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CN101838791B - Method for depositing amorphous carbon film by modifying surface of magnesium alloy - Google Patents

Method for depositing amorphous carbon film by modifying surface of magnesium alloy Download PDF

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CN101838791B
CN101838791B CN2010101479443A CN201010147944A CN101838791B CN 101838791 B CN101838791 B CN 101838791B CN 2010101479443 A CN2010101479443 A CN 2010101479443A CN 201010147944 A CN201010147944 A CN 201010147944A CN 101838791 B CN101838791 B CN 101838791B
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magnesium alloy
arc
amorphous carbon
carbon film
vacuum chamber
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CN101838791A (en
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邹友生
吴远方
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Nanjing University of Science and Technology
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Abstract

本发明公开了一种镁合金表面改性沉积非晶碳薄膜的方法,该方法采用电弧离子镀技术,以石墨为阴极靶材,利用电弧离子镀在镁合金上低温制备硬度高、摩擦系数小、与基片结合强度高、耐磨耐腐蚀的非晶碳薄膜。本发明工艺简单、成本低廉、沉积温度低、沉积速度快、适用于大规模的工业化生产,经过表面沉积非晶碳薄膜改性后的镁合金可广泛用于汽车零部件和航空航天领域。The invention discloses a method for modifying and depositing an amorphous carbon film on the surface of a magnesium alloy. The method adopts an arc ion plating technology, uses graphite as a cathode target material, and uses arc ion plating on a magnesium alloy at a low temperature to prepare a high hardness and low friction coefficient. , Amorphous carbon film with high bonding strength with substrate, wear resistance and corrosion resistance. The invention has the advantages of simple process, low cost, low deposition temperature and fast deposition speed, and is suitable for large-scale industrial production, and the magnesium alloy modified by depositing amorphous carbon film on the surface can be widely used in the fields of auto parts and aerospace.

Description

一种镁合金表面改性沉积非晶碳薄膜的方法 A method for modifying the surface of a magnesium alloy to deposit an amorphous carbon film

技术领域technical field

本发明属于镁合金表面处理和表面改性技术,特别是一种镁合金表面改性沉积非晶碳薄膜的方法。The invention belongs to magnesium alloy surface treatment and surface modification technology, in particular to a method for magnesium alloy surface modification and deposition of amorphous carbon film.

背景技术Background technique

镁合金具有较高的比强度和比刚度、韧性好、易成型、抗振动、能吸收电磁辐射、可回收再利用,对环境污染小等一系列的优点。作为新一代绿色、高强、轻质的金属结构材料,在汽车工业、通讯产品、航空航天、武器装备等领域有着广泛的应用。如镁合金可用在各种民用、军用飞机的发动机零部件、螺旋桨、齿轮箱、支架结构以及火箭、导弹、卫星的一些零部件,这些零部件在不断地运动,其实际使役环境也比较苛刻,这就对镁合金的耐磨性和耐腐蚀性提出了新的要求。然而,镁合金质地柔软、硬度低,耐磨性差,并且极易氧化和腐蚀,尤其是镁合金用在飞机发动机零部件上时,这些缺陷极大地限制了镁合金的实际应用和零部件的特性。因此,对镁合金的表面处理以提供有效保护和提高镁合金表面性能非常重要。对镁合金的表面处理方法主要有阳极氧化、微弧氧化、激光表面处理和表面镀膜,阳极氧化后形成的表面膜薄难以作为耐磨层,且电解液污染环境;微弧氧化在表面可形成一层厚的氧化膜,但疏松多孔,膜层性能下降;激光表面处理,因处理面积有限不利于大规模生产,这些表面处理方法都存在很大的局限性,且处理后的表面耐蚀性和耐磨性在实际使用过程中都不理想。与其他几种方法相比,改善镁合金表面耐磨和耐腐蚀性最有效的方法是在其表面制备一层耐磨损、抗腐蚀的薄膜,利用薄膜在镁合金基体和外界环境之间形成的屏障,抑制镁合金的腐蚀和磨损。Magnesium alloys have a series of advantages such as high specific strength and specific stiffness, good toughness, easy forming, vibration resistance, electromagnetic radiation absorption, recyclability and low environmental pollution. As a new generation of green, high-strength and lightweight metal structural materials, it has been widely used in the fields of automobile industry, communication products, aerospace, weapons and equipment. For example, magnesium alloys can be used in various civil and military aircraft engine parts, propellers, gearboxes, bracket structures, and some parts of rockets, missiles, and satellites. These parts are constantly moving, and their actual operating environment is relatively harsh. This puts forward new requirements for the wear resistance and corrosion resistance of magnesium alloys. However, magnesium alloys are soft, have low hardness, poor wear resistance, and are extremely prone to oxidation and corrosion, especially when magnesium alloys are used in aircraft engine parts. These defects greatly limit the practical application of magnesium alloys and the characteristics of parts . Therefore, the surface treatment of magnesium alloys is very important to provide effective protection and improve the surface properties of magnesium alloys. The surface treatment methods for magnesium alloys mainly include anodic oxidation, micro-arc oxidation, laser surface treatment and surface coating. The surface film formed after anodic oxidation is thin and difficult to be used as a wear-resistant layer, and the electrolyte pollutes the environment; A thick oxide film, but loose and porous, the performance of the film layer decreases; laser surface treatment is not conducive to large-scale production due to the limited treatment area, these surface treatment methods have great limitations, and the surface corrosion resistance after treatment And wear resistance are not ideal in actual use. Compared with several other methods, the most effective way to improve the wear resistance and corrosion resistance of the magnesium alloy surface is to prepare a wear-resistant and corrosion-resistant film on the surface, and use the film to form a layer between the magnesium alloy substrate and the external environment. barrier to inhibit corrosion and wear of magnesium alloys.

非晶碳薄膜具有良好的力学性能和机械性能,如硬度高、弹性模量大、摩擦系数低、优异的耐磨性和耐腐蚀性、良好的化学稳定性,是一种良好的表面抗磨损防护膜。非晶碳薄膜制备工艺简单,实用性好,在机械、电子、光学、热学、声学、医学等领域得到广泛应用。Amorphous carbon film has good mechanical properties and mechanical properties, such as high hardness, large elastic modulus, low friction coefficient, excellent wear resistance and corrosion resistance, good chemical stability, and is a good surface anti-wear protective film. Amorphous carbon thin film has simple preparation process and good practicability, and has been widely used in the fields of machinery, electronics, optics, thermal, acoustics, medicine and so on.

但是现有技术中不存在采用电弧离子镀设备对镁合金沉积非晶碳薄膜进行表面改性的技术。However, in the prior art, there is no technology of using arc ion plating equipment to modify the surface of magnesium alloy deposited amorphous carbon film.

发明内容Contents of the invention

本发明所解决的技术问题在于提供一种操作简便的镁合金表面改性沉积非晶碳薄膜的方法。The technical problem to be solved by the invention is to provide a method for modifying and depositing an amorphous carbon film on the surface of a magnesium alloy which is easy to operate.

实现本发明目的的技术解决方案为:一种镁合金表面改性沉积非晶碳薄膜的方法,采用电弧离子镀沉积薄膜技术,以石墨为阴极靶材,在镁合金上沉积非晶碳薄膜,具体包括以下步骤:The technical solution for realizing the purpose of the present invention is: a method for depositing an amorphous carbon film by modifying the surface of a magnesium alloy, using arc ion plating deposition film technology, using graphite as a cathode target, depositing an amorphous carbon film on a magnesium alloy, Specifically include the following steps:

步骤1、对镁合金基片进行表面预处理;Step 1, carrying out surface pretreatment to the magnesium alloy substrate;

步骤2、将镁合金基片固定在电弧离子镀设备真空室内的衬底支架上,并对电弧离子镀设备真空室抽真空;Step 2, fixing the magnesium alloy substrate on the substrate holder in the vacuum chamber of the arc ion plating equipment, and evacuating the vacuum chamber of the arc ion plating equipment;

步骤3、将氩气通入真空室,之后引燃电弧,在镁合金基片上施加高偏压对镁合金表面进行轰击清洗;Step 3, passing argon gas into the vacuum chamber, then igniting the arc, applying a high bias voltage on the magnesium alloy substrate to bombard and clean the surface of the magnesium alloy;

步骤4、向真空室内通入沉积气体,调整沉积气氛,降低镁合金基片的偏压,调整镁合金基片的温度,控制石墨电弧源的弧电流和弧电压,在镁合金表面沉积非晶碳薄膜;Step 4, feed the deposition gas into the vacuum chamber, adjust the deposition atmosphere, reduce the bias voltage of the magnesium alloy substrate, adjust the temperature of the magnesium alloy substrate, control the arc current and arc voltage of the graphite arc source, and deposit amorphous on the surface of the magnesium alloy carbon film;

步骤5、沉积结束后,关闭弧电源和偏压,关闭气体,待工件在真空室中冷却到室温,打开真空室取出样品。Step 5. After the deposition is completed, turn off the arc power supply and bias voltage, and turn off the gas. After the workpiece is cooled to room temperature in the vacuum chamber, open the vacuum chamber to take out the sample.

本发明与现有技术相比,其显著优点:1)采用电弧离子镀沉积薄膜技术在镁合金基片上沉积非晶碳薄膜,薄膜与镁合金结合强度高、厚度可超过1μm、硬度高、摩擦系数小、耐磨损和耐腐蚀;2)本发明在镁合金表面上能实现非晶碳薄膜的低温沉积,且沉积薄膜均匀致密;3)本发明在镁合金表面上沉积非晶碳薄膜时离化率高、沉积速度快、薄膜生长速度快;4)本发明工艺和设备简单、易行,采用低电压工作、操作安全,使用石墨靶材、成本低廉,适用于大规模的工业化生产;5)本发明在镁合金上沉积非晶碳薄膜,表面改性后的镁合金可广泛用于汽车零部件和航空航天领域。Compared with the prior art, the present invention has significant advantages: 1) The amorphous carbon film is deposited on the magnesium alloy substrate by using the arc ion plating thin film technology, and the film and the magnesium alloy have high bonding strength, a thickness exceeding 1 μm, high hardness and low friction. The coefficient is small, wear-resistant and corrosion-resistant; 2) the present invention can realize the low-temperature deposition of the amorphous carbon film on the surface of the magnesium alloy, and the deposited film is uniform and compact; 3) the present invention deposits the amorphous carbon film on the magnesium alloy surface The ionization rate is high, the deposition speed is fast, and the film growth speed is fast; 4) The process and equipment of the present invention are simple and easy to implement, adopt low voltage operation, safe operation, use graphite targets, and have low cost, and are suitable for large-scale industrial production; 5) The present invention deposits the amorphous carbon film on the magnesium alloy, and the magnesium alloy after surface modification can be widely used in the fields of auto parts and aerospace.

具体实施方式Detailed ways

电弧离子镀设备为沉积非晶碳薄膜的一种常用设备,本发明的一种镁合金表面改性沉积非晶碳薄膜的方法,采用电弧离子镀技术,以石墨为阴极靶材,在镁合金上沉积非晶碳薄膜,具体包括以下步骤:Arc ion plating equipment is a common equipment for depositing amorphous carbon films. A method for depositing amorphous carbon films on the surface of magnesium alloys according to the present invention adopts arc ion plating technology and uses graphite as the cathode target. Depositing an amorphous carbon film on it, specifically comprising the following steps:

步骤1、对镁合金基片进行表面预处理;具体为:对镁合金基材进行砂纸打磨、抛光、除油、去污处理,之后放入丙酮或酒精中利用超声清洗机进行超声清洗,冷风吹干。Step 1. Perform surface pretreatment on the magnesium alloy substrate; specifically: sandpaper, polish, degrease, and decontaminate the magnesium alloy substrate, and then put it in acetone or alcohol and use an ultrasonic cleaning machine for ultrasonic cleaning. blow dry.

步骤2、将镁合金基片固定在电弧离子镀设备真空室内的衬底支架上,并对电弧离子镀设备真空室抽真空;电弧离子镀设备抽真空后的真空度小于或等于3×10-3Pa。Step 2, fixing the magnesium alloy substrate on the substrate holder in the vacuum chamber of the arc ion plating equipment, and vacuumizing the vacuum chamber of the arc ion plating equipment; the vacuum degree of the arc ion plating equipment after vacuuming is less than or equal to 3×10 − 3Pa .

步骤3、将氩气通入真空室,之后引燃电弧,在镁合金基片上施加高偏压对镁合金表面进行轰击清洗;石墨靶材与镁合金基片的距离为100-400mm;通入氩气后真空室的真空度为0.1-1Pa;电弧的弧电流为20-50A、弧电压为20V-30V;在镁合金基片上施加的高偏压为脉冲偏压,该高偏压为-600V~-1000V,占空比为10%-40%;轰击清洗时间为1-5分钟。Step 3. Pass argon gas into the vacuum chamber, then ignite the arc, and apply a high bias voltage on the magnesium alloy substrate to bombard and clean the surface of the magnesium alloy; the distance between the graphite target and the magnesium alloy substrate is 100-400mm; The vacuum degree of the vacuum chamber after argon is 0.1-1Pa; the arc current of the arc is 20-50A, and the arc voltage is 20V-30V; the high bias voltage applied on the magnesium alloy substrate is a pulse bias voltage, and the high bias voltage is - 600V~-1000V, the duty ratio is 10%-40%; the bombardment cleaning time is 1-5 minutes.

步骤4、向真空室内通入沉积气体,调整沉积气氛,降低镁合金基片的偏压,调整镁合金基片的温度,控制石墨电弧源的弧电流和弧电压,在镁合金表面沉积非晶碳薄膜;上述真空室内通入的沉积气体为氩气、氢气、氮气、碳氢气体中的一种或两种及以上的混合,通入气体后的压强为0.05-5Pa;镁合金基片的偏压为0--400V、占空比10%-40%;镁合金基片的温度为25-200℃;石墨电弧源的弧电流为20-50A、弧电压为20-30V。Step 4, feed the deposition gas into the vacuum chamber, adjust the deposition atmosphere, reduce the bias voltage of the magnesium alloy substrate, adjust the temperature of the magnesium alloy substrate, control the arc current and arc voltage of the graphite arc source, and deposit amorphous on the surface of the magnesium alloy Carbon thin film; the deposition gas introduced into the above-mentioned vacuum chamber is a mixture of one or two or more of argon, hydrogen, nitrogen, and hydrocarbon gases, and the pressure after the gas is introduced is 0.05-5Pa; the magnesium alloy substrate The bias voltage is 0-400V, the duty cycle is 10%-40%, the temperature of the magnesium alloy substrate is 25-200°C, the arc current of the graphite arc source is 20-50A, and the arc voltage is 20-30V.

步骤5、沉积结束后,关闭弧电源和偏压,关闭气体,待工件在真空室中冷却到室温,打开真空室取出样品。Step 5. After the deposition is completed, turn off the arc power supply and bias voltage, and turn off the gas. After the workpiece is cooled to room temperature in the vacuum chamber, open the vacuum chamber to take out the sample.

下面结合实施例对本发明做进一步详细的描述:Below in conjunction with embodiment the present invention is described in further detail:

实施例1:Example 1:

选用AZ91镁合金加工成边长10mm的正方形,厚度为3mm。AZ91 magnesium alloy is selected and processed into a square with a side length of 10mm and a thickness of 3mm.

具体操作步骤为:The specific operation steps are:

(1)镁合金的预处理:采用普通洗涤剂对加工后的镁合金基材进行除油和去污处理,然后依次用400-1200#砂纸打磨样品,最后表面抛光。将抛光后的镁合金放入丙酮或酒精中利用超声清洗机进行超声清洗10分钟,冷风吹干、以供使用。(1) Magnesium alloy pretreatment: use ordinary detergent to degrease and decontaminate the processed magnesium alloy substrate, then polish the sample with 400-1200 # sandpaper in sequence, and finally polish the surface. Put the polished magnesium alloy into acetone or alcohol for ultrasonic cleaning for 10 minutes with an ultrasonic cleaning machine, and dry it with cold air before use.

(2)以清洁抛光后的镁合金为衬底基片,将其放置于电弧离子镀设备真空室中,并固定于真空室内的衬底支架上,镁合金基片固定位置正对石墨靶材并与靶材的距离为100mm。然后关闭真空室,利用机械泵和扩散泵抽真空至本底真空度等于3×10-3Pa。待达到本底真空时,打开气阀通入高纯氩气;当真空度稳定于0.2Pa时,开启石墨电弧源,弧电流为20A、弧电压为20V;脉冲偏压调至-600V、占空比为40%,对镁合金衬底进行轰击清洗,轰击清洗时间为5min,以去除衬底表面残余氧化物和残留的杂质。(2) Take the cleaned and polished magnesium alloy as the substrate substrate, place it in the vacuum chamber of the arc ion plating equipment, and fix it on the substrate holder in the vacuum chamber. The fixed position of the magnesium alloy substrate is facing the graphite target. And the distance from the target is 100mm. Then close the vacuum chamber, and evacuate to a background vacuum equal to 3×10 -3 Pa by means of a mechanical pump and a diffusion pump. When the background vacuum is reached, open the gas valve to feed high-purity argon gas; when the vacuum degree is stable at 0.2Pa, turn on the graphite arc source, the arc current is 20A, the arc voltage is 20V; the pulse bias is adjusted to -600V, The empty ratio is 40%, and the magnesium alloy substrate is bombarded and cleaned for 5 minutes to remove residual oxides and residual impurities on the substrate surface.

(3)完成对镁合金基片轰击清洗后,继续通入氩气,在镁合金表面沉积非晶碳薄膜。将施加在镁合金基片的脉冲偏压调整为-50V、占空比20%;工作压强为0.08Pa;沉积温度为150℃;弧电流为20A、弧电压为20V;沉积时间12min。(3) After the bombardment cleaning of the magnesium alloy substrate is completed, the argon gas is continuously introduced to deposit an amorphous carbon film on the surface of the magnesium alloy. The pulse bias voltage applied to the magnesium alloy substrate was adjusted to -50V, the duty cycle was 20%; the working pressure was 0.08Pa; the deposition temperature was 150°C; the arc current was 20A, the arc voltage was 20V; the deposition time was 12min.

(4)非晶碳薄膜沉积结束后,关闭弧电源和脉冲偏压,关闭气体。待工件在真空室中冷却到室温,打开真空室取出样品。(4) After the deposition of the amorphous carbon film is completed, the arc power supply and pulse bias voltage are turned off, and the gas is turned off. After the workpiece is cooled to room temperature in the vacuum chamber, the vacuum chamber is opened to take out the sample.

对在镁合金上沉积的非晶碳薄膜性能测试如下:The performance test of the amorphous carbon film deposited on the magnesium alloy is as follows:

非晶碳薄膜的摩擦系数:0.15;摩擦磨损测试条件为:载荷2N、滑动速度10cm/s、摩擦副为100Cr6钢、湿度40%、温度20-25℃、摩擦距离125m。Friction coefficient of amorphous carbon film: 0.15; friction and wear test conditions are: load 2N, sliding speed 10cm/s, friction pair is 100Cr6 steel, humidity 40%, temperature 20-25°C, friction distance 125m.

摩擦后非晶碳薄膜的磨痕拉曼谱线研究表明在摩擦过程中非晶碳薄膜结构稳定,没有发生变化。The wear scar Raman spectrum of the amorphous carbon film after rubbing shows that the structure of the amorphous carbon film is stable and does not change during the rubbing process.

实施例2:Example 2:

选用AZ91镁合金加工成边长10mm的正方形,厚度为3mm。AZ91 magnesium alloy is selected and processed into a square with a side length of 10mm and a thickness of 3mm.

具体操作步骤为:The specific operation steps are:

(1)镁合金的预处理:采用普通洗涤剂对加工后的镁合金基材进行除油和去污处理,然后依次用400-1200#砂纸打磨样品,最后表面抛光。将抛光后的镁合金放入丙酮或酒精中利用超声清洗机进行超声清洗15分钟,冷风吹干、以供使用。(1) Magnesium alloy pretreatment: use ordinary detergent to degrease and decontaminate the processed magnesium alloy substrate, then polish the sample with 400-1200 # sandpaper in sequence, and finally polish the surface. Put the polished magnesium alloy into acetone or alcohol for ultrasonic cleaning with an ultrasonic cleaning machine for 15 minutes, and dry it with cold air before use.

(2)以清洁抛光后的镁合金为衬底基片,将其放置于电弧离子镀设备真空室中,并固定于真空室内的衬底支架上,镁合金基片固定位置正对石墨靶材并与靶材的距离为400mm。然后关闭真空室,利用机械泵和扩散泵抽真空至本底真空度等于3×10-3Pa。待达到本底真空时,打开气阀通入高纯氩气;当真空度稳定于1Pa时,开启石墨电弧源,弧电流为50A、弧电压为30V;脉冲偏压调至-1000V、占空比为30%,对镁合金衬底进行轰击清洗,轰击清洗时间为1.5min,以去除衬底表面残余氧化物和残留的杂质。(2) Take the cleaned and polished magnesium alloy as the substrate substrate, place it in the vacuum chamber of the arc ion plating equipment, and fix it on the substrate holder in the vacuum chamber. The fixed position of the magnesium alloy substrate is facing the graphite target. And the distance from the target is 400mm. Then close the vacuum chamber, and evacuate to a background vacuum equal to 3×10 -3 Pa by means of a mechanical pump and a diffusion pump. When the background vacuum is reached, open the gas valve to feed high-purity argon gas; when the vacuum degree is stable at 1Pa, turn on the graphite arc source, the arc current is 50A, the arc voltage is 30V; the pulse bias is adjusted to -1000V, and the duty cycle The ratio is 30%, and the magnesium alloy substrate is bombarded and cleaned for 1.5 minutes to remove residual oxides and residual impurities on the surface of the substrate.

(3)完成对镁合金基片轰击清洗后,继续通入氩气,在镁合金表面沉积非晶碳薄膜。将施加在镁合金基片的脉冲偏压调整为-400V、占空比30%;工作压强为0.5Pa;沉积温度为200℃;弧电流为50A、弧电压为30V;沉积时间15min。(3) After the bombardment cleaning of the magnesium alloy substrate is completed, the argon gas is continuously introduced to deposit an amorphous carbon film on the surface of the magnesium alloy. The pulse bias voltage applied to the magnesium alloy substrate was adjusted to -400V, the duty cycle was 30%; the working pressure was 0.5Pa; the deposition temperature was 200°C; the arc current was 50A, the arc voltage was 30V; the deposition time was 15min.

(4)非晶碳薄膜沉积结束后,关闭弧电源和脉冲偏压,关闭气体。待工件在真空室中冷却到室温,打开真空室取出样品。(4) After the deposition of the amorphous carbon film is completed, the arc power supply and pulse bias voltage are turned off, and the gas is turned off. After the workpiece is cooled to room temperature in the vacuum chamber, the vacuum chamber is opened to take out the sample.

对在镁合金上沉积的非晶碳薄膜性能测试如下:The performance test of the amorphous carbon film deposited on the magnesium alloy is as follows:

含氢非晶碳薄膜的摩擦系数:0.12;摩擦磨损测试条件为:载荷2N、滑动速度10cm/s、摩擦副为100Cr6钢、湿度40%、温度20-25℃、摩擦距离125m。Friction coefficient of hydrogen-containing amorphous carbon film: 0.12; friction and wear test conditions are: load 2N, sliding speed 10cm/s, friction pair is 100Cr6 steel, humidity 40%, temperature 20-25°C, friction distance 125m.

摩擦后非晶碳薄膜的磨痕拉曼谱线研究表明在摩擦过程中非晶碳薄膜结构稳定,没有发生变化。The wear scar Raman spectrum of the amorphous carbon film after rubbing shows that the structure of the amorphous carbon film is stable and does not change during the rubbing process.

实施例3:Example 3:

选用AZ91镁合金加工成边长15mm的正方形,厚度为3mm。AZ91 magnesium alloy is selected and processed into a square with a side length of 15 mm and a thickness of 3 mm.

具体操作步骤为:The specific operation steps are:

(1)镁合金的预处理:采用普通洗涤剂对加工后的镁合金基材进行除油和去污处理,然后依次用400-1200#砂纸打磨样品,最后表面抛光。将抛光后的镁合金放入丙酮或酒精中利用超声清洗机进行超声清洗20分钟,冷风吹干、以供使用。(1) Magnesium alloy pretreatment: use ordinary detergent to degrease and decontaminate the processed magnesium alloy substrate, then polish the sample with 400-1200 # sandpaper in sequence, and finally polish the surface. Put the polished magnesium alloy into acetone or alcohol for ultrasonic cleaning with an ultrasonic cleaning machine for 20 minutes, and dry it with cold air before use.

(2)以清洁抛光后的镁合金为衬底基片,将其放置于电弧离子镀设备真空室中,并固定于真空室内的衬底支架上,镁合金基片固定位置正对石墨靶材并与靶材的距离为250mm。然后关闭真空室,利用机械泵和扩散泵抽真空至本底真空度等于3×10-3Pa。待达到本底真空时,打开气阀通入高纯氩气;当真空度稳定于0.5Pa时,开启石墨电弧源,弧电流为35A、弧电压为25V;脉冲偏压调至-800V、占空比为20%,对镁合金衬底进行轰击清洗,轰击清洗时间为3min,以去除衬底表面残余氧化物和残留的杂质。(2) Take the cleaned and polished magnesium alloy as the substrate substrate, place it in the vacuum chamber of the arc ion plating equipment, and fix it on the substrate holder in the vacuum chamber. The fixed position of the magnesium alloy substrate is facing the graphite target. And the distance from the target is 250mm. Then close the vacuum chamber, and evacuate to a background vacuum equal to 3×10 -3 Pa by means of a mechanical pump and a diffusion pump. When the background vacuum is reached, open the gas valve to feed high-purity argon gas; when the vacuum degree is stable at 0.5Pa, turn on the graphite arc source, the arc current is 35A, the arc voltage is 25V; the pulse bias is adjusted to -800V, The empty ratio is 20%, and the magnesium alloy substrate is bombarded and cleaned for 3 minutes, so as to remove residual oxides and residual impurities on the surface of the substrate.

(3)完成对镁合金基片轰击清洗后,关闭氩气,通入高纯氢气,在镁合金表面沉积非晶碳薄膜。将施加在镁合金基片的脉冲偏压调整为-200V、占空比40%;工作压强为3Pa;沉积温度为100℃;弧电流为35A、弧电压为25V;沉积时间10min。(3) After the magnesium alloy substrate is bombarded and cleaned, the argon gas is turned off, and high-purity hydrogen gas is introduced to deposit an amorphous carbon film on the surface of the magnesium alloy. The pulse bias applied to the magnesium alloy substrate was adjusted to -200V, the duty cycle was 40%; the working pressure was 3Pa; the deposition temperature was 100°C; the arc current was 35A, the arc voltage was 25V; the deposition time was 10min.

(4)非晶碳薄膜沉积结束后,关闭弧电源和脉冲偏压,关闭气体。待工件在真空室中冷却到室温,打开真空室取出样品。(4) After the deposition of the amorphous carbon film is completed, the arc power supply and pulse bias voltage are turned off, and the gas is turned off. After the workpiece is cooled to room temperature in the vacuum chamber, the vacuum chamber is opened to take out the sample.

对在镁合金上沉积的非晶碳薄膜性能测试如下:The performance test of the amorphous carbon film deposited on the magnesium alloy is as follows:

非晶碳薄膜的摩擦系数:0.11;摩擦磨损测试条件为:载荷2N、滑动速度10cm/s、摩擦副为100Cr6钢、湿度40%、温度20-25℃、摩擦距离125m。Friction coefficient of amorphous carbon film: 0.11; friction and wear test conditions are: load 2N, sliding speed 10cm/s, friction pair is 100Cr6 steel, humidity 40%, temperature 20-25°C, friction distance 125m.

摩擦后非晶碳薄膜的磨痕拉曼谱线研究表明在摩擦过程中非晶碳薄膜结构稳定,没有发生变化。The wear scar Raman spectrum of the amorphous carbon film after rubbing shows that the structure of the amorphous carbon film is stable and does not change during the rubbing process.

实施例4:Example 4:

选用AZ91镁合金加工成边长15mm的正方形,厚度为3mm。AZ91 magnesium alloy is selected and processed into a square with a side length of 15 mm and a thickness of 3 mm.

具体操作步骤为:The specific operation steps are:

(1)镁合金的预处理:采用普通洗涤剂对加工后的镁合金基材进行除油和去污处理,然后依次用400-1200#砂纸打磨样品,最后表面抛光。将抛光后的镁合金放入丙酮或酒精中利用超声清洗机进行超声清洗25分钟,冷风吹干、以供使用。(1) Magnesium alloy pretreatment: use ordinary detergent to degrease and decontaminate the processed magnesium alloy substrate, then polish the sample with 400-1200 # sandpaper in sequence, and finally polish the surface. Put the polished magnesium alloy into acetone or alcohol for ultrasonic cleaning with an ultrasonic cleaner for 25 minutes, and dry it with cold air before use.

(2)以清洁抛光后的镁合金为衬底基片,将其放置于电弧离子镀设备真空室中,并固定于真空室内的衬底支架上,镁合金基片固定位置正对石墨靶材并与靶材的距离为200mm。之后关闭真空室,利用机械泵和扩散泵抽真空至本底真空度等于3×10-3Pa。待达到本底真空时,打开气阀通入高纯氩气;当真空度稳定于0.8Pa时,开启石墨电弧源,弧电流为30A、弧电压为20V;脉冲偏压调至-900V、占空比为15%,对镁合金衬底进行轰击清洗,轰击清洗时间为4min,以去除衬底表面残余氧化物和残留的杂质。(2) Take the cleaned and polished magnesium alloy as the substrate substrate, place it in the vacuum chamber of the arc ion plating equipment, and fix it on the substrate holder in the vacuum chamber. The fixed position of the magnesium alloy substrate is facing the graphite target. And the distance from the target is 200mm. Afterwards, the vacuum chamber was closed, and the mechanical pump and the diffusion pump were used to evacuate until the background vacuum degree was equal to 3×10 -3 Pa. When the background vacuum is reached, open the gas valve to feed high-purity argon gas; when the vacuum degree is stable at 0.8Pa, turn on the graphite arc source, the arc current is 30A, the arc voltage is 20V; the pulse bias is adjusted to -900V, The empty ratio is 15%, and the magnesium alloy substrate is bombarded and cleaned for 4 minutes to remove residual oxides and residual impurities on the surface of the substrate.

(3)完成对镁合金基片轰击清洗后,关闭氩气,通入高纯乙炔,在镁合金表面沉积非晶碳薄膜。将施加在镁合金基片的脉冲偏压调整为-100V、占空比为15%;工作压强为1Pa;沉积温度为100℃;弧电流为25A、弧电压为25V;沉积时间8min。(3) After the magnesium alloy substrate is bombarded and cleaned, the argon gas is turned off, high-purity acetylene is introduced, and an amorphous carbon film is deposited on the surface of the magnesium alloy. The pulse bias applied to the magnesium alloy substrate was adjusted to -100V, the duty ratio was 15%; the working pressure was 1Pa; the deposition temperature was 100°C; the arc current was 25A, the arc voltage was 25V; the deposition time was 8min.

(4)非晶碳薄膜沉积结束后,关闭弧电源和脉冲偏压,关闭气体。待工件在真空室中冷却到室温,打开真空室取出样品。(4) After the deposition of the amorphous carbon film is completed, the arc power supply and pulse bias voltage are turned off, and the gas is turned off. After the workpiece is cooled to room temperature in the vacuum chamber, the vacuum chamber is opened to take out the sample.

对在镁合金上沉积的非晶碳薄膜性能测试如下:The performance test of the amorphous carbon film deposited on the magnesium alloy is as follows:

非晶碳薄膜的摩擦系数:0.13;摩擦磨损测试条件为:载荷2N、滑动速度10cm/s、摩擦副为100Cr6钢、湿度40%、温度20-25℃、摩擦距离125m。Friction coefficient of amorphous carbon film: 0.13; friction and wear test conditions are: load 2N, sliding speed 10cm/s, friction pair is 100Cr6 steel, humidity 40%, temperature 20-25°C, friction distance 125m.

摩擦后非晶碳薄膜的磨痕拉曼谱线研究表明在摩擦过程中非晶碳薄膜结构稳定,没有发生变化。The wear scar Raman spectrum of the amorphous carbon film after rubbing shows that the structure of the amorphous carbon film is stable and does not change during the rubbing process.

Claims (1)

1. the method for a depositing amorphous carbon film by modifying surface of magnesium alloy is characterized in that, adopts arc ion plating (aip), is cathode targets with graphite, and depositing amorphous carbon film on magnesium alloy specifically may further comprise the steps:
Step 1, the magnesium alloy substrate is carried out surface preparation, be specially: the magnesium alloy substrate is carried out sand papering, polishing, oil removing, decontamination handle, put into acetone or alcohol afterwards and utilize the ultrasonic cleaning machine to carry out ultrasonic cleaning, cold wind dries up;
Step 2, the magnesium alloy substrate is fixed on the substrate support in the arc ion plating apparatus vacuum chamber, and the arc ion plating apparatus vacuum chamber is vacuumized, the vacuum tightness after vacuumizing is less than or equal to 3 * 10 -3Pa;
Step 3, argon gas is fed vacuum chamber, the electric arc that ignites afterwards applies high bias voltage Mg alloy surface is bombarded cleaning on the magnesium alloy substrate; The distance of graphite target and magnesium alloy substrate is 100-400mm; The vacuum tightness that feeds argon gas final vacuum chamber is 0.1-1Pa; The arc current of electric arc is that 20-50A, arc voltage are 20-30V; The high bias voltage that applies on the magnesium alloy substrate is a pulsed bias, this high bias voltage is-600~-1000V, dutycycle is 10%-40%; The bombardment scavenging period is 1-5 minute;
Step 4, feed deposition gases in vacuum chamber, adjust deposition atmosphere, reduce the bias voltage of magnesium alloy substrate, adjust the temperature of magnesium alloy substrate, the arc current and the arc voltage in control graphite arc source are at the Mg alloy surface depositing amorphous carbon film; The deposition gases that feeds in the vacuum chamber is one or more the mixing in argon gas, hydrogen, nitrogen, the hydrocarbon gas, and the pressure that feeds behind the gas is 0.05-5Pa; The bias voltage of magnesium alloy substrate is 0--400V, dutycycle 10%-40%; The temperature of magnesium alloy substrate is 25-200 ℃; The arc current in graphite arc source is that 20-50A, arc voltage are 20-30V;
After step 5, deposition finish, close arc power and bias voltage, close gas, treat magnesium alloy substrate cool to room temperature in vacuum chamber of depositing amorphous carbon film, open vacuum chamber and taking-up.
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