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WO2017161623A1 - Amoled显示面板线缺陷的修复结构及修复方法 - Google Patents

Amoled显示面板线缺陷的修复结构及修复方法 Download PDF

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Publication number
WO2017161623A1
WO2017161623A1 PCT/CN2016/080102 CN2016080102W WO2017161623A1 WO 2017161623 A1 WO2017161623 A1 WO 2017161623A1 CN 2016080102 W CN2016080102 W CN 2016080102W WO 2017161623 A1 WO2017161623 A1 WO 2017161623A1
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WIPO (PCT)
Prior art keywords
test
line
display panel
signal
amoled display
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PCT/CN2016/080102
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English (en)
French (fr)
Inventor
韩佰祥
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深圳市华星光电技术有限公司
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Priority to US15/105,576 priority Critical patent/US10109688B2/en
Publication of WO2017161623A1 publication Critical patent/WO2017161623A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/131—Interconnections, e.g. wiring lines or terminals
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/006—Electronic inspection or testing of displays and display drivers, e.g. of LED or LCD displays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/861—Repairing

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a repair structure and a repair method for a line defect of an AMOLED display panel.
  • OLED Organic Light Emitting Display
  • OLED Organic Light Emitting Display
  • a large-area full-color display and many other advantages have been recognized by the industry as the most promising display panel.
  • the OLED display panel can be divided into two types: passive matrix OLED (PMOLED) and active matrix OLED (AMOLED), namely direct addressing and thin film transistor (Thin Film Transistor, according to the driving method). TFT) matrix addressing two types.
  • the AMOLED has pixels arranged in an array, which is an active display type, and has high luminous efficiency.
  • the panel test Cell Test, CT
  • the panel detecting line is usually provided outside the display area of the AMOLED display panel.
  • the conventional AMOLED display panel detection circuit includes a plurality of signal lines 100' and a plurality of signal fanout lines 200' connected to the signal line 100' one-to-one.
  • a plurality of test TFTs 310' connected in one-to-one correspondence with the signal lines 100', a test control line 320' connected to all of the test TFTs 310', and a plurality of test lines 330'.
  • the test TFT 310' includes a gate, a source 312', an active layer 313', and a drain 314', wherein all of the gates are served by the test control line 320', the source 312', and the drain
  • the pole 314' is located in the same layer as the signal line 100', and the drain 314' is connected to a signal line 100'. All the source 312' of the test TFT 310' responsible for testing the same color pixel is connected to a test line 330'. .
  • the test control line 320' receives the test control signal provided by the panel test terminal to turn on all the test TFTs 310', and the test line 330' receives the test signal provided by the panel test terminal through the test TFT 310'. It is transmitted to the corresponding signal line 100' to test whether the display panel is operating normally.
  • the panel test terminal stops providing the test control signal and the test signal, and the test control line 320' has no signal to receive the test TFT. 310' is off and the display panel is displayed normally.
  • the existing AMOLED display panel detection circuit occupies a certain layout space, but is only used for testing.
  • the defect repair of the AMOLED display panel especially the repair of the line defect is relatively difficult.
  • the bright line can only be repaired as a dark line, which will affect the quality of the AMOLED display panel, so it is necessary to design a repair line to maximize the yield.
  • Existing repair lines for AMOLED display panel line defects often require additional repair bus and repair lines in the display panel, which not only occupies more layout space, but also signals of defective signal lines need to be returned to the control IC for control. There are additional requirements for the control IC, and it is not suitable for small-sized, high-resolution AMOLED display panels.
  • An object of the present invention is to provide a repair structure for a line defect of an AMOLED display panel, which can detect a line layout by using an existing AMOLED display panel, which not only introduces a repair line but also saves layout space, and has no additional requirements on the control IC, and is particularly suitable for Small size, high resolution AMOLED display panel.
  • Another object of the present invention is to provide a method for repairing line defects of an AMOLED display panel, which can save layout space in the panel, and is particularly suitable for repairing line defects of small-sized and high-resolution AMOLED display panels.
  • the present invention firstly provides a repair structure for a line defect of an AMOLED display panel, comprising: an AMOLED display panel detection line, and a repair line directly grafted on the detection line of the AMOLED display panel;
  • the AMOLED display panel detection circuit includes a plurality of signal lines, a plurality of signal fan-out lines connected in one-to-one correspondence with the signal lines, a plurality of test TFTs connected in one-to-one correspondence with the signal lines, and a test control line connected to all the test TFTs. And a plurality of test lines; the test TFT includes a gate, a source, an active layer, and a drain; a gate of all the test TFTs is served by the test control line, and a drain of a test TFT corresponds to a signal The lines are connected, and a test line is connected to the source of the part of the test TFT;
  • the repairing circuit includes a plurality of conductive films and a plurality of repairing wires; the number of the conductive films is equal to the number of test TFTs, and a conductive film is laminated over the test TFTs and insulated from the test TFTs; The number of repaired wires is equal to the number of test leads, and a repaired wire is insulated from all signal fanout lines and a corresponding test line.
  • the signal line is a data line or a scan line of the display panel.
  • the source and drain of the test TFT are in the same layer as the signal line.
  • the material of the conductive film is transparent ITO, and the material of the repair wire is a conductive metal.
  • the invention also provides a method for repairing line defects of an AMOLED display panel, comprising the following steps:
  • Step 1 Providing an AMOLED display panel
  • the AMOLED display panel includes: an AMOLED display panel detection line, and a repair line directly grafted on the detection line of the AMOLED display panel;
  • the AMOLED display panel detection circuit includes a plurality of signal lines, a plurality of signal fan-out lines connected in one-to-one correspondence with the signal lines, a plurality of test TFTs connected in one-to-one correspondence with the signal lines, and a test control line connected to all the test TFTs. And a plurality of test lines; the test TFT includes a gate, a source, an active layer, and a drain; a gate of all the test TFTs is served by the test control line, and a drain of a test TFT corresponds to a signal The lines are connected, and a test line is connected to the source of the part of the test TFT;
  • the repairing circuit includes a plurality of conductive films and a plurality of repairing wires; the number of the conductive films is equal to the number of test TFTs, and a conductive film is laminated over the test TFTs and insulated from the test TFTs; The number of repaired wires is equal to the number of test leads, and a repaired wire is insulated from all signal fanout lines and a corresponding test line;
  • Step 2 When a certain signal line generates a line defect, the part of the signal line located at both sides of the defect point is laser-cut, and the part of the signal line originally connected to the corresponding signal fan-out line continues to work normally;
  • Step 3 laser-welding the source and the drain of the test TFT connected to the signal line corresponding to the line defect, and the conductive film located above the test TFT, and connecting the test line connected to the source of the test TFT.
  • Laser-welding is performed on the repairing wire that is insulated from the test line, and the repaired wire is laser-welded to the insulated intersection of the signal fan-out line corresponding to the signal line connecting the line defect, so that the signal line is originally connected to the corresponding test TFT. The part continues to work normally.
  • the signal line is a data line or a scan line of the display panel.
  • the source and drain of the test TFT are in the same layer as the signal line.
  • All of the sources of the test TFTs responsible for testing the same color pixel are connected to a test line.
  • the material of the conductive film is transparent ITO, and the material of the repair wire is a conductive metal.
  • the present invention also provides a repair structure for a line defect of an AMOLED display panel, comprising: an AMOLED display panel detection line, and a repair line directly grafted on the detection line of the AMOLED display panel;
  • the AMOLED display panel detection circuit includes a plurality of signal lines, a plurality of signal fan-out lines connected in one-to-one correspondence with the signal lines, a plurality of test TFTs connected in one-to-one correspondence with the signal lines, and a test control line connected to all the test TFTs. And a plurality of test lines; the test TFT includes a gate, a source, an active layer, and a drain; a gate of all the test TFTs is served by the test control line, and a drain of a test TFT corresponds to a signal The lines are connected, and a test line is connected to the source of the part of the test TFT;
  • the repairing circuit includes a plurality of conductive films and a plurality of repairing wires; the number of the conductive films is equal to the number of test TFTs, and a conductive film is laminated over the test TFTs and insulated from the test TFTs; The number of repaired wires is equal to the number of test leads, and a repaired wire is insulated from all signal fanout lines and a corresponding test line;
  • the signal line is a data line or a scan line of the display panel
  • the source and drain of the test TFT are in the same layer as the signal line.
  • the invention provides the repairing structure and the repairing method for the line defect of the AMOLED display panel provided by the present invention, by overlaying the conductive film in the repairing line on the test TFT in the detection line of the AMOLED display panel and is insulated from the test TFT.
  • the repair wire in the repair line is insulated from all the signal fanout lines in the AMOLED display panel detection line and the corresponding test lines, so that the repair line is directly grafted on the AMOLED display panel detection line, and the existing AMOLED display can be utilized.
  • the panel detects the layout of the circuit, which not only introduces the repairing circuit with the repair function, but also saves the layout space, and has no additional requirements for the control IC, and is especially suitable for the line defect repair of the small-sized, high-resolution AMOLED display panel.
  • FIG. 1 is a schematic diagram of a conventional AMOLED display panel detection circuit
  • FIG. 2 is a schematic view showing a repair structure of a line defect of an AMOLED display panel according to the present invention
  • FIG. 3 is a schematic diagram of repairing a line defect of an AMOLED display panel according to the present invention.
  • the present invention first provides a repairing knot for a line defect of an AMOLED display panel.
  • the structure includes: an AMOLED display panel detection circuit, and a repair circuit directly grafted on the detection line of the AMOLED display panel.
  • the so-called "direct grafting" means that the repairing line only occupies the existing layout space of the AMOLED display panel detecting line, and no additional occupying additional layout space, and the AMOLED display panel detecting line is reused for the repair of the AMOLED display panel line defect.
  • the AMOLED display panel detection circuit includes a plurality of signal lines 100, a plurality of signal fan-out lines 200 connected in one-to-one correspondence with the signal lines 100, and a plurality of signal fan-out lines 200 connected in one-to-one correspondence with the signal lines 100.
  • the TFT 310 is tested, a test control line 320 connected to all of the test TFTs 310, and a plurality of test lines 330.
  • the test TFT 310 includes a gate, a source 312, an active layer 313, and a drain 314. The gates of all test TFTs 310 are served by the test control line 320.
  • the drain 314 of a test TFT 310 is connected to a signal line 100.
  • a test line 330 is connected to the source 312 of the portion of the test TFT 310.
  • the repair line includes a plurality of conductive films 410 and a plurality of repair wires 420.
  • the number of the conductive films 410 is equal to the number of the test electrodes 310, and a conductive film 410 is overlaid over the test TFTs 310 and insulated from the test TFTs 310; the number of the repair wires 420 and the number of test wires 330 Equivalently, a repair wire 420 is insulated from all of the signal fanout lines 200 and a corresponding test line 330.
  • the signal line 100 is a data line or a scan line of the display panel.
  • the source 312 and the drain 314 of the test TFT 310 are in the same layer as the signal line 100; all the sources 312 of the test TFT 310 responsible for testing the same color pixel are connected to a test line 330, for example All of the source 312 of the test TFT 310 responsible for testing the red pixel are connected to the first test line 330, and all the sources 312 of the test TFT 310 responsible for testing the green pixel are connected to the second test line 330, all of which are responsible for testing the blue.
  • the source 312 of the test pixel 310 of the color pixel is correspondingly connected to the third test line 330.
  • the test control line 320 and the test line 330 are both in an inverted "L" shape, and each of the line segments parallel to the signal line 100 is used for insulation crossing with the repair wire 420 and a line segment perpendicular to the signal line 100 for testing.
  • the TFT 310 is connected.
  • the repairing wire 420 extends in a direction perpendicular to the extending direction of the signal fan-out line 200, and the vertical insulation therebetween intersects.
  • the material of the conductive film 410 is preferably transparent Indium Tin Oxid (ITO), and the material of the repair wire 420 is preferably a conductive metal such as molybdenum, titanium, aluminum, copper or the like.
  • ITO Indium Tin Oxid
  • the material of the repair wire 420 is preferably a conductive metal such as molybdenum, titanium, aluminum, copper or the like.
  • the test control line 320 receives the test control signal provided by the panel test terminal to turn on all the test TFTs 310, and the test signal provided by the test line 330 receiving the panel test terminal is transmitted through the test TFT 310. Go to the corresponding signal line 100 to test whether the display panel is operating normally. After the test is finished, the panel test The test terminal stops providing the test control signal and the test signal. The test control line 320 has no signal reception such that the test TFT 310 is turned off, the signal line 100 transmits the display signal, and the display panel is normally displayed.
  • the laser line is cut off at a portion of the signal line 100 on both sides of the defect point (1, 2 in FIG. 3), The portion of the signal line 100 that is originally connected to the corresponding signal fan-out line 200 continues to operate normally; the source 312 and the drain 314 of the test TFT 310 connected to the signal line 100 where the line defect is present are respectively located above the test TFT 310.
  • the conductive film 410 is laser-welded (3, 4 in FIG. 3), and the test wire 330 connected to the source 312 of the test TFT 310 and the repair wire 420 corresponding to the insulation of the test wire 330 are laser-welded. (5 in FIG.
  • the repaired wire 330 and the insulating intersection of the signal fan-out line 200 corresponding to the signal line 100 to which the line defect occurs are laser-welded (6 in FIG. 3), and the display signal is correspondingly
  • the signal fanout line 200, the test line 330, the source 312 of the test TFT 310, the conductive film 410, and the drain 314 of the test TFT 310 are transmitted to a portion of the signal line 100 that is originally connected to the corresponding test TFT 310, so that it works normally. That is, the line is completed. Repair of defects.
  • the repair structure of the line defect of the AMOLED display panel of the invention directly grafts the repair line on the detection line of the AMOLED display panel, and can detect the line layout by using the existing AMOLED display panel, and introduces the repair line with the repair function and saves the layout space. There is no additional requirement for the control IC, especially for the line defect repair of the small-sized, high-resolution AMOLED display panel.
  • the present invention further provides a method for repairing a line defect of an AMOLED display panel, comprising the following steps:
  • Step 1 Provide an AMOLED display panel.
  • the AMOLED display panel includes: an AMOLED display panel detection line, and a repair line directly grafted on the detection line of the AMOLED display panel.
  • the so-called direct grafting means that the repair line only occupies the existing layout space of the AMOLED display panel detection line, and no additional layout space is occupied, and the AMOLED display panel detection line is reused for the repair of the AMOLED display panel line defect.
  • the AMOLED display panel detection circuit includes a plurality of signal lines 100, a plurality of signal fan-out lines 200 connected in one-to-one correspondence with the signal lines 100, and a plurality of signal fan-out lines 200 connected in one-to-one correspondence with the signal lines 100.
  • the TFT 310 is tested, a test control line 320 connected to all of the test TFTs 310, and a plurality of test lines 330.
  • the test TFT 310 includes a gate, a source 312, an active layer 313, and a drain 314. The gates of all test TFTs 310 are served by the test control line 320.
  • the drain 314 of a test TFT 310 is connected to a signal line 100.
  • a test line 330 is connected to the source 312 of the portion of the test TFT 310.
  • the repair line includes a plurality of conductive films 410 and a plurality of repair wires 420.
  • the number of the conductive films 410 is equal to the number of the test electrodes 310, and a conductive film 410 is overlaid over the test TFTs 310 and insulated from the test TFTs 310; the number of the repair wires 420 and the number of test wires 330 Equivalently, a repair wire 420 is insulated from all of the signal fanout lines 200 and a corresponding test line 330.
  • the signal line 100 is a data line or a scan line of the display panel.
  • the source 312 and the drain 314 of the test TFT 310 are in the same layer as the signal line 100; all the sources 312 of the test TFT 310 responsible for testing the same color pixel are connected to a test line 330, for example All of the source 312 of the test TFT 310 responsible for testing the red pixel are connected to the first test line 330, and all the sources 312 of the test TFT 310 responsible for testing the green pixel are connected to the second test line 330, all of which are responsible for testing the blue.
  • the source 312 of the test pixel 310 of the color pixel is correspondingly connected to the third test line 330.
  • the test control line 320 and the test line 330 are both in an inverted "L" shape, and each of the line segments parallel to the signal line 100 is used for insulation crossing with the repair wire 420 and a line segment perpendicular to the signal line 100 for testing.
  • the TFT 310 is connected.
  • the repairing wire 420 extends in a direction perpendicular to the extending direction of the signal fan-out line 200, and the vertical insulation therebetween intersects.
  • the material of the conductive film 410 is preferably transparent ITO, and the material of the repair wire 420 is preferably a conductive metal such as molybdenum, titanium, aluminum, copper or the like.
  • Step 2 When a certain signal line 100 generates a line defect, the part of the signal line 100 located at both sides of the defect point is laser-cut (1, 2 in FIG. 3), and the signal line 100 originally corresponds to the corresponding signal fan. The portion of the outgoing line 200 continues to function normally.
  • Step 3 Laser-welding the source 312 and the drain 314 of the test TFT 310 connected to the signal line 100 in which the line defect is present, respectively, and the conductive film 410 located above the test TFT 310 (3 in FIG. 3, 4), the test wire 330 connected to the source 312 of the test TFT 310 and the repair wire 420 corresponding to the insulation crossing of the test wire 330 are laser welded (5 in FIG. 3), and the repair wire 330 and Corresponding to the insulation intersection of the signal fan-out line 200 of the signal line 100 in which the line defect occurs, laser welding (6 in FIG. 3) is performed, and the display signal passes through the corresponding signal fan-out line 200, the test line 330, and the source of the test TFT 310. 312, the conductive film 410, the drain 314 of the test TFT 310 is transmitted to the portion of the signal line 100 that is originally connected to the corresponding test TFT 310, so that it works normally, that is, the repair of the line defect is completed.
  • the method for repairing the line defect of the AMOLED display panel of the invention directly grafts the repair line on the detection line of the AMOLED display panel, and can detect the line layout by using the existing AMOLED display panel, and introduces the repair line with the repair function and saves the layout space. And there is no additional requirement for the control IC, especially for small-sized, high-resolution AMOLED display panels. Line defect repair.
  • the repair structure and the repairing method for the line defect of the AMOLED display panel of the present invention are repaired by laminating the conductive film in the repair line correspondingly over the test TFT in the detection line of the AMOLED display panel and insulated from the test TFT.
  • the repair wires in the line are insulated from all the signal fanout lines in the AMOLED display panel detection line and the corresponding test lines, so that the repair lines are directly grafted on the AMOLED display panel detection line, and the existing AMOLED display panel can be detected.
  • the circuit layout not only introduces the repairing circuit with repair function, but also saves layout space, and has no additional requirements for the control IC, especially suitable for line defect repair of small-sized and high-resolution AMOLED display panels.

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Abstract

一种AMOLED显示面板线缺陷的修复结构及修复方法，通过将修复线路中的导电薄膜(410)对应层叠覆盖于AMOLED显示面板检测线路中的测试TFT(310)上方并与测试TFT(310)绝缘，将修复线路中的修复导线(420)与AMOLED显示面板检测线路中所有的信号扇出线(200)、及对应的测试线(330)绝缘交叉，实现了将修复线路直接嫁接在AMOLED显示面板检测线路上，能够利用现有的AMOLED显示面板检测线路布局，既引入了修复线路具有修复功能，又节省布局空间，且对控制IC没有额外要求，尤其适用于小尺寸、高解析度的AMOLED显示面板的线缺陷修复。

Description

AMOLED显示面板线缺陷的修复结构及修复方法 技术领域
本发明涉及显示技术领域，尤其涉及一种AMOLED显示面板线缺陷的修复结构及修复方法。
背景技术
有机发光二极管(Organic Light Emitting Display，OLED)显示面板具有自发光、驱动电压低、发光效率高、响应时间短、清晰度与对比度高、近180°视角、使用温度范围宽，可实现柔性显示与大面积全色显示等诸多优点，被业界公认为是最有发展潜力的显示面板。
OLED显示面板按照驱动方式可以分为无源矩阵型OLED(Passive Matrix OLED，PMOLED)和有源矩阵型OLED(Active Matrix OLED，AMOLED)两大类，即直接寻址和薄膜晶体管(Thin Film Transistor，TFT)矩阵寻址两类。其中，AMOLED具有呈阵列式排布的像素，属于主动显示类型，发光效能高。
AMOLED显示面板在制造完成之后出厂之前，必须先经过面板检测(Cell Test，CT)的过程，以测试AMOLED显示面板中用以控制各个像素的薄膜晶体管的运行是否正常、已及向各个薄膜晶体管传递信号的扫描线、与数据线是否正常，因此，通常在AMOLED显示面板的显示区域之外设置面板检测线路。
图1为一种现有的AMOLED显示面板检测线路的示意图，该现有的AMOLED显示面板检测线路包括多条信号线100’、与信号线100’一一对应相连的多条信号扇出线200’、与信号线100’一一对应相连的多个测试TFT 310’、与所有测试TFT 310’相连的一测试控制线320’、以及数条测试线330’。所述测试TFT 310’包括栅极、源极312’、有源层313’、及漏极314’，其中，所有的栅极由测试控制线320’充当，所述源极312’、及漏极314’与信号线100’位于同一层，一漏极314’对应与一信号线100’相连，所有的负责测试同一颜色像素的测试TFT 310’的源极312’与一测试线330’相连。该AMOLED显示面板检测线路开始工作时，测试控制线320’接收面板测试端子提供的测试控制信号开启所有的测试TFT 310’，同时测试线330’接收面板测试端子提供的测试信号通过测试TFT 310’传输至对应的信号线100’上，从而测试出显示面板是否正常运行。检测结束后，面板测试端子停止提供测试控制信号及测试信号，测试控制线320’无信号接收使得测试TFT  310’关闭，显示面板正常显示。该现有的AMOLED显示面板检测线路占用了一定的布局空间，但仅作测试之用。
目前，AMOLED显示面板的缺陷修复，特别是线缺陷修复相对困难，通常只能将亮线修复为暗线，这样会影响AMOLED显示面板的品质，故需要设计修复线路以最大程度的提升良率。现有的针对AMOLED显示面板线缺陷的修复线路往往需要在显示面板内额外增加修复总线、及修复线等，不仅占用了更多的布局空间，且缺陷信号线的信号需要返回控制IC进行控制，对控制IC有额外的要求，不适用于小尺寸、高解析度的AMOLED显示面板。
发明内容
本发明的目的在于提供一种AMOLED显示面板线缺陷的修复结构，能够利用现有的AMOLED显示面板检测线路布局，既引入修复线路，又节省布局空间，且对控制IC没有额外要求，尤其适用于小尺寸、高解析度的AMOLED显示面板。
本发明的另一目的在于提供一种AMOLED显示面板线缺陷的修复方法，能够节省面板内的布局空间，尤其适用于对小尺寸、高解析度的AMOLED显示面板线缺陷的修复。
为实现上述目的，本发明首先提供一种AMOLED显示面板线缺陷的修复结构，包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路；
所述AMOLED显示面板检测线路包括多条信号线、与信号线一一对应相连的多条信号扇出线、与信号线一一对应相连的多个测试TFT、与所有测试TFT相连的一测试控制线、及数条测试线；所述测试TFT包括栅极、源极、有源层、及漏极；所有测试TFT的栅极由所述测试控制线充当，一测试TFT的漏极对应与一信号线相连，一测试线对应与部分测试TFT的源极相连；
所述修复线路包括多块导电薄膜、及数条修复导线；所述导电薄膜的数量与测试TFT的数量对等，一导电薄膜对应层叠覆盖于一测试TFT上方并与该测试TFT绝缘；所述修复导线的数量与测试线的数量对等，一修复导线与所有的信号扇出线、及一对应的测试线绝缘交叉。
所述信号线为显示面板的数据线或扫描线。
所述测试TFT的源极、及漏极与信号线位于同一层。
所有的负责测试同一颜色像素的测试TFT的源极对应与一测试线相 连。
所述导电薄膜的材料为透明的ITO，所述修复导线的材料为导电金属。
本发明还提供一种AMOLED显示面板线缺陷的修复方法，包括以下步骤：
步骤1、提供一AMOLED显示面板；
所述AMOLED显示面板包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路；
所述AMOLED显示面板检测线路包括多条信号线、与信号线一一对应相连的多条信号扇出线、与信号线一一对应相连的多个测试TFT、与所有测试TFT相连的一测试控制线、及数条测试线；所述测试TFT包括栅极、源极、有源层、及漏极；所有测试TFT的栅极由所述测试控制线充当，一测试TFT的漏极对应与一信号线相连，一测试线对应与部分测试TFT的源极相连；
所述修复线路包括多块导电薄膜、及数条修复导线；所述导电薄膜的数量与测试TFT的数量对等，一导电薄膜对应层叠覆盖于一测试TFT上方并与该测试TFT绝缘；所述修复导线的数量与测试线的数量对等，一修复导线与所有的信号扇出线、及一对应的测试线绝缘交叉；
步骤2、当某一信号线产生线缺陷，将该信号线位于缺陷点两侧的部分进行激光切断，该信号线原本与对应的信号扇出线相连的部分继续正常工作；
步骤3、将与该出现线缺陷的信号线对应相连的测试TFT的源极、漏极分别和位于该测试TFT上方的导电薄膜进行激光熔接，将与该测试TFT的源极相连的测试线和对应与该测试线绝缘交叉的修复导线进行激光熔接，将该修复导线和对应相连出现线缺陷的信号线的信号扇出线的绝缘交叉点进行激光熔接，使该信号线原本与对应的测试TFT相连的部分继续正常工作。
所述信号线为显示面板的数据线或扫描线。
所述测试TFT的源极、及漏极与信号线位于同一层。
所有的负责测试同一颜色像素的测试TFT的源极对应与一测试线相连。
所述导电薄膜的材料为透明的ITO，所述修复导线的材料为导电金属。
本发明还提供一种AMOLED显示面板线缺陷的修复结构，包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路；
所述AMOLED显示面板检测线路包括多条信号线、与信号线一一对应相连的多条信号扇出线、与信号线一一对应相连的多个测试TFT、与所有测试TFT相连的一测试控制线、及数条测试线；所述测试TFT包括栅极、源极、有源层、及漏极；所有测试TFT的栅极由所述测试控制线充当，一测试TFT的漏极对应与一信号线相连，一测试线对应与部分测试TFT的源极相连；
所述修复线路包括多块导电薄膜、及数条修复导线；所述导电薄膜的数量与测试TFT的数量对等，一导电薄膜对应层叠覆盖于一测试TFT上方并与该测试TFT绝缘；所述修复导线的数量与测试线的数量对等，一修复导线与所有的信号扇出线、及一对应的测试线绝缘交叉；
其中，所述信号线为显示面板的数据线或扫描线；
其中，所述测试TFT的源极、及漏极与信号线位于同一层。
本发明的有益效果：本发明提供的AMOLED显示面板线缺陷的修复结构及修复方法，通过将修复线路中的导电薄膜对应层叠覆盖于AMOLED显示面板检测线路中的测试TFT上方并与测试TFT绝缘，将修复线路中的修复导线与AMOLED显示面板检测线路中所有的信号扇出线、及对应的测试线绝缘交叉，实现了将修复线路直接嫁接在AMOLED显示面板检测线路上，能够利用现有的AMOLED显示面板检测线路布局，既引入了修复线路具有修复功能，又节省布局空间，且对控制IC没有额外要求，尤其适用于小尺寸、高解析度的AMOLED显示面板的线缺陷修复。
附图说明
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图中，
图1为一种现有的AMOLED显示面板检测线路的示意图；
图2为本发明的AMOLED显示面板线缺陷的修复结构的示意图；
图3为本发明对AMOLED显示面板线缺陷进行修复的示意图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
请参阅图2，本发明首先提供一种AMOLED显示面板线缺陷的修复结 构，包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路。所谓“直接嫁接”是指修复线路仅占用AMOLED显示面板检测线路现有的布局空间，不再额外占用另外的布局空间，并且所述AMOLED显示面板检测线路复用于AMOLED显示面板线缺陷的修复。
具体地，如图2所示，所述AMOLED显示面板检测线路包括多条信号线100、与信号线100一一对应相连的多条信号扇出线200、与信号线100一一对应相连的多个测试TFT 310、与所有测试TFT 310相连的一测试控制线320、及数条测试线330。所述测试TFT 310包括栅极、源极312、有源层313、及漏极314。所有测试TFT 310的栅极由所述测试控制线320充当，一测试TFT 310的漏极314对应与一信号线100相连，一测试线330对应与部分测试TFT 310的源极312相连。
所述修复线路包括多块导电薄膜410、及数条修复导线420。所述导电薄膜410的数量与测试TFT 310的数量对等，一导电薄膜410对应层叠覆盖于一测试TFT 310上方并与该测试TFT 310绝缘；所述修复导线420的数量与测试线330的数量对等，一修复导线420与所有的信号扇出线200、及一对应的测试线330绝缘交叉。
进一步地，所述信号线100为显示面板的数据线或扫描线。
为便于制作，所述测试TFT 310的源极312、及漏极314与信号线100位于同一层；所有的负责测试同一颜色像素的测试TFT 310的源极312对应与一测试线330相连，例如所有负责测试红色像素的测试TFT 310的源极312对应与第一条测试线330相连，所有负责测试绿色像素的测试TFT 310的源极312对应与第二条测试线330相连，所有负责测试蓝色像素的测试TFT 310的源极312对应与第三条测试线330相连。
所述测试控制线320、及测试线330均呈倒置的“L”形，均包括与信号线100平行的线段用于与修复导线420绝缘交叉、及与信号线100垂直的线段用于与测试TFT 310相连。所述修复导线420的延伸方向与信号扇出线200的延伸方向垂直，二者之间垂直绝缘交叉。
所述导电薄膜410的材料优选透明的氧化铟锡(Indium Tin Oxid，ITO)，所述修复导线420的材料优选为导电金属，如钼、钛、铝、铜等。
当所述AMOLED显示面板检测线路进行检测工作时，测试控制线320接收面板测试端子提供的测试控制信号开启所有的测试TFT 310，同时测试线330接收面板测试端子提供的测试信号通过测试TFT 310传输至对应的信号线100上，从而测试出显示面板是否正常运行。检测结束后，面板测 试端子停止提供测试控制信号及测试信号，测试控制线320无信号接收使得测试TFT 310关闭，信号线100传输显示信号，显示面板正常显示。
结合图3，当AMOLED显示面板在显示过程中某一信号线100产生线缺陷时：将该信号线100位于缺陷点两侧的部分进行激光切断(图3中的1处、2处)，该信号线100原本与对应的信号扇出线200相连的部分继续正常工作；将与该出现线缺陷的信号线100对应相连的测试TFT 310的源极312、漏极314分别和位于该测试TFT 310上方的导电薄膜410进行激光熔接(图3中的3处、4处)，将与该测试TFT 310的源极312相连的测试线330和对应与该测试线330绝缘交叉的修复导线420进行激光熔接(图3中的5处)，将该修复导线330和对应相连出现线缺陷的信号线100的信号扇出线200的绝缘交叉点进行激光熔接(图3中的6处)，显示信号经对应的信号扇出线200、测试线330、测试TFT 310的源极312、导电薄膜410、测试TFT 310的漏极314传输到该信号线100原本与对应的测试TFT 310相连的部分，使其正常工作，即完成了对线缺陷的修复。
本发明的AMOLED显示面板线缺陷的修复结构，将修复线路直接嫁接在AMOLED显示面板检测线路上，能够利用现有的AMOLED显示面板检测线路布局，既引入了修复线路具有修复功能，又节省布局空间，且对控制IC没有额外要求，尤其适用于小尺寸、高解析度的AMOLED显示面板的线缺陷修复。
基于同一发明构思，本发明还提供一种AMOLED显示面板线缺陷的修复方法，包括以下步骤：
步骤1、提供一AMOLED显示面板。
所述AMOLED显示面板包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路。所谓直接嫁接是指修复线路仅占用AMOLED显示面板检测线路现有的布局空间，不再额外占用另外的布局空间，并且所述AMOLED显示面板检测线路复用于AMOLED显示面板线缺陷的修复。
具体地，如图2所示，所述AMOLED显示面板检测线路包括多条信号线100、与信号线100一一对应相连的多条信号扇出线200、与信号线100一一对应相连的多个测试TFT 310、与所有测试TFT 310相连的一测试控制线320、及数条测试线330。所述测试TFT 310包括栅极、源极312、有源层313、及漏极314。所有测试TFT 310的栅极由所述测试控制线320充当，一测试TFT 310的漏极314对应与一信号线100相连，一测试线330对应与部分测试TFT 310的源极312相连。
所述修复线路包括多块导电薄膜410、及数条修复导线420。所述导电薄膜410的数量与测试TFT 310的数量对等，一导电薄膜410对应层叠覆盖于一测试TFT 310上方并与该测试TFT 310绝缘；所述修复导线420的数量与测试线330的数量对等，一修复导线420与所有的信号扇出线200、及一对应的测试线330绝缘交叉。
进一步地，所述信号线100为显示面板的数据线或扫描线。
为便于制作，所述测试TFT 310的源极312、及漏极314与信号线100位于同一层；所有的负责测试同一颜色像素的测试TFT 310的源极312对应与一测试线330相连，例如所有负责测试红色像素的测试TFT 310的源极312对应与第一条测试线330相连，所有负责测试绿色像素的测试TFT 310的源极312对应与第二条测试线330相连，所有负责测试蓝色像素的测试TFT 310的源极312对应与第三条测试线330相连。
所述测试控制线320、及测试线330均呈倒置的“L”形，均包括与信号线100平行的线段用于与修复导线420绝缘交叉、及与信号线100垂直的线段用于与测试TFT 310相连。所述修复导线420的延伸方向与信号扇出线200的延伸方向垂直，二者之间垂直绝缘交叉。
所述导电薄膜410的材料优选透明的ITO，所述修复导线420的材料优选为导电金属，如钼、钛、铝、铜等。
步骤2、当某一信号线100产生线缺陷，将该信号线100位于缺陷点两侧的部分进行激光切断(图3中的1处、2处)，该信号线100原本与对应的信号扇出线200相连的部分继续正常工作。
步骤3、将与该出现线缺陷的信号线100对应相连的测试TFT 310的源极312、漏极314分别和位于该测试TFT 310上方的导电薄膜410进行激光熔接(图3中的3处、4处)，将与该测试TFT 310的源极312相连的测试线330和对应与该测试线330绝缘交叉的修复导线420进行激光熔接(图3中的5处)，将该修复导线330和对应相连出现线缺陷的信号线100的信号扇出线200的绝缘交叉点进行激光熔接(图3中的6处)，显示信号经对应的信号扇出线200、测试线330、测试TFT 310的源极312、导电薄膜410、测试TFT 310的漏极314传输到该信号线100原本与对应的测试TFT 310相连的部分，使其正常工作，即完成了对线缺陷的修复。
本发明的AMOLED显示面板线缺陷的修复方法，将修复线路直接嫁接在AMOLED显示面板检测线路上，能够利用现有的AMOLED显示面板检测线路布局，既引入了修复线路具有修复功能，又节省布局空间，且对控制IC没有额外要求，尤其适用于小尺寸、高解析度的AMOLED显示面板 的线缺陷修复。
综上所述，本发明的AMOLED显示面板线缺陷的修复结构及修复方法，通过将修复线路中的导电薄膜对应层叠覆盖于AMOLED显示面板检测线路中的测试TFT上方并与测试TFT绝缘，将修复线路中的修复导线与AMOLED显示面板检测线路中所有的信号扇出线、及对应的测试线绝缘交叉，实现了将修复线路直接嫁接在AMOLED显示面板检测线路上，能够利用现有的AMOLED显示面板检测线路布局，既引入了修复线路具有修复功能，又节省布局空间，且对控制IC没有额外要求，尤其适用于小尺寸、高解析度的AMOLED显示面板的线缺陷修复。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明后附的权利要求的保护范围。

Claims (13)

  1. 一种AMOLED显示面板线缺陷的修复结构，包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路；
    所述AMOLED显示面板检测线路包括多条信号线、与信号线一一对应相连的多条信号扇出线、与信号线一一对应相连的多个测试TFT、与所有测试TFT相连的一测试控制线、及数条测试线；所述测试TFT包括栅极、源极、有源层、及漏极；所有测试TFT的栅极由所述测试控制线充当，一测试TFT的漏极对应与一信号线相连，一测试线对应与部分测试TFT的源极相连；
    所述修复线路包括多块导电薄膜、及数条修复导线；所述导电薄膜的数量与测试TFT的数量对等，一导电薄膜对应层叠覆盖于一测试TFT上方并与该测试TFT绝缘；所述修复导线的数量与测试线的数量对等，一修复导线与所有的信号扇出线、及一对应的测试线绝缘交叉。
  2. 如权利要求1所述的AMOLED显示面板线缺陷的修复结构，其中，所述信号线为显示面板的数据线或扫描线。
  3. 如权利要求1所述的AMOLED显示面板线缺陷的修复结构，其中，所述测试TFT的源极、及漏极与信号线位于同一层。
  4. 如权利要求2所述的AMOLED显示面板线缺陷的修复结构，其中，所有的负责测试同一颜色像素的测试TFT的源极对应与一测试线相连。
  5. 如权利要求1所述的AMOLED显示面板线缺陷的修复结构，其中，所述导电薄膜的材料为透明的ITO，所述修复导线的材料为导电金属。
  6. 一种AMOLED显示面板线缺陷的修复方法，包括以下步骤：
    步骤1、提供一AMOLED显示面板；
    所述AMOLED显示面板包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路；
    所述AMOLED显示面板检测线路包括多条信号线、与信号线一一对应相连的多条信号扇出线、与信号线一一对应相连的多个测试TFT、与所有测试TFT相连的一测试控制线、及数条测试线；所述测试TFT包括栅极、源极、有源层、及漏极；所有测试TFT的栅极由所述测试控制线充当，一测试TFT的漏极对应与一信号线相连，一测试线对应与部分测试TFT的源极相连；
    所述修复线路包括多块导电薄膜、及数条修复导线；所述导电薄膜的数量与测试TFT的数量对等，一导电薄膜对应层叠覆盖于一测试TFT上方并与该测试TFT绝缘；所述修复导线的数量与测试线的数量对等，一修复导线与所有的信号扇出线、及一对应的测试线绝缘交叉；
    步骤2、当某一信号线产生线缺陷，将该信号线位于缺陷点两侧的部分进行激光切断，该信号线原本与对应的信号扇出线相连的部分继续正常工作；
    步骤3、将与该出现线缺陷的信号线对应相连的测试TFT的源极、漏极分别和位于该测试TFT上方的导电薄膜进行激光熔接，将与该测试TFT的源极相连的测试线和对应与该测试线绝缘交叉的修复导线进行激光熔接，将该修复导线和对应相连出现线缺陷的信号线的信号扇出线的绝缘交叉点进行激光熔接，使该信号线原本与对应的测试TFT相连的部分继续正常工作。
  7. 如权利要求6所述的AMOLED显示面板线缺陷的修复方法，其中，所述信号线为显示面板的数据线或扫描线。
  8. 如权利要求6所述的AMOLED显示面板线缺陷的修复方法，其中，所述测试TFT的源极、及漏极与信号线位于同一层。
  9. 如权利要求7所述的AMOLED显示面板线缺陷的修复方法，其中，所有的负责测试同一颜色像素的测试TFT的源极对应与一测试线相连。
  10. 如权利要求7所述的AMOLED显示面板线缺陷的修复方法，其中，所述导电薄膜的材料为透明的ITO，所述修复导线的材料为导电金属。
  11. 一种AMOLED显示面板线缺陷的修复结构，包括：AMOLED显示面板检测线路、及直接嫁接在所述AMOLED显示面板检测线路上的修复线路；
    所述AMOLED显示面板检测线路包括多条信号线、与信号线一一对应相连的多条信号扇出线、与信号线一一对应相连的多个测试TFT、与所有测试TFT相连的一测试控制线、及数条测试线；所述测试TFT包括栅极、源极、有源层、及漏极；所有测试TFT的栅极由所述测试控制线充当，一测试TFT的漏极对应与一信号线相连，一测试线对应与部分测试TFT的源极相连；
    所述修复线路包括多块导电薄膜、及数条修复导线；所述导电薄膜的数量与测试TFT的数量对等，一导电薄膜对应层叠覆盖于一测试TFT上方并与该测试TFT绝缘；所述修复导线的数量与测试线的数量对等，一修复导线与所有的信号扇出线、及一对应的测试线绝缘交叉；
    其中，所述信号线为显示面板的数据线或扫描线；
    其中，所述测试TFT的源极、及漏极与信号线位于同一层。
  12. 如权利要求11所述的AMOLED显示面板线缺陷的修复结构，其中，所有的负责测试同一颜色像素的测试TFT的源极对应与一测试线相连。
  13. 如权利要求11所述的AMOLED显示面板线缺陷的修复结构，其中，所述导电薄膜的材料为透明的ITO，所述修复导线的材料为导电金属。
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