[go: up one dir, main page]

TW327479U - Vacuum processing apparatus - Google Patents

Vacuum processing apparatus

Info

Publication number
TW327479U
TW327479U TW085212876U TW85212876U TW327479U TW 327479 U TW327479 U TW 327479U TW 085212876 U TW085212876 U TW 085212876U TW 85212876 U TW85212876 U TW 85212876U TW 327479 U TW327479 U TW 327479U
Authority
TW
Taiwan
Prior art keywords
processing apparatus
vacuum processing
vacuum
processing
Prior art date
Application number
TW085212876U
Other languages
Chinese (zh)
Inventor
Masao Kubodera
Toshiyuki Kawaji
Masaki Narishima
Original Assignee
Tokyo Electron Co Ltd
Tel Varian Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP30312992A external-priority patent/JP2997717B2/en
Priority claimed from JP12521993A external-priority patent/JP3172331B2/en
Priority claimed from JP12521893A external-priority patent/JP3151582B2/en
Application filed by Tokyo Electron Co Ltd, Tel Varian Kk filed Critical Tokyo Electron Co Ltd
Publication of TW327479U publication Critical patent/TW327479U/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW085212876U 1992-10-15 1993-11-02 Vacuum processing apparatus TW327479U (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP30312992A JP2997717B2 (en) 1992-10-15 1992-10-15 Vacuum processing equipment
JP12521993A JP3172331B2 (en) 1993-04-28 1993-04-28 Vacuum processing equipment
JP12521893A JP3151582B2 (en) 1993-04-28 1993-04-28 Vacuum processing equipment

Publications (1)

Publication Number Publication Date
TW327479U true TW327479U (en) 1998-02-21

Family

ID=27315071

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085212876U TW327479U (en) 1992-10-15 1993-11-02 Vacuum processing apparatus

Country Status (2)

Country Link
KR (1) KR100242534B1 (en)
TW (1) TW327479U (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100449273B1 (en) * 1997-08-26 2004-11-26 삼성전자주식회사 an apparatus and a method for semiconductor production
KR19990027324A (en) 1997-09-29 1999-04-15 윤종용 Multi-chamber system with wafer recognition system and wafer processing method using the same
JP3297416B2 (en) * 2000-02-28 2002-07-02 株式会社半導体先端テクノロジーズ Resist ashing apparatus and wafer heating method
KR100440624B1 (en) * 2000-03-29 2004-07-15 주식회사 임젠 Method for Producing the Calciumlactate from Diluted Molasses or Vegetables-and Fruits-Wastes
KR20010044329A (en) * 2001-02-07 2001-06-05 김혜자 Preparation method of fermented liquid base and functional foods
US6852644B2 (en) * 2002-11-25 2005-02-08 The Boc Group, Inc. Atmospheric robot handling equipment
KR100625337B1 (en) * 2004-12-28 2006-09-20 동부일렉트로닉스 주식회사 Semiconductor manufacturing equipment and semiconductor manufacturing method using the same
KR100776283B1 (en) * 2006-07-04 2007-11-13 세메스 주식회사 Stripping Process Equipment and Method

Also Published As

Publication number Publication date
KR100242534B1 (en) 2000-02-01
KR940010265A (en) 1994-05-24

Similar Documents

Publication Publication Date Title
GB2266609B (en) Parallel processing apparatus
GB2244371B (en) Plasma processing apparatus
SG76507A1 (en) Continuous vacuum processing apparatus
GB2269081B (en) Image processing apparatus
GB2273844B (en) Image processing apparatus
EP0553762A3 (en) Image processing apparatus
EP0470580A3 (en) Plasma processing apparatus
TW327479U (en) Vacuum processing apparatus
KR960009143B1 (en) Signal processing apparatus
EP0594106A3 (en) Signal processing apparatus
EP0590838A3 (en) Sound processing apparatus
GB9305061D0 (en) Vacuum apparatus
GB2264022B (en) Image processing apparatus
EP0596644A3 (en) Image processing apparatus
EP0414090A3 (en) Processing apparatus
GB2244721B (en) Plasma processing apparatus
HU9201811D0 (en) Processing technique
EP0551823A3 (en) Image processing apparatus
EP0458366A3 (en) Seringe processing apparatus
GB2269810B (en) Food processing apparatus
GB2264122B (en) Pulp processing apparatus
GB9215671D0 (en) Food processing apparatus
GB9226175D0 (en) Processing unit
GB2269369B (en) Material processing apparatus
EP0530619A3 (en) Processing apparatus