CN105764227B - A kind of high line direct current hollow-cathode plasma source - Google Patents
A kind of high line direct current hollow-cathode plasma source Download PDFInfo
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- CN105764227B CN105764227B CN201610334319.7A CN201610334319A CN105764227B CN 105764227 B CN105764227 B CN 105764227B CN 201610334319 A CN201610334319 A CN 201610334319A CN 105764227 B CN105764227 B CN 105764227B
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- plasma source
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- 125000006850 spacer group Chemical group 0.000 claims abstract description 11
- 238000001816 cooling Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 8
- 239000000498 cooling water Substances 0.000 claims description 6
- 238000002679 ablation Methods 0.000 claims description 5
- 230000004888 barrier function Effects 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910001362 Ta alloys Inorganic materials 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000012774 insulation material Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 239000007789 gas Substances 0.000 abstract description 20
- 230000009466 transformation Effects 0.000 abstract description 3
- 230000004927 fusion Effects 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 238000010891 electric arc Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
- H05H1/50—Generating plasma using an arc and using applied magnetic fields, e.g. for focusing or rotating the arc
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
The present invention discloses a kind of high line direct current hollow-cathode plasma source, including seal pipe, coreless armature, cathode plate, connecting plate, first anode plate, second plate plate, striking spacer and control power supply；Coreless armature is mounted on cathode plate；Seal pipe connect with cathode plate and is inserted in coreless armature wherein；The gas introduction port for being input to gas in coreless armature is equipped at the top of seal pipe；Connecting plate and makes to form potential difference therebetween for realizing the sealed connection of cathode plate and first anode plate；High-density plasma line is formed between second plate plate and coreless armature；Striking spacer is located between coreless armature and second plate plate；Controlling power supply has anode, cathode and striking pole, anode connection second plate plate, and cathode connects cathode plate, and striking pole connects first anode plate.The present invention can satisfy the use of multiple gases, and can produce the plasma line of high ionization level, to effectively increase the transformation efficiency of energy.
Description
Technical field
The present invention relates to lower temperature plasma technology fields, and in particular to be a kind of high line direct current hollow cathode etc. from
Daughter source.
Background technique
Since global energy requirements sharply increase, magnetic confinement nuclear fusion can be considered most potential in numerous new energy
One of sustainable clean energy resource.And during magnetic confinement device stable operation, plasma and the first wall and divertor material
The problem of material interaction, then becomes fusion reactor and realizes the commercial science for needing to solve and engineering roadblock.Since magnetic confinement device is transported
The high complexity of row environment, it is very big to carry out online scrutiny difficulty, generallys use laboratory linear plasma at present
Can device simulates fusion facility stack operation operating condition, thus provide high-intensitive, stable plasma output plasma hair
Raw device becomes as key.
Currently, being applied to microwave and the rf (discharge) plasma source of linear plasma body device, due to its energy coupling
It is inefficient to cause plasma flux density too low, it is difficult to simulate the requirement of high flux density in the research such as fusion reactor.Three yin
Pole, which cascades vacuum arc plasma source, can produce high-throughput plasma line by arc discharge, and but its structure is complex, gas consumption
Amount is big, need to be equipped with difference cavity and big pumping speed pump group to exclude neutral gas, is costly and difficult to for expensive gases.
Summary of the invention
In view of the above shortcomings of the prior art, the present invention provides a kind of high line direct current hollow-cathode plasma source,
Its plasma line that can produce high ionization level, and improve energy conversion efficiency.
To achieve the above object, The technical solution adopted by the invention is as follows:
A kind of high line direct current hollow-cathode plasma source, including seal pipe, coreless armature, cathode plate, connecting plate,
One anode plate, second plate plate, striking spacer and control power supply, in which:
The coreless armature is mounted on cathode plate and can front and back adjusting movement；
The seal pipe is connect with cathode plate, and coreless armature is inserted in wherein, to realize the sealing to coreless armature, and
For the mobile reserved margin of coreless armature；The gas being additionally provided at the top of the seal pipe for gas to be input in coreless armature is led
Entrance；
The first anode plate is used as the arc electrode of plasma source, and the connecting plate is for realizing cathode plate and the first sun
The sealed connection of pole plate, and make to form potential difference therebetween；
The second plate plate is used as the working electrode of plasma source, with 30~50 lis of first anode plate bottom interval
Rice, and high-density plasma line is formed between coreless armature；
The striking is every being set between coreless armature and second plate plate, full for controlling the size in striking region
The striking of sufficient gas with various；
The control power supply has anode, cathode and striking pole, wherein anode is connect with second plate plate, cathode and yin
Pole plate connection, striking pole is connect with first anode plate.
Further, it is also provided in the cathode plate for being passed through cooling water to carry out cooling first to coreless armature
Cooling trough.
Still further, being also provided in the first anode plate for being passed through cooling water to prevent coreless armature from burning
Lose and damage the second cooling trough of cathode plate.
Further, insulating barrier is additionally provided on the first anode plate.
Preferably, the coreless armature is tantalum pipe or tantalum alloy pipe, it is mounted on the central axis of cathode plate, and lead to
Cross screw locking.
Preferably, the connecting plate is adopted and is made from an insulative material.
Preferably, the striking spacer is made of the high-temperature insulation material of ceramics or congruence property.
Preferably, the cathode plate, first anode plate and second plate plate are made of red copper material.
Compared with prior art, the invention has the following advantages:
(1) the configuration of the present invention is simple, reasonable, the easy to maintenance, low processing cost of design, pass through seal pipe, hollow electricity
The setting of pole, cathode plate, first anode plate, second plate plate, can satisfy the use of multiple gases, and realize high ionization level
The generation of plasma line, and then the transformation efficiency of energy is effectively improved, the needs of scientific research are not only met, and
And to realize that commercialization provides guarantee.
(2) using the adjusting of control power supply and second plate plate, the present invention can regulation power in very large range, thus
Meet the requirement of different occasions, and the plasma beam spot size in the present invention can be by cathode internal diameter and magnetic field configuration
It adjusts, therefore application range is extremely wide.
(3) coreless armature in the present invention is not only convenient for changing, but also the adjustment mode by being moved forward and backward, and is also effectively mentioned
The utilization rate of high coreless armature is high.
(4) in the present invention, the distance between second plate plate and coreless armature can select according to the actual situation, generally several
Ten centimetres, second plate plate can be made to possess enough spaces in this way and carry out the parameters such as the electron temperature of plasma beam, density
Spatial distribution diagnosed, to facilitate scientific research and Process Exploration.
(5) cathode plate, first anode plate and the second plate plate in the present invention are made of red copper material, not only dissipate
Hot good, excellent electrical properties, and simple shape, are easily worked.
Detailed description of the invention
Fig. 1 is the structural diagram of the present invention.
Wherein, the corresponding title of appended drawing reference are as follows:
1- seal pipe, 2- gas introduction port, 3- coreless armature, 4- cathode plate, the first cooling trough of 5-, 6- connecting plate, 7-
First anode plate, the second cooling trough of 8-, 9- insulating barrier, 10- striking spacer, 11- second plate plate, 12- control power supply.
Specific embodiment
The invention will be further described with embodiment for explanation with reference to the accompanying drawing, and mode of the invention includes but not only limits
In following embodiment.
Embodiment
As shown in Figure 1, the present invention provides a kind of high line direct current for material modification in straight line high-intensity magnetic field device is empty
The heart-yin pole plasma source can produce the plasma line of high ionization level.The present invention includes seal pipe 1, coreless armature
3, cathode plate 4, connecting plate 6, first anode plate 7, second plate plate 11, striking spacer 10 and control power supply 12.The hollow electricity
Pole 3 is mounted on cathode plate 4, tantalum pipe or tantalum alloy pipe can be selected, and lock on 4 central axis of cathode plate by screw.
The seal pipe 1 is connect with cathode plate 4, and coreless armature 3 is inserted in wherein, to realize the sealing to coreless armature, the sealing
Tube top portion is additionally provided with the importing of the gas for being input to gas (such as the multiple gases such as Ar, He, N2, H2) in coreless armature 3
Mouth 2.In the present embodiment, when in use, coreless armature 3 is the ablation since front end, therefore, in the ablation of coreless armature front end
Afterwards, adjusting coreless armature forward can be slightly handled to continue to use, and the seal pipe 1 is then coreless armature in length
Certain spatial margin is reserved in movement.
In addition, the first cooling trough 5 is also provided in the cathode plate 4, for being passed through cooling water, to coreless armature
It is cooled down, prevents coreless armature from excessive ablation occurs because temperature is excessively high.
The first anode plate 7 is used as the arc electrode of plasma source, and the connecting plate 6 is for realizing cathode plate 4 and the
The sealed connection of one anode plate 7, and make to form potential difference therebetween.In the present embodiment, the connecting plate 6 uses high temperature resistant
Insulating materials be made, realize sealing while, can also realize the insulation of cathode plate 4 and first anode plate 7.Also, institute
The second cooling trough 8 being also provided in the first anode plate 7 stated, the cooling trough 8 are opened close to the bottom of first anode plate 7
Mouthful, it is equally used for being passed through cooling water, to prevent from ablation occurs and damaging cathode because plasma temperature is excessively high in nozzle
Plate guarantees the plasma discharge of long-time stable.
In addition, being additionally provided with insulating barrier 9 on the first anode plate 7, which is located at 7 He of first anode plate
Between vacuum linear magnetic field device, for the insulation between the present invention and vacuum linear magnetic field device, it is ensured that when the invention works
Vacuum linear magnetic field device will not be had an impact.
The second plate plate 11 is used as the working electrode of plasma source, certain with 7 bottom interval of first anode plate
Distance (30~50 centimetres), and between coreless armature formed high-density plasma line.The striking spacer 10 is then
It is arranged between coreless armature 3 and second plate plate 11, for controlling the size in striking region, meets the striking of gas with various,
In the present embodiment, striking spacer 10 is made of the high-temperature insulation material of ceramics or congruence property.
The control power supply 12 has anode, cathode and striking pole, wherein anode is connect with second plate plate 11, cathode
It is connect with cathode plate 4, striking pole is connect with first anode plate 7.
Main operational principle of the invention are as follows: be passed through into coreless armature 3 using gas introduction port 2 via seal pipe 1 more
Kind gas forms gas at this point, loading certain voltage between cathode plate 4 and first anode plate 7 by controlling power supply 12
The form of arc discharge.Striking of the invention uses the striking mode of high-frequency and high-voltage, striking voltage and core motor 3 and the first sun
The spacing and vacuum pressure of pole are related, and the general striking duration was at several seconds.
After arc discharge, stable plasma is generated in coreless armature, and escaped by 7 bottom of first anode plate, so
Being transported to second plate plate 11 by vacuum linear magnetic field device afterwards, (second plate plate is located at the center of vacuum linear magnetic field device
Axial location), to form the plasma line of high ionization level.
The present invention can be passed through multiple gases by designing a kind of plasma source simultaneously, and generate high ionization level etc.
Gas ions line, to improve the transformation efficiency of energy.Adjusting of the present invention by control power supply and second plate plate, Ke Yiman
The requirement of foot difference occasion, therefore, the scope of application is quite extensive, is very suitable for promoting and applying.
Above-described embodiment is only one of the preferred embodiment of the present invention, should not be taken to limit protection model of the invention
Enclose, it is all in body design thought of the invention and mentally make have no the change of essential meaning or polishing, solved
Technical problem is still consistent with the present invention, should all be included within protection scope of the present invention.
Claims (8)
1. a kind of high line direct current hollow-cathode plasma source, which is characterized in that including seal pipe (1), coreless armature (3),
Cathode plate (4), connecting plate (6), first anode plate (7), second plate plate (11), striking spacer (10) and control power supply (12),
Wherein:
The coreless armature (3) is mounted on cathode plate (4) and can front and back adjusting movement；
The seal pipe (1) connect with cathode plate (4), and coreless armature (3) is inserted in wherein, to realize to the close of coreless armature
Envelope, and be the mobile reserved margin of coreless armature；It is additionally provided at the top of the seal pipe for gas to be input in coreless armature
Gas introduction port (2)；
The first anode plate (7) is used as the arc electrode of plasma source, and the connecting plate (6) is for realizing cathode plate and first
The sealed connection of anode plate, and make to form potential difference therebetween；
The second plate plate (11) be used as plasma source working electrode, with first anode plate (7) bottom interval 30~
50 centimetres, and high-density plasma line is formed between coreless armature；
The striking spacer (10) is arranged between coreless armature (3) and second plate plate (11), for controlling striking region
Size meets the striking of gas with various；
The control power supply (12) has anode, cathode and striking pole, wherein anode is connect with second plate plate, cathode and yin
Pole plate connection, striking pole is connect with first anode plate.
2. a kind of high line direct current hollow-cathode plasma source according to claim 1, which is characterized in that the cathode
It is also provided in plate (4) for being passed through cooling water to carry out cooling the first cooling trough (5) to coreless armature.
3. a kind of high line direct current hollow-cathode plasma source according to claim 2, which is characterized in that described first
It is also provided in anode plate (7) for being passed through cooling water to prevent coreless armature from ablation occurs and damage the second cold of cathode plate
But sink (8).
4. a kind of high line direct current hollow-cathode plasma source according to claim 3, which is characterized in that described first
Insulating barrier (9) are additionally provided on anode plate (7).
5. a kind of high line direct current hollow-cathode plasma source according to any one of claims 1 to 4, feature exist
In the coreless armature (3) is tantalum pipe or tantalum alloy pipe, is mounted on the central axis of cathode plate (4), and locked by screw
Tightly.
6. a kind of high line direct current hollow-cathode plasma source according to claim 1, which is characterized in that the connection
Plate (6), which is adopted, to be made from an insulative material.
7. a kind of high line direct current hollow-cathode plasma source according to claim 1, which is characterized in that the striking
Spacer (10) is made of the high-temperature insulation material of ceramics or congruence property.
8. a kind of high line direct current hollow-cathode plasma source according to claim 1, which is characterized in that the cathode
Plate (4), first anode plate (7) and second plate plate (8) are made of red copper material.
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| CN201610334319.7A CN105764227B (en) | 2016-05-19 | 2016-05-19 | A kind of high line direct current hollow-cathode plasma source |
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| CN201610334319.7A CN105764227B (en) | 2016-05-19 | 2016-05-19 | A kind of high line direct current hollow-cathode plasma source |
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| CN105764227B true CN105764227B (en) | 2019-01-15 |
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| CN106304594A (en) * | 2016-09-29 | 2017-01-04 | 成都真火科技有限公司 | A kind of laminar flow plasma generator |
| CN108932982B (en) * | 2017-05-22 | 2020-04-14 | 成都达信成科技有限公司 | High beam plasma array source for linear high-intensity magnetic field device |
| CN108770172B (en) * | 2018-08-06 | 2023-09-26 | 重庆新离子环境科技有限公司 | A DC arc plasma torch for hazardous waste treatment |
| CN108770176B (en) * | 2018-08-06 | 2023-11-17 | 法德(浙江)机械科技有限公司 | Large-scale low-voltage high-efficiency Gao Shu direct-current hollow cathode source |
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| DE29608484U1 (en) * | 1996-05-10 | 1996-09-19 | VTD Vakuumtechnik Dresden GmbH, 01257 Dresden | Plasma generating device with a hollow cathode |
| US6368678B1 (en) * | 1998-05-13 | 2002-04-09 | Terry Bluck | Plasma processing system and method |
| DE19902146C2 (en) * | 1999-01-20 | 2003-07-31 | Fraunhofer Ges Forschung | Method and device for pulsed plasma activation |
| CN2722561Y (en) * | 2004-09-01 | 2005-08-31 | 王忠义 | Long-life negative cathode of air plasma generator |
| DE102008047198B4 (en) * | 2008-09-15 | 2012-11-22 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and apparatus for operating a hollow cathode arc discharge |
| CN105578697A (en) * | 2014-10-09 | 2016-05-11 | 核工业西南物理研究院 | A New Double Anode Plasma Torch |
| CN205681690U (en) * | 2016-05-19 | 2016-11-09 | 中国工程物理研究院材料研究所 | A kind of high line direct current hollow-cathode plasma source |
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