TWI845977B - Writing apparatus and writing method - Google Patents

Abstract

A writing apparatus (1) includes writing heads (41), a first stage (21a) and a second stage (21b), and a first distance sensor (5). Sensor elements (51) included in the first distance sensor (5) obtain distances to measurement positions on a substrate (9) held on one stage while pattern writing is performed on a substrate (9) held on the other stage. A writing head (41) includes a second distance sensor obtaining a distance to a measurement position on the substrate (9) on which pattern writing is performed. A focus control part included in a control part (10) controls a focus position of a light emitted from the writing head (41) with using information obtained by the first distance sensor (5) from a substrate (9) before pattern writing and information obtained by the second distance sensor while pattern writing is performed on the substrate (9).

Description

Drawing device and drawing method

The present invention relates to a technology that irradiates light onto a substrate to draw a pattern on the substrate.

[References to related applications]

This application claims priority to Japanese patent application JP2021-137767 filed on August 26, 2021, and all disclosures of Japanese patent application JP2021-137767 are incorporated herein.

In the past, patterns were drawn by irradiating light onto a semiconductor substrate, printed circuit board, organic EL (electroluminescence) display device, or glass substrate for liquid crystal display (hereinafter including the layer of photosensitive material and collectively referred to as "substrate") having a layer of photosensitive material on the surface. In such a drawing device, the substrate is brought in, aligned, drawn on, and unloaded in sequence.

In recent years, in order to improve the throughput (the number of substrates processed per unit time) of the drawing device, the following technology has been proposed: two substrate holders and a drawing head are set in one drawing device, and the substrate on the other substrate holder is replaced and aligned while the substrate on one substrate holder is being drawn.

For example, in the step and scan scanning projection exposure device of International Publication No. 2003/010802, while exposing a wafer on a stage belonging to one substrate holding portion, wafer replacement, alignment measurement, and waiting at the other stage until the exposure is completed are performed on the other stage (see FIG. 4 ).

In addition, Japanese Patent Publication No. 2014-197125 discloses an autofocus mechanism, in which a detector is provided on an optical head in a drawing device for irradiating light on a substrate to draw a pattern, and the detector is used to detect the separation distance between the optical head and the substrate, and the autofocus mechanism adjusts the focus position of the drawing light according to the separation distance. In addition, a technology is disclosed, which uses the detector of the optical head to obtain the change of the separation distance in the drawing area in advance according to the drawing area before drawing, and performs autofocus control according to the change of the separation distance during drawing.

However, in most drawing devices, an autofocus function is provided on the drawing head in order to draw the surface of the substrate with high precision. With the autofocus function, the height direction position of the image formed by the light emitted from the drawing head is correctly aligned with the height direction position of the surface of the substrate. However, since the distance sensor required for autofocus is provided on the drawing head, the measurement required for autofocus is performed after the substrate is arranged under the drawing head. Therefore, even if the substrate is arranged under the drawing head, there is a time when drawing is not performed. As a result, even if two substrate holding parts are provided, the processing volume cannot be fully increased.

The purpose of the present invention is to increase the processing capacity in a drawing device having a first substrate holding portion and a second substrate holding portion.

The present invention focuses on a drawing device that irradiates light onto a substrate to draw a pattern on the substrate. The drawing device comprises: a drawing head that emits modulated light; a first substrate holding portion that holds the first substrate; a second substrate holding portion that holds the second substrate; a moving mechanism that moves the drawing head relatively to the first substrate holding portion while the light emitted from the drawing head is drawing a pattern on the first substrate held by the first substrate holding portion, and moves the drawing head relatively to the second substrate holding portion while the light emitted from the drawing head is drawing a pattern on the second substrate held by the second substrate holding portion; a first distance measuring sensor that moves the drawing head relatively to the second substrate holding portion while the light emitted from the drawing head is drawing a pattern on the second substrate held by the second substrate holding portion; During the period when the second substrate held by the aforementioned second substrate holding portion is drawing a pattern, the first substrate held by the aforementioned first substrate holding portion is opposed to the first substrate and the distance between the first substrate and the measurement position is obtained; during the period when the first substrate held by the aforementioned first substrate holding portion is drawing a pattern, the second substrate held by the aforementioned second substrate holding portion is opposed to the second substrate and the distance between the measurement position is obtained; and a focus control portion is used to control the focus position of the light emitted from the aforementioned drawing head to be aligned with the position in the height direction of the surface of the substrate on which the aforementioned pattern is drawn during the drawing of the pattern. The drawing head includes: a second distance sensor for obtaining the distance from the measurement position on the substrate where the pattern is being drawn; and a focus changing unit for changing the focus position of the light emitted from the drawing head; the focus control unit controls the focus changing unit using information obtained from the substrate by the first distance sensor before the pattern is drawn and information obtained from the second distance sensor during the drawing of the pattern on the substrate.

According to the present invention, the processing capacity can be increased in a drawing device having a first substrate holding portion and a second substrate holding portion.

Preferably, the measurement accuracy of the first distance measuring sensor is lower than the measurement accuracy of the second distance measuring sensor.

In a preferred embodiment of the present invention, before the drawing head starts drawing a pattern on the substrate held by the first substrate holding portion or the second substrate holding portion, the focus control portion uses information obtained by the first distance measuring sensor to bring the focus position of the light emitted from the drawing head close to the height direction position of the surface of the substrate when drawing starts.

Preferably, the first distance measuring sensor is configured to locate the measurement position at a plurality of positions near the start drawing position on the substrate held by the first substrate holding portion or the second substrate holding portion, while obtaining a plurality of distances up to the plurality of the aforementioned positions; and the focus control portion uses the distance with the highest frequency among the plurality of the aforementioned distances as the distance between the first distance measuring sensor and the aforementioned substrate.

In another preferred embodiment of the present invention, the first distance measuring sensor includes a sensor element whose absolute position is fixed above the first substrate holding portion and a sensor element whose absolute position is fixed above the second substrate holding portion.

In other preferred embodiments of the present invention, the drawing device further comprises: an alignment camera, which is opposite to the first substrate held by the first substrate holding portion and photographs the alignment mark on the first substrate during the period of drawing the pattern on the second substrate held by the second substrate holding portion, and is opposite to the second substrate held by the second substrate holding portion and photographs the alignment mark on the second substrate during the period of drawing the pattern on the first substrate held by the first substrate holding portion; and a camera position switching portion, which switches the relative position of the alignment camera relative to the first substrate holding portion and the second substrate holding portion between a position opposite to the first substrate held by the first substrate holding portion and a position opposite to the second substrate held by the second substrate holding portion. The relative position of the first distance measuring sensor relative to the first substrate holding portion and the second substrate holding portion is switched between a position opposite to the first substrate and a position opposite to the second substrate together with the alignment camera by the camera position switching portion.

In another preferred embodiment of the present invention, the first distance measuring sensor is a diffuse reflection type; the focus control unit includes: a correction unit, which corrects the distance from the first distance measuring sensor to the measurement position on the substrate obtained by the first distance measuring sensor; the correction unit corrects the distance in response to the material formed on the surface of the substrate and the vicinity.

The present invention also focuses on a drawing method, which is to irradiate light onto a substrate, thereby drawing a pattern on the substrate. The drawing method comprises: step a, holding a first substrate by a first substrate holding portion; step b, obtaining a distance between the first distance measuring sensor and a measurement position on the first substrate by a first distance measuring sensor opposite to the first substrate; step c, emitting modulated light from a drawing head toward the first substrate while moving the drawing head relatively to the first substrate holding portion, thereby drawing a pattern on the first substrate; step d, holding the first substrate by a second substrate holding portion during step c; a second substrate; a step e, during the process of performing the step c, obtaining the distance between the first distance measuring sensor and the measuring position on the second substrate by the first distance measuring sensor facing the second substrate; a step f, after the steps c and e, emitting modulated light from the drawing head toward the second substrate while relatively moving the drawing head relative to the second substrate holding portion, thereby drawing a pattern on the second substrate; and a step g, repeating the steps a to f. During the process f, the steps a and b are performed on the next first substrate; after the step f and the step b on the next first substrate, the step c is performed on the next first substrate. The drawing head includes: a second distance measuring sensor, which obtains the distance to the measuring position on the substrate on which the pattern is being drawn. In the aforementioned step c, the information obtained from the aforementioned first substrate by the aforementioned first distance sensor in the aforementioned step b and the information obtained from the aforementioned second distance sensor during the period of drawing the pattern on the aforementioned first substrate are used to perform focus control so that the focus position of the light emitted from the aforementioned drawing head is aligned with the position in the height direction of the surface of the aforementioned first substrate. In the aforementioned step f, the information obtained from the aforementioned second substrate by the aforementioned first distance sensor in the aforementioned step e and the information obtained from the aforementioned second distance sensor during the period of drawing the pattern on the aforementioned second substrate are used to perform focus control so that the focus position of the light emitted from the aforementioned drawing head is aligned with the position in the height direction of the surface of the aforementioned second substrate.

The above-mentioned purpose and other purposes, features, aspects and advantages will be more clearly understood by referring to the attached drawings and the detailed description of the present invention as follows.

1: Drawing device

2: Mobile mechanism

2a: First transportation agency

2b: Second transport mechanism

3: Photography Department

4: Pattern drawing department

5: First distance sensor

7: Framework

8: Region

9: Substrate (first substrate, second substrate)

10: Control Department

12: Correction Department

21a: First stage (first substrate holding part)

21b: Second stage (second substrate holding part)

22a: First moving mechanism

22b: Second moving mechanism

31: Aim the camera

32: Camera position switching unit

33: Camera base

34,81,82,83: Arrows

35: Camera position adjustment unit

41: Drawing head

42: Drawing head moving mechanism

51:Sensor elements

71: Base

72: First elevated section

73: Second elevated section

74: Elevated section

91: Upper surface

100: Computer

101:Processor

102: Memory

103: Input and output department

104: Bus

105:Keyboard

106: Mouse

107: Display

111: Shooting Control Department

112: Position detection unit

113: Focus control unit

114: Drawing control unit

115: Memory Department

221a,221b:Guide rails

411: Light modulation element

412: Second distance sensor

413: Focus change department

S11 to S16, S21 to step S26: Step

[Figure 1] is a three-dimensional diagram of a depiction device showing one embodiment.

[Figure 2] is a diagram showing the structure of a computer.

[Figure 3] is a block diagram showing the functional configuration of the control unit and its peripherals.

[Figure 4A] is a diagram showing the flow of the operation of the depicting device.

[Figure 4B] is a diagram showing the flow of the operation of the depicting device.

[Figure 5] shows the locations of the first and second units.

[Figure 6] shows the locations of the first and second units.

[Figure 7] shows the locations of the first and second units.

[Figure 8] shows the locations of the first and second units.

[Figure 9] shows the locations of the first and second units.

[Figure 10] shows the locations of the first and second units.

[Figure 11] is a diagram used to illustrate the appearance of drawing on a substrate.

[Figure 12] is a top view showing another example of the structure of the camera unit and the first distance measuring sensor.

[Figure 13] is a block diagram showing the functional configuration of the correction unit and its surroundings.

FIG. 1 is a three-dimensional diagram of a drawing device 1 of one embodiment of the present invention. The drawing device 1 is a device for irradiating light to a substrate 9 to draw a pattern on the substrate 9. The drawing device 1 is a twin stage type direct drawing device for irradiating slightly beamed light after spatial modulation to a substrate 9 having a layer of photosensitive material on the surface, and scanning the irradiated area of the light on the substrate 9 to draw the pattern. In FIG. 1, three directions orthogonal to each other are shown by arrows as the X direction, the Y direction, and the Z direction. In the example shown in FIG. 1, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction. The same is true in other figures.

The substrate 9 is, for example, a plate-shaped member that is roughly rectangular when viewed from above. The substrate 9 is, for example, a printed circuit substrate in the middle of manufacturing. On the surface of the +Z side of the substrate 9 (hereinafter also referred to as the "upper surface 91"), a resist film formed of a photosensitive material is provided on the copper layer. In the drawing device 1, a circuit pattern is drawn (i.e., formed) on the resist film of the substrate 9. In addition, the type and shape of the substrate 9 can also be changed in various ways.

The drawing device 1 includes a first conveying mechanism 2a, a second conveying mechanism 2b, a shooting unit 3, a pattern drawing unit 4, a frame 7, and a control unit 10. The control unit 10 controls the first conveying mechanism 2a, the second conveying mechanism 2b, the shooting unit 3, the pattern drawing unit 4, etc.

The frame 7 is a main body base portion on which each component of the drawing device 1 is installed. The frame 7 has: a base 71 in a roughly cubic shape; and a first gantry portion 72 and a second gantry portion 73 in a gate shape, which span the base 71. The second gantry portion 73 is arranged close to the +Y side of the first gantry portion 72. In the following description, the first gantry portion 72 and the second gantry portion 73 are also collectively referred to as "gantry portion 74". The first transport mechanism 2a and the second transport mechanism 2b are installed on the base 71. The first gantry portion 72 supports the shooting portion 3. The second gantry portion 73 supports the pattern drawing portion 4. The frame 7 is mounted on a pedestal not shown in the figure.

The first transport mechanism 2a and the second transport mechanism 2b are mechanisms for holding and moving the substrate 9 below the shooting section 3 and the pattern drawing section 4 (i.e., the -Z side), respectively. The second transport mechanism 2b is disposed adjacent to the +X side of the first transport mechanism 2a. The first transport mechanism 2a and the second transport mechanism 2b have a similar structure.

The first transport mechanism 2a includes a first stage 21a and a first moving mechanism 22a. The first stage 21a is a first substrate holding portion that is slightly flat and is used to hold the substrate 9 in a slightly horizontal state from the bottom. The first stage 21a is, for example, a vacuum chuck that is used to absorb and hold the lower surface of the substrate 9. The first stage 21a may also have a structure other than a vacuum chuck. The upper surface 91 of the substrate 9 mounted on the first stage 21a is slightly perpendicular to the Z direction (i.e., the up and down direction) and slightly parallel to the X direction and the Y direction.

The first moving mechanism 22a is a first stage moving mechanism, which is used to relatively move the first stage 21a in a substantially horizontal direction (i.e., a direction substantially parallel to the upper surface 91 of the substrate 9) relative to the photographing section 3 and the pattern drawing section 4. The first moving mechanism 22a moves the first stage 21a supported on the guide rail 221a linearly in the Y direction along the guide rail 221a below the photographing section 3 and the pattern drawing section 4. Thereby, the substrate 9 supported by the first stage 21a moves in the Y direction. In the following description, the Y direction is also referred to as the "substrate moving direction" or the "main scanning direction". The driving source of the first moving mechanism 22a is, for example, a linear servo motor or a structure in which a motor is installed on a ball screw. The structure of the first moving mechanism 22a can also be modified in various ways.

The second transport mechanism 2b includes a second stage 21b and a second moving mechanism 22b. The second stage 21b is a second substrate holding portion in a slightly flat plate shape, which is used to hold the substrate 9 in a slightly horizontal state from the bottom. The second stage 21b is arranged adjacent to the side of the first stage 21a (i.e., the +X side). The upper surface of the second stage 21b is located at a substantially same height as the upper surface of the first stage 21a in the up-down direction (i.e., the Z direction). The second stage 21b is, for example, a vacuum clamp, which is used to absorb and hold the lower surface of the substrate 9. The second stage 21b may also have a structure other than a vacuum clamp. The upper surface 91 of the substrate 9 mounted on the second stage 21b is slightly perpendicular to the Z direction and slightly parallel to the X direction and the Y direction. The upper surface 91 of the substrate 9 held by the second stage 21b is located at approximately the same height in the vertical direction as the upper surface 91 of the substrate 9 held by the first stage 21a (i.e., approximately the same position in the Z direction).

The second moving mechanism 22b is a second stage moving mechanism, which is used to relatively move the second stage 21b in a substantially horizontal direction (i.e., a direction substantially parallel to the upper surface 91 of the substrate 9) relative to the photographing section 3 and the pattern drawing section 4. The second moving mechanism 22b moves the second stage 21b supported on the guide rail 221b linearly in the Y direction (i.e., the substrate moving direction) along the guide rail 221b below the photographing section 3 and the pattern drawing section 4. Thereby, the substrate 9 supported by the second stage 21b moves in the Y direction. The moving direction of the second stage 21b of the second moving mechanism 22b is substantially parallel to the moving direction of the first stage 21a of the first moving mechanism 22a. The driving source of the second moving mechanism 22b is, for example, a linear servo motor or a structure in which a motor is installed on a ball screw. The structure of the second moving mechanism 22b can also be modified in various ways.

The first moving mechanism 22a and the second moving mechanism 22b are arranged in a direction intersecting the substrate moving direction (i.e., the Y direction). In the example shown in FIG. 1 , the first moving mechanism 22a and the second moving mechanism 22b are arranged in a direction intersecting the substrate moving direction (i.e., the Y direction), and the second moving mechanism 22b is adjacent to the side of the +X side of the first moving mechanism 22a. The first moving mechanism 22a and the second moving mechanism 22b are located at approximately the same height in the vertical direction.

The first moving mechanism 22a and the second moving mechanism 22b are supported from below by the base 71 of the frame 7. The first moving mechanism 22a and the second moving mechanism 22b extend from the +Y side to the -Y side beyond the second elevated portion 73, and protrude from the first elevated portion 72 to the -Y side through the bottom of the pattern drawing portion 4 supported by the second elevated portion 73 and the bottom of the shooting portion 3 supported by the first elevated portion 72. The first elevated portion 72 is located at a position in the Y direction that is approximately the same as the center of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction.

In the drawing device 1, the substrate 9 is carried in and out of the first stage 21a when the first stage 21a is located on the -Y side of the first elevated portion 72. In addition, the substrate 9 is carried in and out of the second stage 21b when the second stage 21b is located on the -Y side of the first elevated portion 72.

As described above, the first elevated portion 72 and the second elevated portion 73 are arranged to cross the first transport mechanism 2a and the second transport mechanism 2b. The first elevated portion 72 includes: two pillars extending in the Z direction on both sides of the X direction of the first transport mechanism 2a and the second transport mechanism 2b; and a beam connecting the upper ends of the two pillars. The beam of the first elevated portion 72 extends in the X direction above the first transport mechanism 2a and the second transport mechanism 2b. The two pillars of the first elevated portion 72 are connected to the base 71 at the end on the -Z side. The second elevated portion 73 includes: two pillars extending in the Z direction on both sides of the X direction of the first transport mechanism 2a and the second transport mechanism 2b; and a beam connecting the upper ends of the two pillars. The beam of the second elevated portion 73 extends in the X direction above the first transport mechanism 2a and the second transport mechanism 2b. The two pillars of the second elevated portion 73 are connected to the base 71 at the end on the -Z side.

The photographing section 3 includes a camera position switching section 32 and a plurality of (two in the example shown in FIG. 1 ) alignment cameras 31. The plurality of alignment cameras 31 are arranged in the X direction and are movably mounted on the beam of the first elevated section 72. The camera position switching section 32 is mounted on the beam to move the plurality of alignment cameras 31 along the beam in the X direction. The driving source of the camera position switching section 32 is, for example, a linear servo motor or a structure in which a motor is mounted on a ball screw. In the example shown in FIG. 1 , the interval between the two alignment cameras 31 in the X direction can be changed. In addition, in the shooting unit 3, the number of aiming cameras 31 may be one or more than three.

Each alignment camera 31 is a camera having a photographing sensor and an optical system (not shown). Each alignment camera 31 is, for example, an area camera for obtaining a two-dimensional image. The photographing sensor has a plurality of CCDs (Charge Coupled Devices) and other elements arranged in a matrix. In each alignment camera 31, the reflected light of the illumination light guided to the upper surface 91 of the substrate 9 from a light source (not shown) is guided to the photographing sensor via the optical system. The photographing sensor receives the reflected light from the upper surface 91 of the substrate 9, thereby obtaining an image of a roughly rectangular photographing area. As the above-mentioned light source, various light sources such as LEDs (Light Emitting Diodes) can be used. In addition, each alignment camera 31 may also be a line camera or other types of cameras.

In the drawing device 1, the plurality of alignment cameras 31 are moved between a first shooting position above the first transport mechanism 2a and a second shooting position above the second transport mechanism 2b by means of a camera position switching unit 32. The first shooting position is a position where the alignment camera 31 is opposite to the first stage 21a and the first substrate 9 during shooting. The second shooting position is a position where the alignment camera 31 is opposite to the second stage 21b and the second substrate 9 during shooting. In FIG. 1 , the plurality of alignment cameras 31 are located at the first shooting position. The plurality of alignment cameras 31 shoot the upper surface 91 of the substrate 9 on the first stage 21a at the first shooting position. In addition, the plurality of alignment cameras 31 photograph the upper surface 91 of the substrate 9 on the second stage 21b at the second photographing position.

The pattern drawing section 4 has a drawing head moving mechanism 42 and a plurality of (six in the example shown in FIG. 1 ) drawing heads 41. The plurality of drawing heads 41 are arranged in the X direction and are movably mounted on the beam of the second elevated section 73. The drawing head moving mechanism 42 is mounted on the beam to integrally move the plurality of drawing heads 41 along the beam in the X direction. The driving source of the drawing head moving mechanism 42 is, for example, a linear servo motor or a structure in which a motor is mounted on a ball screw. In addition, in the pattern drawing section 4, the number of drawing heads 41 may be one or more.

Each drawing head 41 has a light source, an optical system, and a spatial light modulator, which are not shown in the figure. As a spatial light modulator, various elements such as DMD (Digital Micro Mirror Device) or GLV (Grating Light Valve) (a registered trademark of Silicon Light Machines (Sunnyvale, California)) can be used. As a light source, various light sources such as LD (Laser Diode) can be used. Multiple drawing heads 41 have a similar structure.

In the drawing device 1, a plurality of drawing heads 41 are moved between a first drawing position above the first transport mechanism 2a and a second drawing position above the second transport mechanism 2b by means of a drawing head moving mechanism 42. The first drawing position is a position where the drawing head 41 is opposite to the first stage 21a and the first substrate 9 during drawing. The second drawing position is a position where the drawing head 41 is opposite to the second stage 21b and the second substrate 9 during drawing. In FIG. 1 , the plurality of drawing heads 41 are located at the second drawing position. The plurality of drawing heads 41 draw patterns on the upper surface 91 of the substrate 9 on the first stage 21a in the first drawing position. In addition, the plurality of drawing heads 41 draw patterns on the upper surface 91 of the substrate 9 on the second stage 21b in the second drawing position. In addition, when drawing a pattern on the upper surface 91 of the substrate 9 on the first stage 21a, the drawing head 41 is also step-shifted in the X direction by the drawing head moving mechanism 42. Similarly, when drawing a pattern on the upper surface 91 of the substrate 9 on the second stage 21b, the drawing head 41 is also step-shifted in the X direction by the drawing head moving mechanism 42.

The first drawing position and the second drawing position are located in the Y direction at positions that are approximately the same as the center of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction. In addition, the first shooting position and the second shooting position are also located in the Y direction at positions that are approximately the same as the center of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction. In other words, the multiple drawing heads 41 of the pattern drawing unit 4 and the multiple alignment cameras 31 of the shooting unit 3 are located in the Y direction at positions that are approximately the same as the center of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction.

When drawing a pattern in the first drawing position, modulated (i.e., spatially modulated) light is irradiated from the plurality of drawing heads 41 of the pattern drawing unit 4 toward the substrate 9 on the first stage 21a below. In addition, in parallel with the irradiation of the light, the substrate 9 is horizontally moved from the +Y direction of the pattern drawing unit 4 to the -Y direction (i.e., the substrate moving direction) by the first moving mechanism 22a. In this way, the irradiation area of the light from the plurality of drawing heads 41 is relatively scanned in the +Y direction on the substrate 9, and the pattern (e.g., circuit pattern) is drawn on the substrate 9. The first moving mechanism 22a is a scanning mechanism for moving the irradiation area of the light from each scanning head 41 in the Y direction on the substrate 9.

When a main scan is completed, the drawing head 41 is moved stepwise in the +X direction (i.e., sub-scanning) to a predetermined distance by the drawing head moving mechanism 42, and is moved in the +Y direction toward the substrate 9. That is, in parallel with the irradiation of the light from the drawing head 41, the substrate 9 is horizontally moved in the +Y direction by the first moving mechanism 22a. Thus, the irradiation area of the light from the plurality of drawing heads 41 is relatively mainly scanned in the -Y direction on the substrate 9, and a pattern is drawn on the substrate 9. Thereafter, in the present embodiment, the drawing head 41 is moved stepwise in the +X direction to a predetermined distance, and is further drawn by the main scan in the +Y direction toward the irradiated area. Thus, in the drawing device 1, the substrate 9 is drawn by repeatedly moving the first stage 21a in the Y direction and stepwise moving the first stage 21a in the X direction in a multi-pass manner. The drawing of the pattern in the second drawing position is the same as the drawing of the pattern in the first drawing position, except that the first stage 21a and the first moving mechanism 22a are changed to the second stage 21b and the second moving mechanism 22b.

The drawing of the substrate 9 can also be performed in a single pass (one-way (one pass)) manner. Specifically, in the case of the first station 21a, the first station 21a is relatively moved in the Y direction relative to the plurality of drawing heads 41 by the first moving mechanism 22a, and the irradiation area of the light from the plurality of drawing heads 41 is scanned only once in the Y direction on the upper surface 91 of the substrate 9. Thus, the drawing of the substrate 9 is terminated. The same is true for the second station 21b.

The number of main scans when drawing a pattern on the substrate 9 can be one, two, three, or four or more times. In the case of multiple main scans, it is preferred that the substrate 9 is moved alternately in the +Y direction and the -Y direction, and when switching the moving direction, the drawing head 41 moves stepwise in the +X direction relative to the substrate 9. Of course, the stepwise movement of the drawing head 41 can also be in the -X direction.

As described above, in the drawing device 1, the first moving mechanism 22a and the drawing head moving mechanism 42 constitute a mechanism for relatively moving the drawing head 41 relative to the substrate 9 held by the first stage 21a during drawing. However, in the case of performing a one-way operation, the first moving mechanism 22a becomes a mechanism for relatively moving the drawing head 41 relative to the substrate 9 held by the first stage 21a during drawing. Similarly, in the drawing device 1, the second moving mechanism 22b and the drawing head moving mechanism 42 constitute a mechanism for relatively moving the drawing head 41 relative to the substrate 9 held by the second stage 21b during drawing. However, in the case of a one-way motion, the second moving mechanism 22b becomes a mechanism for moving the drawing head 41 relatively to the substrate 9 held by the second stage 21b during drawing.

In addition, the drawing head moving mechanism 42 also serves as a head position switching unit for switching the position of the drawing head 41 between a position opposite to the substrate 9 held by the first stage 21a and a position opposite to the substrate 9 held by the second stage 21b. The drawing head moving mechanism 42 does not necessarily have to also serve as a head position switching unit, and a moving mechanism for switching the position of the drawing head 41 between a position opposite to the first stage 21a and a position opposite to the second stage 21b may be provided, and a mechanism for moving the drawing head 41 in steps in the X direction may be provided on the moving mechanism. That is, the following mechanisms (head position switching unit) can be provided in the drawing device 1 in various forms: a mechanism for relatively moving the drawing head 41 relative to the substrate 9 held by the first stage 21a during drawing; a mechanism for relatively moving the drawing head 41 relative to the substrate 9 held by the second stage 21b during drawing; a mechanism for relatively moving the drawing head 41 relative to the first stage 21a and the second stage 21b between a position opposite to the substrate 9 held by the first stage 21a and a position opposite to the substrate 9 held by the second stage 21b.

In the following description, all of these mechanisms are collectively referred to as "moving mechanism 2". In the case of the drawing device 1 of Figure 1, the moving mechanism 2 includes a first moving mechanism 22a, a second moving mechanism 22b, and a drawing head moving mechanism 42. The moving mechanism 2 moves the drawing head 41 relatively to the first stage 21a while the light emitted from the drawing head 41 draws a pattern on the substrate 9 held by the first stage 21a (first substrate holding part); the moving mechanism 2 moves the drawing head 41 relatively to the second stage 21b while the light emitted from the drawing head 41 draws a pattern on the substrate 9 held by the second stage 21b (second substrate holding part).

The drawing device 1 further includes a first distance measuring sensor 5. The first distance measuring sensor 5 is arranged on the -Y side of the beam of the first elevated portion 72. The first distance measuring sensor 5 includes a plurality of sensor elements 51. The plurality of sensor elements 51 are arranged in the X direction. The number of sensor elements 51 is in principle twice the number of drawing heads 41. The same number of sensor elements 51 as the number of drawing heads 41 is arranged above the first station 21a, and the same number of sensor elements 51 as the number of drawing heads 41 is arranged above the second station 21b. In the example of FIG. 1 , the number of drawing heads 41 is six, and the number of sensor elements 51 is twelve. Above the first station 21a, the spacing of the sensor elements 51 (i.e., the spacing of the centers of the sensor elements 51 in the X direction) is the same as the spacing of the drawing heads 41 (i.e., the spacing of the centers of the drawing heads 41 in the X direction). Above the second station 21b, the spacing of the sensor elements 51 is also the same as the spacing of the drawing heads 41.

Each sensor element 51 obtains the distance between each sensor element 51 and the substrate 9 held by the first stage 21a or the second stage 21b located below. More precisely, the distance between the measurement position on the upper surface 91 of the substrate 9 and the specific portion of the sensor element 51 above the measurement is obtained by measurement. The height direction position of the sensor element 51 can be obtained by pre-measurement, and the height direction position of the measurement position is obtained from the height direction position of the sensor element 51 and the obtained distance. Therefore, the measurement of the distance between the sensor element 51 and the measurement position is to obtain the height direction position of the measurement position in essence. More precisely, the output value of the sensor element 51 is converted into the height direction position of the measurement position by the focus control unit 113 described later of the control unit 10. The conversion is performed using, for example, a linear function. In addition, although the measurement position is in principle directly below the sensor element 51, it can be located approximately below and is not limited to directly below.

Each sensor element 51 adopts a diffuse reflection method. Specifically, laser light is irradiated from the sensor element 51 to the substrate 9 through a projecting lens, and the diffuse reflected light from the substrate 9 is received by a light receiving position detection sensor (such as PSD (Position Sensitive Detector) or CMOS (Complementary Metal-Oxide Semiconductor)) through a light receiving lens, thereby detecting the light receiving position. Then, the distance between the sensor element 51 and the measurement position on the substrate 9 is calculated from the light receiving position. Although diffuse reflection sensors are easy to obtain and relatively cheap, their measurement accuracy is relatively low. The wavelength of the light emitted from the first distance sensor 5 can be any wavelength as long as it does not affect the photosensitive material used to form the surface of the substrate 9 (i.e., the upper surface 91). The light source of the first distance sensor 5 is preferably a semiconductor laser of visible light or infrared light, and more preferably a semiconductor laser of visible light.

FIG2 is a diagram showing the structure of a computer 100 included in the control unit 10. The computer 100 is a general computer including a processor 101, a memory 102, an input/output unit 103, and a bus 104. The bus 104 is a signal circuit for connecting the processor 101, the memory 102, and the input/output unit 103. The memory 102 stores programs and various information. The memory 102 is, for example, a RAM (Random Access Memory) or a hard disk drive. The processor 101 follows the program stored in the memory 102, and performs various processing (such as numerical calculation and image processing) while using the memory 102. The input and output unit 103 includes a keyboard 105 and a mouse 106, which receive input from the operator, and a display 107, which displays the output of the processor 101. In addition, the control unit 10 can be a programmable logic controller (PLC) or a circuit board, or a combination of these components and one or more computers.

FIG3 is a block diagram showing the functional structure of the control unit 10 and the peripheral functional structure realized by the computer 100. The control unit 10 has a shooting control unit 111, a position detection unit 112, a focus control unit 113, a drawing control unit 114 and a memory unit 115. The memory unit 115 is mainly realized by the memory 102. The memory unit 115 stores the data of the predetermined pattern drawn on the substrate 9 (i.e., the drawing data) and other information.

The shooting control unit 111, the position detection unit 112, the focus control unit 113 and the drawing control unit 114 are mainly implemented by the processor 101. The shooting control unit 111 controls the shooting unit 3, the first moving mechanism 22a and the second moving mechanism 22b, thereby obtaining the mark (which may also be a part of the pattern) set on the upper surface 91 of the substrate 9 on the first stage 21a and the second stage 21b by the alignment camera 31. The image is transmitted and stored in the memory unit 115.

The position detection unit 112 uses the image to detect the position of the substrate 9 (including the strain of the substrate 9). The drawing control unit 114 controls the moving mechanism 2 and the pattern drawing unit 4 to irradiate light to the substrate 9 held by the first stage 21a or the second stage 21b and draw the pattern. At this time, the position of the substrate 9 detected by the position detection unit 112 is used to correct the drawn pattern while drawing.

As described above, each drawing head 41 of the pattern drawing unit 4 includes a light source, an optical system, and a light modulation element 411. In addition, the light source can be provided integrally with the drawing head 41 or separately from the drawing head 41. In the case where the light source is separated from the drawing head 41, light from the light source is introduced into the drawing head 41 via an optical system having an optical fiber or the like.

As shown in FIG3 , the drawing head 41 further includes a second distance sensor 412 and a focus changing unit 413. The second distance sensor 412 obtains the distance between the second distance sensor 412 and a measurement position on the substrate 9 where the pattern is being drawn. The drawing position or a position that can be regarded as the same height as the drawing position is selected as the measurement position, and the second distance sensor 412 substantially measures the distance between the drawing head 41 and the upper surface 91 of the substrate 9. More precisely, the second distance sensor 412 obtains the distance between the drawing position on the upper surface 91 of the substrate 9 and a position directly above the drawing position relative to the position where the drawing head 41 is fixed. However, the distance obtained by the second distance measuring sensor 412 does not need to be the distance between the drawing head 41 and the position directly below the drawing head 41 or the distance between the drawing position and the position directly above the drawing position, as long as it is the distance in the height direction between the predetermined positions that can be regarded as these distances. That is, the second distance measuring sensor 412 can also obtain the distance in the height direction between the position offset from the drawing position of the upper surface 91 of the substrate 9 and the drawing head 41.

The height position of the second distance sensor 412 (or the drawing head 41) can be obtained by pre-measurement, and the height position of the measurement position can be obtained from the height position of the second distance sensor 412 and the obtained distance. Therefore, the measurement of the distance between the second distance sensor 412 and the measurement position is to obtain the height position of the measurement position in essence.

The second distance sensor 412 performs measurement with higher accuracy than the first distance sensor 5. As the second distance sensor 412, for example, a high-precision light receiving element is used to irradiate the surface of the substrate 9 with oblique light and detect the light receiving position of the regular reflection light of the light. Specifically, for example, laser light is irradiated on the surface of the substrate 9 and the light receiving position of the regular reflection light of the light is detected. The second distance sensor 412 obtains the distance between the drawing head 41 and the substrate 9 based on the light receiving position. As the second distance sensor 412, for example, the components described in the already described Japanese Patent Publication No. 2014-197128 can be used.

The focus changing unit 413 changes the Z-direction position (i.e., the height direction position, hereinafter also referred to as "focus position") of the image formed by the light emitted from the drawing head 41. The focus changing unit 413 includes, for example: a focus lens, which is included in the optical system of the drawing head 41; and a drive unit, which moves the focus lens along the optical axis. The focus lens can be one or more than two. The drive unit moves the position of the focus lens along the optical axis, thereby changing the height direction position of the image formed by the light emitted from the drawing head 41.

The focus control unit 113 uses the information from each sensor element 51 of the first distance sensor 5 and the information from the second distance sensor 412 to perform the following control during the drawing process: the focus position of the image formed by the light emitted from the drawing head 41 is consistent with the position of the Z direction of the surface of the substrate 9 at the drawing position. That is, although the Z direction position of the drawing position on the substrate 9 changes only up and down along with the movement of the drawing position in the main scanning direction, the focus control unit 113 changes the Z direction position of the image formed by the light emitted from the drawing head 41 in accordance with this change. In addition, the use of the information from the first distance sensor 5 by the focus control unit 113 will be described later.

As described above, each sensor element 51 of the first distance sensor 5 has lower accuracy and is cheaper than the second distance sensor 412. This can suppress the increase in the manufacturing cost of the drawing device 1. In the case where the first distance sensor 5 is composed of a plurality of sensor elements 51, the increase in the manufacturing cost of the drawing device 1 can be further suppressed. In particular, as in the drawing device 1 of FIG. 1, in the case where the number of sensor elements 51 is twice the number of the drawing head 41, the effect of suppressing the increase in the manufacturing cost of the drawing device 1 is greater.

Next, the process of drawing a pattern on a substrate 9 by the drawing device 1 shown in FIG. 1 is described. In the drawing device 1, while drawing the substrate 9 held on one of the first and second stages 21a and 21b, the substrate 9 is moved to the other stage and aligned (i.e., position alignment) is performed. When drawing the substrate 9 held on the one stage is completed, drawing the substrate 9 held on the other stage is started. In addition, while drawing the substrate 9 on the other stage, the drawn substrate 9 is moved out from one stage, and a new substrate 9 is moved to the one stage and aligned.

Fig. 4A and Fig. 4B are diagrams showing an example of the flow of the drawing process in the drawing device 1. Steps S11 to S16 on the left side of Fig. 4A and Fig. 4B show the flow of the drawing process toward the substrate 9 on the first stage 21a, and steps S21 to S26 on the right side of Fig. 4A and Fig. 4B show the flow of the drawing process toward the substrate 9 on the second stage 21b. In addition, steps located at the same position in the vertical direction of Fig. 4A and Fig. 4B are performed in parallel. Specifically, steps S11 to S15 and step S26 are performed in parallel. In addition, step S16 and steps S21 to S25 are performed in parallel. In FIG. 4A and FIG. 4B, the description of the movement of the substrate 9 that is first carried into the drawing device 1 and the substrate 9 that is last carried out is omitted.

In FIG. 4A and FIG. 4B, the description starts with the state of drawing a pattern on the substrate 9 on the second stage 21b of the second transport mechanism 2b. In addition, FIG. 5 to FIG. 10 are conceptual diagrams showing the approximate positions of the first stage 21a and the second stage 21b in the drawing device 1 in the drawing process in the Y direction. In FIG. 5 to FIG. 10, the first stage 21a, the first moving mechanism 22a, the second stage 21b, and the second moving mechanism 22b are drawn with solid lines, and the alignment camera 31, the arrangement of the drawing head 41, and the arrangement of the sensor elements 51 of the first distance measuring sensor 5 are drawn with dotted lines.

In the following description, with respect to the position of the first stage 21a in the Y direction, the position where the first stage 21a overlaps with the alignment camera 31 and/or the drawing head 41 in the vertical direction is referred to as the "processing position", the position where the first stage 21a overlaps with the portion on the -Y side of the first moving mechanism 22a in the vertical direction is referred to as the "carry-in and carry-out position", and the position where the first stage 21a overlaps with the portion on the +Y side of the first moving mechanism 22a in the vertical direction is referred to as the "standby position". In addition, regarding the position of the second stage 21b in the Y direction, the position where the second stage 21b overlaps with the alignment camera 31 and/or the drawing head 41 in the vertical direction is called the "processing position", the position where the second stage 21b overlaps with the -Y side of the second moving mechanism 22b in the vertical direction is called the "carry-in and carry-out position", and the position where the second stage 21b overlaps with the +Y side of the second moving mechanism 22b in the vertical direction is called the "standby position". In addition, the above-mentioned processing position does not refer to the concept of a point in the Y direction, but refers to the predetermined range in the Y direction (i.e., the area to be processed) where the alignment camera 31 shoots the substrate 9 and the drawing head 41 draws the pattern.

As shown in FIG5, in the drawing device 1, when the second stage 21b is located at the processing position and the drawing head 41 is located at the second drawing position, the drawing head 41 draws the pattern on the substrate 9 on the second stage 21b (step S26). Hereinafter, the substrate 9 held by the second stage 21b or the predetermined substrate 9 held is referred to as the "second substrate 9". The "second substrate 9" does not refer to the second substrate, but simply refers to the substrate related to the second stage 21b. In step S26, the drawing control unit 114 (refer to FIG3) controls the pattern drawing unit 4, the second moving mechanism 22b and the drawing head moving mechanism 42, thereby drawing the pattern on the substrate 9 moving in the +Y direction or -Y direction in the processing position.

In addition, in parallel with step S26, the substrate 9 that has been drawn is unloaded from the first stage 21a located at the loading and unloading position, and a new substrate 9 is loaded and held on the first stage 21a (steps S11, S12). Hereinafter, the substrate 9 held by the first stage 21a or the predetermined substrate 9 held is referred to as the "first substrate 9". The "first substrate 9" does not refer to the first substrate, but simply refers to the substrate related to the first stage 21a. In the case of a substrate 9 and a second substrate 9 described later that are not distinguished, it is simply referred to as "substrate 9".

Next, the first stage 21a is moved in the +Y direction by the first moving mechanism 22a and is located at the processing position shown in FIG6. In the state shown in FIG6, the substrate 9 on the second stage 21b is depicted while the second stage 21b is located at the processing position. In addition, the alignment camera 31 is located at the first shooting position opposite to the first substrate 9 held by the first stage 21a (first substrate holding part) by the camera position switching part 32. In addition, the interval of the alignment camera 31 is pre-adjusted to match the size of the first substrate 9.

When the first stage 21a is located at the processing position, the first moving mechanism 22a is controlled by the shooting control unit 111 (refer to FIG. 3 ), whereby the first stage 21a moves in the +Y direction at a predetermined speed. By controlling the alignment camera 31 by the shooting control unit 111, shooting is performed at the moment when the alignment mark (not shown) on the first substrate 9 is located below the alignment camera 31, and the acquired image is transmitted to the position detection unit 112. In addition, the movement of the first stage 21a may be stopped during shooting. Shooting is performed for each alignment mark on the first substrate 9. In the position detection unit 112, pattern matching using a reference image is performed on the image. The pattern matching is performed, for example, by a known pattern matching method (e.g., geometric shape pattern matching, normalized correlation search, etc.). In this way, the position of the alignment mark in the image is obtained, and the position of the first substrate 9 on the first stage 21a is detected (step S13). Hereinafter, the information related to the position of the substrate 9 obtained by the position detection unit 112 is referred to as "alignment information".

The position of the first substrate 9 detected by the position detection unit 112 includes the coordinates of the first substrate 9 in the X direction and the Y direction relative to the first stage 21a belonging to the substrate holding unit, the orientation of the first substrate 9 (i.e., the rotational position), and information for displaying the deformation caused by the strain of the first substrate 9. In addition, the information for displaying the deformation of the first substrate 9 is information such as the shape of the deformed first substrate 9 and the position of the drawing area on the first substrate 9. In the position detection unit 112, based on the detected alignment information, the drawing data for the first substrate 9 on the first stage 21a is corrected (i.e., alignment processing). In addition, in the case where the first moving mechanism 22a has the function of rotating the first stage 21a with the axis toward the Z direction as the center, the first substrate 9 can also be rotated based on the alignment information. The above description on the alignment of the first substrate 9 is also the same for the processing of the second substrate 9 described later.

When the -Y side portion of the first substrate 9 passes under the first distance measuring sensor 5, the outputs of the six sensor elements 51 on the first stage 21a side are recorded in the memory section 115 of the control section 10. That is, the distance between the sensor element 51 and the upper surface 91 of the first substrate 9 is repeatedly output from each sensor element 51 and recorded in the memory section 115 of the control section 10. The distance between the sensor element 51 and the upper surface 91 of the first substrate 9 corresponds to the position of the upper surface 91 of the substrate 9 in the height direction at the measurement position of the sensor element 51. Therefore, by the above measurement, the change in the position of the upper surface 91 of the first substrate 9 in the height direction within the moving range of the measurement position is obtained. Hereinafter, the position of the upper surface 91 of the substrate 9 in the height direction at the measurement position or the drawing position is also referred to as the "surface height position". The focus control unit 113 obtains the highest frequency value of the surface height position of the first substrate 9 among the plurality of measurement positions based on the information obtained from each sensor element 51 (step S14). Hereinafter, the highest frequency value is referred to as "focus information". The same number of pre-focus information as the number of sensor elements 51 of the first distance measuring sensor 5 is obtained.

There are through holes and steps in the substrate 9, which should not be used as the measurement position of the height of the upper surface 91 of the substrate 9. The highest frequency value of the numerous surface height positions of the first substrate 9 obtained by each sensor element 51 is used as the position of the height direction of the upper surface 91 of the first substrate 9, thereby obtaining the correct surface height position representing the numerous surface height positions. In addition, the so-called "highest frequency value" means: dividing the position in the height direction into a plurality of small ranges, distinguishing the numerous surface height positions obtained by each sensor element 51 into values belonging to each small range, and using the central value of the small range to which the most surface height positions belong as the correct surface height position representing the numerous measurement positions.

The moving range of the measurement position of each sensor element 51 on the substrate 9 overlaps with the moving trajectory of the drawing position when any drawing head 41 starts drawing in the subsequent process. That is, the position of each sensor element 51 in the X direction coincides with the position of any drawing head 41 in the X direction when drawing starts in the subsequent drawing. Therefore, each sensor element 51 of the first distance measuring sensor 5 (to be more precise, each sensor element 51 on the first substrate 9 side) acquires a plurality of distances to the plurality of positions while the measurement position is located at a plurality of positions near the starting drawing position on the first substrate 9 held by the first stage 21a belonging to the first substrate holding unit (arranged in the main scanning direction). Furthermore, the focus control unit 113 uses the distance with the highest frequency among the obtained multiple distances as the distance between each sensor element 51 of the first distance measuring sensor 5 and the first substrate 9. As described above, the distance between each sensor element 51 and the first substrate 9 is essentially pre-focus information for displaying the surface height position of the substrate 9 in the drawing position when drawing starts.

When the alignment information and pre-focus information are obtained from the first substrate 9 while the pattern is being drawn on the second substrate 9 held by the second stage 21b (second substrate holding portion), the first stage 21a is further moved in the +Y direction by the first moving mechanism 22a and is located at the standby position shown in FIG. 7 (step S15). In the state shown in FIG. 7, the second substrate 9 is drawn while the second stage 21b is located at the processing position (more precisely, a position with a certain range for drawing). The first stage 21a waits at the standby position until the drawing of the second substrate 9 is completed.

When the drawing of the second substrate 9 is completed (step S26), the second stage 21b is moved in the -Y direction by the second moving mechanism 22b, and the second stage 21b is located at the loading and unloading position as shown in FIG8. In parallel with this operation, the first stage 21a is moved in the -Y direction by the first moving mechanism 22a and located at the processing position. Furthermore, the alignment camera 31 is moved from the first shooting position to the second shooting position and the drawing head 41 is moved from the second drawing position to the first drawing position. The second shooting position is a position opposite to the second substrate 9 held by the second stage 21b (second substrate holding part) (to be more precise, opposite during shooting). Furthermore, based on the alignment-processed drawing data, the drawing control unit 114 controls the pattern drawing unit 4 and the first moving mechanism 22a, thereby drawing the pattern on the first substrate 9 on the first stage 21a moving in the Y direction in the processing position (step S16).

FIG. 11 is a diagram for explaining how the first substrate 9 is drawn. The same is true for the drawing of the second substrate 9. Therefore, in the following description of FIG. 11, the first substrate 9 and the second substrate 9 are not distinguished but are collectively referred to as "substrate 9". Six drawing heads 41 are shown in dashed lines in FIG. 11. The eighteen Y-direction long regions 8 drawn on the substrate 9 are regions drawn by a drawing head 41 when the substrate 9 moves in the Y direction. In the case where a DMD is used as the light modulation element 411 of the drawing head 41 and the rectangular image of the DMD is projected obliquely onto the substrate 9, it is correct to say that the plurality of regions 8 slightly overlap in the X direction.

The arrow 81 indicated by a thick solid line shows the initial movement of the drawing positions of the plurality of drawing heads 41. That is, the following situation is shown: the substrate 9 moves in the -Y direction, whereby the drawing position moves relatively in the +Y direction on the substrate 9. When the drawing position moves to the end of the +Y side of the area 8, the drawing head moving mechanism 42 causes the drawing head 41 to move stepwise in the +X direction, whereby the drawing position moves stepwise in the +X direction on the substrate 9. Then, the substrate 9 moves in the +Y direction, whereby the drawing position moves in the -Y direction as indicated by the dashed arrow 82, and drawing is performed toward the second area 8. When the drawing position moves to the end of the -Y side of the second area 8, the drawing head 41 is moved stepwise in the +X direction by the drawing head moving mechanism 42, whereby the drawing position is moved stepwise in the +X direction on the substrate 9. Then, the substrate 9 is moved in the -Y direction, whereby the drawing position is moved in the +Y direction as shown by the dotted arrow 83 and drawing is performed toward the third area 8.

In the case of the example of Figure 11, the drawing head 41 moves back and forth 1.5 times in the Y direction relative to the substrate 9 (that is, it moves to half of the return journey after the outward journey is completed), thereby completing the drawing. In addition, as described above, the number of the drawing heads 41 and the width of the area 8 can also be changed in various ways. Preferably, the number of the drawing heads 41 is two or more. In addition, the drawing head 41 can also move only once in the Y direction, that is, the main scanning direction, relative to the substrate 9 to complete the drawing, or it can move more than two times in the main scanning direction to complete the drawing. If the first substrate 9 is described in general terms, the drawing head 41 emits modulated light toward the first substrate 9 while the drawing head 41 is relatively moved relative to the first stage 21a (first substrate holding portion), thereby drawing a pattern on the first substrate 9. In the case of the second substrate 9, the same is true except that the first stage 21a is replaced with the second stage 21b (second substrate holding portion).

In addition, when the main scanning direction moves an odd number of times until the drawing is completed, in order to make the position of the substrate 9 at the time of the end of the drawing close to the carry-in and carry-out position, the standby position relative to the drawing head 41 is preferably on the opposite side of the carry-in and carry-out position. Conversely, when the main scanning direction moves an even number of times until the drawing is completed, in order to make the position of the substrate 9 at the time of the end of the drawing close to the carry-in and carry-out position, the standby position relative to the drawing head 41 is preferably on the same side as the carry-in and carry-out position.

When the drawing starts toward the initial area 8, the pre-focus information obtained in step S14 is used. In the drawing device 1, very precise drawing is performed. Therefore, a slight deviation between the height direction position of the drawing position on the surface of the substrate 9, that is, the surface height position and the height direction position of the image formed by the light from the drawing head 41 (hereinafter referred to as the "image height position") is not allowed. During the continuous drawing, the second distance sensor 412 of the drawing head 41 measures the surface height position, and the focus control unit 113 of the control unit 10 controls the focus changing unit 413 of the drawing head 41 based on the measurement result. That is, the focus lens in the drawing head 41 is slightly moved along the optical axis. Thereby, even if the drawing position moves parallel to the substrate 9, the surface height position and the image height position in the drawing position are accurately consistent. However, since there is no highly reliable information from the second distance measuring sensor 412 at the time of starting the drawing, there is a possibility that the actual surface height position and the image height position before the control will be greatly offset. In particular, when there is strain in the substrate 9, there may be a situation where the surface height position and the image height position at the end of the substrate 9 are greatly offset. Since there is a limit to the speed of changing the image height position, when the surface height position and the image height position are greatly offset, there will be the following problem: the time required to make the surface height position and the image height position match, the surface height position and the image height position cannot be matched for a period of time after the start of drawing.

Therefore, the first distance measuring sensor 5 is provided in the drawing device 1, so that the position of the height direction of the surface of the substrate 9 at the drawing position at the start of drawing, that is, the surface height position at the start of drawing, is obtained in advance as pre-focus information before the start of drawing, and the surface height position and the image height position are made close to each other before the start of drawing, so that the auto focus control is performed immediately after the start of drawing. More precisely, the pre-focus information obtained by each sensor element 51 of the first distance measuring sensor 5, that is, the distance between each sensor element 51 and the substrate 9 is converted into the distance between the corresponding drawing head 41 and the substrate 9, and is used for the auto focus control at the start of drawing. The distance between the drawing head 41 and the substrate 9 obtained by the conversion is equivalent to the surface height position at the start of drawing obtained substantially. In addition, the surface height position when starting the next area 8 after the description of one area 8 is completed can use the surface height position obtained from the second distance measuring sensor 412 when the description of the previous area 8 is completed.

The first distance measuring sensor 5 is provided, thereby eliminating the need for the following action: using the second distance measuring sensor 412 of the drawing head 41 to measure the surface height position at the starting drawing position before starting drawing. Assuming that the first distance measuring sensor 5 is not provided, it is necessary to scan the drawing head 41 relative to the substrate 9 in the main scanning direction for a certain distance before starting drawing, and use the output of the second distance measuring sensor 412 to obtain the surface height position at the starting drawing position. In contrast, in the drawing device 1, the information of the first distance measuring sensor 5 can be used to make the drawing head 41 start drawing immediately after it is located at the starting drawing position, thereby increasing the processing capacity of the drawing device 1.

As shown in FIG. 4B , in the drawing device 1, in parallel with drawing on the first substrate 9 on the first stage 21a (step S16), the second substrate 9 after drawing is unloaded from the second stage 21b located at the loading and unloading position, and a new second substrate 9 is loaded and held on the second stage 21b (steps S21, S22). Then, the second stage 21b is moved in the +Y direction by the second moving mechanism 22b, and the alignment information of the second substrate 9 is obtained by the control of the shooting control unit 111 in the same manner as steps S13 and S14, and pre-focus information is obtained substantially in parallel with this operation (steps S23, S24). These actions are also the same in the following situations: in the description of the first substrate 9, the first substrate 9 is replaced by the second substrate 9, the first stage 21a is replaced by the second stage 21b, the first moving mechanism 22a is replaced by the second moving mechanism 22b, and the first shooting position is replaced by the second shooting position.

That is, as shown in FIG9 , the second substrate 9 is moved to the processing position by the control of the shooting control unit 111, and the second substrate 9 is moved in the +Y direction while shooting at the moment when the alignment mark is located below the alignment camera 31, and the alignment information of the second substrate 9 is obtained by the position detection unit 112 (step S23). Then, the drawing data for the second substrate 9 is corrected (i.e., alignment processing).

When the -Y side of the second substrate 9 passes under the first ranging sensor 5, the outputs of the six sensor elements 51 on the second stage 21b side are recorded in the memory unit 115. The focus control unit 113 obtains the highest frequency value as pre-focus information based on the numerous values (surface height positions) of the height direction position of the upper surface 91 of the second substrate 9 obtained from the information obtained from each sensor element 51 (step S24). The pre-focus information is the height direction position (surface height position) of the upper surface 91 of the second substrate 9 in the drawing position corresponding to the start of drawing.

When the alignment information and pre-focus information are obtained from the second substrate 9 during the period of drawing the pattern on the first substrate 9 held by the first stage 21a (first substrate holding part), the second stage 21b is further moved in the +Y direction by the second moving mechanism 22b and is located at the standby position as shown in Figure 10 (step S25). In the state of Figure 10, the first substrate 9 is drawn. The second stage 21b waits at the standby position until the drawing of the first substrate 9 is completed.

When the drawing of the first substrate 9 is completed, the drawing head 41 moves to the second drawing position, and the alignment camera 31 moves to the first shooting position. Then, as described with reference to FIG. 4A, the drawing of the second substrate 9 begins (step S26), and during the drawing of the second substrate 9, the first substrate 9 is moved out and the next first substrate 9 is moved in (steps S11, S12), and the alignment information and pre-focus information of the first substrate 9 are obtained (steps S13, S14), and the first substrate 9 is placed in the standby position (step S15).

When the second substrate 9 is started to be drawn, the pre-focus information obtained by the first distance sensor 5 in step S24 is also used to quickly start the auto focus control. This action is also the same for the first substrate 9. The first distance sensor 5 is provided, so that the following action is not required: using the second distance sensor 412 of the drawing head 41 to measure the surface height position in the starting drawing position before starting the drawing. As a result, the drawing head 41 can start drawing immediately after being located at the second drawing position, thereby improving the processing capacity of the drawing device 1.

FIG. 12 is a top view showing another example of the structure of the camera unit 3 and the first distance measuring sensor 5 of the depicting device 1. FIG. 12 shows the structure provided on the first elevated portion 72, and the other structures of the depicting device 1 are the same as those of FIG. 1 .

A camera position switching section 32 extending in the X direction is provided on the beam of the first elevated section 72 in FIG. 12. The camera position switching section 32 moves the camera base 33 in the X direction as indicated by the arrow 34. Two alignment cameras 31 are provided on the camera base 33. One alignment camera 31 is mounted on the camera base 33 via a camera position adjusting section 35. The camera position adjusting section 35 moves the alignment camera 31 relative to the camera base 33 in the X direction. The camera position adjusting section 35 can also adopt various mechanisms, such as a linear servo motor or a mechanism in which a motor is mounted on a ball screw.

The distance between the two alignment cameras 31 is changed by the camera position adjustment unit 35. In addition, the positions of the two alignment cameras 31 are switched between a first shooting position and a second shooting position by the camera position switching unit 32. The first shooting position is a position opposite to the first stage 21a and the first substrate 9 (to be more precise, opposite to the first moving mechanism 22a), and the second shooting position is a position opposite to the second stage 21b and the second substrate 9 (to be more precise, opposite to the second moving mechanism 22b). In addition, although the description of FIG. 1 has been simplified, the camera base 33 and the camera position adjustment unit 35 are also provided in the drawing device 1 of FIG. 1. The camera base 33 can also be regarded as a part of the camera position switching unit 32. In the case where the number of the alignment camera 31 is one, the camera position adjustment unit 35 is not provided. In the case where the number of the alignment cameras 31 is three or more, the camera position adjustment unit 35 may be provided individually for all the alignment cameras 31 except for one alignment camera 31. In addition, even if the number of the alignment cameras 31 is two or more, the positions of all the alignment cameras 31 may be fixed relative to the camera base 33.

Unlike the case of FIG. 1 , in FIG. 12 , the first distance measuring sensor 5 is fixed to the camera base 33. In the example of FIG. 12 , the six sensor elements 51 of the first distance measuring sensor 5 are fixed to the camera base 33. Preferably, the spacing of the sensor elements 51 in the X direction, that is, the spacing in the X direction is the same as the spacing in the X direction of the drawing head 41. Of course, the spacing in the X direction of the sensor elements 51 may also be different from the spacing in the X direction of the drawing head 41. The number of sensor elements 51 is preferably the same as the number of the drawing head 41, but it may be different. The number of sensor elements 51 is preferably two or more, but it may also be one.

The operation of the drawing device 1 having the structure shown in FIG12 is the same as the operation described with reference to FIG4A and FIG4B except that the first distance measuring sensor 5 is moved in the X direction together with the alignment camera 31. That is, during the period of drawing the pattern on the second substrate 9 (step S26), the first substrate 9 is carried out and carried in (steps S11 and S12), the alignment information and the pre-focus information are obtained (steps S13 and S14), and the first substrate 9 is made to wait at the standby position until the drawing of the pattern on the second substrate 9 is completed (step S15). Next, when the drawing of the pattern on the second substrate 9 is completed, the drawing head 41 moves from the second drawing position to the first drawing position, and at the same time, the alignment camera 31 moves from the first shooting position to the second shooting position. Thus, the first distance sensor 5 also moves from the position opposite to the first moving mechanism 22a (the position opposite to the first stage 21a and the first substrate 9 during measurement) to the position opposite to the second moving mechanism 22b (the position opposite to the second stage 21b and the second substrate 9 during measurement).

After that, while the pattern is being drawn on the first substrate 9 (step S16), the second substrate 9 is carried out and brought in (steps S21 and S22), alignment information and pre-focus information are obtained (steps S23 and S24), and the second substrate 9 is made to wait at the standby position until the drawing of the pattern on the first substrate 9 is completed (step S25). When the drawing of the pattern on the first substrate 9 is completed, the drawing head 41 moves from the first drawing position to the second drawing position, and at the same time, the alignment camera 31 moves from the second shooting position to the first shooting position. Thereby, the first distance measuring sensor 5 also moves from the position opposite to the second moving mechanism 22b to the position opposite to the first moving mechanism 22a. When the first substrate 9 and the second substrate 9 are started to be drawn, the pre-focus information obtained in advance is used as described above. This can improve the processing capacity of the drawing device 1.

The first distance measuring sensor 5 shown in FIG. 1 and FIG. 12 (in the case where the first distance measuring sensor 5 includes a plurality of sensor elements 51, each sensor element 51 (hereinafter the same)) is not limited to a diffuse reflection type sensor. For example, a regular reflection type or other types may be used within a possible range. A diffuse reflection type sensor is available at a low price, but on the other hand, when the transmittance of the light used for measurement is high relative to the measurement object, there is a disadvantage that the same measurement cannot be performed as when the transmittance is low. Therefore, in the case where the transmittance of the light used for measurement is high relative to the measurement object, as shown in FIG13, a correction unit 12 is provided in the focus control unit 113 of the drawing device 1, and the correction unit 12 corrects the distance from the first distance sensor 5 (each sensor element 51) obtained by the first distance sensor 5 to the measurement position on the substrate 9. That is, the measured surface height position is corrected. In the case of the above-mentioned implementation form, the correction unit 12 corrects the pre-focus information. In addition, FIG13 only shows the focus control unit 113 and the first distance sensor 5, and the illustrations of other components are omitted.

The calibration is performed when the transmittance of the material used to form the surface of the substrate 9 and the vicinity of the surface of the substrate 9 relative to the wavelength of the light emitted from the first ranging sensor 5 is 50% or more, preferably when the transmittance is 60% or more, and more preferably when the transmittance is 70% or more. The material used to form the surface of the substrate 9 and the vicinity of the surface of the substrate 9 is soda lime glass formed with a resist film or a dry film (such as polyethylene terephthalate) formed with a resist film. A protective film may further exist on the resist film. Of course, the materials that need to be calibrated are not limited to these materials. The wavelength of the light emitted from the first ranging sensor 5 only needs to be a wavelength that does not affect the photosensitive material used to form the upper surface 91 of the substrate 9. Visible light or infrared light with a wavelength of 600nm or more is preferred. For example, the wavelength is 660nm.

In the case where the calibration unit 12 is required to perform calibration, for example, a function for displaying the relationship between the output of the first distance sensor 5 and the distance (or a function for displaying the relationship between the output and the height position of the surface) is obtained in advance by calibration work, and the calibration unit 12 applies the output of the first distance sensor 5 to this function to obtain the distance between the first distance sensor 5 and the substrate 9. The function is preferably a linear function. By providing the calibration unit 12, even in the case where the material used to form the surface of the substrate 9 is transparent to the light used for measurement, a diffusion type sensor can be used as the first distance sensor 5.

Various changes can be made in the above-mentioned drawing device 1.

The drawing head 41 is not limited to emitting light that is spatially modulated into two dimensions, but may also emit linear light that extends in a direction intersecting the main scanning direction and is spatially modulated into one dimension. Furthermore, the drawing head 41 may also emit point-shaped light and modulate the light while scanning the light in a direction intersecting the main scanning direction. As the drawing head 41, various types of drawing heads that emit modulated light may be used.

The substrate holding part for holding the substrate 9 is not limited to the first stage 21a and the second stage 21b. As the first substrate holding part for holding the first substrate 9 and the second substrate holding part for holding the second substrate 9, substrate holding parts of various shapes can be used. For example, the first substrate holding part and the second substrate holding part can also hold the outer edge of the substrate 9 with a claw-shaped component, or can adsorb and hold the center of the lower surface of the substrate 9.

The moving mechanism 2 is not limited to the moving mechanism shown in the above-mentioned embodiment. The moving mechanism 2 relatively moves the drawing head 41 relative to the first substrate holding portion while the light emitted from the drawing head 41 draws a pattern on the first substrate 9 held by the first substrate holding portion, and relatively moves the drawing head 41 relative to the second substrate holding portion while the light emitted from the drawing head 41 draws a pattern on the second substrate 9 held by the second substrate holding portion. Here, since it is preferred to independently move the first substrate 9 when drawing on the first substrate 9 and to independently move the second substrate 9 when measuring the second substrate 9, the moving mechanism 2 preferably includes: a first substrate moving mechanism (broadly defined, different from the first moving mechanism 22a described above), which moves the first substrate 9 horizontally relative to the drawing head 41 and the first distance sensor 5; and a second substrate moving mechanism (broadly defined, different from the second moving mechanism 22b described above), which is independent of the first substrate moving mechanism and is used to relatively move the second substrate 9 horizontally relative to the drawing head 41 and the first distance sensor 5.

Furthermore, since it is preferred to fix the position of the drawing head 41 as much as possible during drawing and to minimize the positional deviation between the drawing head 41 and the first substrate 9 and the second substrate 9, the first substrate moving mechanism preferably includes a first moving mechanism 22a for moving the first substrate 9 in a straight line in the main scanning direction as shown in FIG. 1, and the second substrate moving mechanism also preferably includes a second moving mechanism 22b for moving the second substrate 9 in a straight line in the main scanning direction.

In the example of FIG. 1 , the position of the substrate 9 is described as any one of the "carry-in/carry-out position", the "processing position" and the "standby position", but the "carry-in/carry-out position" and the "standby position" may be the same position. Furthermore, depending on the structure of the robot used to carry in and out the substrate 9, the "carry-in/carry-out position" and the "processing position" may overlap. In this case, the substrate 9 may also move only within the moving range during drawing.

In the example of FIG. 1 , the drawing head 41 is switched between a position opposite to the first substrate holding portion and a position opposite to the second substrate holding portion by a drawing head moving mechanism 42 for moving the drawing head 41 in the X direction. Therefore, the moving mechanism 2 conceptually includes a head position switching unit that switches the drawing head 41 between a position opposite to the first substrate holding portion and a position opposite to the second substrate holding portion. The head position switching unit may also be provided separately from the mechanism for moving the drawing head in the X direction during drawing. Therefore, the moving mechanism 2 includes a first substrate moving mechanism, a second substrate moving mechanism, and a head position switching unit.

The first distance measuring sensor 5 faces the first substrate 9 held by the first substrate holding part and obtains the distance between the first substrate 9 and the measurement position on the first substrate 9 during the period of drawing the pattern on the second substrate 9 held by the second substrate holding part, and faces the second substrate 9 held by the second substrate holding part and obtains the distance between the measurement position on the second substrate 9 during the period of drawing the pattern on the first substrate 9 held by the first substrate holding part. In order to realize such an action, in FIG. 1, the first distance measuring sensor 5 includes a sensor element 51 fixed at an absolute position above the first substrate holding part and a sensor element 51 fixed at an absolute position above the second substrate holding part. Here, the so-called "absolute position" refers to the position relative to the space (i.e., the compartment) of the frame 7 where the drawing device 1 is set. In addition, the absolute position of the sensor element 51 can also be achieved by fixing the sensor element 5 to a location other than the elevated portion 74.

By fixing the absolute position of the sensor element 51, the error of the distance obtained by the sensor element 51 can be suppressed to a very small level, so that it can be easily used for autofocus control. In the case of fixing the absolute position of the sensor element 51, although the number of sensor elements 51 becomes larger than that in the case of FIG. 12, since the sensor element 51 is a cheap sensor, the manufacturing cost of the device will not increase significantly.

The number of sensor elements 51 whose absolute position is fixed to the first substrate holding part (the first stage 21a in the case of FIG. 1) can be one or more. The number of sensor elements 51 whose absolute position is fixed above the second substrate holding part (the second stage 21b in the case of FIG. 1) can be one or more. In the case of the example of FIG. 1, the minimum number of sensor elements 51 is two.

In the case where there are two or more sensor elements 51 facing one substrate 9 at the same time, the first distance sensor 5 obtaining the distance between the first distance sensor 5 and the measurement position on the substrate 9 means obtaining the distance between each sensor element 51 and the corresponding measurement position on the substrate 9. In the case where there is one sensor element 51 facing one substrate 9, the first distance sensor 5 obtaining the distance between the first distance sensor 5 and the measurement position on the substrate 9 means obtaining the distance between one sensor element 51 and the corresponding measurement position on the substrate 9.

In the case of the example of FIG. 12 , the relative position of the first distance measuring sensor 5 relative to the first substrate holding portion as the first stage 21a and the second substrate holding portion as the second stage 21b is switched between the position opposite to the first substrate 9 held by the first substrate holding portion and the position opposite to the second substrate 9 held by the second substrate holding portion together with the alignment camera 31 by the camera position switching portion 32. In this case, the minimum number of sensor elements 51 of the first distance measuring sensor 5 is one. In addition, the first distance measuring sensor 5 can also be fixed to a position other than the camera base 33 as long as it moves together with the alignment camera 31. The camera position switching unit 32 may have various structures as long as it switches the relative position of the camera 31 relative to the first substrate holding unit and the second substrate holding unit between the position opposite to the first substrate 9 held by the first substrate holding unit and the position opposite to the second substrate 9 held by the second substrate holding unit.

In the above-mentioned drawing device 1, the focus control unit 113 uses the pre-focus information obtained by the first distance sensor 5 to implement the following actions: the focus position (image height position) of the drawing head 41 is preliminarily brought close to the position (surface height position) of the surface of the substrate 9, and when the drawing head 41 is arranged at the first drawing position or the second drawing position, the drawing of the pattern is immediately started while performing automatic focus control. However, the information obtained by the first distance sensor 5 is not limited to the pre-focus information obtained in the above-mentioned manner.

For example, in the above-mentioned embodiment, although the surface height position is obtained at the position where the first main scan is started, the surface height position may be obtained at the position where all the main scans in the +Y direction and the -Y direction are started. Furthermore, the change of the surface height position in the entire length of all the main scans may be obtained in advance by the first ranging sensor 5, and this information may be used when drawing a pattern while using the second ranging sensor 412. For example, the position where the auto focus control using the second ranging sensor 412 may be wrong may be detected in advance by the first ranging sensor 5 in each main scan, and used to prevent control errors during drawing. In either case, the measurement performed by the first ranging sensor 5 is performed in the above-mentioned steps S14 and S24. As described above, the focus control unit 113 can also control the focus changing unit 413 while using the information obtained from the substrate 9 by the first distance sensor 5 before the pattern is drawn and the information obtained by the second distance sensor 412 during the pattern drawing on the substrate 9 as various forms.

The focus control unit 113 uses information from the first distance sensor 5 and information from the second distance sensor 412, thereby obtaining information from the substrate 9 held by the other substrate holding unit in advance through the first distance sensor 5 during the period of drawing a pattern on the substrate 9 held by the substrate holding unit of one party, and using the information obtained by the first distance sensor 5 when drawing a pattern on the substrate 9 held by the substrate holding unit of the other party, thereby efficiently performing focus control when drawing a pattern, thereby improving the processing volume.

In the above-mentioned embodiment, although the first distance measuring sensor 5 measures near the start drawing position and obtains the highest frequency value of the distance between the sensor element 51 and the substrate 9 as pre-focus information, the pre-focus information may also be an average value or a central value of the distance. Even with this information, before the drawing head 41 starts drawing a pattern on the substrate 9 held by the first substrate holding portion or the second substrate holding portion, the pre-focus control unit 113 can use the information obtained by the first distance measuring sensor 5 to bring the focus position (image height position) of the light emitted from the drawing head 41 close to the surface height position of the substrate 9 when drawing starts.

In the case of the example of FIG. 1 , it is preferable that the number of sensor elements 51 of the first distance measuring sensor 5 is twice the number of the drawing heads 41. In this way, the distance between the drawing head 41 and the substrate 9 at the position where each drawing head 41 starts drawing can be obtained. In the case of the example of FIG. 12 , it is preferable that the number of sensor elements 51 of the first distance measuring sensor 5 is the same as the number of the drawing heads 41. However, the number of sensor elements 51 of the first distance measuring sensor 5 is not limited to the above example. Even in the case where the measurement position of the sensor element 51 does not coincide with the starting position of the drawing head 41, for example, the measurement values of a plurality of sensor elements 51 are linearly interpolated, thereby obtaining the distance between the drawing head 41 and the substrate 9 at the starting position of each drawing head 41 (or the surface height position).

In the drawing device 1, the first transport mechanism 2a may further have one or more of the following components: a moving mechanism that moves the first substrate holding part (first stage 21a) in the X direction; a rotating mechanism that rotates the first substrate holding part around a rotating shaft extending in the Z direction; and a lifting mechanism that moves the first substrate holding part in the Z direction. As the moving mechanism and the lifting mechanism, for example, a linear servo motor can be used. In addition, as the rotating mechanism, for example, a servo motor can be used. The moving mechanism, the rotating mechanism, and the lifting mechanism can also be modified in various ways. The second transport mechanism 2b is also the same as the first transport mechanism 2a.

In the drawing device 1, the number of substrate holding parts may be more than three. In this case, it is preferred that the number of more than one drawing heads 41 (hereinafter referred to as "drawing head group") used for drawing the same substrate 9 at the same time is less than the number of substrate holding parts (and more than one), the number of more than one alignment cameras 31 (hereinafter referred to as "camera group") used for photographing the same substrate 9 at the same time is also less than the number of substrate holding parts (and more than one), and the number of first distance measuring sensors 5 (that is, more than one sensor elements 51 used for measuring the same substrate 9 at the same time) is also less than the number of substrate holding parts (and more than one). The processing performed by each substrate holding part is the same as the processing performed by the first substrate holding part and the second substrate holding part mentioned above.

According to the above configuration, by using a drawing head group whose number is less than the number of substrate holding parts, a camera group whose number is less than the number of substrate holding parts, and a first distance measuring sensor 5 whose number is less than the number of substrate holding parts, it is possible to obtain the alignment information of other substrates 9 and the information from the first distance measuring sensor 5 during the drawing of any substrate 9, thereby improving the processing capacity. Generally speaking, since the drawing action of the pattern takes time, it is preferable that the number of the drawing head group is one less than the number of substrate holding parts.

The substrate 9 is not limited to a printed circuit substrate. In the drawing device 1, it is also possible to draw glass substrates for flat panel display devices such as semiconductor substrates, liquid crystal display devices, organic EL display devices, glass substrates for photomasks, and substrates for solar cell panels.

The above-mentioned embodiments and the configurations in the various variations can be appropriately combined as long as they do not contradict each other.

Although the present invention has been described and illustrated in detail, these descriptions are illustrative rather than restrictive. Therefore, it is believed that there are many variations and aspects as long as they do not depart from the scope of the present invention.

1: Drawing device

2: Mobile mechanism

2a: First transportation agency

2b: Second transport mechanism

3: Photography Department

4: Pattern drawing department

5: First distance sensor

7: Framework

9: Substrate (first substrate, second substrate)

10: Control Department

21a: First stage (first substrate holding part)

21b: Second stage (second substrate holding part)

22a: First moving mechanism

22b: Second moving mechanism

31: Aim the camera

32: Camera position switching unit

41: Drawing head

42: Drawing head moving mechanism

51:Sensor elements

71: Base

72: The first elevated section

73: Second elevated section

74: Elevated section

91: Upper surface

221a,221b:Guide rails

Claims (7)

A drawing device is provided for drawing a pattern on a substrate by irradiating light to the substrate; the drawing device comprises: a drawing head for emitting modulated light; a first substrate holding part for holding the first substrate; a second substrate holding part for holding the second substrate; and a moving mechanism for moving the drawing head relative to the first substrate holding part while the light emitted from the drawing head is drawing the pattern on the first substrate held by the first substrate holding part. The first distance measuring sensor is used to move the drawing head relative to the second substrate holding portion while the second substrate held by the second substrate holding portion is drawing a pattern. The first distance measuring sensor is used to move the drawing head relative to the second substrate holding portion while the second substrate held by the second substrate holding portion is drawing a pattern. The first distance measuring sensor is used to move the drawing head relative to the second substrate holding portion while the second substrate held by the second substrate holding portion is drawing a pattern. The first distance measuring sensor is used to move the drawing head relative to the second substrate holding portion while the second substrate held by the second substrate holding portion is drawing a pattern. The drawing head is provided with a second distance measuring sensor for obtaining the distance from the measurement position on the substrate on which the pattern is being drawn; and a focus control unit for controlling the focus position of the light emitted from the drawing head to be aligned with the height direction of the surface of the substrate on which the pattern is being drawn during the drawing of the pattern. The drawing head comprises: a second distance measuring sensor for obtaining the distance from the measurement position on the substrate on which the pattern is being drawn; and a focus changing unit for changing the focus position of the light emitted from the drawing head. Focus position; After the drawing head draws a pattern on the substrate held by one of the first substrate holding part or the second substrate holding part, and before the drawing head draws a pattern on the substrate held by the other of the first substrate holding part or the second substrate holding part, the focus control part uses the information obtained by the first distance measuring sensor to bring the focus position of the light emitted from the drawing head close to the height direction position of the surface of the substrate when drawing starts. A depiction device as described in claim 1, wherein the measurement accuracy of the first distance sensor is lower than the measurement accuracy of the second distance sensor. The drawing device as recited in claim 1, wherein the first distance measuring sensor is configured to obtain a plurality of distances up to the plurality of the aforementioned positions while making the measurement position located at a plurality of positions near the starting drawing position on the substrate held by the first substrate holding portion or the second substrate holding portion; and the focus control portion uses the distance with the highest frequency among the plurality of the aforementioned distances as the distance between the first distance measuring sensor and the aforementioned substrate. A drawing device as recited in any one of claims 1 to 3, wherein the first distance measuring sensor comprises a sensor element whose absolute position is fixed above the first substrate holding portion and a sensor element whose absolute position is fixed above the second substrate holding portion. A drawing device as described in any one of claims 1 to 3, further comprising: an alignment camera, which faces the first substrate held by the first substrate holding portion and photographs the alignment mark on the first substrate during the drawing of the pattern on the second substrate held by the second substrate holding portion, and faces the second substrate held by the second substrate holding portion and photographs the alignment mark on the second substrate during the drawing of the pattern on the first substrate held by the first substrate holding portion; and a camera position switching portion, which switches the alignment camera position. The relative position of the camera relative to the first substrate holding part and the second substrate holding part is switched between a position opposite to the first substrate held by the first substrate holding part and a position opposite to the second substrate held by the second substrate holding part; the relative position of the first distance measuring sensor relative to the first substrate holding part and the second substrate holding part is switched together with the alignment camera between a position opposite to the first substrate and a position opposite to the second substrate by the camera position switching part. The drawing device as described in claim 1, wherein the first distance measuring sensor is a diffuse reflection type; the focus control unit includes: a correction unit, which corrects the distance from the first distance measuring sensor to the measurement position on the substrate obtained by the first distance measuring sensor; the correction unit corrects the distance in response to the material formed on the surface of the substrate and the vicinity. A drawing method is to irradiate light onto a substrate to draw a pattern on the substrate; the drawing method comprises: step a, holding a first substrate by a first substrate holding portion; step b, obtaining a distance between the first distance sensor and a measurement position on the first substrate by a first distance sensor facing the first substrate; step c, emitting modulated light from a drawing head toward the first substrate while moving the drawing head relative to the first substrate holding portion to draw a pattern on the first substrate; step d, holding a second substrate by a second substrate holding portion during step c; step e, while performing step c; During the aforementioned process c, the distance between the aforementioned first distance measuring sensor and the measurement position on the aforementioned second substrate is obtained by the aforementioned first distance measuring sensor facing the aforementioned second substrate; Process f, after the aforementioned process c and the aforementioned process e, while emitting modulated light from the aforementioned drawing head toward the aforementioned second substrate, the aforementioned drawing head is relatively moved relative to the aforementioned second substrate holding portion, thereby drawing a pattern on the aforementioned second substrate; and process g, repeating the aforementioned process a to the aforementioned process f; during the aforementioned process f, the aforementioned process a and the aforementioned process b are performed on the next first substrate; during the aforementioned process f and the aforementioned process b on the next first substrate After the aforementioned step b, the aforementioned step c is performed on the aforementioned next first substrate; the aforementioned drawing head includes: a second distance measuring sensor, which obtains the distance between the measurement position and the substrate on which the pattern is being drawn; in the aforementioned step c, the following focus control is performed: before the aforementioned drawing head starts to draw the pattern on the aforementioned first substrate, the focus position of the light emitted from the aforementioned drawing head is aligned to the position in the height direction of the surface of the aforementioned first substrate using the information obtained from the aforementioned first distance measuring sensor in the aforementioned step b; while the aforementioned drawing head is drawing the pattern on the aforementioned first substrate, the focus position of the light emitted from the aforementioned drawing head is aligned to the position in the height direction of the surface of the aforementioned first substrate using the information from the aforementioned second distance measuring sensor The focus position of the light emitted by the drawing head is aligned to the position in the height direction of the surface of the first substrate; the following focus control is performed in the above step f: before the above drawing head starts drawing the pattern on the above second substrate, the focus position of the light emitted from the drawing head is brought close to the position in the height direction of the surface of the second substrate using the information obtained from the above second substrate by the above first distance sensor in the above step e; while the above drawing head is drawing the pattern on the above second substrate, the focus position of the light emitted from the drawing head is aligned to the position in the height direction of the surface of the second substrate using the information from the above second distance sensor.

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