CN100369277C - 发光二极管 - Google Patents
发光二极管 Download PDFInfo
- Publication number
- CN100369277C CN100369277C CNB2004101027050A CN200410102705A CN100369277C CN 100369277 C CN100369277 C CN 100369277C CN B2004101027050 A CNB2004101027050 A CN B2004101027050A CN 200410102705 A CN200410102705 A CN 200410102705A CN 100369277 C CN100369277 C CN 100369277C
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- CN
- China
- Prior art keywords
- electrode
- semiconductor layer
- emitting diode
- electrodes
- disposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000004065 semiconductor Substances 0.000 claims abstract description 113
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 238000004020 luminiscence type Methods 0.000 description 29
- 238000010586 diagram Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910002601 GaN Inorganic materials 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- CODVACFVSVNQPY-UHFFFAOYSA-N [Co].[C] Chemical compound [Co].[C] CODVACFVSVNQPY-UHFFFAOYSA-N 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- -1 gallium nitride compound Chemical class 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 230000009916 joint effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000000904 thermoluminescence Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Abstract
Description
Claims (15)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2004101027050A CN100369277C (zh) | 2004-12-28 | 2004-12-28 | 发光二极管 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2004101027050A CN100369277C (zh) | 2004-12-28 | 2004-12-28 | 发光二极管 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1797798A CN1797798A (zh) | 2006-07-05 |
CN100369277C true CN100369277C (zh) | 2008-02-13 |
Family
ID=36818684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004101027050A Expired - Fee Related CN100369277C (zh) | 2004-12-28 | 2004-12-28 | 发光二极管 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN100369277C (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101428053B1 (ko) * | 2007-12-13 | 2014-08-08 | 엘지이노텍 주식회사 | 반도체 발광소자 및 그 제조방법 |
CN102270633B (zh) * | 2011-07-29 | 2013-11-20 | 贵州大学 | 大功率倒装阵列led芯片及其制造方法 |
TWI583019B (zh) * | 2015-02-17 | 2017-05-11 | 新世紀光電股份有限公司 | Light emitting diode and manufacturing method thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06232626A (ja) * | 1993-02-02 | 1994-08-19 | A T R Koudenpa Tsushin Kenkyusho:Kk | スロット結合型マイクロストリップアンテナ |
US5563422A (en) * | 1993-04-28 | 1996-10-08 | Nichia Chemical Industries, Ltd. | Gallium nitride-based III-V group compound semiconductor device and method of producing the same |
US5691738A (en) * | 1994-03-30 | 1997-11-25 | Nippondenso Co., Ltd. | Thin-film electroluminescent display and method of fabricating same |
CN2419688Y (zh) * | 2000-05-12 | 2001-02-14 | 华上光电股份有限公司 | 一种化合物半导体组件电极结构 |
US6531376B1 (en) * | 2002-04-17 | 2003-03-11 | Semiconductor Components Industries Llc | Method of making a semiconductor device with a low permittivity region |
CN1134848C (zh) * | 1999-08-11 | 2004-01-14 | 晶元光电股份有限公司 | 发光二极管 |
-
2004
- 2004-12-28 CN CNB2004101027050A patent/CN100369277C/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06232626A (ja) * | 1993-02-02 | 1994-08-19 | A T R Koudenpa Tsushin Kenkyusho:Kk | スロット結合型マイクロストリップアンテナ |
US5563422A (en) * | 1993-04-28 | 1996-10-08 | Nichia Chemical Industries, Ltd. | Gallium nitride-based III-V group compound semiconductor device and method of producing the same |
US5691738A (en) * | 1994-03-30 | 1997-11-25 | Nippondenso Co., Ltd. | Thin-film electroluminescent display and method of fabricating same |
CN1134848C (zh) * | 1999-08-11 | 2004-01-14 | 晶元光电股份有限公司 | 发光二极管 |
CN2419688Y (zh) * | 2000-05-12 | 2001-02-14 | 华上光电股份有限公司 | 一种化合物半导体组件电极结构 |
US6531376B1 (en) * | 2002-04-17 | 2003-03-11 | Semiconductor Components Industries Llc | Method of making a semiconductor device with a low permittivity region |
Also Published As
Publication number | Publication date |
---|---|
CN1797798A (zh) | 2006-07-05 |
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C06 | Publication | ||
PB01 | Publication | ||
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: CPT TECHNOLOGY (GROUP) CO., LTD. Free format text: FORMER OWNER: CHINA PROJECTION TUBE CO., LTD. Effective date: 20130718 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: TAIWAN, CHINA TO: 350000 FUZHOU, FUJIAN PROVINCE |
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TR01 | Transfer of patent right |
Effective date of registration: 20130718 Address after: 350000, No. 1, building 6, building No. third, fourth, Confucian Road West, Mawei District, Fujian, Fuzhou Patentee after: CPT DISPLAY TECHNOLOGY (SHENZHEN)CO., LTD. Address before: Taiwan, Taipei, China Zhongshan North Road 3 paragraph 22 Patentee before: Chunghwa Picture Tubes Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080213 Termination date: 20191228 |
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CF01 | Termination of patent right due to non-payment of annual fee |