ATE392717T1 - Laterale schottkydiode mit mehreren mesa - Google Patents
Laterale schottkydiode mit mehreren mesaInfo
- Publication number
- ATE392717T1 ATE392717T1 AT05290361T AT05290361T ATE392717T1 AT E392717 T1 ATE392717 T1 AT E392717T1 AT 05290361 T AT05290361 T AT 05290361T AT 05290361 T AT05290361 T AT 05290361T AT E392717 T1 ATE392717 T1 AT E392717T1
- Authority
- AT
- Austria
- Prior art keywords
- mesas
- mesa
- finger
- schottky
- reduce
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/124—Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
- H10D62/126—Top-view geometrical layouts of the regions or the junctions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D8/00—Diodes
- H10D8/60—Schottky-barrier diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/818—Bonding techniques
- H01L2224/81801—Soldering or alloying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01012—Magnesium [Mg]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01023—Vanadium [V]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0103—Zinc [Zn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01032—Germanium [Ge]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01049—Indium [In]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12032—Schottky diode
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
- H10D62/8503—Nitride Group III-V materials, e.g. AlN or GaN
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/780,363 US7084475B2 (en) | 2004-02-17 | 2004-02-17 | Lateral conduction Schottky diode with plural mesas |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE392717T1 true ATE392717T1 (de) | 2008-05-15 |
Family
ID=34701448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05290361T ATE392717T1 (de) | 2004-02-17 | 2005-02-17 | Laterale schottkydiode mit mehreren mesa |
Country Status (8)
Country | Link |
---|---|
US (1) | US7084475B2 (de) |
EP (1) | EP1564815B1 (de) |
JP (1) | JP5150803B2 (de) |
CN (1) | CN100517763C (de) |
AT (1) | ATE392717T1 (de) |
DE (1) | DE602005006025T2 (de) |
FR (1) | FR2870046B1 (de) |
TW (2) | TWI411008B (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7417266B1 (en) | 2004-06-10 | 2008-08-26 | Qspeed Semiconductor Inc. | MOSFET having a JFET embedded as a body diode |
US7436039B2 (en) * | 2005-01-06 | 2008-10-14 | Velox Semiconductor Corporation | Gallium nitride semiconductor device |
US20060151868A1 (en) * | 2005-01-10 | 2006-07-13 | Zhu Tinggang | Package for gallium nitride semiconductor devices |
CN100385686C (zh) * | 2005-08-30 | 2008-04-30 | 浙江大学 | 一种多晶锗硅肖特基二极管及其制备方法 |
US8026568B2 (en) * | 2005-11-15 | 2011-09-27 | Velox Semiconductor Corporation | Second Schottky contact metal layer to improve GaN Schottky diode performance |
US7915643B2 (en) * | 2007-09-17 | 2011-03-29 | Transphorm Inc. | Enhancement mode gallium nitride power devices |
US8519438B2 (en) | 2008-04-23 | 2013-08-27 | Transphorm Inc. | Enhancement mode III-N HEMTs |
US8289065B2 (en) | 2008-09-23 | 2012-10-16 | Transphorm Inc. | Inductive load power switching circuits |
US7898004B2 (en) | 2008-12-10 | 2011-03-01 | Transphorm Inc. | Semiconductor heterostructure diodes |
US8390091B2 (en) | 2009-02-03 | 2013-03-05 | Freescale Semiconductor, Inc. | Semiconductor structure, an integrated circuit including a semiconductor structure and a method for manufacturing a semiconductor structure |
US8013414B2 (en) * | 2009-02-18 | 2011-09-06 | Alpha & Omega Semiconductor, Inc. | Gallium nitride semiconductor device with improved forward conduction |
US8742459B2 (en) | 2009-05-14 | 2014-06-03 | Transphorm Inc. | High voltage III-nitride semiconductor devices |
TW201103150A (en) * | 2009-07-10 | 2011-01-16 | Tekcore Co Ltd | Group III-nitride semiconductor Schottky diode and its fabrication method |
US8390000B2 (en) | 2009-08-28 | 2013-03-05 | Transphorm Inc. | Semiconductor devices with field plates |
KR101051578B1 (ko) * | 2009-09-08 | 2011-07-22 | 삼성전기주식회사 | 반도체 소자 및 그 제조 방법 |
US8372738B2 (en) * | 2009-10-30 | 2013-02-12 | Alpha & Omega Semiconductor, Inc. | Method for manufacturing a gallium nitride based semiconductor device with improved termination scheme |
US8389977B2 (en) | 2009-12-10 | 2013-03-05 | Transphorm Inc. | Reverse side engineered III-nitride devices |
JP5665361B2 (ja) * | 2010-05-12 | 2015-02-04 | 三菱電機株式会社 | 炭化珪素半導体装置およびその製造方法 |
KR101193357B1 (ko) * | 2010-12-09 | 2012-10-19 | 삼성전기주식회사 | 질화물계 반도체 소자 및 그 제조 방법 |
US8742460B2 (en) | 2010-12-15 | 2014-06-03 | Transphorm Inc. | Transistors with isolation regions |
US8643062B2 (en) | 2011-02-02 | 2014-02-04 | Transphorm Inc. | III-N device structures and methods |
US8772842B2 (en) | 2011-03-04 | 2014-07-08 | Transphorm, Inc. | Semiconductor diodes with low reverse bias currents |
US8716141B2 (en) | 2011-03-04 | 2014-05-06 | Transphorm Inc. | Electrode configurations for semiconductor devices |
US8901604B2 (en) | 2011-09-06 | 2014-12-02 | Transphorm Inc. | Semiconductor devices with guard rings |
US9257547B2 (en) | 2011-09-13 | 2016-02-09 | Transphorm Inc. | III-N device structures having a non-insulating substrate |
US8598937B2 (en) | 2011-10-07 | 2013-12-03 | Transphorm Inc. | High power semiconductor electronic components with increased reliability |
US8633094B2 (en) | 2011-12-01 | 2014-01-21 | Power Integrations, Inc. | GaN high voltage HFET with passivation plus gate dielectric multilayer structure |
US8940620B2 (en) | 2011-12-15 | 2015-01-27 | Power Integrations, Inc. | Composite wafer for fabrication of semiconductor devices |
US9165766B2 (en) | 2012-02-03 | 2015-10-20 | Transphorm Inc. | Buffer layer structures suited for III-nitride devices with foreign substrates |
US8872235B2 (en) * | 2012-02-23 | 2014-10-28 | Infineon Technologies Austria Ag | Integrated Schottky diode for HEMTs |
WO2013155108A1 (en) | 2012-04-09 | 2013-10-17 | Transphorm Inc. | N-polar iii-nitride transistors |
US9184275B2 (en) | 2012-06-27 | 2015-11-10 | Transphorm Inc. | Semiconductor devices with integrated hole collectors |
JP5995234B2 (ja) * | 2012-08-14 | 2016-09-21 | 株式会社レーザーシステム | ダイオード、電力伝送システムおよび電源線用無線接続コネクタ |
WO2014127150A1 (en) | 2013-02-15 | 2014-08-21 | Transphorm Inc. | Electrodes for semiconductor devices and methods of forming the same |
US8928037B2 (en) | 2013-02-28 | 2015-01-06 | Power Integrations, Inc. | Heterostructure power transistor with AlSiN passivation layer |
US9087718B2 (en) | 2013-03-13 | 2015-07-21 | Transphorm Inc. | Enhancement-mode III-nitride devices |
US9245992B2 (en) | 2013-03-15 | 2016-01-26 | Transphorm Inc. | Carbon doping semiconductor devices |
WO2015009514A1 (en) | 2013-07-19 | 2015-01-22 | Transphorm Inc. | Iii-nitride transistor including a p-type depleting layer |
KR20150014641A (ko) * | 2013-07-30 | 2015-02-09 | 서울반도체 주식회사 | 질화갈륨계 다이오드 및 그 제조 방법 |
CN103400864B (zh) * | 2013-07-31 | 2016-12-28 | 中国电子科技集团公司第十三研究所 | 基于极化掺杂的GaN横向肖特基二极管 |
US9318593B2 (en) | 2014-07-21 | 2016-04-19 | Transphorm Inc. | Forming enhancement mode III-nitride devices |
US9536966B2 (en) | 2014-12-16 | 2017-01-03 | Transphorm Inc. | Gate structures for III-N devices |
US9536967B2 (en) | 2014-12-16 | 2017-01-03 | Transphorm Inc. | Recessed ohmic contacts in a III-N device |
CN108604597B (zh) | 2016-01-15 | 2021-09-17 | 创世舫电子有限公司 | 具有al(1-x)sixo栅极绝缘体的增强模式iii-氮化物器件 |
WO2017210323A1 (en) | 2016-05-31 | 2017-12-07 | Transphorm Inc. | Iii-nitride devices including a graded depleting layer |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL167277C (nl) * | 1970-08-29 | 1981-11-16 | Philips Nv | Halfgeleiderinrichting met een plaatvorming half- geleiderlichaam met over althans een deel van de dikte van het halfgeleiderlichaam afgeschuinde randen, dat is voorzien van een metalen elektrode die een gelijkrichtende overgang vormt met het halfgeleider- lichaam en werkwijze ter vervaardiging van de halfgeleiderinrichting. |
US4250520A (en) * | 1979-03-14 | 1981-02-10 | Rca Corporation | Flip chip mounted diode |
GB2137412B (en) * | 1983-03-15 | 1987-03-04 | Standard Telephones Cables Ltd | Semiconductor device |
JPS6022357A (ja) * | 1983-07-18 | 1985-02-04 | Sumitomo Electric Ind Ltd | レベルシフト用シヨツトキダイオ−ド |
JPH0332062A (ja) * | 1989-06-29 | 1991-02-12 | Sharp Corp | 電極構造およびその電極構造を用いた半導体素子 |
CA2120610C (en) * | 1992-08-07 | 1999-03-02 | Hideaki Imai | Nitride based semiconductor device and manufacture thereof |
DE69425186T3 (de) * | 1993-04-28 | 2005-04-14 | Nichia Corp., Anan | Halbleitervorrichtung aus einer galliumnitridartigen III-V-Halbleiterverbindung und Verfahren zu ihrer Herstellung |
JPH08186083A (ja) * | 1994-12-28 | 1996-07-16 | Hitachi Ltd | 金属膜の形成方法 |
US6608327B1 (en) * | 1998-02-27 | 2003-08-19 | North Carolina State University | Gallium nitride semiconductor structure including laterally offset patterned layers |
US6331450B1 (en) * | 1998-12-22 | 2001-12-18 | Toyoda Gosei Co., Ltd. | Method of manufacturing semiconductor device using group III nitride compound |
EP1193766A4 (de) * | 1999-04-30 | 2007-05-30 | Rohm Co Ltd | Halbleiteranordnung mit bipolaren transistoren |
JP4412827B2 (ja) * | 1999-08-20 | 2010-02-10 | シャープ株式会社 | 窒化物半導体厚膜基板 |
US6184570B1 (en) * | 1999-10-28 | 2001-02-06 | Ericsson Inc. | Integrated circuit dies including thermal stress reducing grooves and microelectronic packages utilizing the same |
US6380108B1 (en) * | 1999-12-21 | 2002-04-30 | North Carolina State University | Pendeoepitaxial methods of fabricating gallium nitride semiconductor layers on weak posts, and gallium nitride semiconductor structures fabricated thereby |
US6573537B1 (en) * | 1999-12-22 | 2003-06-03 | Lumileds Lighting, U.S., Llc | Highly reflective ohmic contacts to III-nitride flip-chip LEDs |
US6586781B2 (en) * | 2000-02-04 | 2003-07-01 | Cree Lighting Company | Group III nitride based FETs and HEMTs with reduced trapping and method for producing the same |
KR100348269B1 (ko) | 2000-03-22 | 2002-08-09 | 엘지전자 주식회사 | 루데니움 산화물을 이용한 쇼트키 콘택 방법 |
US6686616B1 (en) * | 2000-05-10 | 2004-02-03 | Cree, Inc. | Silicon carbide metal-semiconductor field effect transistors |
US6344665B1 (en) * | 2000-06-23 | 2002-02-05 | Arima Optoelectronics Corp. | Electrode structure of compound semiconductor device |
JP2003069048A (ja) * | 2001-08-30 | 2003-03-07 | Sanyo Electric Co Ltd | ショットキーバリアダイオードおよびその製造方法 |
US6682968B2 (en) * | 2000-07-27 | 2004-01-27 | Sanyo Electric Co., Ltd. | Manufacturing method of Schottky barrier diode |
JP2003101036A (ja) * | 2001-09-25 | 2003-04-04 | Sanyo Electric Co Ltd | ショットキーバリアダイオードおよびその製造方法 |
JP2002305309A (ja) * | 2001-02-01 | 2002-10-18 | Hitachi Ltd | 半導体装置およびその製造方法 |
US6437374B1 (en) * | 2001-05-07 | 2002-08-20 | Xerox Corporation | Semiconductor device and method of forming a semiconductor device |
TW492202B (en) * | 2001-06-05 | 2002-06-21 | South Epitaxy Corp | Structure of III-V light emitting diode (LED) arranged in flip chip configuration having structure for preventing electrostatic discharge |
JP2003023175A (ja) * | 2001-07-10 | 2003-01-24 | Pawdec:Kk | Msm型半導体受光素子 |
US20030015708A1 (en) * | 2001-07-23 | 2003-01-23 | Primit Parikh | Gallium nitride based diodes with low forward voltage and low reverse current operation |
US6524900B2 (en) * | 2001-07-25 | 2003-02-25 | Abb Research, Ltd | Method concerning a junction barrier Schottky diode, such a diode and use thereof |
US20030034293A1 (en) * | 2001-08-16 | 2003-02-20 | Pti Advanced Filtration, Inc. | Method of treating filtration media to prevent lateral flow, blistering and de-lamination |
JP4064085B2 (ja) * | 2001-10-18 | 2008-03-19 | 三菱電機株式会社 | 半導体装置及びその製造方法 |
KR200283621Y1 (ko) * | 2002-03-18 | 2002-07-27 | (주)에스와이하이테크 | 음성도서유닛 |
US6624444B1 (en) * | 2002-03-28 | 2003-09-23 | Intel Corporation | Electrical-optical package with capacitor DC shunts and associated methods |
EP1502303B1 (de) * | 2002-04-30 | 2011-12-21 | Cree, Inc. | Hochspannungsschaltbauelemente und prozess zu ihrer herstellung |
US7323402B2 (en) * | 2002-07-11 | 2008-01-29 | International Rectifier Corporation | Trench Schottky barrier diode with differential oxide thickness |
-
2004
- 2004-02-17 US US10/780,363 patent/US7084475B2/en not_active Expired - Lifetime
-
2005
- 2005-02-16 TW TW094104495A patent/TWI411008B/zh not_active IP Right Cessation
- 2005-02-16 JP JP2005039132A patent/JP5150803B2/ja not_active Expired - Fee Related
- 2005-02-16 TW TW101100217A patent/TWI493597B/zh not_active IP Right Cessation
- 2005-02-17 FR FR0501625A patent/FR2870046B1/fr not_active Expired - Fee Related
- 2005-02-17 CN CNB2005100075992A patent/CN100517763C/zh not_active Expired - Fee Related
- 2005-02-17 EP EP05290361A patent/EP1564815B1/de not_active Expired - Lifetime
- 2005-02-17 DE DE602005006025T patent/DE602005006025T2/de not_active Expired - Lifetime
- 2005-02-17 AT AT05290361T patent/ATE392717T1/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN100517763C (zh) | 2009-07-22 |
US7084475B2 (en) | 2006-08-01 |
TWI493597B (zh) | 2015-07-21 |
JP2005236288A (ja) | 2005-09-02 |
JP5150803B2 (ja) | 2013-02-27 |
US20050179104A1 (en) | 2005-08-18 |
CN1658402A (zh) | 2005-08-24 |
TW201230143A (en) | 2012-07-16 |
TW200601396A (en) | 2006-01-01 |
TWI411008B (zh) | 2013-10-01 |
FR2870046B1 (fr) | 2008-01-18 |
DE602005006025T2 (de) | 2009-05-07 |
FR2870046A1 (fr) | 2005-11-11 |
DE602005006025D1 (de) | 2008-05-29 |
EP1564815B1 (de) | 2008-04-16 |
EP1564815A1 (de) | 2005-08-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE392717T1 (de) | Laterale schottkydiode mit mehreren mesa | |
US10306714B2 (en) | Semiconductor component and light emitting device using same | |
JP5940235B1 (ja) | 半導体装置 | |
WO2004066397A3 (en) | Rugged fred and fabrication | |
JP2008514030A5 (de) | ||
CN103782393A (zh) | 肖特基二极管 | |
US20160079369A1 (en) | Semiconductor device | |
CN104025302A (zh) | 采用用于结势垒阵列的元件的凹处的肖特基二极管 | |
WO2009034851A1 (ja) | 給電装置とその駆動方法 | |
CN102024836A (zh) | 发光元件 | |
ATE520152T1 (de) | Leistungshalbleiterbauelement | |
JPWO2022137788A5 (de) | ||
CN107039482B (zh) | 一种半导体组件及具有该半导体组件的发光装置 | |
TW200618349A (en) | Transparent electrode for semiconductor light-emitting device | |
EP2696376A3 (de) | Stromsperrschicht für eine Leuchtdiode | |
JP2012156154A (ja) | 電力用半導体装置 | |
CN111295763A (zh) | 宽带隙半导体装置 | |
CN105633237A (zh) | 一种垂直led芯片 | |
EP1729345A3 (de) | Halbleiterbauelement mit einer Diode für eine Gleichrichterschaltung | |
US20100320498A1 (en) | Light-emitting diode device | |
KR20160128933A (ko) | 전계 효과 트랜지스터를 포함하는 스위치 및 집적 회로 | |
US20140055192A1 (en) | Saturation current limiting circuit topology for power transistors | |
JP6246979B1 (ja) | Mosfet及び電力変換回路 | |
JP2015057843A (ja) | 電力用半導体装置 | |
KR20140075532A (ko) | 반도체 소자 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |