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CN106842733B - 显示面板及其阵列基板 - Google Patents

显示面板及其阵列基板 Download PDF

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CN106842733B
CN106842733B CN201710076488.XA CN201710076488A CN106842733B CN 106842733 B CN106842733 B CN 106842733B CN 201710076488 A CN201710076488 A CN 201710076488A CN 106842733 B CN106842733 B CN 106842733B
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array
metal layer
wiring
array substrate
driving circuit
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CN106842733A (zh
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赵阳
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to PCT/CN2017/080397 priority patent/WO2018145359A1/zh
Priority to US15/520,383 priority patent/US10367011B2/en
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
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    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • G02F1/13454Drivers integrated on the active matrix substrate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441Interconnections, e.g. scanning lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441Interconnections, e.g. scanning lines
    • H10D86/443Interconnections, e.g. scanning lines adapted for preventing breakage, peeling or short circuiting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • HELECTRICITY
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136286Wiring, e.g. gate line, drain line
    • G02F1/13629Multilayer wirings

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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

本发明提供一种显示面板及其阵列基板,该阵列基板包括显示区和外围布线区,其中,显示区包括子像素电极、与子像素电极对应设置的扫描线以及与子像素电极对应设置的数据线;外围布线区设置有与扫描线对应设置的栅极驱动电路和与数据线对应设置的数据驱动线,栅极驱动电路和数据驱动线均电连接至驱动芯片的覆晶薄膜封装区,栅极驱动电路电连接至覆晶薄膜封装区的阵列布线设置在不同金属层,从而提高阵列基板的静电防护能力。本发明提供的阵列基板由于设有设置在不同金属层的阵列布线,延长了阵列布线的长度,提高阵列布线的的阻抗,从而减少输入栅极驱动电路的电流,减少栅极驱动电路炸伤的几率,从而提高阵列基板的静电防护能力。

Description

显示面板及其阵列基板
技术领域
本发明涉及显示技术领域,具体是指一种显示面板及其阵列基板。
背景技术
液晶显示器(Liquid Crystal Display,LCD)具有机身薄、省电、无辐射、寿命长等众多优点,得到了广泛的应用。如:液晶电视、智能手机、数字相机、计算机屏幕或笔记本电脑屏幕等等,在平板显示领域中占主导地位。
通常的液晶屏,栅极电路驱动芯片(Gate Driver)设置在玻璃基板的外部,为了简化显示面板的设计,栅极电路驱动芯片放在玻璃基板内部,称为Gate On Array(简称GOA)设计。一般情况下,GOA设计中,通过阵列布线(Wire On Array,简称WOA)将左右侧的GOA与上侧或者下侧的驱动芯片电连接,通常采用单层金属走线,单层金属走线对于高度致密与复杂的GOA电路来说,容易导致进入GOA电路的电流过大,使GOA电路之间的跨线或者尖端部容易炸伤,从而导致断路和短路。
发明内容
本发明提供一种显示面板及其阵列基板,以解决现有技术中GOA设计采用WOA单层金属走线,容易导致进入GOA电路的电流过大,使GOA电路之间的跨线或者尖端部容易炸伤,导致断路和短路的技术问题。
为解决上述技术问题,本发明采用的一个技术方案是:提供一种阵列基板,所述阵列基板包括显示区和外围布线区,其中,
所述显示区包括多个以矩阵方式排列的子像素电极、与每一行所述子像素电极对应设置的扫描线以及与每一列所述子像素电极对应设置的数据线;
所述外围布线区设置有与每一行所述扫描线对应设置的栅极驱动电路和与每一列所述数据线对应设置的数据驱动线,所述栅极驱动电路和所述数据驱动线均电连接至驱动芯片的覆晶薄膜封装区,每一条所述栅极驱动电路电连接至所述覆晶薄膜封装区的阵列布线设置在不同金属层,从而提高所述阵列基板的静电防护能力。
根据本发明一实施例,每一条所述阵列布线连接所述栅极驱动电路的起点和连接所述覆晶薄膜封装区的终点设置在同一金属层。
根据本发明一实施例,所述不同金属层包括第一金属层和第二金属层,所述第一金属层和所述第二金属层的阵列布线的长度范围均大于100μm。
根据本发明一实施例,所述第一金属层和所述第二金属层的阵列布线通过栅极绝缘层的通孔电连接。
根据本发明一实施例,所述通孔的直径等于所述阵列布线的宽度。
根据本发明一实施例,所述阵列布线的宽度范围为10-30μm。
根据本发明一实施例,所述第一金属层包括多个第一金属段,所述第二金属层包括多个第二金属段,所述多个第一金属段与对应的所述多个第二金属段电连接。
根据本发明一实施例,所述阵列布线进一步划分为第一阵列布线区和第二阵列布线区,所述第一阵列布线区的多个所述第一金属段与所述第二阵列布线区的多个所述第一金属段间隔设置在同一层。
根据本发明一实施例,相邻所述阵列布线的距离范围为10-30μm。
为解决上述技术问题,本发明采用的另一个技术方案是:提供一种显示面板,所述显示面板包括壳体和上述所述的阵列基板,其中,所述阵列基板包括显示区和外围布线区,其中,
所述显示区包括多个以矩阵方式排列的子像素电极、与每一行所述子像素电极对应设置的扫描线以及与每一列所述子像素电极对应设置的数据线;
所述外围布线区设置有与每一行所述扫描线对应设置的栅极驱动电路和与每一列所述数据线对应设置的数据驱动线,所述栅极驱动电路和所述数据驱动线均电连接至驱动芯片的覆晶薄膜封装区,每一条所述栅极驱动电路电连接至所述覆晶薄膜封装区的阵列布线设置在不同金属层,从而提高所述阵列基板的静电防护能力。
本发明的有益效果是:区别于现有技术的情况,本发明提供的阵列基板由于设有设置在不同金属层的阵列布线,延长了阵列布线的长度,提高阵列布线的的阻抗,从而减少输入栅极驱动电路的电流,减少栅极驱动电路炸伤的几率,从而提高阵列基板的静电防护能力。
附图说明
为了更清楚地说明本发明实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图,其中:
图1是本发明提供的阵列基板第一实施例的结构示意图;
图2是本发明第一实施例中不同金属层的阵列布线的剖面结构示意图;
图3是本发明提供的阵列基板第二实施例的结构示意图;
图4是本发明提供的阵列基板第三实施例的结构示意图;
图5是本发明第三实施例中不同金属层的阵列布线的剖面结构示意图;
图6是本发明提供的显示面板一实施例的结构示意图。
具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
请一并参阅图1和图2,图1是本发明提供的阵列基板第一实施例的结构示意图,图2是本发明第一实施例中不同金属层的阵列布线的剖面结构示意图。
如图1所示,该阵列基板100阵列基板包括显示区101和外围布线区102,外围布线区102设置在显示区101的周边或者四周,在本发明示例中,外围布线区102设置在显示区101的左侧和上侧。
其中,显示区101包括多个以矩阵方式排列的子像素电极110、与每一行子像素电极110对应设置的扫描线130以及与每一列子像素电极110对应设置的数据线150。
外围布线区102设置有与每一行扫描线130对应设置的栅极驱动电路120和与每一列数据线150对应设置的数据驱动线140,栅极驱动电路120和数据驱动线140均电连接至驱动芯片的覆晶薄膜封装区160,每一条栅极驱动电路120电连接至覆晶薄膜封装区160的阵列布线170设置在不同金属层180(见图2),在本实施例的示例中,虚线与实线不属于同一金属层,从而提高阵列基板100的静电防护能力。
本发明提供的阵列基板100由于设有设置在不同金属层180的阵列布线170,延长了阵列布线170的长度,提高阵列布线170的的阻抗,从而减少输入栅极驱动电路120的电流,减少栅极驱动电路120炸伤的几率,从而提高阵列基板100的静电防护能力。
请一并参见图2,为了方便理解,以不同金属层阵列布线的剖面图为示例进行说明,不同金属层180包括第一金属层181、第二金属层182以及隔绝第一金属层181和第二金属层182的绝缘层183,绝缘层183是至少一层含有绝缘材料的绝缘层,即可以是多层绝缘层,也可以是一层绝缘层。绝缘层的材料可选为环氧树脂。
阵列布线170包括起点171和终点173,还包括第一金属层181的第一阵列布线172和第二金属层182的第二阵列布线174。其中,每一条阵列布线170连接栅极驱动电路120的起点171和连接覆晶薄膜封装区160的终点173设置在同一金属层,可以是第一金属层181,也可以是第二金属层182。且第一金属层181的第一阵列布线172和第二金属层182的第二阵列布线172的长度范围均大于100μm,可选的长度为200μm、300μm或者350μm等等,实际应用例中可以依据具体的阵列基板尺寸进行调整。
在本实施例的示例中,隔绝第一金属层181和第二金属层182的绝缘层183为栅极绝缘层,栅极绝缘层183上设有通孔,第一金属层181的第一阵列布线172和第二金属层182的第二阵列布线174通过栅极绝缘层183的通孔184电连接。通孔184的直径可以大于、小于或者等于阵列布线170的宽度,可选的,通孔184的直径等于阵列布线170的宽度。其中,阵列布线170的宽度范围为10-30μm;进一步的,阵列布线170的宽度范围为15-25μm;可选的,阵列布线170的宽度为20μm。且相邻阵列布线170的距离范围为10-30μm;进一步的,相邻阵列布线170的距离范围为15-25μm;可选的,相邻阵列布线170的距离为20μm。
本实施例的示例中,多个第一阵列布线172和多个第二阵列布线174设置在阵列布线170的弯角处,在其他直线处也均可采用不同金属层的阵列布线170,具体的,在起点171和终点173之间的阵列布线均可以设置在不同金属层,且还可以进行多段设计,详细内容参见下文,此处不再赘述。
请参阅图3,图3本发明提供的阵列基板第二实施例的结构示意图。
如图3所示,为了方便理解,以不同金属层阵列布线的剖面图为示例进行说明,本实施例的结构与第一实施例的结构基本相同,阵列布线270进一步划分为第一阵列布线区203和第二阵列布线区204,其中,第一阵列布线区203的多个第一阵列布线272与第二阵列布线区204的多个第一阵列布线272间隔设置在同一层;同理,第一阵列布线区203的多个第二阵列布线274与第二阵列布线区204的多个第二阵列布线274间隔设置在同一层。
请一并参阅图4和图5,图4本发明提供的阵列基板第二实施例的结构示意图,图5是本发明第三实施例中不同金属层的阵列布线的剖面结构示意图。
如图5所示,为了方便理解,以不同金属层阵列布线的剖面图为示例进行说明,本实施例的结构与第一实施例的结构基本相同,不同的是第一金属层381包括多个第一金属段3701、第一金属段3702,即第一阵列布线372;第二金属层382包括多个第二金属段3703、第二金属段3704,即第二阵列布线374;多个第一金属段与对应的多个第二金属段电连接。其中,第一金属段3701和第一金属段3702的长度可以相等或者不相等,且长度均大于100μm;同理,第二金属段3703和第二金属段3704的长度可以相等或者不相等,且长度均大于100μm。在本实施例的示例中,第一金属层381包括两个第一金属段,在其他实施例中,可以三个、四个,或者更多,在此不一一赘述。
请一并参阅图4,第一阵列布线区303的多个第一金属段3701、第一金属段3702设置在同一层,多个第二金属段3703、第二金属段3704设置在另一层(虚线表示),其中,第二阵列布线区304的多个第一金属段3701、第一金属段3702与第一阵列布线区304的多个第一金属段3701、第一金属段3702间隔设置在同一层。本实施例的阵列基板由于设有设置在不同金属层的多个第一金属段3701和多个第二金属段3703,进一步延长了阵列布线的长度,从而进一步提高阵列基板的静电防护能力。
请参阅图6,图6是本发明提供的显示面板一实施例的结构示意图。
如图6所示,该显示面板10包括壳体11和上述的阵列基板,阵列基板设置在壳体11的内部。其中,阵列基板为上述的阵列基板100、阵列基板200或者阵列基板300。
其中,阵列基板100、阵列基板200或者阵列基板300的结构参见上文,此处不再赘述。
综上所述,本领域技术人员容易理解,本发明提供的阵列基板由于设有设置在不同金属层的阵列布线,延长了阵列布线的长度,提高阵列布线的的阻抗,从而减少输入栅极驱动电路的电流,减少栅极驱动电路炸伤的几率,从而提高阵列基板的静电防护能力。
以上所述仅为本发明的实施例,并非因此限制本发明的专利范围,凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本发明的专利保护范围内。

Claims (6)

1.一种阵列基板,其特征在于,所述阵列基板包括显示区和外围布线区,其中,
所述显示区包括多个以矩阵方式排列的子像素电极、与每一行所述子像素电极对应设置的扫描线以及与每一列所述子像素电极对应设置的数据线;
所述外围布线区设置有与每一行所述扫描线对应设置的栅极驱动电路和与每一列所述数据线对应设置的数据驱动线,所述栅极驱动电路和所述数据驱动线均电连接至驱动芯片的覆晶薄膜封装区,每一条所述栅极驱动电路电连接至所述覆晶薄膜封装区的阵列布线设置在不同金属层,从而提高所述阵列基板的静电防护能力;
所述不同金属层包括第一金属层和第二金属层,所述第一金属层和所述第二金属层的阵列布线的长度范围均大于100μm;
所述阵列布线包括连接所述栅极驱动电路的起点、连接所述覆晶薄膜封装区的终点、位于第一金属层的第一阵列布线和位于第二金属层的第二阵列布线;其中每一条所述阵列布线连接所述栅极驱动电路的起点和连接所述覆晶薄膜封装区的终点设置在同一金属层,所述第一阵列布线和所述第二阵列布线设置在所述阵列布线的弯角处;
其中所述第一金属层包括多个第一金属段,所述第二金属层包括多个第二金属段,所述多个第一金属段与对应的所述多个第二金属段电连接;
所述阵列布线进一步划分为第一阵列布线区和第二阵列布线区,所述第一阵列布线区的多个所述第一金属段与所述第二阵列布线区的多个所述第一金属段间隔设置在同一层。
2.根据权利要求1所述的阵列基板,其特征在于,所述第一金属层和所述第二金属层的阵列布线通过栅极绝缘层的通孔电连接。
3.根据权利要求2所述的阵列基板,其特征在于,所述通孔的直径等于所述阵列布线的宽度。
4.根据权利要求3所述的阵列基板,其特征在于,所述阵列布线的宽度范围为10-30μm。
5.根据权利要求1所述的阵列基板,其特征在于,相邻所述阵列布线的距离范围为10-30μm。
6.一种显示面板,其特征在于,所述显示面板包括壳体和权利要 求1-5中任一项所述的阵列基板,其中,所述阵列基板包括显示区和外围布线区,其中,
所述显示区包括多个以矩阵方式排列的子像素电极、与每一行所述子像素电极对应设置的扫描线以及与每一列所述子像素电极对应设置的数据线;
所述外围布线区设置有与每一行所述扫描线对应设置的栅极驱动电路和与每一列所述数据线对应设置的数据驱动线,所述栅极驱动电路和所述数据驱动线均电连接至驱动芯片的覆晶薄膜封装区,每一条所述栅极驱动电路电连接至所述覆晶薄膜封装区的阵列布线设置在不同金属层,从而提高所述阵列基板的静电防护能力。
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