CN114763436B - Polyimide film with low dielectric loss - Google Patents
Polyimide film with low dielectric loss Download PDFInfo
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- CN114763436B CN114763436B CN202110053400.9A CN202110053400A CN114763436B CN 114763436 B CN114763436 B CN 114763436B CN 202110053400 A CN202110053400 A CN 202110053400A CN 114763436 B CN114763436 B CN 114763436B
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- 229920001721 polyimide Polymers 0.000 title claims abstract description 48
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 56
- 239000000126 substance Substances 0.000 claims abstract description 23
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 16
- 238000007363 ring formation reaction Methods 0.000 claims abstract description 13
- 150000004985 diamines Chemical class 0.000 claims abstract description 11
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 6
- 230000009477 glass transition Effects 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims abstract description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical group CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 claims description 66
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 claims description 49
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical group CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 239000003054 catalyst Substances 0.000 claims description 7
- 150000004984 aromatic diamines Chemical class 0.000 claims description 6
- 239000012024 dehydrating agents Substances 0.000 claims description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000006159 dianhydride group Chemical group 0.000 claims description 4
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 3
- UMGYJGHIMRFYSP-UHFFFAOYSA-N 2-(4-aminophenyl)-1,3-benzoxazol-5-amine Chemical compound C1=CC(N)=CC=C1C1=NC2=CC(N)=CC=C2O1 UMGYJGHIMRFYSP-UHFFFAOYSA-N 0.000 claims description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical group CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 2
- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 claims description 2
- VIUDTWATMPPKEL-UHFFFAOYSA-N 3-(trifluoromethyl)aniline Chemical compound NC1=CC=CC(C(F)(F)F)=C1 VIUDTWATMPPKEL-UHFFFAOYSA-N 0.000 claims description 2
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 claims description 2
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 claims description 2
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 claims description 2
- 150000001412 amines Chemical class 0.000 claims description 2
- 239000001294 propane Substances 0.000 claims description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- HFYWOOUKPVJGBA-UHFFFAOYSA-N 4-propan-2-ylquinoline Chemical compound C1=CC=C2C(C(C)C)=CC=NC2=C1 HFYWOOUKPVJGBA-UHFFFAOYSA-N 0.000 claims 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 claims 1
- 150000003931 anilides Chemical class 0.000 claims 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical group OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 abstract 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 60
- 238000003756 stirring Methods 0.000 description 52
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 40
- 239000003085 diluting agent Substances 0.000 description 20
- 239000007787 solid Substances 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 18
- 150000004986 phenylenediamines Chemical class 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 238000007872 degassing Methods 0.000 description 10
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 239000004642 Polyimide Substances 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- ZPSUIVIDQHHIFH-UHFFFAOYSA-N 3-(trifluoromethyl)-4-[2-(trifluoromethyl)phenyl]benzene-1,2-diamine Chemical group FC(F)(F)C1=C(N)C(N)=CC=C1C1=CC=CC=C1C(F)(F)F ZPSUIVIDQHHIFH-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000006184 cosolvent Substances 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- OUOUTIZPWCNKMX-UHFFFAOYSA-N NC=1C(C(C(=CC=1)C1=CC=CC=C1)(C(F)(F)F)C(F)(F)F)N Chemical group NC=1C(C(C(=CC=1)C1=CC=CC=C1)(C(F)(F)F)C(F)(F)F)N OUOUTIZPWCNKMX-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 125000006160 pyromellitic dianhydride group Chemical group 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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Abstract
本申请为一种低介电损失的聚酰亚胺膜,其系由共聚聚酰胺酸经由化学环化法制得而成,其中共聚聚酰胺酸至少需具有3,3',4,4'‑联苯四甲酸二酐(3,3’,4,4’-biphenyltetracarboxylic dianhydride;BPDA)与对苯二胺(p-phenylene diamine;p-PDA)以及下述化学式(A)之二胺的组成:化学式(A):其中,BPDA的摩尔数需占该共聚聚酰胺酸之二酸酐总摩尔数之百分比60以上,以及p‑PDA的摩尔数需占该共聚聚酰胺酸之二胺总摩尔数之百分比50以上,及化学式(A)的摩尔数需占该共聚聚酰胺酸之二胺总摩尔数之百分比30以上反应组成;以及该聚酰亚胺膜具有玻璃转移温度Tg大于280℃,介电损耗正切Df(@10GHz)小于0.008及热线膨胀系数CTE小于12ppm/℃。This application is a low dielectric loss polyimide film, which is made from copolymerized polyamic acid through a chemical cyclization method, in which the copolymerized polyamic acid must have at least 3,3',4,4'- The composition of biphenyltetracarboxylic dianhydride (BPDA), p-phenylene diamine (p-PDA) and the diamine of the following chemical formula (A): Chemical formula (A): Among them, the number of moles of BPDA must account for more than 60% of the total moles of dianhydride of the copolymerized polyamic acid, and the number of moles of p-PDA must account for more than 50% of the total number of moles of diamine of the copolymerized polyamic acid, and The number of moles of chemical formula (A) must account for more than 30% of the total moles of diamine in the copolymerized polyamic acid; and the polyimide film has a glass transition temperature Tg greater than 280°C and a dielectric loss tangent Df (@ 10GHz) is less than 0.008 and the thermal expansion coefficient CTE is less than 12ppm/℃.
Description
技术领域Technical field
本申请涉及一种低介电损失之聚酰亚胺膜,特别系指一种以化学法制造25微米以上之聚酰亚胺膜,使其具有较低之介电损失及较低之线膨胀系数者This application relates to a polyimide film with low dielectric loss, specifically a polyimide film with a diameter of 25 microns or more that is chemically manufactured to have lower dielectric loss and lower linear expansion. Coefficient
背景技术Background technique
聚酰亚胺具有优秀的耐热性、电气特性与机械强度特性及经设计后有较低的介电损耗,使聚酰亚胺薄膜常使用于具有高温制程的软性电路板应用领域,以及近期更多设计于5G高频高速应用原件上。另外,目前广为人知的是由1,2,4,5-苯四甲酸酐(PMDA)与苯二胺(PDA)以及3,3’,4,4’-联苯四甲酸二酐(BPDA)与对苯二胺(PDA)所组成之聚酰亚胺。其中,PMDA/PDA虽然有极佳的热性质,但其膜非常脆且机械特性和电性差,而BPDA/PDA不仅有优异的耐热性,且机械特性以及尺寸安定性等等也极佳,故而优选在需求这些特性之可挠性印刷电路板、半导体组件之保护膜、集成电路之层间绝缘膜等等用途上使用,但其较高的介电损耗就不适用于5G高频材料上。另外,因为其刚硬且具有直线之主结构,导致分子排列堆积过密,使其薄膜在制造中因溶剂蒸气不易透过而在内部及表面产生气泡。Polyimide has excellent heat resistance, electrical properties and mechanical strength properties and is designed to have low dielectric loss. Polyimide films are often used in flexible circuit board applications with high-temperature processes, and Recently, more designs are used in 5G high-frequency and high-speed application originals. In addition, the currently well-known compounds are composed of 1,2,4,5-pyromellitic anhydride (PMDA) and phenylenediamine (PDA) and 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and Polyimide composed of p-phenylenediamine (PDA). Among them, although PMDA/PDA has excellent thermal properties, its film is very brittle and has poor mechanical and electrical properties. BPDA/PDA not only has excellent heat resistance, but also has excellent mechanical properties and dimensional stability. Therefore, it is preferably used in applications such as flexible printed circuit boards, protective films for semiconductor components, and interlayer insulating films for integrated circuits that require these characteristics. However, its high dielectric loss is not suitable for 5G high-frequency materials. . In addition, because it is rigid and has a straight main structure, the molecules are arranged too densely, making it difficult for solvent vapor to penetrate during the production of the film, causing bubbles to be generated inside and on the surface.
由于此类聚酰亚胺膜易有气泡产生,故以往大多使用热环化的制程方式来生产,因为热环化制程系由聚酰胺酸前驱物(PAA)经过缓慢的加热烘烤,烘烤温度需大于300度以上而得。在此制程中,聚酰胺酸前驱物(PAA)在尚有溶剂存在的可塑段时,其分子炼段为非线性,所以排列较不紧密,所以气泡产生的状况较少,但在膜厚较厚(>25um)的状况下仍会有泡。而由专利文献1是使用共溶剂的方式来制造此聚酰亚胺(BPDA-PDA),共溶剂是利用不同沸点的溶剂产生之共沸现象,在相同烘烤过程中减少溶剂的残留量而获得无气泡的聚酰亚胺膜,但其缺点是在于量产后之废液处理繁琐且增加成本。Since this type of polyimide film is prone to bubbles, it was mostly produced using a thermal cyclization process in the past. This is because the thermal cyclization process involves slowly heating and baking the polyamic acid precursor (PAA). The temperature needs to be greater than 300 degrees. In this process, when the polyamic acid precursor (PAA) is in the plastic segment where solvent still exists, its molecular chain segment is nonlinear, so the arrangement is less dense, so there are fewer bubbles, but when the film thickness is thicker There will still be bubbles even if it is thick (>25um). According to Patent Document 1, the polyimide (BPDA-PDA) is manufactured using a co-solvent. The co-solvent utilizes the azeotropic phenomenon produced by solvents with different boiling points to reduce the residual amount of solvent during the same baking process. A bubble-free polyimide film can be obtained, but its disadvantage is that the waste liquid treatment after mass production is cumbersome and increases the cost.
除了热环化法外,化学环化也是种常见的制膜工艺,化学环化使用脱水剂与催化剂,在温度较低的时候便可将聚酰胺酸前驱物转换成聚酰亚胺,因此在有溶剂存在的可塑段时,由于大部分的非线性聚酰胺酸链段转变成线性的聚酰亚胺链段,此时分子链排列规律且紧密,相对来说会更容易且有更多的气泡产生,但也因此聚酰亚胺之化学环化法比热环化法会有更佳的机械性质与热性质,而由专利文献2提供使用少量立体障碍较大的单体加入组成聚酰亚胺,使分子炼段能有将溶剂较易排出的空间,且不至于影响过多的机械特性及热性质。其虽然可有效解除气泡产生得状况,但会对电性影响较大,导致介电损耗提升而无法应用于5G高频材料上。In addition to thermal cyclization, chemical cyclization is also a common film-making process. Chemical cyclization uses dehydrating agents and catalysts to convert polyamic acid precursors into polyimides at low temperatures. Therefore, in When there is a plastic segment in the presence of solvent, since most of the nonlinear polyamic acid segments are converted into linear polyimide segments, the molecular chains are arranged regularly and closely, which is relatively easier and has more Bubbles are generated, but therefore the chemical cyclization method of polyimide will have better mechanical and thermal properties than the thermal cyclization method. Patent Document 2 provides that a small amount of monomers with larger steric hindrances are added to form a polyimide. Imine allows the molecular refining section to have space for the solvent to be discharged more easily without affecting too many mechanical and thermal properties. Although it can effectively eliminate bubbles, it will have a greater impact on electrical properties, resulting in increased dielectric loss and cannot be applied to 5G high-frequency materials.
专利文献1:CN101802059BPatent document 1: CN101802059B
专利文献2:TWI448487BPatent Document 2: TWI448487B
发明内容Contents of the invention
基于此,本申请提供了一种聚酰亚胺膜,其系由共聚聚酰胺酸经由化学环化法制得而成,其中共聚聚酰胺酸至少需具有3,3',4,4'-联苯四甲酸二酐(3,3’,4,4’-biphenyltetracarboxylic dianhydride;BPDA)与对苯二胺(p-phenylene diamine;p-PDA)以及下述化学式(A)之二胺的组成。Based on this, this application provides a polyimide film, which is prepared from copolymerized polyamic acid through a chemical cyclization method, wherein the copolymerized polyamic acid must have at least 3,3',4,4'-linked The composition of pyromellitic dianhydride (3,3',4,4'-biphenyltetracarboxylic dianhydride; BPDA), p-phenylenediamine (p-phenylene diamine; p-PDA) and the diamine of the following chemical formula (A).
化学式(A):Chemical formula (A):
其中化学式(A)中,R可为-CF3或-CH3;In the chemical formula (A), R can be -CF3 or -CH3;
其中BPDA的摩尔数需占该聚酰胺酸之二酐总摩尔数之百分比60以上,以及p-PDA的摩尔数需占该聚酰亚胺酸之二胺总摩尔数之百分比50以上,及化学式(A)的摩尔数需占该聚酰亚胺酸之二胺总摩尔数之百分比30以上反应组成,使该聚酰亚胺膜具有:The number of moles of BPDA must account for more than 60% of the total number of moles of dianhydride of the polyamic acid, and the number of moles of p-PDA must account for more than 50% of the total number of moles of diamine of the polyamic acid, and the chemical formula The mole number of (A) must account for more than 30% of the total mole number of diamines in the polyimide acid, so that the polyimide film has:
a.玻璃转移温度Tg大于280℃a. Glass transition temperature Tg is greater than 280℃
b.介电损耗正切Df(@10GHz)小于0.008b. Dielectric loss tangent Df (@10GHz) is less than 0.008
c.热线膨胀系数CTE小于12ppm/℃。c. The thermal expansion coefficient CTE is less than 12ppm/℃.
具体实施方式Detailed ways
本申请为一种低介电损失之聚酰亚胺膜,该聚酰亚胺膜之厚度大于25微米,其系由共聚聚酰胺酸经由化学环化法制得而成,其中共聚聚酰胺酸至少需具有3,3',4,4'-联苯四甲酸二酐(3,3,4,4’-biphenyltetracarboxylic dianhydride;BPDA)与对苯二胺(p-phenylene diamine;p-PDA)以及下述化学式(A)之二胺的组成,该化学式(A)为如下:The present application is a polyimide film with low dielectric loss. The thickness of the polyimide film is greater than 25 microns. It is prepared from copolymerized polyamic acid through a chemical cyclization method, wherein the copolymerized polyamic acid is at least Need to have 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and p-phenylene diamine (p-PDA) and the following The composition of the diamine of the chemical formula (A) is as follows:
其中BPDA的摩尔数需占该共聚聚酰胺酸之二酸酐总摩尔数之百分比60以上,以及p-PDA的摩尔数需占该共聚聚酰胺酸之二胺总摩尔数之百分比50以上;化学式(A)的摩尔数需占该共聚聚酰胺酸之二胺总摩尔数之百分比30以上反应组成;以及使该聚酰亚胺膜具有玻璃转移温度Tg大于280℃,介电损耗正切Df(@10GHz)小于0.008,热线膨胀系数CTE小于12ppm/℃。The mole number of BPDA must account for more than 60% of the total mole number of dianhydrides of the copolymerized polyamic acid, and the mole number of p-PDA must account for more than 50% of the total mole number of diamines of the copolymerized polyamic acid; the chemical formula ( The number of moles of A) must account for more than 30% of the total moles of diamine in the copolymerized polyamic acid; and the polyimide film must have a glass transition temperature Tg greater than 280°C and a dielectric loss tangent Df (@10GHz ) is less than 0.008, and the thermal expansion coefficient CTE is less than 12ppm/℃.
其中,该芳香族聚酰胺酸除了上述PDA、化学式(A)及BPDA之芳香族二胺与芳香族二酐反应而得之外,还可包含以下芳香族二胺及二酐:其中芳香族二胺包含了2,2'-二(三氟甲基)二氨基联苯(TFMB)、2,2'-双[4-(4-氨基苯氧基苯基)]丙烷(BAPP)、2,2-双[4-(4-氨基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷(HFBAPP)、对苯二胺(PDA)、4,4'-二(4-氨基苯氧基)联苯(BAPB)、2,2'-双(三氟甲基)-4,4'-二氨基苯基醚(6FODA)、4,4'-二氨基二苯砜(44DDS)、4,4'-二氨基二苯醚(ODA)、4,4'-二氨基苯酰替苯胺(44DABA)、2,2-双(4-氨基苯基)六氟丙烷(Bis-A-AF)、间苯二胺(mPDA)、3,5-二氨基苯甲酸(35DABA)、2-(4-氨基苯基)-5-氨基苯并恶唑(5BPOA)、1,4-双(4-氨基苯氧基)苯(TPEQ)、4,4'-[1,4-苯基双(氧)]双[3-(三氟甲基)苯胺](FAPB)。Wherein, in addition to the aromatic polyamic acid obtained by reacting the above-mentioned aromatic diamines and aromatic dianhydrides of PDA, chemical formula (A) and BPDA, the aromatic polyamic acid may also include the following aromatic diamines and dianhydrides: wherein the aromatic diamines and dianhydrides are Amines include 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB), 2,2'-bis[4-(4-aminophenoxyphenyl)]propane (BAPP), 2, 2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane (HFBAPP), p-phenylenediamine (PDA), 4,4'- Bis(4-aminophenoxy)biphenyl (BAPB), 2,2'-bis(trifluoromethyl)-4,4'-diaminophenyl ether (6FODA), 4,4'-diaminobiphenyl ether Phenyl sulfone (44DDS), 4,4'-diaminodiphenyl ether (ODA), 4,4'-diaminobenzoanilide (44DABA), 2,2-bis(4-aminophenyl)hexafluoropropane (Bis-A-AF), m-phenylenediamine (mPDA), 3,5-diaminobenzoic acid (35DABA), 2-(4-aminophenyl)-5-aminobenzoxazole (5BPOA), 1 , 4-bis(4-aminophenoxy)benzene (TPEQ), 4,4'-[1,4-phenylbis(oxy)]bis[3-(trifluoromethyl)aniline] (FAPB).
其,该化学式(A)中的R可为CH3,使化学式(A)为2,2'-二甲基-4,4'-二氨基联苯(m-TB)。Among them, R in the chemical formula (A) can be CH3, so that the chemical formula (A) is 2,2'-dimethyl-4,4'-diaminobiphenyl (m-TB).
其中,该化学式(A)中的R可为CF3,使化学式(A)为2,2-二(三氟甲基)二氨基联苯(TFMB)。Wherein, R in the chemical formula (A) can be CF3, so that the chemical formula (A) is 2,2-bis(trifluoromethyl)diaminobiphenyl (TFMB).
其中,该化学环化法为添加脱水剂以及催化剂而成,其中脱水剂为乙酸酐,催化剂为甲基吡啶、异喹啉。Among them, the chemical cyclization method is formed by adding a dehydrating agent and a catalyst, wherein the dehydrating agent is acetic anhydride and the catalyst is methylpyridine and isoquinoline.
该脱水剂添加量至少为2当量数以上,该催化剂添加量至少为1当量数以上。The dehydrating agent is added in an amount of at least 2 equivalents, and the catalyst is added in an amount of at least 1 equivalent.
实施例Example
<检测方法><Detection method>
下列实施例中所得到的聚酰亚胺膜的热性质与电性质使用以下方法量测。The thermal properties and electrical properties of the polyimide films obtained in the following examples were measured using the following methods.
(1)Dk&Df@10GHz:使用Keysight Technologies公司出品型号为E5071C ENANetwork Analyzer仪器量测。(1) Dk&Df@10GHz: Measured using the E5071C ENANetwork Analyzer instrument produced by Keysight Technologies.
(2)CTE:依照ASTM D696规范,使用TA Instruments公司出的型号Q400TMA仪器量测。量测透明聚酰亚胺膜在50~200℃时的热膨胀系数,升温速率设定为10℃/min。为了除去因热处理所造成的应力,藉由第一次量测除去残余应力后,以第二次量测结果作为实际值。(2) CTE: Measured in accordance with ASTM D696 specifications using the model Q400TMA instrument produced by TA Instruments. The thermal expansion coefficient of the transparent polyimide film is measured at 50 to 200°C, and the heating rate is set to 10°C/min. In order to remove the stress caused by heat treatment, after removing the residual stress through the first measurement, the second measurement result is used as the actual value.
(3)厚度:使用Elektro Physik公司所制,型号MiniTest 2100仪器(3) Thickness: Use the MiniTest 2100 instrument manufactured by Elektro Physik Company
进行量测。Take measurements.
实施例1Example 1
聚酰胺酸的制作Production of polyamic acid
将17.458克的p-phenylene diamine(PDA,0.0161mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入27.174克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.092mole),搅拌反应1小时且温度持续维持在25℃再添加14.688克的2,2'-diMethyl-4,4'-diaMinobiphenyl(m-Tolidine,0.069mole),搅拌至完全溶解,再缓慢添加40.034克的BPDA,0.136mole,搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000cps±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 17.458 grams of p-phenylene diamine (PDA, 0.0161 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 27.174 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.092 mole), stir for 1 hour and keep the temperature at 25°C, then add 14.688 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (m-Tolidine, 0.069 mole), stir until completely dissolved , then slowly add 40.034 grams of BPDA, 0.136 mole, stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000cps±30,000cps, and finally obtain the solid content It is a 20% copolymer polyamic acid solution.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5克,并加入6.5克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加6.3毫升的醋酸酐稀释液与5.3毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟做为最终处理。Take out 58.5 grams of the above copolymerized polyamic acid solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.3 ml of acetic anhydride diluent and 5.3 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing.
上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为9.7ppm/℃,介电损耗Df0.0069,Tg 335℃。The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 9.7ppm/°C, a dielectric loss of Df0.0069, and a Tg of 335°C.
实施例2Example 2
聚酰胺酸的制作Production of polyamic acid
将11.898克的p-phenylene diamine(PDA,0.0110mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入16.186克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.055mole),搅拌反应1小时且温度持续维持在25℃再添加23.358克的2,2'-diMethyl-4,4'-diaMinobiphenyl(m-Tolidine,0.110mole),搅拌至完全溶解,再缓慢添加47.586克的BPDA,0.1161mole,搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 11.898 grams of p-phenylene diamine (PDA, 0.0110 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 16.186 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.055 mole), stir for 1 hour and keep the temperature at 25°C, then add 23.358 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (m-Tolidine, 0.110 mole), stir until completely dissolved , then slowly add 47.586 grams of BPDA, 0.1161 mole, stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain a solid content of 20% copolymer polyamic acid solution.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5克,并加入6.5克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加6.0毫升的醋酸酐稀释液与5.1毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。Take out 58.5 grams of the above copolymerized polyamic acid solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a ratio of 5 to 1. Dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.0 ml of acetic anhydride diluent and 5.1 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing.
上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为7.7ppm/℃,介电损耗Df0.0065,Tg 315℃。The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 7.7ppm/°C, a dielectric loss of Df0.0065, and a Tg of 315°C.
实施例3Example 3
聚酰胺酸的制作Production of polyamic acid
将12.514克的p-phenylene diamine(PDA,0.0116mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入17.064克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.058mole),搅拌反应1小时且温度持续维持在25℃再添加24.60克的2,2'-diMethyl-4,4'-diaMinobiphenyl(mTB,0.116mole),搅拌至完全溶解,再缓慢添加15.156克的1,2,4,5-苯四甲酸酐(PMDA,0.0695mole),搅拌0.5小时后再缓慢加入30.001克的BPDA,0.102mole,搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 12.514 grams of p-phenylene diamine (PDA, 0.0116 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 17.064 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.058 mole), stir for 1 hour and keep the temperature at 25°C, then add 24.60 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (mTB, 0.116 mole), stir until completely dissolved, and then Slowly add 15.156 grams of pyromellitic anhydride (PMDA, 0.0695 mole), stir for 0.5 hours, then slowly add 30.001 grams of BPDA, 0.102 mole, stir for 12 hours until it dissolves and reacts, and The temperature of the solution was maintained at 25°C, and then a trace amount of BPDA was used to adjust the viscosity to 200,000±30,000cps, finally obtaining a copolymer polyamic acid solution with a solid content of 20%.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加6.3毫升的醋酸酐稀释液与5.3毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。Take 58.5 grams of the above copolymerized polyamic acid solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, then add 6.3 ml of acetic anhydride diluent and 5.3 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing.
上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为8.5ppm/℃,介电损耗Df0.008,Tg 342℃。The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 8.5ppm/°C, a dielectric loss of Df0.008, and a Tg of 342°C.
实施例4Example 4
聚酰胺酸的制作Production of polyamic acid
将11.123克的p-phenylene diamine(PDA,0.103mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入15.151克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.052mole),搅拌反应1小时且温度持续维持在25℃再添加24.60克的2,2'-二(三氟甲基)二氨基联苯(TFMB,0.103mole),搅拌至完全溶解,再缓慢添加13.472克的1,2,4,5-苯四甲酸酐(PMDA,0.062mole),搅拌0.5小时后再缓慢加入26.666克的BPDA,0.091mole,搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 11.123 grams of p-phenylene diamine (PDA, 0.103 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 15.151 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.052 mole), stir the reaction for 1 hour and maintain the temperature at 25°C, then add 24.60 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.103 mole), and stir until complete Dissolve, then slowly add 13.472 grams of pyromellitic anhydride (PMDA, 0.062 mole), stir for 0.5 hours, then slowly add 26.666 grams of BPDA, 0.091 mole, stir for 12 hours until it is dissolved and reaction, and the temperature of the solution was maintained at 25°C, and then a trace amount of BPDA was used to adjust the viscosity to 200,000±30,000cps, and finally a copolymerized polyamic acid solution with a solid content of 20% was obtained.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加5.6毫升的醋酸酐稀释液与4.7毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。Take 58.5 grams of the above copolymerized polyamic acid solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, and then add 5.6 ml of acetic anhydride diluent and 4.7 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing.
上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为11.9ppm/℃,介电损耗Df 0.007,Tg 328℃。The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 11.9ppm/°C, a dielectric loss of Df 0.007, and a Tg of 328°C.
实施例5Example 5
共聚聚酰胺酸的制作Production of copolymerized polyamic acid
将10.623克的p-phenylene diamine(PDA,0.098mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入14.470克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.049mole),搅拌反应1小时且温度持续维持在25℃再添加31.498克的2,2'-二(三氟甲基)二氨基联苯(TFMB,0.098mole),搅拌至完全溶解,再缓慢加入42.831克的BPDA,0.146mole,搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 10.623 grams of p-phenylene diamine (PDA, 0.098 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 14.470 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.049 mole), stir the reaction for 1 hour and keep the temperature at 25°C, then add 31.498 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.098 mole), and stir until complete Dissolve, then slowly add 42.831 grams of BPDA, 0.146 mole, stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain the solid content It is a 20% copolymer polyamic acid solution.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5克加入6.5克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加5.3毫升的醋酸酐稀释液与4.5毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。Take 58.5 grams of the above copolymerized polyamic acid solution and add 6.5 grams of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, and then add 5.3 ml of acetic anhydride diluent and 4.5 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing.
上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为11ppm/℃,介电损耗Df0.0075,Tg 300℃。The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 11ppm/°C, a dielectric loss of Df0.0075, and a Tg of 300°C.
实施例6Example 6
聚酰胺酸的制作Production of polyamic acid
将11.123克的p-phenylene diamine(PDA,0.103mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入15.151克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.052mole),搅拌反应1小时且温度持续维持在25℃再添加24.60克的2,2'-二(三氟甲基)二氨基联苯(TFMB,0.103mole),搅拌至完全溶解,再缓慢添加13.472克的1,2,4,5-苯四甲酸酐(PMDA,0.062mole),搅拌0.5小时后再缓慢加入26.666克的BPDA,0.091mole,搅拌0.5小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 11.123 grams of p-phenylene diamine (PDA, 0.103 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 15.151 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.052 mole), stir the reaction for 1 hour and maintain the temperature at 25°C, then add 24.60 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.103 mole), and stir until complete Dissolve, then slowly add 13.472 grams of pyromellitic anhydride (PMDA, 0.062 mole), stir for 0.5 hours, then slowly add 26.666 grams of BPDA, 0.091 mole, stir for 0.5 hours until it is dissolved and reaction, and the temperature of the solution was maintained at 25°C, and then a trace amount of BPDA was used to adjust the viscosity to 200,000±30,000cps, and finally a copolymerized polyamic acid solution with a solid content of 20% was obtained.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加6.1毫升的醋酸酐稀释液与5.2毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。Take 58.5 mg of the above copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, and then add 6.1 ml of acetic anhydride diluent and 5.2 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing.
上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为9.0ppm/℃,介电损耗Df0.0080,Tg 325℃。The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 9.0ppm/°C, a dielectric loss of Df0.0080, and a Tg of 325°C.
比较例1Comparative example 1
聚酰胺酸溶液的制作Preparation of polyamic acid solution
将20.422克的p-phenylene diamine(PDA,0.189mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入27.817克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.0945mole),搅拌反应1小时且温度持续维持在25℃再添加10.036克的2,2'-diMethyl-4,4'-diaMinobiphenyl(mTB,0.047mole),搅拌至完全溶解后再缓慢加入40.682克的BPDA(0.138mole),搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 20.422 grams of p-phenylene diamine (PDA, 0.189 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 27.817 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.0945 mole), stir for 1 hour and keep the temperature at 25°C, then add 10.036 grams of 2,2'-diMethyl-4,4'-diaMinobiphenyl (mTB, 0.047 mole), stir until completely dissolved, and then Slowly add 40.682 grams of BPDA (0.138 mole), stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C. Then use a trace amount of BPDA to adjust the viscosity to 200,000±30,000cps, and finally obtain a solid content of 20 % copolymerized polyamic acid solution.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加6.4毫升的醋酸酐稀释液与5.4毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为9.5ppm/℃,介电损耗Df 0.011,Tg 340℃。Take 58.5 mg of the above copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, and then add 6.4 ml of acetic anhydride diluent and 5.4 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing. The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 9.5ppm/°C, a dielectric loss of Df 0.011, and a Tg of 340°C.
比较例2Comparative example 2
将10.175克的p-phenylene diamine(PDA,0.094mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入13.859克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.0471mole),搅拌反应1小时且温度持续维持在25℃再添加10.036克的2,2'-二(三氟甲基)二氨基联苯(TFMB,0.047mole),搅拌至完全溶解后再缓慢添加12.323克的1,2,4,5-苯四甲酸酐(PMDA,0.057mole),搅拌0.5小时后再缓慢加入19.614克的4,4'-(4,4'-异丙基二苯氧基)二酞酸酐(BPADA,0.038mole)以及13.028克的BPDA(0.044mole),搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 10.175 grams of p-phenylene diamine (PDA, 0.094 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 13.859 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.0471 mole), stir the reaction for 1 hour and maintain the temperature at 25°C, then add 10.036 grams of 2,2'-bis(trifluoromethyl)diaminobiphenyl (TFMB, 0.047 mole), and stir until complete After dissolving, slowly add 12.323 grams of 1,2,4,5-pyromellitic anhydride (PMDA, 0.057 mole), stir for 0.5 hours, and then slowly add 19.614 grams of 4,4'-(4,4'-isopropyl Diphenoxy) diphthalic anhydride (BPADA, 0.038 mole) and 13.028 grams of BPDA (0.044 mole), stir for 12 hours to dissolve and react, and maintain the temperature of the solution at 25°C, and then use a trace amount of BPDA to The viscosity was adjusted to 200,000±30,000cps, and a copolymer polyamic acid solution with a solid content of 20% was finally obtained.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加5.1毫升的醋酸酐稀释液与4.3毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。Take 58.5 mg of the above copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, and then add 5.1 ml of acetic anhydride diluent and 4.3 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing.
比较例3Comparative example 3
聚酰胺酸溶液的制作Preparation of polyamic acid solution
将12.695克的p-phenylene diamine(PDA,0.118mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入17.293克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.059mole),搅拌反应1小时且温度持续维持在25℃再添加23.510克的4,4'-二氨基二苯醚(ODA,0.118mole),搅拌至完全溶解后再缓慢添加15.375克的1,2,4,5-苯四甲酸酐(PMDA,0.071mole),搅拌0.5小时后再缓慢加入30.089克的BPDA(0.102mole),搅拌12小时待其进行溶解及反应,并且溶液的温度维持为25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 12.695 grams of p-phenylene diamine (PDA, 0.118 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 17.293 grams of 3,3',4,4'- biphenyltetracarboxylicdianhydride (BPDA, 0.059 mole), stir the reaction for 1 hour and keep the temperature at 25°C, then add 23.510 grams of 4,4'-diaminodiphenyl ether (ODA, 0.118 mole), stir until completely dissolved, and then slowly add 15.375 Grams of 1,2,4,5-pyromellitic anhydride (PMDA, 0.071 mole), stir for 0.5 hours, then slowly add 30.089 grams of BPDA (0.102 mole), stir for 12 hours until it dissolves and reacts, and the solution The temperature was maintained at 25°C, and then a trace amount of BPDA was used to adjust the viscosity to 200,000±30,000cps, finally obtaining a copolymer polyamic acid solution with a solid content of 20%.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加6.4毫升的醋酸酐稀释液与5.4毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为10.0ppm/℃,介电损耗Df 0.012,Tg 340℃。Take 58.5 mg of the above copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, and then add 6.4 ml of acetic anhydride diluent and 5.4 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing. The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 10.0ppm/°C, a dielectric loss of Df 0.012, and a Tg of 340°C.
比较例4Comparative example 4
聚酰胺酸溶液的制作Preparation of polyamic acid solution
将26.851克的p-phenylene diamine(PDA,0.249mole),加入400克的N,N-二甲基乙酰胺(DMAc),待全部溶解后加入71.686克的3,3’,4,4’-biphenyltetracarboxylicdianhydride(BPDA,0.244mole),添加时温度控制为25℃,搅拌反应二十四小时且温度持续维持在25℃,之后使用微量的BPDA将黏度调整至200,000±30,000cps,最终得到固体含量为20%的共聚聚酰胺酸溶液。Add 26.851 grams of p-phenylene diamine (PDA, 0.249 mole) to 400 grams of N,N-dimethylacetamide (DMAc). After all is dissolved, add 71.686 grams of 3,3',4,4'- When adding biphenyltetracarboxylicdianhydride (BPDA, 0.244 mole), the temperature is controlled at 25°C. The reaction is stirred for 24 hours and the temperature is maintained at 25°C. Then a trace amount of BPDA is used to adjust the viscosity to 200,000±30,000cps, and the final solid content is 20 % copolymerized polyamic acid solution.
聚酰亚胺膜的制作Production of polyimide film
在上述共聚聚酰胺酸溶液中取出58.5毫克加入6.5毫克N,N-二甲基乙酰胺(DMAc)将固体含量稀释至18%,搅拌10分钟后将醋酸酐与DMAc以5比1之重量比进行稀释,再将3-甲基吡啶与DMAc以1比1之重量比进行稀释之后分别添加6.8毫升的醋酸酐稀释液与5.7毫升的3-甲基吡啶稀释液。在均匀搅拌后使用离心脱泡机进行脱泡,将脱泡后的溶液涂布到玻璃板后使用900μm间隙之刮刀进行涂布。将涂布完成之样品置放于80℃烘箱烘烤20分钟,再以1.8℃/min的速度升温至170℃烘烤20分钟后,再以2.0℃/min的速度升温至350℃烘烤20分钟作为最终处理。上述所制成之聚酰亚胺膜其50~200℃间的热膨胀系数为3.5ppm/℃,介电损耗Df 0.013,Tg 360℃。Take 58.5 mg of the above copolymerized polyamic acid solution and add 6.5 mg of N,N-dimethylacetamide (DMAc) to dilute the solid content to 18%. After stirring for 10 minutes, add acetic anhydride and DMAc at a weight ratio of 5 to 1. Dilute, then dilute 3-methylpyridine and DMAc at a weight ratio of 1:1, and then add 6.8 ml of acetic anhydride diluent and 5.7 ml of 3-methylpyridine diluent respectively. After evenly stirring, use a centrifugal degassing machine to degas, apply the degassed solution to the glass plate and use a spatula with a gap of 900 μm for coating. Place the coated sample in an oven at 80°C for 20 minutes, then raise the temperature to 170°C at a rate of 1.8°C/min and bake for 20 minutes, then raise the temperature to 350°C at a rate of 2.0°C/min and bake for 20 minutes. minutes for final processing. The polyimide film produced above has a thermal expansion coefficient between 50 and 200°C of 3.5ppm/°C, a dielectric loss of Df 0.013, and a Tg of 360°C.
实施例\与比较例表格Table of Examples and Comparative Examples
上述特定实施例之内容系为了详细说明本申请,然而,该等实施例系仅用于说明,并非意欲限制本申请。熟习本领域之技艺者可理解,在不悖离后附申请专利范围所界定之范畴下针对本申请所进行之各种变化或修改系落入本申请之一部分。The content of the above specific embodiments is for the purpose of describing the present application in detail. However, these embodiments are only for illustration and are not intended to limit the present application. Those skilled in the art will understand that various changes or modifications made to this application without departing from the scope defined in the appended patent application are part of this application.
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JP2008214412A (en) * | 2007-03-01 | 2008-09-18 | Toray Ind Inc | Polyimide film and method for producing the same |
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