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TW202225266A - Polyimide film with low dielectric loss having a glass transition temperature Tg of 280 DEG C or higher, a dielectric loss tangent Df (at 10GHz) of 0.008 or less, and a linear thermal expansion coefficient CTE of 12 ppm/DEG C or less - Google Patents

Polyimide film with low dielectric loss having a glass transition temperature Tg of 280 DEG C or higher, a dielectric loss tangent Df (at 10GHz) of 0.008 or less, and a linear thermal expansion coefficient CTE of 12 ppm/DEG C or less Download PDF

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TW202225266A
TW202225266A TW109146657A TW109146657A TW202225266A TW 202225266 A TW202225266 A TW 202225266A TW 109146657 A TW109146657 A TW 109146657A TW 109146657 A TW109146657 A TW 109146657A TW 202225266 A TW202225266 A TW 202225266A
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dielectric loss
polyimide film
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TWI827897B (en
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蔡家量
何宜學
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達邁科技股份有限公司
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Abstract

The present invention is a polyimide film with low dielectric loss, which is prepared from copolymerized polyamic acid by a chemical cyclization method, wherein the copolymerized polyamic acid at least requires a composition having 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and p-phenylene diamine (p-PDA) and a diamine of the following chemical formula (A): wherein, the number of moles of BPDA needs to account for 60 percent or more of the total number of moles of the dianhydrides of the copolymerized polyamic acid, the number of moles of p-PDA needs to account for 50 percent or more of the total molar number of the diamines of the copolymerized polyamic acid, and the number of moles of the chemical formula (A) needs to account for 30 percent or more of the total number of moles of the diamines of the copolymerized polyamide acid; in addition, the polyimide film has a glass transition temperature Tg of 280 DEG C or higher, a dielectric loss tangent Df (at 10GHz) of 0.008 or less, and a linear thermal expansion coefficient CTE of 12 ppm/DEG C or less.

Description

低介電損失之聚醯亞胺膜 Polyimide Film with Low Dielectric Loss

本發明為一種低介電損失之聚醯亞胺膜,特別係指一種以化學法製造25微米以上之聚醯亞胺膜,使其具有較低之介電損失及較低之線膨脹係數者。 The present invention is a polyimide film with low dielectric loss, especially a polyimide film with a size of more than 25 microns produced by chemical method, so that it has lower dielectric loss and lower coefficient of linear expansion .

聚醯亞胺具有優秀的耐熱性、電氣特性與機械強度特性及經設計後有較低的介電損耗,使聚醯亞胺薄膜常使用於具有高溫製程的軟性電路板應用領域,以及近期更多設計於5G高頻高速應用原件上。另外,目前廣為人知的是由1,2,4,5-苯四甲酸酐(PMDA)與苯二胺(PDA)以及3,3’,4,4’-聯苯四甲酸二酐(BPDA)與對苯二胺(PDA)所組成之聚醯亞胺。其中,PMDA/PDA雖然有極佳的熱性質,但其膜非常脆且機械特性和電性差,而BPDA/PDA不僅有優異的耐熱性,且機械特性以及尺寸安定性等等也極佳,故而優選在需求這些特性之可撓性印刷電路板、半導體元件之保護膜、積體電路之層間絕緣膜等等用途上使用,但其較高的介電損耗就不適用於5G高頻材料上。另外,因為其剛硬且具有直線直線之主結構,導致分子排列堆積過密,使其薄膜在製造中因溶劑蒸氣不易透過而在內部及表面產生氣泡。 Polyimide has excellent heat resistance, electrical properties and mechanical strength characteristics, and is designed to have low dielectric loss, so that polyimide films are often used in flexible circuit board applications with high temperature processes, and more recently. Most of them are designed on 5G high-frequency and high-speed application components. In addition, it is widely known that 1,2,4,5-benzenetetracarboxylic anhydride (PMDA) and phenylenediamine (PDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and Polyimide composed of p-phenylenediamine (PDA). Among them, although PMDA/PDA has excellent thermal properties, its film is very brittle and has poor mechanical and electrical properties, while BPDA/PDA not only has excellent heat resistance, but also has excellent mechanical properties and dimensional stability, etc. Therefore, It is preferably used in flexible printed circuit boards, protective films for semiconductor elements, interlayer insulating films for integrated circuits, etc. that require these characteristics, but its high dielectric loss is not suitable for 5G high-frequency materials. In addition, because of its rigidity and the main structure of straight lines, the molecular arrangement is too dense, so that the film is not easily permeated by solvent vapor during the production, and bubbles are generated inside and on the surface.

由於此類聚醯亞胺膜易有氣泡產生,故以往大多使用熱環化的 製程方式來生產,因為熱環化製程系由聚醯胺酸前驅物(PAA)經過緩慢的加熱烘烤,烘烤溫度需大於300度以上而得。在此製程中,聚醯胺酸前驅物(PAA)在尚有溶劑存在的可塑段時,其分子鍊段為非線性,所以排列較不緊密,所以氣泡產生的狀況較少,但在膜厚較厚(>25um)的狀況下仍會有泡。而由專利文獻1是使用共溶劑的方式來製造此聚醯亞胺(BPDA-PDA),共溶劑是利用不同沸點的溶劑產生之共沸現象,在相同烘烤過程中減少溶劑的殘留量而獲得無氣泡的聚醯亞胺膜,但其缺點是在於量產後之廢液處理繁瑣且增加成本。 Since such polyimide films are prone to bubble generation, thermally cyclized films are mostly used in the past. It is produced by the process method, because the thermal cyclization process is obtained by slowly heating and baking the polyamide acid precursor (PAA), and the baking temperature needs to be higher than 300 degrees. In this process, when the plastic segment of the polyamide acid precursor (PAA) still exists in the solvent, its molecular segment is non-linear, so the arrangement is less dense, so the occurrence of bubbles is less, but the film thickness There will still be bubbles in the case of thicker (>25um). In Patent Document 1, the polyimide (BPDA-PDA) is produced by using a co-solvent. The co-solvent uses the azeotropic phenomenon of solvents with different boiling points to reduce the residual amount of the solvent during the same baking process. A bubble-free polyimide membrane can be obtained, but the disadvantage is that the waste liquid treatment after mass production is cumbersome and increases cost.

除了熱環化法外,化學環化也是種常見的製膜工藝,化學環化使用脫水劑與催化劑,在溫度較低的時候便可將聚醯胺酸前驅物轉換成聚醯亞胺,因此在有溶劑存在的可塑段時,由於大部分的非線性聚醯胺酸鏈段轉變成線性的聚醯亞胺鏈段,此時分子鏈排列規律且緊密,相對來說會更容易且更多的氣泡產生,但也因此聚醯亞胺之化學環化法比熱環化法會有更佳的機械性質與熱性質,而由專利文獻2提供使用少量立體障礙較大的單體加入組成聚醯亞胺,使分子鍊段能有將溶劑較易排出的空間,且不至於影響過多的機械特性及熱性質。其雖然可有效解除氣泡產生得狀況,但會對電性影響較大,導致介電損耗提升而無法應用於5G高頻材料上。 In addition to thermal cyclization, chemical cyclization is also a common membrane-making process. Chemical cyclization uses dehydrating agents and catalysts to convert polyamide acid precursors into polyimide at low temperatures. Therefore, In the plastic segment in the presence of solvent, since most of the nonlinear polyimide segments are converted into linear polyimide segments, the molecular chains are arranged regularly and tightly, which is relatively easier and more Therefore, the chemical cyclization method of polyimide will have better mechanical and thermal properties than the thermal cyclization method. Patent Document 2 provides that a small amount of monomers with larger steric barriers are added to form polyimide. The imine can make the molecular segment have a space for the solvent to be easily discharged, and will not affect too much mechanical properties and thermal properties. Although it can effectively relieve the generation of bubbles, it will have a greater impact on electrical properties, resulting in increased dielectric loss and cannot be applied to 5G high-frequency materials.

專利文獻1:CN101802059B Patent Document 1: CN101802059B

專利文獻2:TWI448487B Patent Document 2: TWI448487B

本發明為一種聚醯亞胺膜,其係由共聚聚醯胺酸經由化學環化法製得而成,其中共聚聚醯胺酸至少需具有3,3',4,4'-聯苯四甲酸二酐 The present invention relates to a polyimide film, which is prepared by a chemical cyclization method from a copolymerized polyamic acid, wherein the copolymerized polyamic acid must have at least 3,3',4,4'-biphenyltetracarboxylic acid Dianhydride

(3,3’,4,4’-biphenyltetracarboxylic dianhydride;BPDA)與對苯二胺(p- phenylene diamine;p-PDA)以及下述化學式(A)之二胺的組成。 (3,3',4,4'-biphenyltetracarboxylic dianhydride; BPDA) and p-phenylenediamine (p- phenylene diamine; p-PDA) and the composition of the diamine of the following chemical formula (A).

Figure 109146657-A0101-12-0003-2
Figure 109146657-A0101-12-0003-2

其中化學式(A)中,R可為-CF3或-CH3; Wherein in chemical formula (A), R can be -CF3 or -CH3;

其中BPDA的莫耳數需佔該聚醯胺酸之二酐總莫耳數之百分比60以上,以及p-PDA的莫耳數需佔該聚醯亞胺酸之二胺總莫耳數之百分比50以上,及化學式(A)的莫耳數需佔該聚醯亞胺酸之二胺總莫耳數之百分比30以上反應組成,使該聚醯亞胺膜具有: Wherein the molar number of BPDA needs to account for more than 60% of the total molar number of dianhydride in the polyimide, and the molar number of p-PDA needs to account for the total molar number of diamine in the polyimide acid. More than 50, and the molar number of chemical formula (A) needs to account for more than 30 percent of the total molar number of diamines of the polyimide acid to form the reaction, so that the polyimide film has:

a.玻璃轉移溫度Tg大於280℃ a. Glass transition temperature Tg greater than 280℃

b.介電損耗正切Df(@ 10GHz)小於0.008 b. The dielectric loss tangent Df (@10GHz) is less than 0.008

c.熱線膨脹係數CTE小於12ppm/℃。 c. The thermal linear expansion coefficient CTE is less than 12ppm/℃.

本發明低介電損失之聚醯亞胺膜,該聚醯亞胺膜之厚度大於25微米,其係由共聚聚醯胺酸經由化學環化法製得而成,其中共聚聚醯胺酸至少需具有3,3',4,4'-聯苯四甲酸二酐(3,3,4,4’-biphenyltetracarboxylic dianhydride;BPDA)與對苯二胺(p-phenylene diamine;p-PDA)以及下述化學式(A)之二胺的組成,該化學式(A)為如下: The low dielectric loss polyimide film of the present invention, the thickness of the polyimide film is greater than 25 microns, is prepared by the chemical cyclization method of the copolymerized polyimide, wherein the copolymerized polyimide needs at least With 3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3,4,4'-biphenyltetracarboxylic dianhydride; BPDA) and p-phenylene diamine (p-PDA) and the following The composition of the diamine of chemical formula (A), the chemical formula (A) is as follows:

Figure 109146657-A0101-12-0003-3
其中BPDA的莫耳數需佔該共聚聚醯胺酸之二酸酐總莫耳數之百分比60以 上,以及p-PDA的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比50以上;化學式(A)的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比30以上反應組成;以及使該聚醯亞胺膜具有玻璃轉移溫度Tg大於280℃,介電損耗正切Df(@ 10GHz)小於0.008,熱線膨脹係數CTE小於12ppm/℃。
Figure 109146657-A0101-12-0003-3
Wherein the molar number of BPDA needs to account for more than 60% of the total molar number of dianhydrides of the copolymerized polyamic acid, and the molar number of p-PDA needs to account for the total molar number of diamines of the copolymerized polyamic acid. The percentage is more than 50; the molar number of the chemical formula (A) needs to account for more than 30 percent of the total molar number of diamines in the copolymerized polyamide acid. Reaction composition; and make the polyimide film have a glass transition temperature Tg greater than 280 ° C , the dielectric loss tangent Df (@10GHz) is less than 0.008, and the thermal linear expansion coefficient CTE is less than 12ppm/℃.

其中,該芳香族聚醯胺酸除了上述PDA、化學式(A)及BPDA之芳香族二胺與芳香族二酐反應而得之外,還可包含以下芳香族二胺及二酐:其中芳香族二胺包含了2,2'-二(三氟甲基)二氨基聯苯(TFMB)、2,2'-雙[4-(4-氨基苯氧基苯基)〕丙烷(BAPP)、2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷(HFBAPP)、對苯二胺(PDA)、4,4'-二(4-氨基苯氧基)聯苯(BAPB)、2,2'-雙(三氟甲基)-4,4'-二氨基苯基醚(6FODA)、4,4'-二氨基二苯碸(44DDS)、4,4'-二氨基二苯醚(ODA)、4,4'-二氨基苯醯替苯胺(44DABA)、2,2-双(4-氨基苯基)六氟丙烷(Bis-A-AF)、間苯二胺(mPDA)、3,5-二氨基苯甲酸(35DABA)、2-(4-氨基苯基)-5-氨基苯並惡唑(5BPOA)、1,4-雙(4-氨基苯氧基)苯(TPEQ)、4,4'-[1,4-苯基雙(氧)]雙[3-(三氟甲基)苯胺](FAPB)。 Wherein, in addition to the above-mentioned PDA, chemical formula (A) and aromatic diamine of chemical formula (A) and BPDA and aromatic dianhydride obtained by the reaction of the aromatic polyamide acid, the aromatic diamine and dianhydride can also include the following aromatic diamines and dianhydrides: Diamines include 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB), 2,2'-bis[4-(4-aminophenoxyphenyl)]propane (BAPP), 2 ,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane (HFBAPP), p-phenylenediamine (PDA), 4,4' -Bis(4-aminophenoxy)biphenyl (BAPB), 2,2'-bis(trifluoromethyl)-4,4'-diaminophenyl ether (6FODA), 4,4'-diamino Diphenylene (44DDS), 4,4'-diaminodiphenyl ether (ODA), 4,4'-diaminobenzidine (44DABA), 2,2-bis(4-aminophenyl)hexafluoro Propane (Bis-A-AF), m-phenylenediamine (mPDA), 3,5-diaminobenzoic acid (35DABA), 2-(4-aminophenyl)-5-aminobenzoxazole (5BPOA), 1,4-Bis(4-aminophenoxy)benzene (TPEQ), 4,4'-[1,4-phenylbis(oxy)]bis[3-(trifluoromethyl)aniline](FAPB) .

其,該化學式(A)中的R可為CH3,使化學式(A)為2,2'-二甲基-4,4'-二氨基聯苯(m-TB)。 Wherein, R in the chemical formula (A) can be CH3, so that the chemical formula (A) is 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB).

其中,該化學式(A)中的R可為CF3,使化學式(A)為2,2-二(三氟甲基)二氨基聯苯(TFMB)。 Wherein, R in the chemical formula (A) can be CF3, so that the chemical formula (A) is 2,2-bis(trifluoromethyl)diaminobiphenyl (TFMB).

其中,該化學環化法為添加脫水劑以及催化劑而成,其中脫水劑為乙酸酐,催化劑為甲基吡啶、異喹啉。 Wherein, the chemical cyclization method is formed by adding a dehydrating agent and a catalyst, wherein the dehydrating agent is acetic anhydride, and the catalyst is picoline and isoquinoline.

該脫水劑添加量至少為2當量數以上,該催化劑添加量至少為1當量數以上 The addition amount of the dehydrating agent is at least 2 equivalents or more, and the catalyst addition amount is at least 1 equivalent or more

實施例 Example

<檢測方法> <Detection method>

下列實施例中所得到的聚醯亞胺膜的熱性質與電性質使用以下方法量測。 The thermal and electrical properties of the polyimide films obtained in the following examples were measured using the following methods.

(1)Dk & Df @ 10GHz:使用Keysight Technologies公司出品型號為E5071C ENA Network Analyzer儀器量測。 (1) Dk & Df @ 10GHz: Measured using the model E5071C ENA Network Analyzer produced by Keysight Technologies.

(2)CTE:依照ASTM D696規範,使用TA Instruments公司出的型號Q400 TMA儀器量測。量測透明聚醯亞胺膜在50~200℃時的熱膨脹係數,升溫速率設定為10℃/min。為了除去因熱處理所造成的應力,藉由第一次量測除去殘餘應力後,以第二次量測結果做為實際值。 (2) CTE: According to ASTM D696 specification, use the model Q400 TMA instrument of TA Instruments company to measure. The thermal expansion coefficient of the transparent polyimide film was measured at 50-200 °C, and the heating rate was set to 10 °C/min. In order to remove the stress caused by the heat treatment, after removing the residual stress by the first measurement, the second measurement result is used as the actual value.

(3)厚度:使用Elektro Physik公司所製,型號MiniTest 2100儀器進行量測。 (3) Thickness: Measured using a model MiniTest 2100 instrument manufactured by Elektro Physik.

<實施例1> <Example 1>

聚醯胺酸的製作 Production of Polyamide

將17.458克的p-phenylene diamine(PDA,0.0161mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入27.174克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.092mole),攪拌反應1小時且溫度持續維持在25℃再添加14.688克的2,2'-diMethyl-4,4'-diaMinobiphenyl(m-Tolidine,0.069mole),攪拌至完全溶解,再緩慢添加40.034克的BPDA,0.136mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000cps±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 17.458 grams of p-phenylene diamine (PDA, 0.0161mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 27.174 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.092mole), stirred for 1 hour and the temperature was maintained at 25°C and then added 14.688 g of 2,2'-diMethyl-4,4'-diaMinobiphenyl (m-Tolidine, 0.069mole), stirred until Completely dissolve, then slowly add 40.034 grams of BPDA, 0.136 moles, stir for 12 hours to dissolve and react, and the temperature of the solution is maintained at 25 ° C, then use a trace amount of BPDA to adjust the viscosity to 200,000cps±30,000cps, and finally obtain Copolyamide solution with 20% solids content.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5克,並加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.3毫升的醋酸酐稀釋液與5.3毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於 80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 g of the above-mentioned copolymerized polyamic acid solution, and add 6.5 g of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride to DMAc is 5 The weight ratio of 1 was diluted, and 3-picoline and DMAc were diluted with a weight ratio of 1:1, and then 6.3 ml of acetic anhydride diluent and 5.3 ml of 3-picoline diluent were added respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated sample in Bake in an oven at 80°C for 20 minutes, then raise the temperature to 170°C for 20 minutes at a rate of 1.8°C/min, and then raise the temperature to 350°C for 20 minutes at a rate of 2.0°C/min as the final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為9.7ppm/℃,介電損耗Df 0.0069,Tg 335℃。 The thermal expansion coefficient between 50 and 200°C of the polyimide film prepared above is 9.7ppm/°C, the dielectric loss Df is 0.0069, and the Tg is 335°C.

實施例2 Example 2

聚醯胺酸的製作 Production of Polyamide

將11.898克的p-phenylene diamine(PDA,0.0110mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入16.186克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.055mole),攪拌反應1小時且溫度持續維持在25℃再添加23.358克的2,2'-diMethyl-4,4'-diaMinobiphenyl(m-Tolidine,0.110mole),攪拌至完全溶解,再緩慢添加47.586克的BPDA,0.1161mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 11.898 grams of p-phenylene diamine (PDA, 0.0110mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 16.186 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride(BPDA, 0.055mole), stirred for 1 hour and the temperature was maintained at 25°C, then added 23.358 g of 2,2'-diMethyl-4,4'-diaMinobiphenyl(m-Tolidine, 0.110mole), stirred until Completely dissolve, then slowly add 47.586 grams of BPDA, 0.1161 mole, stir for 12 hours to dissolve and react, and the temperature of the solution is maintained at 25 ° C, then use a trace amount of BPDA to adjust the viscosity to 200,000 ± 30,000cps, and finally obtain a solid A 20% solution of copolyamide.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5克,並加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.0毫升的醋酸酐稀釋液與5.1毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 g of the above-mentioned copolymerized polyamic acid solution, and add 6.5 g of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride to DMAc is 5 1 for dilution, and then 3-picoline and DMAc were diluted with a 1:1 weight ratio, and then 6.0 ml of acetic anhydride diluent and 5.1 ml of 3-picoline diluent were added respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated samples in an oven at 80°C for 20 minutes, then heat up to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min 20 minutes for final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為7.7ppm/℃,介電損耗Df 0.0065,Tg 315℃。 The thermal expansion coefficient between 50 and 200°C of the polyimide film prepared above is 7.7ppm/°C, the dielectric loss Df is 0.0065, and the Tg is 315°C.

實施例3 Example 3

聚醯胺酸的製作 Production of Polyamide

將12.514克的p-phenylene diamine(PDA,0.0116mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入17.064克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.058mole),攪拌反應1小時且溫度持續維持在25℃再添加24.60克的2,2'-diMethyl-4,4'-diaMinobiphenyl(mTB,0.116mole),攪拌至完全溶解,再緩慢添加15.156克的1,2,4,5-苯四甲酸酐(PMDA,0.0695mole),攪拌0.5小時後再緩慢加入30.001克的BPDA,0.102mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 12.514 grams of p-phenylene diamine (PDA, 0.0116mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 17.064 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.058mole), stirred for 1 hour and the temperature was maintained at 25°C and then added 24.60 g of 2,2'-diMethyl-4,4'-diaMinobiphenyl (mTB, 0.116mole), stirred until completely dissolved , and then slowly add 15.156 grams of 1,2,4,5-benzenetetracarboxylic anhydride (PMDA, 0.0695mole), stir for 0.5 hours and then slowly add 30.001 grams of BPDA, 0.102mole, stir for 12 hours until it dissolves and reacts , and the temperature of the solution was maintained at 25 °C, and then the viscosity was adjusted to 200,000±30,000 cps with a trace amount of BPDA, and finally a copolymerized polyamide solution with a solid content of 20% was obtained.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.3毫升的醋酸酐稀釋液與5.3毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 grams of the above-mentioned copolymerized polyamic acid solution, add 6.5 grams of N,N-dimethylacetamide (DMAc), dilute the solid content to 18%, stir for 10 minutes, and mix acetic anhydride and DMAc in a weight ratio of 5 to 1. After diluting 3-picoline and DMAc at a weight ratio of 1:1, 6.3 ml of acetic anhydride diluent and 5.3 ml of 3-picoline diluent were added respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min. 20 minutes for final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為8.5ppm/℃,介電損耗Df 0.008,Tg 342℃。 The thermal expansion coefficient between 50 and 200°C of the polyimide film prepared above is 8.5ppm/°C, the dielectric loss Df is 0.008, and the Tg is 342°C.

實施例4 Example 4

聚醯胺酸的製作 Production of Polyamide

將11.123克的p-phenylene diamine(PDA,0.103mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入15.151克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.052mole),攪拌反應1小時且溫度持續維持在25℃再添加24.60克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.103mole),攪拌至完全溶解,再緩慢添加13.472克的1,2,4,5-苯四甲酸酐(PMDA,0.062mole),攪拌0.5小時後再緩慢加入26.666克的BPDA,0.091mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 11.123 grams of p-phenylene diamine (PDA, 0.103mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 15.151 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.052mole), stirred for 1 hour and the temperature was maintained at 25°C and then added 24.60 g of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.103mole), stirred To complete dissolution, slowly add 13.472 grams of 1,2,4,5-benzenetetracarboxylic anhydride (PMDA, 0.062mole), stir for 0.5 hours, then slowly add 26.666 grams of BPDA, 0.091mole, and stir for 12 hours until it progresses Dissolved and reacted, and the temperature of the solution was maintained at 25 °C, and then the viscosity was adjusted to 200,000±30,000 cps with a trace amount of BPDA, and finally a copolymerized polyamic acid solution with a solid content of 20% was obtained.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加5.6毫升的醋酸酐稀釋液與4.7毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 g of the above-mentioned copolymerized polyamic acid solution and add 6.5 g of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride and DMAc is 5:1. Dilute by weight ratio, and then dilute 3-picoline and DMAc at a weight ratio of 1:1, and then add 5.6 ml of acetic anhydride diluent and 4.7 ml of 3-picoline diluent, respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated samples in an oven at 80°C for 20 minutes, then heat up to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min 20 minutes for final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為11.9ppm/℃,介電損耗Df 0.007,Tg 328℃。 The thermal expansion coefficient between 50 and 200°C of the polyimide film prepared above is 11.9 ppm/°C, the dielectric loss Df is 0.007, and the Tg is 328°C.

實施例5 Example 5

共聚聚醯胺酸的製作 Production of Copolymerized Polyamide

將10.623克的p-phenylene diamine(PDA,0.098mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入14.470克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.049mole),攪拌反應1小時且溫度持續維持在25℃再添加31.498克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.098mole),攪拌至完全溶解,再緩慢加入42.831克的BPDA,0.146mole,攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 10.623 grams of p-phenylene diamine (PDA, 0.098mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 14.470 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.049mole), stirred for 1 hour and the temperature was maintained at 25°C, then added 31.498 g of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.098mole), stirred To complete dissolution, slowly add 42.831 grams of BPDA, 0.146 moles, stir for 12 hours to dissolve and react, and the temperature of the solution is maintained at 25 ° C, then use a trace amount of BPDA to adjust the viscosity to 200,000 ± 30,000cps, and finally obtain Copolyamide solution with 20% solids content.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加5.3毫升的醋酸酐稀釋液與4.5毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 g of the above-mentioned copolymerized polyamic acid solution and add 6.5 g of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride and DMAc is 5:1. Dilute by weight ratio, and then dilute 3-picoline and DMAc at a weight ratio of 1:1, and then add 5.3 ml of acetic anhydride diluent and 4.5 ml of 3-picoline diluent, respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated samples in an oven at 80°C for 20 minutes, then heat up to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min 20 minutes for final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為11ppm/℃,介電損耗Df 0.0075,Tg 300℃。 The polyimide film prepared above has a thermal expansion coefficient of 11 ppm/°C between 50 and 200°C, a dielectric loss of Df of 0.0075, and a Tg of 300°C.

實施例6 Example 6

聚醯胺酸的製作 Production of Polyamide

將11.123克的p-phenylene diamine(PDA,0.103mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入15.151克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.052mole),攪拌反應1小時且溫度持續維持在25℃再添加24.60克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.103mole),攪拌至完全溶解,再緩慢添加13.472克的1,2,4,5-苯四甲酸酐(PMDA,0.062mole),攪拌0.5小時後再緩慢加入26.666克的BPDA,0.091mole,攪拌0.5小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 11.123 grams of p-phenylene diamine (PDA, 0.103mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 15.151 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.052mole), stirred for 1 hour and the temperature was maintained at 25°C and then added 24.60 g of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.103mole), stirred To complete dissolution, slowly add 13.472 grams of 1,2,4,5-benzenetetracarboxylic anhydride (PMDA, 0.062 mole), stir for 0.5 hours, then slowly add 26.666 grams of BPDA, 0.091 mole, stir for 0.5 hours and wait for it to proceed Dissolved and reacted, and the temperature of the solution was maintained at 25 °C, and then the viscosity was adjusted to 200,000±30,000 cps with a trace amount of BPDA, and finally a copolymerized polyamic acid solution with a solid content of 20% was obtained.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.1毫升的醋酸酐稀釋液與5.2毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 mg of the above-mentioned copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride and DMAc is 5:1. After diluting 3-picoline and DMAc in a weight ratio of 1:1, 6.1 ml of acetic anhydride diluent and 5.2 ml of 3-picoline diluent were added respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated samples in an oven at 80°C for 20 minutes, then heat up to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min 20 minutes for final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為9.0ppm/℃,介電損耗Df 0.0080,Tg 325℃。 The thermal expansion coefficient between 50 and 200°C of the polyimide film prepared above is 9.0ppm/°C, the dielectric loss Df is 0.0080, and the Tg is 325°C.

比較例1 Comparative Example 1

聚醯胺酸溶液的製作 Preparation of polyamide solution

將20.422克的p-phenylene diamine(PDA,0.189mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入27.817克的3,3’,4,4’ -biphenyltetracarboxylic dianhydride(BPDA,0.0945mole),攪拌反應1小時且溫度持續維持在25℃再添加10.036克的2,2'-diMethyl-4,4'-diaMinobiphenyl(mTB,0.047mole),攪拌至完全溶解再緩慢加入40.682克的BPDA(0.138mole),攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 20.422 grams of p-phenylene diamine (PDA, 0.189mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 27.817 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.0945mole), stir the reaction for 1 hour and keep the temperature at 25°C, then add 10.036 g of 2,2'-diMethyl-4,4'-diaMinobiphenyl (mTB, 0.047mole), stir until completely dissolved Then slowly add 40.682 grams of BPDA (0.138 mole), stir for 12 hours to dissolve and react, and the temperature of the solution is maintained at 25 ° C, then use a trace amount of BPDA to adjust the viscosity to 200,000 ± 30,000cps, the final solid content is 20% copolyamide solution.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.4毫升的醋酸酐稀釋液與5.4毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 mg of the above-mentioned copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride and DMAc is 5:1. The weight ratio was diluted, and then 3-picoline and DMAc were diluted in a weight ratio of 1:1, and then 6.4 ml of acetic anhydride diluent and 5.4 ml of 3-picoline diluent were added respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated samples in an oven at 80°C for 20 minutes, then heat up to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min 20 minutes for final treatment.

上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為9.5ppm/℃,介電損耗Df 0.011,Tg 340℃。 The thermal expansion coefficient between 50 and 200°C of the polyimide film prepared above is 9.5ppm/°C, the dielectric loss Df is 0.011, and the Tg is 340°C.

比較例2 Comparative Example 2

將10.175克的p-phenylene diamine(PDA,0.094mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入13.859克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.0471mole),攪拌反應1小時且溫度持續維持在25℃再添加10.036克的2,2'-二(三氟甲基)二氨基聯苯(TFMB,0.047mole),攪拌至完全溶解再緩慢添加12.323克的1,2,4,5-苯四甲 酸酐(PMDA,0.057mole),攪拌0.5小時後再緩慢加入19.614克的4,4'-(4,4'-異丙基二苯氧基)二酞酸酐(BPADA,0.038mole)以及13.028克的BPDA(0.044mole),攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 10.175 grams of p-phenylene diamine (PDA, 0.094mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 13.859 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.0471mole), stir the reaction for 1 hour and the temperature is maintained at 25°C and then add 10.036 g of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.047mole), stir To complete dissolution, slowly add 12.323 grams of 1,2,4,5-benzenetetramethyl Acid anhydride (PMDA, 0.057 mole), stirred for 0.5 hours and then slowly added 19.614 g of 4,4'-(4,4'-isopropyldiphenoxy) diphthalic anhydride (BPADA, 0.038 mole) and 13.028 g of BPDA (0.044mole), stirred for 12 hours until it was dissolved and reacted, and the temperature of the solution was maintained at 25°C, and then the viscosity was adjusted to 200,000±30,000cps with a small amount of BPDA, and finally a copolymerized polyamide with a solid content of 20% was obtained. Amino acid solution.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加5.1毫升的醋酸酐稀釋液與4.3毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。 Take out 58.5 mg of the above-mentioned copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride and DMAc is 5:1. The weight ratio was diluted, and then 3-picoline and DMAc were diluted in a weight ratio of 1:1, and then 5.1 ml of acetic anhydride diluent and 4.3 ml of 3-picoline diluent were added respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min. 20 minutes for final treatment.

比較例3 Comparative Example 3

聚醯胺酸溶液的製作 Preparation of polyamide solution

將12.695克的p-phenylene diamine(PDA,0.118mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入17.293克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.059mole),攪拌反應1小時且溫度持續維持在25℃再添加23.510克的4,4'-二氨基二苯醚(ODA,0.118mole),攪拌至完全溶解再緩慢添加15.375克的1,2,4,5-苯四甲酸酐(PMDA,0.071mole),攪拌0.5小時後再緩慢加入30.089克的BPDA(0.102mole),攪拌12小時待其進行溶解及反應,並且溶液的溫度維持為25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 12.695 grams of p-phenylene diamine (PDA, 0.118mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 17.293 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride (BPDA, 0.059mole), stirred for 1 hour and the temperature was maintained at 25°C and then added 23.510 g of 4,4'-diaminodiphenyl ether (ODA, 0.118mole), stirred until completely dissolved and then slowly added 15.375 grams of 1,2,4,5-benzenetetracarboxylic acid anhydride (PMDA, 0.071 mole) was stirred for 0.5 hours and then slowly added 30.089 grams of BPDA (0.102 mole), stirred for 12 hours until it was dissolved and reacted, and the solution was The temperature was maintained at 25 °C, and then the viscosity was adjusted to 200,000 ± 30,000 cps using a small amount of BPDA, and finally a copolymerized polyamide solution with a solid content of 20% was obtained.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.4毫升的醋酸酐稀釋液與5.4毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為10.0ppm/℃,介電損耗Df 0.012,Tg 340℃。 Take out 58.5 mg of the above-mentioned copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride and DMAc is 5:1. The weight ratio was diluted, and then 3-picoline and DMAc were diluted in a weight ratio of 1:1, and then 6.4 ml of acetic anhydride diluent and 5.4 ml of 3-picoline diluent were added respectively. After uniform stirring, a centrifugal defoamer was used for defoaming, and the defoamed solution was applied to a glass plate and then applied using a doctor blade with a gap of 900 μm. Place the coated samples in an oven at 80°C for 20 minutes, then heat up to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min 20 minutes for final treatment. The polyimide film prepared above has a thermal expansion coefficient of 10.0ppm/°C between 50 and 200°C, a dielectric loss of Df of 0.012, and a Tg of 340°C.

比較例4 Comparative Example 4

聚醯胺酸溶液的製作 Preparation of polyamide solution

將26.851克的p-phenylene diamine(PDA,0.249mole),加入400克的N,N-二甲基乙醯胺(DMAc),待全部溶解後加入71.686克的3,3’,4,4’-biphenyltetracarboxylic dianhydride(BPDA,0.244mole),添加時溫度控制為25℃,攪拌反應二十四小時且溫度持續維持在25℃,之後使用微量的BPDA將黏度調整至200,000±30,000cps,最終得到固體含量為20%的共聚聚醯胺酸溶液。 Add 26.851 grams of p-phenylene diamine (PDA, 0.249mole) to 400 grams of N,N-dimethylacetamide (DMAc), and after all dissolved, add 71.686 grams of 3,3',4,4' -biphenyltetracarboxylic dianhydride(BPDA, 0.244mole), the temperature was controlled at 25°C during the addition, the reaction was stirred for 24 hours and the temperature was maintained at 25°C, and then the viscosity was adjusted to 200,000±30,000cps with a small amount of BPDA, and the solid content was finally obtained It is a 20% solution of copolyamide.

聚醯亞胺膜的製作 Fabrication of Polyimide Film

在上述共聚聚醯胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙醯胺(DMAc)將固體含量稀釋至18%,攪拌10分鐘後將醋酸酐與DMAc以5比1之重量比進行稀釋,再將3-甲基吡啶與DMAc以1比1之重量比進行稀釋之後分別添加6.8毫升的醋酸酐稀釋液與5.7毫升的3-甲基吡啶稀釋液。在均勻攪拌後使用離心脫泡機進行脫泡,將脫泡後的溶液塗佈 到玻璃板後使用900μm間隙之刮刀進行塗佈。將塗佈完成之樣品置放於80℃烘箱烘烤20分鐘,再以1.8℃/min的速度升溫至170℃烘烤20分鐘後,再再以2.0℃/min的速度升溫至350℃烘烤20分鐘做為最終處理。上述所製成之聚醯亞胺膜其50~200℃間的熱膨脹係數為3.5ppm/℃,介電損耗Df 0.013,Tg 360℃。 Take out 58.5 mg of the above-mentioned copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, the ratio of acetic anhydride and DMAc is 5:1. Dilute by weight ratio, and then dilute 3-picoline and DMAc at a weight ratio of 1:1, and add 6.8 ml of acetic anhydride diluent and 5.7 ml of 3-picoline diluent, respectively. After uniform stirring, the defoaming machine is used for defoaming, and the defoamed solution is applied After reaching the glass plate, use a doctor blade with a gap of 900 μm for coating. Place the coated samples in an oven at 80°C for 20 minutes, then heat up to 170°C for 20 minutes at a rate of 1.8°C/min, and then bake at 350°C at a rate of 2.0°C/min 20 minutes for final treatment. The polyimide film prepared above has a thermal expansion coefficient of 3.5ppm/°C between 50 and 200°C, a dielectric loss of Df of 0.013, and a Tg of 360°C.

實施例\與比較例表格 Example \ and comparative example table

Figure 109146657-A0101-12-0014-5
Figure 109146657-A0101-12-0014-5

上述特定實施例之內容係為了詳細說明本發明,然而,該等實施例係僅用於說明,並非意欲限制本發明。熟習本領域之技藝者可理解, 在不悖離後附申請專利範圍所界定之範疇下針對本發明所進行之各種變化或修改係落入本發明之一部分。 The contents of the above-mentioned specific embodiments are intended to illustrate the present invention in detail, however, these embodiments are only for illustration and are not intended to limit the present invention. Those skilled in the art can understand that, Various changes or modifications made to the present invention without departing from the scope defined by the appended claims are part of the present invention.

Claims (6)

一種低介電損失之聚醯亞胺膜,該聚醯亞胺膜之厚度大於25微米,其係由共聚聚醯胺酸經由化學環化法製得而成,其中共聚聚醯胺酸至少需具有3,3',4,4'-聯苯四甲酸二酐(3,3,4,4’-biphenyltetracarboxylic dianhydride;BPDA)與對苯二胺(p-phenylene diamine;p-PDA)以及下述化學式(A)之二胺的組成,該化學式(A)為如下: A polyimide film with low dielectric loss, the thickness of the polyimide film is greater than 25 microns, which is prepared by a chemical cyclization method from a copolymerized polyamide, wherein the copolymerized polyamide must have at least 3,3',4,4'-biphenyltetracarboxylic dianhydride (3,3,4,4'-biphenyltetracarboxylic dianhydride; BPDA) and p-phenylene diamine (p-PDA) and the following chemical formula The composition of the diamine of (A), this chemical formula (A) is as follows:
Figure 109146657-A0101-13-0001-8
Figure 109146657-A0101-13-0001-8
其中BPDA的莫耳數需佔該共聚聚醯胺酸之二酸酐總莫耳數之百分比60以上,以及p-PDA的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比50以上;化學式(A)的莫耳數需佔該共聚聚醯胺酸之二胺總莫耳數之百分比30以上反應組成;以及使該聚醯亞胺膜具有玻璃轉移溫度Tg大於280℃,介電損耗正切Df(@ 10GHz)小於0.008,熱線膨脹係數CTE小於12ppm/℃。 Wherein the molar number of BPDA needs to account for more than 60% of the total molar number of the dianhydride of the copolymerized polyamic acid, and the molar number of p-PDA needs to account for the total molar number of the diamine of the copolymerized polyamic acid. The percentage is more than 50; the molar number of the chemical formula (A) needs to account for more than 30 percent of the total molar number of the diamine in the copolymerized polyamide acid. Reaction composition; and make the polyimide film have a glass transition temperature Tg greater than 280 ° C , the dielectric loss tangent Df (@10GHz) is less than 0.008, and the thermal linear expansion coefficient CTE is less than 12ppm/℃.
如申請專利範圍第1項所述之低介電損失之聚醯亞胺膜,其,該化學式(A)中的R可為CH3,使化學式(A)為2,2'-二甲基-4,4'-二氨基聯苯(m-TB)。 According to the low dielectric loss polyimide film described in item 1 of the claimed scope, R in the chemical formula (A) can be CH3, so that the chemical formula (A) is 2,2'-dimethyl- 4,4'-Diaminobiphenyl (m-TB). 如申請專利範圍第1項所述之低介電損失之聚醯亞胺膜,其中,該化學式(A)中的R可為CF3,使化學式(A)為2,2-二(三氟甲基)二氨基聯苯(TFMB)。 The polyimide film with low dielectric loss as described in item 1 of the claimed scope, wherein R in the chemical formula (A) can be CF3, so that the chemical formula (A) is 2,2-bis(trifluoromethyl) base) diaminobiphenyl (TFMB). 如申請專利範圍第1項所述之低介電損失之聚醯亞胺膜,其中,該芳香族聚醯胺酸除了上述PDA、化學式(A)及BPDA之芳香族二 胺與芳香族二酐反應而得之外,還可包含以下芳香族二胺及二酐:其中芳香族二胺包含了2,2'-二(三氟甲基)二氨基聯苯(TFMB)、2,2'-雙[4-(4-氨基苯氧基苯基)]丙烷(BAPP)、2,2-雙[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷(HFBAPP)、對苯二胺(PDA)、4,4'-二(4-氨基苯氧基)聯苯(BAPB)、2,2'-雙(三氟甲基)-4,4'-二氨基苯基醚(6FODA)、4,4'-二氨基二苯碸(44DDS)、4,4'-二氨基二苯醚(ODA)、4,4'-二氨基苯醯替苯胺(44DABA)、2,2-双(4-氨基苯基)六氟丙烷(Bis-A-AF)、間苯二胺(mPDA)、3,5-二氨基苯甲酸(35DABA)、2-(4-氨基苯基)-5-氨基苯並惡唑(5BPOA)、1,4-雙(4-氨基苯氧基)苯(TPEQ)、4,4'-[1,4-苯基雙(氧)]雙[3-(三氟甲基)苯胺](FAPB)。 The polyimide film with low dielectric loss as described in item 1 of the scope of the application, wherein the aromatic polyimide is in addition to the above-mentioned PDA, chemical formula (A) and aromatic diamide of BPDA In addition to the reaction of amine and aromatic dianhydride, it can also include the following aromatic diamines and dianhydrides: wherein the aromatic diamine includes 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB) , 2,2'-bis[4-(4-aminophenoxyphenyl)]propane (BAPP), 2,2-bis[4-(4-aminophenoxy)phenyl]-1,1, 1,3,3,3-Hexafluoropropane (HFBAPP), p-phenylenediamine (PDA), 4,4'-bis(4-aminophenoxy)biphenyl (BAPB), 2,2'-bis( Trifluoromethyl)-4,4'-diaminophenyl ether (6FODA), 4,4'-diaminodiphenyl ether (44DDS), 4,4'-diaminodiphenyl ether (ODA), 4,4'-diaminodiphenyl ether (ODA) 4'-Diaminobenzidine (44DABA), 2,2-bis(4-aminophenyl)hexafluoropropane (Bis-A-AF), m-phenylenediamine (mPDA), 3,5-diamino Benzoic acid (35DABA), 2-(4-aminophenyl)-5-aminobenzoxazole (5BPOA), 1,4-bis(4-aminophenoxy)benzene (TPEQ), 4,4'- [1,4-Phenylbis(oxy)]bis[3-(trifluoromethyl)aniline] (FAPB). 如申請專利範圍第1項所述之低介電損失之聚醯亞胺膜,其中,該化學環化法為添加脫水劑以及催化劑而成,其中脫水劑為乙酸酐,催化劑為甲基吡啶、異喹啉。 The polyimide film with low dielectric loss as described in item 1 of the patent application scope, wherein the chemical cyclization method is formed by adding a dehydrating agent and a catalyst, wherein the dehydrating agent is acetic anhydride, and the catalyst is picoline, isoquinoline. 如申請專利範圍第5項所述之低介電損失之聚醯亞胺膜,其中,該脫水劑添加量至少為2當量數以上,該催化劑添加量至少為1當量數以上 The polyimide film with low dielectric loss according to item 5 of the scope of the application, wherein the addition amount of the dehydrating agent is at least 2 equivalents or more, and the catalyst addition amount is at least 1 equivalent or more
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