WO2023053504A1 - 芳香族ポリアミド系逆浸透膜の洗浄剤、洗浄液及び洗浄方法 - Google Patents
芳香族ポリアミド系逆浸透膜の洗浄剤、洗浄液及び洗浄方法 Download PDFInfo
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- WO2023053504A1 WO2023053504A1 PCT/JP2022/011877 JP2022011877W WO2023053504A1 WO 2023053504 A1 WO2023053504 A1 WO 2023053504A1 JP 2022011877 W JP2022011877 W JP 2022011877W WO 2023053504 A1 WO2023053504 A1 WO 2023053504A1
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- WIPO (PCT)
- Prior art keywords
- cleaning
- aromatic polyamide
- reverse osmosis
- polyamide reverse
- agent
- Prior art date
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- 239000012528 membrane Substances 0.000 title claims abstract description 103
- 238000001223 reverse osmosis Methods 0.000 title claims abstract description 77
- 238000004140 cleaning Methods 0.000 title claims abstract description 76
- 239000004760 aramid Substances 0.000 title claims abstract description 51
- 229920003235 aromatic polyamide Polymers 0.000 title claims abstract description 51
- 239000012459 cleaning agent Substances 0.000 title claims abstract description 47
- 239000007788 liquid Substances 0.000 title claims abstract description 37
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000007864 aqueous solution Substances 0.000 claims abstract description 30
- -1 chloramine compound Chemical class 0.000 claims abstract description 30
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 claims abstract description 29
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- 239000002738 chelating agent Substances 0.000 claims abstract description 22
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 20
- 150000002367 halogens Chemical class 0.000 claims abstract description 20
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 19
- 125000003277 amino group Chemical group 0.000 claims abstract description 15
- 150000003839 salts Chemical class 0.000 claims abstract description 11
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims abstract description 7
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims abstract description 6
- 229920000137 polyphosphoric acid Polymers 0.000 claims abstract description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 27
- 230000000087 stabilizing effect Effects 0.000 claims description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- 239000003599 detergent Substances 0.000 claims description 9
- 239000003945 anionic surfactant Substances 0.000 claims description 8
- OGQPUOLFKIMRMF-UHFFFAOYSA-N chlorosulfamic acid Chemical compound OS(=O)(=O)NCl OGQPUOLFKIMRMF-UHFFFAOYSA-N 0.000 claims description 8
- 150000001412 amines Chemical class 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 6
- 150000003863 ammonium salts Chemical class 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 28
- 230000004907 flux Effects 0.000 abstract description 13
- 239000000356 contaminant Substances 0.000 abstract description 4
- 238000010612 desalination reaction Methods 0.000 abstract description 3
- 238000002156 mixing Methods 0.000 abstract description 3
- 150000003009 phosphonic acids Chemical class 0.000 abstract description 3
- 238000011282 treatment Methods 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 2
- 239000000460 chlorine Substances 0.000 description 21
- 238000012360 testing method Methods 0.000 description 20
- 239000000243 solution Substances 0.000 description 19
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 18
- 229910052801 chlorine Inorganic materials 0.000 description 17
- 230000000694 effects Effects 0.000 description 17
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 16
- 239000004094 surface-active agent Substances 0.000 description 15
- 238000005406 washing Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 9
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 7
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 6
- 235000015165 citric acid Nutrition 0.000 description 6
- 239000003513 alkali Substances 0.000 description 5
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000007800 oxidant agent Substances 0.000 description 5
- SZHQPBJEOCHCKM-UHFFFAOYSA-N 2-phosphonobutane-1,2,4-tricarboxylic acid Chemical compound OC(=O)CCC(P(O)(O)=O)(C(O)=O)CC(O)=O SZHQPBJEOCHCKM-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 4
- 235000019832 sodium triphosphate Nutrition 0.000 description 4
- QDHHCQZDFGDHMP-UHFFFAOYSA-N Chloramine Chemical compound ClN QDHHCQZDFGDHMP-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- HVBSAKJJOYLTQU-UHFFFAOYSA-N 4-aminobenzenesulfonic acid Chemical compound NC1=CC=C(S(O)(=O)=O)C=C1 HVBSAKJJOYLTQU-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- SYELZBGXAIXKHU-UHFFFAOYSA-N dodecyldimethylamine N-oxide Chemical compound CCCCCCCCCCCC[N+](C)(C)[O-] SYELZBGXAIXKHU-UHFFFAOYSA-N 0.000 description 2
- 238000001728 nano-filtration Methods 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 2
- 238000004065 wastewater treatment Methods 0.000 description 2
- BAERPNBPLZWCES-UHFFFAOYSA-N (2-hydroxy-1-phosphonoethyl)phosphonic acid Chemical compound OCC(P(O)(O)=O)P(O)(O)=O BAERPNBPLZWCES-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- IQEKRNXJPCBUAT-UHFFFAOYSA-N 2-[hydroperoxy(hydroxy)phosphoryl]acetic acid Chemical compound OOP(O)(=O)CC(O)=O IQEKRNXJPCBUAT-UHFFFAOYSA-N 0.000 description 1
- KDNIOKSLVIGAAN-UHFFFAOYSA-N 2-sulfamoylbenzoic acid Chemical compound NS(=O)(=O)C1=CC=CC=C1C(O)=O KDNIOKSLVIGAAN-UHFFFAOYSA-N 0.000 description 1
- GEHMBYLTCISYNY-UHFFFAOYSA-N Ammonium sulfamate Chemical compound [NH4+].NS([O-])(=O)=O GEHMBYLTCISYNY-UHFFFAOYSA-N 0.000 description 1
- ZKQDCIXGCQPQNV-UHFFFAOYSA-N Calcium hypochlorite Chemical compound [Ca+2].Cl[O-].Cl[O-] ZKQDCIXGCQPQNV-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Inorganic materials [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
- CODNYICXDISAEA-UHFFFAOYSA-N bromine monochloride Chemical compound BrCl CODNYICXDISAEA-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 1
- 229940077239 chlorous acid Drugs 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 235000019387 fatty acid methyl ester Nutrition 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- CUILPNURFADTPE-UHFFFAOYSA-N hypobromous acid Chemical compound BrO CUILPNURFADTPE-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- WWRMRGSSMGHJPF-UHFFFAOYSA-N n-dodecyl-n-methylhydroxylamine Chemical compound CCCCCCCCCCCCN(C)O WWRMRGSSMGHJPF-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- BTAAXEFROUUDIL-UHFFFAOYSA-M potassium;sulfamate Chemical compound [K+].NS([O-])(=O)=O BTAAXEFROUUDIL-UHFFFAOYSA-M 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- QDWYPRSFEZRKDK-UHFFFAOYSA-M sodium;sulfamate Chemical compound [Na+].NS([O-])(=O)=O QDWYPRSFEZRKDK-UHFFFAOYSA-M 0.000 description 1
- 238000013112 stability test Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 229950000244 sulfanilic acid Drugs 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- 229940048102 triphosphoric acid Drugs 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 238000003809 water extraction Methods 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/10—Accessories; Auxiliary operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
- B01D65/06—Membrane cleaning or sterilisation ; Membrane regeneration with special washing compositions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D17/00—Detergent materials or soaps characterised by their shape or physical properties
- C11D17/08—Liquid soap, e.g. for dispensers; capsuled
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/36—Organic compounds containing phosphorus
Definitions
- the present invention relates to a cleaning agent, a cleaning liquid, and a cleaning method for aromatic polyamide reverse osmosis membranes used in the field of water treatment. Specifically, when the aromatic polyamide reverse osmosis membrane is contaminated and the membrane performance such as permeation flux and rejection rate is lowered, it contains a cleaning agent for effectively restoring the performance, and this cleaning agent.
- the present invention relates to a cleaning liquid and a method for cleaning an aromatic polyamide reverse osmosis membrane using this cleaning liquid.
- aromatic polyamide-based RO membranes which are capable of low-pressure operation and have excellent desalination performance, have been widely used as RO membranes for water treatment.
- aromatic polyamide RO membranes have low resistance to chlorine, unlike cellulose acetate RO membranes, they cannot be treated with chlorine under operating conditions. There is a problem that it is more likely to occur than a cellulosic RO membrane.
- aromatic polyamide-based RO membranes have higher resistance to alkali than cellulose acetate-based RO membranes, and can be washed under alkaline conditions of pH 10 or higher.
- Patent Document 1 describes, as a cleaning agent for alkali-resistant aromatic polyamide RO membranes, a cleaning agent comprising an aqueous solution having a pH of 13 or higher containing a chloramine compound, a surfactant such as an alkylbenzenesulfonate, and an alkaline agent.
- the present invention effectively removes contaminants that cannot be sufficiently removed with conventional cleaning agents when an aromatic polyamide RO membrane is contaminated and performance such as permeation flux and desalinization rate is lowered.
- An object of the present invention is to provide a cleaning agent, a cleaning liquid, and a cleaning method that can
- the gist of the present invention is as follows.
- the concentration of the stabilizing halogen in the cleaning agent is 0.1 to 0.5 M, the concentration of the chelating agent is 0.2 to 2 M, and the concentration of the alkaline agent is 1 to 5 M.
- a cleaning liquid for aromatic polyamide reverse osmosis membranes comprising a dilute aqueous solution of the cleaning agent for aromatic polyamide reverse osmosis membranes according to any one of [1] to [7].
- a method for cleaning an aromatic polyamide reverse osmosis membrane comprising the step of bringing the aromatic polyamide reverse osmosis membrane into contact with the cleaning liquid described in [8] or [9].
- the present invention it is possible to apply a chlorine-based cleaning agent component even to an aromatic polyamide-based RO membrane with low chlorine resistance. For this reason, in addition to the stripping effect and hydrolysis effect under alkaline conditions, the sterilization and organic matter decomposition effects of the stabilized halogen and the cleaning effect of the specific chelating agent are added, and these effects work synergistically for good results. It is possible to effectively restore the performance of the aromatic polyamide reverse osmosis membrane with a strong alkaline cleaning effect.
- FIG. 2 is a cross-sectional view showing the structure of a closed container of the flat membrane test apparatus of FIG. 1; 4 is a graph showing measurement results of Test Example 1.
- FIG. 2 is a cross-sectional view showing the structure of a closed container of the flat membrane test apparatus of FIG. 1; 4 is a graph showing measurement results of Test Example 1.
- the cleaning agent for an aromatic polyamide-based reverse osmosis membrane of the present invention comprises a chelating agent containing a stabilizing halogen and one or more selected from aliphatic carboxylic acids not containing amino groups, polyphosphoric acids, and salts thereof. , an alkaline agent, and an aqueous solution having a pH of 13 or higher.
- the cleaning solution for the aromatic polyamide-based reverse osmosis membrane of the present invention consists of a dilute aqueous solution of this cleaning agent.
- the present invention targets aromatic polyamide reverse osmosis membranes (including nanofiltration (NF) membranes).
- the stabilized halogen used as the halogen-based cleaning agent component is either a compound having a primary amino group, ammonia, or an ammonium salt (hereinafter, these are referred to as "NH 2 -based compounds"), and chlorine It can be produced by mixing a halogen-based oxidizing agent such as a bromine-based oxidizing agent or a bromine-based oxidizing agent. Hypochlorous acid and/or hypochlorite is preferably used as the chlorine-based oxidizing agent.
- Bromine-based oxidizing agents include bromine (liquid bromine), bromine chloride, bromic acid, bromate, and hypobromous acid.
- a chloramine compound that is, a compound (XNH 2 ) having a primary amino group is reacted with hypochlorous acid (HOCl) in the reactions shown in the following reaction formulas (1) and (2).
- HOCl hypochlorous acid
- a compound obtained by substituting a chlorine atom for a hydrogen atom of an amino group (XNHCl) is preferred. Since this compound has a weak oxidizing effect on membranes, it can be used as a cleaning agent even for aromatic polyamide RO membranes with low resistance to chlorine.
- Examples of compounds having a primary amino group include aliphatic amines, aromatic amines, sulfamic acid, sulfanilic acid, sulfamoylbenzoic acid, and amino acids.
- Ammonium salts include ammonium chloride and ammonium sulfate. These may be used individually by 1 type, and may be used in mixture of 2 or more types. Among these NH2 - based compounds, sulfamic acid ( NH2SO2OH ) is preferred. Sulfamic acid is used to form monochlorosulfamin, which is a stable chloramine compound. Sulfamic acid does not increase the TOC value of the detergent because it does not contain carbon. A combination of sulfamic acid and an alkaline agent provides a very effective cleaning agent.
- Hypochlorites to be reacted with NH2 - based compounds include alkali metal salts of hypochlorous acid such as sodium hypochlorite and alkaline earth metal salts of hypochlorous acid such as calcium hypochlorite. can be used. These may be used individually by 1 type, and may be used in mixture of 2 or more types.
- the NH2 - based compound and hypochlorous acid and/or hypochlorite are mixed to produce a chloramine compound
- the NH2 - based compound and hypochlorous acid and/or hypochlorite are
- the Cl 2 /N molar ratio which is the molar ratio of available chlorine (Cl 2 ) derived from chloric acid and/or hypochlorite to nitrogen atom N derived from the NH 2 -based compound, is preferably 0.1 to 1. From the viewpoint of the production efficiency and stability of chloramine, it is preferable to use it so that it is 0.2 to 0.85, more preferably 0.3 to 0.7.
- Cl 2 /N molar ratio is larger than the above upper limit, free chlorine may be produced, and if it is smaller than the above lower limit, the efficiency of chloramine production with respect to the NH 2 -based compound used will be low.
- the amount of hypochlorous acid and/or hypochlorite is the amount of chloramine compound in the chloramine compound/surfactant-containing alkaline aqueous solution.
- the chelating agent used in the present invention is one or more selected from aliphatic carboxylic acids containing no amino group, phosphonic acid compounds containing no amino group, polyphosphoric acid and salts thereof.
- Aliphatic carboxylic acids containing no amino group include succinic acid, malic acid, tartaric acid, citric acid, oxalic acid, PBTC (phosphonobutanetricarboxylic acid), acrylic acid, methacrylic acid, and maleic acid.
- PBTC phosphonobutanetricarboxylic acid
- acrylic acid methacrylic acid
- maleic acid Low-molecular-weight water-soluble polymers obtained by polymerizing or copolymerizing one or more selected monomers are exemplified.
- HEDP hydroxyethylidene diphosphonic acid
- HPAA hydroxyphosphonoacetic acid
- polyphosphoric acid hexametaphosphoric acid, tetrapolyphosphoric acid, triphosphoric acid, or the like can be used.
- sodium salt or potassium salt is preferable.
- Alkali metal hydroxides such as sodium hydroxide and potassium hydroxide are suitable as the alkali agent used in the cleaning agent of the present invention. These may be used individually by 1 type, and may be used in mixture of 2 or more types.
- the cleaning agents of the present invention may contain surfactants.
- an anionic surfactant having a molecular weight of 1000 or less is preferable from the viewpoint of cleaning effect.
- a surfactant with an excessively large molecular weight not only fails to provide a cleaning effect, but may also contaminate the membrane.
- the surfactant preferably does not contain an amino group or an amine oxide in its molecular structure.
- anionic surfactants include alkylbenzenesulfonates such as sodium dodecylbenzenesulfonate, alkylsulfates such as sodium laurylsulfate, alkyldiphenyletherdisulfonates, alkylnaphthalenesulfonates, dialkylsulfosuccinates, poly One or more of oxyethylene alkyl ether sulfates, ⁇ -sulfo fatty acid methyl ester salts, ⁇ -olefin sulfonates and the like can be used.
- the cleaning agent of the present invention has a pH of 13 or higher.
- the stabilizing halogen concentration in the detergent is 0.1-0.5M, the chelating agent concentration is 0.2-2M, the alkaline agent concentration is 1-5M, and the surfactant concentration is 0.5M or less. , for example, 0.002 to 0.5M.
- the cleaning liquid of the present invention consists of an aqueous solution obtained by diluting this cleaning agent with water. If the pH of this washing liquid is less than 11, the permeation flux cannot be fully recovered. The higher the pH of the cleaning liquid, the better the cleaning effect. However, if the pH is too high, the handling of the cleaning liquid becomes poor, and there is a high risk of deterioration of permeable membranes such as RO membranes.
- the pH of the cleaning liquid is preferably 11 or more and 13 or less.
- the concentration of a stabilizing halogen such as a chloramine compound in this washing liquid is preferably 0.002 to 0.015M, more preferably 0.005 to 0.01M. If the concentration of the stabilizing halogen in the cleaning liquid is too low, a sufficient cleaning effect cannot be obtained, and if it is too high, the permeable membrane such as the RO membrane may be deteriorated.
- the chloramine compound concentration of 0.1 M is equivalent to a total chlorine concentration of 7100 mg-Cl 2 /L. The total chlorine concentration can be measured by the DPD method specified in JIS K0400-33-10.1999 or the like.
- Chloramine compounds are conventionally used as slime control agents for permeable membranes.
- a chloramine compound as a slime control agent is usually used at a low concentration of about 0.05 to 50 mg-Cl 2 /L as total chlorine concentration.
- the pH in that case is less than ten.
- the cleaning solution of the present invention contains the chloramine compound at such a high concentration as described above, has a high alkalinity of pH 11 or more, and exhibits a high cleaning effect.
- the concentration of the chelating agent in the washing liquid is preferably 0.004-0.06M, and more preferably 0.01-0.04M.
- the surfactant concentration in the cleaning liquid is preferably 0.0015M or less, and particularly preferably 0.00005 to 0.001M.
- the cleaning agent of the present invention is prepared by adding and dissolving an NH2 - based compound such as sulfamic acid to the aqueous solution of the alkaline agent described above, and adding hypochlorous acid and/or hypochlorous acid to the obtained NH2 - based compound aqueous solution. It can be prepared by adding salt and mixing.
- the aqueous solution of the alkaline agent preferably contains 50 to 90% by weight of water.
- the chelating agent and the surfactant may be added in any step of the preparation process of the detergent, may be included in the aqueous solution of the alkali agent in advance, or may be added to the aqueous solution of the NH2 - based compound in advance. It may be added when adding chlorous acid and/or hypochlorite, or may be added before or after adding hypochlorous acid and/or hypochlorite. Preferably, the chelating agent or surfactant is added after the addition of hypochlorous acid and/or hypochlorite.
- a compound having a primary amino group such as sulfamic acid may be added in the form of a salt.
- this salt include those that are soluble when converted into an alkaline aqueous solution containing a chloramine compound/surfactant, such as sodium sulfamate, potassium sulfamate, and ammonium sulfamate.
- the NH2 - based compound is added so that the concentration of the chloramine compound in the cleaning agent of the present invention is the above concentration.
- the amount of the NH 2 -based compound added is preferably such that the content ratio of the alkaline agent and the NH 2 -based compound is 0.5 to 0.7 in terms of N/alkali metal (molar ratio).
- the NH2 - based compound can be added in powder form or in the form of an aqueous solution.
- the amount of alkali metal contained in the sulfamate is added as an alkali.
- the amount of water contained in the aqueous solution is added as the amount of water in the alkaline aqueous solution.
- hypochlorous acid and/or hypochlorite is preferably added as an aqueous solution having an effective chlorine (Cl 2 ) concentration of 5 to 20% by weight, preferably 10 to 15% by weight.
- Hypochlorous acid and/or hypochlorite are added so that the chloramine compound concentration in the cleaning agent of the present invention is the above concentration, and the NH2 - based compound and hypochlorous acid and/or hypochlorous acid
- the content ratio with the salt is added so as to achieve the aforementioned Cl 2 /N molar ratio.
- the cleaning agent of the present invention comprising an aqueous solution formulation which is excellent in reactivity, stability, handleability, chlorine-free odor, etc., without generation of foaming or chlorine odor. Even in this case, it is preferable to gradually add hypochlorous acid and/or hypochlorite and mix.
- the cleaning liquid of the present invention is produced by diluting the thus produced cleaning agent of the present invention with water, preferably pure water.
- water preferably pure water.
- the cleaning liquid of the present invention can also be produced directly by the same method as described above without going through the cleaning agent of the present invention.
- the method for cleaning the aromatic polyamide reverse osmosis membrane using the cleaning liquid of the present invention is not particularly limited, as long as the aromatic polyamide reverse osmosis membrane is brought into contact with the cleaning liquid.
- Immersion cleaning is usually performed by introducing a cleaning liquid into the raw water side of the permeable membrane module and allowing it to stand still.
- the immersion cleaning time with the cleaning liquid there is no particular limitation on the immersion cleaning time with the cleaning liquid, and it is sufficient if the desired recovery rate of membrane performance is obtained, but it is usually about 2 to 24 hours.
- high-purity water such as pure water is normally passed through for final cleaning.
- the membrane Before or after washing the aromatic polyamide reverse osmosis membrane according to the present invention, the membrane may be washed with another washing liquid. Before or after the aromatic polyamide reverse osmosis membrane is washed with the washing solution of the present invention, it may be washed with an alkaline aqueous solution containing no chloramine compound or surfactant. Also, acid cleaning may be carried out, which is effective for removing scales and metal colloids.
- Washing test (1) using a chloramine compound and a chelating agent in combination A cleaning solution containing 0.5% EDTA as a chelating agent, a cleaning solution containing 0.5% sodium triphosphate, and 2% sodium triphosphate were added to 200 mL of an aqueous sodium hydroxide solution of pH 12 containing 0.01 M monochlorosulfamic acid. Wash solutions Three wash solutions were prepared.
- RO membrane aromatic polyamide reverse osmosis membrane
- Test Example 3 Washing test (2) using a chloramine compound and a chelating agent in combination The test was conducted in the same manner as in Test Example 2, except that 1% HEDP or 1% PBTC was added as a chelating agent to 200 mL of an aqueous sodium hydroxide solution of pH 12 containing 0.01 M monochlorosulfamic acid. As a blank, the test was also conducted without adding the chelating agent.
- RO membrane feed water is supplied from a pipe 11 by a high-pressure pump 4 to a raw water chamber 1A below a flat membrane cell 2 in which an RO membrane is set in a sealed container 1 .
- the closed container 1 is composed of a lower case 1a on the side of the raw water chamber 1A and an upper case 1b on the side of the permeated water chamber 1B.
- a cell 2 is fixed via an O-ring 8 .
- the flat membrane cell 2 is configured such that the permeated water side of the RO membrane 2A is supported by a porous support plate 2B.
- the inside of the raw water chamber 1A below the flat membrane cell 2 is stirred by rotating the stirrer 5 with the stirrer 3 .
- the RO membrane permeated water is taken out from the pipe 12 through the permeated water chamber 1B on the upper side of the flat membrane cell 2 .
- Concentrated water is taken out from the pipe 13 .
- the pressure inside the closed container 1 is adjusted by a pressure gauge 6 provided on the water supply pipe 11 and a pressure control valve 7 provided on the concentrated water extraction pipe 13 .
- RO membrane, test contaminated RO membrane, pure water permeation flux thereof An RO membrane contaminated with organic matter recovered from a wastewater treatment plant (Toray's aromatic polyamide-based RO membrane "TML10") was loaded into the flat membrane test apparatus shown in FIGS. The pure water permeation flux of the contaminated RO membrane was measured under the conditions.
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Abstract
Description
本発明は、芳香族ポリアミド系逆浸透膜(ナノ濾過(NF)膜を含む)を洗浄対象とする。
本発明において、ハロゲン系洗浄剤成分として用いる安定化ハロゲンは、1級アミノ基を有する化合物、アンモニア、及びアンモニウム塩のいずれか(以下、これらを「NH2系化合物」と称す。)と、塩素系酸化剤や臭素系酸化剤などのハロゲン系酸化剤とを混合することにより生成させることができる。塩素系酸化剤としては次亜塩素酸及び/又は次亜塩素酸塩を使用することが好ましい。また、臭素系酸化剤としては臭素(液体臭素)、塩化臭素、臭素酸、臭素酸塩、次亜臭素酸等が挙げられる。安定化ハロゲンとしてはクロラミン化合物、すなわち、以下の反応式(1),(2)に示すような反応で次亜塩素酸(HOCl)と1級アミノ基を有する化合物(XNH2)とを反応させて得られる、アミノ基の水素原子が塩素原子に置換した化合物(XNHCl)が好ましい。この化合物は、膜に対する酸化作用が弱いため、塩素耐性の低い芳香族ポリアミド系RO膜であっても洗浄剤として用いることが可能となる。
XNH2+OCl-⇔XNHCl+OH- (2)
本発明で用いるキレート剤は、アミノ基を含まない脂肪族カルボン酸、アミノ基を含まないホスホン酸化合物、ポリリン酸及びそれらの塩から選ばれる1種又は2種以上である。
本発明の洗浄剤に用いるアルカリ剤としては、水酸化ナトリウム、水酸化カリウム等のアルカリ金属の水酸化物が好適である。これらは1種を単独で用いてもよく、2種以上を混合して用いてもよい。
本発明の洗浄剤は界面活性剤を含んでもよい。界面活性剤としては、洗浄効果の面から、分子量1000以下のアニオン系界面活性剤が好ましい。分子量が過度に大きい界面活性剤では洗浄効果が得られないだけでなく、膜を汚染する場合がある。また、界面活性剤としては、アミノ基及びアミンオキシドを分子構造中に含まないものが好ましい。
本発明の洗浄剤のpHは13以上である。洗浄剤中の安定化ハロゲン濃度は0.1~0.5Mであり、キレート剤濃度は0.2~2Mであり、アルカリ剤濃度は1~5Mであり、界面活性剤濃度は0.5M以下,例えば0.002~0.5Mであることが好ましい。
本発明の洗浄液は、この洗浄剤を水で希釈した水溶液よりなる。この洗浄液のpHが11未満であると、透過流束を十分に回復させることができない。洗浄液のpHは高い方が洗浄効果に優れるが、高過ぎると、洗浄液としての取り扱い性が悪くなり、RO膜等の透過膜が劣化する危険性が高くなる。洗浄液のpHは好ましくは11以上13以下である。
本発明の洗浄剤は、前述のアルカリ剤の水溶液にスルファミン酸等のNH2系化合物を添加して溶解し、得られたNH2系化合物水溶液に、次亜塩素酸及び/又は次亜塩素酸塩を添加して混合することにより調製することができる。上記アルカリ剤の水溶液は、水の量を50~90重量%とすることが好ましい。キレート剤及び界面活性剤は、洗浄剤の調製工程のうち、いずれの工程で添加されてもよく、前述のアルカリ剤の水溶液に予め含まれていてもよく、また、NH2系化合物水溶液に次亜塩素酸及び/又は次亜塩素酸塩を添加する際に添加してもよく、次亜塩素酸及び/又は次亜塩素酸塩の添加の前後で添加してもよい。好ましくは、キレート剤や界面活性剤は次亜塩素酸及び/又は次亜塩素酸塩の添加の後に添加される。
本発明で用いる洗浄剤又は洗浄液には、その洗浄効果を損なわない範囲において、他の洗浄剤成分を添加してもよい。
本発明の洗浄液を用い芳香族ポリアミド系逆浸透膜を洗浄する方法としては、この洗浄液に芳香族ポリアミド系逆浸透膜を接触させればよく、特に制限はない。通常、透過膜モジュールの原水側に洗浄液を導入して静置する浸漬洗浄が行われる。
本発明の洗浄剤に用いられるクロラミン化合物とキレート剤との反応性を試験するために、0.005Mモノクロロスルファミン酸を含むpH12の水酸化ナトリウム水溶液200mLに対し、キレート剤として、HEDP10g/L(0.05M)、クエン酸10g/L(0.05M)、ドデシル硫酸ナトリウム10g/L(0.03M)、EDTA10g/L(0.03M)、又はドデシルジメチルアミンオキシド10g/L(0.04M)添加し、残留塩素を測定した。塩素の残留率の経時変化を図3に示す。図3の通り、アミン系のEDTA又はドデシルジメチルアミンオキシドによりクロラミン化合物が分解され易いことが認められた。
0.01Mモノクロロスルファミン酸を含むpH12の水酸化ナトリウム水溶液200mLに対しキレート剤としてEDTAを0.5%添加した洗浄液、トリリン酸ナトリウムを0.5%添加した洗浄液、及びトリリン酸ナトリウム2%添加した洗浄液の3種の洗浄液を調製した。
汚染RO膜:排水処理プラントから回収した、有機物で汚染されたRO膜(東レ社製芳香族ポリアミド系RO膜「TML10」)を8×5cmにカットしたもの。
その結果、トリリン酸ナトリウム0.5%添加洗浄液、又はトリリン酸ナトリウム2%添加洗浄液で洗浄した場合、EDTA0.5%添加洗浄液に比べて汚染物質除去効果が高いことが認められた。
試験例2において、0.01Mモノクロロスルファミン酸を含むpH12の水酸化ナトリウム水溶液200mLに対し、キレート剤としてHEDPを1%又はPBTCを1%添加したこと以外は同様にして試験を行った。なお、ブランクとして、キレート剤を添加しない場合についても試験を行った。
その結果、HEDP又はPBTCを添加すると、洗浄効果が著しく向上することが認められた。
以下に実施例及び比較例を挙げて本発明をより具体的に説明する。
この平膜試験装置において、RO膜供給水は、配管11より高圧ポンプ4で、密閉容器1のRO膜をセットした平膜セル2の下側の原水室1Aに供給される。図2に示すように、密閉容器1は、原水室1A側の下ケース1aと、透過水室1B側の上ケース1bとで構成され、下ケース1aと上ケース1bとの間に、平膜セル2がOリング8を介して固定されている。平膜セル2はRO膜2Aの透過水側が多孔質支持板2Bで支持された構成とされている。平膜セル2の下側の原水室1A内はスターラー3で攪拌子5を回転させることにより攪拌される。RO膜透過水は平膜セル2の上側の透過水室1Bを経て配管12より取り出される。濃縮水は配管13より取り出される。密閉容器1内の圧力は、給水配管11に設けた圧力計6と、濃縮水取出配管13に設けた圧力調整バルブ7により調整される。
比較例1:0.01Mモノクロロスルファミン酸のみを含むpH12の水酸化ナトリウム水溶液
比較例2:0.01Mモノクロロスルファミン酸及び0.026Mクエン酸を含むpH12の水酸化ナトリウム水溶液
比較例3:0.01Mモノクロロスルファミン酸、0.026Mクエン酸、及び0.00015Mドデシルメチルアミンオキシドを含むpH12の水酸化ナトリウム水溶液
実施例1:0.01Mモノクロロスルファミン酸、0.026Mクエン酸、及び0.00015M非アミン系アニオン界面活性剤を含むpH12の水酸化ナトリウム水溶液
排水処理プラントから回収した、有機物で汚染されたRO膜(東レ社製芳香族ポリアミド系RO膜「TML10」を、図1,2に示す平膜試験装置に装填し、0.75MPa、25℃の条件で、汚染RO膜の純水透過流束を測定した。
その後、この汚染RO膜が装填された平膜試験装置の洗浄を行った。すなわち、汚染RO膜が装填された平膜試験装置に、上記の各洗浄液を供給して容器内を洗浄液で満たし、17時間浸漬洗浄した。浸漬洗浄後、純水を供給して容器内の洗浄液を純水で押し出した後、洗浄後のRO膜の純水透過流束(Flux)を同条件で測定した。
[洗浄後のRO膜のFlux]/[洗浄前の汚染RO膜のFlux]×100%
により算出した。結果を表1に示す。
本発明を特定の態様を用いて詳細に説明したが、本発明の意図と範囲を離れることなく様々な変更が可能であることは当業者に明らかである。
本出願は、2021年9月29日付で出願された日本特許出願2021-159591に基づいており、その全体が引用により援用される。
2 平膜セル
2A RO膜
2B 多孔質支持板
3 スターラー
4 高圧ポンプ
5 攪拌子
6 圧力計
7 圧力調整バルブ
8 Oリング
Claims (10)
- 安定化ハロゲンと、アミノ基を含まない脂肪族カルボン酸、アミノ基を含まないホスホン酸化合物、ポリリン酸及びそれらの塩から選ばれる1種又は2種以上を含むキレート剤と、アルカリ剤とを含むpH13以上の水溶液よりなる、芳香族ポリアミド系逆浸透膜の洗浄剤。
- 前記洗浄剤中の安定化ハロゲンの濃度が0.1~0.5 Mであり、前記キレート剤の濃度が0.2~2 Mであり、アルカリ剤の濃度が1~5 Mである請求項1の芳香族ポリアミド系逆浸透膜の洗浄剤。
- 前記安定化ハロゲンがモノクロロスルファミン酸を含む請求項1又は2の芳香族ポリアミド系逆浸透膜の洗浄剤。
- 前記アルカリ剤が水酸化ナトリウムおよび水酸化カリウムの少なくとも一方である請求項1ないし3のいずれか1項の芳香族ポリアミド系逆浸透膜の洗浄剤。
- 分子量1000未満のアミノ基およびアミンオキシドを分子構造中に有しないアニオン系界面活性剤を含む請求項1ないし4のいずれか1項の芳香族ポリアミド系逆浸透膜の洗浄剤。
- 前記水溶液中のアニオン系界面活性剤の濃度が0.002~0.5 Mである請求項5の芳香族ポリアミド系逆浸透膜の洗浄剤。
- 前記安定化ハロゲンが、1級アミノ基を有する化合物、アンモニア及びアンモニウム塩よりなる群から選ばれる1種又は2種以上と、次亜塩素酸及び/又は次亜塩素酸塩との反応物である請求項1ないし6のいずれか1項の芳香族ポリアミド系逆浸透膜の洗浄剤。
- 請求項1ないし7のいずれか1項に記載の芳香族ポリアミド系逆浸透膜の洗浄剤の希釈水溶液よりなる、芳香族ポリアミド系逆浸透膜の洗浄液。
- 前記洗浄液のpHが11~13である請求項8の芳香族ポリアミド系逆浸透膜の洗浄液。
- 請求項8又は9に記載の洗浄液に芳香族ポリアミド系逆浸透膜を接触させる工程を有する、芳香族ポリアミド系逆浸透膜の洗浄方法。
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JP2015097991A (ja) | 2013-11-19 | 2015-05-28 | 栗田工業株式会社 | 透過膜の洗浄剤及び洗浄方法 |
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JP2015097991A (ja) | 2013-11-19 | 2015-05-28 | 栗田工業株式会社 | 透過膜の洗浄剤及び洗浄方法 |
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