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TWM512219U - Light-emitting diode - Google Patents

Light-emitting diode Download PDF

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Publication number
TWM512219U
TWM512219U TW104203021U TW104203021U TWM512219U TW M512219 U TWM512219 U TW M512219U TW 104203021 U TW104203021 U TW 104203021U TW 104203021 U TW104203021 U TW 104203021U TW M512219 U TWM512219 U TW M512219U
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Taiwan
Prior art keywords
light
emitting diode
top surface
substrate
convex arc
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TW104203021U
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Chinese (zh)
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Te-En Tsao
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Te-En Tsao
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Priority to TW104203021U priority Critical patent/TWM512219U/en
Publication of TWM512219U publication Critical patent/TWM512219U/en

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Abstract

A light-emitting diode is described, which includes a substrate and an illumination structure. The substrate has a first top surface and a first bottom surface opposite to each other, and a first side surface connected between the first top surface and the first bottom surface. The illumination structure has a second top surface and a second bottom surface opposite to each other, and a second side surface connected between the second top surface and the second bottom surface. The first side surface and the second side surface connected to each other to form a third side surface. The third side surface includes a protruding curve portion surrounding and connected to the second top surface.

Description

發光二極體Light-emitting diode

本新型是有關於一種發光元件,且特別是有關於一種發光二極體。The present invention relates to a light-emitting element, and more particularly to a light-emitting diode.

請同時參照圖1A與圖1B,其係繪示一種發光二極體的製程局部立體圖。一般而言,製作發光二極體晶圓100時,先提供基板102。此基板102通常係由藍寶石所組成。接下來,利用磊晶成長方式,於基板102上形成發光結構104,其中發光結構104可運用光電效應而發出光。如圖1A所示,待發光結構104形成後,利用微影蝕刻技術在發光結構104之頂部中形成複數個縱橫交錯的切割道106。每相鄰之二縱向的切割道106與相鄰之二橫向的切割道106共同定義出一發光二極體108。Please refer to FIG. 1A and FIG. 1B simultaneously, which are partial perspective views of a process of a light-emitting diode. In general, when the light emitting diode wafer 100 is fabricated, the substrate 102 is first provided. This substrate 102 is typically composed of sapphire. Next, a light-emitting structure 104 is formed on the substrate 102 by means of epitaxial growth, wherein the light-emitting structure 104 can emit light by using a photoelectric effect. As shown in FIG. 1A, after the light-emitting structure 104 is formed, a plurality of criss-crossing dicing streets 106 are formed in the top of the light-emitting structure 104 by a lithography technique. Each adjacent two longitudinal scribe lines 106 define a light emitting diode 108 in conjunction with two adjacent transverse scribe lines 106.

在發光結構104上設置切割道106後,可先從發光二極體晶圓100之底面對基板102進行研磨,來薄化基板102,以利後續之崩裂製程的進行。完成基板102之厚度的縮減程序後,可直接進行切割製程,而將發光二極體晶圓100分割出許多的發光二極體108,如圖1B所示。這些發光 二極體108再經後續之點測、分類及封裝處理後,即可作為光源而供實際應用。After the dicing street 106 is disposed on the light emitting structure 104, the substrate 102 may be polished from the bottom surface of the light emitting diode wafer 100 to thin the substrate 102 to facilitate the subsequent cracking process. After the reduction process of the thickness of the substrate 102 is completed, the cutting process can be directly performed, and the light-emitting diode wafer 100 is divided into a plurality of light-emitting diodes 108 as shown in FIG. 1B. These lights After the subsequent measurement, classification and encapsulation processing, the diode 108 can be used as a light source for practical applications.

在傳統之切割製程中,一般係以一劈刀自每一切割道106上,直接施加垂直應力,以崩裂發光二極體晶圓100,而可分割出許多的發光二極體108。然而,由於藍寶石所構成之基板102與發光結構104之內應力分布具有明顯差異,因此這樣傳統之發光二極體108的分割技術並無法完全確保每次之崩裂面均係自每一切割道106垂直向下。In a conventional cutting process, a vertical stress is applied directly from each of the dicing streets 106 with a file to break up the light-emitting diode wafer 100, and a plurality of light-emitting diodes 108 can be divided. However, since the stress distribution in the substrate 102 and the light-emitting structure 104 composed of sapphire is significantly different, the division technique of the conventional light-emitting diode 108 cannot completely ensure that each cracked surface is from each of the cutting streets 106. Vertical down.

此外,在這樣的切割方式中,分離界面通常呈破碎不規則狀,因而造成切割成功率下降,而導致切割良率降低,進而造成產量減少。此外,利用此切割技術所獲得之發光二極體108結構呈矩形體結構,其側壁為垂直狀,因此發光結構104所發出之光從發光二極體108之側面出射時,極有可能在發光二極體108之側面處產生全反射,而影響發光二極體108之側面的光取出率,進而降低發光二極體108之發光亮度。Further, in such a cutting method, the separation interface is usually broken and irregular, thereby causing a decrease in the cutting success rate, resulting in a decrease in the cutting yield, which in turn causes a decrease in the yield. In addition, the light-emitting diode 108 obtained by the cutting technique has a rectangular structure and its sidewall is vertical. Therefore, when the light emitted by the light-emitting structure 104 is emitted from the side of the light-emitting diode 108, it is highly likely to be illuminated. Total reflection occurs at the side of the diode 108, which affects the light extraction rate of the side surface of the light-emitting diode 108, thereby reducing the light-emitting luminance of the light-emitting diode 108.

因此,亟需一種發光二極體之製作技術,可順利製作出高亮度之發光二極體。Therefore, there is a need for a light-emitting diode manufacturing technique that can smoothly produce a high-luminance light-emitting diode.

因此,本新型之一目的就是在提供一種發光二極體,其發光結構與基板之堆疊結構的側面包含凸弧部接合且環繞發光結構之頂面。藉此凸弧部的設計,可增加發光二極體之側面結構的表面積,且具有凸弧部的側面可減輕發光 二極體內部之全反射臨界角的限制,而可提高發光二極體之光取出效率。Therefore, an object of the present invention is to provide a light-emitting diode having a light-emitting structure and a side surface of a stacked structure of a substrate including a convex arc portion and surrounding a top surface of the light-emitting structure. Thereby, the design of the convex arc portion can increase the surface area of the side structure of the light-emitting diode, and the side having the convex arc portion can reduce the light emission. The limitation of the total reflection critical angle inside the diode can improve the light extraction efficiency of the light-emitting diode.

本新型之另一目的是在提供一種發光二極體,其側面之凸弧狀部可增加發光二極體之側面的出光面積及出光角度,因此可提高發光二極體之發光亮度。Another object of the present invention is to provide a light-emitting diode in which the convex arc portion on the side surface can increase the light-emitting area and the light-emitting angle of the side surface of the light-emitting diode, thereby improving the light-emitting luminance of the light-emitting diode.

本新型之又一目的是在提供一種發光二極體,其容易製作,因此可提升製程良率。Still another object of the present invention is to provide a light-emitting diode which is easy to fabricate and thus improves process yield.

根據本新型之上述目的,提出一種發光二極體。此發光二極體包含基板以及發光結構。基板具有相對之第一頂面與第一底面、以及第一側面接合該第一頂面與第一底面之間。發光結構具有相對之第二頂面與第二底面、第二側面接合在第二頂面與第二底面之間,其中第二底面與第一頂面接合,且第一側面與第二側面互相接合而構成第三側面。第三側面包含凸弧狀部環繞第二頂面且與第二頂面接合。According to the above object of the present invention, a light-emitting diode is proposed. The light emitting diode includes a substrate and a light emitting structure. The substrate has a first top surface opposite to the first bottom surface and a first side surface joined between the first top surface and the first bottom surface. The light emitting structure has an opposite second top surface and a second bottom surface, and the second side surface is joined between the second top surface and the second bottom surface, wherein the second bottom surface is joined to the first top surface, and the first side surface and the second side surface are mutually Engaged to form a third side. The third side includes a convex arc surrounding the second top surface and engaging the second top surface.

依據本新型之一實施例,上述之凸弧狀部為一圓弧部。According to an embodiment of the present invention, the convex arc portion is a circular arc portion.

依據本新型之另一實施例,上述之凸弧狀部自第二頂面與該第二側面之接合處延伸經過該第二側面而至該第一側面的至少一部分。In accordance with another embodiment of the present invention, the convex arcuate portion extends from the junction of the second top surface and the second side surface through the second side surface to at least a portion of the first side surface.

依據本新型之又一實施例,上述之第三側面更包含直線部與凸弧狀部接合,且介於凸弧狀部與第一底面之間。According to still another embodiment of the present invention, the third side surface further includes a straight portion joined to the convex arc portion and interposed between the convex arc portion and the first bottom surface.

依據本新型之再一實施例,上述之直線部與第一底面實質垂直。According to still another embodiment of the present invention, the straight portion is substantially perpendicular to the first bottom surface.

依據本新型之再一實施例,上述之直線部為第一側面的一部分。According to still another embodiment of the present invention, the straight portion is a part of the first side.

依據本新型之再一實施例,上述之第三側面更包含傾斜部與直線部接合,傾斜部由直線部向內傾斜至第一底面。According to still another embodiment of the present invention, the third side surface further includes an inclined portion joined to the straight portion, and the inclined portion is inclined inward from the straight portion to the first bottom surface.

依據本新型之再一實施例,上述之傾斜部為第一側面的一部分。According to still another embodiment of the present invention, the inclined portion is a part of the first side.

100‧‧‧發光二極體晶圓100‧‧‧Light Emitting Diode Wafer

102‧‧‧基板102‧‧‧Substrate

104‧‧‧發光結構104‧‧‧Lighting structure

106‧‧‧切割道106‧‧‧Cut Road

108‧‧‧發光二極體108‧‧‧Lighting diode

200‧‧‧發光二極體200‧‧‧Lighting diode

202‧‧‧基板202‧‧‧Substrate

204‧‧‧發光結構204‧‧‧Lighting structure

206‧‧‧第一頂面206‧‧‧First top surface

208‧‧‧第一底面208‧‧‧ first bottom surface

210‧‧‧第一側面210‧‧‧ first side

212‧‧‧第二頂面212‧‧‧Second top

214‧‧‧第二底面214‧‧‧second bottom surface

216‧‧‧第二側面216‧‧‧ second side

218‧‧‧第三側面218‧‧‧ third side

220‧‧‧凸弧狀部220‧‧‧ convex arc

222‧‧‧直線部222‧‧‧ Straight line

224‧‧‧傾斜部224‧‧‧ inclined section

226‧‧‧切割道226‧‧‧ cutting road

228‧‧‧緩衝層228‧‧‧buffer layer

230‧‧‧崩裂道230‧‧‧Cracking Road

232‧‧‧崩裂道232‧‧‧Cracking Road

234‧‧‧轉換膠膜234‧‧‧Transfer film

236‧‧‧應力236‧‧‧ stress

為讓本新型之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:〔圖1A〕與〔圖1B〕係繪示一種發光二極體的製程局部立體圖;〔圖2〕係繪示依照本新型之一實施方式的一種發光二極體之剖面示意圖;以及〔圖3A〕至〔圖3F〕係繪示依照本新型之一實施方式的一種發光二極體之製程剖面圖。In order to make the above and other objects, features, advantages and embodiments of the present invention more obvious, the description of the drawings is as follows: [FIG. 1A] and [FIG. 1B] show a partial process of a light-emitting diode. FIG. 2 is a schematic cross-sectional view showing a light emitting diode according to an embodiment of the present invention; and FIG. 3A to FIG. 3F are diagrams showing a light emitting diode according to an embodiment of the present invention. Process profile of the polar body.

請參照圖2,其係繪示依照本新型之一實施方式的一種發光二極體之剖面示意圖。在一實施方式中,發光二 極體200主要包含基板202與發光結構204。在一些例子中,基板202之材質可例如為藍寶石或碳化矽(SiC)。基板202具有第一頂面206、第一底面208與第一側面210。第一頂面206與第一底面208分別位於基板202之相對二側。而第一側面210則接合在第一頂面206與第一底面208之間,即第一側面210之頂邊和底邊分別與第一頂面206之邊緣和第一底面208之邊緣對應接合。Please refer to FIG. 2 , which is a cross-sectional view of a light emitting diode according to an embodiment of the present invention. In an embodiment, the light emitting two The polar body 200 mainly includes a substrate 202 and a light emitting structure 204. In some examples, the material of the substrate 202 can be, for example, sapphire or tantalum carbide (SiC). The substrate 202 has a first top surface 206, a first bottom surface 208 and a first side surface 210. The first top surface 206 and the first bottom surface 208 are respectively located on opposite sides of the substrate 202. The first side surface 210 is joined between the first top surface 206 and the first bottom surface 208, that is, the top side and the bottom side of the first side surface 210 are respectively engaged with the edge of the first top surface 206 and the edge of the first bottom surface 208. .

發光結構204設於基板202之第一頂面206上。在一些例子中,發光結構204可為磊晶結構,且主要可包含依序堆疊在基板202之第一頂面206上的第一電性半導體層、主動層以及第二電性半導體層(未繪示於圖中),其中第一電性與第二電性中之一者可為N型,另一者可為P型。發光結構204可運用光電效應而發出光。發光結構204具有第二頂面212、第二底面214與第二側面216。第二頂面212與第二底面214分別位於發光結構204之相對二側。而第二側面216則接合在第二頂面212與第二底面214之間,即第二側面216之頂邊和底邊分別與第二頂面212之邊緣和第二底面214之邊緣對應接合。The light emitting structure 204 is disposed on the first top surface 206 of the substrate 202. In some examples, the light emitting structure 204 can be an epitaxial structure, and can mainly include a first electrical semiconductor layer, an active layer, and a second electrical semiconductor layer that are sequentially stacked on the first top surface 206 of the substrate 202 (not The figure is shown in the figure, wherein one of the first electrical property and the second electrical property may be an N-type, and the other may be a P-type. The light emitting structure 204 can emit light using a photoelectric effect. The light emitting structure 204 has a second top surface 212, a second bottom surface 214, and a second side surface 216. The second top surface 212 and the second bottom surface 214 are respectively located on opposite sides of the light emitting structure 204. The second side 216 is joined between the second top surface 212 and the second bottom surface 214, that is, the top side and the bottom side of the second side surface 216 are respectively engaged with the edge of the second top surface 212 and the edge of the second bottom surface 214. .

在發光二極體200中,基板202之第一側面210與發光結構204之第二側面216互相延伸接合而構成第三側面218。發光二極體200之第三側面218包含凸弧狀部220,其中此凸弧狀部220與發光結構204之第二頂面212接合,即自第二頂面212之邊緣延伸至基板202之第一側面210。此外,凸弧狀部220呈環狀,而環繞發光結構204之第二頂 面212。在一些示範例子中,凸弧狀部220為圓弧部,即凸弧狀部220具有固定之曲率半徑。In the light emitting diode 200, the first side surface 210 of the substrate 202 and the second side surface 216 of the light emitting structure 204 extend to each other to form a third side surface 218. The third side 218 of the LED 200 includes a convex arc 220, wherein the convex arc 220 is joined to the second top surface 212 of the light emitting structure 204, that is, from the edge of the second top surface 212 to the substrate 202. First side 210. In addition, the convex arc portion 220 is annular, and surrounds the second top of the light emitting structure 204. Face 212. In some exemplary examples, the convex arc 220 is a circular arc portion, that is, the convex arc portion 220 has a fixed radius of curvature.

請再次參照圖2,在一些例子中,凸弧狀部220自發光結構204之第二頂面212與第二側面216之接合處延伸經過第二側面216而至基板202之第一側面210的至少一部分。也就是說,整個第二側面216與至少一部分之第一側面210構成凸弧狀部220。在一些特定例子中,凸弧狀部220可自發光結構204之第二頂面212與第二側面216之接合處延伸至基板202之第一底面208,即整個第二側面216與整個第一側面210構成凸弧狀部220。Referring again to FIG. 2, in some examples, the convex arc 220 extends from the junction of the second top surface 212 and the second side 216 of the light emitting structure 204 through the second side 216 to the first side 210 of the substrate 202. At least part. That is, the entire second side 216 and at least a portion of the first side 210 form a convex arc 220. In some specific examples, the convex arc 220 can extend from the junction of the second top surface 212 and the second side 216 of the light emitting structure 204 to the first bottom surface 208 of the substrate 202, ie, the entire second side 216 and the entire first The side surface 210 constitutes a convex arc portion 220.

在另一些例子中,除了凸弧狀部220外,發光二極體200之第三側面218更可包含直線部222。直線部222與凸弧狀部220接合,且介於凸弧狀部220與基板202之第一底面208之間。直線部222可例如與第一底面208實質垂直。當然,直線部222亦可沒有與第一底面208垂直。在第三側面218包含直線部222的例子中,直線部222為基板202之第一側面210的一部分,且直線部222與部分之凸弧狀部220構成第一側面210。In other examples, in addition to the convex arc 220, the third side 218 of the LED 200 may further include a straight portion 222. The straight portion 222 is joined to the convex arc portion 220 and between the convex arc portion 220 and the first bottom surface 208 of the substrate 202. The straight portion 222 can be substantially perpendicular to the first bottom surface 208, for example. Of course, the straight portion 222 may not be perpendicular to the first bottom surface 208. In the example in which the third side surface 218 includes the straight portion 222, the straight portion 222 is a portion of the first side surface 210 of the substrate 202, and the straight portion 222 and the portion of the convex arc portion 220 constitute the first side surface 210.

在一些例子中,直線部222自凸弧狀部220延伸至基板202之第一底面208。然,如圖2所示,在另一些例子中,發光二極體200之第三側面218可進一步包含傾斜部224。傾斜部224與直線部222接合,且介於直線部222與基板202之第一底面208之間。傾斜部224由直線部222向內傾斜至基板202之第一底面208。在第三側面218包含傾斜部 224的例子中,傾斜部224為基板202之第一側面210的一部分。若第三側面218同時包含直線部222與傾斜部224時,傾斜部224、直線部222與部分之凸弧狀部220構成第一側面210。舉例而言,第一側面210之傾斜部224可為基板202經雷射切割、鑽石刀切割或砂輪切割所形成之傾斜面。In some examples, the straight portion 222 extends from the convex arc portion 220 to the first bottom surface 208 of the substrate 202. However, as shown in FIG. 2, in other examples, the third side 218 of the LED 200 can further include an inclined portion 224. The inclined portion 224 is joined to the straight portion 222 and is interposed between the straight portion 222 and the first bottom surface 208 of the substrate 202. The inclined portion 224 is inclined inward by the straight portion 222 to the first bottom surface 208 of the substrate 202. The third side 218 includes a slope In the example of 224, the sloped portion 224 is part of the first side 210 of the substrate 202. When the third side surface 218 includes the straight portion 222 and the inclined portion 224 at the same time, the inclined portion 224, the straight portion 222, and the portion of the convex arc portion 220 constitute the first side surface 210. For example, the inclined portion 224 of the first side surface 210 may be an inclined surface formed by the substrate 202 by laser cutting, diamond knife cutting or grinding wheel cutting.

第一底面208之長度或寬度可分別比第二頂面212之長度或寬度大。在一些示範例子中,第二頂面212之長度或寬度可為100μm至2000μm,第一底面208之長度或寬度可為101μm至2001μm。在一些特定例子中,發光二極體200之高度,即從第二頂面212至第一底面208之距離,可例如為50μm至200μm,傾斜部224之高度可例如為20μm至80μm。傾斜部224之高度可例如為發光二極體200之高度的1/4至1/2。The length or width of the first bottom surface 208 can be greater than the length or width of the second top surface 212, respectively. In some exemplary examples, the second top surface 212 may have a length or width of from 100 μm to 2000 μm, and the first bottom surface 208 may have a length or width of from 101 μm to 2001 μm. In some specific examples, the height of the light emitting diode 200, that is, the distance from the second top surface 212 to the first bottom surface 208, may be, for example, 50 μm to 200 μm, and the height of the inclined portion 224 may be, for example, 20 μm to 80 μm. The height of the inclined portion 224 may be, for example, 1/4 to 1/2 of the height of the light emitting diode 200.

藉由使發光二極體200包含接合且環繞發光結構204之第二頂面212的凸弧狀部220,可增加發光二極體200之側面的表面積,並可減輕發光二極體200內部之全反射臨界角的限制,進而可達到提高發光二極體200之光取出效率的效果。By causing the light emitting diode 200 to include the convex arc portion 220 that joins and surrounds the second top surface 212 of the light emitting structure 204, the surface area of the side surface of the light emitting diode 200 can be increased, and the inside of the light emitting diode 200 can be reduced. The limitation of the total reflection critical angle can further improve the light extraction efficiency of the light-emitting diode 200.

請參照圖3A至3F,其係繪示依照之一實施方式的一種發光二極體之製程剖面圖。製作本新型之發光二極體200(請參照圖2)時,首先提供基板202,其中基板202具有第一頂面206與第一底面208。再利用例如磊晶成長方式,於基板202上形成發光結構204。發光結構204可包含依序堆疊在基板202之第一頂面206上的第一電性半導體層、主 動層以及第二電性半導體層。發光結構204具有第二頂面212與第二底面214。3A to 3F are cross-sectional views showing a process of a light emitting diode according to an embodiment. When fabricating the novel LED 200 (see FIG. 2), a substrate 202 is first provided, wherein the substrate 202 has a first top surface 206 and a first bottom surface 208. The light emitting structure 204 is formed on the substrate 202 by, for example, epitaxial growth. The light emitting structure 204 can include a first electrical semiconductor layer, which is sequentially stacked on the first top surface 206 of the substrate 202, and a main a moving layer and a second electrical semiconductor layer. The light emitting structure 204 has a second top surface 212 and a second bottom surface 214.

接下來,利用例如微影與蝕刻技術在發光結構204之第二頂面212中形成多個縱橫交錯之切割道226,其中每相鄰之二縱向的切割道226與相鄰之二橫向的切割道226共同定義出一發光二極體200。接著,選擇性地,可利用例如塗佈或沉積等方式,形成緩衝層228於發光結構204之第二頂面212上,並覆蓋在切割道226上,如第3A圖所示。緩衝層228之材質可例如為光阻、金屬、氧化物或上述材料之組合。緩衝層228可在後續之切割製程中,提供發光結構204與切割器具之間的緩衝。Next, a plurality of crisscrossed dicing streets 226 are formed in the second top surface 212 of the light emitting structure 204 using, for example, lithography and etching techniques, wherein each adjacent two longitudinal dicing streets 226 and adjacent two transverse dicing The track 226 collectively defines a light emitting diode 200. Next, a buffer layer 228 can be selectively formed on the second top surface 212 of the light emitting structure 204 by, for example, coating or deposition, and overlying the scribe line 226, as shown in FIG. 3A. The material of the buffer layer 228 can be, for example, a photoresist, a metal, an oxide, or a combination of the above. The buffer layer 228 can provide cushioning between the light emitting structure 204 and the cutting instrument during subsequent cutting processes.

接著,如圖3B所示,利用例如雷射切割技術、鑽石刀切割技術、砂輪切割技術或上述技術之組合,進行切割製程,以在發光結構204之第二頂面212的切割道226中形成多個崩裂道230,其中這些崩裂道230分別延伸在切割道226中。這些崩裂道230之寬度小於切割道226之寬度,崩裂道230之深度小於發光結構204之厚度,亦即此道切割製程並未將發光結構204完全切開。完成切割製程後,利用例如剝除方式,移除緩衝層228。Next, as shown in FIG. 3B, a cutting process is performed using, for example, a laser cutting technique, a diamond knife cutting technique, a grinding wheel cutting technique, or a combination of the above techniques to form in the cutting lane 226 of the second top surface 212 of the light emitting structure 204. A plurality of cracking channels 230, wherein the cracking channels 230 extend in the cutting lanes 226, respectively. The width of the cracking channels 230 is smaller than the width of the cutting track 226. The depth of the cracking channels 230 is smaller than the thickness of the light emitting structure 204, that is, the cutting process does not completely cut the light emitting structure 204. After the cutting process is completed, the buffer layer 228 is removed using, for example, a stripping method.

如圖3C所示,選擇性地,可利用例如化學機械研磨(CMP)的方式,從基板202之第一底面208移除基板202的一部分厚度,藉此縮減基板202之厚度,以利後續崩裂製程的進行。As shown in FIG. 3C, optionally, a portion of the thickness of the substrate 202 may be removed from the first bottom surface 208 of the substrate 202 by, for example, chemical mechanical polishing (CMP), thereby reducing the thickness of the substrate 202 for subsequent cracking. The process is carried out.

接下來,可利用例如雷射切割技術、鑽石刀切割技術、砂輪切割技術或上述技術之組合,再進行一道切割製程,以在基板202之第一底面208中形成多個延伸之崩裂道232。如圖3D所示,這些崩裂道232分別對應於發光結構204之第二頂面212中的崩裂道230,每一崩裂道232與對應之崩裂道230之間相隔一預設水平距離,且在每個發光二極體200中,相較對應之崩裂道230,崩裂道232位於比較偏內的位置。應該注意的一點是,上述實施例雖係先形成崩裂道230,再形成崩裂道232,但是本新型亦可先形成崩裂道232,再形成崩裂道230。Next, a cutting process can be performed using, for example, a laser cutting technique, a diamond knife cutting technique, a grinding wheel cutting technique, or a combination of the above techniques to form a plurality of extended breaching channels 232 in the first bottom surface 208 of the substrate 202. As shown in FIG. 3D, the cracking channels 232 respectively correspond to the cracking channels 230 in the second top surface 212 of the light emitting structure 204, and each of the cracking channels 232 is separated from the corresponding cracking channel 230 by a predetermined horizontal distance, and In each of the light-emitting diodes 200, the cracking path 232 is located at a relatively off-center position than the corresponding cracking path 230. It should be noted that although the above embodiment first forms the cracking path 230 and then forms the cracking path 232, the present invention may also form the cracking path 232 first, and then form the cracking path 230.

完成崩裂道230與232的切割後,可先選擇性地在基板202之第一底面208上貼覆轉換膠膜234。隨後,如圖3E所示,可例如將劈刀(未繪示)置於切割道226上,再利用此劈刀自每一崩裂道230垂直向下而朝對應之崩裂道232施加應力236,可崩解而形成許多的發光二極體200,如圖3F所示。圖3F中所示之發光二極體200與前述圖2中所示之發光二極體200相同,故於此不再重複圖3F之發光二極體200在結構、材質與尺寸等的細節。After the cleavage of the rupture channels 230 and 232 is completed, the conversion film 234 may be selectively applied to the first bottom surface 208 of the substrate 202. Subsequently, as shown in FIG. 3E, for example, a file (not shown) can be placed on the cutting path 226, and then the blade is used to apply a stress 236 vertically downward from each of the cracking channels 230 toward the corresponding cracking path 232. A plurality of light-emitting diodes 200 are formed by disintegration, as shown in Fig. 3F. The light-emitting diode 200 shown in FIG. 3F is the same as the light-emitting diode 200 shown in FIG. 2 above, so the details of the structure, material, size, and the like of the light-emitting diode 200 of FIG. 3F are not repeated here.

由於每一崩裂道230與對應之崩裂道232並非上下正對,而是相隔有一段水平距離,再加上崩裂道232相對於對應之崩裂道230係位於發光二極體200之較內側之處,因此發光結構204與基板202所構成之堆疊結構的裂解路徑係從崩裂道230以一弧狀曲線延伸至對應之崩裂道234。如此一來,可使裂解出來之發光二極體200之第三側 面218具有與發光結構204之第二頂面212接合且環繞第二頂面212的凸弧狀部220。待崩裂製程完成後,即可將轉換膠膜234予已移除。Since each of the cracking lanes 230 and the corresponding cracking lanes 232 are not vertically opposed, but are separated by a horizontal distance, and the cracking lanes 232 are located at the inner side of the light-emitting diodes 200 with respect to the corresponding cracking channels 230. Therefore, the cracking path of the stacked structure formed by the light emitting structure 204 and the substrate 202 extends from the cracking path 230 in an arcuate curve to the corresponding cracking path 234. In this way, the third side of the light-emitting diode 200 that can be cracked can be obtained. The face 218 has a convex arc 220 that engages the second top surface 212 of the light emitting structure 204 and surrounds the second top surface 212. After the cracking process is completed, the conversion film 234 can be removed.

由上述之實施方式可知,本新型之一優點就是因為本新型之發光二極體之發光結構與基板之堆疊結構的側面包含凸弧部接合且環繞發光結構之頂面。藉此凸弧部的設計,可增加發光二極體之側面結構的表面積,且具有凸弧部的側面可減輕發光二極體內部之全反射臨界角的限制,而可提高發光二極體之光取出效率。It can be seen from the above embodiments that one of the advantages of the present invention is that the light-emitting structure of the light-emitting diode of the present invention and the side surface of the stacked structure of the substrate include the convex arc portion and surround the top surface of the light-emitting structure. Thereby, the design of the convex arc portion can increase the surface area of the side structure of the light-emitting diode, and the side surface having the convex arc portion can reduce the limitation of the total reflection critical angle inside the light-emitting diode, and can improve the light-emitting diode. Light extraction efficiency.

由上述之實施方式可知,本新型之另一優點就是因為本新型之發光二極體之側面的凸弧狀部可增加發光二極體之側面的出光面積及出光角度,因此可提高發光二極體之發光亮度。It can be seen from the above embodiments that another advantage of the present invention is that the convex arc portion on the side of the light-emitting diode of the present invention can increase the light-emitting area and the light-emitting angle of the side surface of the light-emitting diode, thereby improving the light-emitting diode. The brightness of the body.

由上述之實施方式可知,本新型之又一優點就是因為本新型之發光二極體容易製作,因此可提升製程良率。It can be seen from the above embodiments that another advantage of the present invention is that the luminous diode of the present invention can be easily fabricated, thereby improving the process yield.

雖然本新型已以實施例揭露如上,然其並非用以限定本新型,任何在此技術領域中具有通常知識者,在不脫離本新型之精神和範圍內,當可作各種之更動與潤飾,因此本新型之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of this new type is subject to the definition of the scope of the patent application.

200‧‧‧發光二極體200‧‧‧Lighting diode

202‧‧‧基板202‧‧‧Substrate

204‧‧‧發光結構204‧‧‧Lighting structure

206‧‧‧第一頂面206‧‧‧First top surface

208‧‧‧第一底面208‧‧‧ first bottom surface

210‧‧‧第一側面210‧‧‧ first side

212‧‧‧第二頂面212‧‧‧Second top

214‧‧‧第二底面214‧‧‧second bottom surface

216‧‧‧第二側面216‧‧‧ second side

218‧‧‧第三側面218‧‧‧ third side

220‧‧‧凸弧狀部220‧‧‧ convex arc

222‧‧‧直線部222‧‧‧ Straight line

224‧‧‧傾斜部224‧‧‧ inclined section

Claims (8)

一種發光二極體,包含:一基板,具有相對之一第一頂面與一第一底面、以及一第一側面接合在該第一頂面與該第一底面之間;以及一發光結構,具有相對之一第二頂面與一第二底面、一第二側面接合在該第二頂面與該第二底面之間,其中該第二底面與該第一頂面接合,且該第一側面與該第二側面互相接合而構成一第三側面,其中該第三側面包含一凸弧狀部環繞該第二頂面且與該第二頂面接合。A light emitting diode comprising: a substrate having a first top surface and a first bottom surface, and a first side surface joined between the first top surface and the first bottom surface; and a light emitting structure, Having a second top surface and a second bottom surface and a second side joined between the second top surface and the second bottom surface, wherein the second bottom surface is joined to the first top surface, and the first The side surface and the second side surface are joined to each other to form a third side surface, wherein the third side surface includes a convex arc portion surrounding the second top surface and engaging the second top surface. 如申請專利範圍第1項之發光二極體,其中該凸弧狀部為一圓弧部。The light-emitting diode of claim 1, wherein the convex arc portion is a circular arc portion. 如申請專利範圍第1項之發光二極體,其中該凸弧狀部自該第二頂面與該第二側面之接合處延伸經過該第二側面而至該第一側面的至少一部分。The illuminating diode of claim 1, wherein the convex arc extends from the junction of the second top surface and the second side through the second side to at least a portion of the first side. 如申請專利範圍第1項之發光二極體,其中該第三側面更包含一直線部與該凸弧狀部接合,且介於該凸弧狀部與該第一底面之間。The light-emitting diode of claim 1, wherein the third side further comprises a straight line portion joined to the convex arc portion and interposed between the convex arc portion and the first bottom surface. 如申請專利範圍第4項之發光二極體,其中該直線部與該第一底面實質垂直。The light-emitting diode of claim 4, wherein the straight portion is substantially perpendicular to the first bottom surface. 如申請專利範圍第4項之發光二極體,其中該直線部為該第一側面的一部分。The light-emitting diode of claim 4, wherein the straight portion is a part of the first side. 如申請專利範圍第4項之發光二極體,其中該第三側面更包含一傾斜部與該直線部接合,該傾斜部由該直線部向內傾斜至該第一底面。The light-emitting diode of claim 4, wherein the third side further comprises an inclined portion joined to the straight portion, the inclined portion being inclined inward from the straight portion to the first bottom surface. 如申請專利範圍第7項之發光二極體,其中該傾斜部為該第一側面的一部分。The light-emitting diode of claim 7, wherein the inclined portion is a part of the first side.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI657592B (en) * 2017-08-24 2019-04-21 日商創光科學股份有限公司 Manufacturing method of nitride semiconductor ultraviolet light emitting element and nitride semiconductor ultraviolet light emitting element
TWI719141B (en) * 2016-09-27 2021-02-21 日商創光科學股份有限公司 Manufacturing method of nitride semiconductor ultraviolet light emitting element and nitride semiconductor ultraviolet light emitting element

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI719141B (en) * 2016-09-27 2021-02-21 日商創光科學股份有限公司 Manufacturing method of nitride semiconductor ultraviolet light emitting element and nitride semiconductor ultraviolet light emitting element
TWI657592B (en) * 2017-08-24 2019-04-21 日商創光科學股份有限公司 Manufacturing method of nitride semiconductor ultraviolet light emitting element and nitride semiconductor ultraviolet light emitting element
US10505087B2 (en) 2017-08-24 2019-12-10 Soko Kagaku Co., Ltd. Method for manufacturing nitride semiconductor ultraviolet light-emitting element and nitride semiconductor ultraviolet light-emitting element

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