CN103917499A - Method for producing glass substrate - Google Patents
Method for producing glass substrate Download PDFInfo
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- CN103917499A CN103917499A CN201280050824.9A CN201280050824A CN103917499A CN 103917499 A CN103917499 A CN 103917499A CN 201280050824 A CN201280050824 A CN 201280050824A CN 103917499 A CN103917499 A CN 103917499A
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- glass
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- glass substrate
- interarea
- chemical grinding
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Chemical Kinetics & Catalysis (AREA)
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- Geochemistry & Mineralogy (AREA)
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- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
Provide is a method for producing glass substrates, whereby in a single wafer process chemical polishing device, it is possible to divide a single glass matrix of sheet form to into a plurality of glass substrates. The present invention is a method for producing glass substrate, for application in a chemical polishing device constituted to carry out chemical polishing treatment out on a plurality of continuously conveyed glass substrates. The chemical polishing device is equipped at least with a conveying section and a polishing treatment section. In the chemical polishing device, the amount of chemical polishing solution sprayed onto the glass matrix from the upper side, and the amount of chemical polishing solution sprayed onto the glass matrix from the lower side, are respectively adjusted, thereby causing partitioning slots formed on a first principal surface and partitioning slots formed on a second principal surface to penetrate through at locations offset by predetermined amounts from the center of the glass matrix in the thickness direction.
Description
Technical field
The present invention relates to the manufacture method of the glass substrate of the chemical abrasive device that a kind of mode being applicable to multiple glass substrates of conveyance are continuously carried out to chemical grinding processing forms.
Background technology
For by glass substrate slimming, in general need to use the chemical grinding liquid that contains hydrofluoric acid to carry out chemical grinding processing to glass substrate.As this kind of chemical grinding processing, can enumerate the glass substrate that should process and in the groove that has added chemical grinding liquid, flood the batch-type chemical grinding of specified time and in the glass substrate that should process carrying roller successively conveyance, spray the one chip chemical grinding of chemical grinding liquid.
In the middle of the mode of these chemical grindings, with regard to the grinding of batch mode, by the glass substrate that should process in lapping liquid bath, flood the specified time and by thinning glass substrate to required thickness of slab, having advantages of can a large amount of glass substrate of primary treatment.But the grinding of batch mode at least has following problem.
First,, in the grinding of batch mode, lapping liquid bath opens wide upward, thereby structurally, the surrounding with lapping liquid bath becomes the problem of dense hydrofluoric acid atmosphere.Particularly, in the case of the lapping liquid of lapping liquid bath is carried out bubbling processing, have the problem that gasiform hydrofluoric acid easily spreads towards periphery.Just operate if the operator who operates in this kind of hydrofluoric acid atmosphere does not have to be equipped with oneself suitable protection-gear, likely health is caused damage.Thus, the cost of protection-gear paying for operator uprises.
In addition, in the grinding of batch mode, for the surrounding of lapping liquid bath being eliminated to dense hydrofluoric acid atmosphere, need to there be the exhaust equipments such as powerful aircleaner, thereby have increased equipment cost.In addition, the corrosion that also easily produces equipment because of hydrofluoric acid gas, therefore also can the appropriate anti-corrosive treatment of promising enforcement and strengthen cost, become the problem that strengthens greatly cost because of the replacement frequency of equipment.
So, in recent years, have the situation of the chemical grinding processing that uses single chip mode.For example, in the middle of conventional art, have the flat panel display glass substrate etching system of following formation,, the longitudinally supporting glass substrate of fixture that utilization can make glass substrate adhere to sprays chemical grinding liquid (for example, with reference to patent documentation 1 to glass substrate in this fixture of conveyance.)。
Formerly technical literature
Patent documentation
Patent documentation 1: TOHKEMY 2008-266135 communique
Summary of the invention
The summary of invention
Invent problem to be solved
But, in the technology of recording in patent documentation 1, owing to being that the mode of processing so that glass substrate is supported with plumbness when forms, although therefore can implement rightly the slimming of glass substrate, but have the not good situation that is unsuitable for the glass baseplate of 1 plate sheet shape to be divided into the processing of multiple glass substrates.Its reason is because in the situation that glass substrate is configured with plumbness, in the time that glass is divided into multiple small pieces, the small pieces that are partitioned into will fall because of gravity.Thus, cannot be by the technology of recording in patent documentation 1 for obtaining the processing of multiple glass substrates from large-scale glass baseplate.
The present invention completes in view of the above-mentioned problems, and a kind of manufacture method of glass substrate is provided, and can in the chemical abrasive device of single chip mode, the glass baseplate of 1 plate sheet shape be divided into multiple glass substrates.
For the method for dealing with problems
The invention provides the manufacture method of the glass substrate of the chemical abrasive device that a kind of mode being applicable to multiple glass substrates of conveyance are continuously carried out to chemical grinding processing forms.Chemical abrasive device at least possesses conveying unit and milled processed portion.Conveying unit possesses multiple carrying rollers of following formation, that is, and and by using across opening the glass baseplate along continuous straight runs conveyance that is formed with resist layer as the mode of the section line of the position that should cut at the first interarea and the second interarea.Chemical grinding liquid sprays and the section line of etching glass base material from above-below direction to the glass baseplate by conveying unit conveyance in milled processed portion.
In this kind of chemical abrasive device, the amount of the chemical grinding liquid by adjusting respectively the amount of the chemical grinding liquid spraying from upper side direction glass baseplate and spray from lower side direction glass baseplate, and make to be formed at the subregion groove in the first interarea and the subregion groove that is formed in the second interarea connects in the position of the misalignment specified amount of the thickness direction from glass baseplate.
In this formation, can prevent from being formed at the subregion groove in the first interarea and be formed at subregion groove in the second interarea and connect in the central position of the thickness direction of glass baseplate.Thus, even in the situation that glass baseplate has been carried out to the intensive treatment such as chemical enhanced processing in advance, also can not produce the ground such as break glass baseplate is divided into multiple glass substrates.In addition, because the chemical abrasive device that can utilize one chip carries out this kind of processing, therefore the security of operation improves.
The effect of invention
According to above-mentioned the present invention, can in the chemical abrasive device of single chip mode, the glass baseplate of 1 plate sheet shape be divided into multiple glass substrates.
Accompanying drawing explanation
Fig. 1 is the figure that represents the outward appearance of the one chip chemical abrasive device of embodiments of the present invention.
Fig. 2 is the figure that represents the summary formation of one chip chemical abrasive device.
Fig. 3 is the figure that represents the summary formation of one chip chemical abrasive device.
Fig. 4 is the figure that represents the summary formation of the first treatment chamber.
Fig. 5 is the figure that represents the summary formation for the treatment of solution feed mechanism.
Fig. 6 is the figure that represents the summary formation of crank mechanism.
Fig. 7 is the figure of the processing in explanation pre-treatment chamber.
Fig. 8 represents to utilize the chemical abrasive device figure of an example of the general survey of the glass baseplate of cutting process in addition.
Fig. 9 represents to utilize the chemical abrasive device figure of an example of the general survey of the glass baseplate of cutting process in addition.
Figure 10 represents to utilize the chemical abrasive device figure of another example of the general survey of the glass baseplate of cutting process in addition.
Figure 11 is the figure that represents the example of glass tray used in the embodiment of manufacture method of glass substrate.
Figure 12 is illustrated in the figure that accommodates the state of glass baseplate in glass tray.
Figure 13 represents that the glass tray that contains glass baseplate is by the figure of the state of conveyance.
Figure 14 is the figure representing the state of the subregion groove depth of the interarea of glass baseplate.
Figure 15 is the figure representing the state of the subregion groove depth of the interarea of glass baseplate.
Embodiment
Fig. 1 is the figure that represents the outward appearance of the chemical abrasive device 10 of the one chip of an example of embodiments of the present invention.In addition, Fig. 2 and Fig. 3 are the figure that represents the summary formation of chemical abrasive device 10.As shown in FIG. 1 to 3, chemical abrasive device 10 possesses the portion of moving into 12, pre-treatment chamber 14, the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22, the first transhipment department 28, the second transhipment department 30, the 3rd transhipment department 32, washing chamber 24, takes out of portion 26, treatment solution resettlement section 42, treatment solution supply unit 44 and water supply portion 46.
Move into portion 12 can receive move into by the automatic operation of operator's manual operation or mechanical manipulator etc. should slimming processing glass substrate 100.Pre-treatment chamber 14 receives the glass substrate 100 coming from moving into portion's 12 conveyances.The first treatment chamber 16 sprays chemical grinding liquid to the top and bottom of glass substrate 100 and by glass substrate slimming.The second treatment chamber 18, the 3rd treatment chamber 20 and the 4th treatment chamber 22 spray with the chemical grinding liquid of the first treatment chamber 16 same compositions further glass substrate slimming to the top and bottom of glass substrate respectively.The first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 link up multiple treatment chambers respectively.Washing chamber 24 is washed the glass substrate 100 via the 4th treatment chamber 22.Taking out of portion 26 can take out having passed through the glass substrate 100 that chemical grinding is processed and washing is processed.The glass substrate 100 that utilizes the automatic operation of operator's manual operation or mechanical manipulator etc. that arrival is taken out of to portion 26 moves out and reclaims from chemical abrasive device 10.,, the in the situation that of the further slimming of needs, glass substrate 100 is imported to chemical abrasive device 10 again, and in the situation that not needing further slimming, transfer to the operation of the back segments such as film formation process thereafter.
Treatment solution resettlement section 42 is connected with the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22 by recovery line 420.Treatment solution supply unit 44 is connected with the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22, the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 by feed flow pipeline 440.Water supply portion 46 is connected with pre-treatment chamber 14 and washing chamber 24 by water supply line 460.And, in Fig. 1, omit diagram for the water supply line 460 of recovery line 420, feed flow pipeline 440 and the rinse water of chemical abrasive device 10.
In above-mentioned chemical abrasive device 10, the operating space of the export mouth 300 of deriving except the introducing port 200 of importing pre-treatment chamber 14, from washing chamber 24 and a part for crank mechanism described later 36, pre-treatment chamber 14, the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22, the first transhipment department 28, the second transhipment department 30, the 3rd transhipment department and washing chamber 24 are used as overall resistance to air loss and watertightness and seal.Introducing port 200 and export mouth 300 present the thickness of slab, the width that are highly slightly larger than glass substrate 100 and are slightly larger than the wide shape of slit of horizontal stroke of glass substrate 100.In addition, connect each portion ground and dispose at grade multiple carrying rollers 50.When each carrying roller 50 is formed in the bottom surface of supporting glass substrate 100 to the carrying channel of the right-hand conveyance of diagram.
Here, conveyance speed should be preferably set to 100～800mm/ minute, is more preferably set as 300～550mm/ minute.In addition, the treatment time in the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20 and the 4th treatment chamber 22 is set as adding up to about 20 minutes in this embodiment, but is not limited thereto.In addition, if conveyance speed exceeds above-mentioned scope and excessively slow, not only production efficiency is poor, and chemical grinding liquid is easily trapped on glass substrate 100, thereby hinder uniform chemical grinding, the poorest in the situation that, likely bring out breaking of glass substrate 100.On the other hand, under identical unit scale, want to improve conveyance speed, the liquid composition of realizing this purpose is just difficult to optimizing, and result is to be difficult to realize uniform chemical grinding.
The glass substrate 100 that utilizes chemical abrasive device 10 to carry out slimming processing is not particularly limited, even but open the large-size glass substrate such as (1080 × 1230mm) and G6 size (1500 × 1800mm) for four of G8 size, chemical abrasive device 10 also can grind its upper and lower surface equably.In addition, not form chemical abrasive device 10 by the mode that fixture or carrier ground directly utilize carrying roller 50 to carry out conveyance glass substrate 100.
As mentioned above, the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22, the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 are communicated with the treatment solution supply unit 44 that has carried out temperature treatment via feed flow pipeline 440, and the chemical grinding liquid for the treatment of solution supply unit 44 is supplied with to each chamber with 40～42 ℃ of left and right.Here, the composition of chemical grinding liquid is preferably made as hydrofluoric acid 1～20 % by weight, hydrochloric acid 0～10 % by weight, remains the liquid composition for water.
In addition, pre-treatment chamber 14 and washing chamber 24 are communicated with water supply portion 46 via water supply line 460, and rinse water is supplied with to each chamber.And the Cleaning Wastewater of discharging in treatment chamber 14 and washing chamber 24 is discharged to sewage treatment equipment in the past.
On the other hand, as mentioned above, the bottom of the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20 and the 4th treatment chamber 22 is communicated with treatment solution resettlement section 42 via recovery line 420, and milled processed water is recycled.Because the bottom of the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 has respectively the bottom tilting towards adjacent treatment chamber, adjacent treatment chamber swimmingly therefore can lead the treatment solution in the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32.And, the milled processed water being recovered is after the precipitation and other processing of resultant of reaction, if the state that can recycle is sent to treatment solution supply unit 44, and is used as dense thick waste liquid and transfers to liquid waste disposal operation the situation of the state that can not recycle is next.
In addition, as shown in Figure 3, pre-treatment chamber 14, the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22 and washing chamber 24 are communicated with exhaust portion 34 via vent line 340, and the internal gas of each chamber is aspirated to exhaust portion 34.Here, because vent line 340 plays consistently effect, thereby the opening the export mouth 300 of deriving by the introducing port 200 of importing pre-treatment chamber 14, from washing chamber 24, a part that is formed at crank mechanism 36 is maintained negative pressure state, does not have the situation that gas spills through these openings of processing.
As shown in Figures 4 and 5, in the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22 and washing chamber 24, dispose respectively one group of (10) spray tube 444 (444U, 444L) extending along the conveyance direction of glass substrate 100 at the upper-lower position of carrying roller 50.Each spray tube 444 is hollow pitch tubes of vinylchlorid or Teflon (registered trademark) system, in a spray tube, is formed with multiple injection nozzles 446 with forming a line.In addition, above glass substrate 100, spray chemical grinding liquid from the upside spray tube 444U that is disposed at upside, spray chemical grinding liquid from the downside spray tube 444L that is disposed at downside to the bottom surface of glass substrate 100.On the other hand, from being disposed at the upside spray tube 242U spraywashing water above glass substrate washing chamber 24, the bottom surface spraywashing water from downside spray tube 242L to glass substrate 100.And, in the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32, be respectively equipped with spray tube 282 (282U, 282L), spray tube 302 (302U, 302L) and spray tube 322 (322U, 322L), above glass substrate 100 and bottom surface spray and the chemical grinding liquid of the first～four treatment chamber 18,20,22,24 same compositions.
The spray tube (242U, 242L) that is disposed at spray tube 282 (282U, 282L), spray tube 302 (302U, 302L) and the spray tube 322 (322U, 322L) in the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 and be disposed in washing chamber 24 is retained as stationary state.And the each spray tube 444 being disposed in the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22 utilizes crank mechanism 36 to swing.
As shown in Fig. 5 (A) and Fig. 5 (B), in this embodiment, the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20 and the 4th treatment chamber 22 dispose respectively 10 spray tubes 444 (444U, 444L) at upside and the downside of glass substrate 100.Fig. 5 (A) is the vertical view of spray tube 444 (444U, 444L), in each spray tube 444 (444U, 444L), is formed with for example 8 injection nozzles 446.
The head end side (diagram downside) of each spray tube 444 (444U, 444L) is closed, and is provided with hydrostatic control portion at its base end side.Hydrostatic control portion is by forming with the open and close valve 442 (442U, 442L) of spray tube 444 (444U, 444L) similar number (10), by adjusting the aperture of each open and close valve 442 (442U, 442L), can at random set the hydraulic pressure of the chemical grinding liquid of supplying with to each spray tube 444 (444U, 444L).For example, can hydraulic pressure difference be set to the hydraulic pressure of upside spray tube 444U and downside spray tube 444L, or in the spray tube 444 (444U, 444L) of central spray tube 444 (444U, 444L) and end, hydraulic pressure be arranged to hydraulic pressure difference.And, can utilize the metrical instrument 38 above that is disposed at chemical abrasive device 10 to confirm to the hydraulic pressure of the chemical grinding liquid of each spray tube 444 (444U, 444L) supply.
In this embodiment, the hydraulic pressure of the spray tube of middle position 444 (444U, 444L) is set as more bigger than the spray tube of peripheral position 444 (444U, 444L), the contact pressure of the middle position to glass substrate 100 or emitted dose are set as slightly higher than the contact pressure of the peripheral position to glass substrate 100 or emitted dose.Thus, the chemical grinding liquid that is ejected into the middle position of glass substrate 100 will move to the peripheral position of glass substrate swimmingly, make chemical grinding liquid be difficult to be trapped in glass substrate 100 above.Consequently, there is the roughly chemical grinding liquid of equivalent in 100 whole effects of glass substrate, thereby be easy to equably whole of grinding glass substrate 100.And, even at the hydraulic pressure that or not does not change spray tube 444 (444U, 444L) on width, chemical grinding liquid can not be trapped in the situation above of glass substrate 100 yet, might not on width, change the hydraulic pressure of spray tube 444 (444U, 444L), the hydraulic pressure of all spray tubes 444 (444U, 444L) is set as to homogeneous.
In addition, each spray tube 444 (444U, 444L) is because its two ends are by the rotatably shaft support such as bearing, and can be by crank mechanism 36 with approximately ± 30 ° of swings (oscillation) (with reference to Fig. 5 (B)).And Fig. 5 (B) is the figure that represents pendulum angle, rather than the figure of the spray regime of expression chemical grinding liquid.That is, due to from the injection nozzle 446 of spray tube 444 with horn-like ejection chemical grinding liquid, therefore its spray regime is greater than pendulum angle.
Crank mechanism 36 is as shown in Fig. 6 (A) and Fig. 6 (B), possess drive-motor 362 and transmission mechanism portion 364, this transmission mechanism portion 364 is converted to the revolving force of drive-motor 362 power that spray tube 444 (444U, 444L) is swung, and transmits to spray tube 444 (444U, 444L).The revolving force of drive-motor 362 is used as the power that swing arm 366 swings is transmitted to swing arm 366 via transmission arm.Swing arm 366 is supported with rotary state by the support 368 of the inner wall part of being located at chemical abrasive device 10.
On the other hand, the end of each spray tube 444 (444U, 444L) connects the next door for the treatment of chamber, be positioned at the part in outside for the treatment of chamber, the moment of torsion being provided with for transmitting necessary moment of torsion for the swing of spray tube 444 (444U, 444L) transmits arm 372,376.Moment of torsion transmit arm 372,376 respectively by keeping arm 370,374 with rotary state support.Keeping arm 370,374 links with state and the swing arm 366 that can rotate and can slide.
In the time utilizing the revolving force of drive-motor 362 that swing arm 366 is swung, keeping arm 370,374 will swing in linkage with swing arm 366 as shown in the arrow in figure.Transmit arm 372 from the power of keeping arm 370 via moment of torsion and be used as upwards side spray tube 444U transmission of moment of torsion.In addition, transmit arm 376 from the power of keeping arm 374 via moment of torsion and be used as the downward side spray tube of moment of torsion 444L transmission.Consequently, as shown in Fig. 6 (A) and Fig. 6 (B), upside spray tube 444U and downside spray tube 444L will be along with the orthogonal directions of the conveyance direction of glass substrate 100 and along approximately ± 30 ° of opposite directions rotations.And the rotating speed of drive-motor 362 has stipulated the number of oscillations of spray tube 444 (444U, 444L), and in this embodiment, be 10～30rpm left and right by the speed setting of drive-motor.
In the spray tube 444U of upside, form in its lower section injection nozzle 446U, in the spray tube 444L of downside, form in the above injection nozzle 446L, therefore approximately ± 30 ° of each injection nozzle rotations on one side, spray chemical grinding liquid (with reference to Fig. 5 (B)) to the top and bottom of glass substrate on one side.
Explanation in passing, in present embodiment, mutually divides the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20 and the 4th treatment chamber 22 that utilize identical liquid composition to carry out identical chemical grinding and cedes territory to arrange audaciously.Its reason is because by reducing the length of spray tube 444 (444U, 444L), prevent the bending of spray tube 444 (444U, 444L), and spray tube 444 (444U, 444L) is swung swimmingly.In addition also because lower the impact being caused by the thermal expansion of spray tube 444 (444U, 444L).By taking this kind of formation, just spray tube 444 (444U, 444L) and the distance of glass substrate 100 can be maintained to homogeneous, easily adjust the hydraulic pressure of the chemical grinding liquid spraying to glass substrate 100.In addition, because spray tube 444 (444U, 444L) swings swimmingly, and can make chemical grinding liquid flow down swimmingly above glass substrate 100, thus chemical grinding liquid be just difficult to be trapped in glass substrate 100 above.And, although the length of spray tube 444 (444U, 444L) is also relevant with caliber (liquor charging amount), but in general, be preferably restricted to below 2.5m, be more preferably restricted to below 2m.
In order at high speed glass substrate 100 to be carried out to chemical grinding, when need to increasing the liquor charging amount of chemical grinding liquid of warm-up mode, by being suitable length by the limitation of length of spray tube 444 (444U, 444L), just drive-motor 362 need not be maximized largely, and can utilize simple mechanism that multiple spray tubes 444 (444U, 444L) are swung swimmingly.
Next, use Fig. 7 (A)～Fig. 7 (C) to describe the formation of pre-treatment chamber 14.As previously mentioned, in pre-treatment chamber 14, closely dispose with the first treatment chamber 16 crank mechanism 36 that spray tube 444 (444U, 444L) is swung.Except above-mentioned formation, in pre-treatment chamber 14, the introducing port importing to the first treatment chamber 16 at glass substrate 100 disposes receives the opposed roll 146 of glass substrate 100 and the washing nozzle 142,144 to the top and bottom injection water of glass substrate 100.Be equipped with multiple washing nozzles 142,144 with all zones of the orthogonal direction (width) of the conveyance direction of glass substrate 100 with the interval of regulation.Here, set and contact pressure glass substrate 100 use opposed roll 146 and carrying roller 50 are gently being kept import the mode of the first treatment chamber 16.
In addition, washing nozzle 142,144 is set as to the introducing port injection water importing to the first treatment chamber 16 towards glass substrate 100.Thus, the glass substrate 100 importing in the first treatment chamber 16 is moistening fully state, can prevent inhomogeneous initial stage etching.; the first treatment chamber 16 is hydrofluoric acid gas atmosphere; if therefore the surface of glass substrate 100 is drying regime; have the danger of being corroded unevenly by hydrofluoric acid gas; but in the present embodiment; due to the surperficial water of glass substrate 100 is protected, therefore can in the first treatment chamber 16, start uniform etching thereafter.
In present embodiment, as shown in Fig. 7 (A)～Fig. 7 (C), washing nozzle 142 be with towards under the mode of injection water form, and washing nozzle 144 be with upward and towards the upstream side of the carrying channel of glass substrate 100 obliquely the mode of injection water form.Washing nozzle 144 with the result that the mode of injection water forms is obliquely upward, approach washing nozzle 142,144 o'clock at glass substrate 100, as shown in Fig. 7 (A) and Fig. 7 (B), can above glass substrate 100, supply feedwater from washing nozzle 144.Thus, just can on glass substrate 100, promptly be formed for protecting it to avoid the film of the water of the impact of hydrofluoric acid gas.And, in the time that glass substrate 100 approaches washing nozzle 144, the water spraying from washing nozzle 144 will be got to the bottom surface of glass substrate 100, therefore can utilize washing nozzle 144 to clean rightly the bottom surface of glass substrate 100, and can make it moistening rightly.
As mentioned above, by washing nozzle 142,144 is set in pre-treatment chamber 14, the glass substrate 100 that can prevent drying regime is exposed in hydrofluoric acid gas and by etching unevenly.In addition, can also prevent that glass substrate 100 from being sandwiched by opposed roll 146 and carrying roller 50 under drying regime, therefore can prevent between by opposed roll 146 and carrying roller 50 time in glass substrate 100 produce damage or glass substrate 100 occur stained.
Next, the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 are described.In the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32, dispose respectively spray tube 282, spray tube 302 and the spray tube 322 of stationary state at the upper-lower position of carrying channel.In addition, spray chemical grinding liquid from spray tube 282, spray tube 302, spray tube 322 to the top and bottom of glass substrate 100.In this embodiment, spray tube 282, spray tube 302 and spray tube 322 form respectively lapping liquid injection equipment of the present invention.
Here, although the empty space in also can processing the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 as glass grinding, but in these first transhipment departments 28, the second transhipment department 30 and the 3rd transhipment department 32, also spray audaciously in the present embodiment the chemical grinding liquid of same composition to glass substrate 100.Thus, just do not worry when by the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 that chemical grinding liquid is trapped on glass substrate or on the contrary when by the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 glass substrate 100 become somewhat dry, thereby can realize the glass grinding of high-quality.And, although spray tube 282, spray tube 302 and the spray tube 322 of the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32 are stationary state, but can not also fixed, but take shuttle-type formation.
Glass substrate 100 is successively by the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22, the first transhipment department 28, the second transhipment department 30 and the 3rd transhipment department 32, by chemical grinding in turn.After this, the discharge opeing of the glass substrate 100 of the chemical grinding in multiple stages that are through with on undertaken by the air knife 244 of outlet that is disposed at the 4th treatment chamber 22 cleaned by the rinse water receiving from the one group of spray tube 242 being disposed at washing chamber 24 after processing.The spray tube 242 that cleans use is stationary state, but also can take to make it the formation of swing.
In any case, at the latter end of clean, dispose upper and lower a pair of air knife 246, utilize the air from wherein spraying that the top and bottom of glass substrate 100 are promptly dry.The glass substrate of after this, discharging from the export mouth 300 of washing chamber 24 is by waiting for that the operator in the portion of taking out of 26 takes out, and completes a series of processing treatment.Configure separately air knife 244 by the leading portion at upper and lower a pair of air knife 246 like this, just can above glass substrate 100, promptly remove chemical grinding liquid, therefore can effectively prevent glass substrate 100 above by etching unevenly.
As mentioned above, according to the chemical abrasive device 10 of present embodiment, owing to carrying out chemical grinding in the space of having sealed, utilize the air-releasing mechanisms such as aircleaner almost to reclaim fully the poisonous gases such as the hydrofluoric acid gas producing in device, therefore hydrofluoric acid gas can not be diffused into around chemical monolithic devices 10 substantially.Consequently, compared with the situation of chemical abrasive device 10 operating environment around and the processing of batch-type chemical grinding, significantly improve.So, do not worry that operator's health worsens, and need in protection-gear, not spend cost yet.
In addition,, because the equipment of the surrounding that can prevent chemical abrasive device 10 is corroded by hydrofluoric acid gas, therefore can also reduce the maintenance cost of equipment.That is to say to there is the very large benefit that can be used for providing with cheap maintenance cost operating environment good for operator.
In addition, in the case of using the chemical abrasive device 10 of single chip mode, compared with the milled processed of batch mode, have advantages of and can improve operation efficiency, product quality.And according to chemical abrasive device 10, because thickness of slab precision improves, the yield rate therefore can estimate scribing time is stable.In addition, for cut surface planar strength, can make it to be better than the milled processed of batch mode.In addition,, due to the hydrofluoric acid loss not caused by bubbling, therefore can expect to obtain the effect of hydrofluoric acid cost cutting 15% left and right.
Next the processing that, is divided into multiple glass substrates to cutting the glass baseplate of 1 plate sheet shape with chemical abrasive device 10 describes.Fig. 8 (A) and Fig. 8 (B) express the general survey of utilizing the glass baseplate 102 that chemical abrasive device 10 processes.Glass baseplate 102 is imported into chemical abrasive device 10 being made up of with reticulation the member for example polyvinyl chloride etc. to hydrofluoric acid resistance in the first glass support part 70 of forming and the second supporting member 72 support.As the raw-material example of glass baseplate 102, can enumerate by the slim alumina silicate glass that turns to thickness of slab 0.5mm～1.2mm left and right.In the saltpetre melting salt of 350～450 ℃ of left and right, glass baseplate 102 is carried out to chemical enhanced processing.
Glass baseplate is being carried out after chemical enhanced processing; form and there is multiple chip areas (use region) of sensor element that touch panel uses etc. and the tectum (overcoat layer) of protective core panel region in the first interarea side, form acid proof resist layer at the first interarea and the second interarea more thereafter.Resist layer forms in the mode across the partitioned area of opening the live width 1mm～5mm left and right for subregion said chip region.For hydrofluoric acid resistant etching resist used in resist layer, can use various resists, for example use in this embodiment Nippon Paint Co., Ltd.'s system " オ プ ト " (registered trademark).
By glass baseplate 102 use the first glass support parts 70 and the second supporting member 72 are sandwiched, import and move into portion 12, and by glass baseplate 102 via pre-treatment chamber 14, the first～four treatment chamber 16,18,20,22 and washing chamber 24, guiding discharge portion 26.Suppose that at glass baseplate 102 be not the complete glass of strengthening, implement identical chemical grinding processing by the first interarea to glass baseplate 102 and the second interarea, just can cut apart rightly glass baseplate 102 with partitioned area.
But, chemical enhanced complete glass at glass baseplate 102, in the time the first interarea and the second interarea being implemented to identical chemical grinding and are processed, will make because of chemical grinding the subregion groove depth of the first interarea and the second interarea, occur likely in glass baseplate 102, to produce and break while perforation at them.For its reason, although also do not illustrate exactly, but according to the result of multiple experiments, can think following reason., as a rule, in the first interarea of etching glass base material 102 and the situation of the second interarea, subregion groove is at the through of the thickness direction of glass baseplate 102 at the same time.
Here, with regard to chemically reinforced glass, form compressive stress layers in two ends (surface) of thickness direction, and in the time that the central part (inside) of thickness direction forms tension stress layer, can think, the strongest at the centre pull stress of thickness direction.If subregion groove connects at the strongest position of this tensile stress, can make the variation gigantism at the produced simultaneously internal stress connecting, can estimate that glass baseplate 102 breaks.
Here, utilize the function of chemical abrasive device 10, as shown in Fig. 9 (A) and Fig. 9 (B), subregion groove is connected in the position of the side-play amount 106 that departs from regulation from the strongest medullary ray 105 of tensile stress.For this side-play amount 106, in principle, σ c is made as stress under compression [MPa], by DOL be made as the thickness [μ m] of chemical enhanced layer, when T is made as to thickness of slab [μ m] and σ T is made as to CT value (Calculated Tensile Stress) [MPa], utilize experiment to illustrate, need to be set as along with CT value raises and becomes large, described CT value is to utilize the value of the σ T of following formula calculating.
[several 1]
Can think for its reason because increase side-play amount 106 and away from medullary ray, the tensile stress of the inside of glass baseplate 102 just reduces.And on the other hand, side-play amount 106 being increased to essential degree above in the situation that, intensity or designability likely reduce, and therefore can say, preferably in the scope of breaking that can prevent glass baseplate 102, side-play amount 106 are set as far as possible littlely.For example, if the thickness of slab of glass baseplate 10 is 0.5mm～1.2mm left and right and CT value is in 30 left and right, just can prevent breaking of glass baseplate 102 by side-play amount 106 being set as to 50 μ m～100 μ m.
In chemical abrasive device 10, in order to adjust above-mentioned side-play amount 106, for example, can adjust the extent of the hydraulic pressure of upside spray tube 444U and downside spray tube 444L, or to utilize downside spray tube 444L only to advance the mode of the in-depth of subregion groove to carry out chemical grinding processing to be equivalent to the amount of side-play amount 106 below.Generally speaking, by suitably adjusting the aperture of each open and close valve 442 (442U, 442L) that forms hydrostatic control portion, just can prevent the subregion groove of the first interarea of glass baseplate 102 and the subregion groove of the second interarea through at the thickness direction of glass baseplate 102.
The glass substrate that has completed end face processing is immersed in and has added sodium hydroxide or TMAH (Tetramethylammonium hydroxide) and DMI (1,3-dimethyl-2-imidazolinone) the peel groove of the alkaline stripping liquid such as mixed solution in, resist layer is peeled off.By carrying out above processing, just can, as shown in Fig. 9 (C), from chemical enhanced complete glass baseplate, stably and effectively obtain multiple glass substrates 104.
Next, use Figure 10, other examples that are divided into the embodiment of the processing of multiple glass substrates 104 to cut the glass baseplate 102 of 1 plate sheet shape in chemical abrasive device 10 describe.In this embodiment, do not use the first glass support part 70 and the second supporting member 72.First, glass baseplate 102 is directly placed on carrying roller 50 and the first interarea and the second interarea two sides are carried out to chemical grinding processing.After this, by the subregion groove depth of the subregion groove of the first interarea and the second interarea the stage of aequum, attach acid resistance film 64 at the face of the side contacting with carrying roller 50.After this,, the interarea that is pasted with acid resistance film 64 being made as under the state of downside, glass baseplate 102 is put on carrying roller 50.
Preferably by acid resistance film 64 with between itself and glass baseplate not the mode of entrained air attach.In this embodiment, use glass laminated machine to carry out the attaching of acid resistance film, but be not limited thereto.In addition, here, as acid resistance film 64, used the resin film of being made by the PET (polyethylene terephthalate) of thick 50～150 μ m left and right, but also can use other raw-material films.Having added in the interarea of acid resistance film 64, even if further carry out the injection of lapping liquid and also can not cause the in-depth of subregion groove, therefore aspect the degree of depth of the subregion groove of the first interarea and the subregion groove of the second interarea, creating a difference.And after additional acid resistance film 64, the injection upper and lower which side to carry out chemical grinding liquid from is all no problem, but from reducing, the viewpoint of fluid volume is considered, preferably only carried out the injection of chemical grinding liquid from upside.
According to this embodiment, can prevent rightly the subregion groove of the first interarea and the subregion groove of the second interarea through at the thickness direction of glass baseplate 102.Thus, can prevent the situation that when the subregion groove of the first interarea and the subregion groove of the second interarea occur to connect, generation is broken in glass baseplate 102.In addition, also can be close to acid resistance film 64 and can on apparent, dispose as 1 plate sheet owing to being divided into the rear each glass substrate 104 of multiple glass substrates 104 at glass component 102, therefore easily carry out the disposal of the glass substrate 104 of discharging from chemical abrasive device 10.And acid resistance film 64 used in this embodiment preferably uses the material with toughness as far as possible.Its reason be because, in the case of the toughness of acid resistance film 64 is low, the acid resistance film 64 on carrying roller 50 will deflection, multiple glass substrates 104 likely scatter.In the case of the toughness of acid resistance film 64 is low, also can on acid resistance film 64, attach plank or framework etc. for adding obdurability.
In addition, use Figure 11～Figure 15, other examples that are divided into the embodiment of the processing of multiple glass substrates 104 to cut the glass baseplate 102 of 1 plate sheet shape in chemical abrasive device 10 describe.In this embodiment, for glass baseplate 102, be glass baseplate 102 is directly placed on carrying roller 50 and the first interarea and the second interarea two sides are carried out to chemical grinding processing at first, this point is identical with embodiment above.In this embodiment, be also by the subregion groove depth of the subregion groove of the first interarea and the second interarea the stage of aequum, attach acid resistance film 64 at the first interarea or the second interarea.
In addition,, in this embodiment, used the glass tray 60 it being supported from the below of glass baseplate 102.Glass tray 60 is made by possessing acid proof resinogen material (being polyvinyl chloride in this embodiment), possesses the main body 600 of accommodating glass baseplate 102 and the point 604 that is fixed on main body 600.Main body 600 possesses base plate and erects the side plate arranging from the periphery of this base plate.Side plate has the height of 2～5 times of left and right of the thickness of glass baseplate 102, spread all over haply the periphery of base plate all zones configure, but be provided with notch part 602 in a part.Point 604 is installed on a side of main body 600, presents the shape along with head end attenuates away from main body 600.Point 604 plays and makes glass tray 60 in carrying roller and the effect in the face of passing through swimmingly between the opposed roll of carrying roller 50 ground configurations etc.
As mentioned above, glass baseplate 102 the subregion groove of the first interarea and the subregion groove depth of the second interarea the stage of aequum, attach acid resistance film 64 at the first interarea or the second interarea, and as shown in Figure 12 (A), this glass baseplate 102 that has attached acid resistance film 64 by so that the mode that the face of acid resistance film 64 sides contacts with glass tray 60 put in the main body 600 of glass tray 60.Thereafter, glass baseplate 102 is fixed in the main body 600 of glass tray 60 by acid resistance adhesive tape 62.After this, contain the glass tray 60 of glass baseplate 102 as shown in Figure 12 (B), by so that point 604 put on carrying roller 50 towards the state in the downstream of conveyance direction.
Glass tray 60 by moving into portion 12, pre-treatment chamber 14, the first treatment chamber 16, the second treatment chamber 18, the 3rd treatment chamber 20, the 4th treatment chamber 22, the first transhipment department 28, the second transhipment department 30, the 3rd transhipment department 32, washing chamber 24, taking out of portion 26, treatment solution resettlement section 42, treatment solution supply unit 44 and water supply portion 46, accumulates main body 600 and manage throughout the chemical grinding liquid of supplying with from upside in chamber and each transhipment department successively.Thus, the glass baseplate 102 on glass tray 60, as shown in Figure 13 (A) and Figure 13 (B), is immersed in the chemical grinding liquid accumulating in main body 600.Now, due to always, from upper direction main body 600 providing chemical lapping liquids, therefore a part for the chemical grinding liquid in main body 600 is crossed side plate top and is overflowed, and flows out to outside through notch part 602.Consequently, because the chemical grinding liquid in main body 600 is always replaced into the chemical grinding liquid of new supply, be therefore easy to make the hydrofluoric acid concentration stabilization always in chemical grinding liquid, guarantee constant grinding rate.And, although in this embodiment, in the bottom surface sections of main body 600, hole is not set, but can, by one or more little holes are set in the bottom surface sections of main body 600, promotes the circulation of chemical grinding liquid yet.
In addition, because being is immersed under the state accumulating in the liquid of the chemical grinding in main body 600 at glass baseplate 102, the subregion groove of the first interarea and the subregion groove of the second interarea connect, compared with situation about therefore connecting with the subregion groove of the first interarea under state spraying chemical grinding liquid and the subregion groove of the second interarea, connect position and be not easy to become sharp-pointed.In addition, after connecting by the subregion groove of the subregion groove at the first interarea and the second interarea, also glass baseplate 102 is immersed in the chemical grinding liquid accumulating in main body 600, just can suppresses to connect the sharp-pointed of position, the end that makes glass substrate 104 analyse and observe lower approach circular-arc.
Next, use Figure 14 (A)～Figure 14 (D) and Figure 15 (A)～Figure 15 (D), the variation of the glass baseplate 102 when processing in this embodiment or the shape of glass substrate 104 describes.First,, as shown in Figure 14 (A)～Figure 14 (C), the subregion groove that does not form resist layer of the first interarea of glass baseplate 102 and the second interarea is subject to the etching of the chemical grinding liquid from spraying up and down and deepens.In the subregion groove depth of the first interarea and the second interarea the stage of required amount, as shown in Figure 14 (D), attach acid resistance film 64 at any one interarea of the first interarea or the second interarea.
Then, as shown in Figure 15 (A), by downward the interarea that is pasted with acid resistance film 64, glass baseplate 102 is housed in glass tray 60, continues to carry out chemical grinding processing.Now, because glass baseplate 102 described above is submerged in chemical grinding liquid, therefore, as shown in Figure 15 (B), the subregion groove that does not just attach the interarea of the upside of acid resistance film 64 is deepened gradually.
After this, according to this embodiment, due to as shown in Figure 15 (C), can avoid the tensile stress maximum at the center as thickness direction of glass baseplate 102 point make subregion groove connect, therefore can prevent that glass baseplate 102 breaks in the time that subregion groove connects.In addition, by glass baseplate 102 being immersed in the chemical grinding liquid of main body 600 of glass tray 60 after subregion groove is connected, just can be as shown in Figure 15 (D), remove the tip of generation in the time that subregion groove connects, the end face that makes each glass substrate analyse and observe lower approach circular-arc.
The glass substrate that the glass substrate that utilizes above-mentioned manufacture method to obtain can be used as the user's side that forms the one-piece type liquid-crystal display of touch panel uses.In addition, also can be used as the protective glass use of the liquid-crystal display of portable phone.
In general thermo-labile owing to being located at the sensor element of chip area, therefore be difficult to the glass that is formed with chip area to carry out chemical enhanced processing, but according to above-mentioned embodiment, the chemical enhanced complete large glass base material 104 that is formed with chip area stably can be cut and obtain multiple glass substrates, therefore particularly in the glass substrate that is equipped with the sensor element that touch panel uses, can boost productivity significantly.
Will be understood that, the explanation of above-mentioned embodiment is all illustrative, and not restrictive aspect all.Scope of the present invention is not to be provided by above-mentioned embodiment, but is provided by the scope of technical scheme.In addition, its intention is, in scope of the present invention, comprise with meaning and the scope of the scope equivalence of technical scheme in all changes.
The explanation of symbol
10 chemical abrasive devices
12 move into portion
14 pre-treatment chambers
16 first treatment chambers
18 second treatment chambers
20 the 3rd treatment chambers
22 the 4th treatment chambers
24 washing chambers
26 take out of portion
28 first transhipment departments
30 second transhipment departments
32 the 3rd transhipment departments
60 glass trays
102 glass baseplates
104 glass substrates
Claims (3)
1. the manufacture method of a glass substrate, it is the manufacture method that is applicable to the glass substrate of the chemical abrasive device of one chip, the chemical abrasive device of described one chip is the chemical abrasive device so that the mode of being carried out chemical grinding processing by multiple glass substrates of conveyance is continuously formed, and possesses:
Conveying unit, it has multiple carrying rollers, described multiple carrying rollers by the first interarea and the second interarea using across opening the glass baseplate along continuous straight runs conveyance that is formed with resist layer as the mode of the section line of the position that should cut;
Milled processed portion, it sprays chemical grinding liquid and the section line of etching glass base material to the glass baseplate by described conveying unit conveyance from above-below direction,
This manufacture method is characterised in that,
The amount of the chemical grinding liquid by adjusting respectively the amount of the chemical grinding liquid spraying from upper side direction glass baseplate and spray from lower side direction glass baseplate, and the subregion groove that is formed at the subregion groove of the first interarea and is formed at the second interarea is connected in the position of the misalignment specified amount of the thickness direction from glass baseplate.
2. the manufacture method of glass substrate according to claim 1, is characterized in that,
Comprise:
The first chemical grinding step: the first interarea and the second interarea both sides are implemented to chemical grinding processing; And
The second chemical grinding step: only the first interarea is implemented to chemical grinding processing with the one side amount of grinding of regulation.
3. the manufacture method of glass substrate according to claim 1 and 2, is characterized in that,
In described the second chemical grinding step, use glass tray, the described glass tray that puts described glass baseplate is carried out to conveyance;
Described glass tray possesses the point that the mode that can accommodate the main body of glass baseplate and attenuate with the downstream side head end towards conveyance direction forms.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011237611A JP5334216B2 (en) | 2011-10-28 | 2011-10-28 | Manufacturing method of glass substrate |
| JP2011-237611 | 2011-10-28 | ||
| PCT/JP2012/076095 WO2013061764A1 (en) | 2011-10-28 | 2012-10-09 | Method for producing glass substrate |
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| Publication Number | Publication Date |
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| CN103917499A true CN103917499A (en) | 2014-07-09 |
| CN103917499B CN103917499B (en) | 2016-08-03 |
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| CN201280050824.9A Expired - Fee Related CN103917499B (en) | 2011-10-28 | 2012-10-09 | The manufacture method of glass substrate |
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| Country | Link |
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| JP (1) | JP5334216B2 (en) |
| KR (1) | KR101988998B1 (en) |
| CN (1) | CN103917499B (en) |
| TW (1) | TWI601600B (en) |
| WO (1) | WO2013061764A1 (en) |
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| CN104253023B (en) * | 2013-06-27 | 2017-05-17 | 细美事有限公司 | Substrate processing apparatus |
| KR102134439B1 (en) * | 2013-08-30 | 2020-07-15 | 세메스 주식회사 | Substrate treating apparatus and substrate treating method |
| JP5789889B2 (en) * | 2014-01-10 | 2015-10-07 | 株式会社Ｎｓｃ | Method for manufacturing glass substrate with end face protective layer |
| US9321677B2 (en) | 2014-01-29 | 2016-04-26 | Corning Incorporated | Bendable glass stack assemblies, articles and methods of making the same |
| JP6376462B2 (en) * | 2014-10-23 | 2018-08-22 | 大日本印刷株式会社 | Cover glass manufacturing method and display device with cover glass |
| US20160347643A1 (en) * | 2015-05-29 | 2016-12-01 | Asahi Glass Company, Limited | Glass substrate manufacturing method |
| JP6853520B2 (en) * | 2018-09-20 | 2021-03-31 | 株式会社Ｎｓｃ | Floating transfer device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1391139A (en) * | 2001-06-08 | 2003-01-15 | 住友精密工业株式会社 | Substrate processing devices |
| JP2010195600A (en) * | 2009-02-23 | 2010-09-09 | Nishiyama Stainless Chemical Kk | Methods for manufacturing glass substrate for electronic device and electronic device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS6452629A (en) * | 1987-08-25 | 1989-02-28 | Asahi Glass Co Ltd | Production of glass product |
| US5228949A (en) * | 1991-11-07 | 1993-07-20 | Chemcut Corporation | Method and apparatus for controlled spray etching |
| JP2005219960A (en) * | 2004-02-05 | 2005-08-18 | Nishiyama Stainless Chem Kk | Cutting and separation method of glass, glass substrate for flat panel display, and flat panel display |
| JP4071220B2 (en) * | 2004-03-17 | 2008-04-02 | 西山ステンレスケミカル株式会社 | Manufacturing method of glass substrate |
| JP3981393B2 (en) * | 2005-12-02 | 2007-09-26 | 西山ステンレスケミカル株式会社 | Chemical polishing apparatus and glass substrate manufacturing method |
| KR101387711B1 (en) | 2007-04-10 | 2014-04-23 | 에프엔에스테크 주식회사 | Glass substrate etching apparatus of flat panel display |
| JP4775829B2 (en) * | 2009-04-03 | 2011-09-21 | 株式会社Ｎｓｃ | Glass substrate for electronic device and method for manufacturing electronic device |
-
2011
- 2011-10-28 JP JP2011237611A patent/JP5334216B2/en not_active Expired - Fee Related
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2012
- 2012-10-09 KR KR1020147010976A patent/KR101988998B1/en not_active Expired - Fee Related
- 2012-10-09 CN CN201280050824.9A patent/CN103917499B/en not_active Expired - Fee Related
- 2012-10-09 WO PCT/JP2012/076095 patent/WO2013061764A1/en active Application Filing
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1391139A (en) * | 2001-06-08 | 2003-01-15 | 住友精密工业株式会社 | Substrate processing devices |
| JP2010195600A (en) * | 2009-02-23 | 2010-09-09 | Nishiyama Stainless Chemical Kk | Methods for manufacturing glass substrate for electronic device and electronic device |
Also Published As
| Publication number | Publication date |
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| CN103917499B (en) | 2016-08-03 |
| JP5334216B2 (en) | 2013-11-06 |
| KR20140093934A (en) | 2014-07-29 |
| TW201341119A (en) | 2013-10-16 |
| JP2013095617A (en) | 2013-05-20 |
| WO2013061764A1 (en) | 2013-05-02 |
| KR101988998B1 (en) | 2019-06-13 |
| TWI601600B (en) | 2017-10-11 |
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