CN107995767A - A kind of arc plasma source of efficient stable - Google Patents
A kind of arc plasma source of efficient stable Download PDFInfo
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- 239000000919 ceramic Substances 0.000 claims abstract description 95
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 44
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 20
- 239000011733 molybdenum Substances 0.000 claims abstract description 20
- 238000002347 injection Methods 0.000 claims abstract description 17
- 239000007924 injection Substances 0.000 claims abstract description 17
- 238000009413 insulation Methods 0.000 claims abstract description 13
- 229910052802 copper Inorganic materials 0.000 claims abstract description 12
- 239000010949 copper Substances 0.000 claims abstract description 12
- 238000002788 crimping Methods 0.000 claims abstract description 8
- 238000012856 packing Methods 0.000 claims abstract 4
- 239000011324 bead Substances 0.000 claims abstract 2
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 2
- 238000002955 isolation Methods 0.000 claims 1
- 230000007935 neutral effect Effects 0.000 abstract description 3
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 7
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 229910052582 BN Inorganic materials 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910000619 316 stainless steel Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- H—ELECTRICITY
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- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
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Abstract
Description
技术领域technical field
本发明属于基础等离子体研究领域，具体涉及一种高效稳定的电弧等离子体源。The invention belongs to the field of basic plasma research, and in particular relates to an efficient and stable arc plasma source.
背景技术Background technique
目前等离子体源主要有螺旋波等离子体源和氧化物阴极等离子体源。然而螺旋波等离子体源和氧化物阴极等离子体源，所产生的等离子体温度密度低、资源利用率低、不能稳定的产生等离子体，以及产生等离子体方式不灵活等缺点；At present, the plasma sources mainly include helicon wave plasma source and oxide cathode plasma source. However, the helicon wave plasma source and the oxide cathode plasma source have disadvantages such as low temperature density of plasma, low resource utilization rate, unstable plasma generation, and inflexible plasma generation methods;
1、螺旋波和氧化物阴极等离子体源都需要持续注气来保证等离子体的产生，而它们的电离度又不高，这样产生的等离子体温度和密度都比较低，而且对于气体和电源的能量的利用率低，造成资源的浪费；1. Both helicon wave and oxide cathode plasma sources need continuous gas injection to ensure the generation of plasma, and their ionization degree is not high, so the temperature and density of the generated plasma are relatively low, and the gas and power supply The utilization rate of energy is low, resulting in waste of resources;
2、螺旋波等离子体需要通过匹配器匹配才完成能量耦合，电离气体来产生等离子体，而且随着等离子体参数和气体参数变化，匹配就会变化，所以能量耦合存在着一些问题，不能稳定的产生等离子体，；2. The helicon wave plasma needs to be matched by a matcher to complete the energy coupling. The ionized gas is used to generate the plasma, and as the plasma parameters and gas parameters change, the matching will change, so there are some problems in the energy coupling, which cannot be stabilized. generate plasma,
3、氧化物阴极是通过加热阴极材料产生少量的电子，然后通过加速栅来增加电子能量，被加速后的电子与中性气体碰撞产生等离子体的，这种等离子体温度密度低，而且引入了大量的杂质，而且加热氧化物产生的巨大热量也不利于物理实验进行，此外氧化物的制备也比较繁琐，这种方式很不灵活；3. The oxide cathode generates a small amount of electrons by heating the cathode material, and then increases the energy of the electrons through the acceleration grid. The accelerated electrons collide with the neutral gas to generate plasma. This plasma has a low temperature density and introduces A large number of impurities, and the huge heat generated by heating the oxide is not conducive to the physical experiment, and the preparation of the oxide is also cumbersome, and this method is very inflexible;
4、由于螺旋波存在能量耦合问题，而氧化物阴极也存在能量耦合问题，所以二者的能量利用率很低；4. Due to the energy coupling problem of the helicon wave and the energy coupling problem of the oxide cathode, the energy utilization rate of the two is very low;
基于以上问题，在基础等离子体物理研究和等离子体应用领域需要能量和资源利用率高、能灵活并且高效稳定的产生等离子体的等离子体源。Based on the above problems, a plasma source with high energy and resource utilization, flexible, efficient and stable plasma generation is required in the fields of basic plasma physics research and plasma applications.
发明内容Contents of the invention
本发明的目的是要克服现有的螺旋波等离子体需要持续注气、等离子体的温度和密度低的缺点，氧化阴极等离子体的温度和密度低，以及引入杂质等缺点，设计一款能够高效稳定产生等离子体参数好，且纯净的等离子体源。The purpose of the present invention is to overcome the shortcomings of the existing helicon wave plasma that requires continuous gas injection, low plasma temperature and density, low temperature and density of the oxidized cathode plasma, and the introduction of impurities, etc., to design a high-efficiency It can stably generate a pure plasma source with good plasma parameters.
本发明采用的技术方案是：一种高效稳定的电弧等离子体源，包括阳极、阳极铜环电极、内部陶瓷筒、中间陶瓷筒、外部陶瓷筒、阴极、阴极铜环电极、钼注气管、阴极陶瓷盖、引入电极中间绝缘、陶瓷垫圈、能量引入压线铜鼻、陶瓷绝缘盒、阳极陶瓷盖和钼垫圈，阴极和阳极共轴装配，阴极和阳极之间用陶瓷垫圈和钼垫圈交替叠填充，内部陶瓷筒套在垫圈外部，内部陶瓷筒两端分别嵌入阴极和阳极的凹槽内，内部陶瓷筒外再套上中间陶瓷筒，中间陶瓷筒的两端与阴极和阳极的内部端面相接，最后，开有装配孔的外部陶瓷筒套在中间陶瓷筒外，两端分别于阴极和阳极的外端面平齐，有装配孔的阴极陶瓷盖平铺于阴极的外端面并与阴极共轴，有装配孔的阳极陶瓷盖平铺于阳极外端面并与阳极共轴，调节阴极陶瓷盖和阳极陶瓷盖使它们的装配孔与外部陶瓷筒的装配孔共轴，使用丝杆来固定整个等离子体源。The technical scheme adopted in the present invention is: a high-efficiency and stable arc plasma source, including anode, anode copper ring electrode, inner ceramic cylinder, middle ceramic cylinder, outer ceramic cylinder, cathode, cathode copper ring electrode, molybdenum gas injection tube, cathode Ceramic cover, lead-in electrode intermediate insulation, ceramic gasket, energy introduction crimping copper lug, ceramic insulation box, anode ceramic cover and molybdenum gasket, cathode and anode are coaxially assembled, and the space between cathode and anode is filled alternately with ceramic gasket and molybdenum gasket , the inner ceramic cylinder is set on the outside of the gasket, the two ends of the inner ceramic cylinder are embedded in the grooves of the cathode and the anode respectively, and the inner ceramic cylinder is covered with the middle ceramic cylinder, and the two ends of the middle ceramic cylinder are connected with the inner end faces of the cathode and the anode , and finally, the outer ceramic cylinder with assembly holes is placed outside the middle ceramic cylinder, and the two ends are respectively flush with the outer end surfaces of the cathode and anode, and the cathode ceramic cover with assembly holes is laid flat on the outer end surface of the cathode and coaxial with the cathode , the anode ceramic cover with assembly holes is laid flat on the outer end surface of the anode and coaxial with the anode, adjust the cathode ceramic cover and anode ceramic cover so that their assembly holes are coaxial with the assembly holes of the external ceramic cylinder, and use a screw to fix the entire plasma body source.
进一步地，上述阳极铜环电极是一个内径70mm外径90mm的铜环，圆环中心位置均匀的开十二个沉头螺纹孔，环的外侧有两个对称的电极臂。Further, the anode copper ring electrode is a copper ring with an inner diameter of 70 mm and an outer diameter of 90 mm. Twelve countersunk threaded holes are evenly opened in the center of the ring, and there are two symmetrical electrode arms on the outside of the ring.
进一步地，上述阳极由金属钼做成，是一个圆柱的U形结构，外端面开有一个喇叭形出口，阳极外端面还开有一个内径70mm外径90mm，厚度3mm的环形槽，槽中间圆环内均匀的分布十二个螺纹孔，阳极铜环电极就装配这个环形槽上。Further, the above-mentioned anode is made of metal molybdenum, which is a cylindrical U-shaped structure, with a trumpet-shaped outlet on the outer end surface, and an annular groove with an inner diameter of 70mm and an outer diameter of 90mm, and a thickness of 3mm. The middle of the groove is round. Twelve threaded holes are evenly distributed in the ring, and the anode copper ring electrode is assembled on this ring groove.
进一步地，上述阳极铜环电极是一个内径70mm外径90mm的铜环，圆环中心位置均匀的开十二个沉头螺纹孔，环的外侧有一个电极臂。Further, the anode copper ring electrode is a copper ring with an inner diameter of 70 mm and an outer diameter of 90 mm. Twelve countersunk threaded holes are evenly opened in the center of the ring, and an electrode arm is provided on the outside of the ring.
进一步地，上述阴极有金属钼做成，其内部圆柱开喇叭口，内圆柱和外圆柱之间开有一个与内部陶瓷筒壁厚一致的固定槽口，并且整个阴极中间开一个与阴极同轴的注气孔，在阴极外端面还开有一个内径70mm外径90mm，厚度3mm的环形槽，槽中间圆环内均匀的分布十二个螺纹孔，阴极铜环电极就装配这个环形槽上。Further, the above-mentioned cathode is made of metal molybdenum, the inner cylinder has a bell mouth, and a fixed notch is opened between the inner cylinder and the outer cylinder, which is consistent with the wall thickness of the inner ceramic cylinder, and a hole coaxial with the cathode is opened in the middle of the entire cathode. There is an annular groove with an inner diameter of 70mm and an outer diameter of 90mm and a thickness of 3mm on the outer end of the cathode. Twelve threaded holes are evenly distributed in the ring in the middle of the groove. The cathode copper ring electrode is assembled on this annular groove.
进一步地，压线铜鼻子是一端开有直径8mm深15mm的孔，另外一端是一个M8的螺柱。Furthermore, the crimping copper lug has a hole with a diameter of 8mm and a depth of 15mm at one end, and an M8 stud at the other end.
进一步地，阴极铜环电极和阳极铜环电极的电极臂都开有一个8mm通孔，压线铜鼻子通过这个孔与铜环电极相连，把外部能量引入用于产生等离子体。Furthermore, the electrode arms of the cathode copper ring electrode and the anode copper ring electrode have an 8mm through hole, and the crimping copper nose is connected with the copper ring electrode through this hole, and external energy is introduced to generate plasma.
进一步地，上述钼注气管通过螺纹与阴极注气孔相连，另外一侧与外部的绝缘材质的注气管相连，并与注气截止阀相连，以脉冲模式把工作质气体注入电离通道。Further, the above-mentioned molybdenum gas injection pipe is connected to the cathode gas injection hole through threads, and the other side is connected to the external gas injection pipe of insulating material, and connected to the gas injection shut-off valve to inject the working gas into the ionization channel in pulse mode.
本发明的优点和积极效果为：Advantage of the present invention and positive effect are:
(1)本发明一种高效稳定的电弧等离子体源工作在脉冲模式下，只需要脉冲注气，减小等离子体中的中性工作质气体，减少工作质气体使用量，在真空下使用时有利于提高等离子体的参数。(1) An efficient and stable arc plasma source of the present invention works in pulse mode, only needs pulse gas injection, reduces the neutral working gas in the plasma, reduces the usage of working gas, and when used under vacuum It is beneficial to improve the parameters of the plasma.
(2)本发明一种高效稳定的电弧等离子体源产生等离子体是使用电弧放电模式，能量利用率高，和氧化物阴极比起来不需要冷却装置，运行简便、耗能少，而且等离子体中的杂质少。(2) A kind of highly efficient and stable arc plasma source of the present invention produces plasma is to use arc discharge mode, and energy utilization rate is high, does not need cooling device compared with oxide cathode, and operation is simple and easy, consumes less energy, and in plasma less impurities.
(3)本发明一种高效稳定的电弧等离子体源产生的等离子体束流强度高，参数高，参数可以根据注气和外部电源控制，有利于物理研究和工业应用中的参数控制。(3) The plasma beam intensity produced by an efficient and stable arc plasma source of the present invention is high, and the parameters are high, and the parameters can be controlled according to gas injection and external power supply, which is beneficial to the parameter control in physical research and industrial application.
(4)本发明一种高效稳定的电弧等离子体源与螺旋波等离子体和氧化阴极等离子体等比起来要结构灵巧，可根据需求方便的缩放尺寸。(4) Compared with the helicon wave plasma and the oxidizing cathode plasma, the efficient and stable arc plasma source of the present invention has a smarter structure, and can be conveniently scaled according to requirements.
附图说明Description of drawings
图1是本发明的一种高效稳定的电弧等离子体源的装配剖面示意图。Fig. 1 is a schematic sectional view of an assembly of an efficient and stable arc plasma source according to the present invention.
图2是本发明的一种高效稳定的电弧等离子体源的阳极。Fig. 2 is an anode of an efficient and stable arc plasma source of the present invention.
图3是本发明的一种高效稳定的电弧等离子体源的阴极。Fig. 3 is a cathode of an efficient and stable arc plasma source of the present invention.
图4是本发明的一种高效稳定的电弧等离子体源的阳极铜环电极。Fig. 4 is an anode copper ring electrode of an efficient and stable arc plasma source of the present invention.
图5是本发明的一种高效稳定的电弧等离子体源的阴极铜环电极。Fig. 5 is a cathode copper ring electrode of an efficient and stable arc plasma source of the present invention.
图中：01、阳极，02、阳极铜环电极，03、内部陶瓷筒，04、中间陶瓷筒，05、外部陶瓷筒，06、阴极，07、阴极铜环电极，08、钼注气管，09、阴极陶瓷盖，10、引入电极中间绝缘，11、陶瓷垫圈，12、能量引入压线铜鼻，13、陶瓷绝缘盒，14、阳极陶瓷盖，15、钼垫圈。In the figure: 01, anode, 02, anode copper ring electrode, 03, inner ceramic cylinder, 04, middle ceramic cylinder, 05, outer ceramic cylinder, 06, cathode, 07, cathode copper ring electrode, 08, molybdenum gas injection tube, 09 1. Cathode ceramic cover, 10. Introducing electrode intermediate insulation, 11. Ceramic gasket, 12. Energy introduction crimping copper nose, 13. Ceramic insulation box, 14. Anode ceramic cover, 15. Molybdenum washer.
具体实施方式Detailed ways
以下结合附图和实施方式，对技术方案做详细说明。The technical solution will be described in detail below in conjunction with the accompanying drawings and embodiments.
如图1所示，一种高效稳定的电弧等离子体源，包括01阳极、02阳极铜环电极、03内部陶瓷筒、04中间陶瓷筒、05外部陶瓷筒、06阴极、07阴极铜环电极、08钼注气管、09阴极陶瓷盖、10引入电极中间绝缘、11陶瓷垫圈、12能量引入压线铜鼻、13陶瓷绝缘盒、14阳极陶瓷盖、15钼垫圈，阴极06和阳极01之间用陶瓷垫圈11和钼垫圈15交替叠填充，内部陶瓷筒03套在垫圈外部，内部陶瓷筒03两端分别嵌入阴极06和阳极01的凹槽内，内部陶瓷筒03外再套上中间陶瓷筒04，中间陶瓷筒04的两端与阴极06和阳极01的内部端面相接，最后，开有装配孔的外部陶瓷筒05套在中间陶瓷筒外04，两端分别于阴极06和阳极01的外端面平齐，有装配孔的阴极陶瓷盖09平铺于阴极06的外端面并与阴极06共轴，有装配孔的阳极陶瓷盖14平铺于阳极01外端面并与阳极01共轴，调节阴极陶瓷盖09和阳极陶瓷盖14使它们装配孔与外部陶瓷筒05的装配孔共轴，使用丝杆来固定整个等离子体源。As shown in Figure 1, an efficient and stable arc plasma source, including 01 anode, 02 anode copper ring electrode, 03 inner ceramic cylinder, 04 middle ceramic cylinder, 05 outer ceramic cylinder, 06 cathode, 07 cathode copper ring electrode, 08 Molybdenum gas injection pipe, 09 Cathode ceramic cover, 10 Inlet electrode intermediate insulation, 11 Ceramic gasket, 12 Energy introduction pressure wire copper nose, 13 Ceramic insulation box, 14 Anode ceramic cover, 15 Molybdenum gasket, used between cathode 06 and anode 01 The ceramic gasket 11 and the molybdenum gasket 15 are alternately stacked and filled, the inner ceramic cylinder 03 is set outside the gasket, the two ends of the inner ceramic cylinder 03 are respectively embedded in the grooves of the cathode 06 and the anode 01, and the inner ceramic cylinder 03 is covered with the middle ceramic cylinder 04 , the two ends of the middle ceramic cylinder 04 are connected to the inner end faces of the cathode 06 and the anode 01, and finally, the outer ceramic cylinder 05 with assembly holes is set on the outer surface of the middle ceramic cylinder 04, and the two ends are respectively connected to the outer surface of the cathode 06 and the anode 01. The end faces are flush, and the cathode ceramic cover 09 with assembly holes is tiled on the outer end surface of the cathode 06 and is coaxial with the cathode 06. The anode ceramic cover 14 with assembly holes is tiled on the outer end surface of the anode 01 and is coaxial with the anode 01. The cathode ceramic cover 09 and the anode ceramic cover 14 make their mounting holes coaxial with the mounting holes of the external ceramic cylinder 05, and screw rods are used to fix the entire plasma source.
所述的陶瓷器件都是使用氮化硼作为材料加工而成。The ceramic devices are all processed by using boron nitride as a material.
所述丝杆是M8的316不锈钢丝杆，其穿过阳极陶瓷盖14、外部陶瓷筒05和阴极陶瓷盖09上的6个通孔，在阴极06和阳极01上拧上螺帽固定，最后加上陶瓷绝缘。Described screw mandrel is the 316 stainless steel screw mandrel of M8, and it passes 6 through holes on the anode ceramic cover 14, external ceramic cylinder 05 and cathode ceramic cover 09, screw on the nut on cathode 06 and anode 01 and fix, finally Plus ceramic insulation.
所述的能量引入压线铜鼻子12是由紫铜做成，一端紧压外部引入的电极线，另外一端与阳极引入铜环电极02或阴极引入铜环电极07的电极臂通过螺帽紧压。The energy introduction pressure wire copper nose 12 is made of red copper, one end tightly presses the electrode wire introduced from the outside, and the other end is tightly pressed with the electrode arm of the anode lead copper ring electrode 02 or the cathode lead copper ring electrode 07 through a nut.
所述的引入电极中间绝缘10是两片氮化硼陶瓷槽，套在阴极引入铜环电极07或阳极引入铜环电极02的电极臂上起过度绝缘作用，两片引入电极中间绝缘通过陶瓷胶粘合在一起。The lead-in electrode intermediate insulation 10 is two boron nitride ceramic tanks, which are placed on the electrode arm of the cathode lead-in copper ring electrode 07 or the anode lead-in copper ring electrode 02 to play an over-insulation role, and the two lead-in electrodes are insulated through ceramic glue glued together.
所述的陶瓷绝缘盒13是由氮化硼陶瓷做成，由两片对称拼接而成，每一片的一侧开方形槽，相邻的一侧开半圆槽，这样就可以在阴极引入铜环电极07或阳极引入铜环电极02的电极臂与能量引入压线铜鼻12之间起过度绝缘作用，两片陶瓷绝缘盒由陶瓷胶粘合在一起。The ceramic insulating box 13 is made of boron nitride ceramics, and is formed by two symmetrical splicing. One side of each piece is opened with a square groove, and the adjacent side is opened with a semicircular groove, so that the copper ring can be introduced into the cathode. The electrode 07 or the electrode arm of the anode lead-in copper ring electrode 02 and the energy lead-in pressure wire copper lug 12 act as over-insulation, and the two ceramic insulating boxes are bonded together by ceramic glue.
上述实例是说明性质的，不是限制性质的，其他变化都属于保护范围。The above examples are illustrative, not restrictive, and other variations are within the scope of protection.
Claims (8)
- A kind of 1. arc plasma source of efficient stable, it is characterised in that：Including anode, anode copper ring electrode, inner ceramic Cylinder, middle ceramic cylinder, external ceramic cylinder, cathode, tough cathode ring electrode, molybdenum air injection pipe, cathodic ceramic lid, introducing electrode centre are absolutely Edge, ceramic washer, energy introduce crimping copper nose, ceramic insulation box, anode ceramic cap and molybdenum packing ring, cathode and the coaxial dress of anode Match somebody with somebody, with the alternately folded filling of ceramic washer and molybdenum packing ring between cathode and anode, inner ceramic jacket casing is in bead outward, inner ceramic Cylinder both ends are respectively embedded into the groove of cathode and anode, put on middle ceramic cylinder outside inner ceramic cylinder again, and the two of middle ceramic cylinder End connects with the internal end surface of cathode and anode, finally, is provided with the external ceramic jacket casing of pilot hole outside middle ceramic cylinder, both ends Concordant with the outer end face of anode respectively at cathode, the cathodic ceramic lid for having pilot hole is laid in the outer end face of cathode and is total to cathode Axis, the anode ceramic cap for having pilot hole are laid in anode outer end face and, adjusting cathodic ceramic lid and anode ceramics coaxial with anode Lid makes their pilot hole coaxial with the pilot hole of external ceramic cylinder, and whole plasma source is fixed using screw.
- 2. arc plasma source according to claim 1, it is characterised in that：Above-mentioned anode copper ring electrode is an internal diameter 12 countersunk head threaded holes are uniformly opened in the copper ring of 70mm outside diameters 90mm, circle ring center position, have two on the outside of ring symmetrically Horn.
- 3. arc plasma source according to claim 1, it is characterised in that：Above-mentioned anode is made by metal molybdenum, is one The U-shaped structure of a cylinder, outer end face are provided with a flaring exit, and anode outer end face is also provided with an internal diameter 70mm outside diameter 90mm, the annular groove of thickness 3mm, uniformly 12 threaded holes of distribution, anode copper ring electrode just assemble this in groove middle circle On a annular groove.
- 4. arc plasma source according to claim 1, it is characterised in that：Above-mentioned anode copper ring electrode is an internal diameter The copper ring of 70mm outside diameters 90mm, circle ring center position uniformly open 12 countersunk head threaded holes, there is a horn on the outside of ring.
- 5. arc plasma source according to claim 1, it is characterised in that：Above-mentioned cathode has metal molybdenum to make, in it Portion's cylinder opens horn mouth, and one and the thick consistent fixed notch of inner ceramic barrel are provided between interior cylinder and outside cylinder, and An injecting hole coaxial with cathode is opened among whole cathode, an internal diameter 70mm outside diameter 90mm is also provided with cathode outer end face, The annular groove of thickness 3mm, uniformly 12 threaded holes of distribution, tough cathode ring electrode just assemble this annular in groove middle circle On groove.
- 6. arc plasma source according to claim 1, it is characterised in that：Crimping copper lug is that one end is provided with diameter The hole of 8mm depths 15mm, other end are the studs of a M8.
- 7. arc plasma source according to claim 1, it is characterised in that：Tough cathode ring electrode and anode copper ring electrode Horn be all provided with a 8mm through hole, crimping copper lug is connected by this hole with copper ring electrode, external energy introduce use In generation plasma.
- 8. arc plasma source according to claim 1, it is characterised in that：Above-mentioned molybdenum air injection pipe passes through screw thread and cathode Injecting hole is connected, and other side is connected with the air injection pipe of exterior isolation material, and is connected with gas injection stop valve, in a pulsed mode As received basis gas is injected ionization channels.
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| CN201711439940.0A CN107995767A (en) | 2017-12-27 | 2017-12-27 | A kind of arc plasma source of efficient stable |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112664963A (en) * | 2021-01-20 | 2021-04-16 | 杭州海莱德智能科技有限公司 | Ultralong plasma flame emitter |
| CN113660759A (en) * | 2021-08-12 | 2021-11-16 | 合肥综合性国家科学中心能源研究院(安徽省能源实验室) | A plasma source with large size and high emission current density |
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| CN112664963A (en) * | 2021-01-20 | 2021-04-16 | 杭州海莱德智能科技有限公司 | Ultralong plasma flame emitter |
| CN113660759A (en) * | 2021-08-12 | 2021-11-16 | 合肥综合性国家科学中心能源研究院(安徽省能源实验室) | A plasma source with large size and high emission current density |
| CN113660759B (en) * | 2021-08-12 | 2023-12-22 | 合肥综合性国家科学中心能源研究院(安徽省能源实验室) | Large-size high-emission current density plasma source |
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Application publication date: 20180504 |