WO2008099524A1 - 光電変換装置及びその製造方法 - Google Patents
光電変換装置及びその製造方法 Download PDFInfo
- Publication number
- WO2008099524A1 WO2008099524A1 PCT/JP2007/065386 JP2007065386W WO2008099524A1 WO 2008099524 A1 WO2008099524 A1 WO 2008099524A1 JP 2007065386 W JP2007065386 W JP 2007065386W WO 2008099524 A1 WO2008099524 A1 WO 2008099524A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- transparent electrode
- substrate
- electrode layer
- photoelectric converter
- photoelectric conversion
- Prior art date
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
- H10F10/174—Photovoltaic cells having only PIN junction potential barriers comprising monocrystalline or polycrystalline materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
- H10F10/172—Photovoltaic cells having only PIN junction potential barriers comprising multiple PIN junctions, e.g. tandem cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
- H10F71/1221—The active layers comprising only Group IV materials comprising polycrystalline silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/42—Optical elements or arrangements directly associated or integrated with photovoltaic cells, e.g. light-reflecting means or light-concentrating means
- H10F77/48—Back surface reflectors [BSR]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Photovoltaic Devices (AREA)
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007800323769A CN101627478B (zh) | 2007-02-16 | 2007-08-06 | 光电转换装置及其制造方法 |
AU2007346981A AU2007346981B2 (en) | 2007-02-16 | 2007-08-06 | Photovoltaic device and process for producing same |
CA002661217A CA2661217A1 (en) | 2007-02-16 | 2007-08-06 | Photovoltaic device and process for producing same |
JP2008557975A JPWO2008099524A1 (ja) | 2007-02-16 | 2007-08-06 | 光電変換装置及びその製造方法 |
EP07792055A EP2133924A4 (en) | 2007-02-16 | 2007-08-06 | PHOTOELECTRIC CONVERTER AND MANUFACTURING METHOD THEREFOR |
US12/003,261 US20080196761A1 (en) | 2007-02-16 | 2007-12-21 | Photovoltaic device and process for producing same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007036432 | 2007-02-16 | ||
JP2007-036432 | 2007-02-16 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/003,261 Continuation US20080196761A1 (en) | 2007-02-16 | 2007-12-21 | Photovoltaic device and process for producing same |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008099524A1 true WO2008099524A1 (ja) | 2008-08-21 |
Family
ID=39689781
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/065386 WO2008099524A1 (ja) | 2007-02-16 | 2007-08-06 | 光電変換装置及びその製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20080196761A1 (ja) |
EP (1) | EP2133924A4 (ja) |
JP (2) | JPWO2008099524A1 (ja) |
KR (1) | KR20090042943A (ja) |
CN (1) | CN101627478B (ja) |
AU (1) | AU2007346981B2 (ja) |
CA (1) | CA2661217A1 (ja) |
WO (1) | WO2008099524A1 (ja) |
Cited By (24)
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WO2010064599A1 (ja) * | 2008-12-01 | 2010-06-10 | シャープ株式会社 | シリコン系薄膜光電変換装置およびその製造方法 |
JP2010135415A (ja) * | 2008-12-02 | 2010-06-17 | Mitsubishi Electric Corp | 薄膜太陽電池の製造方法 |
JP2010186854A (ja) * | 2009-02-12 | 2010-08-26 | Mitsubishi Heavy Ind Ltd | 光電変換装置の製造方法 |
WO2010097975A1 (ja) * | 2009-02-27 | 2010-09-02 | 三菱重工業株式会社 | 光電変換装置 |
US20100224229A1 (en) * | 2009-03-09 | 2010-09-09 | Pralle Martin U | Multi-junction semiconductor photovoltaic apparatus and methods |
WO2010140539A1 (en) * | 2009-06-05 | 2010-12-09 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method for manufacturing the same |
WO2010140522A1 (en) * | 2009-06-05 | 2010-12-09 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and manufacturing method thereof |
JP2011108836A (ja) * | 2009-11-17 | 2011-06-02 | Mitsubishi Electric Corp | 薄膜太陽電池およびその製造方法 |
US8088641B2 (en) | 2008-10-30 | 2012-01-03 | Mitsubishi Heavy Industries, Ltd. | Process for producing photovoltaic device |
JP2012182161A (ja) * | 2011-02-28 | 2012-09-20 | Ulvac Japan Ltd | 薄膜太陽電池、及び薄膜太陽電池の製造方法 |
WO2015045263A1 (ja) * | 2013-09-26 | 2015-04-02 | パナソニックIpマネジメント株式会社 | 太陽電池及び太陽電池モジュール |
TWI514598B (zh) * | 2009-06-05 | 2015-12-21 | Semiconductor Energy Lab | 光電轉換裝置及其製造方法 |
US9496308B2 (en) | 2011-06-09 | 2016-11-15 | Sionyx, Llc | Process module for increasing the response of backside illuminated photosensitive imagers and associated methods |
US9673243B2 (en) | 2009-09-17 | 2017-06-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
US9673250B2 (en) | 2013-06-29 | 2017-06-06 | Sionyx, Llc | Shallow trench textured regions and associated methods |
US9741761B2 (en) | 2010-04-21 | 2017-08-22 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
US9762830B2 (en) | 2013-02-15 | 2017-09-12 | Sionyx, Llc | High dynamic range CMOS image sensor having anti-blooming properties and associated methods |
US9761739B2 (en) | 2010-06-18 | 2017-09-12 | Sionyx, Llc | High speed photosensitive devices and associated methods |
US9905599B2 (en) | 2012-03-22 | 2018-02-27 | Sionyx, Llc | Pixel isolation elements, devices and associated methods |
US9911781B2 (en) | 2009-09-17 | 2018-03-06 | Sionyx, Llc | Photosensitive imaging devices and associated methods |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002026348A (ja) * | 2000-07-05 | 2002-01-25 | Mitsubishi Heavy Ind Ltd | シリコン系薄膜光起電力素子及びその製造方法 |
WO2003036657A1 (en) | 2001-10-19 | 2003-05-01 | Asahi Glass Company, Limited | Substrate with transparent conductive oxide film and production method therefor, and photoelectric conversion element |
JP2005347490A (ja) | 2004-06-02 | 2005-12-15 | Asahi Glass Co Ltd | 透明導電性酸化物膜付き基体およびその製造方法ならびに光電変換素子 |
JP2006216921A (ja) * | 2005-02-07 | 2006-08-17 | Mitsubishi Heavy Ind Ltd | 光電変換装置の製造方法および光電変換装置 |
JP2007005345A (ja) * | 2005-06-21 | 2007-01-11 | Mitsubishi Heavy Ind Ltd | 太陽電池モジュール及び太陽電池モジュールの製造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4598306A (en) * | 1983-07-28 | 1986-07-01 | Energy Conversion Devices, Inc. | Barrier layer for photovoltaic devices |
JPS6193672A (ja) * | 1984-10-12 | 1986-05-12 | Sanyo Electric Co Ltd | 光起電力装置 |
JPS6193674A (ja) * | 1984-10-13 | 1986-05-12 | Sumitomo Electric Ind Ltd | アモルフアスシリコン太陽電池 |
US4689438A (en) * | 1984-10-17 | 1987-08-25 | Sanyo Electric Co., Ltd. | Photovoltaic device |
JPS61104678A (ja) * | 1984-10-29 | 1986-05-22 | Mitsubishi Electric Corp | アモルフアス太陽電池 |
JPH0614554B2 (ja) * | 1985-03-22 | 1994-02-23 | 工業技術院長 | 薄膜太陽電池の製造方法 |
JPH0799776B2 (ja) * | 1986-02-14 | 1995-10-25 | 住友電気工業株式会社 | アモルフアスシリコン太陽電池の製造方法 |
JP2918345B2 (ja) * | 1991-02-20 | 1999-07-12 | キヤノン株式会社 | 光起電力素子 |
JP3048732B2 (ja) * | 1991-11-25 | 2000-06-05 | 三洋電機株式会社 | 光起電力装置 |
US5549763A (en) * | 1993-07-26 | 1996-08-27 | Sanyo Electric Co., Ltd. | Photovoltaic device |
JP3431776B2 (ja) * | 1995-11-13 | 2003-07-28 | シャープ株式会社 | 太陽電池用基板の製造方法および太陽電池用基板加工装置 |
JP2000252499A (ja) * | 1999-02-26 | 2000-09-14 | Kanegafuchi Chem Ind Co Ltd | 薄膜光電変換装置の製造方法 |
JP2001352086A (ja) * | 2000-06-06 | 2001-12-21 | Mitsubishi Heavy Ind Ltd | 透明電極膜、その製造方法、および該透明電極膜を用いた太陽電池及びその製造方法 |
US6787692B2 (en) * | 2000-10-31 | 2004-09-07 | National Institute Of Advanced Industrial Science & Technology | Solar cell substrate, thin-film solar cell, and multi-junction thin-film solar cell |
JP2004014812A (ja) * | 2002-06-07 | 2004-01-15 | Canon Inc | 光起電力素子 |
JP2004079997A (ja) * | 2002-06-19 | 2004-03-11 | Canon Inc | 発電システム及び発電装置 |
JP4756820B2 (ja) * | 2003-11-06 | 2011-08-24 | シャープ株式会社 | 太陽電池 |
JP2005244037A (ja) * | 2004-02-27 | 2005-09-08 | Mitsubishi Heavy Ind Ltd | シリコン膜の製造方法及び太陽電池の製造方法 |
-
2007
- 2007-08-06 CA CA002661217A patent/CA2661217A1/en not_active Abandoned
- 2007-08-06 KR KR1020097004223A patent/KR20090042943A/ko active IP Right Grant
- 2007-08-06 JP JP2008557975A patent/JPWO2008099524A1/ja not_active Withdrawn
- 2007-08-06 EP EP07792055A patent/EP2133924A4/en not_active Withdrawn
- 2007-08-06 CN CN2007800323769A patent/CN101627478B/zh not_active Expired - Fee Related
- 2007-08-06 WO PCT/JP2007/065386 patent/WO2008099524A1/ja active Application Filing
- 2007-08-06 AU AU2007346981A patent/AU2007346981B2/en not_active Expired - Fee Related
- 2007-12-21 US US12/003,261 patent/US20080196761A1/en not_active Abandoned
-
2012
- 2012-07-19 JP JP2012160715A patent/JP2012195620A/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002026348A (ja) * | 2000-07-05 | 2002-01-25 | Mitsubishi Heavy Ind Ltd | シリコン系薄膜光起電力素子及びその製造方法 |
WO2003036657A1 (en) | 2001-10-19 | 2003-05-01 | Asahi Glass Company, Limited | Substrate with transparent conductive oxide film and production method therefor, and photoelectric conversion element |
JP2005347490A (ja) | 2004-06-02 | 2005-12-15 | Asahi Glass Co Ltd | 透明導電性酸化物膜付き基体およびその製造方法ならびに光電変換素子 |
JP2006216921A (ja) * | 2005-02-07 | 2006-08-17 | Mitsubishi Heavy Ind Ltd | 光電変換装置の製造方法および光電変換装置 |
JP2007005345A (ja) * | 2005-06-21 | 2007-01-11 | Mitsubishi Heavy Ind Ltd | 太陽電池モジュール及び太陽電池モジュールの製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2133924A4 |
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Also Published As
Publication number | Publication date |
---|---|
CN101627478A (zh) | 2010-01-13 |
EP2133924A1 (en) | 2009-12-16 |
JP2012195620A (ja) | 2012-10-11 |
KR20090042943A (ko) | 2009-05-04 |
AU2007346981A1 (en) | 2008-08-21 |
CN101627478B (zh) | 2011-06-01 |
JPWO2008099524A1 (ja) | 2010-05-27 |
US20080196761A1 (en) | 2008-08-21 |
EP2133924A4 (en) | 2011-04-27 |
AU2007346981B2 (en) | 2013-08-22 |
CA2661217A1 (en) | 2008-08-21 |
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