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ATE175453T1 - Verfahren zur galvanischen abscheidung von blendfreien nickelniederschlägen - Google Patents

Verfahren zur galvanischen abscheidung von blendfreien nickelniederschlägen

Info

Publication number
ATE175453T1
ATE175453T1 AT96116639T AT96116639T ATE175453T1 AT E175453 T1 ATE175453 T1 AT E175453T1 AT 96116639 T AT96116639 T AT 96116639T AT 96116639 T AT96116639 T AT 96116639T AT E175453 T1 ATE175453 T1 AT E175453T1
Authority
AT
Austria
Prior art keywords
electrolyte
adducts
depositation
glare
galvanic
Prior art date
Application number
AT96116639T
Other languages
English (en)
Inventor
Carmen Elligsen
Gerd Schoengen
Detlef Kowczyk
Original Assignee
Lpw Chemie Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7775920&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE175453(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Lpw Chemie Gmbh filed Critical Lpw Chemie Gmbh
Application granted granted Critical
Publication of ATE175453T1 publication Critical patent/ATE175453T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
AT96116639T 1995-10-27 1996-10-17 Verfahren zur galvanischen abscheidung von blendfreien nickelniederschlägen ATE175453T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19540011A DE19540011C2 (de) 1995-10-27 1995-10-27 Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen

Publications (1)

Publication Number Publication Date
ATE175453T1 true ATE175453T1 (de) 1999-01-15

Family

ID=7775920

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96116639T ATE175453T1 (de) 1995-10-27 1996-10-17 Verfahren zur galvanischen abscheidung von blendfreien nickelniederschlägen

Country Status (6)

Country Link
US (1) US5897763A (de)
EP (1) EP0770710B2 (de)
JP (1) JPH09202987A (de)
AT (1) ATE175453T1 (de)
DE (2) DE19540011C2 (de)
ES (1) ES2128135T5 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1086262A4 (de) * 1999-03-19 2002-01-02 Technic Bad für die elektrobeschichtung
US6248228B1 (en) * 1999-03-19 2001-06-19 Technic, Inc. And Specialty Chemical System, Inc. Metal alloy halide electroplating baths
US6251253B1 (en) * 1999-03-19 2001-06-26 Technic, Inc. Metal alloy sulfate electroplating baths
US6797141B1 (en) * 1999-11-25 2004-09-28 Enthone Inc. Removal of coagulates from a non-glare electroplating bath
US6306275B1 (en) * 2000-03-31 2001-10-23 Lacks Enterprises, Inc. Method for controlling organic micelle size in nickel-plating solution
DE10025552C1 (de) * 2000-05-19 2001-08-02 Atotech Deutschland Gmbh Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges
DE10222962A1 (de) * 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge
ATE507327T1 (de) * 2006-01-06 2011-05-15 Enthone Elektrolyt und verfahren zur abscheidung einer matten metallschicht
PL2620529T3 (pl) * 2012-01-25 2014-09-30 Atotech Deutschland Gmbh Sposób wytwarzania matowych warstw miedzianych
JP6760166B2 (ja) 2017-03-23 2020-09-23 トヨタ自動車株式会社 ニッケル皮膜の形成方法及び当該方法に使用するためのニッケル溶液
US11505867B1 (en) 2021-06-14 2022-11-22 Consolidated Nuclear Security, LLC Methods and systems for electroless plating a first metal onto a second metal in a molten salt bath, and surface pretreatments therefore

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2238861A (en) * 1938-07-06 1941-04-15 Harshaw Chem Corp Electrodeposition of metals
DE1134258B (de) * 1959-05-06 1962-08-02 Dehydag Gmbh Saures galvanisches Nickelbad
DE1621085C3 (de) * 1967-05-16 1980-02-14 Henkel Kgaa, 4000 Duesseldorf Saures galvanisches Bad zur Abscheidung satinglanzender Nickelniederschlage
US3839166A (en) * 1967-05-16 1974-10-01 Henkel & Cie Gmbh Method for obtaining nickel deposits with satin finish
US3839165A (en) * 1967-08-26 1974-10-01 Henkel & Cie Gmbh Nickel electroplating method
BE794695A (fr) * 1972-01-29 1973-05-16 W Kampschulte & Cie K G Dr Bain galvanique de nickel pour la separation de revetements de nickel satines mats
DE2327881B2 (de) * 1973-06-01 1978-06-22 Langbein-Pfanhauser Werke Ag, 4040 Neuss Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge
JPS56152988A (en) * 1980-04-30 1981-11-26 Nobuyuki Koura Nickel satin finish plating bath of heavy ruggedness
JPS61238993A (ja) * 1985-04-16 1986-10-24 Dai Ichi Kogyo Seiyaku Co Ltd 電気メツキ浴用添加剤
JPS62205041A (ja) * 1986-03-05 1987-09-09 Nisso Yuka Kogyo Kk １，４−ブチンジオ−ルのヒドロキシアルキルエ−テル化物の製造方法およびこれを用いたニツケルメツキ処理液

Also Published As

Publication number Publication date
JPH09202987A (ja) 1997-08-05
DE19540011A1 (de) 1997-04-30
ES2128135T5 (es) 2003-03-01
EP0770710B2 (de) 2002-08-14
EP0770710B1 (de) 1999-01-07
US5897763A (en) 1999-04-27
EP0770710A1 (de) 1997-05-02
ES2128135T3 (es) 1999-05-01
DE59601103D1 (de) 1999-02-18
DE19540011C2 (de) 1998-09-10

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