CN110915307B - Substrate for mounting electronic component and method for manufacturing the same - Google Patents
Substrate for mounting electronic component and method for manufacturing the same Download PDFInfo
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- CN110915307B CN110915307B CN201880032995.6A CN201880032995A CN110915307B CN 110915307 B CN110915307 B CN 110915307B CN 201880032995 A CN201880032995 A CN 201880032995A CN 110915307 B CN110915307 B CN 110915307B
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
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Abstract
本发明的基板,包括:绝缘层(11);以及设置在所述绝缘层(11)上的导体(12)。其中,所述导体(12)的底面以及侧面的至少一部分相比所述绝缘层(11)的正面侧更靠近所述绝缘层(11)的背面一侧。
The substrate of the present invention comprises: an insulating layer (11); and a conductor (12) arranged on the insulating layer (11). Wherein, at least a part of the bottom surface and the side surface of the conductor (12) is closer to the back side of the insulating layer (11) than the front side of the insulating layer (11).
Description
技术领域technical field
本发明涉及一种电子部件搭载用基板及其制造方法。The present invention relates to a substrate for mounting electronic components and a manufacturing method thereof.
背景技术Background technique
近年来,伴随着电子装置高密度化安装的趋势,行业普遍要求也能够在电子部件搭载用基板上实现导体的高密度化、小型化、轻薄化、以及多层化。然而,在将导体进行高密度地安装、或是将其小型化时,一旦绝缘层与形成在绝缘层上的导体之间的密着性得不到充分保证时,也就无法充分确保绝缘层与导体之间的密着性。另外,当绝缘层内具有多层导体时,同样也会导致绝缘层与导体之间的密着性不足。In recent years, along with the trend of high-density mounting of electronic devices, the industry has generally demanded that higher density, smaller, thinner, and multi-layered conductors can also be realized on substrates for mounting electronic components. However, when the conductors are mounted at a high density or miniaturized, once the adhesion between the insulating layer and the conductors formed on the insulating layer is not sufficiently ensured, it is impossible to ensure sufficient contact between the insulating layer and the conductor formed on the insulating layer. Adhesion between conductors. In addition, when there are multiple layers of conductors in the insulating layer, the adhesion between the insulating layer and the conductors will also be insufficient.
专利文献1中提出了一种用于提升绝缘层与导体之间的密着性的技术,具体是在利用半加成法(Semi-additive method)来形成导体时,通过对绝缘层进行加热来提升绝缘层与导体之间的密着性。
【先行技术文献】【Prior technical literature】
【专利文献1】特开2012-169600号公报[Patent Document 1] JP-A-2012-169600
但是,当想要制作厚度较薄的印刷基板、或是利用半加成法使绝缘层的正面与导体之间相互密着时,就无法充分确保绝缘层与导体之间的密着性。另外,当绝缘层较薄时,还会容易出现导体剥离的情况。当绝缘层与导体之间的密着性不足时,原本就无法进行印刷基板的制造,即便制造出了印刷基板,也无法避免成品率低的问题。However, when it is desired to produce a thinner printed circuit board or to make the front surface of the insulating layer and the conductor adhere to each other by the semi-additive method, it is impossible to ensure sufficient adhesion between the insulating layer and the conductor. In addition, when the insulating layer is thin, it is easy to cause the conductor to peel off. When the adhesion between the insulating layer and the conductor is insufficient, the printed circuit board cannot be manufactured originally, and even if the printed circuit board is manufactured, the problem of low yield cannot be avoided.
本发明鉴于上述情况,目的是提供一种能够提升密着性的电子部件搭载用基板。In view of the above circumstances, the present invention aims to provide a substrate for mounting electronic components capable of improving adhesion.
发明内容Contents of the invention
本发明通过将形成于绝缘层上的导体埋入绝缘层中,从而来达成上述发明目的。当绝缘层以及导体的组合层在绝缘层上形成大于等于一层时,将至少一个任意组合层中所包含的导体的至少一部分向着绝缘层的方向进行埋设。The present invention achieves the above object by embedding the conductor formed on the insulating layer into the insulating layer. When the combination layer of the insulating layer and the conductor is formed as one layer or more on the insulating layer, at least a part of the conductor contained in at least one combination layer is buried toward the direction of the insulating layer.
本发明中所记载的电子部件搭载用基板只要是能够搭载电子部件,并且是在绝缘层上形成有导体的基板便可。在本发明中,将在绝缘层上形成有导体的基板称为电子部件搭载用基板。并且,本发明包含:本发明中涉及的电子部件搭载用基板所搭载的电子部件、电子组件、以及安装装置。例如,本发明中涉及的安装装置是:具备本发明中涉及的电子部件搭载用基板、以及使用所述电子部件搭载用基板来实施预定处理的电子部件的任意装置。因此,本发明能够适用于使用电子部件搭载用基板来进行运作的所有电子部件、电子组件、以及装置。The substrate for mounting electronic components described in the present invention may be any substrate as long as it can mount electronic components and has a conductor formed on an insulating layer. In the present invention, a substrate on which a conductor is formed on an insulating layer is referred to as an electronic component mounting substrate. Furthermore, the present invention includes electronic components, electronic modules, and mounting devices mounted on the substrate for mounting electronic components according to the present invention. For example, the mounting device according to the present invention is any device including the substrate for mounting electronic components according to the present invention and an electronic component to which a predetermined process is performed using the substrate for mounting electronic components. Therefore, the present invention can be applied to all electronic components, electronic modules, and devices that operate using the substrate for mounting electronic components.
发明效果Invention effect
根据本发明,由于将导体的至少一部分埋入绝缘层中,因此就能够提升电子部件搭载用基板的密着性,即提升剥离强度。通过这样,本发明就能够在防止制造电子部件搭载用基板时的成品率低下的同时,提升电子部件搭载用基板的耐久性,从而总体提升电子部件搭载用基板的品质。并且,本发明还能够提升使用本发明中的布线基板来进行运作的电子部件、电子组件、以及装置的可靠性。According to the present invention, since at least a part of the conductor is buried in the insulating layer, the adhesiveness of the substrate for mounting electronic components, that is, the peel strength can be improved. In this way, the present invention can improve the durability of the substrate for mounting electronic components while preventing a decrease in yield when manufacturing the substrate for mounting electronic components, thereby improving the quality of the substrate for mounting electronic components as a whole. Furthermore, the present invention can improve the reliability of electronic parts, electronic modules, and devices that operate using the wiring board of the present invention.
附图说明Description of drawings
图1是用于说明在绝缘层上形成导体的导体形成工序说明图。FIG. 1 is an explanatory view for explaining a conductor forming process of forming a conductor on an insulating layer.
图2是用于说明在绝缘层上形成导体的导体形成工序说明图。FIG. 2 is an explanatory diagram for explaining a conductor forming step of forming a conductor on an insulating layer.
图3是用于说明将导体压入或是沉入绝缘层的压入工序说明图。FIG. 3 is an explanatory diagram for explaining a press-fitting process for pressing or sinking a conductor into an insulating layer.
图4是用于说明加热步骤的图。Fig. 4 is a diagram for explaining a heating step.
图5是用于说明加热步骤的图。Fig. 5 is a diagram for explaining a heating step.
图6是用于说明加热步骤的图。Fig. 6 is a diagram for explaining a heating step.
图7是用于说明加热步骤的图。Fig. 7 is a diagram for explaining a heating step.
图8是用于说明加热步骤的图。Fig. 8 is a diagram for explaining a heating step.
图9是加热时的说明示意图。Fig. 9 is an explanatory schematic diagram at the time of heating.
图10是用于说明导体压入工序后的状态图。Fig. 10 is a diagram for explaining the state after the conductor press-fitting step.
图11是用于说明导体压入工序后的状态图。Fig. 11 is a diagram for explaining the state after the conductor pressing step.
图12是用于说明将导体压入或是沉入绝缘层的压入工序说明图。FIG. 12 is an explanatory diagram for explaining a press-fitting process for pressing or sinking a conductor into an insulating layer.
图13是用于说明将导体压入或是沉入绝缘层的压入工序说明图。FIG. 13 is an explanatory diagram for explaining a press-fitting process for pressing or sinking a conductor into an insulating layer.
图14是用于说明导体压入工序后的状态图。Fig. 14 is a diagram for explaining the state after the conductor press-fitting step.
图15是用于说明导体压入工序后的状态图。Fig. 15 is a diagram for explaining the state after the conductor pressing step.
图16是用于说明VIA形成工序的图。FIG. 16 is a diagram for explaining a VIA forming step.
图17是展示第二实施方式中涉及的电子部件搭载用基板的一例截面图。17 is a cross-sectional view showing an example of the electronic component mounting substrate according to the second embodiment.
图18是展示非电解镀敷层与导体之间的边界部分的一例截面图。Fig. 18 is a cross-sectional view showing an example of a boundary portion between an electroless plating layer and a conductor.
图19是展示第一例凹凸的放大图。Fig. 19 is an enlarged view showing unevenness of the first example.
图20是展示第二例凹凸的放大图。Fig. 20 is an enlarged view showing a second example of concavities and convexities.
图21是展示绝缘层正面的凹凸的规律性的一示意图。FIG. 21 is a schematic diagram showing the regularity of irregularities on the front surface of the insulating layer.
图22是第三实施方式中涉及的电子部件搭载用基板的制造方法的说明图。22 is an explanatory diagram of a method of manufacturing the electronic component mounting substrate according to the third embodiment.
图23是展示用于制造具有导体凹部的导体的制造方法的一例截面图。23 is a cross-sectional view showing an example of a manufacturing method for manufacturing a conductor having a conductor recess.
图24是展示用于制造具有导体凸部的导体的制造方法的一例截面图。24 is a cross-sectional view illustrating an example of a manufacturing method for manufacturing a conductor having a conductor protrusion.
具体实施方式Detailed ways
以下,将参照附图来说明本发明中的实施方式。以下说明的实施方式只是本发明的实施例,本发明不受以下的实施方式所限制。此外,对于在本发明以及附图中符号为相同的构成要素,则展示为同一符号。Hereinafter, embodiments in the present invention will be described with reference to the drawings. The embodiments described below are merely examples of the present invention, and the present invention is not limited by the following embodiments. In addition, the same code|symbol is shown about the component with the same code|symbol in this invention and drawing.
(第一实施方式)(first embodiment)
在本实施方式中,将对绝缘体层是作为绝缘层的情况进行说明。本实施方式涉及的电子部件搭载用基板的制造方法依次具备如下所述的导体形成工序以及压入工序。通过这样,本发明就能够提升绝缘层与导体之间的密着性,即,提升剥离强度。In this embodiment mode, the case where the insulator layer is an insulating layer will be described. The method of manufacturing an electronic component mounting substrate according to the present embodiment includes a conductor forming step and a press-fitting step described below in this order. In this way, the present invention can improve the adhesion between the insulating layer and the conductor, that is, improve the peel strength.
图1(a)至图1(c)中展示了本发明中用于在绝缘层上形成导体的导体形成工序。在图1(a)至图1(c)中,11表示绝缘层,12表示导体,121表示金属箔,122表示金属镀敷。另外,图1中的上下方向为基板的厚度方向,图中的上端面为正面,下端面为背面。A conductor forming process for forming a conductor on an insulating layer in the present invention is shown in FIGS. 1( a ) to 1 ( c ). In FIGS. 1( a ) to 1 ( c ), 11 denotes an insulating layer, 12 denotes a conductor, 121 denotes a metal foil, and 122 denotes metal plating. In addition, the up-down direction in FIG. 1 is the thickness direction of a board|substrate, the upper end surface in a drawing is a front surface, and the lower end surface is a back surface.
绝缘层11是能够用于印刷基板的绝缘体。用于绝缘层11的材料可以是例如树脂,也可以是具有绝缘性的玻璃或陶瓷等任意物质。绝缘层11可以混合大于等于两种的绝缘性物质。例如,在绝缘层11中可以包含纤维状或颗粒状的绝缘体。The insulating
绝缘层11也可以是将基材混入树脂后的绝缘体。作为树脂,最好是热固化型树脂、或紫外线固化型树脂。如果是具有一定的耐热性,也可以使用热塑性树脂。作为热固化型树脂,可以示例聚酰亚胺树脂、环氧树脂、酚醛树脂、氰酸酯树脂。热塑性树脂的热变形温度只要大于等于50度即可。变形温度越高越好。作为基材,可以示例玻璃纤维、陶瓷粒子、纤维素纤维,也可以是蜘蛛网纤维等自然物。基材也可以不限于上述材料。此外,也可以在玻璃布上叠层使上述树脂浸透而半固化的半固化片,并在加热·加压后构成绝缘层。这在以下任一实施方式中也都是相同的。The insulating
导体12是通过能够用于印刷基板的导体的任意材料所形成的导体层,包括金属箔、金属镀层、轧制板。构成导体12的金属箔121、金属镀敷122的材料可以是具有导电性的所有金属、合金或糊剂。或者,只要具有导电性,即使是碳或陶瓷等金属以外的所有物质,也能够作为导体12的一部分或全部来使用。作为适用于导体12的金属,可以示例铜、金、银、铝、镍或按照质量%来计算是包含这些金属最多的合金或糊剂,也可以不限于此。这在以下任一实施方式中也都是相同的。The
首先,在绝缘层11(图1(a))上铺设的金属箔121上进行金属镀敷(图1(b))。接着,采用公认的镀板法(Panel plating method)和图形电镀法(Pattern plating method)在绝缘层11上形成图形化后的导体12(图1(c))。通过这样形成的导体12就包含有金属箔以及镀敷在金属箔上的金属镀敷层。First, metal plating is performed on the
图2(a)至图2(d)中展示了本发明中用于在绝缘层上形成导体的另一种导体形成工序。该制造方法被称为半加成法。在图2(a)至图2(d)中,11表示绝缘层,12表示导体, 13表示图形抗蚀剂。Another conductor forming process for forming a conductor on an insulating layer in the present invention is shown in FIGS. 2( a ) to 2 ( d ). This manufacturing method is called a semi-additive method. In FIGS. 2(a) to 2(d), 11 denotes an insulating layer, 12 denotes a conductor, and 13 denotes a pattern resist.
作为图案抗蚀剂13的材料,可以示例感光性干膜、液状抗蚀剂、ED抗蚀剂,也可以不限于此。这在以下的任意实施方式中也相同。这些材料都是光固化型或光溶解型。Examples of the material of the pattern resist 13 include photosensitive dry film, liquid resist, and ED resist, but are not limited thereto. This also applies to any of the following embodiments. These materials are either photocurable or photodissolvable.
接着,在绝缘层11(图2(a))上涂布图形抗蚀剂,并最终去除除作为导体部分以外的图形抗蚀剂(图2(b))。然后,在余下的图形抗蚀剂13以外的部分上通过非电解镀敷使导体生长(图2(c))。接着,去除图形抗蚀剂13,留下导体12。此时,如后述的图17所示,在与绝缘层11相垂直的截面上,导体12的上端面(顶面)的角12E带有圆弧状。在该导体形成工序中,在绝缘层11上形成图形化后的导体12。另外,该导体形成工序并不仅限于上述方法。Next, a pattern resist is applied on the insulating layer 11 (FIG. 2(a)), and finally the pattern resist is removed except for the conductor portion (FIG. 2(b)). Then, a conductor is grown by electroless plating on the remaining portion other than the pattern resist 13 (FIG. 2(c)). Next, the pattern resist 13 is removed, leaving the
图3(a)至图3(b)中展示了将本发明中的导体压入至绝缘层的压入工序。在图3(a)至图3(b)中,11表示绝缘层,12表示导体。一旦将形成在绝缘层11正面的导体12(图3(a))机械地向绝缘层11的方向机械压入,那么导体12的一部分就会埋于绝缘层11的正面(图3(b))。图3(b)是本发明中的电子部件搭载用基板的示例。机械压入的运作是例如使用具有平面为冲压面的冲压机,将形成在绝缘层11正面的导体12的整体、或一部分压入至绝缘层11。FIG. 3( a ) to FIG. 3( b ) show the pressing-in process of pressing the conductor in the present invention into the insulating layer. In FIGS. 3( a ) to 3 ( b ), 11 denotes an insulating layer, and 12 denotes a conductor. Once the conductor 12 (Fig. 3(a)) formed on the front side of the insulating
通过将导体12压入绝缘层11,那么不仅是导体12的底面,导体12的侧面的至少一部分也会与绝缘层11密着,从而提升绝缘层11与导体12之间的剥离强度。By pressing the
实现导体12被埋入于绝缘层11的电子部件搭载用基板的方法不限定于导体12机械地埋向绝缘层11。例如,在压入工序中,可以对导体12与绝缘层11双方或任意一方进行加热,并将导体12沉入绝缘层11中。通过这样,就能够在不对导体12进行加力的情况下,将导体12 埋入绝缘层11。The method of realizing the electronic component mounting substrate in which the
这时,虽然可以无需将导体12压入至绝缘层11,但是也可以使用较弱的力将导体12压入至绝缘层11。通过这样,就能够容易地控制作为导体12的顶面的上端面的位置。如上所述,本发明中的压入也包含了以微弱的力进行的压入。下面,作为压入工序的一例,将对在压入工序中除了机械性地将导体12压入绝缘层11中步骤之外,还包括对导体12或绝缘层11双方或其中的一方进行加热的加热步骤的例子进行说明。At this time, although it is not necessary to press the
在压入工序中,当将导体12机械地压入至绝缘层11时,可以对导体12与绝缘层11双方或任意一方进行加热。这在绝缘层过硬或想将剥离强度进一步提升的情况下很有效。加热通过按压加热器、或照射LED光与红外线、或热吹风来实现。也可以使用由加热器加热后的面板对导体12进行机械地压入。In the press-fitting step, when the
图4、图5、图6、图7、图8展示了加热步骤。在图4、图5、图6、图7、图8中,11表示绝缘层,12表示导体。在图4、图5、图6、图7、图8中,(a)、(b)、(c)表示顺序。作为热量的加热步骤,可以是首先进行加热(图4(b)),并一边加热一边机械地压入(图4(c)) 的步骤。也可以是首先进行加热(图5(b)),并在中止加热后进行机械地压入(图5(c)) 的步骤。还可以是将加热与机械地压入同时进行(图6(b))的步骤。还可以是首先进行机械地压入(图7(b)),并一边机械地压入一边加热(图7(c))的步骤。还可以是首先进行机械地压入(图8(b)),在中止机械地压入后进行加热(图8(c))的步骤。Figure 4, Figure 5, Figure 6, Figure 7, Figure 8 show the heating steps. In FIG. 4 , FIG. 5 , FIG. 6 , FIG. 7 , and FIG. 8 , 11 denotes an insulating layer, and 12 denotes a conductor. In FIG. 4, FIG. 5, FIG. 6, FIG. 7, and FIG. 8, (a), (b), and (c) show the order. As the heat heating step, heating may be performed first ( FIG. 4( b )), followed by mechanically pressing ( FIG. 4( c )) while heating. It may be a step of heating first (FIG. 5(b)), and then mechanically pressing (FIG. 5(c)) after the heating is stopped. A step of simultaneously performing heating and mechanical pressing ( FIG. 6( b )) may also be used. It may also be a step of performing mechanical pressing first ( FIG. 7( b )), and heating while mechanically pressing ( FIG. 7( c )). It is also possible to perform mechanical pressing first ( FIG. 8( b )), and then heat ( FIG. 8( c )) after the mechanical pressing is stopped.
图9(a)展示了加热时的示意图。由于导体12是金属,绝缘层11是树脂,所以导体12的膨胀率大于绝缘层11。因此,通过以适度的温度来进行加热,导体12会与绝缘层11密着,从而就能够得到锚固效果。之后,即使是进行除热(图9(b)),导体12与绝缘层11的密着度也会比加热之前有所提升。所以,就会提升绝缘层11与导体12之间的剥离强度。Figure 9(a) shows the schematic diagram during heating. Since the
在压入工序中,用图10(a)、图10(b)、图11(a)、图11(b)、图11(c)说明导体在压入后的状态。图10(a)、图10(b)、图11(a)、图11(b)、图11(c)是本发明中的电子部件搭载用基板的示例。在图10(a)、图10(b)、图11(a)、图11(b)、图11(c)中,11 表示绝缘层,12表示导体。在这些说明中,如图10(a)所示,将导体12上的位于绝缘层11 (未图示)的一侧(靠近绝缘层11的一侧)的面称为底面,将相对于底面的一侧(远离绝缘层11的一侧)的面称为上端面(顶面),将被上端面与底面夹持的一侧称为侧面,绝缘层11 上载有导体12一侧的面称为正面,其相反一侧的面称为背面。In the press-fit process, the state of the conductor after press-fit will be described with reference to FIGS. 10(a), 10(b), 11(a), 11(b), and 11(c). 10( a ), FIG. 10( b ), FIG. 11( a ), FIG. 11( b ), and FIG. 11( c ) are examples of electronic component mounting substrates in the present invention. In FIG. 10( a ), FIG. 10( b ), FIG. 11( a ), FIG. 11( b ), and FIG. 11( c ), 11 denotes an insulating layer, and 12 denotes a conductor. In these descriptions, as shown in FIG. 10( a), the surface on the side of the insulating layer 11 (not shown) (the side close to the insulating layer 11 ) on the
可以压入导体12,直至导体12的底面以及侧面的一部分处于比绝缘层11的正面更低的位置上(图10(a))。由于导体12的整个底面以及侧面的一部分与绝缘层11密着,因此就提升了绝缘层11与导体12之间的剥离强度。此外,也可以压入导体12,直至导体12的上端面与绝缘层11的正面是处于同一面上(图10(b))。由于导体12的整个底面以及整个侧面与绝缘层 11密着,因此就更为提升了绝缘层11与导体12之间的剥离强度。The
此外,在图10(a)中,虽然示例了配置在底面两侧的侧面被共同埋入绝缘层11,但是本发明不受此限定,也可以是例如将配置在底面两侧的仅仅一个侧面埋入绝缘层11。虽然在图10(a)中导体12的上端面是在x轴方向上扩展,但是本发明不受此限定,导体12的上端面也可以是向x轴方向倾斜。In addition, in FIG. 10( a ), although it is illustrated that the side faces arranged on both sides of the bottom surface are commonly buried in the insulating
并且,在图10(a)以及图10(b)中,虽然示例了导体12的截面形状为四角形,但是本发明所涉及的导体12的截面形状可以是任意形状。例如,导体12的上端面可以弯曲,并且侧面与上端面之间的边界也可以构成连续的曲线。10( a ) and FIG. 10( b ) illustrate that the cross-sectional shape of the
不仅是导体12的底面、侧面,也可以压入导体12直至其上端面成为比绝缘层11的正面更低的位置(图11(a)、图11(b)、图11(c))。在图11(a)中,虽然压入导体12直至其上端面成为比绝缘层11的正面更低的位置,但是导体12的上端面是露出的。由于导体12的整个底面以及整个侧面与绝缘层11密着,因此就更为提升了绝缘层11与导体12之间的剥离强度。在图11(b)中,虽然压入导体12直至其上端面成为比绝缘层11的正面更低的位置,但是导体12的上端面的一部分是露出的。由于导体12的整个底面、整个侧面以及上端面的一部分与绝缘层11密着,因此就进一步提升了绝缘层11与导体12之间的剥离强度。在图11(c)中,压入导体12,直至导体12的上端面成为比绝缘层11的正面更低的位置,从而直至将导体12 的上端面埋入绝缘层11。由于导体12的整个底面、整个侧面以及整个上端面与绝缘层11密着,因此就更为提升了绝缘层11与导体12之间的剥离强度。Not only the bottom surface and side surfaces of the
此外,在图10(a)、图10(b)以及图11(a)中,导体12的三个面与绝缘层11密着。当在y-z平面也具有相同构造的情况下,导体12的五个面与绝缘层11密着。因此,除了在x 轴方向上扩展的导体12的底面以外,由于在y轴方向上扩展的导体12的一部分或整个侧面也与绝缘层11密着,因此,相对于施加在导体12上的x、z轴方向的负载,就能够提升剥离强度。In addition, in FIG. 10( a ), FIG. 10( b ), and FIG. 11( a ), three surfaces of the
在图11(b)以及图11(c)中导体12的四个面与绝缘层11密着。当在y-z平面也具有相同构造的情况下,导体12的六个面与绝缘层11密着。因此,除了在x轴方向上扩展的导体12的底面以外,由于在y轴方向上扩展的导体12的一部分或整个侧面以及在x轴方向上扩展的导体12的一部分或整个上端面也与绝缘层11密着,因此,相对于施加在导体12上的x、y、z轴方向的负载,就能够提升剥离强度。In FIG. 11( b ) and FIG. 11( c ), the four surfaces of the
在图10以及图11中,虽然示例了导体12的底面与绝缘层11密着,但是本发明不受此限定。例如,在图10(a)、图10(b)、图11(a)中,本发明也包含导体12的一部分或整个底面露出于绝缘层11的背面,导体12的两个面与绝缘层11密着的形态。当在y-z平面也具有相同构造的情况下,导体12的四个面与绝缘层11密着。这时,由于在y轴方向上扩展的导体12的一部分或整个侧面与绝缘层11密着,因此,相对于施加在导体12上的x、z轴方向的负载,就能够提升剥离强度。In FIG. 10 and FIG. 11 , although the bottom surface of the
此外,在图11(b)中,也包含导体12的整个底面露出于绝缘层11的背面,导体12的三个面与绝缘层11密着的形态。当在y-z平面也具有相同构造的情况下,导体12的五个面与绝缘层11密着。这时,由于在x轴方向上扩展的导体12的一部分的上端面、在y轴方向上扩展的导体12的一部分或整个侧面与绝缘层11密着,因此,相对于施加在导体12上的x、y、z轴方向的负载,就能够提升剥离强度。In addition, in FIG. 11( b ), the entire bottom surface of the
在图11(b)中,也包含导体12的一部分的底面露出于绝缘层11的背面,导体12的四个面与绝缘层11密着的形态。当在y-z平面也具有相同构造的情况下,导体12的六个面与绝缘层11密着。这时,由于在x轴方向上扩展的导体12的一部分的上端面、在y轴方向上扩展的导体12的整个侧面、在x轴方向上扩展的导体12的一部分的底面与绝缘层11密着,因此,相对于施加在导体12上的x、y、z轴方向的负载,就能够提升剥离强度。In FIG. 11( b ), a part of the bottom surface of the
接下来,将对电子部件搭载用基板作为绝缘层以及导体的组合层是形成在绝缘层上的多层基板为例来进行说明的。下述示例中的绝缘层被包含在至少为一层的组合层中,并且至少为一层的组合层中包含的导体的至少一部分被埋设在绝缘层中。具体来说,下述将要进行说明的电子部件搭载用基板包括:绝缘层;形成在所述绝缘层上的导体;以及位于所述导体以及所述绝缘体基板上的至少一组的绝缘层与形成在所述绝缘层上的导体的组合,其中,所述导体中的至少一个导体被埋设在所述绝缘层或绝缘层中。Next, an electronic component mounting substrate will be described as an example of a multilayer substrate in which a combination layer of an insulating layer and a conductor is formed on the insulating layer. The insulating layer in the example described below is contained in at least one built-up layer, and at least a part of the conductor contained in the at least one built-up layer is buried in the insulating layer. Specifically, the substrate for mounting electronic components to be described below includes: an insulating layer; a conductor formed on the insulating layer; and at least one set of insulating layers and layers formed on the conductor and the insulating substrate. A combination of conductors on said insulating layer, wherein at least one of said conductors is buried in said insulating layer or in said insulating layer.
在图12(a)、图12(b)、图12(c)、图13(a)、图13(b)、图13(c)中,11a表示叠层绝缘层,12表示导体,14表示叠层绝缘层。在图12以及图13中,作为叠层绝缘层14与导体 12的组合例,展示的是:叠层绝缘层14-1以及导体12-1的组合层、叠层绝缘层14-2以及导体 12-2的组合层、以及叠层绝缘层14-3及导体12-3的组合层。叠层绝缘层11a、14构成了绝缘层。In Fig. 12(a), Fig. 12(b), Fig. 12(c), Fig. 13(a), Fig. 13(b), and Fig. 13(c), 11a represents a laminated insulating layer, 12 represents a conductor, and 14 Indicates stacked insulating layers. In FIG. 12 and FIG. 13, as a combination example of the laminated insulating
在导体形成工序或第二导体形成工序中,在叠层绝缘层11a或各叠层绝缘层14形成导体(图12(a)、图12(b)、图12(c)、图13(a)、图13(b)、图13(c))。为了在组合层上形成导体,将导体12形成在叠层绝缘层11a上(导体形成工序)。进一步地,在导体12以及叠层绝缘层11a的上层形成叠层绝缘层14,然后再在叠层绝缘层14上进一步形成导体(第二导体形成工序),并将该第二导体形成工序根据所需的次数来反复进行。In the conductor forming step or the second conductor forming step, a conductor is formed on the laminated insulating
叠层绝缘层14的材料可以与能够适用于叠层绝缘层11a中的材料相同。这在以下任一实施方式中同样如此。The material of the laminated insulating
在将导体12压入或使其沉入位于最上层的叠层绝缘层14的压入工序中,是在形成最上层的叠层绝缘层14后(图12(b)),将最上层的导体12压入或使其沉入叠层绝缘层14中(图 12(c))。In the press-in process of pressing or sinking the
在将导体12压入或使其沉入叠层绝缘层14的压入工序,或是在将导体12压入或使其沉入位于中间层的叠层绝缘层14的压入工序中,在叠层绝缘层11a上形成导体12后,或是在形成叠层绝缘层14后再形成导体12后,将导体12机械性地压入叠层绝缘层11a或叠层绝缘层14 中(图13(a))。在最后的第二导体形成工序中,在最上层的叠层绝缘层14上形成导体12(图 13(b)),在压入工序中,将最上层的导体12机械性地压入或使其沉入最上层的叠层绝缘层 14中(图13(c))。In the pressing process of pressing or sinking the
可以将图1(a)至图1(c)中所示工序,或是图2(a)至图2(d)中所示的工序适用于导体形成工序或第二导体形成工序从而来形成导体12。1(a) to FIG. 1(c), or the process shown in FIG. 2(a) to FIG. 2(d) can be applied to the conductor forming process or the second conductor forming process to form
在压入工序中,在将导体12压入或使其沉入至叠层绝缘层11a或叠层绝缘层14时,可以对叠层绝缘层11a、叠层绝缘层14、以及导体12中的至少任意一方进行加热。加热能够通过按压加热器、或照射红外线、或热吹风来实现。也可以使用由加热器加热后的面板将导体12 机械地压入。加热步骤能够与图4、图5、图6、图7、图8中所图示的步骤相同。In the press-in process, when the
在本发明中的电子部件搭载用基板中,叠层绝缘层11a与叠层绝缘层14有时被一体化。或者当多个叠层绝缘层14相互邻接时被一体化。In the electronic component mounting substrate in the present invention, the multilayer insulating
在压入工序中,将导体12压入叠层绝缘层14后的状态与图10(a)、图10(b)、图11(a)、图11(b)、图11(c)相同。In the press-fitting process, the state after pressing the
图14(a)、图14(b)、图15(a)、图15(b)、图15(c)展示了导体12压入叠层绝缘层14后的状态。图14(a)、图14(b)、图15(a)、图15(b)、图15(c)是本发明中的电子部件搭载用基板的示例。在图14(a)、图14(b)、图15(a)、图15(b)、图15(c)中,12 表示导体,14表示叠层绝缘层。在这些说明中,如图14(a)所示,将导体12上的靠近叠层绝缘层11a的一侧(靠近叠层绝缘层11a的一侧)的面称为底面,将相对于底面的一侧(远离叠层绝缘层11a的一侧)的面称为上端面,将被上端面与底面夹持的一侧的面称为侧面,在叠层绝缘层14处,将远离叠层绝缘层11a的一侧的面称为上端面。14( a ), FIG. 14( b ), FIG. 15( a ), FIG. 15( b ), and FIG. 15( c ) show the state after the
可以压入导体12,直至导体12的底面以及侧面的一部分成为比叠层绝缘层14的上端面更低的位置(图14(a))。由于导体12的整个底面以及侧面的一部分与叠层绝缘层14密着,因此就提升了叠层绝缘层14与导体12之间的剥离强度。此外,也可以压入导体12直至其上端面与叠层绝缘层14的上端面是成为同一面的位置(图14(b))。由于导体12的整个底面以及整个侧面与叠层绝缘层14密着,因此就更为提升了叠层绝缘层14与导体12之间的剥离强度。The
不仅是导体12的底面、侧面,也可以压入导体12直至其上端面成为比叠层绝缘层14的上端面更低的位置(图15(a)、图15(b)、图15(c))。在图15(a)中,虽然压入导体12 直至其上端面成为比叠层绝缘层14的上端面更低的位置,但是导体12的上端面是露出的。由于导体12的整个底面以及整个侧面与叠层绝缘层14密着,因此就进一步提升了叠层绝缘层14与导体12之间的剥离强度。在图15(b)中,虽然压入导体12,直至导体12的上端面成为比叠层绝缘层14的上端面更低的位置,但是导体12的上端面的一部分是露出的。由于导体12 的整个底面、整个侧面以及上端面的一部分与叠层绝缘层14密着,因此就更为提升了叠层绝缘层14与导体12之间的剥离强度。在图11(c)中,压入导体12,直至导体12的上端面成为比叠层绝缘层14的上端面更低的位置,从而埋入于叠层绝缘层14直至导体12的上端面。由于导体12的整个底面、整个侧面以及整个上端面与叠层绝缘层14密着,因此就进一步更为提升了叠层绝缘层14与导体12之间的剥离强度。Not only the bottom surface and the side surface of the
通过将最上层的导体12压入或沉入叠层绝缘层14,在作为最终产品的电子部件搭载用基板中,就能够提升叠层绝缘层14与导体12之间的剥离强度。通过将最上层导体以外的导体压入或沉入叠层绝缘层11a或叠层绝缘层14中,在电子部件搭载用基板的制造过程中,就能够提升叠层绝缘层11a或叠层绝缘层14与导体12之间的剥离强度,从而就能够防止制造过程中的导体剥落。By pressing or sinking the
在导体形成工序或第二导体形成工序中具有压入工序。在该压入工序中,也可以包含形成作为导体部的一部分的VIA的VIA形成工序,所述VIA将形成在组合层上的导体12中的不同层上形成的导体12互相电连接。在VIA形成工序之后,将导体12压入或使其沉入叠层绝缘层14中。A press-fitting step is included in the conductor forming step or the second conductor forming step. This press-fitting step may include a VIA forming step of forming a VIA that electrically connects
下面对作为导体部的一部分的VIA进行说明,该VIA将由叠层绝缘层14形成在组合层上的导体12中的不同层上形成的导体12互相电连接。在图16(a)、图16(b)、图16(c)、图16(d)中展示了VIA形成工序。在图16(a)、图16(b)、图16(c)、图16(d)中,11a表示叠层绝缘层,12表示导体,14表示绝缘层,15表示VIA。Next, the VIA, which is a part of the conductor part, and electrically connects the
在导体形成工序或第二导体形成工序中,将导体12、叠层绝缘层14、导体12依次形成在叠层绝缘层11a上(图16(a)、图16(b))。将形成在不同层上的导体12通过VIA15来进行电连接(图16(c))。在此之后,如果将导体12机械地压入或沉入叠层绝缘层14,VIA15就会被压缩,从而就会提高锚固效果,并且提升叠层绝缘层14与导体12之间的剥离强度。这里虽然对将叠层绝缘层11a上的导体12与叠层绝缘层14上的导体12互相电连接的VIA进行了说明,但是这对于将叠层绝缘层14上的导体12与叠层绝缘层14上的导体12相关进行电连接的VIA15也是相同的。对于将最上层的导体12与其下层的导体12相互电连接的VIA也同样如此。In the conductor forming step or the second conductor forming step, the
在上述中,虽然是在VIA形成工序后将导体12机械地压入叠层绝缘层11a和叠层绝缘层 14,但是也可以是在先将导体12机械地压入叠层绝缘层11a和叠层绝缘层14之后再形成 VIA15。In the above, although the
在上述各实施方式中,虽然是在展示叠层绝缘层的单侧的情况下进行说明的,但是本说明并不仅适用于单面基板,在两面基板或多层基板的情况下,本发明中的技术也能够适用于叠层绝缘层两侧中的每一侧。在两面基板或多层基板的情况下,本实施方式中所说的上层或上端面也可以将远离叠层绝缘层一侧的层或面认为是上层或上端面。In each of the above-mentioned embodiments, although one side of the laminated insulating layer is shown and described, this description is not only applicable to a single-sided substrate. In the case of a double-sided substrate or a multilayer substrate, the present invention The technique of can also be applied to each of the two sides of the laminated insulating layer. In the case of a double-sided substrate or a multilayer substrate, the upper layer or upper end surface in this embodiment can also be regarded as the upper layer or upper end surface on the side farther from the stacked insulating layer.
在多层基板的情况下,也可以将叠层绝缘层上的导体、距离叠层绝缘层最远的最外层的导体、以及叠层绝缘层与最外层之间的任意的层中的任意导体压入或沉入叠层绝缘层中。例如,也包含了压入或沉入最外层的导体,并且叠层绝缘层与最外层之间的中间层的导体也被压入或沉入、或者压入或沉入叠层绝缘层与最外层之间的中间层的导体的任意一种形态。In the case of a multilayer substrate, the conductor on the laminated insulating layer, the conductor of the outermost layer farthest from the laminated insulating layer, and any layer between the laminated insulating layer and the outermost layer may be Arbitrary conductors pressed or sunk into laminated insulation. For example, conductors pressed or sunk into the outermost layer are also included, and conductors of intermediate layers between the laminated insulation layer and the outermost layer are also pressed into or sunk, or pressed or sunk into the laminated insulation layer Any form of conductor in the intermediate layer between the outermost layer and the outermost layer.
在两面基板或多层基板的情况下,当压入或沉入两侧的导体时,也可以从两侧同时向导体施加压力,从而将其压入。In the case of double-sided substrates or multi-layer substrates, when pressing or sinking the conductors on both sides, it is also possible to apply pressure to the conductors simultaneously from both sides to press them in.
此外,在制作较薄的印刷基板时,存在容易损伤铜箔,而不得不使用带载体铜箔的现状,该现状也存在着这些问题:第一是带载体铜箔的价格高、第二是次品率高、第三是对于制造工序的管理度的高要求。根据本发明,即使是在不使用带载体铜箔的情况下,也能够制造出基板厚度为较薄的一层印刷基板或多层印刷基板。并且,在本发明的技术中也能够使用通过制造VIA所产生的增层法(Build-up process)、或通过制造贯穿孔所产生的通孔法。In addition, in the production of thinner printed circuit boards, the copper foil is easily damaged, and the current situation of using copper foil with a carrier has to be used. This situation also has these problems: the first is the high price of the copper foil with a carrier, and the second is that The defective rate is high, and the third is the high requirement for the management degree of the manufacturing process. According to the present invention, even without using a copper foil with a carrier, it is possible to manufacture a one-layer printed circuit board or a multilayer printed circuit board having a relatively thin substrate thickness. In addition, the technology of the present invention can also use a build-up process by manufacturing a VIA or a via method by manufacturing a through-hole.
(第二实施方式)(second embodiment)
在第一实施方式中,可以在绝缘层11上的与导体12相接触的正面设置具有高密着性的密着层(未图示)。该密着层是一层在绝缘层11与导体12之间发挥高密着性的任意的绝缘性物质。此情况下,本发明涉及的电子部件搭载用基板的制造方法进一步包括密着层形成工序。In the first embodiment, an adhesive layer (not shown) having high adhesion may be provided on the surface of the insulating
在密着层形成工序中,在绝缘层11上形成密着层。在导体形成工序中,在密着层的上端面形成导体12。密着层形成在绝缘层11上的配置导体12区域的至少一部分上。密着层的理想情况是形成在配置导体12的整个区域上,也可以形成在整个绝缘层11上。In the adhesive layer forming step, an adhesive layer is formed on the insulating
密着层是与导体12之间的密着性更高于绝缘层11的具有绝缘性的任意物质。密着层被配置在绝缘层11与导体12之间的至少一部分上。密着层如果配置在绝缘层11与导体12之间的至少一部分上,就能够提升绝缘层11与导体12之间的密着强度,密着层也可以配置在绝缘层 11与导体12之间的整个区域上。密着层包含提升绝缘层11与导体12之间的密着强度的物质。提升密着强度的物质可以是使用化学相互作用、物理互相作用、以及机械结合中的任意一种。作为机械结合,例如能够示例在后述的第三实施方式中说明的凹凸。The adhesive layer is any material having insulating properties that is more adhesive to the
作为通过化学相互作用来提升密着强度的物质,在密着层的一部分或整体上,可以包含作为粘接剂来使用的物质等。例如,作为一部分或全部由绝缘性物质所构成的密着层的树脂材料,除了聚酰亚胺树脂、环氧树脂、酚醛树脂、氰酸酯树脂等以外,还可以是无机材料等相对于导体12与绝缘层11双方是高密着性的任何物质。也可以包含一部分或全部的金属氧化物、金属氮化物、金属碳化物、氧化剂以及还原剂等无机类物质。As a substance that enhances the adhesion strength by chemical interaction, a substance used as an adhesive may be contained in a part or the whole of the adhesion layer. For example, as the resin material of the adhesive layer composed of a part or all of an insulating material, in addition to polyimide resin, epoxy resin, phenolic resin, cyanate resin, etc., inorganic materials may be used for the
作为通过物理互相作用来提升密着强度的物质,在密着层的一部分或整体上,可以包含具有还原作用的还原剂以及具有氧化作用的氧化剂中的至少任意一个。还原剂具有将导体 12、绝缘层11以及密着层中的至少任意一方中所含有的物质进行还原的作用。氧化剂具有将导体12、绝缘层11以及密着层中的至少任意一方中所含有的物质进行氧化的作用。还原剂以及氧化剂不仅可以与导体12、绝缘层11以及密着层进行反应,还可以与空气或水等周边环境以及其他催化剂等单独或相互的组合进行反应。At least either one of a reducing agent having a reducing effect and an oxidizing agent having an oxidizing effect may be contained in a part or the entirety of the adhesive layer as a substance that increases the adhesive strength through physical interaction. The reducing agent has the function of reducing substances contained in at least one of the
还原剂可以被包含在密着层的整体中,也可以仅被包含在密着层的导体12侧的正面,还可以仅被包含在绝缘层11侧的正面。这对于氧化剂也一样。例如,可以在密着层的导体12 侧的正面包含还原剂,在密着层的绝缘层11侧的正面包含氧化剂。密着层所包含的还原剂的比例是任意的,只要是具有还原的性质也可以是微量的。这对于氧化剂也一样。The reducing agent may be contained in the entire adhesive layer, may be contained only in the front surface of the adhesive layer on the
密着层的绝缘层11侧的正面所包含的还原剂可以与密着层的导体12侧的正面所包含的还原剂不同,也可以相同。作为不同例,例如可以采用这样的构成:在密着层的导体12 侧包含适于导体12还原的还原剂,在密着层的绝缘层11侧包含适于绝缘层11的还原剂。作为相同例,例如只要在绝缘层11与导体12之间包含作为还原剂功能的物质,则就具备本发明中涉及的密着层。这对于氧化剂也一样。The reducing agent contained in the surface of the adhesive layer on the insulating
在图12~图13中的多层基板示例中,能够在组合层上设置密着层。例如,在绝缘层11 与绝缘层上形成的导体12之间、以及用于构成组合层的绝缘层14-1与导体12-1之间设置密着层(未图示)。还可以在用于构成组合层的绝缘层14-1上形成的导体12-1与导体12-1上形成的绝缘层14-2之间设置密着层(未图示)。此情况下,可以形成密着层与导体12-2的组合层来代替绝缘层14-2与导体12-2的组合层。In the example of the multilayer substrate shown in FIGS. 12 to 13 , an adhesive layer can be provided on the buildup layer. For example, an adhesive layer (not shown) is provided between the insulating
本实施方式涉及的电子部件搭载用基板的制造方法可以在导体形成工序之后,进一步包括在第一实施方式中已经说明过的压入工序。通过这样,就能够进一步提升剥离强度。The method of manufacturing an electronic component mounting substrate according to this embodiment may further include the press-fitting step described in the first embodiment after the conductor forming step. By doing so, it is possible to further increase the peel strength.
(第三实施方式)(third embodiment)
图17展示了本发明中的实施方式涉及的电子部件搭载用基板的一例。本实施方式涉及的电子部件搭载用基板是在绝缘层11上形成有导体12。在导体12的绝缘层11侧的最下层包含非电解镀敷层21。例如,导体12从绝缘层11侧的最下层依次叠层有非电解镀敷层21以及电解镀敷层22。这样,由于绝缘层11与非电解镀敷层21相接,因此就能够提升绝缘层11以及导体12 的密着强度。FIG. 17 shows an example of a substrate for mounting electronic components according to an embodiment of the present invention. In the electronic component mounting substrate according to the present embodiment, the
非电解镀敷层21是以非电解镀的任意方法所形成的任意导体。在图17中,虽然示例了在非电解镀敷层21上叠层有电解镀敷层22,但是也可以是未配置电解镀敷层22,并且导体12 的整体是由非电解镀敷层21所形成的方式。The
图18展示了绝缘层11以及导体12的边界部分的放大图。图18(b)展示了绝缘层11的正面11U的截面形状,图18(a)展示了A-A’截面形状。绝缘层11在导体12侧的正面11U上具有凹凸。凹凸可以是凹部或凸部,也可能是这两者。FIG. 18 shows an enlarged view of the insulating
在本发明中,在绝缘层11的正面11U上形成凹凸,并在其上形成非电解镀敷层21。因此,如图19所示,非电解镀敷层21从配置在绝缘层11侧的导体12下部生长,并与绝缘层11的正面 11U直接相接。这里,既可以形成有符号112-6以及112-9所示的凸部,也可以不形成有符号112-6以及112-9所示的凸部。In the present invention, unevenness is formed on the
当在导体12上形成凸形以获得锚固效果时,在密着层的正面与非电解镀敷层21之间,含有用于形成凸形的Ni或Fe等颗粒状物质。另一方面,本发明由于在密着层的正面形成凹凸,因此不含有用于在导体12形成凸形的颗粒状物质。所以,导体12的最下层中的与非电解镀敷层21不同的物质的含有量在30%以下。例如,本发明中的导体12的最下层的非电解镀敷层21可以由单一的物质形成。这里的【单一的物质】包含金属以及合金。此外,在本发明中的从导体12侧朝向密着层侧的导体凸部中,如图18的沟道133所示,未在密着层内形成导通部。即,非电解镀敷层21仅形成在密着层的正面一侧。When forming a convex shape on the
在使用形成在导体12的凸形来形成锚固时,导体12从其自身的位置朝着密着层的中心方向生长。因此,导体12从配置其自身的密着层的正面1附近朝着密着层的中心方向变细。与此相对,本发明由于在密着层的正面形成凹凸,因此不仅是导体12从密着层的正面附近朝着绝缘层11的中心方向变细的形状,还有如图18的凹部111-1、111-3、111-6 所示的从密着层的正面附近朝着绝缘层11的中心方向扩展的形状。When the anchor is formed using the convex shape formed on the
如图20所示,图18的凹部111-8以及111-9也可以从绝缘层11的正面11U附近朝着绝缘层11的中心方向倾斜地形成。这时,凹部111-8与凹部111-9之间的距离最好被设置为越向绝缘层11的深处,凹部111-8与凹部111-9之间的距离就越比绝缘层11的正面11U附近的距离小。通过这样,就能够通过凹部111-8与凹部111-9 来扣住绝缘层11,从而更为提升导体12与绝缘层11之间的剥离强度。As shown in FIG. 20 , recesses 111 - 8 and 111 - 9 in FIG. 18 may be formed obliquely from the vicinity of
另外,由于本发明在绝缘层11的正面11U形成凹凸,因此在绝缘层11的正面11U配置凹凸就具有因凹凸形成方法所产生的规律性。In addition, since the present invention forms the unevenness on the
当使用形成于平面上或辊上的凹凸形来形成凹凸时,平面或辊的凹凸形会直接出现在正面11U上。例如,当凹凸形包含一定宽度或一定间隔的直线时,会留有图18所示的符号11 1-8,111-9以及图21(a)所示般的具有一定宽度或一定间隔的凹部或凸部。当是在切削正面11U从而形成凹凸时,如图21(b)以及图21(c)所示,会在切削方向上留有线状的痕迹。When the unevenness formed on a flat surface or on a roller is used to form the unevenness, the unevenness of the flat surface or the roller appears directly on the
当使用发泡性的药品来形成凹凸时,如图18所示的符号111-1~111-7以及图21(d)所示,会留有圆形泡沫的痕迹。凹部111-1~111-7的内径可以是恒定的,也可以是不同的。此外,如凹部111-1所示,也有在凹部111-1内形成有凸部11 2-1的双重圆形。该凸部112-1也可以被形成在凹部111-2~111-7。此外,凹凸所包含的圆形不仅可以形成在凹部,也可以形成在凸部。此外,在图18(a)以及图18 (b)所示的凹凸的截面形状不限于上述形状,也包含在形成凹凸时所形成的任意形状。例如,能够示例楔形、钩形、梯形、钟摆、具有双峰的梯形等。When the unevenness is formed using a foaming chemical, traces of circular foam are left as shown in symbols 111 - 1 to 111 - 7 shown in FIG. 18 and FIG. 21( d ). The inner diameters of the recesses 111-1 to 111-7 may be constant or different. In addition, as shown in the recessed part 111-1, there is also a double circle in which the convex part 112-1 is formed in the recessed part 111-1. The convex portion 112-1 may also be formed in the concave portions 111-2 to 111-7. In addition, the circular shape included in the unevenness may be formed not only in the concave portion but also in the convex portion. In addition, the cross-sectional shape of the concavo-convex shown in FIG. 18( a ) and FIG. 18( b ) is not limited to the above-mentioned shape, and any shape formed when forming the concavo-convex is also included. For example, a wedge shape, a hook shape, a trapezoid shape, a pendulum shape, a trapezoid shape with double peaks, and the like can be exemplified.
即便在狭窄的范围内无法发现凹凸的规律性,但如果包含到较广的范围则能够发现其规律性。特别是由于电子部件搭载用基板是被分离为芯片并被搭载在电子部件等上,因此根据凹凸的形成方法,凹凸的规律性有时在一个芯片内不会展现出来。在这种情况下,在大于等于两个的任意数量的芯片上才就会开始展现出凹凸形成物质的痕迹。Even if the regularity of unevenness cannot be found in a narrow range, it can be found if it is included in a wide range. In particular, since the substrate for mounting electronic components is separated into chips and mounted on electronic components, etc., the regularity of the unevenness may not appear in one chip depending on the method of forming the unevenness. In this case, traces of the bump-forming substance will only start to show on any number of chips greater than or equal to two.
下面将参照图22来说明本发明涉及的电子部件搭载用基板的制造方法。本实施方式涉及的电子部件搭载用基板的制造方法在导体形成工序之前具有凹凸形成工序。Next, a method of manufacturing an electronic component mounting substrate according to the present invention will be described with reference to FIG. 22 . The manufacturing method of the board|substrate for mounting electronic components which concerns on this embodiment has an uneven|corrugated forming process before a conductor forming process.
在凹凸形成工序中,先准备绝缘层11(图22(a)),再在绝缘层11的正面11U形成凹凸(图 22(b))。在正面11U中的可以形成导体12的布线图案的整个区域上进行凹凸的形成。当在整个正面11U上形成凹凸时,在绝缘层11上存在导体12的正面11U一侧上的未配置有导体12的区域上,也同样形成有图18所示的凹凸。In the concave-convex forming step, the insulating
可以使用任意方法来形成凹凸,例如能够示例:将形成于平面上或辊上的凹凸形转印到正面11U、或是将具有凹凸形的绝缘片埋入正面11U等的物理形成、通过刷子等对正面11U进行切削等的机械形成、使用药品对正面11U进行溶解或溶胀等的化学形成,也可以将这些形成方法进行组合。此外,绝缘层11的正面11U的凹凸形状在配置导体12的区域与未配置导体 12的区域之间可以是不同的。Any method can be used to form the unevenness, for example, physical formation such as transferring an unevenness formed on a plane or a roller to the
导体形成工序虽然如前述第一实施方式中说明过的一样,但是本实施方式在具备非电解镀敷层21这点上却有所不同。其为形成非电解镀敷层21(图22(c)),形成电解镀敷层22(图 22(d)),并去除非电解镀敷层21(图22(e))。非电解镀敷层21的形成除了化学镀之外,还能够示例液状或糊状的导体涂布。在正面11U中的可以形成导体12的布线图案的整个区域进行非电解镀敷层21的形成。电解镀敷层22形成为布线图案的形状。去除非电解镀敷层21是在留下电解镀敷层22的同时,去除形成在布线图案以外的区域的非电解镀敷层21。这时,导体 12的角(图17所示的符号12E)会变圆。在本发明中,由于使导体12从绝缘层11侧生长,因此在与绝缘层11垂直的截面中,在与导体12的绝缘层11侧的面相向的上端面的角带有圆弧。The conductor forming process is the same as that described in the first embodiment, but the present embodiment is different in that the
此外,绝缘层11的正面11U中的形成凹凸的区域、以及形成非电解镀敷层21的区域也可以仅是正面11U中的形成导体12的布线图案的区域。In addition, the region where the unevenness is formed on the
也可以不形成电解镀敷层22,而是将非电解镀敷层21直接形成为布线图案的形状。这时,导体12的整体是由非电解镀敷层121所构成。Instead of forming the
在本实施方式中,虽然示例了单面基板来作为本发明涉及的电子部件搭载用基板的一例,但是本发明不受此限定。例如,本发明涉及的电子部件搭载用基板也可以是双面基板。这时,本实施方式中说明的绝缘层11以及导体12的构造可以被形成为仅是单面的,也可以被形成为是双面的。此外,本发明涉及的电子部件搭载用基板也可以是多层基板。这时,本实施方式中说明的绝缘层11以及导体12的构造只要包含在多层基板中的至少一层即可。In the present embodiment, a single-sided substrate was exemplified as an example of the electronic component mounting substrate according to the present invention, but the present invention is not limited thereto. For example, the electronic component mounting substrate according to the present invention may be a double-sided substrate. At this time, the structure of the insulating
如上所述,本实施方式的导体12在绝缘层11侧的最下层包含非电解镀敷层21,并且绝缘层11与非电解镀敷层121相接。因此,本实施方式能够提供一种剥离强度较强的电子部件搭载用基板。As described above, the
另外,虽然本实施方式是作为适用于第一实施方式的适用例进行了说明,但本实施方式也可以适用于第二实施方式。此情况下,可以在与导体12相接的正面形成凹凸,也可以在与绝缘层11相接的密着层的正面、或是与密着层相接的绝缘层11的正面11U上形成凹凸。In addition, although the present embodiment has been described as an application example applied to the first embodiment, the present embodiment can also be applied to the second embodiment. In this case, unevenness may be formed on the front surface in contact with
(第四实施方式)(fourth embodiment)
接下来,对第四实施方式进行说明。在本实施方式中,导体12的侧面具有导体凹部(凹部)200。Next, a fourth embodiment will be described. In this embodiment, the side surface of the
该导体凹部200可以通过采用含有颗粒状物质250的抗蚀剂来形成。以下就具体例进行说明。The
首先,采用含有颗粒状物质250的抗蚀剂来形成抗蚀层290(参照图23(a))。First, a resist
之后,利用蚀刻等方法将抗蚀层290上用于设置导体12的部位去除(参照图23(b))。此时,要对蚀刻剂进行选择从而使其不会将颗粒状物质250也一并去除。而抗蚀层29中含有的颗粒状物质250则会随抗蚀层290一同被去除。Thereafter, the portion on the resist
然后,在使颗粒状物质250从抗蚀层290上设置的开口295的侧面露出的状态下进行非电解镀敷或电解镀敷,从而形成导体12。这样一来,就能够形成具有导体凹部200的导体12 (参照图23(c))。Then, electroless plating or electrolytic plating is performed with the
然后,利用蚀刻将抗蚀层290以及颗粒状物质250去除。此时,抗蚀层290中所含有的颗粒状物质250会随抗蚀层290一同被去除(参照图23(d))。Then, the resist
接着,在将具有导体凹部200的导体12压入半硬化状态的绝缘层11中(参照图23(e)) 后,使绝缘层11硬化。Next, after pressing the
通过实施上述工序,就能够使绝缘层11的一部分位于导体12的导体凹部200内,从而提升导体12与绝缘层11之间的密着力。By implementing the above steps, a part of the insulating
(第五实施方式)(fifth embodiment)
接下来,对第五实施方式进行说明。在本实施方式中,导体12的侧面具有导体凸部(凸部)210。另外,导体12的侧面也可以同时搭配有导体凸部210和导体凹部200。Next, a fifth embodiment will be described. In this embodiment, the side surface of the
该导体凸部210可以通过采用含有颗粒状物质250的抗蚀剂来形成。以下就具体例进行说明。The
首先,采用含有颗粒状物质250的抗蚀剂来形成抗蚀层290(参照图24(a))。First, a resist
之后,利用蚀刻等方法将抗蚀层290上用于设置导体12的部位去除(参照图24(b))。此时,要对蚀刻剂进行选择从而使其不会将颗粒状物质250也一并去除。而抗蚀层29中含有的颗粒状物质250则会随抗蚀层290一同被去除。Thereafter, the portion where the
然后,进行非电解镀敷或电解镀敷,从而形成导体12(参照图24(c))。这样一来,就能够形成具有导体凸部210的导体12。Then, electroless plating or electrolytic plating is performed to form conductor 12 (see FIG. 24( c )). In this way, the
然后,利用蚀刻将抗蚀层290以及颗粒状物质250去除(参照图24(d))。此时,抗蚀层290中所含有的颗粒状物质250会随抗蚀层290一同被去除。Then, the resist
接着,在将具有导体凸部210的导体12压入半硬化状态的绝缘层11中(参照图24(e)) 后,使绝缘层11硬化。Next, after pressing the
通过实施上述工序,就能够使导体凸部210位于绝缘层11内,并从而提升导体12与绝缘层11之间的密着力。By implementing the above steps, the
(第六实施方式)(sixth embodiment)
在本实施方式中,针对本发明涉及的电子部件搭载用基板的适用例来进行说明。本实施方式涉及的电子部件具备本发明涉及的电子部件搭载用基板,并且使用本发明涉及的电子部件搭载用基板来实施预定处理。处理是利用电子部件进行的任意处理。In this embodiment, the application example of the board|substrate for mounting electronic components which concerns on this invention is demonstrated. The electronic component according to the present embodiment includes the electronic component mounting substrate according to the present invention, and a predetermined process is performed using the electronic component mounting substrate according to the present invention. Processing is any processing performed using electronic components.
在本实施方式涉及的电子组件中,本说明涉及的电子部件被用于所搭载的电子部件中的至少一个中。在本实施方式涉及的安装装置中,本发明涉及的电子部件或电子组件被用于所搭载的电子部件以及电子组件中的至少一个。In the electronic component according to the present embodiment, the electronic component according to the present description is used for at least one of the mounted electronic components. In the mounting device according to this embodiment, the electronic component or the electronic module according to the present invention is used for at least one of the mounted electronic component and electronic module.
本发明能够适用于具备电子部件搭载用基板的所有装置中。如果例举能够适用本说明的一例装置,则能够示例例如:汽车、家电产品、通信设备、控制设备、传感器、机器人、无人机、飞机、宇宙飞船、船、生产器械、工程器械、试验器械、测量器械、计算机相关产品、数字设备、游戏设备以及钟表等。The present invention can be applied to any device including a substrate for mounting electronic components. If an example of a device to which this description is applicable is given, for example, automobiles, home appliances, communication equipment, control equipment, sensors, robots, unmanned aerial vehicles, airplanes, spaceships, ships, production equipment, construction equipment, and test equipment can be exemplified. , measuring instruments, computer-related products, digital equipment, game equipment, and clocks.
在装置中,搭载有对应装置的任意功能。在实施该功能时所使用的电子芯片等的电子组件中,使用本说明涉及的电子部件搭载用基板。由于本发明涉及的电子部件搭载用基板能够提升剥离强度,因此就能够提升电子部件、电子组件以及装置的可靠性。Any function corresponding to the device is mounted on the device. The substrate for mounting electronic components according to the present description is used in an electronic component such as an electronic chip used to implement this function. Since the electronic component mounting substrate according to the present invention can improve the peel strength, the reliability of electronic components, electronic modules, and devices can be improved.
【产业上的利用可能性】【Industrial Utilization Possibility】
本发明的电子部件搭载用基板及其制造方法能够安装在各种电子装置中,或者适用于电子装置的制造。The electronic component mounting substrate and its manufacturing method of the present invention can be mounted in various electronic devices, or can be applied to the manufacture of electronic devices.
符号说明Symbol Description
11 绝缘层11 insulation layer
12 导体12 conductors
121 金属箔121 metal foil
122 金属镀敷122 metal plating
13 图形抗蚀剂13 Pattern Resist
14 绝缘层14 insulation layer
15 VIA15 VIA
11U 正面11U Front
111-1~111-9 凹部111-1~111-9 concave part
112-1、112-6、112-9 凸部112-1, 112-6, 112-9 convex part
113 沟道113 channels
21 非电解镀敷层21 Electroless plating layer
22 电解镀敷层22 electrolytic plating layer
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PCT/JP2018/017502 WO2018211991A1 (en) | 2017-05-19 | 2018-05-02 | Board for mounting electronic component, and manufacturing method therefor |
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09148733A (en) * | 1995-11-28 | 1997-06-06 | Shin Etsu Polymer Co Ltd | Laminate for printed wiring board |
JP2003209343A (en) * | 2002-01-16 | 2003-07-25 | Airex Inc | Printed circuit board |
JP2003273509A (en) * | 2002-03-14 | 2003-09-26 | Fujitsu Ltd | Wiring board and method of manufacturing the same |
CN1744799A (en) * | 2004-09-01 | 2006-03-08 | 日东电工株式会社 | Wire-laying circuit substrate |
CN101155481A (en) * | 2006-09-29 | 2008-04-02 | 新日铁化学株式会社 | Method for manufacturing flexible substrate |
JP2008103559A (en) * | 2006-10-19 | 2008-05-01 | Japan Gore Tex Inc | Electronic circuit board manufacturing method |
JP2011014644A (en) * | 2009-06-30 | 2011-01-20 | Kyocer Slc Technologies Corp | Wiring board and manufacturing method thereof |
JP5662551B1 (en) * | 2013-12-20 | 2015-01-28 | 新光電気工業株式会社 | WIRING BOARD, SEMICONDUCTOR DEVICE, AND WIRING BOARD MANUFACTURING METHOD |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10107435A (en) * | 1996-09-27 | 1998-04-24 | Ibiden Co Ltd | Printed wiring board and manufacturing method thereof and plate resist composition |
JP5069449B2 (en) * | 2006-11-14 | 2012-11-07 | 新光電気工業株式会社 | Wiring board and manufacturing method thereof |
CN103340023A (en) | 2011-01-26 | 2013-10-02 | 住友电木株式会社 | Method for producing printed wiring board |
-
2018
- 2018-05-02 KR KR1020197037396A patent/KR102631808B1/en active Active
- 2018-05-02 JP JP2019519175A patent/JP7048593B2/en active Active
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Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09148733A (en) * | 1995-11-28 | 1997-06-06 | Shin Etsu Polymer Co Ltd | Laminate for printed wiring board |
JP2003209343A (en) * | 2002-01-16 | 2003-07-25 | Airex Inc | Printed circuit board |
JP2003273509A (en) * | 2002-03-14 | 2003-09-26 | Fujitsu Ltd | Wiring board and method of manufacturing the same |
CN1744799A (en) * | 2004-09-01 | 2006-03-08 | 日东电工株式会社 | Wire-laying circuit substrate |
CN101155481A (en) * | 2006-09-29 | 2008-04-02 | 新日铁化学株式会社 | Method for manufacturing flexible substrate |
JP2008103559A (en) * | 2006-10-19 | 2008-05-01 | Japan Gore Tex Inc | Electronic circuit board manufacturing method |
JP2011014644A (en) * | 2009-06-30 | 2011-01-20 | Kyocer Slc Technologies Corp | Wiring board and manufacturing method thereof |
JP5662551B1 (en) * | 2013-12-20 | 2015-01-28 | 新光電気工業株式会社 | WIRING BOARD, SEMICONDUCTOR DEVICE, AND WIRING BOARD MANUFACTURING METHOD |
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KR102631808B1 (en) | 2024-01-31 |
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WO2018211991A1 (en) | 2018-11-22 |
KR20200010363A (en) | 2020-01-30 |
JPWO2018211991A1 (en) | 2020-04-09 |
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