WO2014029046A1 - 一种辐射固化体系用表面控制助剂及其制备方法和应用 - Google Patents
一种辐射固化体系用表面控制助剂及其制备方法和应用 Download PDFInfo
- Publication number
- WO2014029046A1 WO2014029046A1 PCT/CN2012/001357 CN2012001357W WO2014029046A1 WO 2014029046 A1 WO2014029046 A1 WO 2014029046A1 CN 2012001357 W CN2012001357 W CN 2012001357W WO 2014029046 A1 WO2014029046 A1 WO 2014029046A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- component
- surface control
- integer
- control additive
- radiation curing
- Prior art date
Links
- 239000000654 additive Substances 0.000 title claims abstract description 23
- 230000000996 additive effect Effects 0.000 title claims abstract description 22
- 238000003847 radiation curing Methods 0.000 title claims abstract description 17
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000002252 acyl group Chemical group 0.000 claims abstract description 5
- -1 polysiloxane Polymers 0.000 claims description 35
- 229920001296 polysiloxane Polymers 0.000 claims description 27
- 229920000570 polyether Polymers 0.000 claims description 20
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 19
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 15
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 7
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 2
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 claims description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 claims description 2
- 150000004982 aromatic amines Chemical class 0.000 claims description 2
- 235000010354 butylated hydroxytoluene Nutrition 0.000 claims description 2
- 239000003112 inhibitor Substances 0.000 claims description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 229950000688 phenothiazine Drugs 0.000 claims description 2
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims 2
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 claims 2
- 241000282330 Procyon lotor Species 0.000 claims 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 claims 1
- 239000002904 solvent Substances 0.000 abstract description 7
- 239000000976 ink Substances 0.000 abstract description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052799 carbon Inorganic materials 0.000 abstract description 3
- 239000002244 precipitate Substances 0.000 abstract description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 16
- 239000000203 mixture Substances 0.000 description 11
- 239000003973 paint Substances 0.000 description 11
- 239000000047 product Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000009472 formulation Methods 0.000 description 6
- 238000003756 stirring Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 238000003848 UV Light-Curing Methods 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000007259 addition reaction Methods 0.000 description 4
- 150000001336 alkenes Chemical group 0.000 description 4
- 238000006386 neutralization reaction Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- 0 CC(*1)C1N(C)* Chemical compound CC(*1)C1N(C)* 0.000 description 3
- DJWATDZAPAVNBY-UHFFFAOYSA-N butyl acetate trifluoromethanesulfonic acid Chemical compound C(C)(=O)OCCCC.FC(S(=O)(=O)O)(F)F DJWATDZAPAVNBY-UHFFFAOYSA-N 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 238000011534 incubation Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- 238000005201 scrubbing Methods 0.000 description 3
- 229920002545 silicone oil Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- 238000011179 visual inspection Methods 0.000 description 3
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000005923 long-lasting effect Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 125000005702 oxyalkylene group Chemical group 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 239000005028 tinplate Substances 0.000 description 2
- 239000003039 volatile agent Substances 0.000 description 2
- PLFFHJWXOGYWPR-HEDMGYOXSA-N (4r)-4-[(3r,3as,5ar,5br,7as,11as,11br,13ar,13bs)-5a,5b,8,8,11a,13b-hexamethyl-1,2,3,3a,4,5,6,7,7a,9,10,11,11b,12,13,13a-hexadecahydrocyclopenta[a]chrysen-3-yl]pentan-1-ol Chemical compound C([C@]1(C)[C@H]2CC[C@H]34)CCC(C)(C)[C@@H]1CC[C@@]2(C)[C@]4(C)CC[C@@H]1[C@]3(C)CC[C@@H]1[C@@H](CCCO)C PLFFHJWXOGYWPR-HEDMGYOXSA-N 0.000 description 1
- XFNJYAKDBJUJAJ-UHFFFAOYSA-N 1,2-dibromopropane Chemical compound CC(Br)CBr XFNJYAKDBJUJAJ-UHFFFAOYSA-N 0.000 description 1
- MKPHQUIFIPKXJL-UHFFFAOYSA-N 1,2-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(O)C(O)OC(=O)C(C)=C MKPHQUIFIPKXJL-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- FEWFXBUNENSNBQ-UHFFFAOYSA-N 2-hydroxyacrylic acid Chemical compound OC(=C)C(O)=O FEWFXBUNENSNBQ-UHFFFAOYSA-N 0.000 description 1
- NDJOPKQCMPKHHT-UHFFFAOYSA-N C(C=C)(=O)O.C(C=C)(=O)O.CC=CC Chemical compound C(C=C)(=O)O.C(C=C)(=O)O.CC=CC NDJOPKQCMPKHHT-UHFFFAOYSA-N 0.000 description 1
- NJCYUHUURKNESN-UHFFFAOYSA-N CCC(C)N(C)C(CC)(CC)OCC Chemical compound CCC(C)N(C)C(CC)(CC)OCC NJCYUHUURKNESN-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- RSOILICUEWXSLA-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 RSOILICUEWXSLA-UHFFFAOYSA-N 0.000 description 1
- XGIUDIMNNMKGDE-UHFFFAOYSA-N bis(trimethylsilyl)azanide Chemical compound C[Si](C)(C)[N-][Si](C)(C)C XGIUDIMNNMKGDE-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 229940116351 sebacate Drugs 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/106—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C09D11/107—Printing inks based on artificial resins containing macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds from unsaturated acids or derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Definitions
- the invention relates to a surface control auxiliary for radiation curing system, a preparation method and application thereof.
- the surface control additive is an acryl-containing polyether modified polysiloxane with excellent surface control, broad compatibility and long-term retention in radiation-curing (UV/EB) coatings and inks. Smoothness.
- UV/EB radiation-curable coatings and inks are used in many fields due to their fast curing speed, environmental friendliness, energy saving, and coating on various substrates. With the development of UV/EB radiation-curable coatings and inks, the requirements for the additives used therein are also increasing. Traditional organically modified polysiloxanes have not been able to meet the needs of radiation curing systems. It is gradually replaced by UV/EB-curable acryl-modified polysiloxane. The UV/EB-curable acryl-modified polysiloxane retains the smoothness of the coating for a long period of time due to its participation in the film-forming reaction, while also minimizing the migration of precipitates.
- the acryl-modified polysiloxane can be obtained by different polycondensation or addition reactions.
- U.S. Patent No. 4,035,355 describes the use of methyl chlorosilane and acryloyl-containing chlorosilanes to produce acryl-modified polysiloxanes by hydrolysis condensation reaction. The released hydrochloric acid needs to be neutralized and filtered for removal. Cumbersome.
- Goldschmidt uses chloropolysiloxane with hydroxy acrylic acid or tri-light methyl propylene diacrylate or pentaerythritol triacrylate to obtain acryl-modified polysiloxane and its by-product by neutralization with a tertiary amine.
- Hydrochloric acid in addition to the need for filtration to remove the precipitate, the resulting product has a large amount of Si-0-C bond, which is unstable and easily hydrolyzed.
- US 4978726, US Pat. No. 6,548,568, CN101089031, etc. describe the hydrogenation of a hydrogen-containing polysiloxane with an epoxy group-containing unsaturated monomer (such as allyl glycidyl ether), followed by ring opening with (meth)acrylic acid.
- an epoxy group-containing unsaturated monomer such as allyl glycidyl ether
- the oxygen ring obtains an acryl-modified polysiloxane, wherein the last step of the esterification reaction consumes a high energy, and the double bond in the (meth)acrylic acid is in danger of self-polymerization in the final step of esterification and dehydration.
- the present invention obtains an acryl-containing polyether modified polysiloxane surface control assistant through a hydrosilation reaction and a simple controllable synthesis process, which not only avoids the deficiencies of the above preparation methods, but also employs
- the preparation method and the process are simple and feasible, the energy consumption is low, and the controllability is strong.
- Another feature of the present invention is that by introducing different polyether segments of HLB value, a broadly compatible acryl-containing polyether-modified polysiloxane surface control assistant can be obtained, which can satisfy unsaturated polyester. , Flow control requirements for different radiation curing systems such as epoxy acrylate, urethane acrylate, polyester acrylate, polyether acrylate, and acrylate.
- a surface control additive for a radiation curing system having the following structural formula:
- n is an integer of 1 to 500;
- x is an integer from 0 to 800
- p is an integer from 0 to 600
- q is an integer from 1 to 800
- R 4 and R 5 are H or CH 3;
- R 6 is H or a linear or branched alkyl group having 1 to 18 carbons or an acyl group containing a carbon.
- R 6 is methyl, ethyl, n-butyl, isobutyl or acetyl.
- the preparation method of the surface control assistant for the radiation curing system mentioned above comprises the following steps:
- component A and component B are added to the reactor, and a solution of 0.02 to 0.2 wt% of 2% chloroplatinic acid butyl acetate as a catalyst is charged as a catalyst, and reacted at 100 to 120 ° C for 4 to 8 hours.
- a hydrosilation reaction wherein component B reacts with 1 to 90% of the hydrosilyl group in component A; then, the reaction system is cooled to 60 to 80 ° C, and component C and component D are further added.
- the component A is a hydrogen-containing polysiloxane having a number of ⁇ 100000, and the structural formula is as follows:
- R 1 is a phenyl group or a lower alkyl group having 1 to 4 carbon atoms and each R 1 may be the same or different, and R 2 and R 3 are a phenyl group or a lower alkyl group having 1 to 4 carbon atoms or H And at least one R 2 is H; p is an integer from 0 to 600, and q is an integer from 1 to 800;
- the component B is an allyl polyether having the following structural formula:
- R 4 and R 5 are H or CH 3
- R 6 is H or a linear or branched fluorenyl group having 1 to 18 carbons or an acyl group having 2 to 5 carbons
- m and n are integers and make components B has a number average molecular weight of 200 to 20000;
- the component C is an anthraquinone, phenol or aromatic amine polymerization inhibitor; the amount of addition is 0.01 to lwt% of the entire formulation;
- the component D is allyl acrylate or dipropyl methacrylate.
- the component A has a number average molecular weight of 500 to 20,000
- the R 6 is a methyl group, an ethyl group, a butyl group, an isobutyl group or an acetyl group
- the component B has a number average molecular weight of 300 to 10,000.
- the component A has a number average molecular weight of 1,000 to 3,000, and the component B has a number average molecular weight of 400 to 3,000.
- the component B has an HLB value of from 1 to 17.
- the component C is p-methoxyphenol, hydroquinone, phenothiazine, p-tert-butyl catechol, p-hydroxyanisole or 2,6-di-tert-butyl-p-cresol.
- the surface control aid is used as a leveling control aid for UV/EB coating systems or ink systems.
- the type of the component B allyl polyether can be classified into the following four types according to the polymerization method thereof - (1) All EO or PO type: that is, R 4 and R 5 are both H or both are CH 3;
- In-line type the structure is an allyl group first connected with an oxidized olefin unit (epoxy acetam or propylene bromide), and then another oxyalkylene unit;
- an oxidized olefin unit epoxy acetam or propylene bromide
- Hetero-embedded type a mixed unit in which the allyl group is first connected to two olefin oxides, and then a single oxyalkylene unit is added (or, in reverse order of the above);
- the structure is an allyl group in which a mixed unit of two oxidized olefins in a given ratio is firstly connected, and then the same mixing unit or a different ratio of the same oxidized olefin is mixed. It is also possible that the two are different mixing units.
- the surface control additive of the present invention is mainly used in radiation curing (UV/EB) coatings and inks to control the flow of the surface of the coating film.
- the surface control aid contains a curable (meth)acryloyl group, it can participate in a film formation reaction under UV/EB irradiation, thereby maintaining the non-tackiness and smoothness of the coating layer for a long period of time;
- the surface control aid of the reactive group also minimizes the migration of precipitated film after curing.
- the modification of different allyl polyethers the different combinations of EO and PO are utilized, so that the surface control assistant of the invention can adapt to the freedom from high polarity aqueous to low polarity aliphatic hydrocarbon solvent system. The choice can greatly meet the needs of various radiation curing systems currently on the market.
- Figure 1 is an infrared spectrum of the product of Example 1. detailed description
- B is a residue after the hydrosilation addition reaction of allyl polyether.
- C is a residue after the hydrosilation addition reaction of allyl polyether.
- D is a residue after the hydrosilation addition reaction of allyl polyether.
- the surface control aid obtained in the embodiment of the present invention is added into the UV coating with a certain amount of addition, sprayed on a tinplate or a plastic substrate, and solidified in a UV curing machine to observe the leveling. , slip and the durability of the film slip.
- the surface control auxiliaries of the present invention were evaluated using the following three test formulations:
- Solvent-based UV test procedure Each surface control aid was added to the pre-formulated UV coating (Formulation I and ⁇ ), shaken for 5 minutes, and taken out to observe the foam suppression and defoaming conditions. After all the bubbles have disappeared, they are applied to the tinplate and placed in a UV curing machine to cure completely. The thickness of the film is about 30 ⁇ m, and the leveling, shrinkage, slip and ethyl acetate scrubbing of the coating are detected 100 times. Slip.
- Defoaming test Visual inspection, 1 means that the defoaming is abnormally fast, 2 means that the defoaming is fast, and 3 means that the defoaming is OK.
- Leveling test Visual inspection, 1 means that the coating film is continuous and flat, 2 means that the coating film is relatively continuous, but there will be a little unevenness when carefully observed, 3 means that the surface of the coating film is not very smooth and streaked, 4 means that the coating film has orange grain, Orange peel phenomenon, 5 means that the coating film has shrinkage cavities;
- Examples 1 and 2 of the present invention can ensure the leveling and anti-cratering of the paint film because of the polyether segment with adjustable compatibility and the acryl functional group which can participate in the curing of the paint film. It also allows the film to achieve long-lasting smoothness. According to the test results of the items 9 to 10, it is further clarified that the surface control additive of the present invention has both broad system compatibility and long-lasting performance of the UV paint film.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
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Abstract
Description
Claims
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JP2015527744A JP2015531806A (ja) | 2012-08-22 | 2012-10-08 | 放射線硬化型用表面制御助剤ならびにその製造方法および応用 |
EP12883275.5A EP2889321B1 (en) | 2012-08-22 | 2012-10-08 | Surface control additive for radiation curing system, preparation method therefor and application thereof |
US14/423,130 US9845401B2 (en) | 2012-08-22 | 2012-10-08 | Surface control additive for radiation curing system, preparation method therefor and application thereof |
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CN103638872B (zh) * | 2013-12-16 | 2015-07-29 | 南京美思德新材料有限公司 | 一种三硅氧烷聚醚酯表面活性剂及其制备方法 |
CN104479134B (zh) * | 2014-12-08 | 2017-01-18 | 杭州百合科莱恩颜料有限公司 | 嵌段聚硅氧烷聚合物及包括该聚合物的颜料分散剂 |
CN109749085A (zh) * | 2019-01-09 | 2019-05-14 | 新丰博兴聚合材料有限公司 | 一种交联硅氧烷型丙烯酸酯低聚物及其制备的光固化组合物 |
CN113004528A (zh) * | 2019-12-20 | 2021-06-22 | 菁眸生物科技(上海)有限公司 | 一种隐形眼镜及用于隐形眼镜的表面活性剂 |
JP7508699B2 (ja) | 2020-09-02 | 2024-07-01 | ビック-ケミー ゲゼルシャフト ミット ベシュレンクテル ハフツング | 放射線硬化コーティングの表面特性の向上 |
US20240150526A1 (en) * | 2021-03-05 | 2024-05-09 | Dow Toray Co., Ltd. | Co-modified organopolysiloxane and curable organopolysiloxane composition including same |
CN113943530B (zh) * | 2021-11-24 | 2023-09-26 | Ppg涂料(天津)有限公司 | 水性uv固化涂料组合物 |
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EP2889321A1 (en) | 2015-07-01 |
KR20150038179A (ko) | 2015-04-08 |
JP6714048B2 (ja) | 2020-06-24 |
EP2889321A4 (en) | 2015-10-14 |
CN102863625A (zh) | 2013-01-09 |
EP2889321B1 (en) | 2017-05-31 |
CN102863625B (zh) | 2014-02-26 |
KR101821178B1 (ko) | 2018-01-23 |
JP2019014892A (ja) | 2019-01-31 |
JP2015531806A (ja) | 2015-11-05 |
US9845401B2 (en) | 2017-12-19 |
US20150240092A1 (en) | 2015-08-27 |
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