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CN104690969B - Bionic irregular micro nano composite structure manufacturing process based on 3D ejection printing technique - Google Patents

Bionic irregular micro nano composite structure manufacturing process based on 3D ejection printing technique Download PDF

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CN104690969B
CN104690969B CN201510070121.8A CN201510070121A CN104690969B CN 104690969 B CN104690969 B CN 104690969B CN 201510070121 A CN201510070121 A CN 201510070121A CN 104690969 B CN104690969 B CN 104690969B
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substrate
resin
manufacturing process
jet printing
nano composite
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CN104690969A (en
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王莉
罗钰
段辉
卢秉恒
李龙
刘伟
刘增增
杨晓楠
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Xian Jiaotong University
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Abstract

本发明公开了一种基于3D喷射打印技术的仿生异型微纳复合结构的制造工艺,其工艺步骤如下:1.母版图形化步骤;2.3D喷射打印步骤;3.准备基底步骤;4.转移压印步骤。本发明可用于实现“壁虎带”的微纳复合结构,并具有高效率、低成本、具备大面积制备潜力等优势。

The invention discloses a manufacturing process of a bionic special-shaped micro-nano composite structure based on 3D jet printing technology. The process steps are as follows: 1. Master plate patterning step; 2. 3D jet printing step; 3. Base preparation step; 4. Transfer Imprint step. The invention can be used to realize the micro-nano composite structure of the "gecko belt", and has the advantages of high efficiency, low cost, large-area preparation potential and the like.

Description

基于3D喷射打印技术的仿生异型微纳复合结构制造工艺Manufacturing process of biomimetic shaped micro-nano composite structure based on 3D jet printing technology

技术领域technical field

本发明涉及3D打印,特别涉及一种基于3D喷射打印技术的仿生异型微纳米复合结构的制作工艺。The invention relates to 3D printing, in particular to a manufacturing process of a bionic special-shaped micro-nano composite structure based on 3D jet printing technology.

背景技术Background technique

壁虎能在光滑的墙壁上行走自如,而且能够倒贴在天花板上。这是因为壁虎脚与相作用的物体表面之间存在着一中特殊的黏附力,但是这种黏附力的作用机理,成为数世纪以来一到难解的谜题。Geckos can walk freely on smooth walls, and can stick upside down to the ceiling. This is because there is a special adhesive force between the gecko's feet and the surface of the interacting object, but the mechanism of this adhesive force has become a difficult mystery for centuries.

Russell和Ruibal通过扫面电镜发现壁虎每只脚底部长着大约50万根细小的刚毛,每根刚毛的尺寸约为30-130μm,刚毛的末端又分叉成数百根更为细小的绒毛。美国科学家Autumn等通过实验研究发现,这种微纳米复合的刚绒毛结构与接触表面分子之间非常小,从而产生了“范德瓦耳斯力”。尽管每根刚毛产生的粘附力是很微弱的,但是几百万根累加起来后却足以支撑壁虎的身体。这种仿生“壁虎带”的潜在用途很多,比如登山者使用的安全装置,守门员使用的高黏性的手套,以及仅依靠“范德瓦耳斯力”就能轻易黏附的医用绷带等等。而在目前的仿生“壁虎带”制作工艺当中,存在着工艺复杂(如需要制作掩膜板、光刻、翻模),高成本(如采用多晶硅、ICP刻蚀),工艺可重复性差,难以大面积制备的问题。Russell and Ruibal discovered through scanning electron microscopy that there are about 500,000 tiny setae growing on the bottom of each foot of the gecko, and the size of each setae is about 30-130 μm. American scientists Autumn et al. have found through experimental research that the micro-nano composite bristle structure and the contact surface molecules are very small, resulting in "Van der Waals force". Although the adhesive force produced by each setae is very weak, the sum of millions of setae is enough to support the gecko's body. The potential uses of this bionic "gecko belt" are many, such as safety devices used by climbers, high-adhesive gloves used by goalkeepers, and medical bandages that can be easily adhered only by "Van der Waals force". However, in the current bionic "gecko belt" manufacturing process, there are complex processes (such as the need to make masks, photolithography, and mold turning), high costs (such as polysilicon, ICP etching), and poor process repeatability. The problem of large area preparation.

因此,有必要提出一种用于可以实现“壁虎带”结构,并具有高效率、低成本、具备大面积制备潜力等优势的微纳复合结构制作工艺。Therefore, it is necessary to propose a micro-nano composite structure manufacturing process that can realize the "gecko belt" structure and has the advantages of high efficiency, low cost, and large-area preparation potential.

发明内容Contents of the invention

鉴于此,本发明提供了一种基于3D喷射打印技术的仿生异型微纳复合结构制造工艺,该工艺包括:In view of this, the present invention provides a bionic special-shaped micro-nano composite structure manufacturing process based on 3D jet printing technology, which includes:

(a)母版图形化步骤,通过光刻及深干法刻蚀工艺在单晶硅母版上制备微结构;(a) master patterning step, preparing microstructures on the single crystal silicon master by photolithography and deep dry etching process;

(b)喷射打印步骤,先对步骤(a)中图形化的基底进行低表面能处理,然后通过喷射打印工艺在基底上沉积树脂微透镜阵列,并进行紫外固化;(b) a jet printing step, first performing a low surface energy treatment on the patterned substrate in step (a), then depositing a resin microlens array on the substrate through a jet printing process, and performing ultraviolet curing;

(c)准备基底步骤,在另外的基底上涂覆紫外固化树脂,选用与步骤(b)中相同的树脂材料;(c) Prepare the substrate step, coat the UV-curable resin on another substrate, select the same resin material as in step (b);

(d)转移压印步骤,将步骤(c)所得的基底与步骤(b)处理后的母版对接并进行转移压印,施加一定压力,进行紫外固化,然后脱模,最终母版上的树脂材料转移至基底上。(d) transfer embossing step, the substrate obtained in step (c) is docked with the master plate treated in step (b) and transferred and imprinted, a certain pressure is applied, ultraviolet curing is carried out, and then the mold is demoulded, and the final master plate The resin material is transferred to the substrate.

上述结合3D喷射打印技术和纳米转移压印技术的制造工艺,具有高效率,低成本的工艺优势,同时具有大面积制备前景。The above-mentioned manufacturing process combining 3D jet printing technology and nano transfer imprinting technology has the advantages of high efficiency and low cost, and has the prospect of large-area preparation.

附图说明Description of drawings

图1a至1d为本发明的一个实施例所示的在母版上制备亚微米级结构的制作流程图,其中:Figures 1a to 1d are a flow chart of preparing submicron structures on a master plate according to an embodiment of the present invention, wherein:

图1a为旋涂电子束胶工艺,图1b为电子束曝光工艺,图1c为深干法刻蚀工艺,图1d去留膜工艺;11为单晶硅母版,12为电子束胶,13为显影后的电子束胶,14为深干法刻蚀后的单晶硅;Figure 1a is the spin-coating electron beam glue process, Figure 1b is the electron beam exposure process, Figure 1c is the deep dry etching process, and Figure 1d is the film removal process; 11 is the single crystal silicon master, 12 is the electron beam glue, 13 14 is the electron beam gel after development, and 14 is the single crystal silicon after deep dry etching;

图2为本发明的一个实施例所示的喷射打印制备微透镜阵列流程图,其中:图2a为低表面能处理工艺,图2b喷射打印工艺;21为图形化硅母版,22为低表面能C4F8层,23为树脂微透镜阵列;Fig. 2 is the jet printing preparation microlens array flow chart shown in an embodiment of the present invention, wherein: Fig. 2 a is the low surface energy treatment process, Fig. 2 b jet printing process; 21 is the patterned silicon master plate, 22 is the low surface Energy C4F8 layer, 23 is a resin microlens array;

图3为本发明的一个实施例所示的转移压印流程图,其中:图3a为紫外固化胶旋图工艺,图3b为转移压印步骤,图3c为脱模步骤;31为石英基底,32为紫外固化树脂,33为压印转移的树脂;Fig. 3 is the flow chart of transfer embossing shown in an embodiment of the present invention, wherein: Fig. 3 a is the UV-curable glue spinning process, Fig. 3 b is the transfer embossing step, Fig. 3 c is the demoulding step; 31 is the quartz substrate, 32 is an ultraviolet curable resin, and 33 is a resin transferred by embossing;

图4为本发明的一个实施例所示的石英基底上转移压印制备微纳复合结构结构的扫描电镜图。Fig. 4 is a scanning electron microscope image of a micro-nano composite structure prepared by transfer imprinting on a quartz substrate according to an embodiment of the present invention.

具体实施方式detailed description

在一个实施例中,本发明公开了一种基于3D喷射打印技术的仿生异型微纳复合结构制造工艺,该工艺包括:In one embodiment, the present invention discloses a biomimetic special-shaped micro-nano composite structure manufacturing process based on 3D jet printing technology, the process includes:

(a)母版图形化步骤,通过光刻及深干法刻蚀工艺在单晶硅母版上制备微结构;(a) master patterning step, preparing microstructures on the single crystal silicon master by photolithography and deep dry etching process;

(b)喷射打印步骤,先对步骤(a)中图形化的基底进行低表面能处理,然后通过喷射打印工艺在基底上沉积树脂微透镜阵列,并进行紫外固化;(b) a jet printing step, first performing a low surface energy treatment on the patterned substrate in step (a), then depositing a resin microlens array on the substrate through a jet printing process, and performing ultraviolet curing;

(c)准备基底步骤,在另外的基底上涂覆紫外固化树脂,选用与步骤(b)中相同的树脂材料;(c) Prepare the substrate step, coat the UV-curable resin on another substrate, select the same resin material as in step (b);

(d)转移压印步骤,将步骤(c)所得的基底与步骤(b)处理后的母版对接并进行转移压印,施加一定压力,进行紫外固化,然后脱模,最终母版上的树脂材料转移至基底上。(d) transfer embossing step, the substrate obtained in step (c) is docked with the master plate treated in step (b) and transferred and imprinted, a certain pressure is applied, ultraviolet curing is carried out, and then the mold is demoulded, and the final master plate The resin material is transferred to the substrate.

对于该实施例而言,采用上述的工艺步骤制备仿生微纳复合结构,可一次性将不同特征尺寸的结构转移至紫外固化胶上,且两级结构为同一材料,具有较强的稳定性和较长的使用寿命;作为母版的基底,可以重复使用,经过表面处理可以轻易的同紫外固化树脂脱模,一致性较好;采用的3D喷射打印技术属于增材制备技术,材料利用率高,大大降低了成本;而采用转移压印,对压印设备的要求较低,即使不施加压印力的情况下,依靠树脂的自然流动也可使基底和母版上的树脂自然粘连,工艺较为简便。更优的,微接触式的转移压印更佳。For this example, the above-mentioned process steps are used to prepare the biomimetic micro-nano composite structure, which can transfer structures with different characteristic sizes to the UV-curable adhesive at one time, and the two-stage structure is the same material, which has strong stability and Long service life; as the base of the master plate, it can be reused, and can be easily released from the UV-cured resin after surface treatment, with good consistency; the 3D jet printing technology used belongs to the additive preparation technology, and the material utilization rate is high , which greatly reduces the cost; while using transfer imprinting, the requirements for imprinting equipment are lower. Even if no imprinting force is applied, the resin on the substrate and the master can be naturally adhered to each other by relying on the natural flow of the resin. Relatively simple. Even better, micro-contact transfer imprinting is even better.

更优的,在另一个实施例中:所述另外的基底可以是刚性基底如石英,硅片,也可以是柔性基底如PET塑料,PDMS等,取决于其应用领域。也就是说,该实施例对于刚性和柔性两类基底均适用。More preferably, in another embodiment: the additional substrate can be a rigid substrate such as quartz, a silicon wafer, or a flexible substrate such as PET plastic, PDMS, etc., depending on its application field. That is, this embodiment is applicable to both rigid and flexible substrates.

更优的,在另一个实施例中:所述微结构特征尺寸为亚微米级,树脂被填充至微结构内部,在母版上形成了最初的微纳复合结构。More preferably, in another embodiment: the characteristic size of the microstructure is submicron, the resin is filled into the microstructure, and an initial micro-nano composite structure is formed on the master.

对于该实施例而言,可一次性使得本领域中的微米级和亚微米级的结构转移至紫外固化胶上,且两级结构为同一材料,具有较强的稳定性和较长的使用寿命;作为母版的具有亚微米级结构的基底,可以重复使用,经过表面处理可以轻易的同紫外固化树脂脱模,一致性较好;采用的3D喷射打印技术也便于实现较高的制备微米级图形的速率;3D喷射打印后母版上的液滴由于表面张力自然形成具有球面形貌的微透镜结构,转移压印后基底上微米级结构为倒球形,可得到异型仿生亚微米级结构。For this embodiment, the micron-scale and sub-micron-scale structures in this field can be transferred to the UV-curable adhesive at one time, and the two-stage structure is the same material, which has strong stability and long service life ;As the master plate, the substrate with sub-micron structure can be reused. After surface treatment, it can be easily released from the UV-cured resin, and the consistency is good; The speed of graphics; after 3D jet printing, the droplets on the master plate naturally form a microlens structure with a spherical shape due to surface tension. After transfer printing, the micron-scale structure on the substrate is inverted spherical, and a special-shaped bionic sub-micron-scale structure can be obtained.

更优的,在另一个实施例中:步骤(b)中,通过调节喷射打印参数,包括但不限于喷印次数,液滴体积,以改变微透镜的直径以及高度,进而改变微纳复合结构的形貌。显然,此实施例给出了通过喷射打印参数改变微纳复合结构的实现方式。More preferably, in another embodiment: in step (b), by adjusting the jet printing parameters, including but not limited to the number of jet printing, droplet volume, to change the diameter and height of the microlens, and then change the micro-nano composite structure shape. Apparently, this embodiment provides a way to change the micro-nano composite structure through jet printing parameters.

更优的,在另一个实施例中:步骤(d)中,利用相似相容的原理,树脂微透镜与旋涂在步骤(C)所得的基底上的树脂接触,经过施加一定压力和固化步骤,两者具有较强的结合力,脱模后母版上的树脂被转移至基底上。就该是实施例而言,其公开了一种如何接触并转移的技术方案。More preferably, in another embodiment: in step (d), utilize similar and compatible principle, resin microlens is in contact with the resin that is spin-coated on the base that step (c) gains, through applying certain pressure and curing step , the two have a strong bonding force, and the resin on the master plate is transferred to the substrate after demoulding. As far as this embodiment is concerned, it discloses a technical solution of how to contact and transfer.

更优的,在另一个实施例中:对于转移至基底上的树脂而言,原本填充于母版微结构内部的树脂的底面一侧在转移压印后成为了基底上树脂的顶端,并具有与母版上结构相反的亚微米级结构;相应的,微透镜的顶端则成为基底上树脂的底端。就该实施例而言,3D喷射打印后母版上的液滴由于表面张力自然形成具有球面形貌的微透镜结构,转移压印后基底上微米级结构为倒球形,可得到异型仿生亚微米级结构,如果进一步结合顶端的亚微米级结构,那么这种复合结构相比直上直下的形貌,显然具有更好的粘附力和更大范围的粘附角度。More preferably, in another embodiment: for the resin transferred to the substrate, the bottom side of the resin originally filled inside the microstructure of the master plate becomes the top of the resin on the substrate after transfer imprinting, and has The submicron-scale structure that is the opposite of the structure on the master; correspondingly, the top of the microlens becomes the bottom of the resin on the substrate. As far as this embodiment is concerned, the liquid droplets on the master plate after 3D jet printing naturally form a microlens structure with a spherical shape due to surface tension, and the micron-scale structure on the substrate after transfer printing is inverted spherical, and special-shaped bionic submicron-scale structures can be obtained. If the structure is further combined with the submicron-scale structure at the top, then this composite structure obviously has better adhesion and a wider range of adhesion angles than the straight-up and straight-down topography.

以下结合附图和其它实施例对本发明作更进一步的详细描述:Below in conjunction with accompanying drawing and other embodiments the present invention is described in further detail:

(1)如附图1a所示,在透明的石英基片11上旋涂一层电子束胶12,并进行前烘,前烘温度为90℃,时间为5min;(1) As shown in accompanying drawing 1a, spin-coat a layer of electron beam glue 12 on the transparent quartz substrate 11, and carry out pre-baking, the pre-baking temperature is 90 ℃, and the time is 5 min;

(2)如附图1b所示,通过电子束曝光工艺图形化电子束胶13,紫外曝光时间为10s,显影液为电子束胶显影液,显影时间为30s,并进行后烘,后烘温度为95℃,时间为10min;(2) As shown in accompanying drawing 1b, patterned electron beam glue 13 by electron beam exposure process, ultraviolet exposure time is 10s, developing solution is electron beam glue developing solution, and developing time is 30s, and post-baking, post-baking temperature at 95°C for 10 minutes;

(3)如附图1c所示,以曝光显影后的光刻胶为掩膜,采用反应离子刻蚀工艺在石英基片上制备微结构,采用的反应气体为C4F8和CF4,通气量分别为45sccm和15sccm。通过改变刻蚀时间和刻蚀功率可以调节石英表面微结构的深宽比;(3) As shown in accompanying drawing 1c, the photoresist after exposure and development is used as a mask, and the microstructure is prepared on the quartz substrate by reactive ion etching technology. and 15 sccm. The aspect ratio of the quartz surface microstructure can be adjusted by changing the etching time and etching power;

(4)如附图1d所示,用适当浓度的NaOH溶液清洗掉残留的电子束胶掩膜;(4) As shown in accompanying drawing 1d, wash away the residual electron beam glue mask with NaOH solution of appropriate concentration;

(5)如附图2a所示,在具有微结构的硅基底21上制备氟硅烷疏水层22,目的是为了降低硅母版的表面能,同时有利于后续的脱模工艺;(5) As shown in Figure 2a, a fluorosilane hydrophobic layer 22 is prepared on a silicon substrate 21 with a microstructure, the purpose of which is to reduce the surface energy of the silicon master and facilitate the subsequent demoulding process;

(6)如附图2b所示,采用喷射打印的方式在具有亚微米级结构且进行表面疏水处理的硅基底上进一步制备树脂微透镜阵列23并进行紫外固化,固化时间为5分钟,微透镜阵列的排列和占空比可以根据需要进行设计;(6) As shown in accompanying drawing 2b, the resin microlens array 23 is further prepared on a silicon substrate with a submicron-scale structure and surface hydrophobic treatment by jet printing and is cured by ultraviolet light. The curing time is 5 minutes, and the microlens The arrangement and duty cycle of the array can be designed according to the needs;

(7)如附图3a所示,在将要进行接触式压印的基底31上旋涂紫外固化树脂32,例如厚度为1微米。该树脂与制备微透镜阵列所用树脂为同一种材料,以保证较好的结合强度。此步骤中树脂32先不进行固化。此步骤中的基底31,可以是刚性基底如石英,硅片,也可以是柔性基底如PET塑料,PDMS,取决于其应用领域。(7) As shown in FIG. 3 a , spin-coat the UV-curable resin 32 on the substrate 31 to be subjected to contact imprinting, for example, with a thickness of 1 micron. The resin is the same material as the resin used to prepare the microlens array, so as to ensure better bonding strength. In this step, the resin 32 is not cured first. The substrate 31 in this step can be a rigid substrate such as quartz or a silicon wafer, or a flexible substrate such as PET plastic or PDMS, depending on its application field.

(8)接着,如附图3b所示,将基底21与图3a中的基底31进行接触压印,施加10N的压印,压印时间为5分钟,压印过程中再对紫外固化树脂32进行紫外固化,时间为5分钟。(8) Next, as shown in accompanying drawing 3b, substrate 21 and substrate 31 in Fig. 3a are subjected to contact embossing, applying 10N embossing, embossing time is 5 minutes, and then UV curable resin 32 is imprinted in embossing process UV curing was carried out for 5 minutes.

(9)如附图3c所示,进行脱模步骤,脱模完成后石英基底21的微透镜阵列以及21上的微结构均转移至基底31上。(9) As shown in FIG. 3 c , a demolding step is performed, and the microlens array on the quartz substrate 21 and the microstructures on the quartz substrate 21 are all transferred to the substrate 31 after the demoulding is completed.

图4则为本发明的一个实施例所示的石英基底上转移压印制备微纳复合结构结构的扫描电镜图。Fig. 4 is a scanning electron micrograph of a micro-nano composite structure prepared by transfer imprinting on a quartz substrate according to an embodiment of the present invention.

以上利用具体个例对本公开的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本公开的技术方案及其核心思想;对于本领域技术人员,依据本公开的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本公开的限制。The principles and implementation methods of the present disclosure have been described above using specific examples. The descriptions of the above embodiments are only used to help understand the technical solutions and core ideas of the present disclosure; for those skilled in the art, according to the ideas of the present disclosure, specific There will be changes in the implementation and scope of application. To sum up, the contents of this specification should not be construed as limiting the present disclosure.

Claims (5)

1.一种基于3D喷射打印技术的仿生异型微纳复合结构的制造工艺,包括如下步骤:1. A manufacturing process of a bionic special-shaped micro-nano composite structure based on 3D jet printing technology, comprising the following steps: (a)母版图形化步骤,通过光刻及深干法刻蚀工艺在单晶硅母版上制备微结构;(a) master patterning step, preparing microstructures on the single crystal silicon master by photolithography and deep dry etching process; (b)喷射打印步骤,先对步骤(a)中图形化的基底进行低表面能处理,然后通过喷射打印工艺在基底上沉积树脂微透镜阵列,并进行紫外固化;(b) a jet printing step, first performing a low surface energy treatment on the patterned substrate in step (a), then depositing a resin microlens array on the substrate through a jet printing process, and performing ultraviolet curing; (c)准备基底步骤,在另外的基底上涂覆紫外固化树脂,选用与步骤(b)中相同的树脂材料;(c) Prepare the substrate step, coat the UV-curable resin on another substrate, select the same resin material as in step (b); (d)转移压印步骤,将步骤(c)所得的基底与步骤(b)处理后的母版对接并进行转移压印,施加一定压力,进行紫外固化,然后脱模,最终母版上的树脂材料转移至基底上。(d) transfer embossing step, the substrate obtained in step (c) is docked with the master plate treated in step (b) and transferred and imprinted, a certain pressure is applied, ultraviolet curing is carried out, and then the mold is demoulded, and the final master plate The resin material is transferred to the substrate. 2.如权利要求1所述的制造工艺,其特征在于:优选的,所述微结构特征尺寸为亚微米级,树脂被填充至微结构内部,在母版上形成了最初的微纳复合结构。2. The manufacturing process according to claim 1, characterized in that: preferably, the characteristic size of the microstructure is sub-micron, the resin is filled into the microstructure, and the initial micro-nano composite structure is formed on the master plate . 3.如权利要求1所述的制造工艺,其特征在于:步骤(b)中,通过调节喷射打印参数,包括但不限于喷印次数,液滴体积,以改变微透镜的直径以及高度,进而改变微纳复合结构的形貌。3. The manufacturing process as claimed in claim 1, characterized in that: in step (b), by adjusting the jet printing parameters, including but not limited to the number of jet printing, droplet volume, to change the diameter and height of the microlens, and then Change the morphology of the micro-nano composite structure. 4.如权利要求2所述的制造工艺,其特征在于:步骤(d)中,利用相似相容的原理,树脂微透镜与旋涂在步骤(C)所得的基底上的树脂接触,经过施加一定压力和固化步骤,两者具有较强的结合力,脱模后母版上的树脂被转移至基底上。4. The manufacturing process as claimed in claim 2, characterized in that: in step (d), using the principle of similar compatibility, the resin microlens is in contact with the resin that is spin-coated on the substrate obtained in step (c), and after applying Certain pressure and curing steps, the two have a strong bonding force, and the resin on the master plate is transferred to the substrate after demoulding. 5.如权利要求4所述的制造工艺,其特征在于:对于转移至基底上的树脂而言,原本填充于母版微结构内部的树脂的底面一侧在转移压印后成为了基底上树脂的顶端,并具有与母版上结构相反的亚微米级结构;相应的,微透镜的顶端则成为基底上树脂的底端。5. The manufacturing process as claimed in claim 4, characterized in that: for the resin transferred to the substrate, the bottom side of the resin originally filled in the microstructure of the master plate becomes the resin on the substrate after transfer imprinting The top of the microlens has a submicron-scale structure opposite to the structure on the master; correspondingly, the top of the microlens becomes the bottom of the resin on the substrate.
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