置有卷膜装置,采用该重离子微孔膜真空辐照终端可以实现重离子微孔膜的高密度辐照生产;1. The heavy ion microporous membrane vacuum irradiation terminal provided by the present invention includes winding irradiation equipment, slide rails, driving equipment and control equipment. The driving equipment controls the pulling of the winding irradiation equipment along the slide rails laterally and/or through the control equipment. Or longitudinal reciprocating motion, and can pull the winding irradiation equipment to the ion beam outlet for irradiation processing. The winding irradiation equipment includes a vacuum chamber. A sealing device is provided at the inlet of the vacuum chamber, and a sealing device is provided inside the vacuum chamber. There is a rolling film device, and the heavy ion microporous membrane vacuum irradiation terminal can be used to achieve high-density irradiation production of heavy ion microporous membranes;

2、本发明设置束流散射装置,束流散射装置包括真空束流管道、预散焦四极磁铁、八极磁铁和末端散焦四极磁铁,利用两台四极磁铁和一台八极磁铁替代扫描磁铁,使束流在较大空间范围内呈现均匀分布,实现束流的均匀散射提高重离子微孔膜的辐照均匀度;2. The present invention is equipped with a beam scattering device. The beam scattering device includes a vacuum beam pipe, a pre-defocused quadrupole magnet, an octupole magnet and an end defocused quadrupole magnet. Two quadrupole magnets and one octupole magnet are used. Instead of scanning magnets, the beam is uniformly distributed in a large spatial range, achieving uniform scattering of the beam and improving the irradiation uniformity of the heavy ion microporous membrane;

3、本发明设置有真空差分装置,真空差分装置包括依次连接的若干真空室和真空束流管道,真空度在真空差分装置内采用逐级降低的方式,完成真空度的逐级过渡,能提高真空腔体内的辐照原膜的辐照效率;3. The present invention is equipped with a vacuum differential device. The vacuum differential device includes a number of vacuum chambers and vacuum beam pipes connected in sequence. The vacuum degree is gradually reduced in the vacuum differential device to complete the step-by-step transition of the vacuum degree, which can improve the vacuum degree. The irradiation efficiency of the irradiated original film in the vacuum chamber;

综上所述,本发明可以广泛应用于重离子微孔膜的辐照生产中。In summary, the present invention can be widely used in the irradiation production of heavy ion microporous membranes.

附图说明Description of drawings

通过阅读下文优选实施方式的详细描述,各种其他的优点和益处对于本领域普通技术人员将变得清楚明了。附图仅用于示出优选实施方式的目的,而并不认为是对本发明的限制。在整个附图中,用相同的附图标记表示相同的部件。在附图中:Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are for the purpose of illustrating preferred embodiments only and are not to be construed as limiting the invention. Throughout the drawings, the same reference numbers refer to the same parts. In the attached picture:

图1为本发明实施例的直线加速器重离子微孔膜辐照装置结构图;Figure 1 is a structural diagram of a linear accelerator heavy ion microporous membrane irradiation device according to an embodiment of the present invention;

图2为本发明实施例的束流散射装置结构图;Figure 2 is a structural diagram of a beam scattering device according to an embodiment of the present invention;

图3为本发明实施例的真空差分装置结构示意图;Figure 3 is a schematic structural diagram of a vacuum differential device according to an embodiment of the present invention;

图4为本发明实施例的重离子微孔膜真空辐照终端结构示意图;Figure 4 is a schematic diagram of the vacuum irradiation terminal structure of the heavy ion microporous membrane according to an embodiment of the present invention;

图5为本发明实施例的卷膜装置结构示意图;Figure 5 is a schematic structural diagram of the film rolling device according to the embodiment of the present invention;

图6为本发明实施例的密封装置结构示意图,(a)为真空腔体密封圈结构示意图,(b)为束流出口密封圈结构示意图。Figure 6 is a schematic structural diagram of the sealing device according to the embodiment of the present invention. (a) is a schematic structural diagram of the vacuum chamber sealing ring, and (b) is a schematic structural diagram of the beam outlet sealing ring.

具体实施方式Detailed ways

下面将参照附图更详细地描述本发明的示例性实施方式。虽然附图中显示了本发明的示例性实施方式,然而应当理解,可以以各种形式实现本发明而不应被这里阐述的实施方式所限制。相反,提供这些实施方式是为了能够更透彻地理解本发明,并且能够将本发明的范围完整的传达给本领域的技术人员。Exemplary embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. Although exemplary embodiments of the invention are shown in the drawings, it should be understood that the invention may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided to provide a thorough understanding of the invention, and to fully convey the scope of the invention to those skilled in the art.

应理解的是,文中使用的术语仅出于描述特定示例实施方式的目的,而无意于进行限制。除非上下文另外明确地指出,否则如文中使用的单数形式“一”、“一个”以及“所述”也可以表示包括复数形式。术语“包括”、“包含”、“含有”以及“具有”是包含性的,并且因此指明所陈述的特征、步骤、操作、元件和/或部件的存在,但并不排除存在或者添加一个或多个其它特征、步骤、操作、元件、部件、和/或它们的组合。文中描述的方法步骤、过程、以及操作不解释为必须要求它们以所描述或说明的特定顺序执行,除非明确指出执行顺序。还应当理解,可以使用另外或者替代的步骤。It is to be understood that the terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting. As used herein, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly dictates otherwise. The terms "comprises", "includes", "contains" and "having" are inclusive and thus indicate the presence of stated features, steps, operations, elements and/or parts but do not exclude the presence or addition of one or Various other features, steps, operations, elements, components, and/or combinations thereof. The method steps, procedures, and operations described herein are not to be construed as requiring that they be performed in the particular order described or illustrated, unless an order of performance is expressly indicated. It should also be understood that additional or alternative steps may be used.

尽管可以在文中使用术语第一、第二、第三等来描述多个元件、部件、区域、层和/或部段,但是,这些元件、部件、区域、层和/或部段不应被这些术语所限制。这些术语可以仅用来将一个元件、部件、区域、层或部段与另一区域、层或部段区分开。除非上下文明确地指出,否则诸如“第一”、“第二”之类的术语以及其它数字术语在文中使用时并不暗示顺序或者次序。因此,以下讨论的第一元件、部件、区域、层或部段在不脱离示例实施方式的教导的情况下可以被称作第二元件、部件、区域、层或部段。Although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections shall not be referred to as restricted by these terms. These terms are only used to distinguish one element, component, region, layer or section from another region, layer or section. Terms such as "first," "second," and other numerical terms when used herein do not imply a sequence or order unless clearly indicated by the context. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the example embodiments.

为了便于描述,可以在文中使用空间相对关系术语来描述如图中示出的一个元件或者特征相对于另一元件或者特征的关系,这些相对关系术语例如为“内部”、“外部”、“内侧”、“外侧”、“下面”、“上面”等。这种空间相对关系术语意于包括除图中描绘的方位之外的在使用或者操作中装置的不同方位。For convenience of description, spatially relative terms may be used herein to describe the relationship of one element or feature to another element or feature as shown in the figures. These relative terms, such as "inner", "outer", "inner" ”, “outside”, “below”, “above”, etc. Such spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures.

如图1所示,本实施例提供的直线加速器重离子微孔膜辐照装置,包括直线加速器装置1、束流散射装置2、真空差分装置3和重离子微孔膜真空辐照终端4。As shown in Figure 1, the linear accelerator heavy ion microporous membrane irradiation device provided in this embodiment includes a linear accelerator device 1, a beam scattering device 2, a vacuum differential device 3 and a heavy ion microporous membrane vacuum irradiation terminal 4.

直线加速器装置1,用于产生4MeV/u的多种重离子束流。Linear accelerator device 1 is used to generate a variety of heavy ion beams of 4MeV/u.

束流散射装置2,用于使重离子束流扩散及空间分布均匀化。The beam scattering device 2 is used to diffuse the heavy ion beam and uniformize its spatial distribution.

真空差分装置3,用于将束流管道的高真空逐步降低至低真空。Vacuum differential device 3 is used to gradually reduce the high vacuum of the beam pipeline to low vacuum.

重离子微孔膜真空辐照终端4,用于使得处于真空环境的辐照原膜在束流轰击下形成重离子微孔膜。The heavy ion microporous membrane vacuum irradiation terminal 4 is used to form a heavy ion microporous membrane under beam bombardment from the irradiated original membrane in a vacuum environment.

本发明的一些优选实施例中,直线加速器装置1包括常规ECR离子源、低能束流传输线LEBT、射频四极加速器RFQ、中能束流匹配段MEBT、漂移管直线加速器IH-DTL和高能注入线HEBT。其中:ECR离子源产生强流重离子束流;强流重离子束流经过低能束运线LEBT进行束流横向匹配;经过横向匹配的束流注入到工作频率为162.5MHz的射频四极加速器RFQ被加速到600keV/u;经射频四极加速器RFQ出射的束流经过中能束流匹配段MEBT对束流的横向和纵向相空间进行匹配;经过横向和纵向相空间进行匹配的束流注入到相同工作频率的漂移管直线加速器IH-DTL,最终被加速至能量4MeV/u;高能注入线HEBT包括束流真空管道和四极磁铁,束流真空管道穿过四极磁铁,用于对经漂移管直线加速器IH-DTL出射的束流进行传输,并使其真空变化平衡。综上所述,由于本实施例工作频率设计为162.5MHz,因此本实施例的直线加速器装置1具有加速效率高,束流品质好,结构紧凑等诸多优点。In some preferred embodiments of the present invention, the linear accelerator device 1 includes a conventional ECR ion source, a low energy beam transmission line LEBT, a radio frequency quadrupole accelerator RFQ, a medium energy beam matching section MEBT, a drift tube linear accelerator IH-DTL and a high energy injection line HEBT. Among them: the ECR ion source generates a strong current heavy ion beam; the strong current heavy ion beam passes through the low-energy beam transport line LEBT for beam transverse matching; the transversely matched beam is injected into the radio frequency quadrupole accelerator RFQ with an operating frequency of 162.5MHz. Accelerated to 600keV/u; the beam emitted from the radio frequency quadrupole accelerator RFQ passes through the medium energy beam matching section MEBT to match the transverse and longitudinal phase spaces of the beam; the beam that is matched in the transverse and longitudinal phase spaces is injected into The drift tube linear accelerator IH-DTL with the same operating frequency is finally accelerated to an energy of 4MeV/u; the high-energy injection line HEBT includes a beam vacuum pipe and a quadrupole magnet. The beam vacuum pipe passes through the quadrupole magnet for warp drift. The beam emitted from the tube linear accelerator IH-DTL is transmitted and its vacuum changes are balanced. To sum up, since the operating frequency of this embodiment is designed to be 162.5 MHz, the linear accelerator device 1 of this embodiment has many advantages such as high acceleration efficiency, good beam quality, and compact structure.

本发明的一些优选实施例中,为了提高重离子微孔膜的辐照均匀性,本实施例的直线加速器装置1的束流引出后通过束流散射装置2使束流扩散及空间分布均匀化。In some preferred embodiments of the present invention, in order to improve the irradiation uniformity of the heavy ion microporous membrane, the beam of the linear accelerator device 1 of this embodiment is extracted and passed through the beam scattering device 2 to uniformize the beam diffusion and spatial distribution. .

如图2所示,本实施例的束流散射装置2,包括束流真空管道21、预散焦四极磁铁22、八极磁铁23和末端散焦四极磁铁24。As shown in FIG. 2 , the beam scattering device 2 of this embodiment includes a beam vacuum pipe 21 , a pre-defocused quadrupole magnet 22 , an octupole magnet 23 and an end defocused quadrupole magnet 24 .

直线加速器装置1产生的束流横截面及发散角都很小,预散焦四极磁铁22放置束流真空管道21入口处,经直线加速器装置1出射的束流从束流真空管道21穿过预散焦四极磁铁22,束流在水平方向上剖面(水平方向上剖面为平行于束流的一个剖面)开始增大即发散传输,在垂直方向剖面(垂直方向剖面为垂直于束流的一个剖面)开始较小即汇聚传输;在束流到达垂直方向的束腰(束腰为束流的中间位置)附近时,此处放置一台八极磁铁23,对束流的空间分布进行调制通过给八极磁铁23加高压电流、增大磁场,进而影响束流真空管道21内的重离子束,即使水平方向上的边缘束流感受到较大的聚焦力,同时水平方向上内部束流基本不受聚焦作用,通过调整八极磁铁23的聚焦强度可使束流在水平方向上的分布成为均匀分布。束流继续向右侧传输,经过末端散焦四极磁铁24通过增强磁场影响离子束,使束流水平方向上的发散角进一步增大,则可快速让束流水平方向剖面达到0.5米量级,可满足重离子微孔膜生产终端的需求。The beam cross-section and divergence angle generated by the linear accelerator device 1 are very small. The pre-defocused quadrupole magnet 22 is placed at the entrance of the beam vacuum pipe 21. The beam emitted by the linear accelerator device 1 passes through the beam vacuum pipe 21. Pre-defocused quadrupole magnet 22, the beam begins to increase in the horizontal direction (the cross-section in the horizontal direction is a cross-section parallel to the beam), that is, divergently propagates, and when the cross-section in the vertical direction (the cross-section in the vertical direction is perpendicular to the beam) (a section) starts out small, that is, converges and transmits; when the beam reaches the vicinity of the beam waist in the vertical direction (the beam waist is the middle position of the beam), an eight-pole magnet 23 is placed here to modulate the spatial distribution of the beam. By adding high-voltage current to the eight-pole magnet 23 and increasing the magnetic field, the heavy ion beam in the beam vacuum pipe 21 is affected. Even though the edge beam in the horizontal direction feels a greater focusing force, at the same time, the internal beam in the horizontal direction is basically Without being affected by focusing, the distribution of the beam in the horizontal direction can be made uniform by adjusting the focusing intensity of the eight-pole magnet 23 . The beam continues to propagate to the right, and passes through the end defocused quadrupole magnet 24 to influence the ion beam by enhancing the magnetic field, further increasing the divergence angle of the beam in the horizontal direction, and the horizontal profile of the beam can quickly reach the level of 0.5 meters. It can meet the needs of heavy ion microporous membrane production terminals.

在上述束流传输过程中,束流垂直方向的剖面一直被两台四极磁铁约束在很小的范围,所以束流管道一般选取矩形截面或者椭圆形截面以便能最大限度的利用真空管道的空间,另一方面可降低重离子微孔膜生产终端对前端离子加速器真空方面的影响,有助于降低真空差分系统的设计难度。优选地,束流真空管道21的出口采用喇叭形。During the above-mentioned beam transmission process, the vertical cross-section of the beam has been constrained to a small range by two quadrupole magnets, so the beam pipe generally chooses a rectangular or elliptical cross-section to maximize the use of the space of the vacuum pipe. , on the other hand, it can reduce the impact of the heavy ion microporous membrane production terminal on the vacuum of the front-end ion accelerator, and help reduce the design difficulty of the vacuum differential system. Preferably, the outlet of the beam vacuum pipe 21 adopts a trumpet shape.

本发明的一些优选实施例中,批量生产核孔膜时,为了提高生产效率,在重离子微孔膜真空辐照终端4更换膜材料后需尽快与真空差分装置3连接进行辐照生产。重离子微孔膜真空辐照终端4由于腔体体积大、内置膜材料及卷绕装置气载大,抽到高真空状态需要较长时间,因此综合考虑重离子微孔膜真空辐照终端所能接受的抽气时间和真空差分能力,因此在束流真空管道与重离子微孔膜真空辐照终端之间设计建造10-6Pa到102Pa的真空差分结构,本实施例采用5级差分的方式,分步抽取真空,以此为例,不限于此,可以根据实际需要进行设置。In some preferred embodiments of the present invention, when mass-producing nuclear pore membranes, in order to improve production efficiency, the heavy ion microporous membrane vacuum irradiation terminal 4 needs to be connected to the vacuum differential device 3 as soon as possible after replacing the membrane material for irradiation production. Heavy ion microporous membrane vacuum irradiation terminal 4 Due to the large volume of the cavity, the large air load of the built-in membrane material and the winding device, it takes a long time to pump to a high vacuum state, so the requirements of the heavy ion microporous membrane vacuum irradiation terminal should be comprehensively considered. Acceptable pumping time and vacuum differential capability, therefore, a vacuum differential structure of 10 -6 Pa to 10 2 Pa is designed and constructed between the beam vacuum pipeline and the heavy ion microporous membrane vacuum irradiation terminal. This embodiment uses 5 levels. The differential method is to extract vacuum step by step. This is an example. It is not limited to this and can be set according to actual needs.

真空差分装置3的入口连接束流真空管道21的出口,真空差分装置3的出口连接重离子微孔膜真空辐照终端4。真空差分装置3用于将束流真空管道21的高真空逐步降低至重离子微孔膜真空辐照终端4的低真空,例如从5E-6Pa降低至1E+2Pa,逐步降低真空度。The inlet of the vacuum differential device 3 is connected to the outlet of the beam vacuum pipeline 21, and the outlet of the vacuum differential device 3 is connected to the heavy ion microporous membrane vacuum irradiation terminal 4. The vacuum differential device 3 is used to gradually reduce the high vacuum of the beam vacuum pipe 21 to the low vacuum of the heavy ion microporous membrane vacuum irradiation terminal 4, for example, from 5E-6Pa to 1E+2Pa, gradually reducing the vacuum degree.

具体地,如图3所示,本实施例的真空差分装置3采用5级差分完成10-6Pa到102Pa的过渡,真空差分装置3包括束流真空管道30以及第一~第五真空室31~35,第一~第五真空室31~35依次间隔设置,第一~第五真空室31~35之间通过束流真空管道30连接,第五真空室35的出口设置为喇叭形。其中,真空度在真空差分装置3内采用逐级降低的方式,完成真空度从10-6Pa到102Pa的过渡,真空室的具体结构与现有的真空室结构类似,包括有各种泵和调节阀门,在此不做赘述,可以采用现有技术进行实现。进一步地,每一真空室内均设置有真空计,用于进行真空度的监测。Specifically, as shown in Figure 3, the vacuum differential device 3 of this embodiment uses 5 levels of differential to complete the transition from 10 -6 Pa to 10 2 Pa. The vacuum differential device 3 includes a beam vacuum pipeline 30 and first to fifth vacuums. Chambers 31 to 35, the first to fifth vacuum chambers 31 to 35 are arranged in sequence, the first to fifth vacuum chambers 31 to 35 are connected through a beam vacuum pipeline 30, and the outlet of the fifth vacuum chamber 35 is set in a trumpet shape. . Among them, the vacuum degree is gradually reduced in the vacuum differential device 3 to complete the transition of the vacuum degree from 10 -6 Pa to 10 2 Pa. The specific structure of the vacuum chamber is similar to the existing vacuum chamber structure, including various The pump and regulating valve will not be described in detail here and can be implemented using existing technology. Further, each vacuum chamber is equipped with a vacuum gauge for monitoring the vacuum degree.

本发明的一些优选实施例中,如图4所示,本实施例的重离子微孔膜真空辐照终端4包括两台卷绕辐照设备41、滑轨42、驱动设备43和控制设备44;每台卷绕辐照设备41通过控制设备44控制驱动设备43驱动,使其可以在滑轨42上进行横向或/和纵向移动,使得每台卷绕辐照设备41均可以通过滑轨42运动到束流出口处(即工作位置)进行辐照加工。In some preferred embodiments of the present invention, as shown in Figure 4, the heavy ion microporous membrane vacuum irradiation terminal 4 of this embodiment includes two winding irradiation devices 41, slide rails 42, driving equipment 43 and control equipment 44 ; Each winding irradiation device 41 controls the driving device 43 through the control device 44 so that it can move laterally or/and longitudinally on the slide rail 42, so that each roll irradiation device 41 can pass through the slide rail 42 Move to the beam exit (i.e. the working position) for irradiation processing.

一些实现中,滑轨42可以包括横向滑轨421和纵向滑轨422,设置在重离子束流出口外侧,横向滑轨421对应真空差分装置3的出口位置,可以使得卷绕辐照设备41运动到工作位置进行辐照加工,纵向滑轨422可以使得卷绕辐照设备41上下往返运动;每一滑轨上均设置有用于牵引卷绕辐照设备41运动的驱动设备43,驱动设备43可以采用牵引电机,牵引电机使得卷绕辐照设备41可以沿着滑轨进行横向和/或纵向的往复循环运动,将卷绕辐照设备41牵引至离子束流出口(即工作位置)。In some implementations, the slide rail 42 may include a transverse slide rail 421 and a longitudinal slide rail 422, which are arranged outside the heavy ion beam exit. The transverse slide rail 421 corresponds to the exit position of the vacuum differential device 3 and can make the winding irradiation equipment 41 move. To the working position for irradiation processing, the longitudinal slide rails 422 can make the winding irradiation equipment 41 move up and down; each slide rail is provided with a driving device 43 for pulling the movement of the winding irradiation equipment 41, and the driving device 43 can Using a traction motor, the traction motor allows the winding irradiation equipment 41 to perform lateral and/or longitudinal reciprocating movement along the slide rail, and pulls the winding irradiation equipment 41 to the ion beam outlet (i.e., the working position).

另一些实现中,每一卷绕辐照设备41均包括真空腔体411,本实施例的真空腔体411与现有技术不同点具体说明如下:In other implementations, each winding irradiation device 41 includes a vacuum chamber 411. The differences between the vacuum chamber 411 in this embodiment and the prior art are specifically described as follows:

每一真空腔体411的进口处均设置有密封装置412,用于对真空腔体411与束流管道出口的连接处进行密封。A sealing device 412 is provided at the inlet of each vacuum chamber 411 for sealing the connection between the vacuum chamber 411 and the exit of the beam pipe.

每一真空腔体411内均设置有卷膜装置5,每一真空腔体411的一侧均设置有开关门,便于更换卷膜,可以通过手动方式进行膜材料的安放和收取。进一步地,开关门上可以设置有卷膜观察窗,卷膜观察窗用于观察卷膜装置5的放料、收料情况以及观察膜材料的辐照情况,观察窗处还可以设置有遮挡板。开关门上还可以设置视觉观察系统,也可以安装摄像头进行远程观察,用于对真空腔体411内的工作进行查看。优选地,每一真空腔体411可以采用圆形卧式全不锈钢结构。Each vacuum chamber 411 is provided with a film rolling device 5, and one side of each vacuum chamber 411 is provided with a switch door to facilitate the replacement of the film roll, and the film material can be placed and collected manually. Further, the opening and closing door can be provided with a rolling film observation window. The rolling film observation window is used to observe the unwinding and retracting conditions of the film rolling device 5 and the irradiation condition of the film material. A blocking plate can also be provided at the observation window. . A visual observation system can also be installed on the switch door, or a camera can be installed for remote observation to view the work in the vacuum chamber 411. Preferably, each vacuum chamber 411 can adopt a circular horizontal all-stainless steel structure.

进一步地,卷膜装置5包括第一放料轴51、第二放料轴52、第一放料电机53、第二放料电机54、第一放料张力监测轴55、第二放料张力监测轴56、第一传动轴57、第二传动轴58、第三传动轴59、第四传动轴510、第一收料张力监测轴511、第二收料张力监测轴512、第一收料轴513、第二收料轴514、第一收料电机515和第二收料电机516。Further, the film rolling device 5 includes a first unwinding shaft 51, a second unwinding shaft 52, a first unwinding motor 53, a second unwinding motor 54, a first unwinding tension monitoring shaft 55, and a second unwinding tension. Monitoring shaft 56, first transmission shaft 57, second transmission shaft 58, third transmission shaft 59, fourth transmission shaft 510, first rewinding tension monitoring shaft 511, second rewinding tension monitoring shaft 512, first rewinding shaft 513, the second taking-up shaft 514, the first taking-up motor 515 and the second taking-up motor 516.

真空腔体4内的顶部均平行设置有第一放料轴51和第二放料轴52,第一放料轴51连接第一放料电机53,第二放料轴52连接第二放料电机54,第一放料电机53和第二放料电机54用于驱动第一放料轴51和第二放料轴52进行对膜材料进行放料。The top of the vacuum chamber 4 is provided with a first discharge shaft 51 and a second discharge shaft 52 in parallel. The first discharge shaft 51 is connected to the first discharge motor 53, and the second discharge shaft 52 is connected to the second discharge shaft. The motor 54, the first discharging motor 53 and the second discharging motor 54 are used to drive the first discharging shaft 51 and the second discharging shaft 52 to discharge the film material.

对应于第一放料轴51的位置,真空腔体4内中部竖向间隔设置有第一放料张力监测轴55、第一传动轴57、第二传动轴58和第一收料张力监测轴511。对应于第二放料轴52的位置,真空腔体4内的中部还竖向间隔设置有第二放料张力监测轴56、第三传动轴59、第四传动轴510和第二收料张力监测轴512。第一放料张力监测轴55、第一收料张力监测轴511、第二放料张力监测轴56和第二收料张力监测轴512用于监测对应监测轴上膜材料的张力。Corresponding to the position of the first unloading shaft 51, a first unloading tension monitoring shaft 55, a first transmission shaft 57, a second transmission shaft 58 and a first rewinding tension monitoring shaft are arranged at vertical intervals in the middle of the vacuum chamber 4. 511. Corresponding to the position of the second discharging shaft 52, a second discharging tension monitoring shaft 56, a third transmission shaft 59, a fourth transmission shaft 510 and a second taking-up tension are arranged at vertical intervals in the middle of the vacuum chamber 4. Monitor axis 512. The first unwinding tension monitoring axis 55, the first rewinding tension monitoring axis 511, the second unwinding tension monitoring axis 56 and the second rewinding tension monitoring axis 512 are used to monitor the tension of the film material on the corresponding monitoring axis.

每一真空腔体4内的底部均平行设置有第一收料轴513和第二收料轴514,第一收料轴513连接有第一收料电机515,第二收料轴514连接第二收料电机516,第一收料电机515和第二收料电机516用于对经过对应放料张力监测轴、传动轴和收料张力监测轴的膜材料进行收料。The bottom of each vacuum chamber 4 is provided with a first collecting shaft 513 and a second collecting shaft 514 in parallel. The first collecting shaft 513 is connected to a first collecting motor 515, and the second collecting shaft 514 is connected to a first collecting motor 515. The two rewinding motors 516, the first rewinding motor 515 and the second rewinding motor 516 are used to rewind the film material passing through the corresponding unwinding tension monitoring shaft, transmission shaft and rewinding tension monitoring shaft.

进一步地,第一放料张力监测轴55、第一传动轴57、第二传动轴58和第一收料张力监测轴511以及第二放料张力监测轴56、第三传动轴59、第四传动轴510和第二收料张力监测轴512上传动的膜材料与束流方向垂直,只有这样才能使束流辐照到膜,形成重离子微孔膜。Further, the first unwinding tension monitoring shaft 55, the first transmission shaft 57, the second transmission shaft 58 and the first rewinding tension monitoring shaft 511 as well as the second unwinding tension monitoring shaft 56, the third transmission shaft 59, the fourth The membrane material driven on the transmission shaft 510 and the second rewinding tension monitoring shaft 512 is perpendicular to the direction of the beam. Only in this way can the beam irradiate the membrane to form a heavy ion microporous membrane.

更进一步地,第一放料张力监测轴55、第二放料张力监测轴56、第一收料张力监测轴511和第二收料张力监测轴512上均设置有张力传感器,张力传感器用于采集所在传动轴上膜材料的张力值。Furthermore, the first unwinding tension monitoring shaft 55, the second unwinding tension monitoring shaft 56, the first rewinding tension monitoring shaft 511 and the second rewinding tension monitoring shaft 512 are all provided with tension sensors, and the tension sensors are used for Collect the tension value of the membrane material on the drive shaft.

需要说明的是,本实施例中的卷膜装置5采用两放两收的结构,但可以根据实际需求设置放料和收料的卷轴数,增加同时辐照的膜材料数量,具体数量不做限定。It should be noted that the film rolling device 5 in this embodiment adopts a structure of two unwinding and two retracting, but the number of unwinding and retracting reels can be set according to actual needs to increase the number of film materials irradiated at the same time. The specific number is not specified. limited.

又一些实现中,如图4、图6所示,密封装置412包括若干个限位开关4121、真空腔体密封圈4122和束流出口密封圈4123。In some implementations, as shown in Figures 4 and 6, the sealing device 412 includes several limit switches 4121, vacuum chamber sealing rings 4122, and beam outlet sealing rings 4123.

卷绕辐照设备41由牵引电机牵引真空腔体411到预定的位置,触发限位开关4121,控制设备44收到限位开关4121的信号后,给纵向的驱动设备43发出停止指令,再启动横向的驱动设备43,达到预定位置触发限位开关4121后,控制设备44发送信号停止指令,此时密封位置已达到,真空腔体密封圈4122和束流出口密封圈4123对应,此时真空腔体密封圈4122和束流出口密封圈4123紧紧相扣,其中,真空腔体密封圈4122周向间隔向外延伸设置有橡胶柱4122-1,相应地,束流出口密封圈4123上设置有与橡胶柱相匹配的橡胶孔4123,真空腔体密封圈4122的橡胶柱4122-1插入到束流出口密封圈4123-1的橡胶孔完成密封,此时,控制设备44发送指令通过气缸A将整个密封装置顶紧,完成整个密封过程。具体使用时,真空腔体密封圈4122和束流出口密封圈4123可以设置在真空腔体41和真空差分装置3的束流真空管道出口的接口法兰上,使真空腔体41接口法兰与束流真空管道出口法兰对接及密封。The winding irradiation equipment 41 pulls the vacuum chamber 411 to a predetermined position by the traction motor and triggers the limit switch 4121. After receiving the signal from the limit switch 4121, the control equipment 44 sends a stop command to the longitudinal driving equipment 43 and then starts again. After the horizontal driving device 43 reaches the predetermined position and triggers the limit switch 4121, the control device 44 sends a signal to stop the command. At this time, the sealing position has been reached. The vacuum chamber sealing ring 4122 corresponds to the beam outlet sealing ring 4123. At this time, the vacuum chamber The sealing ring 4122 and the beam exit sealing ring 4123 are closely interlocked. The vacuum chamber sealing ring 4122 is provided with rubber posts 4122-1 extending outward at circumferential intervals. Correspondingly, the beam exit sealing ring 4123 is provided with rubber posts 4122-1. The rubber hole 4123 that matches the column, the rubber column 4122-1 of the vacuum chamber sealing ring 4122 is inserted into the rubber hole of the beam outlet sealing ring 4123-1 to complete the sealing. At this time, the control device 44 sends an instruction to seal the entire seal through the cylinder A. The device is tightened to complete the entire sealing process. In specific use, the vacuum chamber sealing ring 4122 and the beam outlet sealing ring 4123 can be provided on the interface flange of the vacuum chamber 41 and the beam vacuum pipeline outlet of the vacuum differential device 3, so that the interface flange of the vacuum chamber 41 is connected with the beam. Flange docking and sealing of outlet of flow vacuum pipeline.

本实施例的重离子微孔膜真空辐照终端4使用时,例如第一台卷绕辐照设备41完成准备,例如安装好辐照原膜后及对真空腔体411抽好真空,可以通过控制设备44控制卷绕辐照设备41运动到离子束流出口处,运动到工作位置完成对接及密封,对真空腔体411快速抽真空,当真空度到达预定工作真空时则进行辐照工艺;在第一台卷绕设备41做辐照工艺的同时,第二台卷绕设备41开始上卷及抽真空,待第一台卷绕设备41辐照结束时,破坏真空,撤离工作位置,第二台卷绕设备41通过控制设备44控制其沿着滑轨运动到工作位置,重复第一台卷绕设备41真空室的辐照工艺,往复循环,达到能够连续辐照工作的要求。When the heavy ion microporous membrane vacuum irradiation terminal 4 of this embodiment is used, for example, the first winding irradiation equipment 41 is ready, for example, after the original irradiation film is installed and the vacuum chamber 411 is evacuated, the The control device 44 controls the winding irradiation device 41 to move to the ion beam outlet, move to the working position to complete docking and sealing, and quickly evacuate the vacuum chamber 411. When the vacuum reaches the predetermined working vacuum, the irradiation process is performed; While the first winding equipment 41 is performing the irradiation process, the second winding equipment 41 starts to wind up and vacuum. When the irradiation of the first winding equipment 41 is completed, the vacuum is destroyed and the working position is evacuated. The second winding equipment 41 is controlled by the control device 44 to move along the slide rail to the working position, and repeats the irradiation process of the vacuum chamber of the first winding equipment 41 in a reciprocating cycle to meet the requirement of continuous irradiation work.

综上所述,本发明可以通过直线加速器装置1、束流散射装置2、真空差分装置3以及重离子微孔膜真空辐照终端4,组成基于直线加速器的重离子微孔膜生产装置,利用该生产装置可生产高密度、高质量的重离子微孔膜。To sum up, the present invention can use the linear accelerator device 1, the beam scattering device 2, the vacuum differential device 3 and the heavy ion microporous membrane vacuum irradiation terminal 4 to form a linear accelerator-based heavy ion microporous membrane production device, using This production device can produce high-density, high-quality heavy ion microporous membranes.

本实施例提供的直线加速器重离子微孔膜辐照装置的使用过程为:The usage process of the linear accelerator heavy ion microporous membrane irradiation device provided in this embodiment is as follows:

S1、直线加速器装置1发出的重离子束流扩散及空间分布均匀化后通过真空束流管道发射到真空差分装置3。S1. The heavy ion beam emitted by the linear accelerator device 1 is diffused and spatially distributed and then launched to the vacuum differential device 3 through the vacuum beam pipeline.

S2、真空差分装置3将束流管道的高真空逐步降低至真空腔体411内的低真空。S2. The vacuum differential device 3 gradually reduces the high vacuum in the beam pipe to the low vacuum in the vacuum chamber 411.

S3、在真空腔体411内的卷膜装置5上设置辐照原膜材料。S3. Set the irradiated original film material on the film rolling device 5 in the vacuum chamber 411.

S4、通过牵引电机经滑轨42将该真空腔体411滑动至束流出口处即工作位置,使得该真空腔体411的进口与束流出口对接,并通过密封装置412进行密封,密封后对该真空腔体411抽真空直至达到预设的真空值S4. Use the traction motor to slide the vacuum chamber 411 through the slide rail 42 to the beam outlet, that is, the working position, so that the inlet of the vacuum chamber 411 is connected to the beam outlet, and sealed by the sealing device 412. After sealing, The vacuum chamber 411 is evacuated until it reaches a preset vacuum value.

S5、通过发散后的束流对该真空腔体411内的膜材料进行辐照,形成重离子微孔膜。S5. Irradiate the membrane material in the vacuum chamber 411 with the diverged beam to form a heavy ion microporous membrane.

S6、在对该真空腔体411内的膜材料进行辐照的同时,对另一真空腔体411内的膜材料进行换样,并抽真空直至达到预设的真空值,等待辐照生产。S6. While irradiating the membrane material in the vacuum chamber 411, change the membrane material in another vacuum chamber 411, and evacuate until the preset vacuum value is reached, waiting for irradiation production.

S7、当该真空腔体411内的膜材料完成辐照时,通过牵引电机经滑轨将该真空腔体411撤离工作位置,重复步骤S4和S6往复循环,直至达到连续辐照工作的要求。S7. When the membrane material in the vacuum chamber 411 completes the irradiation, use the traction motor to evacuate the vacuum chamber 411 from the working position through the slide rail, and repeat steps S4 and S6 until the requirements for continuous irradiation work are met.

最后应说明的是,以上实施例仅用以说明本发明的技术方案,而非对其限制;尽管参照前述实施例对本发明进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换,而这些修改或者替换,并不使相应技术方案的本质脱离本发明各实施例技术方案的精神和范围。Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that it can still be used Modifications may be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions may be made to some of the technical features, but these modifications or substitutions do not cause the essence of the corresponding technical solutions to depart from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims (10)

1. The linear accelerator heavy ion microporous membrane irradiation device is characterized by comprising a linear accelerator device, a beam scattering device, a vacuum difference device and a heavy ion microporous membrane vacuum irradiation terminal;
the linac apparatus is configured to generate a heavy ion beam;
the beam dispersing device is configured to uniformly disperse and spatially distribute heavy ion beams in beam pipeline transmission;
the vacuum difference device is configured to gradually reduce the vacuum degree of the beam pipeline;
and the heavy ion microporous membrane vacuum irradiation terminal is connected with the vacuum differential device in a sealing way, so that the irradiation raw membrane in a vacuum environment forms a heavy ion microporous membrane under the bombardment of heavy ion beam current.
2. The linear accelerator ion microporous membrane irradiation device according to claim 1, wherein the linear accelerator device comprises an ECR ion source, a low energy beam transmission line, a radio frequency quadrupole accelerator, a mid energy beam matching section, a drift tube linear accelerator, and a high energy injection line;
the ECR ion source generates strong-current heavy-ion beams, the strong-current heavy-ion beams are subjected to beam transverse matching through the low-energy beam transmission line, the beams subjected to transverse matching are injected into the radio-frequency quadrupole accelerator to accelerate, the beams emitted by the radio-frequency quadrupole accelerator are subjected to beam transverse and longitudinal phase space matching through the medium-energy beam matching section, the beams subjected to transverse and longitudinal phase space matching are injected into the drift tube linear accelerator to accelerate further, the accelerated heavy-ion beams are injected into the beam scattering device through the high-energy injection line, wherein the high-energy injection line comprises a first vacuum beam pipeline and a quadrupole magnet, and the first vacuum beam pipeline penetrates through the quadrupole magnet, so that the heavy-ion beams are transmitted in the first vacuum beam pipeline.
3. The linear accelerator heavy ion microporous membrane irradiation device according to claim 2, wherein the beam dispersing device comprises a second vacuum beam conduit, a pre-defocused quadrupole magnet, an octapole magnet and a terminal defocused quadrupole magnet;
the pre-defocused quadrupole magnet passes through the inlet of the second vacuum beam pipeline, so that the section of the heavy ion beam injected by the high-energy injection line begins to be increased in the horizontal direction, and the section begins to be converged in the vertical direction;
the octupole magnet is arranged at the beam waist position of the heavy ion beam in the vertical direction, so that the heavy ion beam is uniformly distributed in the horizontal direction;
the tail end defocusing quadrupole magnet passes through the outlet of the second vacuum beam pipeline, so that the divergence angle of the heavy ion beam in the horizontal direction is increased.
4. The linear accelerator heavy ion microporous membrane irradiation device according to any one of claims 1 to 3, wherein the vacuum differential device comprises a plurality of vacuum chambers and a third vacuum beam pipeline which are sequentially connected, the vacuum chambers are sequentially connected through the third vacuum beam pipeline, an outlet of a final stage vacuum chamber is connected with the heavy ion microporous membrane vacuum irradiation terminal through a beam horn-shaped transmission pipeline, and the vacuum degree is gradually reduced in the vacuum differential device, so that gradual transition of the vacuum degree is completed.
5. A linear accelerator heavy ion microporous membrane irradiation device according to any one of claims 1 to 3, wherein the heavy ion microporous membrane vacuum irradiation terminal comprises at least one winding irradiation apparatus, a slide rail, a driving apparatus and a control apparatus;
the sliding rail is arranged at the outer side of the vacuum differential device;
the driving device is arranged on the sliding rail, and the driving device controls and pulls the winding irradiation device to reciprocate along the sliding rail transversely and/or longitudinally through the control device, and can pull the winding irradiation device to an ion beam outflow opening for irradiation processing.
6. The linear accelerator ion microporous membrane irradiation device according to claim 5, wherein the winding irradiation apparatus comprises a vacuum chamber;
a sealing device is arranged at the inlet of the vacuum cavity and used for sealing the joint of the vacuum cavity and the beam outlet;
a film rolling device is arranged in the vacuum cavity;
and an opening and closing door is arranged on one side of the vacuum cavity and used for placing and collecting the irradiation original film.
7. The linear accelerator heavy ion microporous membrane irradiation device according to claim 6, wherein the membrane winding device comprises at least one discharging motor, a discharging shaft, a transmission shaft, a receiving shaft and a receiving motor;
at least one discharging shaft is arranged in the vacuum cavity, and each discharging shaft is connected with a discharging motor for discharging the irradiation raw film;
the bottom in the vacuum cavity is provided with at least one material receiving shaft, and the material receiving shaft is connected with a material receiving motor for receiving the irradiation raw film;
the transmission shaft is arranged between the discharging shaft and the receiving shaft and is used for transmitting the irradiation raw film.
8. The linear accelerator heavy ion microporous membrane irradiation device according to claim 7, wherein a discharging tension monitoring shaft and a receiving tension monitoring shaft are arranged between the discharging shaft and the receiving shaft at intervals, and tension sensors are further arranged on the discharging tension monitoring shaft and the receiving tension monitoring shaft and used for monitoring the tension of the membrane material on the corresponding monitoring shaft.
9. The linear accelerator heavy ion microporous membrane irradiation device according to claim 6, wherein the sealing device comprises a plurality of limit switches, a vacuum cavity sealing ring and a beam outlet sealing ring;
the limit switch is used for limiting the movement position of the vacuum cavity, when the vacuum cavity moves to a preset position to trigger the limit switch, the control equipment receives a trigger signal to stop the movement of the vacuum cavity;
when the vacuum cavity moves to the working position, the sealing ring of the vacuum cavity and the sealing ring of the beam outlet are matched to finish sealing.
10. The linear accelerator heavy ion microporous membrane irradiation device according to claim 9, wherein rubber columns are arranged on the vacuum cavity sealing ring in a circumferentially-spaced and outwards extending manner, and correspondingly, rubber holes matched with the rubber columns are arranged on the beam outlet sealing ring, and the rubber columns of the vacuum cavity sealing ring are inserted into the rubber holes of the beam outlet sealing ring to complete sealing; and a film rolling observation window or a visual observation system is arranged on the switch door and used for checking the work in the vacuum cavity.
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