1240760 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種鍍膜裝置，尤指一種利用圓柱鍍膜 腔體進行鍍膜之用於平板式基材之鍍膜裝置。 【先前技術】 對習知鍍膜裝置而言，如何改良其設備配置以有效提 咼產能，無疑是生產線上最重要之問題；目前習知上往往 是以提升鍍膜環境之空間利用率的方式，以增加單位空間 内所配置的待鍍元件數目，進而可增加單位時間内完成鍍_ 膜的待鑛元件數目，達至量產需求。 、以第5圖所示之習知圓管基材鍍膜裝置為例，其係用 以於全玻璃真空管之内層玻璃管表面鍵覆一層選擇性吸收 膜’以提升該玻璃管對太陽輻射之吸收。其係如圖示設叶 -繞其圓心轉動之圓盤7〇,並於該圓盤7〇周圍 多數個等間隔排列之待鑛玻璃管 * 兮圓舣# 行級圾埽e 72，此些玻璃管72將隨1240760 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a coating device, and more particularly to a coating device for a flat-plate substrate that uses a cylindrical coating cavity for coating. [Previous technology] For the conventional coating device, how to improve its equipment configuration to effectively increase production capacity is undoubtedly the most important issue on the production line. At present, it is often used to increase the space utilization ratio of the coating environment to Increasing the number of components to be plated in a unit space can further increase the number of components to be mined to complete the plating process in a unit time, thereby achieving mass production requirements. Take the conventional round tube substrate coating device shown in Figure 5 as an example, which is used to bond a layer of selective absorption film on the surface of the inner glass tube of an all-glass vacuum tube to enhance the absorption of solar radiation by the glass tube . It is set as shown in the figure-a disk 70 rotating around the center of the circle, and a plurality of equally spaced glass tubes to be mined are arranged around the disk 70. 曦 圆 舣 # Row-level trash 72, these The glass tube 72 will follow
二 轉動而繞該圓盤圓心71轉動，同時每一玻璃 IT:璃將繞其自身圓心旋轉’如此，即可於轉動過”， 二J 7二表面上的每一位置均可猶環朝向該圓盤川 广71，同日，，該圓盤圓心71附近 (Sputter)乾材73，該乾材73之表 有濺鍍 時，僅需以離4 f /τ …又後有待鍍材料，此 偟而以孅子撞擊（I〇n Bombardmen ㈣即可令該_表面之激發該 些玻璃管72之表面，士赤且古古咖，义材科均勾濺鍍至該 以同時於多數個根玻：管;2上Γ覆:?之率之鑛膜製程’ 坂後所需之待鍍材料。 17913 5 !24〇76〇 f而’此―設計雖具有極高的_產能，惟其適用領 ^極為有限’而僅能運用於圓管狀之待鑛元件上，對於 ^平板式集熱片等平板式基材而言，顯然難以運用相同 原理而達至所需的制產能；以第6圖為例，若 5圖之圓盤與㈣設備進行平板式基材_， 弟 =間利用率’則顯然僅能將該些平板式基材8〇取问 =該圓盤70之周圍’並令其待錢表面均朝向該圓盤 b之囡心，惟此-排列方式雖可顧及鑛膜之均勾 :然卻減低了鏟膜之量產產能，且若待鑛之平板式基材 的尺寸過大，更將形成㈣上之_而減低單 間内的基材數目。 ΤΙ二 再者，或有以增大該圓盤直徑尺寸之方式而進 =產能之考量’㈣設計除了將增加制設備之成本夕卜~ ^將造成整體空間利用率的降低；此因為顧及鍍膜之 度，该些平板式基材僅能以圓周狀排列於同一排，因紗 大圓盤之設計僅能增加零星數片待㈣材 3 更多的圓盤空間。 賈了 因此’如何開發一種用於平板式基材之鑛膜裝置，以 提南其鍍膜產能，同時復兼顧整體設備的空間利用率 本，確已為此相關研發領域所迫切待解之課題。 ^ 【發明内容】 ' 因此，有鏗於前述及其他問題，本發明之主要 於提供-種可增加產能的用於平板絲材讀膜裳置。 本發明之另-目的在於提供_種可增加空間利㈣ 17913 6 1240760 的用於平板式基材之鍍膜裝置。 本冬明之再一目的在於提供一種可提升鍍膜均勾性 的用於平板式基材之鍍膜裝置。 本發明之又一目的在於提供一種可降低設備成本的 用於平板式基材之鍍膜裝置。 為達則述及其他目的，本發明所提供之用於平板式基 材;之鑛膜農置，係包括：—腔體；設於該腔體内之轉盤^ ::於該轉盤周圍的複數個架體，且每-架體係裝置有至· 二平板式基材，位於該轉盤下方且用以驅動該轉盤與該義擊 架體分別轉動的驅動組件；以及設於該腔體内的鑛膜單 兀將-待鍍材料鑛覆於該些平板式基材上。 轉般:H架體係為一等邊三角柱狀架體’且係分別與該· 2 由心相隔等距離；而該驅動組件則係包括馬達- 與齒輪Μ。 此外，⑽膜單元係為一可轉動或靜止之圓柱乾材， =置於該腔體内約略中央之位置，且該㈣表面之_ 枓係X帶電離子之轟擊而受激發並職於該些平板式其 材之表面上。 土 *轉:二之設計’顯然可藉該三角柱狀架體 工間配置與轉動機制’達至提高產能與空間利用 与達續膜作業之量產效果，同時復可兼顧 ，、鍍膜均勻性’並減低設備之相對成本。 【實施方式】 乂下係藉由4寸定的具體實例說明本發明之實施方 17913 7 1240760 式，熟悉此技藝之人士可由太 本成明書所揭示之内容拉屁 瞭解本發明之其他優點|4 丄 季工易地 1文”沾與功效。本發明亦可藉由其他不π 的具體實例加以施行哎庫用 同 仃次應用，本說明書中的各項細節亦可Two turns and rotates around the center 71 of the disc, and at the same time each glass IT: glass will rotate around its own center 'so that it can be rotated.' Disk Chuanguang 71. On the same day, the dry material 73 near the center of the disk (Sputter) 73. When the surface of the dry material 73 is sputtered, it is only necessary to leave 4 f / τ… and then the material to be plated. And the impact of Ion Bombardmen (Ion Bombardmen) can make the surface of the glass tube 72, Shichi and Gugu, Yicai Branch are sputter-plated to the same time to many root glass : Tube; 2 Γ coating:? The rate of the ore film process 'materials to be plated after Sakago. 17913 5! 24〇76〇f and' this-although the design has a very high capacity, but it is applicable ^ It is extremely limited and can only be used on round tubular components to be mined. For flat-plate substrates such as flat-plate heat collectors, it is obviously difficult to use the same principle to achieve the required production capacity; take Figure 6 as For example, if the disc and substrate of Figure 5 are used for flat-type substrates, the ratio of the utilization rate is obviously limited to those flat-type substrates. = Around the disc 70 'and make its money-receiving surface face the center of the disc b, but this-the arrangement can take into account the uniformity of the mineral film: but it reduces the mass production capacity of the shovel film, and If the size of the flat substrate to be mined is too large, it will form a __ above and reduce the number of substrates in a single room. TII Second, or to increase the diameter of the disc = the capacity of In consideration of the '㈣ design, in addition to increasing the cost of manufacturing equipment ~ ^ will cause a reduction in overall space utilization; because of the degree of coating, the flat substrates can only be arranged in the same row in a circular shape due to the large yarn The design of the disc can only increase the number of pieces of material to be spent 3 more disc space. Jia Le therefore 'how to develop a mineral film device for flat substrates to increase its coating capacity while taking into account the overall The space utilization rate of equipment is indeed an urgent subject to be solved in this related research and development field. ^ [Summary of the Invention] Therefore, due to the foregoing and other problems, the present invention mainly provides a kind of application that can increase production capacity. Read the film on the flat wire. The other purpose is to provide a coating device for flat substrates that can increase the space and profit. 17913 6 1240760. Another purpose of this Dongming is to provide a flat substrate that can improve the uniformity of the coating. Coating device. Another object of the present invention is to provide a coating device for a flat-plate substrate which can reduce the equipment cost. In order to achieve other purposes, the present invention provides a flat-plate substrate; The system includes:-a cavity; a turntable provided in the cavity ^ :: a plurality of racks around the turntable, and each-rack system device has up to two flat substrates, which are located below the turntable and A driving assembly for driving the turntable and the hitting frame body to rotate respectively; and a mineral film unit provided in the cavity to cover the flat-plate substrate with the material to be plated. Turning like this: The H frame system is an equilateral triangular columnar frame body 'and is separated from the · 2 center by an equal distance; and the driving component includes a motor-and a gear M. In addition, the cymbal membrane unit is a cylindrical dry material that can be rotated or stationary, which is placed at a position approximately at the center of the cavity, and the _ 枓 on the surface of the ytterbium is excited by the charged X-ion ions and serves them. Flat type on the surface of the material. Soil transfer: The design of Er 'apparently can use the triangular columnar frame workshop configuration and rotation mechanism to achieve the effect of increasing production capacity and space utilization, and achieving the mass production effect of film renewal operation, and at the same time, it can take into account the uniformity of coating. And reduce the relative cost of equipment. [Embodiment] His Majesty uses a 4-inch specific example to illustrate the implementation method of the invention 17913 7 1240760. Those who are familiar with this technique can understand the other advantages of the invention by farting as disclosed in the book of Taiben Chengming | 4 丄 季 工 易地 1 text "Smear and effect. The present invention can also be implemented by other specific examples of non-π, the same application in the library, the details in this specification can also be
基於不同硯點與應用，在不悻 T 修飾與變更。 衫_本發明之精神下進行各種 第以圖所示即本發明之用於平板 施例上視圖’其係用以將一待鑛材料於2Based on different points and applications, we will not modify and change. __ Various kinds of shirts are carried out under the spirit of the present invention.
多數平板式基材1〇之表面上，包括-腔體-， 口又於t/亥腔體5 〇内之隸般9 Π，4/L W 個架體30,用以驅動“般盤2G周圍的複數 動組射未圖-、 架體30分別轉動的顯 二θ不）’以及设於該腔體50内的鍍膜單元45。 $賴盤2G係為—可係繞其圓心21轉動的轉盤2〇,且 之周圍係設置有多數個架體如，該些架體％係 =括-轉軸—33與圍置於該轉轴33周圍的等邊三角柱狀支 卞而垓二—角柱狀架體3〇係等間隔而呈圓周狀排列，且 =刀別與4轉動軸心21 (即轉盤2〇之圓心川等距離；同 *二角柱狀架體30係隨該轉盤20而繞該轉動軸心 It動且彳又分別於繞該轉動軸心轉動之同時繞其所投影 之正二角形的形心3 1轉動。 加么士該三角柱狀架體30係如第1B圖所示為一三角柱狀支 木、、、。構，以圍置成三個矩形表Φ 32，俾令該待鍵之平板式 基材10 (如平板式集熱片）設置於該矩形表面32上，並將 其待鍍表面朝向該三角柱狀架體30之外，進而可令每一三 角柱狀架體30上均配置有三個平板式基材1〇;同時，該 17913 8 1240760 支架結構中亦如圖所示，設置有-轉軸33,該轉 妾至X第二之側視圖(僅圖示-三角柱狀架體· =;，咖2。上帽輪組41，以令該三角柱狀 行轉動。 41而於该轉盤20上自 該鑛膜單元45係為—乾材，其係如第 圖般故置於該些三角柱狀架體3〇 轉盤20之中麥仿署.而枯*从 間並偏心地鄰近於該 圓柱體，且r，巴45係為一可轉動或靜止之 -表面係鍍有該待錢材料，以令妹材45上之 待鍍材料可於受激發後濺射至該靶材Μ 至該些繞該轉盤圓心21進行轉動 °而濺射 ,、/赫令士人斗—a 角柱狀架體30上， 以鍍後於该三角柱狀架體3〇之矩 材H)表面。 Σϋ®32上的平板式基 藉由第2圖之側視圖（僅圖示—三角柱狀架體 可 更清楚見得本實施例之驅動組件4〇的驅動On the surface of most flat-type substrates 10, including -cavity-, the mouth is in the same manner as t / hai cavity 50, which is like 9 Π, 4 / LW frame 30, which is used to drive around "Pan 2G" The complex motion shot is not shown in the figure, the frame body 30 is rotated to show the two θ not) 'and the coating unit 45 provided in the cavity 50. $ 赖 盘 2G 系 为 —turntable that can be rotated around its center 21 20, and a plurality of frames are provided around the frame, for example, the frame% = bracket-shaft-33 and an equilateral triangular columnar support surrounding the shaft 33 and two-corner-shaped frame The body 30 is arranged at equal intervals and arranged in a circle, and = the knife is equidistant from the axis 4 of the rotation 21 (that is, the center of the circle of the turntable 20); the same as the two-corner cylindrical frame 30 rotates with the turntable 20 The axis It moves and 彳 rotates around the center of rotation of the projected square-shaped centroid 31 while rotating around the axis of rotation. The triangular columnar frame 30 of Gasmus is a triangular column as shown in FIG. 1B. It is shaped like a wood, ..., to surround three rectangular tables Φ 32, and the flat substrate 10 (such as a flat heat collector) to be keyed is set on the rectangular surface 32, and The surface to be plated faces outside the triangular columnar frame 30, so that each triangular columnar frame 30 can be provided with three flat substrates 10; meanwhile, the 17913 8 1240760 bracket structure is also shown in the figure -It is provided with a rotation shaft 33, which turns to the second side view of X (only shown in the figure-a triangular columnar frame · = ;, coffee 2. Upper cap wheel set 41, so that the triangular columnar row rotates. 41 而 于The turntable 20 is a dry material from the ore membrane unit 45, which is placed in the triangular columnar frame 30 as shown in the figure. In the cylinder, and r, Ba 45 is a rotatable or stationary-the surface is plated with the material to be coated, so that the material to be plated on the sister material 45 can be sputtered to the target M after being excited. So far, these are rotated around the turntable center 21 and sputtered on the Herringbone-a corner columnar frame 30 to be plated on the surface of the rectangular columnar frame 30). ΣH The flat base on the ®32 is shown in the side view in Figure 2 (only shown—the triangular columnar frame can more clearly see the drive of the drive assembly 40 in this embodiment).
件扣係:包括有-驅動器42與一齒輪組，該驅動器42 = ^亥轉盤20下方’且可為一馬達。該齒輪组則包括有一位 於该轉盤20下方的主齒輪組43及一位於該轉盤⑼上方的 副齒輪組4!，該驅動器42係供驅動該轉盤加轉 驅動器42具有一用以屬合該主齒輪組43的齒冑44, ^ 齒輪組43係可帶動該轉盤2〇上方之副歯輪纽4ι，該=音 輪組41係供驅動該架體3〇轉動。如此，即可達至=二二 例中令該些三角柱狀架體3〇既繞該㈣= 行旋轉之設計。 17913 9 1240760 同時，本實施例中係 + 10定位於該三角柱狀二夹固之方式而將該平板式基材 狀木體30的矩形表面32上，並方1在 如弟1B圖所示，先於每m _、 入該管件η中，以固定件（未圖示）插置 於4 S件而將該平板式基材10夾固 ^亥二角柱狀架體30之矩形表面32上。惟，此 =广明之限制’其他以黏貼或扣合形式定位該平： 。40^一方式亦均屬於本發明，僅需令該平板式基材 衣，又於忒二角柱狀架體30之表面即可。 第2圖此二僅t實！例之鑛膜装置1進行崎錢膜時，係如 壯力1又 —二角柱狀架體30)將該轉盤20盥三角柱 U置於該腔體5G中，該腔體50係·呈真空且 一例如氬氣（Ar)離子之帶帝雜工 、充有 膜時，僅需對該帶電予;^當操作者欲進行鑛 電將而轉…/ 偏壓，即可將其激發成 Α水而轟巴材45表面之待鑛材料， 二原子將受該帶電離子57之森擊而受 錢= 圍的平板式基材1〇表面，完成高產能且高均勾； :。此-繼計僅為本發明之實施例，並非二；= _5位置等，均可達至本c數目或變 加綜上所述，即知’本發明係藉由一可轉動的三 木體與轉盤之搭配設計，而解決習 材之鐘膜產能的問題，此—^^=从升平板式基 r據整體空間利用率之 I而疋，俾使其空間利用率達至最大，而減低整體設備 17913 10 1240760 之相對成本。按，若佑笛 t ^ , π 依乐3Α、3Β圖之比較，即 見度尺寸同樣為…的平拓 』見侍對 柱狀架體30於轉動時^^基材1〇而言，其所需之三角 (U3W1夏15w. ^ 有之圓面積與直徑係分別為The component buckle system includes a driver 42 and a gear set. The driver 42 = ^ lower than the turntable 20 'and may be a motor. The gear set includes a main gear set 43 located below the turntable 20 and a sub-gear set 4 located above the turntable ⑼. The driver 42 is used to drive the turntable plus a rotation drive 42 having a function to belong to the main The gears 44 of the gear set 43 and the gear set 43 can drive the auxiliary wheels 4m above the turntable 20, and the sound wheel set 41 is used to drive the frame 30 to rotate. In this way, you can reach the design of making the triangular columnar bodies 30 rotate around the ㈣ = line in the two or two cases. 17913 9 1240760 At the same time, in this embodiment, +10 is located on the rectangular surface 32 of the flat substrate-like wood body 30 in the triangular columnar two clamping manner, and the square 1 is as shown in the figure 1B. Prior to each m_, the tube member η is inserted, and a fixing member (not shown) is inserted into the 4 S member to clamp the flat-plate substrate 10 on the rectangular surface 32 of the two-dimensional columnar frame 30. However, this = the limitation of Guangming ’The other positions the flat in the form of pasting or buckling:. The 40 ^ 1 method also belongs to the present invention, and it is only required that the flat-type substrate coat be placed on the surface of the pentagonal columnar frame 30. Figure 2 is only true! For example, when the ore membrane device 1 performs the oscillating film, it is as strong as 1-diagonal columnar frame 30) The turntable 20 and the triangular column U are placed in the cavity 5G, and the cavity 50 is vacuum and For example, when carrying a handyman with argon (Ar) ions and filling the membrane, only the charge is needed; ^ When the operator wants to switch the mining power ... / Bias, it can be excited into Α water and For the material to be mined on the surface of the 45-bar material, two atoms will be affected by the charge of the charged ion 57. The flat-type substrate 10 surface around the surface will complete high productivity and high uniformity;:. This-following calculation is only an embodiment of the present invention, not two; = _5 positions, etc., can reach the number of c or change the above, that is, the invention is based on a rotatable three-wood body and The collocation design of the turntable solves the problem of the bell film capacity of traditional materials. This ^^ = rises from the flat plate type base according to the overall space utilization rate I, which maximizes the space utilization rate and reduces the overall Relative cost of equipment 17913 10 1240760. According to the comparison of the yule t ^, π according to the 3A and 3B pictures of Lele, that is, the flatness of the visibility dimension is the same. ”See the position of the columnar frame 30 when the base frame 30 is rotated. The required triangle (U3W1 Xia 15w. ^ The circle area and diameter are
55，則JL於韓㈣“ +肖柱狀木脰3〇改為四角柱體 n/m 2、、轉冑令所佔有之圓面積與直徑將分別辦加A 〇.497w2 與9 力為 達至二角柱狀架體30佔用面積的15 :所！^，體55乃至其他更多邊狀設計雖可增加 盘亩L 板式基材1G數量，然若對於相同體積之轉盤 腔體而言，其所佔用之空間卻遠較三角柱狀架體％ 而使其配置數目又遠較三角柱狀架體3〇為少，反而 導致整體設備内可同時進行鐘膜之平板式基材ι〇數量的 降低。 由此可知本為明所提出用於平板式基材之錢膜裝置 確，有提高產能與空間利用率之功效，既可達至錢膜作業 之量產效果，同時復可兼顧其鐘膜均勻性，並減低設備之 相對成本。 此外，本發明之結構配置除前述實施例外，復可如第 4圖所不之第二實施例，而以一籠式支架轉盤6〇取代前述 之轉盤20，該籠式支架轉盤6〇之周圍係具有多數個支撐 桿61，且該三角柱狀架體30係藉一固定桿63而設置於該 籠式支架轉盤60周圍（僅圖示一三角柱狀架體％)，並可藉 一傳動機構62而進行轉動，進而達成令該些三角柱狀架體 30隨該籠式支架轉盤60轉動復自行旋轉之設計，同樣可 達成本發明之高產能鍍膜功效。 17913 11 1240760 上述實例僅為例示性說明本發明之原理及其功效 非用於限制本發明。任何熟習此項技藝之人士均可^ 背本發明之精神及範嘴下，對上述實施例進行修飾盘變連 化。因此，本發明之權利保護範圍，應如後述之申靖專利 範圍所列。 T明專利 【圖式簡單說明】 第1A圖係本發明之用 佳實施例上視圖； 料板式基材之鑛膜裝置的較 弟1B圖係第ία圖所一一 Μ 2 Fir^m ία 斤不之三角柱狀架體示意圖； 弟2圖係弟1A圖所；* μ ▲ 所之鍍膜裝置側視圖； 乐3Α及3Β圖係分別接 行鑛膜時之空間利用率比=了角柱狀架體與四角柱體進 第4圖係本發明之 给c门〆 币一只鈀例不意圖； 第5圖係習知上用 及 、61 s基材之鍍膜裝置上視圖；以 第6圖係以第5 不圖。 圖之習知裝置進行平板式基材鍍膜之55, then JL Yu Han's "+ Columnar wooden cymbal 30" changed to a quadrangular cylinder n / m 2. The circle area and diameter occupied by the turn order will be increased by A 〇.497w2 and 9 respectively. To the two-dimension columnar frame 30 which occupies 15% of the area: ^, the body 55 and even other more edge designs can increase the number of 1M of the L-shaped plate substrate, but if it is the same volume of the turntable cavity, its The occupied space is much smaller than that of the triangular columnar frame, and the number of configurations is much smaller than that of the triangular columnar frame 30. Instead, the number of flat substrates that can simultaneously perform the bell film in the overall device is reduced. It can be known from this that the money film device proposed for the flat-type substrate is indeed effective in improving productivity and space utilization. It can achieve the mass production effect of the money film operation, and at the same time, it can take into account the uniformity of its bell film In addition, the structural configuration of the present invention is the same as the second embodiment shown in FIG. 4 except for the foregoing embodiment, and a cage bracket turntable 60 is used to replace the aforementioned turntable 20, The cage bracket turntable 60 has a plurality of supporting rods 61 around it. In addition, the triangular columnar frame 30 is arranged around the cage bracket turntable 60 by a fixing rod 63 (only a triangular columnar frame is shown), and can be rotated by a transmission mechanism 62 to achieve the order The design of the triangular columnar bodies 30 following the rotation of the cage bracket turntable 60 and the self-rotation can also achieve the high-efficiency coating effect of the invention. 17913 11 1240760 The above examples are merely illustrative to illustrate the principle of the present invention and its effectiveness. In order to limit the present invention, anyone skilled in the art can mutate the modified embodiment of the above embodiments under the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention should be as described later. Jing patents are listed. T Ming patent [Simplified illustration of the drawing] Figure 1A is a top view of a preferred embodiment of the present invention; Figure 1B of a younger brother of a sheet-type substrate mineral film device is shown in Figure 1-1. 2 Fir ^ m ία A schematic diagram of the triangular columnar frame of Jinbuzhi; Figure 2 is the figure 1A; * μ ▲ The side view of the coating device; Figures 3A and 3B are the space utilization ratios when the mineral film is connected respectively. = Angular columnar body Entering the quadrangular cylinder Figure 4 is not intended to give a palladium to the C-gate coin of the present invention; Figure 5 is a top view of a conventional coating device with 61 s substrate; Figure 6 is based on Figure 5 is not shown in the figure.
10 平板式基材 20轉盤 30 三角柱狀架體 3 2 矩形表面 40 驅動組件 42驅動器 【主要元件符號說明】 1 鍍膜裝置 12管件 21 轉動軸心 31形心 33轉軸 41 副齒輪組 17913 12 1240760 43 主齒輪組 44 齒盤 45 靶材 50 真空腔體 55 四角柱體 57 帶電離子 60 籠式支架轉盤 61 支撐桿 62 傳動機構 63 固定桿 70 圓盤 71 圓心 72 待鍍玻璃管 73 靶材 80 平板式基材 13 1791310 Flat substrate 20 Turntable 30 Triangular columnar frame 3 2 Rectangular surface 40 Drive unit 42 Drive [Description of main component symbols] 1 Coating device 12 Tube 21 Rotating shaft center 31 Shape center 33 Rotary shaft 41 Sub-gear set 17913 12 1240760 43 Main Gear set 44 Tooth plate 45 Target material 50 Vacuum cavity 55 Quadrilateral cylinder 57 Charged ion 60 Cage bracket turntable 61 Support rod 62 Transmission mechanism 63 Fixing rod 70 Disk 71 Circle center 72 Glass tube to be plated 73 Target material 80 Flat base Material 13 17913