CN111146367B - Preparation method of light extraction film with micro-nano composite structure - Google Patents
Preparation method of light extraction film with micro-nano composite structure Download PDFInfo
- Publication number
- CN111146367B CN111146367B CN202010062209.6A CN202010062209A CN111146367B CN 111146367 B CN111146367 B CN 111146367B CN 202010062209 A CN202010062209 A CN 202010062209A CN 111146367 B CN111146367 B CN 111146367B
- Authority
- CN
- China
- Prior art keywords
- micro
- nano composite
- pattern
- pdms
- light extraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002114 nanocomposite Substances 0.000 title claims abstract description 60
- 238000000605 extraction Methods 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- 239000004205 dimethyl polysiloxane Substances 0.000 claims abstract description 64
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims abstract description 64
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims abstract description 64
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims abstract description 50
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims abstract description 50
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 239000002086 nanomaterial Substances 0.000 claims abstract description 9
- 238000007639 printing Methods 0.000 claims abstract description 7
- 238000009832 plasma treatment Methods 0.000 claims abstract description 6
- 229920000642 polymer Polymers 0.000 claims abstract description 4
- 238000001020 plasma etching Methods 0.000 claims description 16
- -1 polydimethylsiloxane Polymers 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 13
- 239000003431 cross linking reagent Substances 0.000 claims description 12
- 239000000178 monomer Substances 0.000 claims description 12
- 239000003292 glue Substances 0.000 claims description 10
- 229920002120 photoresistant polymer Polymers 0.000 claims description 9
- 238000004528 spin coating Methods 0.000 claims description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 230000004048 modification Effects 0.000 claims description 5
- 238000012986 modification Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 4
- 238000000137 annealing Methods 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 230000005484 gravity Effects 0.000 claims description 3
- 238000007641 inkjet printing Methods 0.000 claims description 3
- 238000010329 laser etching Methods 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 238000007650 screen-printing Methods 0.000 claims description 3
- 239000005051 trimethylchlorosilane Substances 0.000 claims description 3
- 239000006260 foam Substances 0.000 claims 1
- 230000010076 replication Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000011521 glass Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000003362 replicative effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000000861 blow drying Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
本发明涉及一种微纳复合结构光提取膜的制备方法，包括步骤：步骤S1：采用软印刷方法制备具有有序微米结构的PDMS模板；步骤S2：将有序微米结构的PDMS模板进行拉伸，并进行等离子处理，在微米结构的PDMS模板上获得不同形状和尺寸的纳米图案，形成具有与所需微纳米复合结构相反的PDMS微纳米复合图案；步骤S3：将PDMS微纳米复合图案转移到所需聚合物上，得到光提取膜。本发明制作效率高，成本低，同时制备的光提取膜在有序微米结构图案嵌套无序纳米结构，可以避免器件衬底与空气界面的光损失，在不改变OLED器件的视角特性的同时，具有较强的光提取效果。
The invention relates to a preparation method of a micro-nano composite structure light extraction film, comprising the steps of: step S1: preparing a PDMS template with an ordered micro-structure by a soft printing method; step S2: stretching the PDMS template with an ordered micro-structure , and plasma treatment was performed to obtain nanopatterns of different shapes and sizes on the microstructured PDMS template to form PDMS micronanocomposite patterns with the opposite of the desired micronanocomposite structure; Step S3: Transfer the PDMS micronanocomposite pattern to the On the desired polymer, a light extraction film is obtained. The invention has high production efficiency and low cost, and at the same time, the prepared light extraction film is embedded with disordered nanostructures in the ordered microstructure pattern, which can avoid light loss at the interface between the device substrate and the air, and does not change the viewing angle characteristics of the OLED device at the same time. , has a strong light extraction effect.
Description
Technical Field
The invention relates to the technical field of photoelectric display, in particular to a preparation method of a light extraction film with a micro-nano composite structure.
Background
Organic Light Emitting Diodes (OLEDs) are widely used in displays of mobile phones and televisions, however, external quantum efficiency of the OLEDs is about 20% due to losses generated by a surface plasmon resonance mode at a metal-organic interface, a waveguide mode in an Indium Tin Oxide (ITO)/organic layer, a substrate mode in a glass substrate, and the like.
Since the refractive index between the ITO/glass interface and the glass/air interface is small, the optical loss in the substrate mode is larger than that in the waveguide mode, and thus, adding a light extraction layer at the glass/air interface can greatly increase the light emitting efficiency of the OLED.
Conventional single periodic microstructure light extraction films tend to alter the spectral characteristics and angular distribution of the device.
Disclosure of Invention
In view of the above, the present invention provides a method for preparing a light extraction film with a micro-nano composite structure, which can avoid light loss at an interface between a device substrate and air, and has a strong light extraction effect without changing a viewing angle characteristic of an OLED device.
The invention is realized by adopting the following scheme: a preparation method of a light extraction film with a micro-nano composite structure comprises a substrate, a periodic microstructure applied on the substrate, and a nano structure applied on the microstructure; the preparation of the light extraction film comprises the following steps:
step S1: preparing a PDMS template with an ordered micron structure by adopting a soft printing method;
step S2: stretching the PDMS template with the ordered microstructure in a single direction or multiple directions simultaneously, carrying out plasma treatment, and obtaining nano patterns with different shapes and sizes on the PDMS template with the microstructure to form PDMS micro-nano composite patterns; the nano-structure pattern is controlled by regulating and controlling the stretching direction, so that the extraction efficiency of light in different directions is controlled;
step S3: transferring the PDMS micro-nano composite pattern to a required polymer to form a micro-nano composite pattern with a structure opposite to that of the required micro-nano composite structure;
step S4: and (4) taking the micro-nano composite pattern which is obtained in the step (S3) and is opposite to the required micro-nano composite structure as a template, and copying the light extraction film with the required micro-nano composite structure once or for multiple times so as to improve the preparation efficiency.
Further, step S1 specifically includes the following steps:
step S11: preparing a micron pattern on a clean substrate, annealing the micron pattern, improving the bonding force between the pattern and the substrate, and forming a micron pattern master mask;
step S12: performing surface modification on the micron pattern master mask by adopting trimethylchlorosilane;
step S13: uniformly mixing polydimethylsiloxane monomers and a cross-linking agent according to a preset proportion by adopting a soft printing method, vacuumizing to remove bubbles, uniformly spin-coating on a micro-pattern mother plate, standing, heating for curing, and stripping to obtain a polydimethylsiloxane micro-structure opposite to the micro-pattern mother plate, namely the PDMS template with the ordered micro-structure.
Further, step S3 specifically includes the following steps:
step S31: placing the PDMS template with the PDMS micro-nano composite pattern obtained in the step S3 in vacuum to remove gas in the polydimethylsiloxane, and forming negative pressure;
step S32: uniformly coating ultraviolet curing glue on the substrate, placing the PDMS template with the negative pressure treated in the step S31 on the ultraviolet curing glue on the side with the pattern, standing for a period of time under the action of the negative pressure and gravity, and stripping the PDMS template after ultraviolet exposure to obtain the UV glue micro-nano composite pattern with the opposite micro-nano composite structure to the required micro-nano composite structure.
Further, in step S4, the replicating the required micro-nano composite structure light extraction film specifically includes the following steps:
step S41: uniformly mixing PDMS monomers and a cross-linking agent according to a preset proportion, and vacuumizing to remove bubbles;
step S42: and (4) uniformly spin-coating the mixture of the PDMS monomer and the cross-linking agent on the micrometer pattern which is obtained in the step S3 and is opposite to the required micro-nano composite structure, standing for a period of time, blowing off surface bubbles with gas, heating and curing, and stripping to obtain the PDMS micro-nano composite structure light extraction film.
Further, in step S11, the micro pattern is prepared by a method including, but not limited to, photoresist melting, laser etching, screen printing, inkjet printing, or a combination thereof, and the micro pattern is periodically one-dimensional or two-dimensional.
Further, in step S13, the ratio of the polydimethylsiloxane monomer to the cross-linking agent is 100:1 to 1: 1.
Further, in step S2, the stretching degree is 0% to 500%.
Further, in step S2, the reactive ion etching power of the plasma treatment is 50-250W, the reactive ion etching time is 40-240S, the reactive ion etching flow rate is 10-60 sccm, the reactive ion etching pressure is 1-10 pa, and the reactive ion etching gas includes, but is not limited to, oxygen, argon or a mixed gas.
Compared with the prior art, the invention has the following beneficial effects:
1. the light extraction film prepared by the method is embedded with the disordered nano structure in the ordered micro structure pattern, can avoid the light loss of the device substrate and the air interface, and has stronger light extraction effect while the visual angle characteristic of the OLED device is not changed.
2. The invention controls the nanostructure pattern by regulating the stretching direction, thereby controlling the extraction efficiency of light in different directions.
3. The invention takes the obtained micro-nano composite pattern with the opposite structure to the required micro-nano composite structure as a template, and can obtain the required light extraction film by adopting a simple copying method subsequently, thereby having high manufacturing efficiency and low cost.
Drawings
FIG. 1 shows a process for forming a photoresist master in accordance with an embodiment of the present invention. Wherein (a) is a photoresist spin coating process, (b) is a photoresist patterning process, and (c) is a photoresist micron-scale patterning process.
Fig. 2 is a process of preparing a PDMS soft mold with a master in an embodiment of the present invention. The method comprises the following steps of (a) a process for filling a photoresist master plate by PDMS spin coating, (b) a process for curing and demolding the PDMS, (c) a process for etching reactive ions after PDMS is prestretched, and (d) a schematic diagram for forming a micro-nano composite structure by the PDMS.
Fig. 3 is a process flow of imprinting and preparing a micro-nano composite structure according to an embodiment of the invention. The method comprises the following steps of (a) carrying out ultraviolet curing glue spin coating, (b) carrying out a process of impressing ultraviolet curing glue to form a micro-nano composite structure, and (c) carrying out ultraviolet curing glue demoulding.
Fig. 4 is a scanning electron microscope image of the micro-nano composite structure in the embodiment of the invention.
In the figure, 1 is a substrate, 2 is photoresist, 3 is PDMS, 4 is reactive ion etching gas, 5 is ultraviolet curing glue, and 6 is a ultraviolet curing lamp.
Detailed Description
The invention is further explained below with reference to the drawings and the embodiments.
It should be noted that the following detailed description is exemplary and is intended to provide further explanation of the disclosure. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.
As shown in fig. 1 to fig. 3, the present embodiment provides a method for preparing a light extraction film with a micro-nano composite structure, where the light extraction film includes a substrate, a periodic microstructure applied on the substrate, and a nanostructure applied on the microstructure; the preparation of the light extraction film comprises the following steps:
step S1: preparing a PDMS template with an ordered micron structure by adopting a soft printing method;
step S11: as shown in fig. 1, the surface of a substrate is ultrasonically cleaned by acetone, ethanol and deionized water, nitrogen is used for blow-drying, a micron pattern is prepared on a clean substrate, 90-degree annealing is carried out on the micron pattern, the bonding force between the pattern and the substrate is improved, and a micron pattern mother plate is formed;
step S12: as shown in (a) and (b) in fig. 2, performing surface modification on the micro pattern master plate by using trimethylchlorosilane;
step S13: and (2) coating PDMS on the mother plate in a spin mode by adopting a soft printing method, uniformly mixing polydimethylsiloxane monomers and a cross-linking agent in a ratio of 10:1, vacuumizing to remove bubbles, uniformly coating the PDMS on the micro-pattern mother plate in a spin mode at 500rpm for 60s, standing for 5min, heating and curing for 2h at 80 ℃, and stripping to obtain a polydimethylsiloxane micro-structure opposite to the micro-pattern mother plate, namely the PDMS template with the ordered micro-structure.
Step S2: as shown in (c) and (d) of fig. 2, the PDMS template with the ordered microstructure is stretched in a single direction or in multiple directions simultaneously, and plasma treatment is performed to obtain nano patterns with different shapes and sizes on the PDMS template with the microstructure, so as to form a PDMS micro-nano composite pattern with a structure opposite to the required micro-nano composite structure; the nano-structure pattern is controlled by regulating and controlling the stretching direction, so that the extraction efficiency of light in different directions is controlled;
step S3: transferring the PDMS micro-nano composite pattern to a required polymer to form a micro-nano composite pattern with a structure opposite to that of the required micro-nano composite structure;
step S4: and (4) taking the micro-nano composite pattern which is obtained in the step (S3) and is opposite to the required micro-nano composite structure as a template, and copying the light extraction film with the required micro-nano composite structure once or for multiple times so as to improve the preparation efficiency.
In this embodiment, step S3 specifically includes the following steps:
step S31: placing the PDMS template with the PDMS micro-nano composite pattern obtained in the step S3 in vacuum to remove gas in the polydimethylsiloxane, and forming negative pressure;
step S32: as shown in fig. 3, spin-coating an ultraviolet curing adhesive on a glass substrate at a rotating speed of 3000rpm for 40s, placing the patterned surface on the ultraviolet curing adhesive, standing for 5-10min under the action of polydimethylsiloxane negative pressure and gravity, exposing under an ultraviolet lamp for 20min, and stripping the polydimethylsiloxane to obtain the UV adhesive micro-nano composite pattern with the opposite micro-nano composite structure.
In step S4, the method for replicating the required micro-nano composite structure light extraction film specifically includes the following steps:
step S41: uniformly mixing PDMS monomers and a cross-linking agent according to a preset proportion, and vacuumizing to remove bubbles;
step S42: and (4) uniformly spin-coating the mixture of the PDMS monomer and the cross-linking agent on the micrometer pattern which is obtained in the step S3 and is opposite to the required micro-nano composite structure, standing for a period of time, blowing off surface bubbles with gas, heating and curing, and stripping to obtain the PDMS micro-nano composite structure light extraction film.
In this embodiment, in step S11, the micro pattern is prepared by a method including, but not limited to, photoresist melting, laser etching, screen printing, inkjet printing, or a combination thereof, and the micro pattern is periodically one-dimensional or two-dimensional.
In this embodiment, in step S13, the ratio of the polydimethylsiloxane monomer to the cross-linking agent is 100:1 to 1: 1.
In the present embodiment, in step S2, the stretching degree is 0% to 500%.
In this embodiment, in step S2, the reactive ion etching power of the plasma processing is 50-250W, the reactive ion etching time is 40-240S, the reactive ion etching flow rate is 10-60 sccm, the reactive ion etching pressure is 1-10 pa, and the reactive ion etching gas includes, but is not limited to, oxygen, argon, or a mixed gas.
Preferably, the light extraction film prepared in this embodiment may be disposed inside the light emitting device or disposed outside the light emitting device by using the refractive index matching fluid. Fig. 4 is a scanning electron microscope image of the micro-nano composite structure light extraction film prepared by the method of the embodiment.
The foregoing is directed to preferred embodiments of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow. However, any simple modification, equivalent change and modification of the above embodiments according to the technical essence of the present invention are within the protection scope of the technical solution of the present invention.
Claims (5)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010062209.6A CN111146367B (en) | 2020-01-20 | 2020-01-20 | Preparation method of light extraction film with micro-nano composite structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010062209.6A CN111146367B (en) | 2020-01-20 | 2020-01-20 | Preparation method of light extraction film with micro-nano composite structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111146367A CN111146367A (en) | 2020-05-12 |
| CN111146367B true CN111146367B (en) | 2021-03-30 |
Family
ID=70526225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010062209.6A Active CN111146367B (en) | 2020-01-20 | 2020-01-20 | Preparation method of light extraction film with micro-nano composite structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111146367B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112768621B (en) * | 2021-01-27 | 2022-03-08 | 福州大学 | Integrated cycle micro-concave mirror composite light extraction structure |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4147247B2 (en) * | 2005-01-21 | 2008-09-10 | 旭化成株式会社 | Method for reducing pitch of fine concavo-convex lattice and fine concavo-convex lattice member obtained thereby |
| CN100514185C (en) * | 2006-04-18 | 2009-07-15 | 清华大学 | Method for making polymer self-supporting nano-micron-line |
| US10144172B2 (en) * | 2016-02-02 | 2018-12-04 | Sourabh Kumar Saha | Method to suppress period doubling during manufacture of micro and nano scale wrinkled structures |
| CN107275439B (en) * | 2017-06-01 | 2018-10-30 | 西南交通大学 | A kind of manufacturing method of " I " type structure PDMS matrixes based on reverse |
-
2020
- 2020-01-20 CN CN202010062209.6A patent/CN111146367B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN111146367A (en) | 2020-05-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW578200B (en) | Patterned structure reproduction using nonsticking mold | |
| CN102910579B (en) | Nanoimprinting method capable of improving depth-to-width ratio of graph and product thereof | |
| CN101414119B (en) | Method for constructing sub-micron or nano-scale templates with micron-scale templates | |
| CN102012633A (en) | Method for making self-supporting structure of nano fluid system based on SU-8 photoresist | |
| CN102508410A (en) | Composite nanometer impressing mold plate with sandwich structure and preparation method of composite nanometer impressing mold plate | |
| CN102060262B (en) | Method for manufacturing micro-nano fluid control system by using low-pressure bonding technology | |
| CN101923279A (en) | Nano-imprint template and preparation method thereof | |
| CN102897709B (en) | Manufacturing method of low-cost micronano integrated structure | |
| KR20110056028A (en) | A method of forming nanopatterns on a substrate using SOG (Spin-on Glass) | |
| CN102250377B (en) | Wide-spectrum wide-angle antireflection polymer nano bionic membrane and preparation method thereof | |
| CN103172019A (en) | Preparation process of dry adhesive micro-nano compound two-stage inclined structure | |
| CN106486209A (en) | A kind of patterning 3D graphene conductive film and its environment-friendly preparation method thereof and application | |
| CN109987580B (en) | Preparation method of nano forest structure and regulation and control method of nano forest structure | |
| KR101291727B1 (en) | Method for manufacturing implint resin and implinting method | |
| CN111146367B (en) | Preparation method of light extraction film with micro-nano composite structure | |
| KR20100074434A (en) | Pattern transfer method of nanoimprint lithography using shadow evaportation and nanotransfer printing | |
| CN111153379A (en) | A method for fabricating size-controlled nanochannels by angular deposition of thin films | |
| Hwang et al. | Fabrication of roll imprint stamp for continuous UV roll imprinting process | |
| Handte et al. | Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi-and trilayer resist systems | |
| CN103631089A (en) | Preparation method of ultraviolet curing nano-imprinting polymer template | |
| CN104690969B (en) | Bionic irregular micro nano composite structure manufacturing process based on 3D ejection printing technique | |
| CN1877453A (en) | Method for making reverse ladder structure by using architecture-complementary micro-patterning technique | |
| CN1562731A (en) | Nano reproducing method based on spin coating | |
| US20050167894A1 (en) | Patterned structure reproduction using nonsticking mold | |
| CN102243436B (en) | Electric-field-induced micro-compounding method under geometrical restraint |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |