CN207820298U - An Efficient and Stable Arc Plasma Source - Google Patents
An Efficient and Stable Arc Plasma Source Download PDFInfo
- Publication number
- CN207820298U CN207820298U CN201721855171.8U CN201721855171U CN207820298U CN 207820298 U CN207820298 U CN 207820298U CN 201721855171 U CN201721855171 U CN 201721855171U CN 207820298 U CN207820298 U CN 207820298U
- Authority
- CN
- China
- Prior art keywords
- ceramic
- anode
- cathode
- cylinder
- ceramic cylinder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000919 ceramic Substances 0.000 claims abstract description 96
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 44
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 20
- 239000011733 molybdenum Substances 0.000 claims abstract description 20
- 238000002347 injection Methods 0.000 claims abstract description 17
- 239000007924 injection Substances 0.000 claims abstract description 17
- 238000009413 insulation Methods 0.000 claims abstract description 13
- 229910052802 copper Inorganic materials 0.000 claims abstract description 12
- 239000010949 copper Substances 0.000 claims abstract description 12
- 238000002788 crimping Methods 0.000 claims abstract description 8
- 239000011324 bead Substances 0.000 claims abstract 2
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 2
- 238000002955 isolation Methods 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 abstract description 3
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 7
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 229910052582 BN Inorganic materials 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910000619 316 stainless steel Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Plasma Technology (AREA)
Abstract
Description
技术领域technical field
本实用新型属于基础等离子体研究领域,具体涉及一种高效稳定的电弧等离子体源。The utility model belongs to the field of basic plasma research, in particular to an efficient and stable arc plasma source.
背景技术Background technique
目前等离子体源主要有螺旋波等离子体源和氧化物阴极等离子体源。然而螺旋波等离子体源和氧化物阴极等离子体源,所产生的等离子体温度密度低、资源利用率低、不能稳定的产生等离子体,以及产生等离子体方式不灵活等缺点;At present, the plasma sources mainly include helicon wave plasma source and oxide cathode plasma source. However, the helicon wave plasma source and the oxide cathode plasma source have disadvantages such as low temperature density of plasma, low resource utilization rate, unstable plasma generation, and inflexible plasma generation methods;
1、螺旋波和氧化物阴极等离子体源都需要持续注气来保证等离子体的产生,而它们的电离度又不高,这样产生的等离子体温度和密度都比较低,而且对于气体和电源的能量的利用率低,造成资源的浪费;1. Both helicon wave and oxide cathode plasma sources need continuous gas injection to ensure the generation of plasma, and their ionization degree is not high, so the temperature and density of the generated plasma are relatively low, and the gas and power supply The utilization rate of energy is low, resulting in waste of resources;
2、螺旋波等离子体需要通过匹配器匹配才完成能量耦合,电离气体来产生等离子体,而且随着等离子体参数和气体参数变化,匹配就会变化,所以能量耦合存在着一些问题,不能稳定的产生等离子体,;2. The helicon wave plasma needs to be matched by a matcher to complete the energy coupling. The ionized gas is used to generate the plasma, and as the plasma parameters and gas parameters change, the matching will change, so there are some problems in the energy coupling, which cannot be stabilized. generate plasma,
3、氧化物阴极是通过加热阴极材料产生少量的电子,然后通过加速栅来增加电子能量,被加速后的电子与中性气体碰撞产生等离子体的,这种等离子体温度密度低,而且引入了大量的杂质,而且加热氧化物产生的巨大热量也不利于物理实验进行,此外氧化物的制备也比较繁琐,这种方式很不灵活;3. The oxide cathode generates a small amount of electrons by heating the cathode material, and then increases the energy of the electrons through the acceleration grid. The accelerated electrons collide with the neutral gas to generate plasma. This plasma has a low temperature density and introduces A large number of impurities, and the huge heat generated by heating the oxide is not conducive to the physical experiment, and the preparation of the oxide is also cumbersome, and this method is very inflexible;
4、由于螺旋波存在能量耦合问题,而氧化物阴极也存在能量耦合问题,所以二者的能量利用率很低;4. Due to the energy coupling problem of the helicon wave and the energy coupling problem of the oxide cathode, the energy utilization rate of the two is very low;
基于以上问题,在基础等离子体物理研究和等离子体应用领域需要能量和资源利用率高、能灵活并且高效稳定的产生等离子体的等离子体源。Based on the above problems, a plasma source with high energy and resource utilization, flexible, efficient and stable plasma generation is required in the fields of basic plasma physics research and plasma applications.
实用新型内容Utility model content
本实用新型的目的是要克服现有的螺旋波等离子体需要持续注气、等离子体的温度和密度低的缺点,氧化阴极等离子体的温度和密度低,以及引入杂质等缺点,设计一款能够高效稳定产生等离子体参数好,且纯净的等离子体源。The purpose of this utility model is to overcome the disadvantages of the existing helicon wave plasma, such as continuous gas injection, low plasma temperature and density, low temperature and density of the oxidized cathode plasma, and the introduction of impurities, etc., to design a Efficient and stable generation of plasma with good parameters and pure plasma source.
本实用新型采用的技术方案是:一种高效稳定的电弧等离子体源,包括阳极、阳极铜环电极、内部陶瓷筒、中间陶瓷筒、外部陶瓷筒、阴极、阴极铜环电极、钼注气管、阴极陶瓷盖、引入电极中间绝缘、陶瓷垫圈、能量引入压线铜鼻、陶瓷绝缘盒、阳极陶瓷盖和钼垫圈,阴极和阳极共轴装配,阴极和阳极之间用陶瓷垫圈和钼垫圈交替叠填充,内部陶瓷筒套在垫圈外部,内部陶瓷筒两端分别嵌入阴极和阳极的凹槽内,内部陶瓷筒外再套上中间陶瓷筒,中间陶瓷筒的两端与阴极和阳极的内部端面相接,最后,开有装配孔的外部陶瓷筒套在中间陶瓷筒外,两端分别与阴极和阳极的外端面平齐,有装配孔的阴极陶瓷盖平铺于阴极的外端面并与阴极共轴,有装配孔的阳极陶瓷盖平铺于阳极外端面并与阳极共轴,调节阴极陶瓷盖和阳极陶瓷盖使它们的装配孔与外部陶瓷筒的装配孔共轴,使用丝杆来固定整个等离子体源。The technical scheme adopted by the utility model is: a high-efficiency and stable arc plasma source, including anode, anode copper ring electrode, inner ceramic cylinder, middle ceramic cylinder, outer ceramic cylinder, cathode, cathode copper ring electrode, molybdenum gas injection tube, Cathode ceramic cover, lead-in electrode intermediate insulation, ceramic gasket, energy introduction crimping copper lug, ceramic insulation box, anode ceramic cover and molybdenum gasket, cathode and anode are coaxially assembled, and ceramic gasket and molybdenum gasket are alternately stacked between cathode and anode Filling, the inner ceramic cylinder is set on the outside of the gasket, the two ends of the inner ceramic cylinder are embedded in the grooves of the cathode and the anode respectively, and the inner ceramic cylinder is covered with the middle ceramic cylinder, and the two ends of the middle ceramic cylinder are in contact with the inner end faces of the cathode and the anode. Finally, the outer ceramic cylinder with assembly holes is placed outside the middle ceramic cylinder, and the two ends are respectively flush with the outer end surfaces of the cathode and anode, and the cathode ceramic cover with assembly holes is laid flat on the outer end surface of the cathode and shared with the cathode. Shaft, the anode ceramic cover with assembly holes is laid flat on the outer end surface of the anode and coaxial with the anode, adjust the cathode ceramic cover and anode ceramic cover so that their assembly holes are coaxial with the assembly holes of the external ceramic cylinder, and use a screw to fix the entire plasma source.
进一步地,上述阳极铜环电极是一个内径70mm外径90mm的铜环,圆环中心位置均匀的开十二个沉头螺纹孔,环的外侧有两个对称的电极臂。Further, the anode copper ring electrode is a copper ring with an inner diameter of 70 mm and an outer diameter of 90 mm. Twelve countersunk threaded holes are evenly opened in the center of the ring, and there are two symmetrical electrode arms on the outside of the ring.
进一步地,上述阳极由金属钼做成,是一个圆柱的U形结构,外端面开有一个喇叭形出口,阳极外端面还开有一个内径70mm外径90mm,厚度3mm的环形槽,槽中间圆环内均匀的分布十二个螺纹孔,阳极铜环电极就装配这个环形槽上。Further, the above-mentioned anode is made of metal molybdenum, which is a cylindrical U-shaped structure, with a trumpet-shaped outlet on the outer end surface, and an annular groove with an inner diameter of 70mm and an outer diameter of 90mm, and a thickness of 3mm. The middle of the groove is round. Twelve threaded holes are evenly distributed in the ring, and the anode copper ring electrode is assembled on this ring groove.
进一步地,上述阳极铜环电极是一个内径70mm外径90mm的铜环,圆环中心位置均匀的开十二个沉头螺纹孔,环的外侧有一个电极臂。Further, the anode copper ring electrode is a copper ring with an inner diameter of 70 mm and an outer diameter of 90 mm. Twelve countersunk threaded holes are evenly opened in the center of the ring, and an electrode arm is provided on the outside of the ring.
进一步地,上述阴极有金属钼做成,其内部圆柱开喇叭口,内圆柱和外圆柱之间开有一个与内部陶瓷筒壁厚一致的固定槽口,并且整个阴极中间开一个与阴极同轴的注气孔,在阴极外端面还开有一个内径70mm外径90mm,厚度3mm的环形槽,槽中间圆环内均匀的分布十二个螺纹孔,阴极铜环电极就装配这个环形槽上。Further, the above-mentioned cathode is made of metal molybdenum, the inner cylinder has a bell mouth, and a fixed notch is opened between the inner cylinder and the outer cylinder, which is consistent with the wall thickness of the inner ceramic cylinder, and a hole coaxial with the cathode is opened in the middle of the entire cathode. There is an annular groove with an inner diameter of 70mm and an outer diameter of 90mm and a thickness of 3mm on the outer end of the cathode. Twelve threaded holes are evenly distributed in the ring in the middle of the groove. The cathode copper ring electrode is assembled on this annular groove.
进一步地,压线铜鼻子是一端开有直径8mm深15mm的孔,另外一端是一个M8的螺柱。Furthermore, the crimping copper lug has a hole with a diameter of 8mm and a depth of 15mm at one end, and an M8 stud at the other end.
进一步地,阴极铜环电极和阳极铜环电极的电极臂都开有一个8mm通孔,压线铜鼻子通过这个孔与铜环电极相连,把外部能量引入用于产生等离子体。Furthermore, the electrode arms of the cathode copper ring electrode and the anode copper ring electrode have an 8mm through hole, and the crimping copper nose is connected with the copper ring electrode through this hole, and external energy is introduced to generate plasma.
进一步地,上述钼注气管通过螺纹与阴极注气孔相连,另外一侧与外部的绝缘材质的注气管相连,并与注气截止阀相连,以脉冲模式把工作质气体注入电离通道。Further, the above-mentioned molybdenum gas injection pipe is connected to the cathode gas injection hole through threads, and the other side is connected to the external gas injection pipe of insulating material, and connected to the gas injection shut-off valve to inject the working gas into the ionization channel in pulse mode.
本实用新型的优点和积极效果为:Advantage and positive effect of the present utility model are:
(1)本实用新型一种高效稳定的电弧等离子体源工作在脉冲模式下,只需要脉冲注气,减小等离子体中的中性工作质气体,减少工作质气体使用量,在真空下使用时有利于提高等离子体的参数。(1) An efficient and stable arc plasma source of the utility model works in pulse mode, only needs pulse gas injection, reduces the neutral working gas in the plasma, reduces the usage of working gas, and can be used under vacuum It is beneficial to improve the parameters of the plasma.
(2)本实用新型一种高效稳定的电弧等离子体源产生等离子体是使用电弧放电模式,能量利用率高,和氧化物阴极比起来不需要冷却装置,运行简便、耗能少,而且等离子体中的杂质少。(2) A high-efficiency and stable arc plasma source of the utility model uses an arc discharge mode to generate plasma, and has high energy utilization rate. There are few impurities in it.
(3)本实用新型一种高效稳定的电弧等离子体源产生的等离子体束流强度高,参数高,参数可以根据注气和外部电源控制,有利于物理研究和工业应用中的参数控制。(3) The plasma beam produced by an efficient and stable arc plasma source of the utility model has high intensity and high parameters, and the parameters can be controlled according to gas injection and external power supply, which is beneficial to the parameter control in physical research and industrial application.
(4)本实用新型一种高效稳定的电弧等离子体源与螺旋波等离子体和氧化阴极等离子体等比起来要结构灵巧,可根据需求方便的缩放尺寸。(4) Compared with the helicon wave plasma and the oxidizing cathode plasma, the efficient and stable arc plasma source of the utility model has a smarter structure, and the size can be scaled conveniently according to the demand.
附图说明Description of drawings
图1是本实用新型的一种高效稳定的电弧等离子体源的装配剖面示意图。Fig. 1 is a schematic sectional view of an assembly of an efficient and stable arc plasma source of the present invention.
图2是本实用新型的一种高效稳定的电弧等离子体源的阳极。Fig. 2 is an anode of an efficient and stable arc plasma source of the present invention.
图3是本实用新型的一种高效稳定的电弧等离子体源的阴极。Fig. 3 is a cathode of an efficient and stable arc plasma source of the present invention.
图4是本实用新型的一种高效稳定的电弧等离子体源的阳极铜环电极。Fig. 4 is an anode copper ring electrode of an efficient and stable arc plasma source of the utility model.
图5是本实用新型的一种高效稳定的电弧等离子体源的阴极铜环电极。Fig. 5 is a cathode copper ring electrode of an efficient and stable arc plasma source of the present invention.
图中:01阳极,02阳极铜环电极,03内部陶瓷筒,04中间陶瓷筒,05外部陶瓷筒,06阴极,07阴极铜环电极,08钼注气管,09阴极陶瓷盖,10引入电极中间绝缘,11陶瓷垫圈, 12能量引入压线铜鼻,13陶瓷绝缘盒,14阳极陶瓷盖,15钼垫圈。In the figure: 01 anode, 02 anode copper ring electrode, 03 internal ceramic cylinder, 04 middle ceramic cylinder, 05 external ceramic cylinder, 06 cathode, 07 cathode copper ring electrode, 08 molybdenum gas injection pipe, 09 cathode ceramic cover, 10 lead into the middle of the electrode Insulation, 11 ceramic washers, 12 energy introduction crimping copper lugs, 13 ceramic insulation boxes, 14 anode ceramic covers, 15 molybdenum washers.
具体实施方式Detailed ways
以下结合附图和实施方式,对技术方案做详细说明。The technical solution will be described in detail below in conjunction with the accompanying drawings and embodiments.
如图1所示,一种高效稳定的电弧等离子体源,包括01阳极,02阳极铜环电极,03内部陶瓷筒,04中间陶瓷筒,05外部陶瓷筒,06阴极,07阴极铜环电极,08钼注气管,09 阴极陶瓷盖,10引入电极中间绝缘,11陶瓷垫圈,12能量引入压线铜鼻,13陶瓷绝缘盒, 14阳极陶瓷盖,15钼垫圈,阴极06和阳极01之间用陶瓷垫圈11和钼垫圈15交替叠填充,内部陶瓷筒03套在垫圈外部,内部陶瓷筒03两端分别嵌入阴极06和阳极01的凹槽内,内部陶瓷筒03外再套上中间陶瓷筒04,中间陶瓷筒04的两端与阴极06和阳极01的内部端面相接,最后,开有装配孔的外部陶瓷筒05套在中间陶瓷筒04外,两端分别与阴极06和阳极01的外端面平齐,有装配孔的阴极陶瓷盖09平铺于阴极06的外端面并与阴极06共轴,有装配孔的阳极陶瓷盖14平铺于阳极01外端面并与阳极01共轴,调节阴极陶瓷盖09和阳极陶瓷盖14使它们装配孔与外部陶瓷筒05的装配孔共轴,使用丝杆来固定整个等离子体源。As shown in Figure 1, an efficient and stable arc plasma source, including 01 anode, 02 anode copper ring electrode, 03 inner ceramic cylinder, 04 middle ceramic cylinder, 05 outer ceramic cylinder, 06 cathode, 07 cathode copper ring electrode, 08 Molybdenum gas injection pipe, 09 Cathode ceramic cover, 10 Introduce electrode intermediate insulation, 11 Ceramic gasket, 12 Energy introduction pressure wire copper nose, 13 Ceramic insulation box, 14 Anode ceramic cover, 15 Molybdenum gasket, used between cathode 06 and anode 01 The ceramic gasket 11 and the molybdenum gasket 15 are alternately stacked and filled, the inner ceramic cylinder 03 is set outside the gasket, the two ends of the inner ceramic cylinder 03 are respectively embedded in the grooves of the cathode 06 and the anode 01, and the inner ceramic cylinder 03 is covered with the middle ceramic cylinder 04 , the two ends of the middle ceramic cylinder 04 are connected to the inner end faces of the cathode 06 and the anode 01, and finally, the outer ceramic cylinder 05 with assembly holes is set outside the middle ceramic cylinder 04, and the two ends are respectively connected to the outer surface of the cathode 06 and the anode 01. The end faces are flush, and the cathode ceramic cover 09 with assembly holes is tiled on the outer end surface of the cathode 06 and is coaxial with the cathode 06. The anode ceramic cover 14 with assembly holes is tiled on the outer end surface of the anode 01 and is coaxial with the anode 01. The cathode ceramic cover 09 and the anode ceramic cover 14 make their mounting holes coaxial with the mounting holes of the external ceramic cylinder 05, and screw rods are used to fix the entire plasma source.
所述的陶瓷器件都是使用氮化硼作为材料加工而成。The ceramic devices are all processed by using boron nitride as a material.
所述丝杆是M8的316不锈钢丝杆,其穿过阳极陶瓷盖14、外部陶瓷筒05和阴极陶瓷盖09上的6个通孔,在阴极06和阳极01上拧上螺帽固定,最后加上陶瓷绝缘。Described screw mandrel is the 316 stainless steel screw mandrel of M8, and it passes 6 through holes on the anode ceramic cover 14, external ceramic cylinder 05 and cathode ceramic cover 09, screw on the nut on cathode 06 and anode 01 and fix, finally Plus ceramic insulation.
所述的能量引入压线铜鼻子12是由紫铜做成,一端紧压外部引入的电极线,另外一端与阳极引入铜环电极02或阴极引入铜环电极07的电极臂通过螺帽紧压。The energy introduction pressure wire copper nose 12 is made of red copper, one end tightly presses the electrode wire introduced from the outside, and the other end is tightly pressed with the electrode arm of the anode lead copper ring electrode 02 or the cathode lead copper ring electrode 07 through a nut.
所述的引入电极中间绝缘10是两片氮化硼陶瓷槽,套在阴极引入铜环电极07或阳极引入铜环电极02的电极臂上起过度绝缘作用,两片引入电极中间绝缘通过陶瓷胶粘合在一起。The lead-in electrode intermediate insulation 10 is two boron nitride ceramic tanks, which are placed on the electrode arm of the cathode lead-in copper ring electrode 07 or the anode lead-in copper ring electrode 02 to play an over-insulation role, and the two lead-in electrodes are insulated through ceramic glue glued together.
所述的陶瓷绝缘盒13是由氮化硼陶瓷做成,由两片对称拼接而成,每一片的一侧开方形槽,相邻的一侧开半圆槽,这样就可以在阴极引入铜环电极07或阳极引入铜环电极02的电极臂与能量引入压线铜鼻12之间起过度绝缘作用,两片陶瓷绝缘盒由陶瓷胶粘合在一起。The ceramic insulating box 13 is made of boron nitride ceramics, and is formed by two symmetrical splicing. One side of each piece is opened with a square groove, and the adjacent side is opened with a semicircular groove, so that the copper ring can be introduced into the cathode. The electrode 07 or the electrode arm of the anode lead-in copper ring electrode 02 and the energy lead-in pressure wire copper lug 12 act as over-insulation, and the two ceramic insulating boxes are bonded together by ceramic glue.
上述实例是说明性质的,不是限制性质的,其他变化都属于保护范围。The above examples are illustrative, not restrictive, and other variations are within the scope of protection.
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201721855171.8U CN207820298U (en) | 2017-12-27 | 2017-12-27 | An Efficient and Stable Arc Plasma Source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201721855171.8U CN207820298U (en) | 2017-12-27 | 2017-12-27 | An Efficient and Stable Arc Plasma Source |
Publications (1)
Publication Number | Publication Date |
---|---|
CN207820298U true CN207820298U (en) | 2018-09-04 |
Family
ID=63331187
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201721855171.8U Expired - Fee Related CN207820298U (en) | 2017-12-27 | 2017-12-27 | An Efficient and Stable Arc Plasma Source |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN207820298U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107995767A (en) * | 2017-12-27 | 2018-05-04 | 中国科学技术大学 | A kind of arc plasma source of efficient stable |
CN109951945A (en) * | 2019-03-14 | 2019-06-28 | 中国科学院合肥物质科学研究院 | A flat large-area high-density DC arc discharge plasma source |
-
2017
- 2017-12-27 CN CN201721855171.8U patent/CN207820298U/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107995767A (en) * | 2017-12-27 | 2018-05-04 | 中国科学技术大学 | A kind of arc plasma source of efficient stable |
CN109951945A (en) * | 2019-03-14 | 2019-06-28 | 中国科学院合肥物质科学研究院 | A flat large-area high-density DC arc discharge plasma source |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN105407621B (en) | A kind of compact D D accelerators for neutron production | |
CN101582367B (en) | Pulse type large beam spot electronic beam generating device | |
CN205124106U (en) | Compact D -D neutron generator | |
CN207820298U (en) | An Efficient and Stable Arc Plasma Source | |
CN103079328B (en) | A kind of medium blocking discharge electrode and preparation method thereof | |
CN108770172A (en) | A kind of DC arc plasma jet for hazardous waste disposal | |
CN104113314B (en) | Laser trigger vacuum switch and switch system | |
CN107995767A (en) | A kind of arc plasma source of efficient stable | |
CN104157538A (en) | High-power continuous wave klystron for Tokamak device | |
CN203165843U (en) | Glow discharge cleaning structure | |
CN105764225B (en) | A kind of compact type large power hollow cathode discharge device | |
CN205681690U (en) | A kind of high line direct current hollow-cathode plasma source | |
CN116528449A (en) | Pulse mode multi-peak field built-in antenna type radio frequency strong current negative hydrogen ion source | |
CN203715276U (en) | Ozone generating unit and ozone generator applying same | |
CN105764227A (en) | High-beam direct-current hollow cathode plasma source | |
CN109951945A (en) | A flat large-area high-density DC arc discharge plasma source | |
CN101582364B (en) | Anti-metal spraying double-cup ion source filament seat structure | |
CN106356276A (en) | Ion-source gasification discharge device for electromagnetic separator of isotopes | |
CN104934280A (en) | External grid-controlled cold cathode array electron gun | |
CN103118478A (en) | Pulse penning discharge big-aperture plasma generating device | |
CN201690672U (en) | Atmospheric pressure direct current arc electric discharge plasma generating device | |
CN203498082U (en) | Double-water-cooling ozone discharge chamber | |
CN204155898U (en) | A kind of cold cathode producing cylindrical many note INTENSE RELATIVISTIC ELECTRON BEAM | |
CN206931551U (en) | Lead interior crossing type multi-level depressurization collector | |
CN112863993B (en) | Large-throughput microwave plasma reaction cavity |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20180904 |
|
CF01 | Termination of patent right due to non-payment of annual fee |