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TWI381492B - Method of sealing vacuum electronic device - Google Patents

Method of sealing vacuum electronic device Download PDF

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Publication number
TWI381492B
TWI381492B TW97119112A TW97119112A TWI381492B TW I381492 B TWI381492 B TW I381492B TW 97119112 A TW97119112 A TW 97119112A TW 97119112 A TW97119112 A TW 97119112A TW I381492 B TWI381492 B TW I381492B
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Taiwan
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sealing
low
glass frit
melting glass
vacuum
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TW97119112A
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Chinese (zh)
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TW200950008A (en
Inventor
Peng Liu
Pi-Jin Chen
Cai-Lin Guo
Bing-Chu Du
Liang Liu
Shou-Shan Fan
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Hon Hai Prec Ind Co Ltd
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Priority to TW97119112A priority Critical patent/TWI381492B/en
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Publication of TWI381492B publication Critical patent/TWI381492B/en

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Description

真空器件的封接方法 Sealing method of vacuum device

本發明涉及真空技術領域,尤其涉及一種真空器件的封接方法。 The present invention relates to the field of vacuum technology, and in particular, to a sealing method for a vacuum device.

真空技術於真空電子器件的製造中起著重要的作用,真空問題越來越引起人們的關注(請參見,Vacuum problems of miniaturization of vacuum electronic component:a new generation of compact photomultipliers,Vacuum V64,P15-31(2002))。真空器件的封接質量對器件的使用壽命具有重要的影響。 Vacuum technology plays an important role in the manufacture of vacuum electronic devices, and vacuum problems are attracting more and more attention (see, Vacuum problems of miniaturization of vacuum electronic component: a new generation of compact photomultipliers, Vacuum V64, P15-31) (2002)). The quality of the sealing of vacuum devices has a significant impact on the life of the device.

請參閱圖1,先前技術中,對真空器件的封接方法一般包括以下步驟:提供一預封接器件100,該預封接器件100包括一排氣孔102;提供一排氣管110,並將該排氣管110的一端通過低熔點玻璃粉108連接到上述排氣孔102,另一端露出於預封接器件100外;提供一連接到抽真空系統106的真空杯104,用該真空杯104將上述排氣管110罩住,並對預封接器件100進行抽真空;當達到預定真空度後,採用一聚光封口裝置112加熱軟化排氣管110進行封口。當排氣管110軟化後,於遠離排氣孔102的一端形成一封閉結構。 Referring to FIG. 1 , in the prior art, a sealing method for a vacuum device generally includes the following steps: providing a pre-sealing device 100 including a vent hole 102; providing an exhaust pipe 110, and One end of the exhaust pipe 110 is connected to the exhaust hole 102 through the low-melting glass frit 108, and the other end is exposed outside the pre-sealing device 100; a vacuum cup 104 connected to the vacuum system 106 is provided, and the vacuum cup is provided. 104, the exhaust pipe 110 is covered, and the pre-sealing device 100 is evacuated; after the predetermined degree of vacuum is reached, a concentrating sealing device 112 is used to heat and soften the exhaust pipe 110 for sealing. When the exhaust pipe 110 is softened, a closed structure is formed at one end away from the exhaust hole 102.

請參閱圖2,上述方法中還可以將該預封接器件100直接置於一真空室114內,並通過一抽真空系統106對真空室114進行抽真空,當真空室114內達到預定真空度後,採 用一電熱封口裝置116加熱軟化排氣管110進行封口,得到一真空器件。當排氣管110軟化後,於遠離排氣孔102的一端形成一封閉結構。 Referring to FIG. 2, in the above method, the pre-sealing device 100 can be directly placed in a vacuum chamber 114, and the vacuum chamber 114 is evacuated through a vacuum system 106, and a predetermined degree of vacuum is reached in the vacuum chamber 114. After mining The electric exhaust pipe 110 is heated and softened by an electric heat sealing device 116 to perform sealing, thereby obtaining a vacuum device. When the exhaust pipe 110 is softened, a closed structure is formed at one end away from the exhaust hole 102.

然而,採用上述方法對預封接器件100進行封接,需要用到排氣管110,故,於封裝好的真空器件上就會留下一突起的尾巴狀排氣管110,這對真空器件的安全性及穩定性帶來威脅。而且,通過加熱軟化排氣管110進行封口,為了利於封接,排氣管110的管徑都比較小,一般小於5毫米,這樣通過排氣管110排氣就很耗時,抽真空時間長,故,製備成本也較高。另外,排氣管110以及封接排氣管110的低熔點玻璃粉108於加熱時放出的氣體會進入預封接器件100內,從而影響真空器件的真空度。 However, the sealing of the pre-sealing device 100 by the above method requires the use of the exhaust pipe 110, so that a protruding tail-shaped exhaust pipe 110 is left on the packaged vacuum device, which is a vacuum device. The security and stability pose a threat. Moreover, the sealing is performed by heating and softening the exhaust pipe 110. In order to facilitate the sealing, the diameter of the exhaust pipe 110 is relatively small, generally less than 5 mm, so that exhausting through the exhaust pipe 110 is time consuming and the vacuuming time is long. Therefore, the preparation cost is also high. In addition, the exhaust pipe 110 and the gas discharged from the low-melting glass frit 108 sealing the exhaust pipe 110 during heating may enter the pre-sealing device 100, thereby affecting the vacuum degree of the vacuum device.

有鑒於此,提供一種無需加熱軟化排氣管進行封口,且可以實現較快速度排氣的真空器件的封接方法實為必要。 In view of the above, it is necessary to provide a sealing method for a vacuum device that does not require heating to soften the exhaust pipe for sealing and that can achieve faster exhaust.

一種真空器件的封接方法,其包括以下步驟:提供一預封接器件,所述預封接器件包括一殼體以及一設置於該殼體上的排氣孔;提供一封接蓋,並於該封接蓋的一表面形成一低熔點玻璃粉層;將所述封接蓋形成有低熔點玻璃粉層的一面對應於排氣孔,且與排氣孔間隔一定距離設置;對上述預封接器件進行抽真空;加熱軟化該低熔點玻璃粉層,使封接蓋封住排氣孔;以及降溫凝固,使上述封接蓋與預封接器件結合。 A sealing method for a vacuum device, comprising the steps of: providing a pre-sealing device, the pre-sealing device comprising a casing and a venting hole disposed on the casing; providing a cover, and Forming a low-melting glass frit layer on a surface of the sealing cover; a side of the sealing cover formed with a low-melting glass frit layer corresponding to the vent hole and disposed at a distance from the vent hole; The sealing device performs vacuuming; heating and softening the low-melting glass frit layer to seal the venting opening; and cooling and solidifying, so that the sealing cover is combined with the pre-sealing device.

與先前技術相比較,本技術方案提供的真空器件的封接 方法具有以下優點:第一,採用封接蓋封接,使得製備的真空器件沒有突起的尾巴狀排氣管,提高了真空器件的安全性及穩定性。第二,可以通過大孔徑的排氣孔排氣,提高了排氣速度,節約了時間成本。 Sealing of the vacuum device provided by the technical solution compared with the prior art The method has the following advantages: First, the sealing cover is sealed, so that the prepared vacuum device has no protruding tail-shaped exhaust pipe, which improves the safety and stability of the vacuum device. Second, it can be exhausted through the vent hole of the large aperture, which improves the exhaust speed and saves time cost.

以下將結合附圖詳細說明本技術方案的真空器件的封接方法。 Hereinafter, the sealing method of the vacuum device of the present technical solution will be described in detail with reference to the accompanying drawings.

請參閱圖3及圖4,本技術方案實施例提供一種真空器件的封接方法,其主要包括以下步驟: Referring to FIG. 3 and FIG. 4 , an embodiment of the present technical solution provides a sealing method for a vacuum device, which mainly includes the following steps:

步驟一,提供一預封接器件300,所述預封接器件300包括一殼體312以及一排氣孔302。 In a first step, a pre-sealing device 300 is provided. The pre-sealing device 300 includes a housing 312 and a venting opening 302.

該排氣孔302設置於殼體312上。所述殼體312的材料可選擇為玻璃、金屬等任意可以通過低熔點玻璃粉封接的材料。所述預封接器件300的大小根據實際情況選擇。所述排氣孔302的孔徑不限,可以儘量開大,然,要根據預封接器件300的大小選擇。 The vent 302 is disposed on the housing 312. The material of the housing 312 can be selected from any material that can be sealed by a low-melting glass frit, such as glass or metal. The size of the pre-sealing device 300 is selected according to actual conditions. The aperture of the venting opening 302 is not limited and can be opened as much as possible. However, it is selected according to the size of the pre-sealing device 300.

本實施例中的預封接器件300為一真空電子器件。殼體312為玻璃,殼體312上開有一排氣孔302。該預封接器件300還進一步包括了置於該殼體312內的其他電子元件(圖中未顯示)。該排氣孔302的孔徑優選為2~10毫米。可以理解,排氣孔302的孔徑不宜太小或太大。孔徑太小不利於快速排氣,但孔徑太大會影響封接後的穩固性。 The pre-sealing device 300 in this embodiment is a vacuum electronic device. The housing 312 is glass, and the housing 312 is provided with a venting opening 302. The pre-sealing device 300 further includes other electronic components (not shown) disposed within the housing 312. The diameter of the vent hole 302 is preferably 2 to 10 mm. It will be appreciated that the aperture of the vent 302 is not too small or too large. Too small a pore size is not conducive to rapid venting, but too large a pore size will affect the stability after sealing.

可以理解,所述預封接器件300不限於真空電子器件的封接,任何需進行永久性封裝的器件均可。 It will be appreciated that the pre-sealing device 300 is not limited to the sealing of vacuum electronics, any device that requires permanent packaging.

步驟二,提供一封接蓋308,並於該封接蓋308的一表面形成一低熔點玻璃粉層304。 In the second step, a cover 308 is provided, and a low-melting glass frit layer 304 is formed on a surface of the sealing cover 308.

所述封接蓋308為一平板。所述封接蓋308的面積略大於上述預封接器件300的排氣孔302的面積。所述封接蓋308的材料為玻璃或金屬,且該封接蓋308材料的熔點/軟化溫度應高於所選的低熔點玻璃粉的軟化溫度。本實施例中,所述封接蓋308為一軟化溫度高於600℃的玻璃板,所述低熔點玻璃粉層304的軟化溫度為400℃。 The sealing cover 308 is a flat plate. The area of the sealing cover 308 is slightly larger than the area of the venting opening 302 of the pre-sealing device 300. The material of the sealing cover 308 is glass or metal, and the melting/softening temperature of the material of the sealing cover 308 should be higher than the softening temperature of the selected low melting glass frit. In this embodiment, the sealing cover 308 is a glass plate having a softening temperature higher than 600 ° C, and the softening temperature of the low-melting glass frit layer 304 is 400 ° C.

於該封接蓋308的一表面形成低熔點玻璃粉層304的方法具體包括以下步驟:首先,將低熔點玻璃粉與黏結劑混合得到一漿料。然後,通過絲網列印或手工塗覆的方法於封接蓋308的一表面形成一低熔點玻璃粉層304。所述低熔點玻璃粉層304的面積應略大於上述排氣孔302的面積,厚度小於1毫米。 The method for forming the low-melting glass frit layer 304 on one surface of the sealing cover 308 specifically includes the following steps: First, the low-melting glass frit is mixed with a binder to obtain a slurry. Then, a low-melting glass frit layer 304 is formed on one surface of the sealing cover 308 by screen printing or manual coating. The area of the low-melting glass frit layer 304 should be slightly larger than the area of the vent hole 302, and the thickness is less than 1 mm.

進一步,於該封接蓋308的一表面形成一低熔點玻璃粉層304之後,將該低熔點玻璃粉層304於真空環境下進行熔煉處理,以將其內部氣體排出。將該低熔點玻璃粉層304於真空環境下熔煉的方法具體包括以下步驟:首先,將該形成有低熔點玻璃粉層304的封接蓋308置於一真空環境中。 Further, after forming a low-melting glass frit layer 304 on one surface of the sealing cover 308, the low-melting glass frit layer 304 is subjected to a melting treatment in a vacuum environment to discharge the internal gas. The method of melting the low-melting glass frit layer 304 in a vacuum environment specifically includes the following steps: First, the sealing cap 308 formed with the low-melting glass frit layer 304 is placed in a vacuum environment.

所述封接蓋308形成有低熔點玻璃粉層304的一面朝上。所述真空環境的壓強低於1×10-2帕。可以理解,本實施例中,可以同時對複數個低熔點玻璃粉層304進行熔煉處理。 The sealing cover 308 is formed with the side of the low-melting glass frit layer 304 facing upward. The pressure in the vacuum environment is less than 1 x 10 -2 Pa. It can be understood that, in this embodiment, a plurality of low-melting glass frit layers 304 can be simultaneously smelted.

其次,對該形成有低熔點玻璃粉層304的封接蓋308進行加熱,使低熔點玻璃粉層處於熔融態,並保持一段時間。 Next, the sealing cap 308 on which the low-melting glass frit layer 304 is formed is heated to keep the low-melting glass frit layer in a molten state for a certain period of time.

所述加熱可以通過電熱絲、紅外照射或鐳射照射等方法實現。所述低熔點玻璃粉層304於熔融態下保持的時間為30~60分鐘。該過程中,低熔點玻璃粉層304內的氣體全部排出。 The heating can be achieved by a method such as electric heating wire, infrared irradiation or laser irradiation. The low-melting glass frit layer 304 is maintained in a molten state for a period of 30 to 60 minutes. In this process, all of the gas in the low-melting glass frit layer 304 is discharged.

最後,使該形成有低熔點玻璃粉層304的封接蓋308降溫至室溫,熔融態的低熔點玻璃粉層304凝固,並將該封接蓋308取出。 Finally, the sealing cap 308 having the low-melting glass frit layer 304 formed is cooled to room temperature, and the molten low-melting glass frit layer 304 is solidified, and the sealing cap 308 is taken out.

本技術方案中,由於對低熔點玻璃粉層304進行了熔煉排氣處理,故,後續封接過程中,加熱低熔點玻璃粉層304就不會有氣體排出。 In the present technical solution, since the low-melting glass frit layer 304 is subjected to smelting and exhausting treatment, the low-melting-point glass frit layer 304 is heated without gas discharge during the subsequent sealing process.

步驟三,將所述封接蓋308形成有低熔點玻璃粉層304的一面對應於排氣孔302,且與排氣孔302間隔一定距離設置。 Step 3: One side of the sealing cover 308 formed with the low-melting glass frit layer 304 corresponds to the vent hole 302 and is disposed at a distance from the vent hole 302.

本實施例中,可預先於預封接器件300的排氣孔302周圍間隔設置至少三個支撐體306,且支撐體306之間的距離不小於2毫米。並將封接蓋308置於上述支撐體306上,封接蓋308形成有低熔點玻璃粉層304的一面對應於排氣孔302。 In this embodiment, at least three support bodies 306 may be disposed in advance around the exhaust holes 302 of the pre-sealing device 300, and the distance between the support bodies 306 is not less than 2 mm. The sealing cover 308 is placed on the support body 306, and one side of the sealing cover 308 formed with the low-melting glass frit layer 304 corresponds to the vent hole 302.

所述支撐體306材料為低熔點玻璃粉,其形狀不限。該低熔點玻璃粉加工成支撐體306前,可先於真空環境下進行熔煉處理,將低熔點玻璃粉內部氣體排出。本實施例中 ,於排氣孔302周圍設置三個等間隔的柱狀支撐體306,以用來支撐封接蓋308。 The material of the support body 306 is a low-melting glass frit, and its shape is not limited. Before the low-melting glass frit is processed into the support 306, the smelting treatment may be performed in a vacuum environment to discharge the internal gas of the low-melting glass frit. In this embodiment Three equally spaced columnar supports 306 are provided around the venting opening 302 for supporting the sealing cover 308.

將封接蓋308置於上述支撐體306上,且形成有低熔點玻璃粉層304的一面與排氣孔302對準,封接蓋308通過該支撐體306與排氣孔302間隔設置。於支撐體306之間留有空隙,該空隙可以用來排氣。 The sealing cover 308 is placed on the support body 306, and one side of the low-melting glass frit layer 304 is formed in alignment with the exhaust hole 302, and the sealing cover 308 is spaced apart from the exhaust hole 302 by the support body 306. A gap is left between the supports 306, which can be used to vent.

可以理解,本實施例中還可以通過其他方式使封接蓋308與排氣孔302間隔一定距離設置,如可用一機械手(圖中未顯示)將所述封接蓋308形成有低熔點玻璃粉層304的一面對應於排氣孔302,且與排氣孔302間隔一定距離懸空設置。 It can be understood that, in this embodiment, the sealing cover 308 can be disposed at a distance from the vent hole 302 by other means. For example, the sealing cover 308 can be formed with a low-melting glass by a robot (not shown). One side of the powder layer 304 corresponds to the vent hole 302 and is disposed at a distance from the vent hole 302.

進一步,該封接蓋308形成有低熔點玻璃粉層304的一表面還可以形成一吸氣劑310,用於吸附真空器件內殘餘的氣體,維持真空器件內部的真空度。該吸氣劑310可以為蒸散型吸氣劑,也可以為非蒸散型吸氣劑。所述的蒸散型吸氣劑材料主要以鋇、鍶、鎂、鈣為主體材料,如:鋇鋁鎳。所述的非蒸散型吸氣劑材料主要包括鈦、鋯、鉿、釷、釩、鐵、鋁、稀土金屬及其合金。本實施例中,所述吸氣劑310為非蒸散型吸氣劑,其材料為鋯釩鐵。由於將吸氣劑310形成於所述封接蓋308上,故,無需於預封接器件300內預留專門的設置吸氣劑310空間,有利於封接器件300的設計。 Further, a surface of the sealing cover 308 formed with the low-melting glass frit layer 304 may further form a getter 310 for adsorbing residual gas in the vacuum device to maintain the vacuum inside the vacuum device. The getter 310 may be an evapotranspiration getter or a non-evaporable getter. The evapotranspiration getter material is mainly composed of lanthanum, cerium, magnesium and calcium, such as lanthanum aluminum. The non-evaporable getter material mainly includes titanium, zirconium, hafnium, tantalum, vanadium, iron, aluminum, rare earth metals and alloys thereof. In this embodiment, the getter 310 is a non-evaporable getter, and the material thereof is zirconium ferrovanadium. Since the getter 310 is formed on the sealing cover 308, it is not necessary to reserve a space for the getter 310 in the pre-sealing device 300, which is advantageous for the design of the sealing device 300.

步驟四,對上述預封接器件300進行抽真空。 In step four, the pre-sealing device 300 is evacuated.

對預封接器件300進行抽真空可以通過真空杯或真空室來 實現。本實施例中,將該預封接器件300置於一真空室314內,通過改變真空室314的真空度來實現對預封接器件300進行抽真空。具體包括以下步驟:首先,提供一真空室314,該真空室314與一抽真空系統316相連通,且該真空室314內壁設置有一加熱裝置320。所述加熱裝置320可以為電熱絲、紅外照射器或鐳射照射器等。 Vacuuming the pre-sealing device 300 can be done through a vacuum cup or vacuum chamber achieve. In this embodiment, the pre-sealing device 300 is placed in a vacuum chamber 314, and the pre-sealing device 300 is evacuated by changing the degree of vacuum of the vacuum chamber 314. Specifically, the method includes the following steps: First, a vacuum chamber 314 is provided, and the vacuum chamber 314 is in communication with an evacuation system 316, and a heating device 320 is disposed on the inner wall of the vacuum chamber 314. The heating device 320 may be a heating wire, an infrared illuminator or a laser illuminator or the like.

其次,將所述至少一個預封接器件300置於真空室314內,並進行抽真空。 Next, the at least one pre-sealing device 300 is placed in a vacuum chamber 314 and evacuated.

最後,加熱該預封接器件300,對預封接器件300進行烘烤排氣。 Finally, the pre-sealing device 300 is heated to bake the pre-sealed device 300.

通過加熱裝置320對預封接器件300進行烘烤排氣,可以儘量的將預封接器件300內的空氣排出。加熱的溫度應當低於所選的低熔點玻璃粉的軟化溫度。本實施例中,由於於封接蓋308上形成了吸氣劑310,故,烘烤排氣的過程中,同時完成了對吸氣劑310的激活。 The pre-sealing device 300 is baked and exhausted by the heating device 320, and the air in the pre-sealing device 300 can be discharged as much as possible. The heating temperature should be lower than the softening temperature of the selected low melting glass frit. In the present embodiment, since the getter 310 is formed on the sealing cover 308, the activation of the getter 310 is completed simultaneously in the process of baking the exhaust gas.

步驟五,加熱軟化該低熔點玻璃粉層304,使封接蓋308封住排氣孔302。 In step five, the low-melting glass frit layer 304 is heated and softened, so that the sealing cap 308 seals the vent hole 302.

加熱可以通過加熱裝置320來實現,也可以採用烘烤爐直接加熱使其軟化。當加熱使低熔點玻璃粉層304以及支撐體306軟化後,於重力作用下封接蓋308將排氣孔302封住。 Heating can be achieved by heating device 320, or it can be directly heated by a baking oven to soften it. When the low-melting glass frit layer 304 and the support 306 are softened by heating, the sealing cap 308 is sealed by gravity to seal the vent hole 302.

步驟六,降溫凝固,使上述封接蓋308與預封接器件300 結合。 Step six, cooling and solidifying, so that the sealing cover 308 and the pre-sealing device 300 are Combine.

停止加熱,低熔點玻璃粉開始凝固,並將封接蓋308與預封接器件300封接於一起。此時,由於預先對低熔點玻璃粉層304進行真空熔煉處理,故,當加熱使低熔點玻璃粉層304以及支撐體306軟化後,不會有氣體排出。 Heating is stopped, the low melting glass frit begins to solidify, and the sealing cap 308 is sealed with the pre-sealing device 300. At this time, since the low-melting-point glass frit layer 304 is subjected to vacuum melting treatment in advance, when the low-melting-point glass frit layer 304 and the support 306 are softened by heating, no gas is discharged.

可以理解,進一步還可以預先於封接蓋308沒有形成有低熔點玻璃粉層304的一表面設置一重物322。低熔點玻璃粉層304以及支撐體306軟化後,該重物322可以給封接蓋308一向下的壓力,使封接蓋308與預封接器件300更好的結合。 It can be understood that a weight 322 may be further disposed in advance on a surface of the sealing cover 308 where the low-melting glass frit layer 304 is not formed. After the low-melting glass frit layer 304 and the support 306 are softened, the weight 322 can give a downward pressure to the sealing cover 308, so that the sealing cover 308 can be better combined with the pre-sealing device 300.

本技術方案提供的真空器件的封接方法具有以下優點:第一,採用無排氣管封接,使得製備的真空器件沒有突起的尾巴狀排氣管,提高了真空器件的安全性及穩定性。第二,通過大孔徑排氣孔排氣,提高了排氣速度,節約了時間成本。第三,將吸氣劑形成於封接蓋上,故,無需於預封接器件內預留專門的設置吸氣劑的空間,有利於真空器件的設計。 The sealing method of the vacuum device provided by the technical solution has the following advantages: First, the non-exhaust pipe is sealed, so that the prepared vacuum device has no protruding tail-shaped exhaust pipe, thereby improving the safety and stability of the vacuum device. . Second, the exhaust through the large aperture vents increases the exhaust speed and saves time. Thirdly, the getter is formed on the sealing cover. Therefore, it is not necessary to reserve a space for setting the getter in the pre-sealing device, which is advantageous for the design of the vacuum device.

綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施例,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

100,300‧‧‧預封接器件 100,300‧‧‧ pre-sealed devices

102,302‧‧‧排氣孔 102,302‧‧‧ venting holes

104‧‧‧真空杯 104‧‧‧vacuum cup

106,316‧‧‧抽真空系統 106,316‧‧‧ Vacuum system

108‧‧‧低熔點波璃粉 108‧‧‧Low melting point glass powder

110‧‧‧排氣管 110‧‧‧Exhaust pipe

112‧‧‧聚光封口裝置 112‧‧‧Concentrating sealing device

114,314‧‧‧真空室 114,314‧‧‧vacuum room

116‧‧‧電熱封口裝置 116‧‧‧Electric heat sealing device

304‧‧‧低熔點玻璃粉層 304‧‧‧Low-melting glass powder layer

306‧‧‧支撐體 306‧‧‧Support

308‧‧‧封接蓋 308‧‧‧Filling cover

310‧‧‧吸氣劑 310‧‧‧ getter

312‧‧‧殼體 312‧‧‧Shell

320‧‧‧加熱裝置 320‧‧‧ heating device

322‧‧‧重物 322‧‧‧ Heavy objects

圖1為先前技術中採用真空杯封接真空器件的裝置的結構 示意圖。 1 is a structure of a device for sealing a vacuum device using a vacuum cup in the prior art. schematic diagram.

圖2為先前技術中採用真空室封接真空器件的裝置的結構示意圖。 2 is a schematic view showing the structure of a device for sealing a vacuum device using a vacuum chamber in the prior art.

圖3為本技術方案實施例所提供的真空器件的封接方法流程圖。 FIG. 3 is a flow chart of a sealing method of a vacuum device according to an embodiment of the present technical solution.

圖4為本技術方案實施例封接真空器件的裝置的結構示意圖。 4 is a schematic structural view of an apparatus for sealing a vacuum device according to an embodiment of the present technical solution.

Claims (11)

一種真空器件的封接方法,其包括以下步驟:提供一預封接器件,所述預封接器件包括一殼體以及一設置於該殼體上的排氣孔;提供一封接蓋,並於該封接蓋的一表面形成一低熔點玻璃粉層,將該低熔點玻璃粉層於真空環境下熔煉;將所述封接蓋形成有低熔點玻璃粉層的一面對應於排氣孔,且與排氣孔間隔一定距離設置;對上述預封接器件進行抽真空;加熱軟化該低熔點玻璃粉層,並使封接蓋封住排氣孔;以及降溫凝固,使上述封接蓋與預封接器件結合。 A sealing method for a vacuum device, comprising the steps of: providing a pre-sealing device, the pre-sealing device comprising a casing and a venting hole disposed on the casing; providing a cover, and Forming a low-melting glass frit layer on a surface of the sealing cover, and melting the low-melting glass frit layer in a vacuum environment; and forming one side of the sealing cap with a low-melting glass frit layer corresponding to the vent hole; And is disposed at a distance from the vent hole; vacuuming the pre-sealing device; heating and softening the low-melting glass powder layer, and sealing the sealing hole; and cooling and solidifying, so that the sealing cover is Pre-sealed device bonding. 如申請專利範圍第1項所述的真空器件的封接方法,其中,所述預封接器件的材料為玻璃或金屬。 The sealing method of the vacuum device according to claim 1, wherein the material of the pre-sealing device is glass or metal. 如申請專利範圍第1項所述的真空器件的封接方法,其中,所述排氣孔的孔徑為2~10毫米。 The sealing method of the vacuum device according to claim 1, wherein the vent hole has a pore diameter of 2 to 10 mm. 如申請專利範圍第1項所述的真空器件的封接方法,其中,所述封接蓋的材料為金屬或玻璃,且該封接蓋的熔點/軟化溫度高於所選的低熔點玻璃粉的軟化溫度。 The sealing method of the vacuum device according to claim 1, wherein the sealing cover is made of metal or glass, and the sealing cap has a melting point/softening temperature higher than the selected low melting glass powder. Softening temperature. 如申請專利範圍第1項所述的真空器件的封接方法,其中,所述低熔點玻璃粉層通過絲網列印或手工塗覆的方法形成於封接蓋的一表面。 The method of sealing a vacuum device according to claim 1, wherein the low-melting glass frit layer is formed on a surface of the sealing cover by screen printing or manual coating. 如申請專利範圍第1項所述的真空器件的封接方法,其中,所述將低熔點玻璃粉層於真空環境下熔煉的過程具體包括以下步驟:將該形成有低熔點玻璃粉層的封接蓋置於一 壓力低於1×10-2帕的的真空環境中;對該形成有低熔點玻璃粉層的封接蓋進行加熱,使低熔點玻璃粉層處於熔融態,並保持30~60分鐘;使該形成有低熔點玻璃粉層的封接蓋降溫至室溫,熔融態的低熔點玻璃粉層凝固,並將該封接蓋取出。 The sealing method of the vacuum device according to claim 1, wherein the process of melting the low-melting glass frit layer in a vacuum environment specifically comprises the step of: forming a seal having a low-melting glass frit layer The cover is placed in a vacuum environment with a pressure lower than 1×10 −2 Pa; the sealing cover forming the low-melting glass frit layer is heated to keep the low-melting glass frit layer in a molten state and kept at 30~ 60 minutes; the sealing cap formed with the low-melting glass frit layer was cooled to room temperature, and the molten low-melting glass frit layer was solidified, and the sealing cap was taken out. 如申請專利範圍第6項所述的真空器件的封接方法,其中,將該低熔點玻璃粉層於真空環境下熔煉之後,進一步於所述封接蓋形成有低熔點玻璃粉層的表面形成一吸氣劑。 The method of sealing a vacuum device according to claim 6, wherein the low-melting glass frit layer is further melted in a vacuum environment, and further formed on a surface of the sealing cap formed with a low-melting glass frit layer. A getter. 如申請專利範圍第1項所述的真空器件的封接方法,其中,於預封接器件的排氣孔周圍設置至少三個支撐體,並將封接蓋置於上述支撐體上,且形成有低熔點玻璃粉層的一面對應於排氣孔,封接蓋通過該支撐體與排氣孔間隔設置。 The sealing method of the vacuum device according to claim 1, wherein at least three support bodies are disposed around the vent hole of the pre-sealing device, and the sealing cover is placed on the support body and formed One side of the low-melting glass frit layer corresponds to the vent hole, and the sealing cover is spaced apart from the vent hole by the support body. 如申請專利範圍第8項所述的真空器件的封接方法,其中,所述支撐體的材料為低熔點玻璃粉,且該低熔點玻璃粉加工成支撐體前,先於真空環境下進行熔煉處理。 The method for sealing a vacuum device according to claim 8, wherein the material of the support is a low-melting glass frit, and the low-melting glass frit is melted before being processed into a support. deal with. 如申請專利範圍第9項所述的真空器件的封接方法,其中,通過加熱使支撐體軟化,且封接蓋於重力作用下封住排氣孔。 The sealing method of the vacuum device according to claim 9, wherein the support is softened by heating, and the sealing cover seals the vent hole by gravity. 如申請專利範圍第1項所述的真空器件的封接方法,其中,所述對預封接器件進行抽真空的過程包括以下步驟:提供一真空室,該真空室與一抽真空系統相連通,且該真空室內壁設置有一加熱裝置;將所述預封接器件置於真空室內,並進行抽真空;加熱該預封接器件,對預封接器件進行烘烤排氣。 The method of sealing a vacuum device according to claim 1, wherein the vacuuming the pre-sealing device comprises the steps of: providing a vacuum chamber, the vacuum chamber being connected to a vacuum system And the heating chamber is provided with a heating device; the pre-sealing device is placed in the vacuum chamber, and vacuuming is performed; and the pre-sealing device is heated to bake and exhaust the pre-sealing device.
TW97119112A 2008-05-23 2008-05-23 Method of sealing vacuum electronic device TWI381492B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5797780A (en) * 1996-02-23 1998-08-25 Industrial Technology Research Institute Hybrid tubeless sealing process for flat panel displays
US5921837A (en) * 1996-10-25 1999-07-13 Pixtech S.A. Method and device for assembling a flat display screen
JP2005011558A (en) * 2003-06-17 2005-01-13 Nippon Hoso Kyokai <Nhk> Method and apparatus for manufacturing flat panel display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5797780A (en) * 1996-02-23 1998-08-25 Industrial Technology Research Institute Hybrid tubeless sealing process for flat panel displays
US5921837A (en) * 1996-10-25 1999-07-13 Pixtech S.A. Method and device for assembling a flat display screen
JP2005011558A (en) * 2003-06-17 2005-01-13 Nippon Hoso Kyokai <Nhk> Method and apparatus for manufacturing flat panel display device

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