CN111352280B - Display panel - Google Patents
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- CN111352280B CN111352280B CN202010236052.4A CN202010236052A CN111352280B CN 111352280 B CN111352280 B CN 111352280B CN 202010236052 A CN202010236052 A CN 202010236052A CN 111352280 B CN111352280 B CN 111352280B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
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Abstract
Description
技术领域technical field
本发明是有关于一种显示面板,且特别是有关于一种包括感测装置的显示面板。The present invention relates to a display panel, and more particularly, to a display panel including a sensing device.
背景技术Background technique
目前,为了增加产品的使用便利性,许多厂商会于产品中装设感测装置。举例来说,现有的手机内时常附载有指纹识别的感测装置。在现有的指纹识别技术中,感测装置检测手指指纹所反射的光线,指纹的高低起伏会有不同强度的反射光,因此不同的指纹样貌会被感测装置所分辨出来。At present, in order to increase the convenience of use of the products, many manufacturers install sensing devices in the products. For example, a sensor device for fingerprint recognition is often attached to an existing mobile phone. In the existing fingerprint recognition technology, the sensing device detects the light reflected by the fingerprint of the finger, and the fluctuation of the fingerprint will have different intensities of reflected light, so the different fingerprint appearances will be distinguished by the sensing device.
然而,当光线不足或指纹凹痕不明显时,感测装置容易检测错误。导致使用者需要重复感应才能成功识别指纹。因此,目前亟需一种可以解决前述问题的方法。However, when the light is insufficient or the fingerprint dent is not obvious, the sensing device is prone to false detection. As a result, the user needs to repeat the induction to successfully identify the fingerprint. Therefore, there is an urgent need for a method that can solve the aforementioned problems.
发明内容SUMMARY OF THE INVENTION
本发明的至少一实施例提供一种显示面板,可以降低数据线的极性对感测装置造成的影响,藉此提升感测装置识别指纹的能力。At least one embodiment of the present invention provides a display panel, which can reduce the influence of the polarity of a data line on a sensing device, thereby improving the ability of the sensing device to identify fingerprints.
本发明的至少一实施例提供一种显示面板。显示面板包括第一基板、像素阵列、第一输出线、第二输出线、第一感测装置以及第二感测装置。像素阵列位于第一基板上。像素阵列以行反转的方式驱动,且包括多条扫描线、多条数据线以及多个像素。数据线交错于扫描线。各像素包括多个子像素,且各子像素电性连接至对应的一条扫描线以及对应的一条数据线。第一输出线以及第二输出线实质上平行于数据线。数据线中与第一输出线最相邻的一者以及数据线中与第二输出线最相邻的另一者具有相同的极性(polarity)。第一感测装置以及第二感测装置分别电性连接至第一输出线以及第二输出线。At least one embodiment of the present invention provides a display panel. The display panel includes a first substrate, a pixel array, a first output line, a second output line, a first sensing device, and a second sensing device. The pixel array is located on the first substrate. The pixel array is driven in a row inversion manner, and includes a plurality of scan lines, a plurality of data lines, and a plurality of pixels. The data lines are interleaved with the scan lines. Each pixel includes a plurality of sub-pixels, and each sub-pixel is electrically connected to a corresponding scan line and a corresponding data line. The first output line and the second output line are substantially parallel to the data lines. One of the data lines closest to the first output line and the other of the data lines closest to the second output line have the same polarity. The first sensing device and the second sensing device are electrically connected to the first output line and the second output line, respectively.
本发明的至少一实施例提供一种显示面板。显示面板包括第一基板、像素阵列、第一输出线、第二输出线、第一感测装置、第二感测装置、系统电压线、第一参考电压线以及第二参考电压线。像素阵列位于第一基板上,且包括多条扫描线、多条数据线以及多个像素。数据线交错于扫描线。各像素包括多个子像素,且各子像素电性连接至对应的一条扫描线以及对应的一条数据线。第一输出线以及第二输出线实质上平行于数据线。第一感测装置以及第二感测装置分别电性连接至第一输出线以及第二输出线,且第一感测装置以及第二感测装置分别包括第一感光元件以及第二感光元件。系统电压线位于第一感测装置与第二感测装置之间以及第一输出线与第二输出线之间,且电性连接至第一感测装置以及第二感测装置。第一参考电压线以及第二参考电压线分别位于第一感光元件以及第二感光元件的两侧。第一参考电压线以及第二参考电压线分别电性连接至第一感测装置以及第二感测装置。At least one embodiment of the present invention provides a display panel. The display panel includes a first substrate, a pixel array, a first output line, a second output line, a first sensing device, a second sensing device, a system voltage line, a first reference voltage line, and a second reference voltage line. The pixel array is located on the first substrate and includes a plurality of scan lines, a plurality of data lines and a plurality of pixels. The data lines are interleaved with the scan lines. Each pixel includes a plurality of sub-pixels, and each sub-pixel is electrically connected to a corresponding scan line and a corresponding data line. The first output line and the second output line are substantially parallel to the data lines. The first sensing device and the second sensing device are electrically connected to the first output line and the second output line, respectively, and the first sensing device and the second sensing device respectively include a first photosensitive element and a second photosensitive element. The system voltage line is located between the first sensing device and the second sensing device and between the first output line and the second output line, and is electrically connected to the first sensing device and the second sensing device. The first reference voltage line and the second reference voltage line are located on two sides of the first photosensitive element and the second photosensitive element, respectively. The first reference voltage line and the second reference voltage line are electrically connected to the first sensing device and the second sensing device, respectively.
以下结合附图和具体实施例对本发明进行详细描述,但不作为对本发明的限定。The present invention is described in detail below with reference to the accompanying drawings and specific embodiments, but is not intended to limit the present invention.
附图说明Description of drawings
图1是依照本发明的一实施例的一种显示面板的剖面示意图。FIG. 1 is a schematic cross-sectional view of a display panel according to an embodiment of the present invention.
图2A是依照本发明的一实施例的一种像素阵列基板的俯视示意图。2A is a schematic top view of a pixel array substrate according to an embodiment of the present invention.
图2B是沿着图2A的剖面线aa’的剖面示意图。Fig. 2B is a schematic cross-sectional view taken along the section line aa' of Fig. 2A .
图3A是依照本发明的一实施例的一种感测元件基板的仰视示意图。3A is a schematic bottom view of a sensing element substrate according to an embodiment of the present invention.
图3B是沿着图3A的剖面线bb’的剖面示意图。Fig. 3B is a schematic cross-sectional view along the section line bb' of Fig. 3A.
图4A是依照本发明的一实施例的一种像素阵列基板的俯视示意图。4A is a schematic top view of a pixel array substrate according to an embodiment of the present invention.
图4B是依照本发明的一实施例的一种感测元件基板的仰视示意图。4B is a schematic bottom view of a sensing element substrate according to an embodiment of the present invention.
图4C是依照本发明的一实施例的显示面板的立体示意图。4C is a schematic perspective view of a display panel according to an embodiment of the present invention.
其中,附图标记:Among them, reference numerals:
1、2:显示面板1, 2: Display panel
10:像素阵列基板10: Pixel array substrate
100:第一基板100: First substrate
110:像素阵列110: Pixel array
20:感测元件基板20: Sensing element substrate
200:第二基板200: Second substrate
212:第一输出线212: first output line
214:第二输出线214: Second output line
216:第三输出线216: The third output line
218:第四输出线218: Fourth output line
222:第一感测装置222: First Sensing Device
224:第二感测装置224: Second Sensing Device
222a:第三感测装置222a: third sensing device
224a:第四感测装置224a: Fourth Sensing Device
222b:第五感测装置222b: Fifth Sensing Device
224b:第六感测装置224b: Sixth Sensing Device
222c:第七感测装置222c: Seventh Sensing Device
224c:第八感测装置224c: Eighth Sensing Device
232:第一系统电压线232: First system voltage line
234:第二系统电压线234: Second system voltage line
242:第一参考电压线242: first reference voltage line
244:第二参考电压线244: Second reference voltage line
246:第三参考电压线246: Third reference voltage line
252:第一控制信号线252: the first control signal line
254:第二控制信号线254: The second control signal line
256:第三控制信号线256: The third control signal line
258:第四控制信号线258: Fourth control signal line
BL:背光模块BL: Backlight Module
B1、B1’、I1、I1’、I2、I2’、I3、I3’、I4:绝缘层B1, B1', I1, I1', I2, I2', I3, I3', I4: insulating layer
B2:钝化层B2: Passivation layer
CE:共用电极CE: Common electrode
CL:共用电极线CL: Common electrode line
C1、C3:导电层C1, C3: Conductive layer
C2、C4:电极层C2, C4: electrode layer
D、D1、D2:漏极D, D1, D2: Drain
CH、CH1、CH2:半导体通道层CH, CH1, CH2: semiconductor channel layers
CR:遮光区CR: Blackout area
DL:数据线DL: data line
F:手指F: finger
G、G1、G2:栅极G, G1, G2: Grid
LC:显示介质层LC: Display medium layer
LR:光线LR: light
LS:感光元件LS: photosensitive element
LS1:第一感光元件LS1: The first photosensitive element
LS2:第一感光元件LS2: The first photosensitive element
LS1a:第三感光元件LS1a: Third photosensitive element
LS2a:第四感光元件LS2a: Fourth photosensitive element
LS1b:第五感光元件LS1b: Fifth photosensitive element
LS2b:第六感光元件LS2b: sixth photosensitive element
LS1c:第七感光元件LS1c: seventh photosensitive element
LS2c:第八感光元件LS2c: Eighth photosensitive element
OR:透光区OR: light transmission area
PE:像素电极PE: pixel electrode
PX:像素px: pixels
P1、P2、P3、P4:节距P1, P2, P3, P4: pitch
R1、R2:光感测层R1, R2: light sensing layer
H1、H2、H1a、H2a、H1b、H2b、H1c、H2c、H1d、H3a、H3b、O1、O2、OP、TH1、TH2:开口H1, H2, H1a, H2a, H1b, H2b, H1c, H2c, H1d, H3a, H3b, O1, O2, OP, TH1, TH2: Open
S、S1、S2:源极S, S1, S2: source
SL:扫描线SL: scan line
SM:遮蔽层SM: Masking layer
SP:子像素SP: Subpixel
TE:转接电极TE: transfer electrode
T:开关元件T: switching element
T1:第一开关元件T1: The first switching element
T2:第二开关元件T2: Second switching element
T3:第三开关元件T3: Third switching element
T4:第四开关元件T4: Fourth switching element
具体实施方式Detailed ways
下面结合附图对本发明的结构原理和工作原理作具体的描述:Below in conjunction with accompanying drawing, structure principle and working principle of the present invention are described in detail:
图1是依照本发明的一实施例的一种显示面板的剖面示意图。为了方便说明,图1省略绘示了感测元件基板以及像素阵列基板的部分构件。FIG. 1 is a schematic cross-sectional view of a display panel according to an embodiment of the present invention. For convenience of description, FIG. 1 omits to illustrate some components of the sensing element substrate and the pixel array substrate.
请参考图1,显示面板1包括感测元件基板20、像素阵列基板10以及显示介质层LC。感测元件基板20面对像素阵列基板10。显示介质层LC位于像素阵列基板10与感测元件基板20之间。在本实施例中,显示面板1还包括背光模块BL,背光模块BL设置于像素阵列基板10的下方,换句话说,像素阵列基板10位于背光模块BL以及感测元件基板20之间。Please refer to FIG. 1 , the
在本实施例中,像素阵列基板10包括第一基板100以及像素阵列110。像素阵列110位于第一基板100上。In this embodiment, the
在本实施例中,感测元件基板20包括第二基板200以及多个感测装置(图1中以感测装置中的感光元件LS示意)。感测装置位于第二基板200上。在一些实施例中,感测元件基板20还包括系统电压线、参考电压线以及输出线。关于系统电压线、参考电压线以及输出线的设置方式可见于图2A的实施例。In this embodiment, the
在本实施例中,感光元件LS包括导电层C1、光感测层R以及电极层C2。光感测层R位于导电层C1以及电极层C2之间。In this embodiment, the photosensitive element LS includes a conductive layer C1, a photosensitive layer R, and an electrode layer C2. The photo-sensing layer R is located between the conductive layer C1 and the electrode layer C2.
在本实施例中,当手指F靠近感测元件基板20时,背光模块BL所发出的光线LR会被手指F反射至光感测层R。In this embodiment, when the finger F is close to the
图2A是依照本发明的一实施例的一种像素阵列基板的俯视示意图。图2B是沿着图2A的剖面线aa’的剖面示意图。图3A是依照本发明的一实施例的一种感测元件基板的仰视示意图。图3B是沿着图3A的剖面线bb’的剖面示意图。需注意的是,为了使附图清晰,图2A、图2B、图3A以及图3B并非以等比例绘示。2A is a schematic top view of a pixel array substrate according to an embodiment of the present invention. Fig. 2B is a schematic cross-sectional view taken along the section line aa' of Fig. 2A . 3A is a schematic bottom view of a sensing element substrate according to an embodiment of the present invention. Fig. 3B is a schematic cross-sectional view along the section line bb' of Fig. 3A. It should be noted that, in order to make the drawings clear, FIGS. 2A , 2B, 3A and 3B are not drawn in isometric scales.
在此必须说明的是,图2A至图3B的实施例沿用图1的实施例的元件标号与部分内容,其中采用相同或近似的标号来表示相同或近似的元件,并且省略了相同技术内容的说明。关于省略部分的说明可参考前述实施例,在此不赘述。It must be noted here that the embodiments of FIG. 2A to FIG. 3B use the element numbers and part of the content of the embodiment of FIG. 1 , wherein the same or similar reference numbers are used to represent the same or similar elements, and the same technical content is omitted. illustrate. For the description of the omitted part, reference may be made to the foregoing embodiments, which will not be repeated here.
在本实施例中,显示面板具有透光区OR以及遮光区CR。在一些实施例中,遮光区CR重叠于黑矩阵(图2B以及图3B省略绘出)。在一些实施例中,黑矩阵位于感测元件基板20中。在其他实施例中,黑矩阵位于像素阵列基板10中。In this embodiment, the display panel has a light-transmitting region OR and a light-shielding region CR. In some embodiments, the light-shielding region CR overlaps the black matrix (not shown in FIG. 2B and FIG. 3B ). In some embodiments, the black matrix is located in the
请参考图2A与图2B,像素阵列110位于第一基板100上,且包括多条扫描线SL、多条数据线DL以及多个像素PX。数据线DL可为锯齿状(zigzag)、直线形或其他形状。Referring to FIGS. 2A and 2B , the
数据线DL交错于扫描线SL。各像素PX包括多个子像素SP,且各子像素SP电性连接至对应的一条扫描线SL以及对应的一条数据线DL。The data lines DL are interlaced with the scan lines SL. Each pixel PX includes a plurality of sub-pixels SP, and each sub-pixel SP is electrically connected to a corresponding scan line SL and a corresponding data line DL.
在本实施例中,各子像素SP包括开关元件T以及电性连接至开关元件T的像素电极PE。在本实施例中,开关元件T、扫描线SL以及数据线DL位于遮光区CR,且至少部分像素电极PE位于透光区OR。In this embodiment, each sub-pixel SP includes a switching element T and a pixel electrode PE electrically connected to the switching element T. In this embodiment, the switching element T, the scan line SL and the data line DL are located in the light-shielding region CR, and at least part of the pixel electrode PE is located in the light-transmitting region OR.
开关元件T例如位于绝缘层I1上。在一些实施例中,开关元件T与第一基板100之间夹有遮光层M。开关元件T包括栅极G、源极S、漏极D以及半导体通道层CH。半导体通道层CH位于绝缘层I1上。栅极G与半导体通道层CH重叠,且栅极G与半导体通道层CH之间夹有绝缘层I2。栅极G与扫描线SL电性连接。在本实施例中,栅极G与扫描线SL属于同一导电膜层,但本发明不以此为限。绝缘层I3位于绝缘层I2上并覆盖栅极G与扫描线SL。源极S以及漏极D位于绝缘层I3的上方,且源极S与数据线DL电性连接。在本实施例中,源极S以及数据线DL属于同一导电膜层,但本发明不以此为限。源极S以及漏极D通过开口H1、H2而电性连接至半导体通道层CH,开口H1、H2例如位于绝缘层I3以及绝缘层I2中。绝缘层B1位于源极S以及漏极D的上方。The switching element T is located, for example, on the insulating layer I1. In some embodiments, the light shielding layer M is sandwiched between the switching element T and the
上述开关元件T是以顶部栅极型薄膜晶体管为例来说明,但本发明不限于此。根据其他实施例,上述开关元件T也可是以底部栅极型薄膜晶体管。The above-mentioned switching element T is described by taking a top-gate thin film transistor as an example, but the present invention is not limited to this. According to other embodiments, the above-mentioned switching element T may also be a bottom gate type thin film transistor.
在本实施例中,像素阵列基板10选择性的包括共用电极线CL。In this embodiment, the
在本实施例中,共用电极线CL与数据线DL的延伸方向相同,且共用电极线CL与数据线DL属于相同膜层,但本发明不以此为限。在其他实施例中,共用电极线CL与于数据线DL属于不同膜层,且共用电极线CL于垂直第一基板100的方向上重叠于数据线DL,藉此可以提升显示面板的开口率。In this embodiment, the extending directions of the common electrode line CL and the data line DL are the same, and the common electrode line CL and the data line DL belong to the same film layer, but the invention is not limited to this. In other embodiments, the common electrode line CL and the data line DL belong to different layers, and the common electrode line CL overlaps the data line DL in a direction perpendicular to the
共用电极CE位于绝缘层B1上,且通过绝缘层B1中的开口电性连接至共用电极线CL。在一些实施例中,共用电极CE包括触控电极。The common electrode CE is located on the insulating layer B1 and is electrically connected to the common electrode line CL through the opening in the insulating layer B1. In some embodiments, the common electrode CE includes a touch electrode.
绝缘层I4位于共用电极CE上。像素电极PE位于绝缘层I4上,像素电极PE重叠于共用电极CE,像素电极PE与共用电极CE分离。像素电极PE通过开口OP而电性连接至开关元件T的漏极D。在本实施例中,开口OP穿过绝缘层B1、绝缘层I4以及共用电极CE,但本发明不以此为限。在一些实施例中,像素阵列基板10可以采用边缘场切换(Fringe Field Switching,FFS)技术或横向电场(In-Plane-Switching,IPS)技术驱动液晶。The insulating layer I4 is located on the common electrode CE. The pixel electrode PE is located on the insulating layer I4, the pixel electrode PE overlaps with the common electrode CE, and the pixel electrode PE is separated from the common electrode CE. The pixel electrode PE is electrically connected to the drain D of the switching element T through the opening OP. In this embodiment, the opening OP passes through the insulating layer B1 , the insulating layer I4 and the common electrode CE, but the invention is not limited thereto. In some embodiments, the
在本实施例中,像素阵列110以行反转(Column inversion)的方式驱动,举例来说,相邻的数据线DL具有不同的极性。在本实施例中,数据线DL的极性会随着操作时间而不断反转。In this embodiment, the
请参考图3A与图3B,第一输出线212、第二输出线214、第一感测装置222、第二感测装置224、第一系统电压线232、第一参考电压线242、第二参考电压线244、第一控制信号线252与第二控制信号线254位于第二基板200上。在本实施例中,第一输出线212、第二输出线214、第一感测装置222、第二感测装置224、第一系统电压线232、第一参考电压线242、第二参考电压线244、第一控制信号线252与第二控制信号线254位于遮光区CR。3A and 3B, the
在本实施例中,第一输出线212、第二输出线214、第一系统电压线232、第一参考电压线242以及第二参考电压线244重叠且实质上平行于第一基板100上的数据线DL,藉此能避免显示面板的开口率下降。在一些实施例中,第一输出线212、第二输出线214、第一系统电压线232、第一参考电压线242以及第二参考电压线244可为锯齿状(zigzag)、直线形或其他形状。In the present embodiment, the
在本实施例中,第一感测装置222电性连接至第一输出线212、第一参考电压线242、第一控制信号线252以及第一系统电压线232。第一感测装置222包括第一开关元件T1、第二开关元件T2以及第一感光元件LS1。In this embodiment, the
在本实施例中,第一开关元件T1包括栅极G1、源极S1、漏极D1以及半导体通道层CH1。在本实施例中,第一开关元件T1与第二基板200之间还包括遮光层M1,但本发明不以此为限。In this embodiment, the first switching element T1 includes a gate G1 , a source S1 , a drain D1 and a semiconductor channel layer CH1 . In this embodiment, a light shielding layer M1 is further included between the first switching element T1 and the
半导体通道层CH1位于绝缘层I1’上。栅极G1与半导体通道层CH1重叠,且栅极G1与半导体通道层CH1之间夹有绝缘层I2’。栅极G1与第一控制信号线252电性连接。绝缘层I3’位于绝缘层I2’上且覆盖栅极G1、第一控制信号线252与第二控制信号线254。源极S1以及漏极D1位于绝缘层I3’的上方,且源极S1与第一参考电压线242电性连接,其中第一参考电压线242例如电性连接至电压VSS。源极S1以及漏极D1分别通过开口H1a、H2a而电性连接至半导体通道层CH1,开口H1a、H2a例如位于绝缘层I3’以及绝缘层I2’中。The semiconductor channel layer CH1 is located on the insulating layer I1'. The gate G1 overlaps with the semiconductor channel layer CH1, and an insulating layer I2' is sandwiched between the gate G1 and the semiconductor channel layer CH1. The gate G1 is electrically connected to the first
第二开关元件T2包括栅极G2、源极S2、漏极D2以及半导体通道层CH2。在本实施例中,第二开关元件T2与第二基板200之间还包括遮光层M2,但本发明不以此为限。The second switching element T2 includes a gate electrode G2, a source electrode S2, a drain electrode D2 and a semiconductor channel layer CH2. In this embodiment, the light shielding layer M2 is further included between the second switching element T2 and the
半导体通道层CH2位于绝缘层I1’上。栅极G2与半导体通道层CH2重叠,且栅极G2与半导体通道层CH2之间夹有绝缘层I2’。绝缘层I3’覆盖栅极G2。栅极G2与第一开关元件T1电性连接。举例来说,第一开关元件T1的漏极D1通过开口H3a而电性连接至栅极G2,开口H3a例如位于绝缘层I3’中。源极S2以及漏极D2位于绝缘层I3’的上方,且源极S2与第一系统电压线232电性连接,其中第一系统电压线232例如电性连接至电压VDD。漏极D2与第一输出线212电性连接。源极S2以及漏极D2通过开口H2b、H1b而电性连接至半导体通道层CH2,开口H1b、H2b例如位于绝缘层I3’以及绝缘层I2’中。藉此设计使信号更佳。The semiconductor channel layer CH2 is located on the insulating layer I1'. The gate G2 overlaps with the semiconductor channel layer CH2, and an insulating layer I2' is sandwiched between the gate G2 and the semiconductor channel layer CH2. The insulating layer I3' covers the gate G2. The gate G2 is electrically connected to the first switching element T1. For example, the drain D1 of the first switching element T1 is electrically connected to the gate G2 through the opening H3a, for example, the opening H3a is located in the insulating layer I3'. The source electrode S2 and the drain electrode D2 are located above the insulating layer I3', and the source electrode S2 is electrically connected to the first
第一感光元件LS1包括导电层C1、光感测层R1以及电极层C2。光感测层R1位于导电层C1以及电极层C2之间。The first photosensitive element LS1 includes a conductive layer C1, a photosensitive layer R1, and an electrode layer C2. The photo-sensing layer R1 is located between the conductive layer C1 and the electrode layer C2.
导电层C1位于绝缘层B1’上。第一感光元件LS1的导电层C1电性连接至第二控制信号线254。The conductive layer C1 is located on the insulating layer B1'. The conductive layer C1 of the first photosensitive element LS1 is electrically connected to the second
电极层C2位于绝缘层B1’上。第一感光元件LS1的电极层C2电性连接至第一开关元件T1的漏极D1以及第二开关元件T2的栅极G2。举例来说,电极层C2通过开口TH1而电性连接至第一开关元件T1的漏极D1,开口TH1例如位于绝缘层B1’中。在一些实施例中,电极层C2与漏极D1之间选择性地夹有转接电极层(未示出),转接电极层例如与导电层C1属于同一膜层。The electrode layer C2 is located on the insulating layer B1'. The electrode layer C2 of the first photosensitive element LS1 is electrically connected to the drain D1 of the first switching element T1 and the gate G2 of the second switching element T2. For example, the electrode layer C2 is electrically connected to the drain D1 of the first switching element T1 through the opening TH1, and the opening TH1 is, for example, located in the insulating layer B1'. In some embodiments, a transfer electrode layer (not shown) is selectively sandwiched between the electrode layer C2 and the drain electrode D1, and the transfer electrode layer and the conductive layer C1 belong to the same film layer, for example.
在本实施例中,第二感测装置224电性连接至第二输出线214、第二参考电压线244、第一控制信号线252以及第一系统电压线232。在本实施例中,第一感测装置222以及第二感测装置224共用同一条第一系统电压线232。第二感测装置224包括第三开关元件T3、第四开关元件T4以及第二感光元件LS2。In this embodiment, the
在本实施例中,第三开关元件T3包括栅极G3、源极S3、漏极D3以及半导体通道层CH3。在本实施例中,第三开关元件T3与第二基板200之间还包括遮光层M3,但本发明不以此为限。In this embodiment, the third switching element T3 includes a gate electrode G3, a source electrode S3, a drain electrode D3 and a semiconductor channel layer CH3. In this embodiment, a light shielding layer M3 is further included between the third switching element T3 and the
半导体通道层CH3位于绝缘层I1’上。栅极G3与半导体通道层CH3重叠,且栅极G3与半导体通道层CH3之间夹有绝缘层I2’。栅极G3与第一控制信号线252电性连接。绝缘层I3’覆盖栅极G3。源极S3以及漏极D3位于绝缘层I3’的上方,且源极S3与第二参考电压线244电性连接,其中第二参考电压线244例如电性连接至电压VSS。源极S3以及漏极D3分别通过开口H1c、H2c而电性连接至半导体通道层CH3,开口H1c、H2c例如位于绝缘层I3’以及绝缘层I2’中。The semiconductor channel layer CH3 is located on the insulating layer I1'. The gate G3 overlaps with the semiconductor channel layer CH3, and an insulating layer I2' is sandwiched between the gate G3 and the semiconductor channel layer CH3. The gate G3 is electrically connected to the first
第四开关元件T4包括栅极G4、源极S4、漏极D4以及半导体通道层CH4。在本实施例中,第四开关元件T4与第二基板200之间还包括遮光层M4,但本发明不以此为限。The fourth switching element T4 includes a gate electrode G4, a source electrode S4, a drain electrode D4 and a semiconductor channel layer CH4. In this embodiment, a light shielding layer M4 is further included between the fourth switching element T4 and the
半导体通道层CH4位于绝缘层I1’上。栅极G4与半导体通道层CH4重叠,且栅极G4与半导体通道层CH4之间夹有绝缘层I2’。绝缘层I3’覆盖栅极G4。栅极G4与第三开关元件T3电性连接。举例来说,第三开关元件T3的漏极D3通过开口H3b而电性连接至栅极G4,开口H3b例如位于绝缘层I3’中。源极S4以及漏极D4位于绝缘层I3’的上方,且源极S4与第一系统电压线232电性连接。漏极D4与第二输出线214电性连接。源极S4以及漏极D4通过开口H2b、H1d而电性连接至半导体通道层CH4,开口H1d例如位于绝缘层I3’以及绝缘层I2’中。藉此设计使信号更佳。The semiconductor channel layer CH4 is located on the insulating layer I1'. The gate G4 overlaps with the semiconductor channel layer CH4, and an insulating layer I2' is sandwiched between the gate G4 and the semiconductor channel layer CH4. The insulating layer I3' covers the gate G4. The gate G4 is electrically connected to the third switching element T3. For example, the drain D3 of the third switching element T3 is electrically connected to the gate G4 through the opening H3b, for example, the opening H3b is located in the insulating layer I3'. The source electrode S4 and the drain electrode D4 are located above the insulating layer I3', and the source electrode S4 is electrically connected to the first
在本实施例中,半导体通道层CH4与半导体通道层CH2连成一体,且源极S4与源极S2连成一体,藉此能减小感测装置的尺寸。In this embodiment, the semiconductor channel layer CH4 and the semiconductor channel layer CH2 are integrated, and the source electrode S4 and the source electrode S2 are integrated, thereby reducing the size of the sensing device.
在一些实施例中,栅极G2与栅极G4的形状互为镜像对称,且漏极D1与漏极D3的形状互为镜像对称。In some embodiments, the shapes of the gate G2 and the gate G4 are mirror-symmetrical to each other, and the shapes of the drain D1 and the drain D3 are mirror-symmetrical to each other.
在本实施例中,栅极G1、栅极G2、栅极G3、栅极G4、第一控制信号线252与第二控制信号线254属于同一导电膜层,但本发明不以此为限。在本实施例中,源极S1、漏极D1、源极S2、漏极D2、源极S3、漏极D3、源极S4、漏极D4、第一参考电压线242、第二参考电压线244、第一输出线212、第二输出线214以及第一系统电压线232属于同一导电膜层,但本发明不以此为限。In this embodiment, the gate G1 , the gate G2 , the gate G3 , the gate G4 , the first
在本实施例中,第一开关元件T1、第二开关元件T2、第三开关元件T3以及第四开关元件T4是以顶部栅极型薄膜晶体管为例来说明,但本发明不限于此。在其他实施例中,第一开关元件T1、第二开关元件T2、第三开关元件T3以及第四开关元件T4也可是以底部栅极型薄膜晶体管或其他适合的薄膜晶体管。In this embodiment, the first switching element T1 , the second switching element T2 , the third switching element T3 and the fourth switching element T4 are described by taking the top gate type thin film transistor as an example, but the invention is not limited thereto. In other embodiments, the first switching element T1 , the second switching element T2 , the third switching element T3 and the fourth switching element T4 may also be bottom gate type thin film transistors or other suitable thin film transistors.
第二感光元件LS2包括导电层C3、光感测层R2以及电极层C4。光感测层R2位于导电层C3以及电极层C4之间。The second light-sensing element LS2 includes a conductive layer C3, a light-sensing layer R2, and an electrode layer C4. The photo-sensing layer R2 is located between the conductive layer C3 and the electrode layer C4.
导电层C3位于绝缘层B1’上。导电层C3电性连接至第二控制信号线254。在本实施例中,导电层C1以及导电层C3连成一体,且导电层C1以及导电层C3通过开口O1而电性连接至转接电极TE,转接电极TE通过开口O2而电性连接至第二控制信号线254。开口O1例如位于绝缘层B1’中。开口O2例如位于绝缘层I3’中。在一些实施例中,转接电极TE与第一系统电压线232属于同一导电膜层,但本发明不以此为限。The conductive layer C3 is located on the insulating layer B1'. The conductive layer C3 is electrically connected to the second
电极层C4位于绝缘层B1’上。电极层C4电性连接至第三开关元件T3的漏极D3以及第四开关元件T4的栅极G4。举例来说,电极层C4通过开口TH2而电性连接至第三开关元件T3的漏极D3,开口TH2例如位于绝缘层B1’中。在一些实施例中,电极层C4与漏极D3之间选择性地夹有转接电极层(未示出),转接电极层例如与导电层C3属于同一膜层。The electrode layer C4 is located on the insulating layer B1'. The electrode layer C4 is electrically connected to the drain D3 of the third switching element T3 and the gate G4 of the fourth switching element T4. For example, the electrode layer C4 is electrically connected to the drain D3 of the third switching element T3 through the opening TH2, for example, the opening TH2 is located in the insulating layer B1'. In some embodiments, a transfer electrode layer (not shown) is selectively sandwiched between the electrode layer C4 and the drain electrode D3, and the transfer electrode layer and the conductive layer C3 belong to the same film layer, for example.
在本实施例中,导电层C1以及导电层C3的材质较佳为透明导电材料,例如是铟锡氧化物、铟锌氧化物、铝锡氧化物、铝锌氧化物、铟镓锌氧化物或其他合适的氧化物或者是上述至少二者的堆叠层。In this embodiment, the materials of the conductive layer C1 and the conductive layer C3 are preferably transparent conductive materials, such as indium tin oxide, indium zinc oxide, aluminum tin oxide, aluminum zinc oxide, indium gallium zinc oxide or Other suitable oxides or stacks of at least two of the above.
在本实施例中,电极层C2以及电极层C4的材质例如是钼、铝、钛、铜、金、银或其他导电材料或上述两种以上材料的堆叠。在一些实施例中,电极层C2以及电极层C4可作为反射层使用,藉此增加光感测层R1以及光感测层R2所能接收到的光线。In this embodiment, the materials of the electrode layer C2 and the electrode layer C4 are, for example, molybdenum, aluminum, titanium, copper, gold, silver or other conductive materials or a stack of two or more of the above materials. In some embodiments, the electrode layer C2 and the electrode layer C4 can be used as a reflective layer, thereby increasing the light that the photo-sensing layer R1 and the photo-sensing layer R2 can receive.
在本实施例中,光感测层R1以及光感测层R2的材质例如是富硅氧化物(Silicon-rich oxide,SRO)或其他合适的材料。In this embodiment, the materials of the photo-sensing layer R1 and the photo-sensing layer R2 are, for example, silicon-rich oxide (SRO) or other suitable materials.
在本实施例中,感测元件基板20还包括遮蔽层SM。In this embodiment, the
遮蔽层SM位于第一输出线212与像素阵列基板10之间、第二输出线214与像素阵列基板10之间、第一系统电压线232与像素阵列基板10之间、第一参考电压线242与像素阵列基板10之间、第二参考电压线244与像素阵列基板10之间、第一控制信号线252与像素阵列基板10之间以及第二控制信号线254与像素阵列基板10之间。The shielding layer SM is located between the
在一些实施例中,遮蔽层SM、导电层C1以及导电层C3为同一导电膜层。遮蔽层SM与导电层C1(或导电层C3)电性连接至不同的信号源。藉由遮蔽层SM来改善感测元件基板20所产生的电场影响显示介质层中液晶分子的问题,能够提升显示装置的显示品质。In some embodiments, the shielding layer SM, the conductive layer C1 and the conductive layer C3 are the same conductive film layer. The shielding layer SM and the conductive layer C1 (or the conductive layer C3 ) are electrically connected to different signal sources. The problem that the electric field generated by the
在一些实施例中,共用电极CE与遮蔽层SM电性连接至相同信号源。也可以说共用电极CE与遮蔽层SM上施有相同的信号,藉此进一步改善感测元件基板20所产生之电场影响显示品质的问题。In some embodiments, the common electrode CE and the shielding layer SM are electrically connected to the same signal source. It can also be said that the same signal is applied to the common electrode CE and the shielding layer SM, thereby further improving the problem that the electric field generated by the
在本实施例中,感测元件基板20更包括钝化层B2。钝化层B2覆盖导电层C1、电极层C2、遮蔽层SM以及绝缘层B1’。In this embodiment, the
在本实施例中,第一系统电压线232位于第一感测装置222与第二感测装置224之间以及第一输出线212与第二输出线214之间,且第一参考电压线242以及第二参考电压线244分别位于第一感光元件222以及第二感光元件224的两侧,因此,与第一输出线212最相邻的一条数据线DL以及与第二输出线214最相邻的另一条数据线DL具有相同的极性(例如在同一时间同为正极或同为负极)。举例来说,重叠于第一输出线212的一条数据线DL与重叠于第二输出线214的另一条数据线DL具有相同的极性,藉此可以降低数据线DL的极性对第一感测装置222以及第二感测装置224造成的影响,并且提升第一感测装置222以及第二感测装置224识别指纹的能力。In this embodiment, the first
图4A是依照本发明的一实施例的一种像素阵列基板的俯视示意图。图4B是依照本发明的一实施例的一种感测元件基板的仰视示意图。图4C是依照本发明的一实施例的显示面板的立体示意图。4A is a schematic top view of a pixel array substrate according to an embodiment of the present invention. 4B is a schematic bottom view of a sensing element substrate according to an embodiment of the present invention. 4C is a schematic perspective view of a display panel according to an embodiment of the present invention.
在此必须说明的是,图4A至图4C的实施例沿用图2A至图3B的实施例的元件标号与部分内容,其中采用相同或近似的标号来表示相同或近似的元件,并且省略了相同技术内容的说明。关于省略部分的说明可参考前述实施例,在此不赘述。It must be noted here that the embodiments of FIGS. 4A to 4C use the element numbers and part of the content of the embodiments of FIGS. 2A to 3B , wherein the same or similar reference numbers are used to represent the same or similar elements, and the same elements are omitted. Description of technical content. For the description of the omitted part, reference may be made to the foregoing embodiments, which will not be repeated here.
请参考图4A、图4B以及图4C,显示装置2包括感测元件基板20以及像素阵列基板10。Referring to FIGS. 4A , 4B and 4C , the
像素阵列基板10包括第一基板100以及像素阵列110。像素阵列110位于第一基板100上。像素阵列110包括多条扫描线SL、多条数据线DL以及多个像素PX。各像素PX包括多个子像素SP,且各子像素SP电性连接至对应的一条扫描线SL以及对应的一条数据线DL。在本实施例中,各子像素SP包括开关元件T以及电性连接至开关元件T的像素电极PE。The
在本实施例中,感测元件基板20包括第二基板200、第一感测装置222、第二感测装置224、第三感测装置222a、第四感测装置224a、第五感测装置222b、第六感测装置224b、第七感测装置222c、第八感测装置224c、第一系统电压线232、第二系统电压线234、第一输出线212、第二输出线214、第三输出线216、第四输出线218、第一参考电压线242、第二参考电压线244、第三参考电压线246、第一控制信号线252、第二控制信号线254、第三控制信号线256以及第四控制信号线258。In this embodiment, the
第一感测装置222电性连接至第一系统电压线232、第一输出线212、第一控制信号线252、第二控制信号线254以及第一参考电压线242。第二感测装置224电性连接至第一系统电压线232、第二输出线214、第一控制信号线252、第二控制信号线254以及第二参考电压线244。The
第三感测装置222a以及第四感测装置224a的结构分别类似于前述实施例中的第一感测装置222以及第二感测装置224。第三感测装置222a电性连接至第二系统电压线234、第三输出线216、第一控制信号线252、第二控制信号线254以及第二参考电压线244。第四感测装置224a电性连接至第二系统电压线234、第四输出线218、第一控制信号线252、第二控制信号线254以及第三参考电压线246。The structures of the
第五感测装置222b以及第六感测装置224b的结构分别类似于前述实施例中的第一感测装置222以及第二感测装置224。第五感测装置222b电性连接至第一系统电压线232、第一输出线212、第三控制信号线256、第四控制信号线258以及第一参考电压线242。第六感测装置224b电性连接至第一系统电压线232、第二输出线214、第三控制信号线256、第四控制信号线258以及第二参考电压线244。The structures of the
第七感测装置222c以及第八感测装置224c的结构分别类似于前述实施例中的第一感测装置222以及第二感测装置224。第七感测装置222c电性连接至第二系统电压线234、第三输出线216、第三控制信号线256、第四控制信号线258以及第二参考电压线244。第八感测装置224c电性连接至第二系统电压线234、第四输出线218、第三控制信号线256、第四控制信号线258以及第三参考电压线246。The structures of the
在本实施例中,与第一输出线212最相邻的数据线DL、与第二输出线214最相邻的数据线DL、与第三输出线216最相邻的数据线DL以及与第四输出线218最相邻的数据线DL具有相同的极性,因此,可以降低数据线DL的极性对感测装置造成的影响,藉此提升感测装置识别指纹的能力。In this embodiment, the data line DL closest to the
在本实施例中,第一感测装置222、第二感测装置224、第三感测装置222a、第四感测装置224a、第五感测装置222b、第六感测装置224b、第七感测装置222c以及第八感测装置224c分别包括第一感光元件LS1、第二感光元件LS2、第三感光元件LS1a、第四感光元件LS2a、第五感光元件LS1b、第六感光元件LS2b、第七感光元件LS1c以及第八感光元件LS2c。In this embodiment, the
在本实施例中,感光元件之间的节距等于像素PX之间的节距。举例来说,第一感光元件LS1以及第二感光元件LS2之间的节距P1等于像素PX之间的节距P2,第一感光元件LS1以及第五感光元件LS1b之间的节距P3约等于像素PX之间的节距P4。在本实施例中,节距P1等于节距P3,且节距P2等于节距P4。In this embodiment, the pitch between the photosensitive elements is equal to the pitch between the pixels PX. For example, the pitch P1 between the first photosensitive element LS1 and the second photosensitive element LS2 is equal to the pitch P2 between the pixels PX, and the pitch P3 between the first photosensitive element LS1 and the fifth photosensitive element LS1b is approximately equal to Pitch P4 between pixels PX. In this embodiment, the pitch P1 is equal to the pitch P3, and the pitch P2 is equal to the pitch P4.
虽然在本实施例中,第一感测装置222、第二感测装置224、第三感测装置222a、第四感测装置224a、第五感测装置222b、第六感测装置224b、第七感测装置222c、第八感测装置224c、第一系统电压线232、第二系统电压线234、第一输出线212、第二输出线214、第三输出线216、第四输出线218、第一参考电压线242、第二参考电压线244、第三参考电压线246、第一控制信号线252、第二控制信号线254、第三控制信号线256以及第四控制信号线258位于第二基板200上,但本发明不以此为限。在其他实施例中,第一感测装置222、第二感测装置224、第三感测装置222a、第四感测装置224a、第五感测装置222b、第六感测装置224b、第七感测装置222c、第八感测装置224c、第一系统电压线232、第二系统电压线234、第一输出线212、第二输出线214、第三输出线216、第四输出线218、第一参考电压线242、第二参考电压线244、第三参考电压线246、第一控制信号线252、第二控制信号线254、第三控制信号线256以及第四控制信号线258位于第一基板100上。Although in this embodiment, the
综上所述,由于第一系统电压线位于第一感测装置与第二感测装置之间以及第一输出线与第二输出线之间,且第一参考电压线以及第二参考电压线分别位于第一感光元件以及第二感光元件的两侧,与第一输出线最相邻的一条数据线以及与第二输出线最相邻的另一条数据线具有相同的极性(例如在同一时间同为正极或同为负极)。举例来说,重叠于第一输出线的一条数据线与重叠于第二输出线的另一条数据线具有相同的极性,因此,可以降低数据线的极性对第一感测装置以及第二感测装置造成的影响,藉此提升第一感测装置以及第二感测装置识别指纹的能力。To sum up, since the first system voltage line is located between the first sensing device and the second sensing device and between the first output line and the second output line, and the first reference voltage line and the second reference voltage line Located on both sides of the first photosensitive element and the second photosensitive element, the data line closest to the first output line and the other data line closest to the second output line have the same polarity (for example, in the same time is the same positive or the same negative). For example, one data line overlapping the first output line and another data line overlapping the second output line have the same polarity, therefore, the polarity of the data line can be reduced for the first sensing device and the second The influence caused by the sensing device is improved, thereby enhancing the ability of the first sensing device and the second sensing device to identify fingerprints.
当然,本发明还可有其它多种实施例,在不背离本发明精神及其实质的情况下,熟悉本领域的技术人员当可根据本发明作出各种相应的改变和变形,但这些相应的改变和变形都应属于本发明所附的权利要求的保护范围。Of course, the present invention can also have other various embodiments, without departing from the spirit and essence of the present invention, those skilled in the art can make various corresponding changes and modifications according to the present invention, but these corresponding Changes and deformations should belong to the protection scope of the appended claims of the present invention.
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