CN109604251B - 一种清洗装置及清洗方法 - Google Patents
一种清洗装置及清洗方法 Download PDFInfo
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- CN109604251B CN109604251B CN201811634866.2A CN201811634866A CN109604251B CN 109604251 B CN109604251 B CN 109604251B CN 201811634866 A CN201811634866 A CN 201811634866A CN 109604251 B CN109604251 B CN 109604251B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
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Claims (7)
Priority Applications (1)
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CN201811634866.2A CN109604251B (zh) | 2018-12-29 | 2018-12-29 | 一种清洗装置及清洗方法 |
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CN201811634866.2A CN109604251B (zh) | 2018-12-29 | 2018-12-29 | 一种清洗装置及清洗方法 |
Publications (2)
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CN109604251A CN109604251A (zh) | 2019-04-12 |
CN109604251B true CN109604251B (zh) | 2022-04-05 |
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CN201811634866.2A Active CN109604251B (zh) | 2018-12-29 | 2018-12-29 | 一种清洗装置及清洗方法 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110252727A (zh) * | 2019-06-26 | 2019-09-20 | 西安奕斯伟硅片技术有限公司 | 一种晶棒清洗装置 |
CN110788066B (zh) * | 2019-07-30 | 2021-10-19 | 华南农业大学 | 一种二自由度便携式洗根机 |
CN110773505B (zh) * | 2019-10-31 | 2022-06-28 | 西安奕斯伟材料科技有限公司 | 一种硅片清洗装置及方法 |
CN111906076B (zh) * | 2020-08-19 | 2021-07-16 | 邵阳宝兴化工设备有限公司 | 一种多功能水泵配件清洗装置 |
CN112452993B (zh) * | 2020-10-30 | 2021-09-28 | 上海先予工业自动化设备有限公司 | 一种用于大型齿轮箱体的全自动上下料清洗装置 |
CN113787049A (zh) * | 2021-09-15 | 2021-12-14 | 新阳硅密(上海)半导体技术有限公司 | 一种用于单片湿处理制程的槽式工艺方法 |
CN114260248A (zh) * | 2021-12-13 | 2022-04-01 | 无锡子索生化科技有限公司 | 一种半导体器件清洗装置 |
Citations (10)
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JPH0458686B2 (zh) * | 1984-04-19 | 1992-09-18 | Shaapu Kk | |
US5427622A (en) * | 1993-02-12 | 1995-06-27 | International Business Machines Corporation | Method for uniform cleaning of wafers using megasonic energy |
JP2005046687A (ja) * | 2003-07-31 | 2005-02-24 | Pentel Corp | ガラス基板洗浄装置 |
CN103861838A (zh) * | 2012-12-18 | 2014-06-18 | 黄兴来 | 摆杆吊架轴承散件清洗机 |
CN103878138A (zh) * | 2014-03-25 | 2014-06-25 | 福建浔兴拉链科技股份有限公司 | 一种拉链头清洗机 |
CN105414101A (zh) * | 2015-12-12 | 2016-03-23 | 重庆旭鹏生态农业开发有限公司 | 玉米清洗装置 |
CN206104448U (zh) * | 2016-08-19 | 2017-04-19 | 郑州博奥医学检验所有限公司 | 一种生物芯片自动清洗装置 |
CN107526247A (zh) * | 2017-08-31 | 2017-12-29 | 京东方科技集团股份有限公司 | 一种掩膜板的夹具、掩膜板清洗系统及清洗掩膜板的方法 |
CN108356023A (zh) * | 2017-07-10 | 2018-08-03 | 信丰县弘业电子有限公司 | 一种贴片电感超声波清洗机 |
CN108405453A (zh) * | 2018-04-04 | 2018-08-17 | 玉环震浪超声有限公司 | 一种清洗装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG63810A1 (en) * | 1997-02-21 | 1999-03-30 | Canon Kk | Wafer processing apparatus wafer processing method and semiconductor substrate fabrication method |
JP4277182B2 (ja) * | 2003-06-30 | 2009-06-10 | オリエンタル工業株式会社 | シリコンウェハー用洗浄装置 |
CN203875062U (zh) * | 2014-04-22 | 2014-10-15 | 苏州金牛精密机械有限公司 | 硅片清洗用移动装置 |
CN206179833U (zh) * | 2016-10-28 | 2017-05-17 | 北京南轩兴达电子科技有限公司 | 自动硅片清洗机 |
CN108262303B (zh) * | 2016-12-30 | 2024-02-02 | 中核建中核燃料元件有限公司 | 一种投料容器超声波自动清洗装置 |
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2018
- 2018-12-29 CN CN201811634866.2A patent/CN109604251B/zh active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0458686B2 (zh) * | 1984-04-19 | 1992-09-18 | Shaapu Kk | |
US5427622A (en) * | 1993-02-12 | 1995-06-27 | International Business Machines Corporation | Method for uniform cleaning of wafers using megasonic energy |
JP2005046687A (ja) * | 2003-07-31 | 2005-02-24 | Pentel Corp | ガラス基板洗浄装置 |
CN103861838A (zh) * | 2012-12-18 | 2014-06-18 | 黄兴来 | 摆杆吊架轴承散件清洗机 |
CN103878138A (zh) * | 2014-03-25 | 2014-06-25 | 福建浔兴拉链科技股份有限公司 | 一种拉链头清洗机 |
CN105414101A (zh) * | 2015-12-12 | 2016-03-23 | 重庆旭鹏生态农业开发有限公司 | 玉米清洗装置 |
CN206104448U (zh) * | 2016-08-19 | 2017-04-19 | 郑州博奥医学检验所有限公司 | 一种生物芯片自动清洗装置 |
CN108356023A (zh) * | 2017-07-10 | 2018-08-03 | 信丰县弘业电子有限公司 | 一种贴片电感超声波清洗机 |
CN107526247A (zh) * | 2017-08-31 | 2017-12-29 | 京东方科技集团股份有限公司 | 一种掩膜板的夹具、掩膜板清洗系统及清洗掩膜板的方法 |
CN108405453A (zh) * | 2018-04-04 | 2018-08-17 | 玉环震浪超声有限公司 | 一种清洗装置 |
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Effective date of registration: 20211011 Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Applicant after: Xi'an yisiwei Material Technology Co.,Ltd. Applicant after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: 710065 room 1323, block a, city gate, No. 1, Jinye Road, high tech Zone, Xi'an, Shaanxi Province Applicant before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
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Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee after: Xi'an Yisiwei Material Technology Co.,Ltd. Patentee after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee before: Xi'an yisiwei Material Technology Co.,Ltd. Patentee before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
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