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TW330988B - The photomask structure of semiconductor lithography processes - Google Patents

The photomask structure of semiconductor lithography processes

Info

Publication number
TW330988B
TW330988B TW086104551A TW86104551A TW330988B TW 330988 B TW330988 B TW 330988B TW 086104551 A TW086104551 A TW 086104551A TW 86104551 A TW86104551 A TW 86104551A TW 330988 B TW330988 B TW 330988B
Authority
TW
Taiwan
Prior art keywords
photomask
lithography processes
semiconductor lithography
photomask structure
pattern
Prior art date
Application number
TW086104551A
Other languages
English (en)
Inventor
Ming-Juh Jin
Shyh-Shyong Chen
Ying-Cherng Jaw
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Priority to TW086104551A priority Critical patent/TW330988B/zh
Application granted granted Critical
Publication of TW330988B publication Critical patent/TW330988B/zh

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
TW086104551A 1997-04-09 1997-04-09 The photomask structure of semiconductor lithography processes TW330988B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW086104551A TW330988B (en) 1997-04-09 1997-04-09 The photomask structure of semiconductor lithography processes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW086104551A TW330988B (en) 1997-04-09 1997-04-09 The photomask structure of semiconductor lithography processes

Publications (1)

Publication Number Publication Date
TW330988B true TW330988B (en) 1998-05-01

Family

ID=58262657

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086104551A TW330988B (en) 1997-04-09 1997-04-09 The photomask structure of semiconductor lithography processes

Country Status (1)

Country Link
TW (1) TW330988B (zh)

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees