[go: up one dir, main page]

TWI447889B - 晶片封裝結構 - Google Patents

晶片封裝結構 Download PDF

Info

Publication number
TWI447889B
TWI447889B TW100127940A TW100127940A TWI447889B TW I447889 B TWI447889 B TW I447889B TW 100127940 A TW100127940 A TW 100127940A TW 100127940 A TW100127940 A TW 100127940A TW I447889 B TWI447889 B TW I447889B
Authority
TW
Taiwan
Prior art keywords
wafer
bumps
package structure
pins
bonding region
Prior art date
Application number
TW100127940A
Other languages
English (en)
Other versions
TW201308563A (zh
Inventor
Hung Che Shen
Original Assignee
Chipmos Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chipmos Technologies Inc filed Critical Chipmos Technologies Inc
Priority to TW100127940A priority Critical patent/TWI447889B/zh
Priority to CN201110308023.5A priority patent/CN102915989B/zh
Priority to US13/525,354 priority patent/US20130032940A1/en
Publication of TW201308563A publication Critical patent/TW201308563A/zh
Application granted granted Critical
Publication of TWI447889B publication Critical patent/TWI447889B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/4985Flexible insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49894Materials of the insulating layers or coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/60Protection against electrostatic charges or discharges, e.g. Faraday shields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16227Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/2612Auxiliary members for layer connectors, e.g. spacers
    • H01L2224/26152Auxiliary members for layer connectors, e.g. spacers being formed on an item to be connected not being a semiconductor or solid-state body
    • H01L2224/26175Flow barriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/812Applying energy for connecting
    • H01L2224/81201Compression bonding
    • H01L2224/81203Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8138Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/81399Material
    • H01L2224/814Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/81401Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
    • H01L2224/81411Tin [Sn] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/818Bonding techniques
    • H01L2224/81801Soldering or alloying
    • H01L2224/81805Soldering or alloying involving forming a eutectic alloy at the bonding interface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/013Alloys
    • H01L2924/0132Binary Alloys
    • H01L2924/01322Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Wire Bonding (AREA)

Description

晶片封裝結構
本發明是有關於一種晶片封裝結構,且特別是有關於一種使用可撓性基板的晶片封裝結構。
隨著半導體技術的改良,使得液晶顯示器具有低的消耗電功率、薄型量輕、解析度高、色彩飽和度高、壽命長等優點,因而廣泛地應用在筆記型電腦或桌上型電腦的液晶螢幕及液晶電視等與生活息息相關之電子產品。其中,顯示器之驅動晶片(integrated circuit,IC)更是液晶顯示器不可或缺的重要元件。
因應液晶顯示裝置驅動晶片各種應用之需求,一般是採用捲帶自動接合(tape automatic bonding,TAB)封裝技術進行晶片封裝,其中又分成薄膜覆晶(Chip On Film,COF)封裝及捲帶承載封裝(Tape Carrier Package,TCP)。
請參考圖1,詳細而言,以捲帶自動接合方式進行晶片封裝的製程,係在完成可撓性基板50上的線路及晶片60上的凸塊62製程之後進行內引腳52接合(inner lead bonding,ILB),使晶片60上的凸塊62與可撓性基板50上的內引腳52產生共晶接合而電性連接。現行可撓性基板50上包含內引腳52的線路一般是用銅箔形成,而內引腳52上另形成有錫層,以幫助凸塊62與內引腳52共晶接合時能確實連接。然而,在使用熱壓方式進行共晶接合時,內引腳52上的鍍錫若過多則可能會產生溢錫70,因內引腳52與凸塊62接合之處很接近晶片60邊緣,則溢錫70容易沿內引腳52延伸而接觸到配置於晶片60邊緣的靜電防護環(seal ring/guard ring)80,造成漏電或橋接短路等電性失效。此外,如圖2所示,即使未發生上述溢錫現象,仍可能因可撓性基板50的翹曲彎折而使靜電防護環80接觸到內引腳52(edge touch),同樣會造成漏電或橋接短路等電性失效。
本發明提供一種晶片封裝結構,可降低晶片邊緣之靜電防護環因接觸內引腳而電性失效的機率。
本發明提出一種晶片封裝結構,包括晶片、可撓性基板、多個第一引腳及多個第二引腳。晶片具有主動面。主動面上設置有多個第一凸塊、多個第二凸塊與靜電防護環。第一凸塊鄰近晶片之第一邊。第二凸塊鄰近晶片相對第一邊的第二邊。靜電防護環位於第一凸塊與第一邊之間以及第二凸塊與第二邊之間。可撓性基板具有晶片接合區。晶片接合區具有相對的第一側與第二側。晶片係設置於晶片接合區內,且晶片之第一邊與第二邊分別對應晶片接合區之第一側與第二側。第一引腳配置於可撓性基板上,且從第一側進入晶片接合區內並向第二側延伸而分別與第二凸塊電性連接。第二引腳配置於可撓性基板上,且從第二側進入晶片接合區內並向第一側延伸而分別與第一凸塊電性連接。
在本發明之一實施例中,上述之晶片封裝結構更包括封裝膠體,設置於晶片與可撓性基板之間,以包覆第一凸塊、第二凸塊與靜電防護環。
在本發明之一實施例中,上述之第一引腳及第二引腳具有外接端及內接端,外接端遠離晶片接合區,內接端終止於晶片接合區內並與相應之凸塊連接。
在本發明之一實施例中,上述之第一引腳與第二引腳交錯排列。
在本發明之一實施例中,上述之晶片封裝結構更包括防銲層,防銲層位於晶片接合區之外並局部覆蓋第一引腳及第二引腳。
在本發明之一實施例中,上述之可撓性基板係適用於薄膜覆晶封裝(chip on film package,COF package)或捲帶承載封裝(tape carrier package,TCP package)。
基於上述,本發明的第一引腳從晶片接合區的第一側進入晶片接合區內,並往晶片接合區的第二側延伸而電性連接鄰近第二側的第二凸塊,且第二引腳從晶片接合區的第二側進入晶片接合區內,並往晶片接合區的第一側延伸而電性連接鄰近第一側的第一凸塊。藉由將引腳延伸經過晶片接合區至另一側而與鄰近該側的凸塊接合,使引腳不會橫越接合凸塊該側的晶片邊緣,當引腳與凸塊接合時產生溢錫,溢錫不會沿引腳延伸而接觸到配置於晶片邊緣的靜電防護環,因此可避免引腳與靜電防護環透過溢錫產生橋接而有漏電或短路等電性失效情況發生。再者,因為引腳延伸經過晶片接合區內,使可撓性基板強度增加,可防止可撓性基板產生下陷、翹曲等現象,進而避免晶片接合時因可撓性基板翹曲彎折而造成晶片邊緣接觸引腳(edge touch)的問題。引腳分佈於晶片接合區內,也可藉金屬的高導熱效率提升晶片封裝結構的散熱效率。
為讓本發明之上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。
圖3為本發明一實施例之晶片封裝結構的俯視圖。圖4為圖3之晶片封裝結構沿A-A’線的局部剖面圖。圖5為圖3之晶片封裝結構沿B-B’線的局部剖面圖。請參考圖3至圖5,本實施例的晶片封裝結構100包括晶片110、可撓性基板120、多個第一引腳130及多個第二引腳140。晶片110具有主動面110a,主動面110a上設置有多個第一凸塊112、多個第二凸塊114與靜電防護環116。第一凸塊112鄰近晶片110之第一邊110b,第二凸塊114鄰近相對第一邊110b的第二邊110c。靜電防護環116位於第一凸塊112與第一邊110b之間以及第二凸塊114與第二邊110c之間。於本實施例中,靜電防護環116環繞於晶片四周與第一凸塊112及第二凸塊114之間,然而靜電防護環116的範圍和形狀並不以此為限。以圖3的視角而言,部分第一引腳130、部分第二引腳140、第一凸塊112、第二凸塊114及靜電防護環116被晶片110所遮蔽而以虛線繪示。
可撓性基板120具有晶片接合區122,晶片接合區122具有相對的第一側122a與第二側122b。晶片110係設置於晶片接合區122內,且晶片110之第一邊110b與第二邊110c分別對應晶片接合區之第一側122a與第二側122b。第一引腳130配置於可撓性基板120上,且從第一側122a進入晶片接合區122內並向第二側122b延伸而分別與第二凸塊114電性連接。第二引腳140配置於可撓性基板120上,且從第二側122b進入晶片接合區122內並向第一側122a延伸而分別與第一凸塊112電性連接。藉此,第一引腳130與第二凸塊114接合時並不會橫跨經過第二凸塊114鄰近的晶片110之第二邊110c,換言之,第一引腳130會終止於第二邊110c之前,相同的,第二引腳140與第一凸塊112接合時並不會橫跨經過第一凸塊112鄰近的晶片110之第一邊110b,即第二引腳140會終止於第一邊110b之前,因此引腳130、140與凸塊112、114透過熱壓製程共晶接合時若產生溢錫,溢錫不會沿引腳130、140延伸而接觸到配置於晶片110邊緣的靜電防護環116,可避免第一引腳130及第二引腳140透過溢錫接觸到靜電防護環116,進而造成漏電或短路等電性失效問題發生。
晶片封裝結構100更包括防銲層160,防銲層160位於晶片接合區122之外並局部覆蓋第一引腳130及第二引腳140,以防止引腳130、140之間不當接觸而造成電性短路。本實施例的晶片封裝結構100例如為薄膜覆晶封裝,晶片接合區122是由防銲層160的開口所定義,然本發明不以此為限,可撓性基板120除了適用於薄膜覆晶封裝,亦適用於捲帶承載封裝,於捲帶承載封裝,晶片接合區122則由元件孔所定義。可撓性基板110的材料可選自聚醯亞胺(polyimide,PI)、聚酯類化合物(polyethylene terephthalate,PET)或其他合適的可撓性材料。
請參考圖3,第一引腳130及第二引腳140遠離晶片接合區122的部分可視為其外接端,外接端是作為晶片封裝結構100後續接合外部元件(例如:玻璃面板、印刷電路板)之用。而第一引腳130及第二引腳140終止於晶片接合區122內並與相應之凸塊(112或114)連接的部分可視為其內接端。藉由熱壓或超音波接合製程,可使第一引腳130及第二引腳140的內接端與相應的凸塊112、114共晶接合。由於第一引腳130及第二引腳140延伸經過晶片接合區122,使得可撓性基板120強度增加,因此可防止可撓性基板120產生下陷、翹曲等現象,進而避免晶片110接合時因可撓性基板120翹曲彎折而造成晶片110邊緣接觸引腳130、140的問題。再者,藉所述延伸分佈於晶片接合區122內的引腳130、140的金屬高導熱效率可幫助消散晶片110運作時產生的熱,進而提升晶片封裝結構100的散熱效率。在本實施例中,第一引腳130與第二引腳140係交錯排列,以使整體結構較為對稱,然本發明不以此為限,在其它實施例中,第一引腳130與第二引腳140亦可以其它適當方式排列。
請參考圖4及圖5,本實施例的晶片封裝結構100更包括封裝膠體150,封裝膠體150設置於晶片110與可撓性基板120之間,以包覆第一凸塊112、第二凸塊114與靜電防護環116,藉以防止濕氣及汙染物進入,進而保護凸塊112、114與引腳130、140之電性接點。圖6為圖3之晶片封裝結構沿C-C’線的局部剖面圖。圖7為圖3之晶片封裝結構沿D-D’線的局部剖面圖。如圖6所示,第二引腳140係延伸經過晶片110之第二邊110c所在區域,而在此區域未有凸塊與第二引腳140接合,因此不會產生溢錫現象,而可避免靜電防護環116透過溢錫而與引腳橋接導致短路。同樣地,如圖7所示,第一引腳130係延伸經過晶片110之第一邊110b所在區域,而在此區域未有凸塊與第一引腳130接合,因此不會產生溢錫現象,而可避免靜電防護環116透過溢錫而與引腳橋接導致短路。
綜上所述,本發明的第一引腳從晶片接合區的第一側進入晶片接合區內,並往晶片接合區的第二側延伸而電性連接鄰近第二側的第二凸塊,且第二引腳從晶片接合區的第二側進入晶片接合區內,並往晶片接合區的第一側延伸而電性連接鄰近第一側的第一凸塊。藉由將引腳延伸經過晶片接合區至另一側而與鄰近該側的凸塊接合,使引腳不會橫越接合凸塊該側的晶片邊緣,當引腳與凸塊接合時產生溢錫,溢錫不會沿引腳延伸而接觸到配置於晶片邊緣的靜電防護環,因此可避免引腳與靜電防護環透過溢錫產生橋接而有漏電或短路等電性失效情況發生。再者,因為引腳延伸經過晶片接合區內,使可撓性基板強度增加,可防止可撓性基板產生下陷、翹曲等現象,進而避免晶片接合時因可撓性基板翹曲彎折而造成晶片邊緣接觸引腳(edge touch)的問題。引腳分佈於晶片接合區內,也可藉金屬的高導熱效率提升晶片封裝結構的散熱效率。
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,故本發明之保護範圍當視後附之申請專利範圍所界定者為準。
50、120...可撓性基板
52...內引腳
60、110...晶片
62...凸塊
70...溢錫
80...靜電防護環
100...晶片封裝結構
110a...主動面
110b...第一邊
110c...第二邊
112...第一凸塊
114...第二凸塊
116...靜電防護環
122...晶片接合區
122a...第一側
122b...第二側
130...第一引腳
140...第二引腳
150...封裝膠體
160...防銲層
圖1及圖2為習知捲帶式封裝結構的示意圖。
圖3為本發明一實施例之晶片封裝結構的俯視圖。
圖4為圖3之晶片封裝結構沿A-A’線的局部剖面圖。
圖5為圖3之晶片封裝結構沿B-B’線的局部剖面圖。
圖6為圖3之晶片封裝結構沿C-C’線的局部剖面圖。
圖7為圖3之晶片封裝結構沿D-D’線的局部剖面圖。
100...晶片封裝結構
110...晶片
110b...第一邊
110c...第二邊
112...第一凸塊
114...第二凸塊
116...靜電防護環
120...可撓性基板
122...晶片接合區
122a...第一側
122b...第二側
130...第一引腳
140...第二引腳

Claims (6)

  1. 一種晶片封裝結構,包括:一晶片,具有一主動面,該主動面上設置有多個第一凸塊、多個第二凸塊與一靜電防護環,該多個第一凸塊鄰近該晶片之一第一邊,該多個第二凸塊鄰近該晶片相對該第一邊的一第二邊,該靜電防護環位於該些第一凸塊與該第一邊之間以及該些第二凸塊與該第二邊之間;一可撓性基板,具有一晶片接合區,其中該晶片接合區具有相對的一第一側與一第二側,該晶片係設置於該晶片接合區內,且該晶片之該第一邊與該第二邊分別對應該晶片接合區之該第一側與該第二側;多個第一引腳,配置於該可撓性基板上,且從該第一側進入該晶片接合區內並向該第二側延伸而分別與該多個第二凸塊電性連接;以及多個第二引腳,配置於該可撓性基板上,且從該第二側進入該晶片接合區內並向該第一側延伸而分別與該多個第一凸塊電性連接。
  2. 如申請專利範圍第1項所述之晶片封裝結構,更包括一封裝膠體,設置於該晶片與該可撓性基板之間,以包覆該多個第一凸塊、第二凸塊與該靜電防護環。
  3. 如申請專利範圍第1項所述之晶片封裝結構,其中各該些第一引腳及該些第二引腳具有一外接端及一內接端,該外接端遠離該晶片接合區,該內接端終止於該晶片接合區內並與相應之該凸塊連接。
  4. 如申請專利範圍第1項所述之晶片封裝結構,其中該些第一引腳與該些第二引腳交錯排列。
  5. 如申請專利範圍第1項所述之晶片封裝結構,更包括一防銲層,該防銲層位於該晶片接合區之外並局部覆蓋該多個第一引腳及該多個第二引腳。
  6. 如申請專利範圍第1項所述之晶片封裝結構,其中該可撓性基板係適用於薄膜覆晶封裝或捲帶承載封裝。
TW100127940A 2011-08-05 2011-08-05 晶片封裝結構 TWI447889B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW100127940A TWI447889B (zh) 2011-08-05 2011-08-05 晶片封裝結構
CN201110308023.5A CN102915989B (zh) 2011-08-05 2011-09-29 芯片封装结构
US13/525,354 US20130032940A1 (en) 2011-08-05 2012-06-17 Chip package structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100127940A TWI447889B (zh) 2011-08-05 2011-08-05 晶片封裝結構

Publications (2)

Publication Number Publication Date
TW201308563A TW201308563A (zh) 2013-02-16
TWI447889B true TWI447889B (zh) 2014-08-01

Family

ID=47614301

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100127940A TWI447889B (zh) 2011-08-05 2011-08-05 晶片封裝結構

Country Status (3)

Country Link
US (1) US20130032940A1 (zh)
CN (1) CN102915989B (zh)
TW (1) TWI447889B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI512908B (zh) * 2013-07-05 2015-12-11 Advanced Semiconductor Eng 半導體組合結構及半導體製程
CN112968119B (zh) * 2020-12-18 2022-02-18 重庆康佳光电技术研究院有限公司 芯片的转移方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070008689A1 (en) * 2005-07-07 2007-01-11 Hyun-Sang Park LCD driver IC and method of arranging pads in the driver integrated circuit
US7239030B2 (en) * 2004-10-29 2007-07-03 Ube Industries, Ltd. Flexible wiring board for tape carrier package having improved flame resistance
US7443013B2 (en) * 2005-08-19 2008-10-28 Chipmos Technologies Inc. Flexible substrate for package of die
US7567484B2 (en) * 2006-04-28 2009-07-28 Kawasaki Microelectronics, Inc. Method of preventing dielectric breakdown of semiconductor device and semiconductor device preventing dielectric breakdown
TW201032295A (en) * 2009-02-27 2010-09-01 Advanced Semiconductor Eng Quad flat non-leaded package

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6211565B1 (en) * 1999-04-29 2001-04-03 Winbond Electronics Corporation Apparatus for preventing electrostatic discharge in an integrated circuit
US20040080056A1 (en) * 2001-03-30 2004-04-29 Lim David Chong Sook Packaging system for die-up connection of a die-down oriented integrated circuit
US6965168B2 (en) * 2002-02-26 2005-11-15 Cts Corporation Micro-machined semiconductor package
TW586676U (en) * 2003-06-16 2004-05-01 Via Tech Inc Hybrid IC package substrate
CN1697173A (zh) * 2004-05-12 2005-11-16 宏连国际科技股份有限公司 高密度引脚的组成结构
US7576426B2 (en) * 2005-04-01 2009-08-18 Skyworks Solutions, Inc. Wafer level package including a device wafer integrated with a passive component
CN100499101C (zh) * 2006-08-02 2009-06-10 南茂科技股份有限公司 具有延长引脚的薄膜覆晶封装构造
JP5714564B2 (ja) * 2009-03-30 2015-05-07 クゥアルコム・インコーポレイテッドQualcomm Incorporated 上部ポストパッシベーション技術および底部構造技術を使用する集積回路チップ

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7239030B2 (en) * 2004-10-29 2007-07-03 Ube Industries, Ltd. Flexible wiring board for tape carrier package having improved flame resistance
US20070008689A1 (en) * 2005-07-07 2007-01-11 Hyun-Sang Park LCD driver IC and method of arranging pads in the driver integrated circuit
US7443013B2 (en) * 2005-08-19 2008-10-28 Chipmos Technologies Inc. Flexible substrate for package of die
US7567484B2 (en) * 2006-04-28 2009-07-28 Kawasaki Microelectronics, Inc. Method of preventing dielectric breakdown of semiconductor device and semiconductor device preventing dielectric breakdown
TW201032295A (en) * 2009-02-27 2010-09-01 Advanced Semiconductor Eng Quad flat non-leaded package

Also Published As

Publication number Publication date
CN102915989A (zh) 2013-02-06
CN102915989B (zh) 2015-04-08
US20130032940A1 (en) 2013-02-07
TW201308563A (zh) 2013-02-16

Similar Documents

Publication Publication Date Title
KR100765478B1 (ko) 구멍이 형성된 테이프 배선기판과, 그를 이용한 테이프패키지 및 평판 표시 장치
KR100652519B1 (ko) 듀얼 금속층을 갖는 테이프 배선기판 및 그를 이용한 칩 온필름 패키지
TWI455273B (zh) 晶片封裝結構
US8269322B2 (en) Tape wiring substrate and tape package using the same
US7589421B2 (en) Heat-radiating semiconductor chip, tape wiring substrate and tape package using the same
US7439611B2 (en) Circuit board with auxiliary wiring configuration to suppress breakage during bonding process
TW201320275A (zh) 晶片封裝結構
TWI615934B (zh) 半導體裝置、顯示面板總成、半導體結構
TWI604579B (zh) 薄膜覆晶封裝結構
TWI447889B (zh) 晶片封裝結構
TWI509756B (zh) 薄膜覆晶封裝結構
WO2024120485A1 (zh) 可挠性线路板、薄膜覆晶封装结构及显示装置
US6853080B2 (en) Electronic device and method of manufacturing the same, and electronic instrument
KR102250825B1 (ko) Cof 패키지
TW201944562A (zh) 薄膜覆晶封裝結構
JP5078631B2 (ja) 半導体装置
KR102788200B1 (ko) Cof 패키지
CN221264064U (zh) 可挠性线路板、薄膜覆晶封装结构
JP2013026291A (ja) 半導体装置
TW201537713A (zh) 薄膜覆晶封裝結構
KR20070078030A (ko) 응력 완화형 배선패턴을 갖는 테이프 배선기판 및 그를이용한 테이프 패키지
KR20240176335A (ko) Cof 패키지
KR20240040509A (ko) 칩 온 필름 패키지 및 이를 포함하는 디스플레이 장치
KR20070039732A (ko) 연결된 더미 배선 패턴을 갖는 테이프 배선기판 및 그를이용한 테이프 패키지
CN117855220A (zh) 显示装置