WO2012102212A1 - 樹脂組成物シート、金属箔付樹脂組成物シート、メタルベース配線板材料、メタルベース配線板、及びled光源部材 - Google Patents
樹脂組成物シート、金属箔付樹脂組成物シート、メタルベース配線板材料、メタルベース配線板、及びled光源部材 Download PDFInfo
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- inorganic filler
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
- H05K1/056—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2605/00—Vehicles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2605/00—Vehicles
- B32B2605/003—Interior finishings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0373—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/189—Printed circuits structurally associated with non-printed electric components characterised by the use of a flexible or folded printed circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10007—Types of components
- H05K2201/10106—Light emitting diode [LED]
Definitions
- the present invention relates to a resin composition sheet, a resin composition sheet with metal foil, a metal base wiring board material, a metal base wiring board, and an LED light source member.
- Japanese Patent Application Laid-Open No. 2008-13759 discloses an epoxy resin composition containing an epoxy resin exhibiting liquid crystallinity and an insulating inorganic filler, and has high thermal conductivity and excellent workability. Has been.
- the present invention relates to a resin composition sheet capable of forming a cured resin having excellent thermal conductivity and electrical insulation, a resin composition sheet with metal foil, a metal base wiring board material formed using these, and a metal base wiring It is an object to provide a plate and an LED light source member.
- the present invention relates to the following.
- ⁇ 1> includes a thermosetting resin, a phenol resin, and an insulating inorganic filler, A resin composition sheet in which the occupancy ratio of the recesses having a maximum depth of 0.5 ⁇ m or more on the surface is 4% or less in terms of area ratio.
- insulating inorganic filler is at least one filler selected from the group consisting of aluminum oxide, magnesium oxide, boron nitride, aluminum nitride, silicon nitride, silicon carbide, and aluminum fluoride.
- R 1 represents an alkyl group, an aryl group, or an aralkyl group
- R 2 and R 3 each independently represent a hydrogen atom, an alkyl group, an aryl group, or an aralkyl group
- m represents an integer of 0 to 2
- n represents an integer of 1 to 10.
- ⁇ 6> It is formed from a resin composition containing the thermosetting resin, the phenol resin, and the insulating inorganic filler,
- the resin composition has a viscosity of 1000 mPa ⁇ s to 10,000 mPa ⁇ s,
- the minimum melt viscosity at 20 ° C. to 200 ° C. is 10 Pa ⁇ s to 1000 Pa ⁇ s
- a resin composition sheet in which the occupancy ratio of the recesses having a maximum depth of 0.5 ⁇ m or more on the surface is 4% or less in terms of area ratio.
- ⁇ 8> The resin composition sheet according to any one of ⁇ 1> to ⁇ 7>, wherein the average thickness is 20 ⁇ m or more and 500 ⁇ m or less.
- a resin composition sheet with metal foil comprising the resin composition sheet according to any one of ⁇ 1> to ⁇ 8> and a metal foil.
- Metal foil A metal substrate; Between the metal foil and the metal substrate, a thermally conductive insulating layer that is a cured product of the resin composition sheet according to any one of ⁇ 1> to ⁇ 8>, Metal base wiring board material having
- a wiring layer a wiring layer; A metal substrate; Between the wiring layer and the metal substrate, a thermally conductive insulating layer that is a cured product of the resin composition sheet according to any one of ⁇ 1> to ⁇ 8>, Metal base wiring board having
- a resin composition sheet capable of forming a cured resin having excellent thermal conductivity and electrical insulation, a resin composition sheet with metal foil, a metal base wiring board material formed using these, and a metal A base wiring board and an LED light source member can be provided.
- the cross-section in an example of the metal base wiring board material of this invention is shown.
- the cross-section in an example of the metal base wiring board of this invention is shown.
- the cross-section in an example of the LED light source member of this invention is shown.
- process is not limited to an independent process, and is included in the term if the intended action of the process is achieved even when it cannot be clearly distinguished from other processes.
- a numerical range indicated using “to” indicates a range including the numerical values described before and after “to” as the minimum value and the maximum value, respectively.
- the first resin composition sheet of the present invention includes a thermosetting resin, a phenol resin, and an insulating inorganic filler, and the occupancy ratio of the recesses having a maximum depth of 0.5 ⁇ m or more on the surface of the resin composition sheet.
- the second resin composition sheet of the present invention has a minimum melt viscosity at 20 ° C. to 200 ° C. of 10 to 1000 Pa ⁇ s, and an occupancy ratio of a recess having a maximum depth of 0.5 ⁇ m or more on the surface, It is a resin composition sheet having an area ratio of 4% or less.
- the said recessed part in this invention says what exists in the resin composition sheet
- the resin composition sheet of the present invention is bonded to a metal foil, a wiring layer, or a metal substrate to form a resin composition sheet with a metal foil, a wiring board material, a wiring board, and the like. Therefore, the dent on the surface of the resin composition sheet forms bubbles at the interface bonded to the metal foil, the wiring layer, or the metal substrate.
- the bubbles may be referred to as “interface bubbles”.
- the interfacial bubbles contained in the resin composition sheet serve as a starting point for dielectric breakdown, and lower the dielectric breakdown voltage of the wiring board material or the wiring board.
- the resin composition sheet flows due to pressure heating (such as curing heating for forming a so-called C stage) when producing the wiring board material, and the interfacial bubbles Disappears. Therefore, the conventional resin composition sheet is devised so that the interfacial bubbles are eliminated by pressurization and heating when forming the C stage, and no interfacial bubbles exist after the C stage. Specifically, a method for improving the fluidity of the resin composition sheet during pressure heating when producing a wiring board material has been studied.
- the resin composition sheet at the time of pressure heating if the fluidity of the resin composition sheet at the time of pressure heating is too high, the resin composition sheet flows out from the end of the wiring board material due to the pressure heating when producing the wiring board material, and the end In some cases, the thickness of the resin composition sheet in the sheet varied and the thickness varied. This variation in thickness causes a variation in performance within the surface of the metal base wiring board material. Moreover, workability
- the conventional resin sheet has improved the dielectric breakdown voltage by filling the recess by improving the fluidity of the resin, regardless of the occupation ratio of the recess. Thickness variation and a decrease in workability due to the flow-out of the resin composition.
- the occupancy ratio of the recesses having a maximum depth of 0.5 ⁇ m or more is set to 4% or less in terms of the area ratio, thereby improving the fluidity of the resin
- the recess is sufficiently filled, and the dielectric breakdown voltage can be improved.
- the problem of the workability fall by the thickness variation in the surface of a metal base wiring board material and the flowing out of a resin composition can also be eliminated.
- the occupancy ratio of recesses having a maximum depth of 0.5 ⁇ m or more on the surface is 4% or less by area ratio
- the occupancy ratio of the recesses in the present invention is defined as the ratio of the area calculated from the total area of the observed recesses to the total area in the range where the recesses on the surface of the resin composition sheet were observed. More specifically, it is represented by the following formula.
- Recess occupancy (%) (Area calculated from the total area of the observed recesses) / (Total area of the range where the recesses were observed) ⁇ 100
- the observation of the recesses in the present invention can be performed with a scanning electron microscope (SEM), an optical microscope, a laser microscope, and an optical interference microscope.
- SEM scanning electron microscope
- the occupancy ratio of the recesses on the surface of the resin composition sheet In the measurement, when the metal foil, the wiring layer, the metal substrate, or the like can be peeled off, the concave portion on the surface of the resin composition sheet after peeling is observed and obtained by the above formula.
- the occupancy ratio of the recesses can be evaluated by observing the cross section. In this case, the square of the ratio of the sum of the lengths of the widths of the observed interface bubbles to the total length of the range in which the cross-section was observed is defined as the recess occupation ratio (%).
- the occupancy ratio of the recess is 4% or less from the viewpoint of improving the breakdown voltage, and preferably 3% or less for improving the breakdown voltage more reliably, and has a large surface roughness. In order to improve the dielectric breakdown voltage more reliably with respect to the adherend, it is more preferably 2% or less.
- a method for adjusting the occupancy ratio of the recesses on the surface of the resin composition sheet for example, (1) a method for adjusting the type and blending amount of the insulating inorganic filler, and (2) a resin composition sheet is manufactured. (3) When manufacturing a resin composition sheet, two resin composition sheets are manufactured and the two sheets are bonded together to occupy a concave portion on the surface. The method of reducing the rate, (4) The method of passing through the process of smoothing the surface of a resin composition sheet, etc. are mentioned.
- the insulating inorganic filler is mixed with different particle sizes, for example, large particles, medium particles, and small particles, and the mixing ratio is JIS-K-5101-13-2. And a method of blending so as to minimize the oil absorption rate. Thereby, even if it raises the filling rate of an insulating inorganic filler in order to improve thermal conductivity, resin can be filled between fillers and the area ratio of the recessed part of a resin composition sheet can be reduced.
- two or more resin composition sheets may be bonded using a known method such as a laminator or a press. Since the resin composition sheets are familiar to each other, the resin composition sheets can be joined together to form a single resin sheet. Therefore, for example, when one surface of the resin composition sheet has a high area ratio of the recesses or when unevenness is formed, the recesses and the unevenness can be eliminated by bonding the surfaces to each other. Therefore, it is possible to reduce the recess occupation ratio on the surface of the resin composition sheet.
- a method of pressurizing and heating may be used in one of the resin composition sheets or when the two resin composition sheets of (3) are bonded together.
- produced in the resin composition sheet back surface, ie, the interface of a resin composition sheet and a base material can be reduced.
- the concave portions generated at the interface between the resin composition sheet and the base material are likely to be reduced.
- the present invention is not limited to these methods.
- the first resin composition sheet of the present invention is formed from a resin composition containing a thermosetting resin, a phenol resin, and an insulating inorganic filler.
- the resin composition sheet of the present invention may further contain other components as necessary.
- the second resin composition sheet of the present invention is not particularly limited in composition as long as the minimum melt viscosity is within the above range, but, like the first resin composition sheet, a thermosetting resin, a phenol A resin and an insulating inorganic filler are preferably included. A method for measuring the minimum melt viscosity will be described later.
- thermosetting resin The resin composition sheet of the present invention contains at least one thermosetting resin.
- the thermosetting resin is not particularly limited as long as it is a thermosetting resin, and a commonly used thermosetting resin can be used.
- Specific examples of thermosetting resins include epoxy resins, polyimide resins, polyamideimide resins, triazine resins, phenol resins, melamine resins, polyester resins, cyanate ester resins, and modifications of these resins. And the like. These resins may be used alone or in combination of two or more.
- thermosetting resin in the present invention is preferably a resin selected from an epoxy resin and a triazine resin, more preferably an epoxy resin, from the viewpoint of heat resistance.
- curing agent and hardening accelerator may be included as needed.
- An epoxy resin may be used individually by 1 type, or may use 2 or more types together.
- epoxy resin examples include bisphenol A, bisphenol F, biphenol, novolac type phenol resin, orthocresol novolac type phenol resin, trisphenol methane novolac type phenol resin and the like.
- Polyglycidyl ethers obtained by reacting polyhydric alcohols such as monohydric phenol and 1,4-butanediol with epichlorohydrin; polyglycidyl esters obtained by reacting polybasic acids such as phthalic acid and hexahydrophthalic acid with epichlorohydrin N-glycidyl derivatives of compounds having amines, amides or heterocyclic nitrogen bases; and alicyclic epoxy resins.
- an epoxy monomer having a mesogen skeleton typified by a biphenyl structure or a polymer thereof is preferable because the thermal conductivity of the resin itself is improved and the melt viscosity at the time of heating is reduced.
- the mesogen skeleton in the present invention refers to a functional group that may exhibit liquid crystallinity.
- Specific examples include biphenyl, phenylbenzoate, azobenzene, stilbene, and derivatives thereof.
- Examples include biphenyl and those having three or more 6-membered ring structures in the molecule.
- the following general formula (A) described in the committee edition 2000) is given.
- the ring structures represented as ring 1, ring 2, and ring 3 are each independently
- the linking groups X1 and X2 are each independently a single bond
- Y1, Y2, and Y3 are each independently —R, —OR (where R represents an aliphatic hydrocarbon group having 1 to 8 carbon atoms), —F , -Cl, -Br, -I, -CN, -NO 2 , or -CO-CH 3 , and n, m and l each independently represents an integer of 0 to 4.
- Examples of the epoxy monomer having a mesogenic skeleton include biphenyl type epoxy resin, bixylenyl type epoxy resin, 1- (3-methyl-4-oxiranylmethoxyphenyl) -4- (4-oxiranylmethoxyphenyl) -1-cyclohexene. Or 1- (3-methyl-4-oxiranylmethoxyphenyl) -4- (4-oxiranylmethoxyphenyl) -benzene and the like, and from the viewpoint of the melting point and the thermal conductivity of the cured product, 1- ( 3-methyl-4-oxiranylmethoxyphenyl) -4- (4-oxiranylmethoxyphenyl) -1-cyclohexene is more preferred.
- Such an epoxy compound can be produced, for example, by the method described in Patent Document 1 described above.
- the epoxy monomers having a mesogenic skeleton or a polymer thereof it is preferable to contain at least one bifunctional epoxy resin having a biphenyl skeleton.
- the bifunctional epoxy resin having a biphenyl skeleton is not particularly limited as long as it is a compound having at least one biphenyl skeleton and having two epoxy groups. Specific examples include biphenyl type epoxy resins and biphenylene type epoxy resins.
- As the biphenyl type epoxy resin it is preferable to use an epoxy resin represented by the following general formula (III).
- R 1 to R 8 each independently represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 10 carbon atoms, and n represents an integer of 0 to 3.
- Examples of the substituted or unsubstituted hydrocarbon group having 1 to 10 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, and an isobutyl group.
- R 1 to R 8 are preferably each independently a hydrogen atom or a methyl group.
- Examples of the biphenyl type epoxy resin represented by the general formula (III) include 4,4′-bis (2,3-epoxypropoxy) biphenyl or 4,4′-bis (2,3-epoxypropoxy) -3. , 3 ', 5,5'-tetramethylbiphenyl as the main component, epichlorohydrin and 4,4'-biphenol or 4,4'-(3,3 ', 5,5'-tetramethyl) biphenol An epoxy resin obtained by reacting is used. Among these, an epoxy resin mainly composed of 4,4′-bis (2,3-epoxypropoxy) -3,3 ′, 5,5′-tetramethylbiphenyl is preferable.
- YX-4000 manufactured by Japan Epoxy Resin Co., Ltd.
- YL-6121H manufactured by Japan Epoxy Resin Co., Ltd.
- YSLV-80XY manufactured by Toto Kasei Co., Ltd.
- examples of the biphenylene type epoxy resin include an epoxy resin represented by the following general formula (IV).
- R 1 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, or carbon Represents an aralkyl group of formula 7 to 10, and n represents an integer of 0 to 10.
- Examples of the alkyl group having 1 to 10 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, an isopropyl group, and an isobutyl group.
- Examples of the alkoxy group having 1 to 10 carbon atoms include methoxy group, ethoxy group, propoxy group, butoxy group and the like.
- Examples of the aryl group having 6 to 10 carbon atoms include a phenyl group, a tolyl group, and a xylyl group.
- Examples of the aralkyl group having 7 to 10 carbon atoms include benzyl group and phenethyl group.
- R 1 to R 9 are preferably each independently a hydrogen atom or a methyl group.
- biphenyl type epoxy resin represented by the general formula (IV) for example, NC-3000 (trade name, manufactured by Nippon Kayaku Co., Ltd.) is commercially available.
- the bifunctional epoxy resin having a biphenyl skeleton in the present invention is represented by the general formula (III) or the general formula (IV) from the viewpoint of thermal conductivity, electrical insulation, and flexibility of a B stage sheet described later. It is preferable that at least one kind of compound is included, and it is more preferable that at least one kind of the compound represented by the general formula (III) is included.
- seat of this invention From a thermal conductivity, electrical insulation, and a flexible viewpoint of a B stage sheet
- the bifunctional epoxy resin having the biphenyl skeleton and other epoxy resins may be used in combination.
- other epoxy resins conventionally known epoxy resins can be used without particular limitation as long as they do not have a biphenyl skeleton.
- epoxy resins include phenol novolac type epoxy resins, orthocresol novolac type epoxy resins, and epoxy resins having a triphenylmethane skeleton, such as phenol, cresol, xylenol, resorcin, catechol, bisphenol A, Condensation of phenols such as bisphenol F and / or naphthols such as ⁇ -naphthol, ⁇ -naphthol and dihydroxynaphthalene with compounds having an aldehyde group such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde and salicylaldehyde in an acidic catalyst
- aldehyde group such as formaldehyde, acetaldehyde, propionaldehyde, benzaldehyde and salicylaldehyde in an acidic catalyst
- examples include epoxidized novolak resins obtained by co-condensation.
- bisphenol A bisphenol F, bisphenol S, stilbene type epoxy resin, hydroquinone type epoxy resin, glycidyl ester type epoxy resin obtained by reaction of polybasic acid such as phthalic acid and dimer acid and epichlorohydrin, diaminodiphenylmethane, isocyanuric acid, etc.
- Glycidylamine-type epoxy resin obtained by reaction of polyamine with epichlorohydrin, epoxidized product of co-condensation resin of dicyclopentadiene and phenol, epoxy resin having naphthalene ring, phenol-aralkyl resin, phenol-aralkyl resin containing biphenylene skeleton
- Epoxidized products of aralkyl type phenol resins such as naphthol / aralkyl resin, trimethylolpropane type epoxy resin, terpene modified epoxy resin
- Examples include linear aliphatic epoxy resins obtained by oxidizing fin bonds with peracids such as peracetic acid, alicyclic epoxy resins, and sulfur atom-containing epoxy resins. These can be used alone or in combination of two or more. May be.
- the resin composition sheet of the present invention preferably contains at least one selected from epoxy resins having a naphthalene ring, from the viewpoint of flexibility in the B stage sheet.
- the content is not particularly limited.
- the content is 1% by mass to 30% by mass with respect to the bifunctional epoxy resin having the biphenyl skeleton.
- the content is preferably 2% by mass to 20% by mass, more preferably 3% by mass to 15% by mass. With such a content, the thermal conductivity, electrical insulation, and flexibility of the B stage sheet are more effectively improved.
- the resin composition sheet of the present invention contains at least one phenol resin.
- the phenol resin preferably includes a phenol resin (hereinafter sometimes referred to as “novolak resin”) containing at least one compound having a structural unit represented by the following general formula (I).
- the phenol resin acts as a curing agent for an epoxy resin, for example.
- R 1 represents an alkyl group, an aryl group, or an aralkyl group.
- the alkyl group, aryl group and aralkyl group represented by R 1 may further have a substituent if possible.
- the substituent include an alkyl group, an aryl group, a halogen atom, and a hydroxyl group. Can be mentioned.
- n represents an integer of 1 to 10, preferably 1 to 8, and more preferably 1 to 7.
- R 2 and R 3 each independently represent a hydrogen atom, an alkyl group, an aryl group, a phenyl group, or an aralkyl group.
- the alkyl group, phenyl group, aryl group and aralkyl group represented by R 2 and R 3 may further have a substituent if possible, and examples of the substituent include an alkyl group, an aryl group, a halogen atom, An atom, a hydroxyl group, etc. can be mentioned.
- R 2 and R 3 in the present invention are preferably a hydrogen atom, an alkyl group, a phenyl group or an aryl group from the viewpoint of storage stability and thermal conductivity, and are preferably a hydrogen atom, an alkyl group having 1 to 4 carbon atoms.
- an aryl group having 3 to 6 carbon atoms and a phenyl group are more preferable, and a hydrogen atom is further preferable.
- R 2 and R 3 are an aryl group.
- the phenol resin in the present invention may contain one kind of compound having the structural unit represented by the above general formula (I), or may contain two or more kinds.
- the phenol resin represented by the general formula (I) includes a partial structure derived from resorcinol as a phenolic compound, but may further include at least one partial structure derived from a phenolic compound other than resorcinol.
- phenolic compounds other than resorcinol include phenol, cresol, catechol, and hydroquinone.
- the said phenol resin may contain the partial structure derived from these individually by 1 type or in combination of 2 or more types.
- the partial structure derived from the phenolic compound means a monovalent or divalent group constituted by removing one or two hydrogen atoms from the benzene ring portion of the phenolic compound.
- the position where the hydrogen atom is removed is not particularly limited.
- the partial structure derived from a phenolic compound other than resorcinol includes phenol, cresol, catechol, hydroquinone, 1,2,3-trihydroxybenzene, 1 from the viewpoint of thermal conductivity, adhesiveness, and storage stability. It is preferably a partial structure derived from at least one selected from 1,2,4-trihydroxybenzene and 1,3,5-trihydroxybenzene, and a portion derived from at least one selected from catechol and hydroquinone A structure is more preferable.
- the content ratio of the partial structure derived from resorcinol in the phenol resin is not particularly limited, but from the viewpoint of thermal conductivity and storage stability, the content ratio of the partial structure derived from resorcinol to the total mass of the phenol resin is 30.
- the content is preferably at least mass%, more preferably at least 55 mass%, and even more preferably at least 80 mass%.
- the phenol resin in the present invention is preferably a phenol resin containing a compound having a partial structure represented by any one of the following general formulas (Ia) to (If).
- the compound having the structural unit represented by the general formula (I) is preferably at least one compound represented by the following general formula (II).
- R 11 represents a hydrogen atom or a monovalent group derived from a phenolic compound represented by the following general formula (IIp), and R 12 represents a monovalent group derived from a phenolic compound.
- R 1, R 2, R 3 , m and n are respectively the same as R 1, R 2, R 3 , m and n in the general formula (I).
- the monovalent group derived from the phenolic compound represented by R 11 and R 12 is a monovalent group constituted by removing one hydrogen atom from the benzene ring portion of the phenolic compound, and the hydrogen atom is removed. There is no particular limitation on the position.
- p represents an integer of 1 to 3.
- R 1, R 2 and R 3 are respectively the same meaning as R 1, R 2 and R 3 in formula (I)
- m represents an integer of 0-2.
- the phenolic compound in R 11 and R 12 is not particularly limited as long as it is a compound having a phenolic hydroxyl group.
- Specific examples include phenol, cresol, catechol, resorcinol, hydroquinone and the like. Among these, from the viewpoints of thermal conductivity and storage stability, at least one selected from cresol, catechol, and resorcinol is preferable.
- the phenol resin containing the compound having the structural unit represented by the general formula (I) may contain a monomer that is a phenolic compound constituting the phenol resin.
- the content ratio of the monomer that is a phenolic compound constituting the phenol resin (hereinafter sometimes referred to as “monomer content ratio”) is not particularly limited, but is preferably 5 to 80% by mass, and preferably 15 to 60% by mass. % Is more preferable, and 20 to 50% by mass is even more preferable.
- the monomer content ratio is 5% by mass or more, an increase in the viscosity of the phenol resin is suppressed, and the adhesion of the inorganic filler is further improved. Moreover, by being 80 mass% or less, a higher-order higher-order structure is formed by the crosslinking reaction in the case of hardening, and the outstanding heat conductivity and heat resistance can be achieved.
- the monomer of the phenolic compound constituting the phenol resin examples include resorcinol, catechol, and hydroquinone, and it is preferable that at least resorcinol is included as a monomer.
- the content ratio of the phenol resin in the resin composition sheet of the present invention is not particularly limited, but it is 1% by mass from the viewpoint of thermal conductivity, electrical insulation, flexibility of B-stage sheet and pot life. It is preferably ⁇ 15% by mass, more preferably 2% by mass to 10% by mass.
- thermosetting resin and the phenol resin (thermosetting resin / phenol resin) in the resin composition sheet of the present invention is, for example, 0.6 to 1.5 on an equivalent ratio basis. In view of thermal conductivity, flexibility of the B-stage sheet, and pot life, it is preferably 0.8 to 1.2.
- the resin composition sheet of the present invention may contain a curing agent other than the phenol resin, if necessary, in addition to the phenol resin.
- a curing agent other than the phenol resin
- conventionally known curing agents can be used without particular limitation. Specifically, for example, polyaddition type curing agents such as amine curing agents and mercaptan curing agents, latent curing agents such as imidazole, and the like can be used.
- the insulating inorganic filler contained in the resin composition sheet of the present invention is not particularly limited as long as it is an insulating inorganic filler.
- it has a thermal conductivity of 1 W / mK or more, specifically, silicon dioxide, aluminum oxide, magnesium oxide, beryllium oxide, boron nitride, aluminum nitride, silicon nitride, silicon carbide, aluminum fluoride, Or it is selected from calcium fluoride.
- it is an inorganic ceramic having a thermal conductivity of 10 W / mK or more, and specifically selected from aluminum oxide, magnesium oxide, boron nitride, aluminum nitride, silicon nitride, silicon carbide, or aluminum fluoride. .
- aluminum oxide (alumina) having a volume resistivity of 10 16 ⁇ cm or more is more preferable. You may use these individually by 1 type or in mixture of 2 or more types.
- ⁇ Particle size and mixing ratio of the insulating inorganic filler are not particularly limited.
- the particle size and mixing ratio of the insulating inorganic filler for example, when a case where three types of inorganic filler groups having different particle size distributions are applied is taken as an example, the cumulative 50 particles from the small particle size side of the weight cumulative particle size distribution.
- the ratio of (A), (B) and (C) is 40 mass% or more and 90 mass% or less, 5 mass% or more and 40 mass% or less, 1 mass% or more and 30 mass% or less (however, the inorganic filler group)
- the total mass% of (A), (B) and (C) is 10 It is preferable to fill a proportion of the mass%).
- the particle size distribution is designed so that the large particle size side meets the conventional knowledge such as the Fuller curve when drawing the weight cumulative particle size distribution. It is preferable.
- the average particle diameter and the maximum of the inorganic filler group (A) are limited by the target film thickness in the case of a sheet or a metal foil with a resin.
- the average particle diameter of the inorganic filler group (A) is preferably as large as possible from the viewpoint of thermal conductivity, but it is as thin as possible within the range where insulation is allowed from the viewpoint of thermal resistance. Thickness is preferred.
- the maximum particle size is at least 7/8 or less of the film thickness, preferably 2/3 or less, and more preferably 1/2 or less.
- the average particle diameter of the inorganic filler group (A) is preferably 1 ⁇ 2 or less of the film thickness and preferably 5 ⁇ m or more and 100 ⁇ m or less, and 10 ⁇ m from the viewpoint of filling property, thermal resistance and thermal conductivity.
- the thickness is more preferably 75 ⁇ m or less and further preferably 10 ⁇ m or more and 45 ⁇ m or less.
- the particle diameter D50 of the insulating inorganic filler is measured using a laser diffraction method, and corresponds to the particle diameter at which the weight accumulation becomes 50% when the weight accumulation particle size distribution curve is drawn from the small particle diameter side. .
- the particle size distribution measurement using the laser diffraction method can be performed using a laser diffraction scattering particle size distribution measuring apparatus (for example, LS230 manufactured by Beckman Coulter, Inc.).
- a laser diffraction scattering particle size distribution measuring apparatus for example, LS230 manufactured by Beckman Coulter, Inc.
- the inorganic filler group (A) and the inorganic filler group (B) are alumina fillers, it is more preferable that they are alumina fillers made of ⁇ -alumina single crystal particles.
- the inorganic filler group (C) is an alumina filler
- it is preferably ⁇ -alumina, ⁇ -alumina, ⁇ -alumina, or ⁇ -alumina, more preferably ⁇ -alumina. More preferably, it is an alumina filler composed of single crystal particles of ⁇ -alumina.
- the content of the insulating inorganic filler contained in the resin composition sheet of the present invention is not particularly limited, but can be 40 vol% to 82 vol% in the solid content constituting the resin composition sheet, and the thermal conductivity From the viewpoint of electrical insulation and sheet flexibility, 50 vol% to 79 vol% is more preferable, and 55 vol% to 76 vol% is more preferable.
- the thermal conductivity is low, and when it is too large, it is difficult to form a sheet-like material.
- solid content in a resin composition sheet means the residue which removed the volatile component from the component which comprises a resin composition sheet.
- the inorganic filler groups (A) to (C) can be appropriately selected from commercially available ones. Also, for example, transition alumina or an alumina filler that becomes transition alumina by heat treatment is fired in an atmosphere gas containing hydrogen chloride (see, for example, Japanese Patent Laid-Open Nos. 6-191833 and 6-191836). ).
- the resin composition sheet of the present invention may contain inorganic fibers mainly composed of alumina and having a number average fiber diameter of 1 ⁇ m to 50 ⁇ m.
- inorganic fiber mainly composed of alumina means an inorganic fiber containing 41 vol% or more of alumina. Especially, it is preferable that it is an inorganic fiber containing 58 vol% or more of alumina, and it is more preferable that it is an inorganic fiber containing 74 vol% or more of alumina.
- the number average fiber diameter of such inorganic fibers is 1 ⁇ m to 50 ⁇ m, preferably 1 ⁇ m to 30 ⁇ m, more preferably 1 ⁇ m to 20 ⁇ m.
- the fiber length of such inorganic fibers is usually 0.1 mm to 100 mm.
- inorganic fibers commercially available fibers are usually used. Specifically, Artex (manufactured by Sumitomo Chemical Co., Ltd.), Denka Arsen (manufactured by Denki Kagaku Kogyo Co., Ltd.), Maftec Bulk Fiber (Mitsubishi Chemical) Sangyo Co., Ltd.).
- the amount of the inorganic fiber used is usually 4 vol% to 58 vol%, preferably 4 vol% to 41 vol%, based on the mass of the inorganic filler group (A) to (C). An amount is usually used in which the total mass of the filler and the inorganic fibers is 30 to 95% by mass in the solid content of the resin composition sheet.
- the resin composition sheet of the present invention may further contain an inorganic filler other than the insulating inorganic filler, if necessary, in addition to the insulating inorganic filler.
- the inorganic filler include non-conductive materials such as magnesium oxide, aluminum nitride, boron nitride, silicon nitride, silicon oxide, aluminum hydroxide, and barium sulfate.
- the conductive material include gold, silver, nickel, and copper.
- the resin composition sheet of the present invention may contain other components as required in addition to the essential components.
- other components include a solvent, a silane coupling agent, a dispersant, and an anti-settling agent.
- the solvent is not particularly limited as long as it does not inhibit the curing reaction of the resin composition sheet, and a commonly used organic solvent can be appropriately selected and used.
- the resin composition sheet of the present invention preferably contains a silane coupling agent.
- a silane coupling agent By including a silane coupling agent, it plays a role of forming a covalent bond between the surface of the insulating inorganic filler and the organic resin surrounding it (corresponding to a binder agent), thereby efficiently transferring heat and Furthermore, by preventing the ingress of moisture, it contributes to the improvement of insulation reliability.
- silane coupling agent commercially available ones can be usually used, but considering the compatibility with the epoxy resin and the phenol resin and reducing the heat conduction loss at the interface between the resin layer and the insulating inorganic filler, It is preferable to use a silane coupling agent having an epoxy group, amino group, mercapto group, ureido group, or hydroxyl group.
- a silane coupling agent oligomer Typified by a silane
- a dispersant can be added to the resin composition sheet of the present invention, and a commercially available dispersant effective for dispersing the insulating inorganic filler can be usually used as the dispersant.
- a commercially available dispersant effective for dispersing the insulating inorganic filler can be usually used as the dispersant.
- Ajinomoto Finetech Co., Ltd. Ajisper series, Enomoto Kasei Co., Ltd. HIPLAAD series, Kao Corporation homogenol series, etc. are mentioned. Two or more kinds of these dispersants can be used in combination.
- a resin composition sheet may be formed using the resin composition.
- the resin composition includes the thermosetting resin, the phenol resin, and the insulating inorganic filler. Since this resin composition is filled with an insulating inorganic filler, the behavior of the insulating inorganic filler when the resin composition is applied onto the substrate affects the above-described recess occupancy.
- the insulating inorganic filler settles faster on the coated substrate side than the evaporation of the organic solvent contained in the resin composition, and forms a wall of the insulating inorganic filler.
- volatile substances such as a solvent contained in the resin composition closer to the coating substrate than the wall of the insulating inorganic filler are dammed by the wall of the insulating inorganic filler, and aggregate to form bubbles.
- interfacial bubbles are generated on the coated substrate side. Therefore, in order to reduce the recess occupancy ratio of the resin composition sheet of the invention, it is important to control the viscosity of the resin composition applied on the substrate.
- the surface roughness of the metal foil is generally rougher than that of the metal substrate as described later. It became clear that adjustment of the viscosity was important.
- the viscosity of the resin composition is measured with a B-type viscometer (spindle No. 4, rotation speed 30 rpm) at 25 ° C.
- the pressure is preferably 1000 to 10000 mPa ⁇ s, more preferably 1200 to 8000 mPa ⁇ s, and further preferably 1500 to 6000 mPa ⁇ s. If the viscosity is too low, the insulating inorganic filler settles quickly and tends to generate interfacial bubbles. On the other hand, if the viscosity is too high, it becomes difficult to control the film thickness of the coating film.
- a resin composition sheet with a metal foil is prepared by applying a resin composition having a low viscosity to a metal foil, when the viscosity is 1000 mPa or more, the sedimentation of the insulating inorganic filler can be suppressed from becoming too fast. Further, it is possible to suppress the generation of a gap between the rough surface of the roughened metal foil and the insulating inorganic filler.
- the greater the insulating inorganic filler content the higher the viscosity of the resin composition, making it difficult to apply a uniform film thickness.
- the viscosity is lowered by increasing the amount of addition of a solvent or the like, as described above, the sedimentation of the insulating inorganic filler becomes too fast and the recess occupation ratio increases. Therefore, it is desirable to adjust the resin composition to an appropriate viscosity.
- the resin composition sheet of the present invention is a semi-cured (B stage) sheet.
- this resin composition sheet in a semi-cured state (B stage) is used in a wiring board material or a wiring board and is fully cured, it becomes a thermally conductive insulating layer.
- the resin composition sheet is formed by applying the resin composition onto a support base material (coating base material) to form a sheet-like coating material, and heating it until it is in a semi-cured state (B stage). It is made with.
- the method for applying the resin composition is not particularly limited, but is preferably applied when formed in a large area.
- coating can be implemented by a well-known method.
- Specific examples of the coating method include comma coating, die coating, lip coating, and gravure coating.
- a coating method for forming a resin layer with a predetermined thickness a comma coating method in which an object to be coated is passed between gaps, a die coating method in which a resin varnish whose flow rate is adjusted from a nozzle, or the like can be applied. .
- Other examples include a lip coat and a gravure coat.
- a solvent may be added to the resin composition for viscosity adjustment.
- the solvent contained in the resin composition is not particularly limited, and methyl ethyl ketone, acetone, methyl isobutyl ketone, cyclohexanone, cyclohexanol, dimethylacetamide, isopropanol, methanol, ethanol, and the like can be used.
- the coating base material is not particularly limited, but an inexpensive plastic base material is preferable because it is removed when a metal base wiring board material is produced.
- the resin used for the plastic substrate is polystyrene resin, acrylic resin, polymethyl methacrylate resin, polycarbonate resin, polyvinyl chloride resin, polyvinylidene chloride resin, polyethylene resin, polypropylene resin, polyamide resin, polyamideimide resin, polyetherimide.
- Resin polyether ether ketone resin, polyarylate resin, polyacetal resin, polybutylene terephthalate resin, thermoplastic polyester resin such as polyethylene terephthalate resin, cellulose acetate resin, fluororesin, polysulfone resin, polyethersulfone resin, polymethylpentene resin, Examples thereof include thermoplastic resins such as polyurethane resin and diallyl phthalate resin, and thermosetting resins.
- the thickness of the plastic substrate is preferably 0.01 mm to 5 mm from the viewpoint of handleability. In order to improve the peelability of the resin composition sheet, a release layer may be formed on the surface of the plastic substrate.
- the obtained coated product may be dried prior to heating for semi-curing.
- the drying temperature and drying time are preferably adjusted as appropriate according to the type of organic solvent contained in the coated material.
- the drying temperature and drying time by adjusting the evaporation rate of the organic solvent and the sedimentation rate of the insulating inorganic filler to the coated substrate side, the occupation ratio of the recesses on the surface of the obtained resin composition sheet can be reduced. It is also possible to make it 4% or less.
- the drying temperature is preferably 30 ° C. to 90 ° C., more preferably 40 ° C. to 100 ° C., and still more preferably 50 ° C. to 110 ° C.
- the drying time is preferably 0.2 to 60 minutes, more preferably 0.5 to 40 minutes, and further preferably 1 to 30 minutes.
- the obtained coated product is heated until it becomes a semi-cured state (B stage).
- the “semi-cured state (B stage)” is a minimum melt viscosity of 10 3 to 10 6 Pa ⁇ s at room temperature, but 10 to 10 3 Pa in the range of 80 ° C. to 200 ° C. -A state where the viscosity is reduced to s.
- the C-cured sheet (thermally conductive insulating layer) after the main curing is not melted by heating.
- the above-mentioned minimum melt viscosity means that the melt viscosity of the terminal-modified imide oligomer takes a minimum value due to a decrease in viscosity due to an increase in temperature and an increase in viscosity due to a curing reaction.
- a method for measuring the minimum melt viscosity of the resin composition sheet will be described later.
- the heating temperature for semi-curing is preferably 70 ° C. to 160 ° C., more preferably 80 ° C. to 150 ° C., and still more preferably 90 ° C. to 140 ° C.
- the heating time for semi-curing is preferably 0.2 to 60 minutes, more preferably 0.5 to 40 minutes, and further preferably 1 to 30 minutes.
- the content of the organic solvent in the resin composition sheet (B stage sheet) is reduced to 40% or less of the content in the resin composition before being applied on the substrate, after the main curing (C From the viewpoint of suppressing generation of voids and bubbles in the heat conductive insulating layer of the stage sheet).
- the obtained resin composition sheet may be a single layer, or a laminate of two resin composition sheets, or a laminate of three or more resin composition sheets. Also good.
- the lamination of two or more resin composition sheets may be performed using a known method such as a laminator or a press, and may be in a semi-cured state (B stage) by heating at that time.
- the resin composition sheets are familiar to each other, so that the resin composition sheets can be joined to each other, and a single resin sheet can be formed. . Therefore, for example, when one surface of the resin composition sheet has a high area ratio of the recesses or when unevenness is formed, the recesses and the unevenness can be eliminated by bonding the surfaces to each other. Therefore, it is possible to reduce the recess occupation ratio on the surface of the resin composition sheet.
- the bonding of the resin composition sheet is preferably performed by heating at 70 ° C. to 160 ° C., more preferably 80 ° C. to 150 ° C., and still more preferably 90 ° C. to 140 ° C.
- the pressure for bonding is preferably 0.05 MPa to 1 MPa, more preferably 0.1 MPa to 0.6 MPa, and still more preferably 0.2 MPa to 0.4 MPa.
- the obtained resin composition sheet may smooth the surface and reduce the recessed portion occupation ratio of the surface.
- the smoothing method include known methods such as a laminator and a press.
- the resin composition sheet may be slightly flowed by pressurization, and the concave portion of the sheet surface may be eliminated. It is desirable that the member brought into contact with the resin composition sheet during smoothing is smooth. This is because the smoothness of the member affects the smoothness of the resin composition sheet.
- a plastic sheet having a smooth surface may be brought into contact with the resin composition sheet, and at the same time, the resin composition sheet may be prevented from sticking to a laminator or a press.
- the fluidity of the resin composition may be improved by heating the resin composition sheet during pressurization. In this smoothing step, a semi-cured state (B stage) may be obtained by heating.
- the degree of vacuum is preferably 0.01 kPa to 20 kPa, more preferably 0.03 kPa to 10 kPa, and further preferably 0.1 kPa to 5 kPa.
- the heating temperature of the vacuum laminator is preferably 70 ° C to 170 ° C, more preferably 80 ° C to 160 ° C, and further preferably 90 ° C to 150 ° C.
- the pressure of the vacuum laminator is preferably 0.1 MPa to 3 MPa, more preferably 0.3 MPa to 2 MPa, and still more preferably 0.6 MPa to 1.5 MPa.
- the minimum melt viscosity of the resin composition sheet affects the fluidity of the resin composition in the pressure heating process from the B stage to the C stage. Therefore, it is desirable to adjust the minimum melt viscosity in the temperature range of 20 ° C. to 200 ° C. applied in the pressurizing and heating step from the viewpoint of handling properties and suppressing the outflow of the resin composition sheet from the end portion.
- the minimum melt viscosity of the resin composition sheet is a minimum value that appears due to a decrease in viscosity due to an increase in temperature and an increase in viscosity due to a curing reaction when the temperature dependence of shear viscoelasticity is measured.
- Examples of conditions for measuring shear viscoelasticity include a heating rate of 5 ° C./min (press heating rate), a frequency of 1 to 10 Hz, and a measuring jig for sandwiching a sheet includes a circular flat plate.
- the sample may be a laminate of resin composition sheets as necessary.
- the minimum melt viscosity at 20 ° C. to 200 ° C. of the resin composition sheet is preferably 10 Pa ⁇ s to 1000 Pa ⁇ s, more preferably 20 Pa ⁇ s to 800 Pa ⁇ s, and more preferably 30 Pa ⁇ s to 600 Pa ⁇ s. More preferably. If the minimum melt viscosity is too low, the thickness of the heat conductive insulating layer will vary. If the minimum melt viscosity is too high, the heat conductive insulating layer will not adhere sufficiently to the adherend such as a copper foil or metal substrate, and adhesion will occur. Decrease in power and breakdown voltage occur. Accordingly, when the minimum melt viscosity at 20 ° C. to 200 ° C. is within the above range, it exhibits excellent fluidity during heating and follows an adherend having a concavo-convex structure. Show.
- the thickness of the resin composition sheet (B stage sheet) of the present invention can be appropriately selected according to the purpose.
- the average thickness is preferably 20 ⁇ m to 500 ⁇ m, more preferably 25 ⁇ m to 400 ⁇ m, thermal conductivity, electrical conductivity, From the viewpoint of insulation and sheet flexibility, the thickness is preferably 30 ⁇ m to 300 ⁇ m. When it is 20 ⁇ m or more, the electrical insulation is excellent, and when it is 500 ⁇ m or less, an increase in thermal resistance is suppressed.
- the resin composition sheet with a metal foil is obtained by attaching a metal foil to the resin composition sheet. More specifically, a metal foil can be bonded to the resin composition sheet by a known method using a laminator, a press, or the like to produce a resin composition sheet with a metal foil. Moreover, a resin composition sheet with metal foil can be produced by applying a resin composition using a metal foil as a base material to form a coated product, and heating it to a semi-cured state (B stage).
- the metal foil is roughened in order to increase the adhesive force with the resin composition sheet.
- a resin composition sheet with a metal foil is prepared by sticking the resin composition sheet to a metal foil, if a concave portion having the specific size is present on the surface of the resin composition sheet, C-stage pressurization and heating Interfacial bubbles may be easily generated without following the roughened surface shape of the metal foil in the process.
- the resin composition sheet of the present invention that is, including a thermosetting resin, a phenol resin, and an insulating inorganic filler, has a maximum depth of 0.5 ⁇ m or more on the surface.
- the first resin composition sheet having an area ratio of 4% or less, or the lowest melt viscosity at 20 ° C. to 200 ° C. is 10 to 1000 Pa ⁇ s
- the resin composition sheet of the present invention effectively suppresses the generation of interfacial bubbles even when a metal substrate is attached.
- the metal foil a metal foil made of any material of copper, aluminum, nickel, tin, or an alloy containing them can be used. Further, the layer structure of the metal foil is not limited to one layer, and a composite foil of two to three layers can also be used. When low cost and high electrical conductivity are desired, it is desirable to use a copper foil.
- the thickness of the metal foil is preferably 3 ⁇ m to 110 ⁇ m, more preferably 5 ⁇ m to 90 ⁇ m, and even more preferably 9 ⁇ m to 70 ⁇ m. In the case of 3 ⁇ m or more, it is excellent in handling and can be prevented from being broken with a slight force. Moreover, when it is 110 micrometers or less, the usage-amount of expensive metal foil is suppressed.
- the metal foil may be handled with the carrier film attached.
- a carrier film a slightly adhesive adhesive film, a self-adsorbing adhesive film, or a UV curable adhesive film can be used.
- the metal foil is broken by being in a state where the carrier film is adhered to the metal foil. Can be suppressed.
- the thermally conductive insulating layer is an adhesive layer that insulates a metal substrate from a wiring layer or a metal foil in a metal base wiring board or a metal base wiring board material described later.
- the resin composition sheet (B stage) is fully cured (C stage) to form a heat conductive insulating layer (C stage).
- the above-mentioned resin composition sheet is sandwiched between the metal substrate and the metal foil, and the metal substrate and the metal foil are bonded by pressurizing and heating with a press machine or the like.
- the resin composition sheet in a semi-cured state (B stage) is re-melted in a pressure heating process, the resin composition sheet is in close contact with the metal substrate and the metal foil, and then the resin composition sheet is fully cured (C Stage) to form a heat conductive insulating layer (C stage), and the metal substrate and the metal foil are bonded.
- the thermally conductive insulating layer after the main curing is not melted by heating.
- the heat conductive insulating layer of the present invention is a composite of a heat conductive insulating inorganic filler and a thermosetting resin.
- the thermally conductive insulating inorganic filler it is preferable to use an inorganic ceramic having high thermal conductivity and insulating properties.
- the heat conductivity can be increased with a smaller filler content.
- the biphenyl skeleton in the bifunctional epoxy resin having a biphenyl skeleton has an anisotropic structure because it becomes a mesogenic group.
- the thermally conductive resin layer has an anisotropic structure inside, high thermal conductivity is exhibited.
- the heat conduction of an insulator is mainly due to phonons, and the heat conduction is caused by static scattering of phonons at defects in the material and dynamic scattering due to collision of phonons due to anharmonicity of molecular vibration and lattice vibration. The rate drops.
- the main chain direction of the polymer has a higher thermal conductivity than the direction perpendicular to the main chain (inter-molecular chain direction). This is because the main chain direction of the polymer is linked by a strong conjugated bond, so the harmonics of the main chain direction (phonon) are highly harmonious, and defects that cause static scattering of phonons are also present between the molecular chains. This is because it is much smaller than the direction. Therefore, the thermal conductivity can be increased anisotropically by orienting the main chain of the polymer. Orientation of the main chain of the polymer is carried out by a known method such as stretching, electric field application, rubbing. When the main chain of the polymer is oriented in the direction perpendicular to the film surface (thickness direction), the thermal conductivity in the thickness direction can be increased.
- the thermal conductivity in the film surface can be increased.
- the thermal conductivity in the vertical direction which is the direction between molecular chains of a polymer, is lower than that of a polymer that is not oriented. Therefore, in general, in the resin composition sheet in which the main chain of the polymer is oriented in the horizontal direction of the film surface, the thermal conductivity in the thickness direction becomes small.
- the order of the substance is increased, the harmonicity of vibration is increased and defects are reduced, so that the thermal conductivity in the intermolecular chain direction (thickness direction) can also be increased.
- the substance having the highest order of the substance is a perfect crystal, but the perfect crystal of the polymer insulator is practically impossible to apply as an insulating adhesive material.
- the liquid crystal state is highly ordered after the crystal and can be realized. Since the bifunctional epoxy resin having a biphenyl skeleton has a mesogenic group, there are few defects not only in the main chain direction but also in the intermolecular chain direction, and the vibration anharmonicity is also small. Therefore, a large thermal conductivity is exhibited without being constrained by a specific orientation direction.
- FIG. 1 shows a cross-sectional structure of an example of the metal base wiring board material of the present invention.
- the metal base wiring board material includes a metal foil 30 and a metal substrate 20, and includes a thermally conductive insulating layer 10 that is a cured product of the resin composition sheet between the metal foil 30 and the metal substrate 20. .
- the metal substrate 20 and the metal foil 30 are insulated by the arrangement of the heat conductive insulating layer 10.
- the metal substrate 20 is made of a metal material having a high thermal conductivity and a large heat capacity, and examples thereof include copper, aluminum, iron, and alloys used for lead frames. As the metal substrate 20 is thicker, the strength of the metal base wiring board increases. However, when the metal base wiring board on which electronic components are mounted is integrated with a metal chassis or the like with screws or adhesive material, the strength is improved. Further, the metal substrate 20 does not need to be particularly thick.
- the material of the metal substrate 20 may be selected according to the purpose such as aluminum when priority is given to weight reduction and workability, and iron when priority is given to strength. In order to increase productivity, it is preferable to cut the metal base wiring board into a size to be used after mounting the electronic component after the metal base wiring board is manufactured in a large size. Therefore, it is desirable that the metal substrate 20 has high workability for cutting.
- metal substrate 20 made of aluminum aluminum or an alloy containing aluminum as a main component can be selected as a material, and various types are available depending on the chemical composition and heat treatment conditions. It is preferable to select a type that is high and excellent in strength.
- the metal base wiring board material is produced by a method of sandwiching the resin composition sheet between the metal substrate 20 and the metal foil 30 and pressurizing and heating with a press machine or the like. Or it produces by the method etc. which pressurize and heat the resin composition sheet with metal foil, and the metal substrate 20.
- FIG. The conditions for the heat and pressure treatment for curing the resin composition sheet are appropriately selected according to the configuration of the resin composition sheet.
- the heating temperature is preferably 80 to 250 ° C. and the pressure is preferably 0.5 to 8.0 MPa, the heating temperature is 130 to 230 ° C. and the pressure is more preferably 1.5 to 5.0 MPa. .
- FIG. 2 shows a cross-sectional structure of an example of the metal base wiring board of the present invention.
- the metal base wiring board includes a metal substrate 20 and a wiring layer 40, and includes a thermally conductive insulating layer 10 that is a cured product of the resin composition sheet between the metal substrate 20 and the wiring layer 40.
- the metal substrate 20 and the wiring layer 40 are insulated by the arrangement of the heat conductive insulating layer 10.
- the wiring layer 40 is obtained by wiring the metal foil 30 that is a metal-based wiring board material. Etching is industrially preferable as a method of wiring the metal foil 30.
- solder resist is formed on the surface of the metal base wiring board except for a pad portion for mounting electronic components.
- the metal base wiring board material is preferably cut into the size of an electronic component mounting member such as an LED light source member after circuit processing and solder resist formation.
- the electronic component is mounted by applying an electrical connection material such as solder to the pad portion of the metal base wiring board, placing the electronic component, and then passing through a solder reflow process.
- FIG. 3 shows a cross-sectional structure of an LED light source member when an LED package is used as an electronic component.
- the heat conductive insulating layer 10 is provided between the metal substrate 20 and the wiring layer 40, and the electronic component 50 is mounted on the wiring layer 40.
- an LED backlight unit or the like can be produced, or an LED electric light or an LED bulb can be produced.
- the heat generated in the LED package is conducted and dissipated in the order of the electrical connection material such as solder, the pad portion composed of the metal foil 30, the thermally conductive insulating layer 10, and the metal substrate 20.
- the heat conductive insulating layer 10 that is a cured product of the resin composition sheet of the present invention, the heat dissipation from the pad portion to the metal substrate is improved, and the temperature rise of the LED package can be suppressed.
- Example 1 ⁇ Resin synthesis example 1> Into a 3 L separable flask equipped with a stirrer, a cooler and a thermometer, 594 g of resorcinol, 66 g of catechol, 316.2 g of 37% formalin, 15 g of oxalic acid, and 100 g of water were heated to 100 ° C. while heating in an oil bath. Warm up. The reaction was continued for 4 hours at reflux temperature. Thereafter, the temperature in the flask was raised to 170 ° C. while distilling off water. The reaction was continued for 8 hours while maintaining 170 ° C.
- a phenol resin having a structural unit represented by the general formula (I) was taken out.
- the number average molecular weight of the obtained phenol resin was 530, and the weight average molecular weight was 930.
- the phenol equivalent of the phenol resin is 65 g / eq. Met.
- ⁇ Varnish-like resin composition > 56.80 g (63% (total mass of insulating inorganic filler)) of an insulating inorganic filler (Sumitomo Chemical Co., Sumiko Random AA18) having a particle diameter D50 of 18 ⁇ m in a 1 L lid container made of polypropylene 20.29 g (22.5% (total mass of insulating inorganic filler)) of an insulating inorganic filler (Sumitomo Chemical Co., Ltd., Sumiko Random AA3) having a particle diameter D50 of 3 ⁇ m and a particle diameter D50 of 0.005.
- ⁇ Resin composition sheet> The resin composition 1 obtained above was applied on a PET film (Teijin DuPont Films, A53) using a bar coater, and dried at 100 ° C. for 20 minutes. The film thickness after drying was 50 ⁇ m. Two resin composition sheets after drying are placed facing each other, laminated using a roll laminator at 110 ° C., 0.3 MPa, feed rate 0.3 m / min, and an average thickness of 100 ⁇ m resin composition sheet (B stage sheet) was obtained. The obtained resin composition sheet was excellent in flexibility.
- the ratio for which all the insulating inorganic fillers in a resin composition sheet occupied was evaluated as follows. First, by measuring the weight of the resin composition sheet, firing the resin composition sheet at 400 ° C. for 2 hours, then 700 ° C. for 3 hours, evaporating the resin component, and measuring the mass of the remaining insulating inorganic filler, The weight ratio of the insulating inorganic filler in the resin composition sheet was evaluated. Next, the insulating inorganic filler was submerged in water, and the volume of the insulating inorganic filler was measured from the change in the water level. From this, the specific gravity of the insulating inorganic filler was evaluated.
- the specific gravity of the resin composition sheet was evaluated by the same method.
- the weight ratio of the insulating inorganic filler in the resin sheet was divided by the specific gravity of the insulating inorganic filler, and the value obtained by integrating the specific gravity of the resin sheet was evaluated as the volume ratio of the insulating inorganic filler.
- the evaluation results are shown in Table 1.
- ⁇ Minimum melt viscosity of resin composition sheet> The temperature dependence of the complex elastic modulus of the resin composition sheet was measured with a dynamic viscoelastic device (RES made by Rheometric Scientific, Inc., ARES), and the complex viscosity was determined by dividing by the angular frequency.
- Eight resin composition sheets from which the PET film was peeled were stacked, and a sheet having a layer thickness of 0.8 mm was used as a measurement sample. The measurement sample was sandwiched between 25 mm ⁇ disk-shaped measuring jigs and sheared at 80 ° C. for 10 seconds. Thereafter, the complex viscosity in the range of 20 ° C. to 200 ° C. was measured at a heating rate of 5 ° C./min, a frequency of 10 Hz. The lowest complex viscosity at 20 ° C. to 200 ° C. was evaluated as the lowest melt viscosity.
- the surface shape of the resin composition sheet was measured by a three-dimensional non-contact surface shape measurement system (Ryoka System Co., Ltd., MM3200). The surface shape was measured in a visual field range of 250 ⁇ m ⁇ 190 ⁇ m. Surface correction was performed on the measured image data using polynomial approximation as a second order, and the approximate surface was subtracted from the measured image data before the surface correction to obtain corrected image data. Thereby, the inclination of the surface height of the resin composition sheet was corrected.
- the area ratio of the portion higher than the threshold value was evaluated by bearing analysis using a value 0.5 ⁇ m lower than the average height (flat portion) as a binarization threshold value (threshold value). Thereby, the area ratio of the flat part was evaluated.
- a value obtained by subtracting the area ratio from 100% was evaluated as a concave area ratio. This measurement and operation were repeated 10 times on the sample at random, and the area ratio occupied by the recesses was averaged to obtain the recess occupation ratio of the sample. The results are shown in Table 1.
- ⁇ Metal base wiring board material> A 500 mm ⁇ 600 mm resin composition sheet from which PET has been peeled is sandwiched between a roughened surface side of a 550 mm ⁇ 650 mm copper foil (manufactured by Nippon Electrolytic Co., Ltd., 35 ⁇ m thickness) and a 500 mm ⁇ 600 mm aluminum substrate (A5052, 1 mmt). Then, using a vacuum press, under pressure of 2 MPa under a vacuum of 3 kPa, pressurizing and heating at 140 ° C. for 2 hours and 190 ° C. for 2 hours to obtain a metal base wiring board material.
- a vacuum press under pressure of 2 MPa under a vacuum of 3 kPa
- ⁇ Variation in thickness of thermally conductive insulating layer> The thickness variation of the heat conductive insulating layer was evaluated by the presence or absence of unevenness on the copper foil surface.
- the metal base wiring board material of an evaluation sample is enlarged with 500 mm x 600 mm, the dispersion
- the copper foil and aluminum substrate of the obtained metal base wiring board material were etched to obtain a thermally conductive insulating layer after the main curing.
- An aqueous ammonium persulfate solution was used for etching the copper foil.
- Hydrochloric acid was used for etching the aluminum substrate.
- the thermal conductivity of the obtained heat conductive insulating layer was determined as follows.
- the frequency dependence of the phase difference of a temperature wave was measured using the temperature wave thermal analyzer (the eye phase mobile 1u by the eye phase company).
- the slope of the phase difference with respect to the square root of the frequency was determined in the frequency range of 200 to 400 Hz.
- the gradient of this phase difference is equal to ⁇ d ( ⁇ / ⁇ ) 0.5. Therefore, the thermal diffusion coefficient ( ⁇ ) was obtained from the thickness (d) of the thermally conductive insulating layer and the gradient of the phase difference.
- specific heat was measured with a differential scanning calorimeter (DSC, manufactured by Perkin Elmer, Ryris 1), and density was measured with an electronic hydrometer (manufactured by Alpha Mirage, SD-200L).
- thermal conductivity [W / mK] thermal diffusivity (thermal diffusivity ( ⁇ )) [mm 2 / s] ⁇ specific heat [J / kg ⁇ K] ⁇ density [g / cm 3 ]
- Example 2 ⁇ Resin composition>
- alumina filler AS-20, manufactured by Showa Denko KK
- alumina filler having a particle diameter D50 of 20 ⁇ m as the alumina filler
- 10.73 g 11.9% (total mass of alumina filler) of Sumiko Random AA04
- 13.5 g of 2-butanone manufactured by Wako Pure Chemical Industries, Ltd.
- Example 2 In the same manner as in Example 1, a varnish-like resin composition 2 was prepared, and the viscosity was evaluated. Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- ⁇ Resin composition sheet with metal foil> The resin composition 2 obtained above was applied onto a roughened surface of a copper foil (manufactured by Nippon Electrolytic Co., Ltd., 35 ⁇ m) using a bar coater, and dried at 100 ° C. for 20 minutes. The film thickness after drying was 100 ⁇ m.
- a PET film manufactured by Teijin DuPont Films, A53
- a vacuum laminator manufactured by Meiki Seisakusho
- a vacuum press was performed for 2 seconds to obtain a resin composition sheet with metal foil (B stage sheet).
- the average thickness of the resin composition sheet in the resin composition sheet with metal foil was 100 ⁇ m.
- the obtained resin composition sheet with metal foil was evaluated for the recess occupancy rate in the same manner as in Example 1.
- Example 1 In the same manner as in Example 1, except that the resin composition sheet was sandwiched between a copper foil and an aluminum substrate, and the resin composition sheet side in the resin composition sheet with metal foil obtained was an aluminum substrate.
- the metal base wiring board material was produced by changing the contact with the substrate.
- the obtained metal base wiring board material was evaluated in the same manner as in Example 1 for variations in thickness of the thermally conductive insulating layer, peel strength, electrical insulating properties, and thermal conductivity. The evaluation results are shown in Table 1.
- a resin composition sheet (B stage sheet) was produced on the PET film in the same manner as in Example 1 except that the resin composition 2 was used.
- the obtained resin composition sheet was excellent in flexibility.
- the minimum melt viscosity of the obtained resin composition sheet was evaluated. The evaluation results are shown in Table 1.
- Example 3 In Example 1, 9.3 g of 2-butanone (manufactured by Wako Pure Chemical Industries, Ltd.) as a solvent and 5.32 g of the phenol resin obtained in Resin Synthesis Example 1 were added and stirred. Further, Example 1 was used except that 6.35 g of a bifunctional epoxy resin having a biphenyl skeleton (manufactured by Mitsubishi Chemical Corporation, YL6121H) and 0.706 g of naphthalene-based epoxy resin (manufactured by DIC Corporation, HP4032D) were used. Similarly, a varnish-like resin composition 3 was prepared, and the viscosity was evaluated. Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- Example 4 A varnish-like resin composition 4 was prepared in the same manner as in Example 1 except that 13.7 g of 2-butanone (manufactured by Wako Pure Chemical Industries, Ltd.) was added as a solvent in Example 1, and the viscosity was evaluated. .
- Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- Example 1 In the same manner as in Example 1, except that the resin composition 1 was changed to the resin composition 4, a resin composition sheet was produced.
- the obtained resin composition sheet was excellent in flexibility.
- the minimum melt viscosity and the recess occupation ratio were evaluated.
- a metal-based wiring board material was produced in place of the resin composition sheet obtained above, and the thickness variation, peel strength, electrical insulation, and thermal conductivity of the thermally conductive insulating layer were produced. The rate was evaluated. The evaluation results are shown in Table 1.
- Example 5 In Example 1, 9.3 g of 2-butanone (manufactured by Wako Pure Chemical Industries, Ltd.) as a solvent and 5.32 g of the phenol resin obtained in Resin Synthesis Example 1 were added and stirred. Further, Example 1 was used except that 6.35 g of a bifunctional epoxy resin having a biphenyl skeleton (manufactured by Mitsubishi Chemical Corporation, YL6121H) and 0.706 g of naphthalene-based epoxy resin (manufactured by DIC Corporation, HP4032D) were used. Similarly, a varnish-like resin composition 5 was prepared, and the viscosity was evaluated. Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- ⁇ Resin composition sheet> The resin composition 5 obtained above was applied on a PET film (manufactured by Teijin DuPont Films, A53) using a bar coater, and dried at 100 ° C. for 20 minutes. The film thickness after drying was 38 ⁇ m. Two resin composition sheets after drying are placed facing each other, laminated at 110 ° C., 0.3 MPa, feed rate 0.3 m / min using a roll laminator, and a resin composition sheet having an average thickness of 75 ⁇ m. (B stage sheet) was obtained. The obtained resin composition sheet was excellent in flexibility.
- Example 6 In Example 1, 9.3 g of 2-butanone (manufactured by Wako Pure Chemical Industries, Ltd.) as a solvent and 5.32 g of the phenol resin obtained in Resin Synthesis Example 1 were added and stirred. Further, Example 1 was used except that 6.35 g of a bifunctional epoxy resin having a biphenyl skeleton (manufactured by Mitsubishi Chemical Corporation, YL6121H) and 0.706 g of naphthalene-based epoxy resin (manufactured by DIC Corporation, HP4032D) were used. Similarly, a varnish-like resin composition 6 was prepared and the viscosity was evaluated. Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- ⁇ Resin composition sheet> The resin composition 6 obtained above was applied on a PET film (manufactured by Teijin DuPont Films, A53) using a bar coater, and dried at 100 ° C. for 20 minutes. The film thickness after drying was 63 ⁇ m. Two resin composition sheets after drying are placed facing each other, laminated at 110 ° C., 0.3 MPa, feed rate 0.3 m / min using a roll laminator, and a resin composition sheet having an average thickness of 125 ⁇ m. (B stage sheet) was obtained. The obtained resin composition sheet was excellent in flexibility.
- Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- Example 1 In the same manner as in Example 1, except that the resin composition 1 was changed to the resin composition 7, a resin composition sheet was produced.
- the obtained resin composition sheet was excellent in flexibility.
- the minimum melt viscosity and the recess occupation ratio were evaluated.
- a metal-based wiring board material was produced in place of the resin composition sheet obtained above, and the thickness variation, peel strength, electrical insulation, and thermal conductivity of the thermally conductive insulating layer were produced. The rate was evaluated. The evaluation results are shown in Table 1.
- ⁇ Resin composition sheet> The resin composition was applied on a polyethylene terephthalate (PET) film with an applicator so that the thickness after drying was 200 ⁇ m, and then allowed to stand at room temperature for 30 minutes to dry. After further drying at a temperature of 100 ° C. for 30 minutes, a hot press (press temperature 120 ° C., vacuum degree 1 kPa, press pressure 1 MPa, treatment time 1 minute) is performed in a vacuum press, and a resin composition having an average thickness of 200 ⁇ m A product resin sheet (B stage sheet) was obtained. With respect to the obtained resin composition sheet, the minimum melt viscosity and the recess occupation ratio were evaluated in the same manner as in Example 1.
- ⁇ Metal base wiring board material> A 500 mm ⁇ 600 mm resin composition sheet from which PET has been peeled is sandwiched between a roughened surface side of a 550 mm ⁇ 650 mm copper foil (manufactured by Nippon Electrolytic Co., Ltd., 35 ⁇ m thickness) and a 500 mm ⁇ 600 mm aluminum substrate (A5052, 1 mmt). Then, using a vacuum press, it was heated under pressure at 150 ° C. for 5 minutes at 4 MPa under a vacuum of 3 kPa. Subsequently, it heated at 140 degreeC for 2 hours and 190 degreeC for 2 hours on atmospheric pressure conditions, and obtained the metal base wiring board material. In the obtained metal base wiring board material, evaluation of the variation in the thickness of the thermally conductive insulating layer, peel strength, electrical insulation, and thermal conductivity was performed in the same manner as in Example 1. The evaluation results are shown in Table 1.
- Example 1 In Example 1, except that 18.2 g of 2-butanone (manufactured by Wako Pure Chemical Industries, Ltd.) was added as a solvent, a varnish-like resin composition 9 was prepared and its viscosity was evaluated in the same manner as in Example 1. .
- Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- Example 1 In the same manner as in Example 1, except that the resin composition 1 was changed to the resin composition 9, a resin composition sheet was produced.
- the obtained resin composition sheet was excellent in flexibility.
- the minimum melt viscosity and the recess occupation ratio were evaluated.
- a metal-based wiring board material was produced in place of the resin composition sheet obtained above, and the thickness variation, peel strength, electrical insulation, and thermal conductivity of the thermally conductive insulating layer were produced. The rate was evaluated. The evaluation results are shown in Table 1.
- Example 2 a varnish-like resin composition 10 was prepared and the viscosity was evaluated in the same manner as in Example 2 except that 19.3 g of 2-butanone (manufactured by Wako Pure Chemical Industries, Ltd.) was added as a solvent. .
- Table 1 shows the particle diameter D50 of each blended insulating inorganic filler and the weight ratio with respect to the total mass of the insulating inorganic filler.
- Example 1 the resin composition 1 was changed into the resin composition 10, and the resin composition sheet was produced.
- the obtained resin composition sheet was excellent in flexibility.
- the minimum melt viscosity and the recess occupation ratio were evaluated.
- a metal-based wiring board material was produced in place of the resin composition sheet obtained above, and the thickness variation, peel strength, electrical insulation, and thermal conductivity of the thermally conductive insulating layer were produced. The rate was evaluated. The evaluation results are shown in Table 1.
- the resin composition sheet in the present invention uses a resin other than the resin used in the above-mentioned examples as the thermosetting resin, the occupation ratio of the concave portion having a maximum depth of 0.5 ⁇ m or more on the surface is an area. A similar effect can be obtained if the resin composition sheet has a rate of 4% or less.
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Abstract
Description
そのため、高い熱伝導率と高い電気絶縁性を有する樹脂組成物が、熱伝導性封止材や熱伝導性接着剤として実用化されてきている。
上記に関連して、特開2008-13759号公報には、液晶性を示すエポキシ樹脂と絶縁性無機フィラーとを含むエポキシ樹脂組成物が開示され、高い熱伝導率と優れた加工性を有するとされている。
本発明は、熱伝導率及び電気絶縁性に優れる樹脂硬化物を形成可能な樹脂組成物シート、金属箔付樹脂組成物シート、ならびにこれらを用いて形成されるメタルベース配線板材料、メタルベース配線板、及びLED光源部材を提供することを課題とする。
<1> 熱硬化性樹脂と、フェノール樹脂と、絶縁性無機フィラーとを含み、
表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下である樹脂組成物シート。
前記樹脂組成物は、粘度が1000mPa・s以上10000mPa・s以下であり、
前記樹脂組成物を支持基材上に塗布して形成されてなる前記<1>~<5>のいずれか1項に記載の樹脂組成物シート。
表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下である樹脂組成物シート。
金属基板と、
前記金属箔と前記金属基板との間に、前記<1>~<8>のいずれか1項に記載の樹脂組成物シートの硬化物である熱伝導性絶縁層と、
を有するメタルベース配線板材料。
金属基板と、
前記配線層と前記金属基板との間に、前記<1>~<8>のいずれか1項に記載の樹脂組成物シートの硬化物である熱伝導性絶縁層と、
を有するメタルベース配線板。
また本明細書において「~」を用いて示された数値範囲は、「~」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。
本発明の第一の樹脂組成物シートは、熱硬化性樹脂と、フェノール樹脂と、絶縁性無機フィラーを含み、樹脂組成物シートの表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下の樹脂組成物シートである。
本発明の第二の樹脂組成物シートは、20℃~200℃での最低溶融粘度が、10~1000Pa・sであり、表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下である樹脂組成物シートである。
これに対して本発明の樹脂組成物シートでは、表面において、最大深さ0.5μm以上である凹部の占有率を面積率で4%以下にすることで、樹脂の流動性を向上させなくても凹部が十分に充填され、絶縁破壊電圧が向上できる。さらに、メタルベース配線板材料の面内の厚みばらつきや、樹脂組成物の流れ出しによる作業性低下の問題も解消できる。
金属箔、配線層、又は金属基板等が貼合された後の金属箔付樹脂組成物シート、メタルベース配線板材料、又はメタルベース配線板等において、樹脂組成物シート表面の凹部の占有率を測定するには、金属箔、配線層、又は金属基板等が剥離できる場合は、剥離した後の樹脂組成物シート表面の凹部を観測し、上記式により求める。金属箔、配線層、又は金属基板等が剥離できない場合は、断面の観察により凹部の占有率を評価することができる。この場合、断面の観察を行った範囲の総長さに対する、観察された界面気泡の幅の長さの総和の比率の2乗を凹部占有率(%)とする。
(2)においては、樹脂組成物の粘度を塗工に適した粘度に低下させるために、溶媒等を添加することが好ましい。溶媒添加量を適正量以下とする場合には、溶媒等の揮発による凹部の発生が抑えられる。
しかしながら、本発明はこれらの方法に限定されない。
本発明の第一の樹脂組成物シートは、熱硬化性樹脂と、フェノール樹脂と、絶縁性無機フィラーとを含む樹脂組成物から形成される。本発明の樹脂組成物シートは、さらに必要に応じて、その他の成分を含んでもよい。
本発明の樹脂組成物シートは、熱硬化性樹脂の少なくとも1種を含む。前記熱硬化性樹脂としては、熱硬化性を有する樹脂であれば特に制限はなく、通常用いられる熱硬化性樹脂を用いることができる。熱硬化性樹脂として具体的には例えば、エポキシ系樹脂、ポリイミド系樹脂、ポリアミドイミド系樹脂、トリアジン系樹脂、フェノール系樹脂、メラミン系樹脂、ポリエステル系樹脂、シアネートエステル系樹脂、及びこれら樹脂の変性系などを挙げることができる。これらの樹脂は1種単独で用いても、2種類以上を併用してもよい。
前記ビフェニル型エポキシ樹脂としては、下記一般式(III)で表されるエポキシ樹脂等を用いることが好ましい。
はYX-4000(ジャパンエポキシレジン株式会社製)、YL-6121H(ジャパンエポキシレジン株式会社製)、YSLV-80XY(東都化成株式会社製)等が市販品として入手可能である。
本発明におけるビフェニル骨格を有する2官能エポキシ樹脂としては、熱伝導率、電気絶縁性及び後述するBステージシートの可とう性の観点から、前記一般式(III)又は一般式(IV)で表される化合物の少なくとも1種を含むことが好ましく、一般式(III)で表される化合物の少なくとも1種を含むことがより好ましい。
本発明の樹脂組成物シートは、フェノール樹脂の少なくとも1種を含有する。前記フェノール樹脂として、下記一般式(I)で表される構造単位を有する化合物の少なくとも1種を含むフェノール樹脂(以下、「ノボラック樹脂」ということがある)を含むことが好ましい。前記フェノール樹脂は、例えば、エポキシ樹脂の硬化剤として作用する。
特定の構造を有するフェノール樹脂を含むことで、熱伝導率が効果的に向上し、さらに硬化前の状態における可使時間を十分に長くすることができる。
ことが好ましい。
また本発明の樹脂組成物シートにおける前記フェノール樹脂の含有比率としては、特に制限はないが、熱伝導率、電気絶縁性、Bステージシートの可とう性及び可使時間の観点から、1質量%~15質量%であることが好ましく、2質量%~10質量%であることがより好ましい。
本発明の樹脂組成物シートに含まれる絶縁性無機フィラーは、絶縁性の無機フィラーであれば特に制限されない。好ましくは、1W/mK以上の熱伝導率を有するものであり、具体的には、二酸化ケイ素、酸化アルミニウム、酸化マグネシウム、酸化ベリリウム、窒化ホウ素、窒化アルミニウム、窒化ケイ素、炭化ケイ素、フッ化アルミニウム、又はフッ化カルシウムから選択される。これらのうち、一種又は二種以上を混合して用いてもよい。
さらに好ましくは、10W/mK以上の熱伝導率を有する無機セラミックであり、具体的には、酸化アルミニウム、酸化マグネシウム、窒化ホウ素、窒化アルミニウム、窒化ケイ素、炭化ケイ素、又はフッ化アルミニウムから選択される。
そのなかでも、1016Ωcm以上の体積抵抗率を有する、酸化アルミニウム(アルミナ)がより好ましい。
これらは、一種単独で、又は二種以上を混合して用いてもよい。
尚、樹脂組成物シート中の固形分とは、樹脂組成物シートを構成する成分から揮発性の成分を除去した残分を意味する。
本発明の樹脂組成物シートは上記必須成分に加えて、必要に応じてその他の成分を含んでいてもよい。その他の成分としては例えば、溶剤、シランカップリング剤、分散剤、沈降防止剤等を挙げることができる。
本発明では、樹脂組成物を用いて樹脂組成物シートを形成してもよい。樹脂組成物は、前記熱硬化性樹脂と、前記フェノール樹脂と、前記絶縁性無機フィラーとを含む。この樹脂組成物は、絶縁性無機フィラーを充填しているため、基材上に樹脂組成物を付与する時の絶縁性無機フィラーの挙動が、前述の凹部占有率に影響する。
本発明の樹脂組成物シートは、半硬化状態(Bステージ)のシート状物である。この半硬化状態(Bステージ)の樹脂組成物シートが、配線板材料や配線板中に用いられ本硬化されると、熱伝導性絶縁層となる。
樹脂組成物シートの最低溶融粘度は、BステージからCステージとする加圧加熱工程での樹脂組成物の流動性に影響する。そのため、加圧加熱工程で加えられる温度範囲20℃~200℃における最低溶融粘度を調整することが、取り扱い性や、端部からの樹脂組成物シートの流出を押さえる観点から望ましい。
ずり粘弾性を測定する条件の例として、昇温速度5℃/min(プレスの昇温速度)、周波数1~10Hzが挙げられ、シートをはさむ測定冶具は円形の平板が挙げられる。サンプルは、必要に応じて樹脂組成物シートを積層したものを用いてもよい。
金属箔付き樹脂組成物シートは、前記の樹脂組成物シートに金属箔を貼付したものである。より具体的には、樹脂組成物シートに金属箔をラミネータやプレス機等を用いて公知の方法で貼り合せ、金属箔付き樹脂組成物シートを作製することができる。また、金属箔付き樹脂組成物シートは、金属箔を基材として樹脂組成物を付与して塗工物を形成し、半硬化状態(Bステージ)まで加熱することで作製することができる。
このような界面気泡の発生を抑えるには、本発明の樹脂組成物シート、つまり、熱硬化性樹脂と、フェノール樹脂と、絶縁性無機フィラーとを含み、表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下である第一の樹脂組成物シート、又は、20℃~200℃での最低溶融粘度が、10~1000Pa・sであり、表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下である第二の樹脂組成物シート、を用いることが有効であることが見出された。なお、本発明の樹脂組成物シートは、勿論、金属基板を付設する場合にも界面気泡の発生を効果的に抑制する。
熱伝導性絶縁層は、後述のメタルベース配線板やメタルベース配線板材料において、金属基板と配線層又は金属箔との間を絶縁させる接着層である。前記樹脂組成物シート(Bステージ)を本硬化(Cステージ化)して熱伝導性絶縁層(Cステージ)とする。
具体的には、金属基板と金属箔の間に前述の樹脂組成物シートを挟み、プレス機等で加圧加熱することにより、金属基板と金属箔とを接着させる。半硬化状態(Bステージ)である前記樹脂組成物シートは、加圧加熱工程で再溶融し、金属基板及び金属箔に樹脂組成物シートが密着し、その後、樹脂組成物シートを本硬化(Cステージ化)して熱伝導性絶縁層(Cステージ)となり、金属基板と金属箔とが接着される。本硬化した後の熱伝導性絶縁層は、加熱によって溶融することはない。
図1に、本発明のメタルベース配線板材料の一例の断面構造を示す。
メタルベース配線板材料は、金属箔30と、金属基板20とを有し、金属箔30と金属基板20との間に、前記樹脂組成物シートの硬化物である熱伝導性絶縁層10を備える。熱伝導性絶縁層10の配置により金属基板20と金属箔30は絶縁される。
ウム、強度を優先する場合は鉄、というように目的を応じて材質を選定してもよい。
メタルベース配線板を大きなサイズで作製した後、電子部品実装後に使用するサイズにカットすることが生産性を高めるために好ましい。そのため、金属基板20はカットするための加工性が高いことが望ましい。
図2に、本発明のメタルベース配線板の一例の断面構造を示す。
メタルベース配線板は、金属基板20と配線層40とを有し、金属基板20と配線層40との間に、前記樹脂組成物シートの硬化物である熱伝導性絶縁層10を備える。熱伝導性絶縁層10の配置により金属基板20と配線層40は絶縁される。
図3に、電子部品としてLEDパッケージを用いたときのLED光源部材の断面構造を示す。図3に示すLED光源部材では、金属基板20と配線層40との間に熱伝導性絶縁層10を備え、配線層40に電子部品50が搭載される。このLED光源機器を用いて、LEDバックライトユニット等が作製でき、あるいはLED電灯やLED電球等を作製することができる。
<樹脂合成例1>
撹拌機、冷却器、温度計を備えた3Lのセパラブルフラスコにレゾルシノール594g、カテコール66g、37%ホルマリン316.2g、シュウ酸15g、水100gを入れ、オイルバスで加温しながら100℃に昇温した。還流温度で4時間反応を続けた。
その後水を留去しながら、フラスコ内の温度を170℃に昇温した。170℃を保持しながら8時間反応を続けた。その後減圧下、20分間濃縮を行い系内の水等を除去して、一般式(I)で表される構造単位を有するフェノール樹脂を取り出した。得られたフェノール樹脂の数平均分子量は530、重量平均分子量は930であった。またフェノール樹脂のフェノール当量は65g/eq.であった。
ポリプロピレン製の1L蓋付き容器中に、粒子径D50が18μmである絶縁性無機フィラー(住友化学株式会社製、スミコランダムAA18)を56.80g(63%(対絶縁性無機フィラー総質量))と、粒子径D50が3μmである絶縁性無機フィラー(住友化学株式会社製、スミコランダムAA3)を20.29g(22.5%(対絶縁性無機フィラー総質量))と、粒子径D50が0.4μmである絶縁性無機フィラー(住友化学株式会社製、スミコランダムAA04)を13.07g(14.5%(対絶縁性無機フィラー総質量))と、を秤量し、シランカップリング剤(信越化学工業株式会社製、KBM403)を0.099g、溶剤として2-ブタノン(和光純薬株式会社製)を11.18g、分散剤(楠本化成株式会社製、ED-113)を0.180g、上記樹脂合成例1で得られたフェノール樹脂を5.96g加えて攪拌した。さらにビフェニル骨格を有する2官能エポキシ樹脂(三菱化学株式会社製、YL6121H)を5.914g、ナフタレン系エポキシ樹脂(DIC株式会社製、HP4032D)を0.657g、イミダゾール化合物(四国化成工業株式会社製、2PHZ)を0.012g加えた。さらに、直径5mmのジルコニア製ボールを500g投入し、ボールミル架台上で100rpmで48時間攪拌した後、ジルコニア製ボールを濾別し、ワニス状の樹脂組成物1を得た。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
ワニス状の樹脂組成物1の25℃での粘度をB型粘度計(スピンドルNo4、回転数30rpm)にて測定した。測定結果を表1に示した。
上記で得られた樹脂組成物1を、バーコーターを用いて、PETフィルム(帝人デュポンフィルム社製、A53)上に塗布し、100℃で20分間乾燥を行なった。乾燥後の膜厚は50μmであった。乾燥後の樹脂組成物シートを向かい合わせに2枚載置し、ロールラミネーターを用い、110℃、0.3MPa、送り速度0.3m/minにて積層し、平均厚さ100μmの樹脂組成物シート(Bステージシート)を得た。得られた樹脂組成物シートは可とう性に優れていた。
また、樹脂組成物シート中における全絶縁性無機フィラーが占める割合を以下のように評価した。まず、樹脂組成物シートの重量を測定し、その樹脂組成物シートを400℃2時間次いで700℃3時間焼成し、樹脂分を蒸発させ、残存した絶縁性無機フィラーの質量を測定することで、絶縁性無機フィラーの樹脂組成物シート中の重量比を評価した。次いで、その絶縁性無機フィラーを水中に沈めて、水位の変化から絶縁性無機フィラーの体積を測定した。これより、絶縁性無機機フィラーの比重を評価した。次いで、同様の方法で樹脂組成物シートの比重を評価した。次いで、樹脂シート中の絶縁性無機フィラーの重量比を絶縁性無機フィラーの比重で除し、さらに樹脂シートの比重を積算した値を絶縁性無機フィラーの体積比率として評価した。評価結果を表1に示す。
動的粘弾性装置(Rheometric Scientific,Inc.製、ARES)により、樹脂組成物シートの複素弾性率の温度依存性を測定し、角周波数で除すことで複素粘度を求めた。
PETフィルムをはく離した樹脂組成物シートを8枚重ね、層厚み0.8mmのシートを測定サンプルとした。測定サンプルを25mmφの円板状の測定冶具ではさみ、80℃で10秒間、ずり動作を行った。その後、昇温速度5℃/min、周波数10Hz、20℃から200℃の範囲の複素粘度を測定した。20℃~200℃での複素粘度の最低値を最低溶融粘度として評価した。
樹脂組成物シートの表面形状を三次元非接触表面形状計測システム(菱化システム社製、MM3200)により測定した。250μm×190μmの視野範囲にて表面形状の測定を行った。測定画像データに対して多項式近似を2次とした面補正を行い、かつ、面補正前の測定画像データから近似面を差し引き、補正後の画像データを得た。これにより、樹脂組成物シートの表面高さの傾きが補正された。次いで、平均高さ(平坦部)よりも0.5μm低い値を二値化しきい値(閾値)としたベアリング解析により、しきい値(閾値)よりも高い部分の面積率を評価した。これにより、平坦部の面積率を評価した。次いで、前記面積率を100%から差し引いた値を、凹部面積率として評価した。この測定および操作を、試料に対して無作為に10回繰り返し、凹部の占める面積率を平均して、その試料の凹部占有率とした。その結果を表1に示した。
PETを剥離した500mm×600mmの樹脂組成物シートを550mm×650mmの銅箔(日本電解社製、35μm厚)の粗化面側と500mm×600mmのアルミ基板(A5052、1mmt)の間に挟んで、真空加圧プレスを用い、3kPaの真空下で2MPa加圧にて、140℃で2時間、190℃で2時間加圧加熱し、メタルベース配線板材料を得た。
熱伝導性絶縁層の厚さばらつきを、銅箔面の凹凸の有無により評価した。なお、評価サンプルのメタルベース配線板材料を500mm×600mmと大きくすると、熱伝導性絶縁層のばらつきは、銅箔面の凹凸として現れる。
JIS-C6481(1996年度版)に準拠して、作製したアルミベース基板を用いて90°ピールの試験片を作製した。金属基板を25mm × 100mmに切り出し、中心10mm幅で残した銅箔(35μm)を、テンシロン引張試験機(オリエンテック社製 TM-100)を用いて常温で50mm/minの速度で90°の方向に引き剥がし多時の平均荷重から、ピール強度を測定した。
得られたメタルベース配線板材料の銅箔を20mmφの丸型パターンを残し、過硫酸アンモニウム水溶液によりエッチングした。耐電圧測定装置(Tokyo TOA Electronics Ltd. Japan製、Puncture Tester PT-1011)により、50個以上の丸型パターンの絶縁破壊電圧を測定した。最も低かった絶縁破壊電圧を表1に示した。
得られたメタルベース配線板材料の銅箔とアルミ基板をエッチングし、本硬化後の熱伝導性絶縁層を得た。銅箔のエッチングには過流酸アンモニウム水溶液を用いた。アルミ基板のエッチングには塩酸を用いた。得られた熱伝導性絶縁層の熱伝導率を次のようにして求めた。
次いで、比熱を示差走査熱量計(DSC、Perkin Elmer社製、Ryris 1)にて測定し、密度を電子比重計(アルファーミラージュ社製、SD-200L)にて測定した。そして、熱伝導率[W/mK]を次式から求めた。得られた熱伝導率を表1に示した。
熱伝導率[W/mK] = 熱拡散率(熱拡散係数(α))[mm2/s]×比熱[J/kg・K]×密度[g/cm3]
<樹脂組成物>
実施例1において、アルミナフィラーとして、粒子径D50が20μmであるアルミナフィラー(昭和電工株式会社製、AS-20)を62.66g(69.5%(対アルミナフィラー総質量))と、粒子径D50が3μmであるアルミナフィラー(住友化学製、スミコランダムAA3)を16.77g(18.6%(対アルミナフィラー総質量))と、粒子径D50が0.4μmであるアルミナフィラー(住友化学製、スミコランダムAA04)を10.73g(11.9%(対アルミナフィラー総質量))と、溶剤として2-ブタノン(和光純薬株式会社製)を13.5g、を用いたこと以外は実施例1と同様にして、ワニス状の樹脂組成物2を調製し、粘度を評価した。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
上記で得られた樹脂組成物2を、バーコーターを用いて、銅箔(日本電解社製、35μm)の粗化面上に塗布し、100℃で20分間乾燥を行なった。乾燥後の膜厚は100μmであった。乾燥後の樹脂層上にPETフィルム(帝人デュポンフィルム社製、A53)を載置し、次いで真空ラミネータ(名機製作所社製)を用い、3kPa以下の真空下、130℃、1MPa加圧において15秒間真空プレスを行って、金属箔付樹脂組成物シート(Bステージシート)を得た。金属箔付樹脂組成物シートにおける樹脂組成物シートの平均厚さは100μmであった。
得られた金属箔付樹脂組成物シートは、実施例1と同様の方法で、凹部占有率の評価を行った。
得られたメタルベース配線板材料は、実施例1と同様の方法で、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を行った。評価結果を表1に示した。
実施例1において、溶剤として2-ブタノン(和光純薬株式会社製)を9.3g、上記樹脂合成例1で得られたフェノール樹脂を5.32g加えて攪拌した。さらにビフェニル骨格を有する2官能エポキシ樹脂(三菱化学株式会社製、YL6121H)を6.35g、ナフタレン系エポキシ樹脂(DIC株式会社製、HP4032D)を0.706g、を用いたこと以外は実施例1と同様にして、ワニス状の樹脂組成物3を調製し、粘度を評価した。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
上記で得られた樹脂組成物3に代えた以外は実施例1と同様にして、2枚重ね合わせて作製した脂組成物シート(Bステージシート)を得た。得られた樹脂組成物シートは可とう性に優れていた。得られた樹脂組成物シートについて、実施例1と同様の方法で、最低溶融粘度と凹部占有率の評価を行った。
また、実施例1と同様にして、但し、樹脂組成物シートを、上記得られた樹脂組成物シートに変えて、メタルベース配線板材料を作製した。得られたメタルベース配線板材料において、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を、実施例1と同様の方法で行った。評価結果を表1に示した。
実施例1において、溶剤として2-ブタノン(和光純薬株式会社製)を13.7g加えたこと以外は実施例1と同様にして、ワニス状の樹脂組成物4を調製し、粘度を評価した。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
更に、実施例と同様にして、上記得られた樹脂組成物シートに変えてメタルベース配線板材料を作製し、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を行った。評価結果を表1に示した。
実施例1において、溶剤として2-ブタノン(和光純薬株式会社製)を9.3g、上記樹脂合成例1で得られたフェノール樹脂を5.32g加えて攪拌した。さらにビフェニル骨格を有する2官能エポキシ樹脂(三菱化学株式会社製、YL6121H)を6.35g、ナフタレン系エポキシ樹脂(DIC株式会社製、HP4032D)を0.706g、を用いたこと以外は実施例1と同様にして、ワニス状の樹脂組成物5を調製し、粘度を評価した。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
上記で得られた樹脂組成物5を、バーコーターを用いて、PETフィルム(帝人デュポンフィルム社製、A53)上に塗布し、100℃で20分間乾燥を行なった。乾燥後の膜厚は38μmであった。乾燥後の樹脂組成物シートを向かい合わせに2枚載置し、ロールラミネーターを用い、110℃、0.3MPa、送り速度0.3m/minにて積層し、平均厚さ75μmの樹脂組成物シート(Bステージシート)を得た。得られた樹脂組成物シートは可とう性に優れていた。
また、実施例1と同様にして、但し、樹脂組成物シートを、上記得られた樹脂組成物シートに変えて、メタルベース配線板材料を作製した。得られたメタルベース配線板材料において、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を、実施例1と同様の方法で行った。評価結果を表1に示した。
実施例1において、溶剤として2-ブタノン(和光純薬株式会社製)を9.3g、上記樹脂合成例1で得られたフェノール樹脂を5.32g加えて攪拌した。さらにビフェニル骨格を有する2官能エポキシ樹脂(三菱化学株式会社製、YL6121H)を6.35g、ナフタレン系エポキシ樹脂(DIC株式会社製、HP4032D)を0.706g、を用いたこと以外は実施例1と同様にして、ワニス状の樹脂組成物6を調製し、粘度を評価した。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
上記で得られた樹脂組成物6を、バーコーターを用いて、PETフィルム(帝人デュポンフィルム社製、A53)上に塗布し、100℃で20分間乾燥を行なった。乾燥後の膜厚は63μmであった。乾燥後の樹脂組成物シートを向かい合わせに2枚載置し、ロールラミネーターを用い、110℃、0.3MPa、送り速度0.3m/minにて積層し、平均厚さ125μmの樹脂組成物シート(Bステージシート)を得た。得られた樹脂組成物シートは可とう性に優れていた。
また、実施例1と同様にして、但し、樹脂組成物シートを、上記得られた樹脂組成物シートに変えて、メタルベース配線板材料を作製した。得られたメタルベース配線板材料において、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を、実施例1と同様の方法で行った。評価結果を表1に示した。
更に、実施例と同様にして、上記得られた樹脂組成物シートに変えてメタルベース配線板材料を作製し、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を行った。評価結果を表1に示した。
樹脂組成物について、アプリケータでポリエチレンテレフタレート(PET)フィルム上に乾燥後厚みが200μmとなるように塗布した後、30分室温で放置し、乾燥させた。温度100℃で、30分間更に乾燥させた後、真空プレスにて熱間加圧(プレス温度120℃、真空度1kPa、プレス圧1MPa、処理時間1分)を行い、平均厚さ200μmの樹脂組成物樹脂シート(Bステージシート)を得た。得られた樹脂組成物シートについて、実施例1と同様の方法で、最低溶融粘度と凹部占有率の評価を行った。
PETを剥離した500mm×600mmの樹脂組成物シートを550mm×650mmの銅箔(日本電解社製、35μm厚)の粗化面側と500mm×600mmのアルミ基板(A5052、1mmt)の間に挟んで、真空加圧プレスを用い、3kPaの真空下で4MPa加圧にて、150℃で5分間加圧加熱した。次いで、大気圧条件下にて140℃で2時間、190℃で2時間加熱し、メタルベース配線板材料を得た。
得られたメタルベース配線板材料において、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を、実施例1と同様の方法で行った。評価結果を表1に示した。
実施例1において、溶剤として2-ブタノン(和光純薬株式会社製)を18.2g加えたこと以外は実施例1と同様にして、ワニス状の樹脂組成物9を調製し、粘度を評価した。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
更に、実施例と同様にして、上記得られた樹脂組成物シートに変えてメタルベース配線板材料を作製し、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を行った。評価結果を表1に示した。
実施例2において、溶剤として2-ブタノン(和光純薬株式会社製)を19.3g加えたこと以外は実施例2と同様にして、ワニス状の樹脂組成物10を調製し、粘度を評価した。配合した各々の絶縁性無機フィラーの粒子径D50と絶縁性無機フィラー総質量に対する重量比を表1に示す。
更に、実施例と同様にして、上記得られた樹脂組成物シートに変えてメタルベース配線板材料を作製し、熱伝導性絶縁層の厚さのばらつき、ピール強度、電気絶縁性、及び熱伝導率の評価を行った。評価結果を表1に示した。
Claims (12)
- 熱硬化性樹脂と、フェノール樹脂と、絶縁性無機フィラーとを含み、
表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下である樹脂組成物シート。 - 20℃~200℃での最低溶融粘度が、10~1000Pa・sである請求項1に記載の樹脂組成物シート。
- 前記絶縁性無機フィラーが、40vol%以上82vol%以下で含有される請求項1又は請求項2に記載の樹脂組成物シート。
- 前記絶縁性無機フィラーが、酸化アルミニウム、酸化マグネシウム、窒化ホウ素、窒化アルミニウム、窒化ケイ素、炭化ケイ素、及びフッ化アルミニウムのフィラーからなる群より選択される少なくとも一種のフィラーである請求項1~請求項5のいずれか1項に記載の樹脂組成物シート。
- 前記熱硬化性樹脂と、前記フェノール樹脂と、前記絶縁性無機フィラーとを含む樹脂組成物から形成されてなり、
前記樹脂組成物は、粘度が1000mPa・s以上10000mPa・s以下であり、
前記樹脂組成物を支持基材上に塗布して形成されてなる請求項1~請求項95のいずれか1項に記載の樹脂組成物シート。 - 20℃~200℃での最低溶融粘度が、10Pa・s~1000Pa・sであり、
表面における、最大深さ0.5μm以上である凹部の占有率が、面積率で4%以下である樹脂組成物シート。 - 平均厚みが、20μm以上500μm以下である請求項1~請求項87のいずれか1項に記載の樹脂組成物シート。
- 請求項1~請求項8のいずれか1項に記載の樹脂組成物シートと、金属箔と、を有する金属箔付樹脂組成物シート。
- 金属箔と、
金属基板と、
前記金属箔と前記金属基板との間に、請求項1~請求項8のいずれか1項に記載の樹脂組成物シートの硬化物である熱伝導性絶縁層と、
を有するメタルベース配線板材料。 - 配線層と、
金属基板と、
前記配線層と前記金属基板との間に、請求項1~請求項8のいずれか1項に記載の樹脂組成物シートの硬化物である熱伝導性絶縁層と、
を有するメタルベース配線板。 - 請求項1~請求項8のいずれか1項に記載の樹脂組成物シート、請求項9に記載の金属箔付樹脂組成物シート、請求項10に記載のメタルベース配線板材料、又は請求項11のメタルベース配線板、のいずれか1つを用いて形成されたLED光源部材。
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013147589A (ja) * | 2012-01-20 | 2013-08-01 | Nitto Denko Corp | 電子部品封止用樹脂組成物シートおよびそれを用いた電子部品装置の製法 |
JP2013234313A (ja) * | 2011-11-02 | 2013-11-21 | Hitachi Chemical Co Ltd | エポキシ樹脂組成物、その半硬化体および硬化体、並びにそれを用いた樹脂シート、プリプレグ、積層板、金属基板、プリント配線板、およびパワー半導体装置 |
JP2015232116A (ja) * | 2014-05-15 | 2015-12-24 | Tdk株式会社 | 無機フィラー含有エポキシ樹脂硬化物およびこれを用いた積層板 |
JP2017512887A (ja) * | 2014-02-24 | 2017-05-25 | ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング | 熱伝導性プリアプライアンダーフィル組成物およびその使用 |
JPWO2016093248A1 (ja) * | 2014-12-08 | 2017-09-21 | 日立化成株式会社 | エポキシ樹脂組成物、樹脂シート、プリプレグ、樹脂付金属箔、金属基板、及びパワー半導体装置 |
WO2019054486A1 (ja) * | 2017-09-15 | 2019-03-21 | 東洋インキScホールディングス株式会社 | 熱伝導性絶縁シートおよび複合部材 |
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EP4498407A4 (en) * | 2022-03-22 | 2025-07-09 | Nhk Spring Co Ltd | LAMINATE MANUFACTURING PROCESS |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105453707B (zh) * | 2013-08-14 | 2018-07-06 | 电化株式会社 | 氮化硼-树脂复合体电路基板、氮化硼-树脂复合体散热板一体型电路基板 |
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006124434A (ja) * | 2004-10-26 | 2006-05-18 | Matsushita Electric Works Ltd | エポキシ樹脂無機複合シート及び成形品 |
JP2007262398A (ja) * | 2006-03-01 | 2007-10-11 | Hitachi Chem Co Ltd | エポキシ樹脂組成物及び電子部品装置 |
JP2009117598A (ja) * | 2007-11-06 | 2009-05-28 | Denki Kagaku Kogyo Kk | 回路基板とそれを用いた半導体装置 |
JP2010132890A (ja) * | 2008-10-28 | 2010-06-17 | Hitachi Chem Co Ltd | 接着シート及びこれを用いた半導体装置の製造方法 |
JP2011090868A (ja) * | 2009-10-22 | 2011-05-06 | Denki Kagaku Kogyo Kk | 絶縁シート、回路基板及び絶縁シートの製造方法 |
WO2012002546A1 (ja) * | 2010-07-02 | 2012-01-05 | 日立化成工業株式会社 | Bステージシート、樹脂付金属箔、金属基板、及びled基板 |
JP2012031401A (ja) * | 2010-07-02 | 2012-02-16 | Hitachi Chem Co Ltd | 樹脂組成物、bステージシート、樹脂付金属箔、金属基板及びled基板 |
JP2012031402A (ja) * | 2010-07-02 | 2012-02-16 | Hitachi Chem Co Ltd | 樹脂組成物、bステージシート、樹脂付金属箔、金属基板及びled基板 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001055425A (ja) * | 1999-06-10 | 2001-02-27 | Nippon Kayaku Co Ltd | レゾルシンノボラック樹脂、エポキシ樹脂組成物及びその硬化物 |
JP4474113B2 (ja) * | 2003-04-07 | 2010-06-02 | 日立化成工業株式会社 | 封止用固形エポキシ樹脂成形材料及び半導体装置 |
JP2008013759A (ja) * | 2006-06-07 | 2008-01-24 | Sumitomo Chemical Co Ltd | エポキシ樹脂組成物及びエポキシ樹脂硬化物 |
JP2009117336A (ja) * | 2007-10-18 | 2009-05-28 | Hitachi Chem Co Ltd | 電気機器絶縁用エポキシ樹脂組成物及び電気機器 |
US8318292B2 (en) * | 2008-03-26 | 2012-11-27 | Sumitomo Bakelite Co., Ltd. | Resin sheet with copper foil, multilayer printed wiring board, method for manufacturing multilayer printed wiring board and semiconductor device |
TWI499690B (zh) * | 2009-03-13 | 2015-09-11 | Ajinomoto Kk | Paste metal laminates |
-
2012
- 2012-01-20 JP JP2012554771A patent/JP5904126B2/ja not_active Expired - Fee Related
- 2012-01-20 CN CN201280006296.7A patent/CN103328548B/zh not_active Expired - Fee Related
- 2012-01-20 WO PCT/JP2012/051263 patent/WO2012102212A1/ja active Application Filing
- 2012-01-20 KR KR1020137019050A patent/KR101929067B1/ko not_active Expired - Fee Related
- 2012-01-30 TW TW101102876A patent/TWI455969B/zh not_active IP Right Cessation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006124434A (ja) * | 2004-10-26 | 2006-05-18 | Matsushita Electric Works Ltd | エポキシ樹脂無機複合シート及び成形品 |
JP2007262398A (ja) * | 2006-03-01 | 2007-10-11 | Hitachi Chem Co Ltd | エポキシ樹脂組成物及び電子部品装置 |
JP2009117598A (ja) * | 2007-11-06 | 2009-05-28 | Denki Kagaku Kogyo Kk | 回路基板とそれを用いた半導体装置 |
JP2010132890A (ja) * | 2008-10-28 | 2010-06-17 | Hitachi Chem Co Ltd | 接着シート及びこれを用いた半導体装置の製造方法 |
JP2011090868A (ja) * | 2009-10-22 | 2011-05-06 | Denki Kagaku Kogyo Kk | 絶縁シート、回路基板及び絶縁シートの製造方法 |
WO2012002546A1 (ja) * | 2010-07-02 | 2012-01-05 | 日立化成工業株式会社 | Bステージシート、樹脂付金属箔、金属基板、及びled基板 |
JP2012031401A (ja) * | 2010-07-02 | 2012-02-16 | Hitachi Chem Co Ltd | 樹脂組成物、bステージシート、樹脂付金属箔、金属基板及びled基板 |
JP2012031402A (ja) * | 2010-07-02 | 2012-02-16 | Hitachi Chem Co Ltd | 樹脂組成物、bステージシート、樹脂付金属箔、金属基板及びled基板 |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013234313A (ja) * | 2011-11-02 | 2013-11-21 | Hitachi Chemical Co Ltd | エポキシ樹脂組成物、その半硬化体および硬化体、並びにそれを用いた樹脂シート、プリプレグ、積層板、金属基板、プリント配線板、およびパワー半導体装置 |
JP2013147589A (ja) * | 2012-01-20 | 2013-08-01 | Nitto Denko Corp | 電子部品封止用樹脂組成物シートおよびそれを用いた電子部品装置の製法 |
US10913879B2 (en) | 2014-02-24 | 2021-02-09 | Henkel IP & Holding GmbH | Thermally conductive pre-applied underfill formulations and uses thereof |
JP2017512887A (ja) * | 2014-02-24 | 2017-05-25 | ヘンケル アイピー アンド ホールディング ゲゼルシャフト ミット ベシュレンクテル ハフツング | 熱伝導性プリアプライアンダーフィル組成物およびその使用 |
JP2015232116A (ja) * | 2014-05-15 | 2015-12-24 | Tdk株式会社 | 無機フィラー含有エポキシ樹脂硬化物およびこれを用いた積層板 |
JPWO2016093248A1 (ja) * | 2014-12-08 | 2017-09-21 | 日立化成株式会社 | エポキシ樹脂組成物、樹脂シート、プリプレグ、樹脂付金属箔、金属基板、及びパワー半導体装置 |
JP2021165401A (ja) * | 2014-12-08 | 2021-10-14 | 昭和電工マテリアルズ株式会社 | エポキシ樹脂組成物、樹脂シート、プリプレグ、樹脂付金属箔、金属基板、及びパワー半導体装置 |
JP7201029B2 (ja) | 2014-12-08 | 2023-01-10 | 昭和電工マテリアルズ株式会社 | エポキシ樹脂組成物、樹脂シート、プリプレグ、樹脂付金属箔、金属基板、及びパワー半導体装置 |
JP2019052264A (ja) * | 2017-09-15 | 2019-04-04 | 東洋インキScホールディングス株式会社 | 熱伝導性絶縁シートおよび複合部材 |
KR20200054216A (ko) | 2017-09-15 | 2020-05-19 | 토요잉크Sc홀딩스주식회사 | 열 전도성 절연 시트 및 복합 부재 |
WO2019054486A1 (ja) * | 2017-09-15 | 2019-03-21 | 東洋インキScホールディングス株式会社 | 熱伝導性絶縁シートおよび複合部材 |
KR102493229B1 (ko) | 2017-09-15 | 2023-01-31 | 토요잉크Sc홀딩스주식회사 | 열 전도성 절연 시트 및 복합 부재 |
US11825632B2 (en) | 2017-09-15 | 2023-11-21 | Toyo Ink Sc Holdings Co., Ltd. | Thermally conductive insulating sheet, and composite member |
JP2021152101A (ja) * | 2020-03-24 | 2021-09-30 | 三菱マテリアル株式会社 | 絶縁膜、金属ベース基板及び金属ベース基板の製造方法 |
WO2021192479A1 (ja) * | 2020-03-24 | 2021-09-30 | 三菱マテリアル株式会社 | 絶縁膜、金属ベース基板及び金属ベース基板の製造方法 |
JP7508824B2 (ja) | 2020-03-24 | 2024-07-02 | 三菱マテリアル株式会社 | 絶縁膜、金属ベース基板及び金属ベース基板の製造方法 |
EP4498407A4 (en) * | 2022-03-22 | 2025-07-09 | Nhk Spring Co Ltd | LAMINATE MANUFACTURING PROCESS |
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JPWO2012102212A1 (ja) | 2014-06-30 |
TWI455969B (zh) | 2014-10-11 |
JP5904126B2 (ja) | 2016-04-13 |
KR101929067B1 (ko) | 2018-12-13 |
KR20140005923A (ko) | 2014-01-15 |
TW201245295A (en) | 2012-11-16 |
CN103328548A (zh) | 2013-09-25 |
CN103328548B (zh) | 2016-06-29 |
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