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TWI827897B - Low dielectric loss polyimide film - Google Patents

Low dielectric loss polyimide film Download PDF

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TWI827897B
TWI827897B TW109146657A TW109146657A TWI827897B TW I827897 B TWI827897 B TW I827897B TW 109146657 A TW109146657 A TW 109146657A TW 109146657 A TW109146657 A TW 109146657A TW I827897 B TWI827897 B TW I827897B
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TW202225266A (en
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蔡家量
何宜學
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達邁科技股份有限公司
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Abstract

本發明為一種低介電損失之聚醯亞胺膜,其係由共聚聚醯胺酸經由化學環化法製得而成,其中共聚聚醯胺酸至少需具有3,3',4,4'-聯苯四甲酸二酐(3,3’,4,4’-biphenyltetracarboxylic dianhydride;BPDA)與對苯二胺(p-phenylene diamine;p-PDA)以及下述化學式(A)之二胺的組成: The invention is a polyimide film with low dielectric loss, which is prepared from copolymerized polyamide through a chemical cyclization method, wherein the copolymerized polyamide must have at least 3,3',4,4' -The composition of biphenyltetracarboxylic dianhydride (3,3',4,4'-biphenyltetracarboxylic dianhydride; BPDA), p-phenylene diamine (p-PDA) and the diamine of the following chemical formula (A) :

Figure 109146657-A0101-11-0001-7
Figure 109146657-A0101-11-0001-7

其中,BPDA的莫耳數需佔該共聚聚醯胺酸之二酸酐總莫耳數之百分比60以上,以及p-PDA的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比50以上,及化學式(A)的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比30以上反應組成;以及該聚醯亞胺膜具有玻璃轉移溫度Tg大於280℃,介電損耗正切Df(@ 10GHz)小於0.008及熱線膨脹係數CTE小於12ppm/℃。 Among them, the molar number of BPDA must account for more than 60% of the total molar number of the dianhydride of the copolymerized polyamic acid, and the molar number of p-PDA must account for the total molar number of the diamine of the copolymerized polyamic acid. The percentage of the molar number of chemical formula (A) must be more than 30% of the total molar number of diamines in the copolymerized polyamide acid; and the polyimide film has a glass transition temperature Tg greater than 280 ℃, the dielectric loss tangent Df (@ 10GHz) is less than 0.008 and the thermal expansion coefficient CTE is less than 12ppm/℃.

Description

低介電損失之聚醯亞胺膜 Low dielectric loss polyimide film

本發明為一種低介電損失之聚醯亞胺膜,特別係指一種以化學法製造25微米以上之聚醯亞胺膜,使其具有較低之介電損失及較低之線膨脹係數者。 The invention is a polyimide film with low dielectric loss, especially a polyimide film with a diameter of 25 microns or more produced by a chemical method, so that it has a low dielectric loss and a low linear expansion coefficient. .

聚醯亞胺具有優秀的耐熱性、電氣特性與機械強度特性及經設計後有較低的介電損耗,使聚醯亞胺薄膜常使用於具有高溫製程的軟性電路板應用領域,以及近期更多設計於5G高頻高速應用原件上。另外,目前廣為人知的是由1,2,4,5-苯四甲酸酐(PMDA)與苯二胺(PDA)以及3,3’,4,4’-聯苯四甲酸二酐(BPDA)與對苯二胺(PDA)所組成之聚醯亞胺。其中,PMDA/PDA雖然有極佳的熱性質,但其膜非常脆且機械特性和電性差,而BPDA/PDA不僅有優異的耐熱性,且機械特性以及尺寸安定性等等也極佳,故而優選在需求這些特性之可撓性印刷電路板、半導體元件之保護膜、積體電路之層間絕緣膜等等用途上使用,但其較高的介電損耗就不適用於5G高頻材料上。另外,因為其剛硬且具有直線直線之主結構,導致分子排列堆積過密,使其薄膜在製造中因溶劑蒸氣不易透過而在內部及表面產生氣泡。 Polyimide has excellent heat resistance, electrical properties and mechanical strength properties and is designed to have low dielectric loss. Polyimide films are often used in flexible circuit board applications with high-temperature processes, as well as in recent developments. Most of them are designed for 5G high-frequency and high-speed application components. In addition, the currently well-known compounds are composed of 1,2,4,5-pyromellitic anhydride (PMDA) and phenylenediamine (PDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and Polyimide composed of p-phenylenediamine (PDA). Among them, although PMDA/PDA has excellent thermal properties, its film is very brittle and has poor mechanical and electrical properties. BPDA/PDA not only has excellent heat resistance, but also has excellent mechanical properties and dimensional stability. Therefore, It is preferably used in applications such as flexible printed circuit boards, protective films for semiconductor components, and interlayer insulating films for integrated circuits that require these characteristics. However, its high dielectric loss makes it unsuitable for 5G high-frequency materials. In addition, because it is rigid and has a straight main structure, the molecules are arranged and packed too densely, making it difficult for solvent vapor to penetrate during the production of the film, causing bubbles to be generated inside and on the surface.

由於此類聚醯亞胺膜易有氣泡產生,故以往大多使用熱環化的 製程方式來生產,因為熱環化製程系由聚醯胺酸前驅物(PAA)經過緩慢的加熱烘烤,烘烤溫度需大於300度以上而得。在此製程中,聚醯胺酸前驅物(PAA)在尚有溶劑存在的可塑段時,其分子鍊段為非線性,所以排列較不緊密,所以氣泡產生的狀況較少,但在膜厚較厚(>25um)的狀況下仍會有泡。而由專利文獻1是使用共溶劑的方式來製造此聚醯亞胺(BPDA-PDA),共溶劑是利用不同沸點的溶劑產生之共沸現象,在相同烘烤過程中減少溶劑的殘留量而獲得無氣泡的聚醯亞胺膜,但其缺點是在於量產後之廢液處理繁瑣且增加成本。 Since this type of polyimide membrane is prone to bubbles, thermal cyclization was mostly used in the past. It is produced by a process method, because the thermal cyclization process is obtained by slowly heating and baking the polyamide precursor (PAA), and the baking temperature needs to be greater than 300 degrees. In this process, when the polyamide precursor (PAA) is in the plastic segment where the solvent is still present, its molecular chain segments are nonlinear, so the arrangement is less dense, so bubbles are less likely to occur, but when the film thickness There will still be bubbles when it is thicker (>25um). Patent Document 1 uses a co-solvent to produce the polyimide (BPDA-PDA). The co-solvent utilizes the azeotropic phenomenon produced by solvents with different boiling points to reduce the residual amount of solvent during the same baking process. A bubble-free polyimide membrane is obtained, but the disadvantage is that the waste liquid treatment after mass production is cumbersome and increases the cost.

除了熱環化法外,化學環化也是種常見的製膜工藝,化學環化使用脫水劑與催化劑,在溫度較低的時候便可將聚醯胺酸前驅物轉換成聚醯亞胺,因此在有溶劑存在的可塑段時,由於大部分的非線性聚醯胺酸鏈段轉變成線性的聚醯亞胺鏈段,此時分子鏈排列規律且緊密,相對來說會更容易且更多的氣泡產生,但也因此聚醯亞胺之化學環化法比熱環化法會有更佳的機械性質與熱性質,而由專利文獻2提供使用少量立體障礙較大的單體加入組成聚醯亞胺,使分子鍊段能有將溶劑較易排出的空間,且不至於影響過多的機械特性及熱性質。其雖然可有效解除氣泡產生得狀況,但會對電性影響較大,導致介電損耗提升而無法應用於5G高頻材料上。 In addition to thermal cyclization, chemical cyclization is also a common film-making process. Chemical cyclization uses dehydrating agents and catalysts to convert the polyamide precursor into polyimide at low temperatures. Therefore, In the plastic segment in the presence of solvent, since most of the nonlinear polyamide chain segments are converted into linear polyimide chain segments, the molecular chains are arranged regularly and closely, which is relatively easier and more Bubbles are generated, but therefore the chemical cyclization method of polyimide will have better mechanical and thermal properties than the thermal cyclization method. Patent Document 2 provides that a small amount of monomers with larger steric hindrances are added to form the polyimide. Imine allows the molecular chain segment to have space for the solvent to be discharged more easily without affecting too many mechanical and thermal properties. Although it can effectively eliminate bubbles, it will have a greater impact on electrical properties, resulting in increased dielectric loss and cannot be applied to 5G high-frequency materials.

專利文獻1:CN101802059B Patent document 1: CN101802059B

專利文獻2:TWI448487B Patent Document 2: TWI448487B

本發明為一種聚醯亞胺膜,其係由共聚聚醯胺酸經由化學環化法製得而成,其中共聚聚醯胺酸至少需具有3,3',4,4'-聯苯四甲酸二酐 The invention is a polyimide film, which is prepared from copolymerized polyamide through a chemical cyclization method, wherein the copolymerized polyamide must have at least 3,3',4,4'-biphenyltetracarboxylic acid. dianhydride

(3,3’,4,4’-biphenyltetracarboxylic dianhydride;BPDA)與對苯二胺(p- phenylene diamine;p-PDA)以及下述化學式(A)之二胺的組成。 (3,3’,4,4’-biphenyltetracarboxylic dianhydride; BPDA) and p-phenylenediamine (p- phenylene diamine; p-PDA) and the diamine of the following chemical formula (A).

Figure 109146657-A0101-12-0003-2
Figure 109146657-A0101-12-0003-2

其中化學式(A)中,R可為-CF3或-CH3; In the chemical formula (A), R can be -CF3 or -CH3;

其中BPDA的莫耳數需佔該聚醯胺酸之二酐總莫耳數之百分比60以上,以及p-PDA的莫耳數需佔該聚醯亞胺酸之二胺總莫耳數之百分比50以上,及化學式(A)的莫耳數需佔該聚醯亞胺酸之二胺總莫耳數之百分比30以上反應組成,使該聚醯亞胺膜具有: The molar number of BPDA must account for more than 60% of the total molar number of the dianhydride of the polyamic acid, and the molar number of p-PDA must account for the total molar number of the diamine of the polyamic acid. More than 50, and the molar number of chemical formula (A) needs to account for more than 30% of the total molar number of the diamines of the polyimide acid. The reaction composition makes the polyimide film have:

a.玻璃轉移溫度Tg大於280℃ a. Glass transition temperature Tg is greater than 280℃

b.介電損耗正切Df(@ 10GHz)小於0.008 b. Dielectric loss tangent Df (@ 10GHz) is less than 0.008

c.熱線膨脹係數CTE小於12ppm/℃。 c. The thermal expansion coefficient CTE is less than 12ppm/℃.

本發明低介電損失之聚醯亞胺膜,該聚醯亞胺膜之厚度大於25微米,其係由共聚聚醯胺酸經由化學環化法製得而成,其中共聚聚醯胺酸至少需具有3,3',4,4'-聯苯四甲酸二酐(3,3,4,4’-biphenyltetracarboxylic dianhydride;BPDA)與對苯二胺(p-phenylene diamine;p-PDA)以及下述化學式(A)之二胺的組成,該化學式(A)為如下: The polyimide film with low dielectric loss of the present invention, the thickness of the polyimide film is greater than 25 microns, and is prepared from copolymerized polyamide through a chemical cyclization method, wherein the copolymerized polyamide requires at least It has 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and p-phenylenediamine (p-phenylene diamine; p-PDA) and the following The composition of the diamine of chemical formula (A), which chemical formula (A) is as follows:

Figure 109146657-A0101-12-0003-3
其中BPDA的莫耳數需佔該共聚聚醯胺酸之二酸酐總莫耳數之百分比60以 上,以及p-PDA的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比50以上;化學式(A)的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比30以上反應組成;以及使該聚醯亞胺膜具有玻璃轉移溫度Tg大於280℃,介電損耗正切Df(@ 10GHz)小於0.008,熱線膨脹係數CTE小於12ppm/℃。
Figure 109146657-A0101-12-0003-3
The molar number of BPDA must account for more than 60% of the total molar number of the dianhydride of the copolymerized polyamic acid, and the molar number of p-PDA must account for the total molar number of the diamine of the copolymerized polyamic acid. The percentage is more than 50; the molar number of chemical formula (A) needs to account for more than 30 molar percentage of the total molar number of the diamine of the copolymerized polyamide acid; and the polyimide film has a glass transition temperature Tg greater than 280°C. , the dielectric loss tangent Df (@ 10GHz) is less than 0.008, and the thermal expansion coefficient CTE is less than 12ppm/℃.

其中,該芳香族聚醯胺酸除了上述PDA、化學式(A)及BPDA之芳香族二胺與芳香族二酐反應而得之外,還可包含以下芳香族二胺及二酐:其中芳香族二胺包含了2,2'-二(三氟甲基)二氨基聯苯(TFMB)、2,2'-雙[4-(4-氨基苯氧基苯基)〕丙烷(BAPP)、2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷(HFBAPP)、對苯二胺(PDA)、4,4'-二(4-氨基苯氧基)聯苯(BAPB)、2,2'-雙(三氟甲基)-4,4'-二氨基苯基醚(6FODA)、4,4'-二氨基二苯碸(44DDS)、4,4'-二氨基二苯醚(ODA)、4,4'-二氨基苯醯替苯胺(44DABA)、2,2-双(4-氨基苯基)六氟丙烷(Bis-A-AF)、間苯二胺(mPDA)、3,5-二氨基苯甲酸(35DABA)、2-(4-氨基苯基)-5-氨基苯並惡唑(5BPOA)、1,4-雙(4-氨基苯氧基)苯(TPEQ)、4,4'-[1,4-苯基雙(氧)]雙[3-(三氟甲基)苯胺](FAPB)。 Wherein, in addition to the above-mentioned PDA, chemical formula (A) and BPDA aromatic diamine and aromatic dianhydride reaction, the aromatic polyamic acid may also include the following aromatic diamines and dianhydrides: wherein aromatic Diamines include 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB), 2,2'-bis[4-(4-aminophenoxyphenyl)]propane (BAPP), 2 ,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane (HFBAPP), p-phenylenediamine (PDA), 4,4' -Bis(4-aminophenoxy)biphenyl (BAPB), 2,2'-bis(trifluoromethyl)-4,4'-diaminophenyl ether (6FODA), 4,4'-diamino Diphenyl sulfide (44DDS), 4,4'-diaminodiphenyl ether (ODA), 4,4'-diaminobenzoanilide (44DABA), 2,2-bis(4-aminophenyl)hexafluoro Propane (Bis-A-AF), m-phenylenediamine (mPDA), 3,5-diaminobenzoic acid (35DABA), 2-(4-aminophenyl)-5-aminobenzoxazole (5BPOA), 1,4-bis(4-aminophenoxy)benzene (TPEQ), 4,4'-[1,4-phenylbis(oxy)]bis[3-(trifluoromethyl)aniline](FAPB) .

其,該化學式(A)中的R可為CH3,使化學式(A)為2,2'-二甲基-4,4'-二氨基聯苯(m-TB)。 Among them, R in the chemical formula (A) can be CH3, so that the chemical formula (A) is 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB).

其中,該化學式(A)中的R可為CF3,使化學式(A)為2,2-二(三氟甲基)二氨基聯苯(TFMB)。 Wherein, R in the chemical formula (A) can be CF3, so that the chemical formula (A) is 2,2-bis(trifluoromethyl)diaminobiphenyl (TFMB).

其中,該化學環化法為添加脫水劑以及催化劑而成,其中脫水劑為乙酸酐,催化劑為甲基吡啶、異喹啉。 Among them, the chemical cyclization method is formed by adding a dehydrating agent and a catalyst, wherein the dehydrating agent is acetic anhydride and the catalyst is methylpyridine and isoquinoline.

該脫水劑添加量至少為2當量數以上,該催化劑添加量至少為1當量數以上 The dehydrating agent is added in an amount of at least 2 equivalents, and the catalyst is added in an amount of at least 1 equivalent.

實施例 Example

<檢測方法> <Detection method>

下列實施例中所得到的聚醯亞胺膜的熱性質與電性質使用以下方法量測。 The thermal properties and electrical properties of the polyimide films obtained in the following examples were measured using the following methods.

(1)Dk & Df @ 10GHz:使用Keysight Technologies公司出品型號為E5071C ENA Network Analyzer儀器量測。 (1) Dk & Df @ 10GHz: Measured using the E5071C ENA Network Analyzer instrument produced by Keysight Technologies.

(2)CTE:依照ASTM D696規範,使用TA Instruments公司出的型號Q400 TMA儀器量測。量測透明聚醯亞胺膜在50~200℃時的熱膨脹係數,升溫速率設定為10℃/min。為了除去因熱處理所造成的應力,藉由第一次量測除去殘餘應力後,以第二次量測結果做為實際值。 (2) CTE: Measured in accordance with ASTM D696 specifications using the model Q400 TMA instrument produced by TA Instruments. Measure the thermal expansion coefficient of the transparent polyimide film at 50~200℃, and set the heating rate to 10℃/min. In order to remove the stress caused by heat treatment, after removing the residual stress through the first measurement, the second measurement result is used as the actual value.

(3)厚度:使用Elektro Physik公司所製,型號MiniTest 2100儀器進行量測。 (3) Thickness: Measured using MiniTest 2100 instrument manufactured by Elektro Physik Company.

<實施例1> <Example 1>

聚醯胺酸的製作 Production of polyamide

將17.458克的p-phenylene diamine(PDA,0.0161mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入27.174克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.092mole),攪拌反應1小時且溫度持續維持在25℃再添加14.688克的2,2'-diMethyl-4,4'-diaMinobiphenyl(m-Tolidine,0.069mole),攪拌至完全溶解,再緩慢添加40.034克的BPDA,0.136mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000cps±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 17.458 grams of p-phenylene diamine (PDA, 0.0161 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 27.174 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.092 mole), stir for 1 hour and keep the temperature at 25°C, then add 14.688 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (m-Tolidine, 0.069 mole), stir until Completely dissolve, then slowly add 40.034 grams of BPDA, 0.136 mole, stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C, then use a trace amount of BPDA to adjust the viscosity to 200,000cps±30,000cps, and finally get A solution of copolymerized polyamide with a solids content of 20%.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5克,並加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.3毫升的醋酸酐稀釋液與5.3毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於 80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 grams of the above copolymerized polyamide solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, mix acetic anhydride and DMAc at a ratio of 5. Dilute the mixture at a weight ratio of 1, dilute 3-methylpyridine and DMAc at a weight ratio of 1 to 1, and then add 6.3 ml of acetic anhydride diluent and 5.3 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample on Bake in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C and bake for 20 minutes at a rate of 2.0°C/min as the final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為9.7ppm/℃,介電損耗Df 0.0069,Tg 335℃。 The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 9.7ppm/°C, a dielectric loss of Df 0.0069, and a Tg of 335°C.

實施例2 Example 2

聚醯胺酸的製作 Production of polyamide

將11.898克的p-phenylene diamine(PDA,0.0110mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入16.186克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.055mole),攪拌反應1小時且溫度持續維持在25℃再添加23.358克的2,2'-diMethyl-4,4'-diaMinobiphenyl(m-Tolidine,0.110mole),攪拌至完全溶解,再緩慢添加47.586克的BPDA,0.1161mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 11.898 grams of p-phenylene diamine (PDA, 0.0110 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 16.186 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.055 mole), stir for 1 hour and keep the temperature at 25°C, then add 23.358 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (m-Tolidine, 0.110 mole), stir until Completely dissolve, then slowly add 47.586 grams of BPDA, 0.1161 mole, stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C, then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain a solid A 20% copolymerized polyamide solution.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5克,並加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.0毫升的醋酸酐稀釋液與5.1毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 grams of the above copolymerized polyamide solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, mix acetic anhydride and DMAc at a ratio of 5. Dilute the mixture at a weight ratio of 1, dilute 3-methylpyridine and DMAc at a weight ratio of 1 to 1, and add 6.0 ml of acetic anhydride diluent and 5.1 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為7.7ppm/℃,介電損耗Df 0.0065,Tg 315℃。 The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 7.7ppm/°C, a dielectric loss of Df 0.0065, and a Tg of 315°C.

實施例3 Example 3

聚醯胺酸的製作 Production of polyamide

將12.514克的p-phenylene diamine(PDA,0.0116mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入17.064克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.058mole),攪拌反應1小時且溫度持續維持在25℃再添加24.60克的2,2'-diMethyl-4,4'-diaMinobiphenyl(mTB,0.116mole),攪拌至完全溶解,再緩慢添加15.156克的1,2,4,5-苯四甲酸酐(PMDA,0.0695mole),攪拌0.5小時後再緩慢加入30.001克的BPDA,0.102mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 12.514 grams of p-phenylene diamine (PDA, 0.0116 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 17.064 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.058 mole), stir for 1 hour and keep the temperature at 25°C, then add 24.60 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (mTB, 0.116 mole), stir until completely dissolved , then slowly add 15.156 grams of pyromellitic anhydride (PMDA, 0.0695 mole), stir for 0.5 hours, then slowly add 30.001 grams of BPDA, 0.102 mole, stir for 12 hours until it dissolves and reacts , and the temperature of the solution was maintained at 25°C, and then a trace amount of BPDA was used to adjust the viscosity to 200,000±30,000cps, and finally a copolymerized polyamide solution with a solid content of 20% was obtained.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.3毫升的醋酸酐稀釋液與5.3毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 58.5 grams of the above copolymerized polyamide solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.3 ml of acetic anhydride diluent and 5.3 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為8.5ppm/℃,介電損耗Df 0.008,Tg 342℃。 The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 8.5ppm/°C, a dielectric loss of Df 0.008, and a Tg of 342°C.

實施例4 Example 4

聚醯胺酸的製作 Production of polyamide

將11.123克的p-phenylene diamine(PDA,0.103mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入15.151克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.052mole),攪拌反應1小時且溫度持續維持在25℃再添加24.60克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.103mole),攪拌至完全溶解,再緩慢添加13.472克的1,2,4,5-苯四甲酸酐(PMDA,0.062mole),攪拌0.5小時後再緩慢加入26.666克的BPDA,0.091mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 11.123 grams of p-phenylene diamine (PDA, 0.103 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 15.151 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.052 mole), stir for 1 hour and keep the temperature at 25°C, then add 24.60 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.103 mole), stir Until it is completely dissolved, slowly add 13.472 grams of pyromellitic anhydride (PMDA, 0.062 mole), stir for 0.5 hours, then slowly add 26.666 grams of BPDA, 0.091 mole, and stir for 12 hours until it completes. Dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain a copolymerized polyamide solution with a solid content of 20%.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加5.6毫升的醋酸酐稀釋液與4.7毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 58.5 grams of the above copolymerized polyamide solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 5.6 ml of acetic anhydride diluent and 4.7 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為11.9ppm/℃,介電損耗Df 0.007,Tg 328℃。 The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 11.9ppm/°C, a dielectric loss of Df 0.007, and a Tg of 328°C.

實施例5 Example 5

共聚聚醯胺酸的製作 Preparation of copolymerized polyamide

將10.623克的p-phenylene diamine(PDA,0.098mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入14.470克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.049mole),攪拌反應1小時且溫度持續維持在25℃再添加31.498克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.098mole),攪拌至完全溶解,再緩慢加入42.831克的BPDA,0.146mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 10.623 grams of p-phenylene diamine (PDA, 0.098 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 14.470 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.049 mole), stir for 1 hour and keep the temperature at 25°C, then add 31.498 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.098 mole), stir Until it is completely dissolved, slowly add 42.831 grams of BPDA, 0.146 mole, stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally get A solution of copolymerized polyamide with a solids content of 20%.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加5.3毫升的醋酸酐稀釋液與4.5毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 58.5 grams of the above copolymerized polyamide solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 5.3 ml of acetic anhydride diluent and 4.5 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為11ppm/℃,介電損耗Df 0.0075,Tg 300℃。 The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 11ppm/°C, a dielectric loss of Df 0.0075, and a Tg of 300°C.

實施例6 Example 6

聚醯胺酸的製作 Production of polyamide

將11.123克的p-phenylene diamine(PDA,0.103mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入15.151克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.052mole),攪拌反應1小時且溫度持續維持在25℃再添加24.60克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.103mole),攪拌至完全溶解,再緩慢添加13.472克的1,2,4,5-苯四甲酸酐(PMDA,0.062mole),攪拌0.5小時後再緩慢加入26.666克的BPDA,0.091mole,攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 11.123 grams of p-phenylene diamine (PDA, 0.103 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 15.151 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.052 mole), stir for 1 hour and keep the temperature at 25°C, then add 24.60 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.103 mole), stir Until it is completely dissolved, slowly add 13.472 grams of pyromellitic anhydride (PMDA, 0.062 mole), stir for 0.5 hours, then slowly add 26.666 grams of BPDA, 0.091 mole, stir for 0.5 hours and wait for it to proceed. Dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain a copolymerized polyamide solution with a solid content of 20%.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.1毫升的醋酸酐稀釋液與5.2毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 58.5 mg of the above copolymerized polyamide solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.1 ml of acetic anhydride diluent and 5.2 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為9.0ppm/℃,介電損耗Df 0.0080,Tg 325℃。 The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 9.0ppm/°C, a dielectric loss of Df 0.0080, and a Tg of 325°C.

比較例1 Comparative example 1

聚醯胺酸溶液的製作 Preparation of polyamide solution

將20.422克的p-phenylene diamine(PDA,0.189mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入27.817克的3,3’,4,4’ -biphenyltetracarboxylic dianhydride(BPDA,0.0945mole),攪拌反應1小時且溫度持續維持在25℃再添加10.036克的2,2'-diMethyl-4,4'-diaMinobiphenyl(mTB,0.047mole),攪拌至完全溶解再緩慢加入40.682克的BPDA(0.138mole),攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 20.422 grams of p-phenylene diamine (PDA, 0.189 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 27.817 grams of 3,3’,4,4’ -biphenyltetracarboxylic dianhydride (BPDA, 0.0945 mole), stir for 1 hour and keep the temperature at 25°C, then add 10.036 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (mTB, 0.047 mole), stir until completely dissolved Then slowly add 40.682 grams of BPDA (0.138 mole), stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain a solid content of 20% copolymerized polyamide solution.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.4毫升的醋酸酐稀釋液與5.4毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 58.5 mg of the above copolymerized polyamide solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.4 ml of acetic anhydride diluent and 5.4 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為9.5ppm/℃,介電損耗Df 0.011,Tg 340℃。 The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 9.5ppm/°C, a dielectric loss of Df 0.011, and a Tg of 340°C.

比較例2 Comparative example 2

將10.175克的p-phenylene diamine(PDA,0.094mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入13.859克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.0471mole),攪拌反應1小時且溫度持續維持在25℃再添加10.036克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.047mole),攪拌至完全溶解再緩慢添加12.323克的1,2,4,5-苯四甲 酸酐(PMDA,0.057mole),攪拌0.5小時後再緩慢加入19.614克的4,4'-(4,4'-異丙基二苯氧基)二酞酸酐(BPADA,0.038mole)以及13.028克的BPDA(0.044mole),攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 10.175 grams of p-phenylene diamine (PDA, 0.094 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 13.859 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.0471 mole), stir for 1 hour and keep the temperature at 25°C, then add 10.036 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.047 mole), stir Until it is completely dissolved, slowly add 12.323 grams of 1,2,4,5-benzene tetramethyl acid anhydride (PMDA, 0.057 mole), stir for 0.5 hours and then slowly add 19.614 grams of 4,4'-(4,4'-isopropyl diphenoxy) diphthalic anhydride (BPADA, 0.038 mole) and 13.028 grams of BPDA (0.044 mole), stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain a copolymer with a solid content of 20%. Amino acid solution.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加5.1毫升的醋酸酐稀釋液與4.3毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take 58.5 mg of the above copolymerized polyamide solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 5.1 ml of acetic anhydride diluent and 4.3 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing.

比較例3 Comparative example 3

聚醯胺酸溶液的製作 Preparation of polyamide solution

將12.695克的p-phenylene diamine(PDA,0.118mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入17.293克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.059mole),攪拌反應1小時且溫度持續維持在25℃再添加23.510克的4,4'-二氨基二苯醚(ODA,0.118mole),攪拌至完全溶解再緩慢添加15.375克的1,2,4,5-苯四甲酸酐(PMDA,0.071mole),攪拌0.5小時後再緩慢加入30.089克的BPDA(0.102mole),攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 12.695 grams of p-phenylene diamine (PDA, 0.118 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 17.293 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.059 mole), stir for 1 hour and keep the temperature at 25°C, then add 23.510 grams of 4,4'-diaminodiphenyl ether (ODA, 0.118 mole), stir until completely dissolved and then add slowly 15.375 grams of pyromellitic anhydride (PMDA, 0.071 mole), stir for 0.5 hours, then slowly add 30.089 grams of BPDA (0.102 mole), stir for 12 hours until it dissolves and reacts, and the solution The temperature was maintained at 25°C, and then a trace amount of BPDA was used to adjust the viscosity to 200,000±30,000cps, and finally a copolymerized polyamide solution with a solid content of 20% was obtained.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.4毫升的醋酸酐稀釋液與5.4毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為10.0ppm/℃,介電損耗Df 0.012,Tg 340℃。 Take 58.5 mg of the above copolymerized polyamide solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.4 ml of acetic anhydride diluent and 5.4 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing. The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 10.0ppm/°C, a dielectric loss of Df 0.012, and a Tg of 340°C.

比較例4 Comparative example 4

聚醯胺酸溶液的製作 Preparation of polyamide solution

將26.851克的p-phenylene diamine(PDA,0.249mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入71.686克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.244mole),添加時溫度控制為25℃,攪拌反應二十四小時且溫度持續維持在25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 26.851 grams of p-phenylene diamine (PDA, 0.249 mole) and 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 71.686 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.244 mole), the temperature is controlled at 25°C when added, the reaction is stirred for 24 hours and the temperature is maintained at 25°C, and then a trace amount of BPDA is used to adjust the viscosity to 200,000±30,000cps, and the solid content is finally obtained It is a 20% copolymerized polyamide solution.

聚醯亞胺膜的製作 Production of polyimide membrane

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.8毫升的醋酸酐稀釋液與5.7毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈 到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為3.5ppm/℃,介電損耗Df 0.013,Tg 360℃。 Take 58.5 mg of the above copolymerized polyamide solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.8 ml of acetic anhydride diluent and 5.7 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, and apply the degassed solution After reaching the glass plate, use a 900μm gap spatula to apply. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min, bake for 20 minutes, and then raise the temperature to 350°C at a rate of 2.0°C/min. 20 minutes for final processing. The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 3.5ppm/°C, a dielectric loss of Df 0.013, and a Tg of 360°C.

實施例\與比較例表格 Table of Examples and Comparative Examples

Figure 109146657-A0101-12-0014-5
Figure 109146657-A0101-12-0014-5

上述特定實施例之內容係為了詳細說明本發明,然而,該等實施例係僅用於說明,並非意欲限制本發明。熟習本領域之技藝者可理解, 在不悖離後附申請專利範圍所界定之範疇下針對本發明所進行之各種變化或修改係落入本發明之一部分。 The specific embodiments described above are intended to illustrate the present invention in detail. However, these embodiments are only for illustration and are not intended to limit the present invention. Those familiar with the art in this field can understand, Various changes or modifications made to the present invention without departing from the scope defined in the appended patent application are part of the present invention.

Claims (4)

一種低介電損失之聚醯亞胺膜,該聚醯亞胺膜之厚度大於25微米,其係由共聚聚醯胺酸經由化學環化法製得而成,其中共聚聚醯胺酸至少需具有3,3',4,4'-聯苯四甲酸二酐(3,3,4,4’-biphenyltetracarboxylic dianhydride:BPDA)與對苯二胺(p-phenylene diamine;p-PDA)以及下述化學式(A)之二胺的組成,該化學式(A)為如下:
Figure 109146657-A0305-02-0018-1
,其中,R為為CH3,使化學式(A)為2,2'-二甲基-4,4'-二氨基聯苯(m-TB),或R為CF3,使化學式(A)為2,2-二(三氟甲基)二氨基聯苯(TFMB);其中BPDA的莫耳數需佔該共聚聚醯胺酸之二酸酐總莫耳數之百分比60以上,以及p-PDA的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比50以上;化學式(A)的莫耳數需估該共聚聚醯胺酸之二胺總莫耳數之百分比30以上反應組成;以及使該聚醯亞胺膜具有玻璃轉移溫度Tg大於280℃,介電損耗正切Df(@10GHz)小於0.008,熱線膨脹係數CTE小於12ppm/℃。
A polyimide film with low dielectric loss. The thickness of the polyimide film is greater than 25 microns. It is prepared from copolymerized polyamide through a chemical cyclization method, wherein the copolymerized polyamide must have at least 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and p-phenylene diamine (p-PDA) and the following chemical formula The composition of the diamine of (A), the chemical formula (A) is as follows:
Figure 109146657-A0305-02-0018-1
, where R is CH3, so that chemical formula (A) is 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB), or R is CF3, so that chemical formula (A) is 2 , 2-bis(trifluoromethyl)diaminobiphenyl (TFMB); the molar number of BPDA must account for more than 60% of the total molar number of the dianhydride of the copolymerized polyamide acid, and the molar number of p-PDA must be The molar number of chemical formula (A) needs to account for more than 50% of the total molar number of the diamines of the copolymerized polyamide acid; the molar number of the chemical formula (A) needs to be estimated to be more than 30% of the total molar number of the diamines of the copolymerized polyamic acid. The composition; and the polyimide film has a glass transition temperature Tg greater than 280°C, a dielectric loss tangent Df (@10GHz) less than 0.008, and a thermal expansion coefficient CTE less than 12ppm/°C.
如申請專利範圍第1項所述之低介電損失之聚醯亞胺膜,其中,該芳香族聚醯胺酸除了上述PDA、化學式(A)及BPDA之芳香族二胺與芳香族二酐反應而得之外,還可包含以下芳香族二胺:其中芳香族二胺包含了2,2'-二(三氟甲基)二氨基聯苯(TFMB)、2,2'-雙[4-(4-氨基苯氧基苯基)]丙烷(BAPP)、2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷(HFBAPP)、對苯二胺(PDA)、4,4'-二(4-氨基苯 氧基)聯苯(BAPB)、2,2'-雙(三氟甲基)-4,4'-二氨基苯基醚(6FODA)、4,4'-二氨基二苯碸(44DDS)、4,4'-二氨基二苯醚(ODA)、4,4'-二氨基苯醯替苯胺(44DABA)、2,2-双(4-氨基苯基)六氟丙烷(Bis-A-AF)、間苯二胺(mPDA)、3,5-二氨基苯甲酸(35DABA)、2-(4-氨基苯基)-5-氨基苯並惡唑(5BPOA)、1,4-雙(4-氨基苯氧基)苯(TPEQ)或4,4'-[1,4-苯基雙(氧)]雙[3-(三氟甲基)苯胺](FAPB)。 The polyimide film with low dielectric loss as described in item 1 of the patent application, wherein the aromatic polyamide contains, in addition to the aromatic diamine and aromatic dianhydride of the above-mentioned PDA, chemical formula (A) and BPDA. In addition to those obtained by reaction, the following aromatic diamines may also be included: wherein the aromatic diamines include 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB), 2,2'-bis[4 -(4-Aminophenoxyphenyl)]propane (BAPP), 2,2-bis[4-(4-aminophenoxyphenyl)]-1,1,1,3,3,3-hexa Fluoropropane (HFBAPP), p-phenylenediamine (PDA), 4,4'-bis(4-aminobenzene) Oxy)biphenyl (BAPB), 2,2'-bis(trifluoromethyl)-4,4'-diaminophenyl ether (6FODA), 4,4'-diaminodiphenyl sulfone (44DDS), 4,4'-diaminodiphenyl ether (ODA), 4,4'-diaminobenzoanilide (44DABA), 2,2-bis(4-aminophenyl)hexafluoropropane (Bis-A-AF ), m-phenylenediamine (mPDA), 3,5-diaminobenzoic acid (35DABA), 2-(4-aminophenyl)-5-aminobenzoxazole (5BPOA), 1,4-bis(4 -Aminophenoxy)benzene (TPEQ) or 4,4'-[1,4-phenylbis(oxy)]bis[3-(trifluoromethyl)aniline] (FAPB). 如申請專利範圍第1項所述之低介電損失之聚醯亞胺膜,其中,該化學環化法為添加脫水劑以及催化劑而成,其中脫水劑為乙酸酐,催化劑為甲基吡啶或異喹啉。 The polyimide film with low dielectric loss as described in item 1 of the patent application, wherein the chemical cyclization method is formed by adding a dehydrating agent and a catalyst, wherein the dehydrating agent is acetic anhydride and the catalyst is methylpyridine or Isoquinoline. 如申請專利範圍第3項所述之低介電損失之聚醯亞胺膜,其中,該脫水劑添加量至少為2當量數以上,該催化劑添加量至少為1當量數以上。 For the low dielectric loss polyimide membrane described in item 3 of the patent application, the dehydrating agent is added in an amount of at least 2 equivalents, and the catalyst is added in an amount of at least 1 equivalent.
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TW201825295A (en) * 2016-09-29 2018-07-16 日商新日鐵住金化學股份有限公司 Polyimide film, copper-clad laminate, and circuit substrate
TW201917147A (en) * 2017-10-17 2019-05-01 達邁科技股份有限公司 Method for producing transparent polyimide film having an excellent transparency and a high elongation percentage

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