TW202306651A - Substrate conveying device, coating processing device, and substrate conveying method - Google Patents

Abstract

This substrate conveying device is provided with a pair of guide rails, a pair of movement units, a plurality of main holding units, and auxiliary holding units. The pair of guide rails extend in a substrate conveying direction. The pair of movement units move respectively along the pair of guide rails. The plurality of main holding units are each provided on the pair of movement units, to hold the substrate from below the substrate. Each auxiliary holding unit is provided between the main holding units that are adjacent to one another on each movement unit, to hold the substrate from below the substrate. Each of the plurality of main holding units includes a first suction attachment unit for suction-attaching the substrate, and an adjusting unit for adjusting the position of the first suction attachment unit. Each auxiliary holding unit includes a second suction attachment unit for suction-attaching the substrate, and a tracking unit for adjusting the position of the second suction attachment unit by tracking the movement of the substrate based on the adjustments of the positions of the first suction attachment units.

Description

Substrate transfer device, coating processing device, and substrate transfer method

The present disclosure relates to a substrate transfer device, a coating processing device, and a substrate transfer method.

Patent Document 1 discloses that a substrate is conveyed along two guide rails extending in a substrate conveyance direction, and droplets of a functional liquid are discharged onto the substrate. [Prior Art Literature] [Patent Document]

[Patent Document 1] Japanese Patent Laid-Open No. 2018-126718

[Problems to be Solved by the Invention]

The present disclosure provides a technique for reducing errors in substrate transfer. [Means to solve the problem]

A substrate transfer device according to an aspect of the present disclosure includes: a pair of guide rails; a pair of moving parts; a plurality of main holding parts; and auxiliary holding parts. A pair of guide rails extend along the conveying direction of the substrate. The pair of moving parts move respectively along the pair of guide rails. A plurality of main holding parts are respectively provided on a pair of moving parts, and hold the substrate from below the substrate. The sub-holding part is provided between the main holding parts adjacent to each moving part, and holds the substrate from below the substrate. The plurality of main holding parts are provided with: a first suction part for holding the substrate by suction; and an adjustment part for adjusting the position of the first suction part. The sub-holding unit includes: a second suction unit for suction-holding the substrate; and a follow-up unit for adjusting the position of the second suction unit following the movement of the substrate based on the adjustment of the position of the first suction unit. [Effect of Invention]

According to the present disclosure, errors in substrate transfer can be reduced.

Hereinafter, embodiments of the substrate transfer device, coating processing device, and substrate transfer method disclosed in the present application will be described in detail with reference to the attached drawings. In addition, the disclosed substrate transfer device, coating processing device, and substrate transfer method are not limited by the embodiments described below.

In each of the drawings referred to below, for the sake of easy understanding of the description, the orthogonality of "regulating the mutually orthogonal X-axis direction, Y-axis direction, and Z-axis direction, and setting the positive direction of the Z-axis as the vertical upward direction" is shown. coordinate system.

Here, the front-rear direction is defined and the left-right direction is defined. In the front-rear direction, the positive direction of the Y-axis is defined as the front, and the negative direction of the Y-axis is defined as the rear. In the left-right direction, the positive direction of the X-axis is defined as the right. Set the negative direction of the X axis to the left. In addition, the up-down direction is defined, and in the up-down direction, the positive direction of the Z-axis is defined as upward, and the negative direction of the Z-axis is defined as downward. The substrate processing apparatus 1 processes the substrate S while transporting the substrate S in the front-rear direction from the rear to the front. That is, the substrate processing apparatus 1 processes the substrate S while conveying the substrate S along the conveyance direction (Y-axis direction).

＜Overall composition＞ Referring to FIG. 1, the overall configuration of a substrate processing apparatus 1 according to the embodiment will be described. FIG. 1 is a schematic plan view showing part of a substrate processing apparatus 1 according to an embodiment. The substrate processing apparatus 1 draws on the substrate S by an inkjet method while conveying the substrate S which is a workpiece in the horizontal direction. The substrate S is, for example, a substrate used for a flat panel display.

The substrate processing apparatus 1 is provided with: a floating platform 2; a first guide rail 3_1; and a second guide rail 3_2. Moreover, the substrate processing apparatus 1 is provided with: the 1st moving part 4_1; and the 2nd moving part 4_2. Also, the substrate processing apparatus 1 is provided with: a first main holding unit 5_1; a second main holding unit 5_2; a third main holding unit 5_3; a fourth main holding unit 5_4; a first auxiliary holding unit 6_1; Holding part 6_2. In addition, the substrate processing apparatus 1 includes: a plurality of coating units 7 ; a maintenance unit 8 ; and a control device 9 .

In addition, below, the 1st guide rail 3_1 and the 2nd guide rail 3_2 may be collectively described as "the guide rail 3." Moreover, the 1st moving part 4_1 and the 2nd moving part 4_2 may be collectively described as "moving part 4." In addition, the first main holding part 5_1 to the fourth main holding part 5_4 may be collectively described as "main holding part 5". In addition, the first sub-holding portion 6_1 and the second sub-holding portion 6_2 may be collectively referred to as “sub-holding portion 6 ”.

The floating platform 2 has a plurality of ejection ports (not shown). The floating platform 2 blows compressed gas (such as air) toward the lower surface of the substrate S from the ejection port, and applies a force (hereinafter referred to as "uplifting force") acting upward to the substrate S. The floating platform 2 adjusts the floating height of the substrate S held by the main holding part 5 and the sub holding part 6 so as to impart buoyancy force. That is, the floating platform 2 blows gas from below to the substrate S held by the main holding part 5 and the sub-holding part 6 to adjust the floating height of the substrate S.

The floating platform 2 includes a loading platform for loading the substrate S and an unloading platform for unloading the substrate S. The carry-in platform is provided on the rear side of the substrate processing apparatus 1 . The carry-out platform is provided on the front side of the substrate processing apparatus 1 .

In addition, a plurality of floating platforms 2 may be installed along the conveyance direction (Y-axis direction). The range of the floating height of the substrate S on the floating platform 2 below the coating part 7 is narrower than the range of the floating height of the substrates S on the other floating platforms 2 . For example, the range of the floating height of the substrate S on the floating platform 2 below the coating part 7 is 30-60 μm. The range of the floating height of the substrate S on the other floating platform 2 is 200-2000 μm.

For example, in the floating platform 2 located below the coating part 7, it can also be adjusted by "spouting compressed air toward the bottom of the substrate S, and sucking the air between the substrate S and the floating platform 2". The floating height of the substrate S.

The 1st guide rail 3_1 and the 2nd guide rail 3_2 are arranged in the left-right direction (X-axis direction), and extend along a conveyance direction (Y-axis direction).

The 1st guide rail 3_1 and the 2nd guide rail 3_2 are arrange|positioned so that the floating platform 2 may be sandwiched in the left-right direction (X-axis direction). The first guide rail 3_1 is arranged on the X-axis positive direction side of the floating platform 2 , and the second guide rail 3_2 is arranged on the X-axis negative direction side of the floating platform 2 . The 1st guide rail 3_1 and the 2nd guide rail 3_2 are comprised by granite, for example. The cross section of the guide rail 3 perpendicular to the conveying direction (Y-axis direction) is, for example, rectangular.

The 1st moving part 4_1 is installed on the 1st guide rail 3_1, and moves along the 1st guide rail 3_1. The 2nd moving part 4_2 is installed on the 2nd guide rail 3_2, and moves along the 2nd guide rail 3_2. In addition, the 1st moving part 4_1 and the 2nd moving part 4_2 each have a drive part, such as a motor, and can move independently.

The plurality of main holding parts 5 are provided on the first moving part 4_1 and the second moving part 4_2 respectively, and hold the substrate S from below the substrate S. As shown in FIG.

Specifically, the first main holding part 5_1 and the second main holding part 5_2 among the plurality of main holding parts 5 are arranged on the first moving part 4_1, and the third main holding part 5_3 and the fourth main holding part 5_4 , is set on the second moving part 4_2. The first main holding part 5_1 and the second main holding part 5_2 are arranged in the order of the first main holding part 5_1 and the second main holding part 5_2 along the conveyance direction (Y-axis direction) on the first moving part 4_1. Moreover, the 3rd main holding part 5_3 and the 4th main holding part 5_4 are on the 2nd moving part 4_2, along the conveyance direction (Y-axis direction) in the order of the 3rd main holding part 5_3 and the 4th main holding part 5_4 arrangement. In addition, the number of the plurality of main holding parts 5 is not limited to four.

The sub-holding unit 6 is provided between the adjacent main holding units 5 on the moving units 4 , and holds the substrate S from below the substrate S. As shown in FIG.

Specifically, the first sub-holding part 6_1 is provided between the first main holding part 5_1 and the second main holding part 5_2 adjacent on the first moving part 4_1. In addition, the second sub-holding part 6_2 is provided between the third main holding part 5_3 and the fourth main holding part 5_4 adjacent on the second moving part 4_2. In addition, the number of the plurality of auxiliary holding parts 6 is not limited to two.

In the embodiment, a plurality of (here, four) main holding portions 5 hold the four corners of the substrate S from below the substrate S. As shown in FIG. Also, a plurality of (here, two) sub-holding portions 6 hold the side edges of the substrate S that are not held by the main holding portion 5 from below the substrate S. As shown in FIG. The substrate S is in a state where the four corners are held by a plurality of main holders 5 and the side edges are held by a plurality of auxiliary holders 6 and floated by the floating platform 2 , moved by the first moving part 4_1 and the second moving part 4_1 and the second moving part 4_1. Section 4_2 is conveyed along the conveying direction (Y-axis positive direction).

In this way, in the substrate processing apparatus 1, during the conveyance of the substrate S, the side edge of the substrate S that is not held by the main holder 5 is held by the sub-holding portion 6, whereby the substrate being conveyed can be suppressed. The deflection of S.

The coating unit 7 is for coating the functional liquid on the substrate S being transported along the transport direction (Y-axis positive direction). Functional fluid, ink. The coating unit 7 is for coating the functional liquid on the substrate S whose floating height has been adjusted by the floating platform 2 . Specifically, the application unit 7 applies the functional liquid to the substrate S by discharging the functional liquid onto the substrate S. A plurality of application parts 7 are arranged along the left-right direction (X-axis direction). In the example shown in FIG. 1 , although seven application parts 7 are arranged along the left-right direction (X-axis direction), the number of application parts 7 is not limited to this. The application unit 7 has a plurality of heads for discharging the functional liquid, and discharges the functional liquid onto the substrate S from each head.

The applicator 7 is movable along a pair of rails 10 arranged in the Y-axis direction and extending in the X-axis direction. The pair of rails 10 is, for example, provided to extend rightward with respect to the floating platform 2 . Between a pair of rails 10 on the right side of the floating platform 2, a maintenance unit 8 is arranged. The coating unit 7 is movable between a position above the maintenance unit 8 and a position where the functional liquid is discharged onto the substrate S. As shown in FIG. The coating unit 7 moves in the left-right direction along a pair of rails 10 by a driving device such as a linear motor. The plurality of application parts 7 can also independently move in the left-right direction, and can also move in the left-right direction integrally.

The maintenance part 8 performs maintenance of the head part of the coating part 7, and removes or prevents the discharge failure of the head part of the coating part 7, etc. In addition, the maintenance part 8 can also be arranged above the floating platform 2 .

The control device 9 is, for example, a computer, and includes a control unit 91 and a memory unit 92 . The memory unit 92 stores programs for controlling various processes executed in the substrate processing apparatus 1 . The control unit 91 controls the operation of the substrate processing apparatus 1 by reading and executing the program stored in the memory unit 92 .

In addition, the program is recorded on a computer-readable storage medium, and may be installed in the memory unit 92 of the control device 9 from the storage medium. Examples of computer-readable storage media include hard disks (HD), floppy disks (FD), optical disks (CD), magneto-optical disks (MO), and memory cards.

＜Main holding part＞ Next, referring to FIG. 2 and FIG. 3 , the configuration of the main holding unit 5 will be described. Fig. 2 is a schematic plan view of the main holding portion 5 of the embodiment. 3 is a schematic side view of the main holding portion 5 of the embodiment. In addition, in FIG. 2 and FIG. 3, although the 1st main holding part 5_1 is shown as an example, the structure of the 2nd main holding part 5_2 - the 4th main holding part 5_4 is also the same as the 1st main holding part 5_1.

As shown in FIGS. 2 and 3 , the main holding portion 5 includes: a base portion 50 ; a first adjustment portion 51 ; a second adjustment portion 52 ; a rotation portion 53 ; an arm portion 54 ;

The first suction unit 55 suction-holds the substrate S. As shown in FIG. Specifically, the first suction unit 55 includes a plurality of suction disks 551 . The plurality of suction pads 551 are arranged in a row in the horizontal direction (here, the Y-axis direction). In addition, although the example in which the 1st adsorption|suction part 55 was equipped with the three adsorption pads 551 was shown here, the number of adsorption pads 551 is not limited to three. The first suction unit 55 sucks the lower surface of the substrate S and holds the substrate S by a plurality of suction pads 551 .

The base part 50 , the first adjustment part 51 , the second adjustment part 52 , the rotation part 53 and the arm part 54 are examples of adjustment parts for adjusting the relative position of the first suction part 55 with respect to the moving part 4 .

The base part 50 is fixed on the moving part 4 . The first adjustment part 51 is provided on the base part 50 and is movable in the left-right direction (X-axis direction) on the base part 50 . The second adjustment part 52 is provided on the first adjustment part 51 and is movable in the front-rear direction (Y-axis direction) on the first adjustment part 51 . The rotating part 53 is provided on the second adjusting part 52 and is rotatable around a vertical axis (Z axis). The arm part 54 is a member extending in the horizontal direction, is supported by the rotation part 53 at the base end part, and supports the first adsorption part 55 at the front end part.

In this way, the adjustment unit moves the first adjustment unit 51 in the left-right direction (X-axis direction), thereby moving the first suction unit 55 in the left-right direction (X-axis direction). That is, the first adjustment unit 51 can adjust the position of the first adsorption unit 55 relative to the moving unit 4 along the left-right direction (X-axis direction).

In addition, the adjustment unit can move the first suction unit 55 in the front-rear direction (Y-axis direction) by moving the second adjustment unit 52 in the front-rear direction (Y-axis direction). That is, the second adjustment unit 52 can adjust the position of the first adsorption unit 55 relative to the moving unit 4 along the front-rear direction (Y-axis direction).

In addition, the adjusting part can rotate the first suction part 55 supported by the rotating part 53 via the arm part 54 around the vertical axis (Z axis) by "rotating the rotating part 53 around the vertical axis (Z axis)". . That is, the rotating part 53 is an example of the third adjustment part, and can adjust the position of the first adsorption part 55 relative to the moving part 4 along the circumferential direction centered on the vertical axis (Z-axis direction).

Moreover, the 1st adjustment part 51 and the 2nd adjustment part 52 each have a drive part, such as a motor, and can move independently. On the other hand, the rotating part 53 is, for example, a bearing without a driving part, and rotates the first adsorption part 55 so as to follow the movement of the first adjusting part 51 and the second adjusting part 52 . In addition, it is not limited to this, and a drive unit may be provided on the rotation unit 53 .

However, the pair of guide rails 3 extends along the front-back direction (Y-axis direction) which is the conveyance direction of the substrate S. As shown in FIG. As an example, the length of the pair of guide rails 3 in the front-back direction (Y-axis direction) is about 3 to 7 m. In this way, since the pair of guide rails 3 are long, it may be difficult to form them completely straight, and there may be a possibility of deformation of, for example, about several μm in the left-right direction (X-axis direction). Similarly, the pair of guide rails 3 may be deformed by several μm in the vertical direction (Z-axis direction). Also, even if it is assumed that the pair of guide rails 3 can be formed straight, there is a possibility of subsequent deformation due to environmental changes (for example, temperature changes).

In this way, when the pair of guide rails 3 is deformed, the distance between two adjacent main holding parts 5 among the plurality (here, four) of the main holding parts 5 changes. That is, the relative positions of the plurality of main holders 5 change. In other words, the relative positions of the plurality of first adsorption parts 55 change. When the relative positions of the plurality of first adsorption parts 55 change, the positional relationship between the first adsorption parts 55 and the substrate S changes. Thereby, since the 1st adsorption|suction part 55 deviates with respect to the board|substrate S, it becomes difficult to convey the board|substrate S with high precision. In particular, as in the substrate processing apparatus 1 of the embodiment, when the first moving part 4_1 and the second moving part 4_2 are not integrated but independent, the relative positions of the plurality of main holding parts 5 are easily affected by the position of the guide rails 3. deformed and shifted.

Therefore, in the substrate processing apparatus 1, while the substrate S is being conveyed, the distance between two adjacent main holding parts 5 among the plurality of main holding parts 5 becomes a preset distance, and each The first adjustment part 51 and the second adjustment part 52 of the main holding part 5 adjust the position of the first suction part 55 relative to the moving part 4 .

＜Auxiliary Holder＞ Next, referring to FIG. 4 and FIG. 5 , the configuration of the sub-holding portion 6 will be described. Fig. 4 is a schematic plan view of the sub-holding portion 6 of the embodiment. In addition, FIG. 5 is a schematic side view of the sub-holding portion 6 of the embodiment. In addition, in FIG. 4 and FIG. 5, although the 1st sub-holding part 6_1 is shown as an example, the structure of the 2nd sub-holding part 6_2 is also the same as that of the 1st sub-holding part 6_1.

As shown in FIGS. 4 and 5 , the auxiliary holding portion 6 includes: a pair of base portions 61 ; an arm portion 62 ; and a second adsorption portion 63 .

The second suction unit 63 suction-holds the substrate S. As shown in FIG. Specifically, the second suction unit 63 includes a plurality of suction disks 631 . The plurality of suction disks 631 are arranged in a row in the horizontal direction (here, the Y-axis direction). In addition, although the example in which the 2nd adsorption|suction part 63 was equipped with the three adsorption pads 631 was shown here, the number of adsorption pads 631 is not limited to three. The second suction unit 63 sucks the lower surface of the substrate S and holds the substrate S by a plurality of suction pads 631 .

The length of the second suction part 63 along the front-back direction (Y-axis direction) which is the conveyance direction of the substrate S is longer than that of the first suction part 55 . In addition, the length along the front-back direction (Y-axis direction) of the second suction portion 63 may be the same as the length along the front-back direction (Y-axis direction) of the first suction portion 55 , and may be longer than the length along the first suction portion 55 . The length of the adsorption|suction part 55 in the front-back direction (Y-axis direction) is short.

The pair of base part 61 and arm part 62 is an example of a follower part that adjusts the relative position of the second suction part 63 with respect to the moving part 4 following the movement of the substrate S based on the position adjustment of the first suction part 55 .

A pair of base parts 61 are fixed on the moving part 4 . The arm portion 62 is a substantially T-shaped member extending in the horizontal direction, and a pair of base ends are respectively horizontally movable and rotatably supported in a pair of base portions 61 via balls 61a, and a second end is supported at a front end. Adsorption part 63.

The following part can make the second arm part 62 supported by the arm part 62 move in the left-right direction (X-axis direction) by following the movement of the substrate S along the left-right direction (X-axis direction). 2. The suction unit 63 moves in the left-right direction (X-axis direction). That is, the arm portion 62 can follow the movement of the substrate S along the left-right direction (X-axis direction) based on the adjustment of the position of the first suction portion 55, and adjust the second suction portion in the left-right direction (X-axis direction). 63 relative to the position of the moving part 4.

Also, the following part can be supported by the arm part 62 in such a way that "following the movement of the substrate S along the front-back direction (Y-axis direction), the arm part 62 moves in the front-back direction (Y-axis direction)". The second suction part 63 moves in the front-rear direction (Y-axis direction). That is, the arm part 62 can follow the movement of the substrate S along the front-back direction (Y-axis direction) based on the adjustment of the position of the first suction part 55, and adjust the second suction part in the front-back direction (Y-axis direction). 63 relative to the position of the moving part 4.

In addition, the following part can be supported by the method of "following the movement of the substrate S along the circumferential direction centered on the vertical axis (Z axis), and the arm part 62 rotates around the vertical axis (Z axis)". The second suction portion 63 of the arm portion 62 rotates around a vertical axis (Z axis). That is, the arm portion 62 can follow the movement of the substrate S along the circumferential direction centered on the vertical axis (Z axis) based on the adjustment of the position of the first suction portion 55, and the vertical axis (Z axis) as the The position of the second suction part 63 relative to the moving part 4 is adjusted in the circumferential direction of the center.

However, in the substrate processing apparatus 1, during the conveyance of the substrate S, the side edge of the substrate S not held by the main holder 5 is held by the sub-holding portion 6, thereby suppressing the deflection of the substrate S being conveyed. song. In addition, in the substrate processing apparatus 1 , the position of the first suction unit 55 relative to the moving unit 4 is adjusted by the first adjustment unit 51 and the second adjustment unit 52 of each main holding unit 5 .

In this way, the substrate S moves by adjusting the position of the first suction unit 55 relative to the moving unit 4 . When the substrate S moves, the positional relationship between the second suction portion 63 of the auxiliary holding portion 6 and the substrate S changes. Thereby, since the board|substrate S deviates with respect to the 2nd adsorption|suction part 63, it becomes difficult to convey the board|substrate S with high precision.

Therefore, in the substrate processing apparatus 1 of the embodiment, while the substrate S is being conveyed, the arm portion 62 of the sub-holding portion 6 follows the movement of the substrate S based on the adjustment of the position of the first suction portion 55 to adjust the second suction portion 55 . 2 The position of the suction unit 63 relative to the moving unit 4. Thereby, while suppressing the deflection of the conveyed board|substrate S, the positional displacement of the board|substrate S with respect to the 2nd adsorption|suction part 63 can be suppressed. That is, even when the position of the first suction unit 55 relative to the moving unit 4 is adjusted while the substrate S is being transferred, the positional relationship between the second suction unit 63 and the substrate S can be appropriately maintained.

<Processing flow of substrate processing equipment> Next, referring to FIG. 6 , the procedure of processing performed by the substrate processing apparatus 1 of the embodiment will be described. FIG. 6 is a flow chart showing a procedure of processing executed by the substrate processing apparatus 1 according to the embodiment. Each processing shown in FIG. 6 is executed under the control of the control device 9 .

The substrate processing apparatus 1 performs a holding process (step S101). The substrate processing apparatus 1 holds the substrate S conveyed to the floating table 2 by a plurality of main holding parts 5 and sub holding parts 6 . Specifically, in the substrate processing apparatus 1, the four corners of the substrate S are sucked by the first suction parts 55 of each main holding part 5 and the side edges of the substrate S are sucked by the second suction parts 63 of the sub-holding parts 6, thereby , holding the substrate S.

The substrate processing apparatus 1 performs a transfer process (step S102). The substrate processing apparatus 1 transports the substrate S along the transport direction by moving the pair of moving parts 4 along the pair of guide rails 3 .

The substrate processing apparatus 1 performs an adjustment process (step S103). The substrate processing apparatus 1 adjusts the position of the first suction unit 55 relative to the moving unit 4 by the first adjustment unit 51 and the second adjustment unit 52 of each main holding unit 5 while the substrate S is being transferred. At this time, the substrate processing apparatus 1 adjusts the position of the second suction part 63 by following the movement of the substrate S based on the adjustment of the position of the first suction part 55 by the arm part 62 of the sub-holding part 6 .

The substrate processing apparatus 1 performs a coating process (step S104). The substrate processing apparatus 1 discharges the functional liquid from the coating unit 7 onto the substrate S conveyed along the conveying direction, and applies the functional liquid to the substrate S. The substrate S coated with the functional liquid is carried out from the floating platform 2 .

＜Modifications＞ The structure of the substrate processing apparatus is not limited to the structure shown in the embodiment. Therefore, below, referring to FIGS. 7 to 9 , the configuration of a substrate processing apparatus according to a modified example of the embodiment will be described. FIG. 7 is a schematic plan view showing part of a substrate processing apparatus 1A according to a modified example. In addition, FIG. 8 is a schematic plan view of a sub-holding portion 11 of a modified example. In addition, FIG. 9 is a schematic plan view of a sub-holding portion 11 of a modified example. In addition, in FIG. 8 and FIG. 9, although the 1st sub-holding part 11_1 is shown as an example, the structure of the 2nd sub-holding part 11_2 is also the same as that of the 1st sub-holding part 11_1.

As shown in FIG. 7 , a substrate processing apparatus 1A according to a modified example is provided with a first sub-holding unit 11_1 and a second sub-holding unit 11_2 instead of the first sub-holding unit 6_1 and the second sub-holding unit shown in FIG. 1 . 6_2. In addition, below, the 1st sub-holding part 11_1 and the 2nd sub-holding part 11_2 may be collectively described as "sub-holding part 11."

The sub-holding part 11 is provided between the adjacent main holding parts 5 on the respective moving parts 4, and holds the substrate S from below the substrate S. As shown in FIG.

Specifically, the first sub-holding part 11_1 is provided between the first main holding part 5_1 and the second main holding part 5_2 adjacent on the first moving part 4_1. Moreover, the second sub-holding part 11_2 is provided between the third main holding part 5_3 and the fourth main holding part 5_4 adjacent on the second moving part 4_2. In addition, the number of the plurality of auxiliary holding parts 11 is not limited to two.

As shown in FIGS. 8 and 9 , the sub-holding portion 11 includes: a base portion 110 ; a first following portion 111 ; a second following portion 112 ; a rotating portion 113 ; an arm portion 114 ; and a second adsorption portion 63A.

The second adsorption portion 63A has the same configuration as the second adsorption portion 63 shown in FIGS. 4 and 5 except for the thickness and the length along the front-rear direction (Y-axis direction). The length along the front-back direction (Y-axis direction) of the second suction portion 63A is the same as the length along the front-back direction (Y-axis direction) of the first suction portion 55 . In addition, the length along the front-back direction (Y-axis direction) of the second adsorption portion 63A may be longer than the length along the front-back direction (Y-axis direction) of the first adsorption portion 55 . The second suction unit 63A, similarly to the second suction unit 63 , holds the substrate S by suctioning the lower surface of the substrate S by a plurality of suction pads 551 .

The base part 110, the first following part 111, the second following part 112, the rotating part 113 and the arm part 114 follow the movement of the substrate S based on the adjustment of the position of the first suction part 55, and adjust the relative position of the second suction part 63. An example of the relative position follower of the moving part 4.

The base part 110 is fixed on the moving part 4 . The first tracking part 111 is provided on the base part 50 and is movable in the left-right direction (X-axis direction) on the base part 50 . The second tracking part 112 is provided on the first tracking part 111 and is movable on the first tracking part 111 in the front-rear direction (Y-axis direction). The rotating part 113 is provided on the second following part 112 and is rotatable around a vertical axis (Z axis). The arm part 114 is a member extending in the horizontal direction, is supported by the rotation part 113 at the base end part, and supports the second adsorption part 63A at the front end part.

The following part can make the second suction part 63A move in the left-right direction (X-axis direction) by following the movement of the substrate S along the left-right direction (X-axis direction), and the first follow-up part 111 moves along the left-right direction (X-axis direction). Move in the left-right direction (X-axis direction). That is, the first following part 111 can follow the movement of the substrate S along the left-right direction (X-axis direction) based on the adjustment of the position of the first suction part 55, and adjust the second position along the left-right direction (X-axis direction). The position of the adsorption unit 63A relative to the moving unit 4 .

In addition, the following unit can make the second suction unit 112 move along the front-rear direction (Y-axis direction) by following the movement of the substrate S along the front-back direction (Y-axis direction)”. The portion 63A moves in the front-rear direction (Y-axis direction). That is, the second following part 112 can follow the movement of the substrate S along the front-back direction (Y-axis direction) based on the adjustment of the position of the first suction part 55, and adjust the second position along the front-back direction (Y-axis direction). The position of the adsorption unit 63A relative to the moving unit 4 .

In addition, the following part can make the rotating part 113 rotate around the vertical axis (Z axis) by following the movement of the substrate S along the circumferential direction centered on the vertical axis (Z axis). 114 is rotated around the vertical axis (Z axis) by the second suction portion 63A supported by the rotation portion 113 . That is, the rotating part 113 is an example of the third following part, and can follow the movement of the substrate S along the front-back direction (Y-axis direction) based on the adjustment of the position of the first suction part 55, along the vertical axis (Z The position of the second suction part 63A relative to the moving part 4 is adjusted in the circumferential direction centered on the axial direction).

In addition, the first following part 111, the second following part 112 and the rotating part 113 are respectively connected with the first adjusting part 51, the second adjusting part 52 and the rotating part 53 of each main holding part 5 (referring to Fig. 2 and Fig. 3 ). Basically the same composition. However, each of the first following unit 111 and the second following unit 112 does not have a drive unit, and does not move independently of each other. In addition, the present invention is not limited thereto, and drive units may be provided in the first tracking unit 111 and the second tracking unit 112 respectively.

＜Effect＞ As mentioned above, the substrate transfer device (for example, substrate processing device 1, 1A) of the embodiment is equipped with: a pair of guide rails (for example, the first guide rail 3_1 and the second guide rail 3_2); moving part (for example, the first moving part 4_1 and the second moving part 4_2); a plurality of main holding parts (for example, the first main holding part 5_1 ~ the 4th main holding part 5_4); and auxiliary holding parts (for example, the first sub-holding parts 6_1, 11_1 and second sub-holding parts 6_2, 11_2). The pair of guide rails extend along the conveyance direction (for example, the Y-axis direction) of the substrate (for example, the substrate S). The pair of moving parts move respectively along the pair of guide rails. A plurality of main holding parts are respectively provided on a pair of moving parts, and hold the substrate from below the substrate. The sub-holding part is provided between the main holding parts adjacent to each moving part, and holds the substrate from below the substrate. A plurality of main holding parts are equipped with: a first adsorption part (for example, the first adsorption part 55), which absorbs and holds the substrate; and an adjustment part (for example, the first adjustment part 51 and the second adjustment part 52), which adjusts the first The position of the adsorption part. The auxiliary holding part is provided with: the 2nd suction part (for example, the 2nd suction part 63, 63A), suction holds the substrate; The rotation unit 113) adjusts the position of the second suction unit following the movement of the substrate based on the adjustment of the position of the first suction unit.

Thereby, even when the position of the first suction part is adjusted during the transfer of the substrate, it is possible to suppress the deflection of the substrate being carried and to suppress the displacement of the substrate relative to the second suction part. The positional relationship between the second suction part and the substrate is properly maintained. Therefore, according to the substrate transfer device of the embodiment, errors in substrate transfer can be reduced.

Also, since the substrate conveying device conveys the substrate while holding the side edge of the substrate by the sub-holding part, the interval between the side edge of the substrate and the coating part (for example, the coating part 7) can be kept constant. In the state, the functional liquid is discharged from the coating part to the substrate. Therefore, according to the substrate transfer device of the embodiment, it is possible to draw the substrate with high precision.

Moreover, the adjustment unit may also include: a first adjustment unit (for example, the first adjustment unit 51), which adjusts the position of the first suction unit along a direction (for example, the X-axis direction) perpendicular to the conveying direction; 2. The adjustment part (for example, the second adjustment part 52) adjusts the position of the first suction part along the conveyance direction; Adjust the position of the first suction part in the circumferential direction of the center. The following part (for example, the arm part 62) can also follow the movement of the substrate along the direction perpendicular to the conveying direction, the conveying direction and the circumferential direction centered on the vertical axis, and adjust the second suction part (for example, the second The position of the adsorption part 63). Thereby, the position of the second suction portion can be adjusted following the movement of the substrate along the direction perpendicular to the conveyance direction, the conveyance direction, and the circumferential direction centered on the vertical axis.

Moreover, the adjustment unit may also include: a first adjustment unit for adjusting the position of the first adsorption unit along a direction perpendicular to the transport direction; a second adjustment unit for adjusting the position of the first adsorption unit along the transport direction; And the third adjustment part adjusts the position of the first adsorption part along the circumferential direction centering on the vertical axis. The following section can also be equipped with: a first following section (for example, the first following section 111), which follows the movement of the substrate along a direction perpendicular to the conveying direction, and adjusts the second suction section (for example, the second suction section 111). 63A); the 2nd follow-up part (for example, the 2nd follow-up part 112), follows the movement of the substrate along the conveying direction, adjusts the position of the 2nd adsorption part; and the 3rd follow-up part (for example, the rotation part 113), The position of the second suction part is adjusted following the movement of the substrate in the circumferential direction centered on the vertical axis. Thereby, the position of the second suction portion can be adjusted following the movement of the substrate along the direction perpendicular to the conveyance direction, the conveyance direction, and the circumferential direction centered on the vertical axis.

Moreover, the length of the 2nd adsorption|suction part along a conveyance direction may be longer than the 1st adsorption|suction part. Thereby, even when the number of sub-holding parts provided between adjacent main holding parts is small, it is possible to suppress the deflection of the conveyed substrate and suppress the positional displacement of the substrate with respect to the second suction part. .

In the above embodiment, an example was described in which the substrate processing apparatus 1 is equipped with the coating unit 7 and the coating unit 7 draws the substrate S by inkjet, but the processing of the substrate S is not limited to this. For example, this disclosure can also be applied in the case of performing various processing such as "modifying the surface of the substrate S or removing a film on the surface by performing a treatment of irradiating the substrate S with light or a treatment of discharging a removal solution". Technology.

In addition, it should be considered that the embodiment disclosed this time is an illustration and not a limitation in any respect. In fact, the above-mentioned embodiments can be realized in various forms. In addition, the above-mentioned embodiments can also be omitted, substituted, and changed in various forms without departing from the scope of the appended claims and their meaning.

1,1A: Substrate processing device 2: Floating platform 3_1: The first guide rail 3_2: The second guide rail 4_1: The first mobile department 4_2: The second mobile department 5_1: The first main holding part 5_2: The second main holding part 5_3: The 3rd main holding part 5_4: The 4th main holding part 6_1, 11_1: 1st auxiliary holding part 6_2, 11_2: The 2nd auxiliary holding part 7: Coating department 9: Control device 50: Basal part 51: The first adjustment department 52: The 2nd adjustment department 53: Rotating part 54: arm 55: The first adsorption part 61,110: Basal part 62: arm 63,63A: The second adsorption part 91: Control Department 92: memory department 111: The first follow-up department 112: The second follow-up department 113: Rotating part 114: arm

[FIG. 1] FIG. 1 is a schematic plan view showing part of a substrate processing apparatus according to an embodiment. [FIG. 2] FIG. 2 is a schematic plan view of the main holding portion of the embodiment. [ Fig. 3 ] Fig. 3 is a schematic side view of the main holding portion of the embodiment. [FIG. 4] FIG. 4 is a schematic plan view of the sub-holding portion of the embodiment. [ Fig. 5 ] Fig. 5 is a schematic side view of the sub-holding portion of the embodiment. [FIG. 6] FIG. 6 is a flowchart showing the procedure of processing executed by the substrate processing apparatus according to the embodiment. [ Fig. 7] Fig. 7 is a schematic plan view showing part of a substrate processing apparatus according to a modified example. [ Fig. 8] Fig. 8 is a schematic plan view of a sub-holding portion of a modified example. [ Fig. 9] Fig. 9 is a schematic plan view of a sub-holding portion of a modified example.

1: Substrate processing device

2: Floating platform

3_1(3): The first guide rail

3_2(3): The second guide rail

4_1(4): 1st Mobile Division

4_2(4): The second mobile unit

5_1(5): The first main holding part

5_2(5): The second main holding part

5_3(5): The 3rd main holding part

5_4(5): The 4th main holding part

6_1(6): The 1st auxiliary holding part

6_2(6): The second holding part

7: Coating department

8:Maintenance Department

9: Control device

10: A pair of tracks

91: Control Department

92: memory department

S: Substrate

Claims (6)

A substrate conveying device is characterized in that it has: A pair of guide rails extending along the conveying direction of the substrate; A pair of moving parts respectively move along the aforementioned pair of guide rails; a plurality of main holding parts are respectively provided on the pair of moving parts, and hold the substrate from below the substrate; and The auxiliary holding part is provided between the main holding parts adjacent to each of the moving parts, and holds the substrate from below the substrate, The above-mentioned plurality of main holding parts are equipped with: the first adsorption unit adsorbs and holds the substrate; and The adjustment part adjusts the position of the aforementioned first adsorption part, The above-mentioned auxiliary holding part is equipped with: the second adsorption unit adsorbs and holds the substrate; and The following unit follows the movement of the substrate based on the adjustment of the position of the first suction unit, and adjusts the position of the second suction unit. The substrate transfer device according to claim 1, wherein, The aforementioned adjustment department is equipped with: The first adjustment unit adjusts the position of the first suction unit along a direction perpendicular to the conveying direction; a second adjustment unit that adjusts the position of the first suction unit along the conveying direction; and The third adjustment part adjusts the position of the first adsorption part along the circumferential direction centered on the vertical axis, The following unit adjusts the position of the second suction unit by following the movement of the substrate in a direction perpendicular to the transport direction, the transport direction, and a circumferential direction centered on the vertical axis. The substrate transfer device according to claim 1, wherein, The aforementioned adjustment department is equipped with: The first adjustment unit adjusts the position of the first suction unit along a direction perpendicular to the conveying direction; a second adjustment unit that adjusts the position of the first suction unit along the conveying direction; and The third adjustment part adjusts the position of the first adsorption part along the circumferential direction centered on the vertical axis, The aforementioned follow-up department includes: the first following unit follows the movement of the substrate along the direction perpendicular to the conveying direction, and adjusts the position of the second suction unit; the second following unit adjusts the position of the second suction unit by following the movement of the substrate along the conveying direction; and The third following unit follows the movement of the substrate along the circumferential direction centering on the vertical axis, and adjusts the position of the second suction unit. The substrate transfer device according to any one of claims 1 to 3, wherein, The second adsorption portion is longer in length along the conveyance direction than the first adsorption portion. A coating processing device is characterized in that it has: Such as the substrate transfer device in any one of the claims 1 to 4; and The coating unit applies a functional liquid to the substrate conveyed by the substrate conveying device. A substrate conveying method, which is a substrate conveying method in a substrate conveying device, the substrate conveying device is provided with: a pair of guide rails extending along the conveying direction of the substrate; a pair of moving parts extending along the pair of guide rails The rails move separately; a plurality of main holding parts are respectively provided on the aforementioned pair of moving parts, and hold the aforementioned substrate from below the aforementioned substrate; Between the parts, hold the above-mentioned substrate from below the above-mentioned substrate, and the above-mentioned plurality of main holding parts are equipped with: a first adsorption part, which absorbs and holds the above-mentioned substrate; A part comprising: a second suction part for holding the substrate by suction; and a follow-up part for following the movement of the substrate based on the adjustment of the position of the first suction part and adjusting the position of the second suction part. The substrate transfer method , whose features include: The process of "holding the above-mentioned substrate by the above-mentioned plurality of main holding parts and the above-mentioned auxiliary holding parts"; The process of "transporting the aforementioned substrate by moving the aforementioned pair of moving parts along the aforementioned pair of guide rails"; and "During the transfer of the substrate, the position of the first suction part is adjusted by the adjustment part, and the movement of the substrate based on the adjustment of the position of the first suction part is followed by the follow-up part to adjust the second suction part. The position of the adsorption part" project.

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