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USD684551S1 - Wafer polishing pad holder - Google Patents

Wafer polishing pad holder Download PDF

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Publication number
USD684551S1
USD684551S1 US29/396,846 US201129396846F USD684551S US D684551 S1 USD684551 S1 US D684551S1 US 201129396846 F US201129396846 F US 201129396846F US D684551 S USD684551 S US D684551S
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US
United States
Prior art keywords
polishing pad
wafer polishing
pad holder
new design
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/396,846
Inventor
Phuong Van Nguyen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
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Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to US29/396,846 priority Critical patent/USD684551S1/en
Application granted granted Critical
Publication of USD684551S1 publication Critical patent/USD684551S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a top perspective view of the wafer polishing pad holder showing my new design;
FIG. 2 is a top view of the wafer polishing pad holder showing my new design;
FIG. 3 is a front view of the wafer polishing pad holder showing my new design;
FIG. 4 is a rear view of the wafer polishing pad holder showing my new design;
FIG. 5 is a right side view of the wafer polishing pad holder showing my new design;
FIG. 6 is a left side view of the wafer polishing pad holder showing my new design; and
FIG. 7 is a cross sectional view of the wafer polishing pad holder, taken from FIG. 2 as indicated showing my new design; and,
FIG. 8 is a top view of the wafer polishing pad holder without the milled island within the inside pocket showing my new design.

Claims (1)

    CLAIM
  1. The ornamental design for a wafer polishing pad holder, as shown and described.
US29/396,846 2011-07-07 2011-07-07 Wafer polishing pad holder Active USD684551S1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US29/396,846 USD684551S1 (en) 2011-07-07 2011-07-07 Wafer polishing pad holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/396,846 USD684551S1 (en) 2011-07-07 2011-07-07 Wafer polishing pad holder

Publications (1)

Publication Number Publication Date
USD684551S1 true USD684551S1 (en) 2013-06-18

Family

ID=48578479

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/396,846 Active USD684551S1 (en) 2011-07-07 2011-07-07 Wafer polishing pad holder

Country Status (1)

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US (1) USD684551S1 (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130267155A1 (en) * 2012-04-09 2013-10-10 Phuong Van Nguyen Wafer Polishing Pad Holder Template
USD731448S1 (en) * 2013-10-29 2015-06-09 Ebara Corporation Polishing pad for substrate polishing apparatus
USD748593S1 (en) * 2014-03-05 2016-02-02 Hzo, Inc. Boat for use in a material deposition apparatus
USD760180S1 (en) * 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
USD766850S1 (en) * 2014-03-28 2016-09-20 Tokyo Electron Limited Wafer holder for manufacturing semiconductor
USD769200S1 (en) * 2013-05-15 2016-10-18 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD770990S1 (en) * 2013-05-15 2016-11-08 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD784937S1 (en) * 2014-11-13 2017-04-25 Tokyo Electron Limited Dummy wafer
USD785576S1 (en) 2014-11-13 2017-05-02 Tokyo Electron Limited Dummy wafer
USD786810S1 (en) * 2014-11-13 2017-05-16 Tokyo Electron Limited Dummy wafer
USD803917S1 (en) * 2015-06-16 2017-11-28 Hitachi Kokusai Electric, Inc. Heat reflector for substrate processing apparatus
USD804556S1 (en) * 2015-06-16 2017-12-05 Hitachi Kokusai Electric Inc. Heat reflector for substrate processing apparatus
USD808349S1 (en) 2013-05-15 2018-01-23 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD997111S1 (en) * 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1035600S1 (en) * 2022-02-23 2024-07-16 Rf Scientific, Llc Semiconductor test fixture
USD1054388S1 (en) * 2021-10-15 2024-12-17 Shin-Etsu Chemical Co., Ltd. Carrier substrate for handling

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130267155A1 (en) * 2012-04-09 2013-10-10 Phuong Van Nguyen Wafer Polishing Pad Holder Template
USD808349S1 (en) 2013-05-15 2018-01-23 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD769200S1 (en) * 2013-05-15 2016-10-18 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD770990S1 (en) * 2013-05-15 2016-11-08 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD813180S1 (en) 2013-05-15 2018-03-20 Ebara Corporation Elastic membrane for semiconductor wafer polishing apparatus
USD731448S1 (en) * 2013-10-29 2015-06-09 Ebara Corporation Polishing pad for substrate polishing apparatus
USD760180S1 (en) * 2014-02-21 2016-06-28 Hzo, Inc. Hexcell channel arrangement for use in a boat for a deposition apparatus
USD748593S1 (en) * 2014-03-05 2016-02-02 Hzo, Inc. Boat for use in a material deposition apparatus
USD766850S1 (en) * 2014-03-28 2016-09-20 Tokyo Electron Limited Wafer holder for manufacturing semiconductor
USD786810S1 (en) * 2014-11-13 2017-05-16 Tokyo Electron Limited Dummy wafer
USD785576S1 (en) 2014-11-13 2017-05-02 Tokyo Electron Limited Dummy wafer
USD784937S1 (en) * 2014-11-13 2017-04-25 Tokyo Electron Limited Dummy wafer
USD803917S1 (en) * 2015-06-16 2017-11-28 Hitachi Kokusai Electric, Inc. Heat reflector for substrate processing apparatus
USD804556S1 (en) * 2015-06-16 2017-12-05 Hitachi Kokusai Electric Inc. Heat reflector for substrate processing apparatus
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1054388S1 (en) * 2021-10-15 2024-12-17 Shin-Etsu Chemical Co., Ltd. Carrier substrate for handling
USD997111S1 (en) * 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1035600S1 (en) * 2022-02-23 2024-07-16 Rf Scientific, Llc Semiconductor test fixture

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