TWD115746S1 - 支撐板 - Google Patents
支撐板Info
- Publication number
- TWD115746S1 TWD115746S1 TW095301182F TW95301182F TWD115746S1 TW D115746 S1 TWD115746 S1 TW D115746S1 TW 095301182 F TW095301182 F TW 095301182F TW 95301182 F TW95301182 F TW 95301182F TW D115746 S1 TWD115746 S1 TW D115746S1
- Authority
- TW
- Taiwan
- Prior art keywords
- round holes
- back side
- small round
- semiconductor wafer
- design
- Prior art date
Links
Abstract
【物品用途】;本創作的物品是一種支撐板,當在研磨半導體晶圓之背面側進行薄板化時,貼附在半導體晶圓之正面側,於研磨之際,防止半導體晶圓發生破裂等,材質例如可使用玻璃板。;【創作特點】;如立體圖、前視圖及後視圖所示,該支撐板為一薄板體,並於適當處做部分切除形成平切面,其正面的外周具有許多貫穿至背面的小圓孔,於該些小圓孔所圍構的內表面上,佈滿蜂巢形花紋,且於該花紋的中心具有四個貫穿至背面的小圓孔,因此由後視圖觀看時,除小圓孔外其餘為平滑面狀的設計;綜上所述,本創作之整體造形除了功能需求外,同時更考慮到美觀上的要求,依此產生此以特殊之外觀樣態,確為一創新美觀之產品。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005026008 | 2005-09-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD115746S1 true TWD115746S1 (zh) | 2007-03-01 |
Family
ID=38120961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095301182F TWD115746S1 (zh) | 2005-09-08 | 2006-03-08 | 支撐板 |
Country Status (2)
Country | Link |
---|---|
US (1) | USD544452S1 (zh) |
TW (1) | TWD115746S1 (zh) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8475636B2 (en) | 2008-11-07 | 2013-07-02 | Novellus Systems, Inc. | Method and apparatus for electroplating |
US8308931B2 (en) * | 2006-08-16 | 2012-11-13 | Novellus Systems, Inc. | Method and apparatus for electroplating |
US8623193B1 (en) | 2004-06-16 | 2014-01-07 | Novellus Systems, Inc. | Method of electroplating using a high resistance ionic current source |
US8262871B1 (en) | 2008-12-19 | 2012-09-11 | Novellus Systems, Inc. | Plating method and apparatus with multiple internally irrigated chambers |
US9624592B2 (en) | 2010-07-02 | 2017-04-18 | Novellus Systems, Inc. | Cross flow manifold for electroplating apparatus |
US8795480B2 (en) | 2010-07-02 | 2014-08-05 | Novellus Systems, Inc. | Control of electrolyte hydrodynamics for efficient mass transfer during electroplating |
US9523155B2 (en) | 2012-12-12 | 2016-12-20 | Novellus Systems, Inc. | Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating |
US10094034B2 (en) | 2015-08-28 | 2018-10-09 | Lam Research Corporation | Edge flow element for electroplating apparatus |
US10233556B2 (en) | 2010-07-02 | 2019-03-19 | Lam Research Corporation | Dynamic modulation of cross flow manifold during electroplating |
USD760180S1 (en) * | 2014-02-21 | 2016-06-28 | Hzo, Inc. | Hexcell channel arrangement for use in a boat for a deposition apparatus |
USD748593S1 (en) * | 2014-03-05 | 2016-02-02 | Hzo, Inc. | Boat for use in a material deposition apparatus |
US9670588B2 (en) | 2013-05-01 | 2017-06-06 | Lam Research Corporation | Anisotropic high resistance ionic current source (AHRICS) |
US9449808B2 (en) | 2013-05-29 | 2016-09-20 | Novellus Systems, Inc. | Apparatus for advanced packaging applications |
JP1534136S (zh) | 2014-11-13 | 2015-09-28 | ||
JP1534137S (zh) | 2014-11-13 | 2015-09-28 | ||
JP1534138S (zh) * | 2014-11-13 | 2015-09-28 | ||
USD809804S1 (en) * | 2014-12-17 | 2018-02-13 | Ngk Insulators, Ltd. | Composite substrate for acoustic wave device |
TWD174921S (zh) | 2014-12-17 | 2016-04-11 | 日本碍子股份有限公司 | 複合基板之部分 |
US9816194B2 (en) | 2015-03-19 | 2017-11-14 | Lam Research Corporation | Control of electrolyte flow dynamics for uniform electroplating |
USD793972S1 (en) | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 31-pocket configuration |
USD793971S1 (en) | 2015-03-27 | 2017-08-08 | Veeco Instruments Inc. | Wafer carrier with a 14-pocket configuration |
USD778247S1 (en) | 2015-04-16 | 2017-02-07 | Veeco Instruments Inc. | Wafer carrier with a multi-pocket configuration |
US10014170B2 (en) | 2015-05-14 | 2018-07-03 | Lam Research Corporation | Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity |
USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
US10364505B2 (en) | 2016-05-24 | 2019-07-30 | Lam Research Corporation | Dynamic modulation of cross flow manifold during elecroplating |
US11001934B2 (en) | 2017-08-21 | 2021-05-11 | Lam Research Corporation | Methods and apparatus for flow isolation and focusing during electroplating |
US10781527B2 (en) | 2017-09-18 | 2020-09-22 | Lam Research Corporation | Methods and apparatus for controlling delivery of cross flowing and impinging electrolyte during electroplating |
USD1054388S1 (en) * | 2021-10-15 | 2024-12-17 | Shin-Etsu Chemical Co., Ltd. | Carrier substrate for handling |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1427772A1 (de) * | 1965-11-23 | 1968-12-12 | Telefunken Patent | Verfahren zum Zerlegen einer Halbleiterscheibe in einzelne Halbleiterplaettchen |
US5663654A (en) * | 1990-08-29 | 1997-09-02 | Micron Technology, Inc. | Universal wafer carrier for wafer level die burn-in |
EP0707214A3 (en) * | 1994-10-14 | 1997-04-16 | Hughes Aircraft Co | Multiport membrane probe to test complete semiconductor plates |
US5894161A (en) * | 1997-02-24 | 1999-04-13 | Micron Technology, Inc. | Interconnect with pressure sensing mechanism for testing semiconductor wafers |
US6483043B1 (en) * | 2000-05-19 | 2002-11-19 | Eaglestone Partners I, Llc | Chip assembly with integrated power distribution between a wafer interposer and an integrated circuit chip |
US6541989B1 (en) * | 2000-09-29 | 2003-04-01 | Motorola, Inc. | Testing device for semiconductor components and a method of using the device |
US7204887B2 (en) * | 2000-10-16 | 2007-04-17 | Nippon Steel Corporation | Wafer holding, wafer support member, wafer boat and heat treatment furnace |
US6448805B1 (en) * | 2001-02-12 | 2002-09-10 | Novalux, Inc. | Method and apparatus for wafer-level testing of semiconductor lasers |
US20020121915A1 (en) * | 2001-03-05 | 2002-09-05 | Agere Systems Guardian Corp. | Automated pattern clustering detection for wafer probe maps |
KR20040094390A (ko) * | 2002-04-11 | 2004-11-09 | 세키스이가가쿠 고교가부시키가이샤 | 반도체 칩의 제조 방법 |
US6710611B2 (en) * | 2002-04-19 | 2004-03-23 | Ceramic Component Technologies, Inc. | Test plate for ceramic surface mount devices and other electronic components |
US7015418B2 (en) * | 2002-05-17 | 2006-03-21 | Gsi Group Corporation | Method and system for calibrating a laser processing system and laser marking system utilizing same |
SG111069A1 (en) * | 2002-06-18 | 2005-05-30 | Micron Technology Inc | Semiconductor devices including peripherally located bond pads, assemblies, packages, and methods |
JP2004207606A (ja) * | 2002-12-26 | 2004-07-22 | Disco Abrasive Syst Ltd | ウェーハサポートプレート |
-
2006
- 2006-03-08 TW TW095301182F patent/TWD115746S1/zh unknown
- 2006-03-08 US US29/255,496 patent/USD544452S1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
USD544452S1 (en) | 2007-06-12 |
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