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JPS53139982A - Exposure apparatus of semiconductor substrates - Google Patents

Exposure apparatus of semiconductor substrates

Info

Publication number
JPS53139982A
JPS53139982A JP5443377A JP5443377A JPS53139982A JP S53139982 A JPS53139982 A JP S53139982A JP 5443377 A JP5443377 A JP 5443377A JP 5443377 A JP5443377 A JP 5443377A JP S53139982 A JPS53139982 A JP S53139982A
Authority
JP
Japan
Prior art keywords
mask
frame member
exposure apparatus
semiconductor substrates
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5443377A
Other languages
Japanese (ja)
Inventor
Keiichi Shibata
Kosuke Sumitomo
Kazuo Niwa
Akinari Mutsuyama
Keisuke Wakabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5443377A priority Critical patent/JPS53139982A/en
Publication of JPS53139982A publication Critical patent/JPS53139982A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To improve the contact state between mask and wafer and obtain fine patterns by providing a first frame member and a second frame member which hold the mask therebetween in its thickness direction at their circumferential edge part and a pattern original plate holding part which extends to the central part and supports the mask in convex form on the wafer side to the first frame member.
COPYRIGHT: (C)1978,JPO&Japio
JP5443377A 1977-05-13 1977-05-13 Exposure apparatus of semiconductor substrates Pending JPS53139982A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5443377A JPS53139982A (en) 1977-05-13 1977-05-13 Exposure apparatus of semiconductor substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5443377A JPS53139982A (en) 1977-05-13 1977-05-13 Exposure apparatus of semiconductor substrates

Publications (1)

Publication Number Publication Date
JPS53139982A true JPS53139982A (en) 1978-12-06

Family

ID=12970573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5443377A Pending JPS53139982A (en) 1977-05-13 1977-05-13 Exposure apparatus of semiconductor substrates

Country Status (1)

Country Link
JP (1) JPS53139982A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014017458A1 (en) * 2012-07-26 2014-01-30 富士フイルム株式会社 Mask unit and exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014017458A1 (en) * 2012-07-26 2014-01-30 富士フイルム株式会社 Mask unit and exposure device

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