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US5392116A - Interferometric phase measurement - Google Patents

Interferometric phase measurement Download PDF

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Publication number
US5392116A
US5392116A US08/030,941 US3094193A US5392116A US 5392116 A US5392116 A US 5392116A US 3094193 A US3094193 A US 3094193A US 5392116 A US5392116 A US 5392116A
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United States
Prior art keywords
recited
phase
partial beams
beams
pairs
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Expired - Lifetime
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US08/030,941
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English (en)
Inventor
Guenter Makosch
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International Business Machines Corp
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International Business Machines Corp
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Assigned to INTERNATIONAL BUSINESS MACHINES CORPORATION reassignment INTERNATIONAL BUSINESS MACHINES CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: MAKOSCH, GUENTER (NMN)
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02078—Caused by ambiguity
    • G01B9/02079—Quadrature detection, i.e. detecting relatively phase-shifted signals
    • G01B9/02081—Quadrature detection, i.e. detecting relatively phase-shifted signals simultaneous quadrature detection, e.g. by spatial phase shifting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Definitions

  • the invention lies in the field of optical measuring devices. It concerns in particular interferometer arrangements that detect the phase differences between differently polarized light beams.
  • Digital interferometers are being increasingly used in a number of production processes to characterize and measure surfaces.
  • Optical measuring devices of this kind are distinguished by a high degree of measuring accuracy. For manufacturing, it is desirable to make measurements without contacting the measured part to avoid damage. It is also desirable that measurements be fully automated.
  • a measuring device of this kind is the Laser Spot Scanning Interferometer (LASSI) described in U.S. Pat. No. 4,298,283 assigned to the assignee of the present invention, incorporated herein by reference.
  • the underlying measuring principle is based on scanning the surface to be tested with two laser light beams which are simultaneously focused adjacent to each other onto the surface. During this process, the optical phase difference between the two light waves, which are reflected from the surface, changes linearly as a function of the height difference between the two laser spots on the surface. The phase difference is determined by phase switching.
  • an electro-optical light modulator is used which periodically shifts the phase difference between the two light waves by a fixed amount.
  • ⁇ is the light wavelength
  • h is the height difference
  • phase measuring value ⁇ M is calculated according to that equation, using, for example, a personal computer controller.
  • phase measuring method provides the exact phase measuring value ⁇ M and thus the height difference value h to be determined, provided that the modulation voltage at the modulator shifts the phase periodically by ⁇ 2/3 ⁇ .
  • this switching voltage is not constant. Similar to the half-wave voltage of the modulator, the switching voltage, depending upon the ambient temperature, is subject to slight variations which may exceed 5% of the rated voltage. To reduce errors resulting therefrom during phase measurement to a minimum, the half-wave voltage frequently has to be redefined by an automatic calibration routine. Another error, attributable to the sequential processing of the measuring value, occurs when a rapidly changing phase measuring value is dynamically determined. In a phase measuring process, the measuring time of the three light power values P S , P R and P T is several milliseconds.
  • phase value ⁇ M to be measured must remain unchanged. For.scanning profile height measurements, this may be achieved by a correspondingly slow lateral movement of the measuring object. However, in the case of unforeseeable rapid phase changes, such errors and their effect cannot be avoided.
  • the present invention improves upon the phase detection of the prior art.
  • An object is to develop an improved optical phase measurement that eliminates the disadvantages of the existing measuring techniques, avoids sequential processing, and provides simultaneous measurement of the needed measuring values.
  • the method and arrangement for phase measurement according to the present invention permits parallel signal input and signal processing.
  • differently polarized light beams are initially split by a beam splitter into several partial beams or divided into several diffraction orders by a diffraction grating.
  • these diffraction orders are focused preferably as laterally displaced parallel light beams onto light sensitive sensors.
  • a phase shifter and a polarization filter are arranged between the lens and the sensors. With the aid of the phase shifter, the phases of the individual parallel beams are each shifted differently depending upon their position and polarization.
  • phase differences between the partial beams lead to interference-and therefore intensity changes of the parallel beams which are detected by the sensors.
  • the phase difference of the light beams is directly derivable from the simultaneously recorded intensity pattern of the partial beams.
  • the phase measuring method according to the invention has a high measuring accuracy and permits a compact design of the phase measuring apparatus.
  • Applications include step and profile height measurements in the nanometer range as well as measurements of minimum displacements in one plane (alignment and overlay measurements).
  • phase measuring method is described in detail below by way of a preferred embodiment of a measuring arrangement for step and profile height measurement with reference to drawings, in which
  • FIG. 1 is a schematic diagram of a surface height measuring device with parallel signal evaluation
  • FIG. 2 shows the design of the optical phase detector according to the invention.
  • FIG. 3 is an example of the phase shifter used in the phase detector.
  • the beam of a linearly polarized laser 1 is split into two light beams 3 and 4 polarized perpendicularly to each other, which, by means of the lens 5, are focused as two parallel light beams 31 and 41 onto the surface 6 of the object 7 to be measured.
  • a continuous light attenuator consisting of a polarizer 8 and a rotatable half-wave plate 9
  • the absolute and the relative light intensity of the two light beams my be suitably changed.
  • an optical phase difference ⁇ M occurs between the two light beams, which, according to equation (1) is directly proportional to the height difference h between the laser light spots on the surface.
  • the beams are recombined by the Wollaston prism without changing their directions of polarization and reflected at the beam splitting mirror 10 in one superimposed light beam 23 in the detector arm 11 of the arrangement.
  • beams 21 and 22 are not two separate beams but are a superposition of two reflected and recombined light beams as described above, and also are the border lines of incident superimposed light beam 23.
  • 31 and 41 is a diffraction order of superimposed light beam 23 and are the border lines of the light cone converging on the detector 16.
  • the phase difference between the partial beams of the reflected light beam pair (21, 22) of which incident superimposed light beam 23 consists is determined by means of the measuring arrangement schematically illustrated in FIG. 2.
  • This arrangement comprises a transmission diffraction grating 12 dividing incident superimposed light beam (23) into several pairs of diffraction orders (31, 41), (32, 42) (33, 43), (34, 44), (35, 45) each of which is a superposition of the diffraction orders of two reflected light beams as described above; a lens 13 focusing the diffraction orders as axially parallel equidistant light beams onto a line detector 16; the polarizer 15, and a phase shifting optical element 14.
  • This phase shifter 14 is designed on the principle of the Babinet compensator (FIG. 3). It consists of two birefringent wedge plates 17, 18 making up a plane parallel plate. The optical axes of the two wedge plates are perpendicular to each other, extending parallel to the boundary faces of the plate. Two partial waves of a laser beam polarized perpendicularly to each other are subject to a path or phase difference by passing through the two wedges as given by ##EQU3## where
  • ⁇ is the light wavelength
  • n o ,n e are the refraction indices of the ordinary or the extraordinary beam in the crystal
  • x is the distance from the plate center
  • ⁇ is the prism angle of the wedge plates 17, 18.
  • Each of the diffraction orders passing the phase shifter 14 in the above described arrangement consists of two perpendicularly polarized partial components, the phase difference of which is ⁇ M .
  • the two components are additionally phase shifted by ⁇ to each other, as defined by equation (3).
  • the phase increment between two adjacent pairs of diffraction orders 19, 20 is constant, as the diffraction orders are equidistant.
  • the phase increment may be determined to be ⁇ /2 for a given spacing of the diffraction orders.
  • the two partial components of the -2nd diffraction order are phase shifted by - ⁇ to each other, those of the -1st diffraction order by ⁇ /2, and those of the +1st and the +2nd by ⁇ /2 and ⁇ , respectively.
  • phase difference ⁇ M may be determined as follows: ##EQU5##
  • the method according to the invention permits a parallel recording of several phase shifted intensity signals. These signals were in the prior art generated in a time staggered fashion by periodically switching the electro-optical modulator and thus had to be sequentially processed.
  • the method of the present invention by contrast, generates the necessary individual signals simultaneously, so that they may be processed in parallel. This enhances the measuring speed and measuring reliability. By using more than three characteristic values, the measuring accuracy is further improved.
  • other phase switching techniques based on sequential signal processing may be converted-into parallel methods.
  • the previously used sequential measuring process may be replaced by a parallel method which is identical in form if the phase shift between the zeroth and the two first diffraction orders is ⁇ 2/3 ⁇ .
  • the powers of the three diffraction orders are given in this case by: ##EQU6##
  • the phase difference may be determined as follows: ##EQU7## This formula is identical to equation (2) with
  • a method confined to a minimum number of three defining equations is inferior to the above discussed method with five such equations, as the inaccuracies decrease as the number of power signals increase.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
US08/030,941 1992-03-17 1993-03-12 Interferometric phase measurement Expired - Lifetime US5392116A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP92104558A EP0561015A1 (de) 1992-03-17 1992-03-17 Interferometrische Phasenmessung
EP92104558 1992-03-17

Publications (1)

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US5392116A true US5392116A (en) 1995-02-21

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EP (1) EP0561015A1 (de)
JP (1) JP2673086B2 (de)

Cited By (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5581345A (en) * 1990-12-03 1996-12-03 Nikon Corporation Confocal laser scanning mode interference contrast microscope, and method of measuring minute step height and apparatus with said microscope
US5604591A (en) * 1994-04-11 1997-02-18 Olympus Optical Co., Ltd. Method of measuring phase difference and apparatus for carrying out the same
DE19635907A1 (de) * 1995-09-05 1997-03-06 Zygo Co Verfahren zur Messung der Phasendifferenz zwischen zwei orthogonal polarisierten Komponenten eines Prüfstrahls sowie Homodyn-Interferometer-Empfängervorrichtung zur Durchführung des Verfahrens
US5699160A (en) * 1996-09-23 1997-12-16 International Business Machines Corporation Optical apparatus for inspecting laser texture
US5898500A (en) * 1997-02-26 1999-04-27 Instruments, S.A. Device and method for three-dimensional measurements and observation in situ of a surface layer deposited on a thin-film stack
US6304330B1 (en) 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
GB2372097A (en) * 2001-02-07 2002-08-14 Image Automation Ltd Multiple beam interferometer
EP1332331A1 (de) * 2000-10-17 2003-08-06 The Board of Trustees of the University of Illinois Interferometrischer sensor und verfahren zum erkennen von optischen feldern
US20030223075A1 (en) * 1999-03-12 2003-12-04 Canon Kabushiki Kaisha Compact interference measuring apparatus detecting plurality of phase difference signals
US20040190003A1 (en) * 2003-03-24 2004-09-30 International Business Machines Corp. Interferometric method and system
US6831742B1 (en) 2000-10-23 2004-12-14 Applied Materials, Inc Monitoring substrate processing using reflected radiation
US20050041243A1 (en) * 2001-10-25 2005-02-24 Choo Dae-Ho Liquid crystal process defect inspection apparatus and inspection method
US20050146796A1 (en) * 2002-04-26 2005-07-07 International Business Machines Corporation Polarizing beamsplitter
US6934027B2 (en) * 2000-07-07 2005-08-23 Robert Bosch Gmbh Interferometric measuring device
DE102004053420A1 (de) * 2004-11-05 2006-05-24 Robert Bosch Gmbh Interferometer mit einem Höhenadapter zur Vermessung einer Oberflächenkontur eines Messobjektes
US7061613B1 (en) 2004-01-13 2006-06-13 Nanometrics Incorporated Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation
US20060215289A1 (en) * 2004-06-14 2006-09-28 Kla-Tencor Technologies Corp. Servo pattern characterization on magnetic disks
US20060250618A1 (en) * 2005-04-27 2006-11-09 Mitutoyo Corporation Interferometer and method of calibrating the interferometer
US20060250620A1 (en) * 2005-04-11 2006-11-09 Zetetic Institute Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
US20060250610A1 (en) * 2005-05-06 2006-11-09 Kla-Tencor Technologies Corp. Wafer edge inspection
US20060250611A1 (en) * 2005-05-06 2006-11-09 Kla-Tencor Technologies Corp. Wafer edge inspection
US20060250612A1 (en) * 1997-09-22 2006-11-09 Meeks Steven W Detecting and classifying surface features or defects by controlling the angle of the illumination plane of incidence with respect to the feature or defect
US20060256345A1 (en) * 2005-05-12 2006-11-16 Kla-Tencor Technologies Corp. Interferometry measurement in disturbed environments
US20060262291A1 (en) * 2005-05-17 2006-11-23 Hess Harald F Dynamic reference plane compensation
US20060285124A1 (en) * 2005-05-18 2006-12-21 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
US20070046951A1 (en) * 2005-08-26 2007-03-01 Zetetic Institute Apparatus and Method for Measurement and Compensation of Atmospheric Turbulence Effects in Wavefront Interferometry
US20070058174A1 (en) * 2005-08-08 2007-03-15 Zetetic Institute Apparatus and Methods for Reduction and Compensation of Effects of Vibrations and of Environmental Effects in Wavefront Interferometry
US20070115483A1 (en) * 1997-09-22 2007-05-24 Oak Dave S Surface finish roughness measurement
US20070121115A1 (en) * 2005-11-15 2007-05-31 Zetetic Institute Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
US20070133009A1 (en) * 2005-12-14 2007-06-14 Shu-Guo Tang Phase shifting imaging module and method of imaging
US7253909B1 (en) 2003-06-25 2007-08-07 N&K Technology, Inc. Phase shift measurement using transmittance spectra
US7286229B1 (en) 2005-09-06 2007-10-23 Kla-Tencor Technologies Corporation Detecting multi-domain states in perpendicular magnetic media
US7295300B1 (en) 2005-09-28 2007-11-13 Kla-Tencor Technologies Corporation Detecting surface pits
US20070262771A1 (en) * 2006-05-11 2007-11-15 Kla-Tencor Technologies Corporation Method and System for Perpendicular Magnetic Media Metrology
CN100390519C (zh) * 1999-05-19 2008-05-28 松下电器产业株式会社 透镜的评价方法及其装置、光学单元和透镜的调整方法及装置
US20080158551A1 (en) * 2006-12-21 2008-07-03 Hess Harald F Systems and methods for 3-dimensional interferometric microscopy
US7397553B1 (en) 2005-10-24 2008-07-08 Kla-Tencor Technologies Corporation Surface scanning
US20080180656A1 (en) * 2007-01-26 2008-07-31 Kla-Tencor Technologies Corporation Surface characteristic analysis
US20090059236A1 (en) * 2007-08-30 2009-03-05 Kla-Tencor Technologies Corporation Wafer Edge Inspection
US7714995B2 (en) 1997-09-22 2010-05-11 Kla-Tencor Corporation Material independent profiler
US20110122418A1 (en) * 2009-11-20 2011-05-26 Mitutoyo Corporation Apparatus for determining a height map of a surface through both interferometric and non-interferometric measurements
CN102841395A (zh) * 2011-06-23 2012-12-26 精工爱普生株式会社 透射式衍射光栅以及检测装置
US9759545B2 (en) 2013-01-24 2017-09-12 Hitachi-Lg Data Storage, Inc. Optical tomograph and optical tomographic method
US10094648B2 (en) 2016-06-30 2018-10-09 Keysight Technologies, Inc. Homodyne optical sensor system incorporating a multi-phase beam combining system
US20190057910A1 (en) * 2016-03-29 2019-02-21 Applied Materials, Inc. Metrology systems for substrate stress and deformation measurement
US10809193B2 (en) 2018-04-06 2020-10-20 Asml Netherlands B.V. Inspection apparatus having non-linear optics

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI417519B (zh) * 2009-12-10 2013-12-01 Ind Tech Res Inst 干涉相位差量測方法及其系統
JP6038619B2 (ja) * 2012-12-04 2016-12-07 株式会社日立エルジーデータストレージ 偏光感受型光計測装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4298283A (en) * 1978-11-30 1981-11-03 International Business Machines Corporation Interferometric measuring method
US4358201A (en) * 1979-06-22 1982-11-09 International Business Machines Corporation Interferometric measurement apparatus and method having increased measuring range
US4707137A (en) * 1985-10-25 1987-11-17 Laser Magnetic Storage International Company Device and method for testing the wave front quality of optical components
US4714348A (en) * 1985-12-23 1987-12-22 International Business Machines Corporation Method and arrangement for optically determining surface profiles
JPH01109718A (ja) * 1987-10-22 1989-04-26 Nec Kyushu Ltd 縮小投影型露光装置
US4844616A (en) * 1988-05-31 1989-07-04 International Business Machines Corporation Interferometric dimensional measurement and defect detection method
EP0481356A2 (de) * 1990-10-18 1992-04-22 Dr. Johannes Heidenhain GmbH Polarisationsoptische Anordnung
US5235405A (en) * 1984-02-18 1993-08-10 Gec Ferranti Defence Systems Limited Detector apparatus for detecing coherent monohromatic point-source radiation

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2127483A1 (de) * 1971-06-03 1972-12-14 Leitz Ernst Gmbh Verfahren zur interferentiellen Messung von Langen, Winkeln, Gangunter schieden oder Geschwindigkeiten
JPS63151802A (ja) * 1986-12-17 1988-06-24 Rikagaku Kenkyusho 高精度偏光干渉計

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4298283A (en) * 1978-11-30 1981-11-03 International Business Machines Corporation Interferometric measuring method
US4358201A (en) * 1979-06-22 1982-11-09 International Business Machines Corporation Interferometric measurement apparatus and method having increased measuring range
US5235405A (en) * 1984-02-18 1993-08-10 Gec Ferranti Defence Systems Limited Detector apparatus for detecing coherent monohromatic point-source radiation
US4707137A (en) * 1985-10-25 1987-11-17 Laser Magnetic Storage International Company Device and method for testing the wave front quality of optical components
US4714348A (en) * 1985-12-23 1987-12-22 International Business Machines Corporation Method and arrangement for optically determining surface profiles
JPH01109718A (ja) * 1987-10-22 1989-04-26 Nec Kyushu Ltd 縮小投影型露光装置
US4844616A (en) * 1988-05-31 1989-07-04 International Business Machines Corporation Interferometric dimensional measurement and defect detection method
EP0481356A2 (de) * 1990-10-18 1992-04-22 Dr. Johannes Heidenhain GmbH Polarisationsoptische Anordnung

Cited By (97)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5581345A (en) * 1990-12-03 1996-12-03 Nikon Corporation Confocal laser scanning mode interference contrast microscope, and method of measuring minute step height and apparatus with said microscope
US5604591A (en) * 1994-04-11 1997-02-18 Olympus Optical Co., Ltd. Method of measuring phase difference and apparatus for carrying out the same
DE19635907A1 (de) * 1995-09-05 1997-03-06 Zygo Co Verfahren zur Messung der Phasendifferenz zwischen zwei orthogonal polarisierten Komponenten eines Prüfstrahls sowie Homodyn-Interferometer-Empfängervorrichtung zur Durchführung des Verfahrens
US5663793A (en) * 1995-09-05 1997-09-02 Zygo Corporation Homodyne interferometric receiver and calibration method having improved accuracy and functionality
DE19635907C2 (de) * 1995-09-05 1999-02-18 Zygo Co Verfahren zur Messung der Phasendifferenz zwischen zwei orthogonal polarisierten Komponenten eines Prüfstrahls sowie Homodyn-Interferometer-Empfängervorrichtung zur Durchführung des Verfahrens
US5699160A (en) * 1996-09-23 1997-12-16 International Business Machines Corporation Optical apparatus for inspecting laser texture
US5898500A (en) * 1997-02-26 1999-04-27 Instruments, S.A. Device and method for three-dimensional measurements and observation in situ of a surface layer deposited on a thin-film stack
GB2322697B (en) * 1997-02-26 2001-04-25 Instruments Sa Measurement and observation of a deposited surface layer
DE19807649B4 (de) * 1997-02-26 2010-10-14 Instruments S.A. Vorrichtung und Verfahren zur dreidimensionalen Messung und Beobachtung dünner Schichten
US7714995B2 (en) 1997-09-22 2010-05-11 Kla-Tencor Corporation Material independent profiler
US7688435B2 (en) 1997-09-22 2010-03-30 Kla-Tencor Corporation Detecting and classifying surface features or defects by controlling the angle of the illumination plane of incidence with respect to the feature or defect
US7630086B2 (en) 1997-09-22 2009-12-08 Kla-Tencor Corporation Surface finish roughness measurement
US20070115483A1 (en) * 1997-09-22 2007-05-24 Oak Dave S Surface finish roughness measurement
US20060250612A1 (en) * 1997-09-22 2006-11-09 Meeks Steven W Detecting and classifying surface features or defects by controlling the angle of the illumination plane of incidence with respect to the feature or defect
US20060114474A1 (en) * 1999-03-12 2006-06-01 Canon Kabushiki Kaisha Interference measuring apparatus
US7375820B2 (en) 1999-03-12 2008-05-20 Canon Kabushiki Kaisha Interference measuring apparatus for detecting a plurality of stable phase difference signals
US7034947B2 (en) * 1999-03-12 2006-04-25 Canon Kabushiki Kaisha Compact interference measuring apparatus for detecting the magnitude and direction of positional deviation
US20030223075A1 (en) * 1999-03-12 2003-12-04 Canon Kabushiki Kaisha Compact interference measuring apparatus detecting plurality of phase difference signals
CN100390519C (zh) * 1999-05-19 2008-05-28 松下电器产业株式会社 透镜的评价方法及其装置、光学单元和透镜的调整方法及装置
US6552808B2 (en) 1999-10-06 2003-04-22 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
US7298497B2 (en) 1999-10-06 2007-11-20 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
US6304330B1 (en) 1999-10-06 2001-10-16 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
US20060132795A1 (en) * 1999-10-06 2006-06-22 Millerd James E Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
US7170611B2 (en) 1999-10-06 2007-01-30 Metrolaser, Inc. Methods and apparatus for splitting, imaging, and measuring wavefronts in interferometry
US6934027B2 (en) * 2000-07-07 2005-08-23 Robert Bosch Gmbh Interferometric measuring device
EP1332331A4 (de) * 2000-10-17 2006-03-22 Univ Illinois Interferometrischer sensor und verfahren zum erkennen von optischen feldern
EP1332331A1 (de) * 2000-10-17 2003-08-06 The Board of Trustees of the University of Illinois Interferometrischer sensor und verfahren zum erkennen von optischen feldern
US6831742B1 (en) 2000-10-23 2004-12-14 Applied Materials, Inc Monitoring substrate processing using reflected radiation
GB2372097A (en) * 2001-02-07 2002-08-14 Image Automation Ltd Multiple beam interferometer
US20050041243A1 (en) * 2001-10-25 2005-02-24 Choo Dae-Ho Liquid crystal process defect inspection apparatus and inspection method
US7113278B2 (en) * 2001-10-25 2006-09-26 Samsung Electronics Co., Ltd. Liquid crystal process defect inspection apparatus and inspection method
US20050146796A1 (en) * 2002-04-26 2005-07-07 International Business Machines Corporation Polarizing beamsplitter
US7167311B2 (en) 2002-04-26 2007-01-23 International Business Machines Corporation Polarizing beamsplitter
US7221459B2 (en) * 2003-03-24 2007-05-22 International Business Machines Corporation Method and system for interferometric height measurement
US20080180689A1 (en) * 2003-03-24 2008-07-31 Gernot Brasen Interferometric Height Measurement
US20080180687A1 (en) * 2003-03-24 2008-07-31 Gernot Brasen Interferometric Height Measurement
US20040190003A1 (en) * 2003-03-24 2004-09-30 International Business Machines Corp. Interferometric method and system
US7551292B2 (en) * 2003-03-24 2009-06-23 International Business Machines Corporation Interferometric Height Measurement
US7551291B2 (en) * 2003-03-24 2009-06-23 International Business Machines Corporation Interferometric height measurement
US7253909B1 (en) 2003-06-25 2007-08-07 N&K Technology, Inc. Phase shift measurement using transmittance spectra
US7061613B1 (en) 2004-01-13 2006-06-13 Nanometrics Incorporated Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation
US20060215289A1 (en) * 2004-06-14 2006-09-28 Kla-Tencor Technologies Corp. Servo pattern characterization on magnetic disks
US7397621B2 (en) 2004-06-14 2008-07-08 Kla-Tencor Technologies Corporation Servo pattern characterization on magnetic disks
DE102004053420A1 (de) * 2004-11-05 2006-05-24 Robert Bosch Gmbh Interferometer mit einem Höhenadapter zur Vermessung einer Oberflächenkontur eines Messobjektes
DE102004053420B4 (de) * 2004-11-05 2007-04-19 Robert Bosch Gmbh Interferometer mit einem Höhenadapter zur Vermessung einer Oberflächenkontur eines Messobjektes
US20060250620A1 (en) * 2005-04-11 2006-11-09 Zetetic Institute Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
US7508527B2 (en) 2005-04-11 2009-03-24 Zetetic Institute Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry
US7511827B2 (en) * 2005-04-27 2009-03-31 Mitutoyo Corporation Interferometer and method of calibrating the interferometer
US20060250618A1 (en) * 2005-04-27 2006-11-09 Mitutoyo Corporation Interferometer and method of calibrating the interferometer
US20070127016A1 (en) * 2005-05-06 2007-06-07 Meeks Steven W Wafer edge inspection
US7532318B2 (en) 2005-05-06 2009-05-12 Kla-Tencor Corporation Wafer edge inspection
US7161669B2 (en) 2005-05-06 2007-01-09 Kla- Tencor Technologies Corporation Wafer edge inspection
US7161668B2 (en) 2005-05-06 2007-01-09 Kla-Tencor Technologies Corporation Wafer edge inspection
US20060250611A1 (en) * 2005-05-06 2006-11-09 Kla-Tencor Technologies Corp. Wafer edge inspection
US20060250610A1 (en) * 2005-05-06 2006-11-09 Kla-Tencor Technologies Corp. Wafer edge inspection
US20060256345A1 (en) * 2005-05-12 2006-11-16 Kla-Tencor Technologies Corp. Interferometry measurement in disturbed environments
CN100543407C (zh) * 2005-05-17 2009-09-23 恪纳腾技术公司 动态参考平面补偿
US20060262291A1 (en) * 2005-05-17 2006-11-23 Hess Harald F Dynamic reference plane compensation
US7505143B2 (en) * 2005-05-17 2009-03-17 Kla-Tencor Corporation Dynamic reference plane compensation
US20060285124A1 (en) * 2005-05-18 2006-12-21 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
US7428058B2 (en) 2005-05-18 2008-09-23 Zetetic Institute Apparatus and method for in situ and ex situ measurements of optical system flare
US7405832B2 (en) 2005-08-08 2008-07-29 Zetetic Institute Apparatus and methods for reduction and compensation of effects of vibrations and of environmental effects in wavefront interferometry
US20070058174A1 (en) * 2005-08-08 2007-03-15 Zetetic Institute Apparatus and Methods for Reduction and Compensation of Effects of Vibrations and of Environmental Effects in Wavefront Interferometry
US20070046951A1 (en) * 2005-08-26 2007-03-01 Zetetic Institute Apparatus and Method for Measurement and Compensation of Atmospheric Turbulence Effects in Wavefront Interferometry
US7460245B2 (en) 2005-08-26 2008-12-02 Zetetic Institute Apparatus and method for measurement and compensation of atmospheric turbulence effects in wavefront interferometry
US7286229B1 (en) 2005-09-06 2007-10-23 Kla-Tencor Technologies Corporation Detecting multi-domain states in perpendicular magnetic media
US7295300B1 (en) 2005-09-28 2007-11-13 Kla-Tencor Technologies Corporation Detecting surface pits
US7397553B1 (en) 2005-10-24 2008-07-08 Kla-Tencor Technologies Corporation Surface scanning
US20070121115A1 (en) * 2005-11-15 2007-05-31 Zetetic Institute Apparatus and method for reducing effects of coherent artifacts and compensation of effects of vibrations and environmental changes in interferometry
GB2433317A (en) * 2005-12-14 2007-06-20 Gen Electric Phase shifting imaging module for handheld interferometer
US20070133009A1 (en) * 2005-12-14 2007-06-14 Shu-Guo Tang Phase shifting imaging module and method of imaging
GB2433317B (en) * 2005-12-14 2010-08-18 Gen Electric Phase shifting imaging module and method of imaging
US7466426B2 (en) 2005-12-14 2008-12-16 General Electric Company Phase shifting imaging module and method of imaging
US7684145B2 (en) 2006-05-11 2010-03-23 Microsense, Llc Method and system for perpendicular magnetic media metrology
US20070262771A1 (en) * 2006-05-11 2007-11-15 Kla-Tencor Technologies Corporation Method and System for Perpendicular Magnetic Media Metrology
US20100002326A1 (en) * 2006-05-11 2010-01-07 Ade Technologies, Inc. Method and system for perpendicular magnetic media metrology
US7916304B2 (en) 2006-12-21 2011-03-29 Howard Hughes Medical Institute Systems and methods for 3-dimensional interferometric microscopy
US8780442B2 (en) 2006-12-21 2014-07-15 Howard Hughes Medical Institute Optical interfering apparatus
US20080158551A1 (en) * 2006-12-21 2008-07-03 Hess Harald F Systems and methods for 3-dimensional interferometric microscopy
US20110170200A1 (en) * 2006-12-21 2011-07-14 Howard Hughes Medical Institute Systems and Methods for 3-Dimensional Interferometric Microscopy
US9482512B2 (en) 2006-12-21 2016-11-01 Howard Hughes Medical Institute Methods for 3-dimensional interferometric microscopy
US9127925B2 (en) 2006-12-21 2015-09-08 Howard Hughes Medical Institute Method of 3-dimensional imaging of activated samples
US7554654B2 (en) 2007-01-26 2009-06-30 Kla-Tencor Corporation Surface characteristic analysis
US20080180656A1 (en) * 2007-01-26 2008-07-31 Kla-Tencor Technologies Corporation Surface characteristic analysis
US7656519B2 (en) 2007-08-30 2010-02-02 Kla-Tencor Corporation Wafer edge inspection
US20090059236A1 (en) * 2007-08-30 2009-03-05 Kla-Tencor Technologies Corporation Wafer Edge Inspection
US20110122418A1 (en) * 2009-11-20 2011-05-26 Mitutoyo Corporation Apparatus for determining a height map of a surface through both interferometric and non-interferometric measurements
US8547557B2 (en) * 2009-11-20 2013-10-01 Mitutoyo Corporation Apparatus for determining a height map of a surface through both interferometric and non-interferometric measurements
US9041924B2 (en) * 2011-06-23 2015-05-26 Seiko Epson Corporation Transmissive diffraction grating and detection apparatus
US20120327412A1 (en) * 2011-06-23 2012-12-27 Seiko Epson Corporation Transmissive diffraction grating and detection apparatus
CN102841395A (zh) * 2011-06-23 2012-12-26 精工爱普生株式会社 透射式衍射光栅以及检测装置
CN102841395B (zh) * 2011-06-23 2017-03-01 精工爱普生株式会社 透射式衍射光栅以及检测装置
US9759545B2 (en) 2013-01-24 2017-09-12 Hitachi-Lg Data Storage, Inc. Optical tomograph and optical tomographic method
US20190057910A1 (en) * 2016-03-29 2019-02-21 Applied Materials, Inc. Metrology systems for substrate stress and deformation measurement
US10510624B2 (en) * 2016-03-29 2019-12-17 Applied Materials, Inc. Metrology systems with multiple derivative modules for substrate stress and deformation measurement
US10094648B2 (en) 2016-06-30 2018-10-09 Keysight Technologies, Inc. Homodyne optical sensor system incorporating a multi-phase beam combining system
US10809193B2 (en) 2018-04-06 2020-10-20 Asml Netherlands B.V. Inspection apparatus having non-linear optics

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