TW202045672A - Reinforcing film method for making device and reinforcing method - Google Patents
Reinforcing film method for making device and reinforcing method Download PDFInfo
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- TW202045672A TW202045672A TW109104300A TW109104300A TW202045672A TW 202045672 A TW202045672 A TW 202045672A TW 109104300 A TW109104300 A TW 109104300A TW 109104300 A TW109104300 A TW 109104300A TW 202045672 A TW202045672 A TW 202045672A
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- Prior art keywords
- adhesive layer
- adherend
- reinforcing film
- adhesive
- film
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- 230000003014 reinforcing effect Effects 0.000 title claims abstract description 104
- 238000000034 method Methods 0.000 title claims description 17
- 239000012790 adhesive layer Substances 0.000 claims abstract description 156
- 229920005601 base polymer Polymers 0.000 claims abstract description 94
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 75
- 239000000203 mixture Substances 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 36
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 33
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 27
- 239000003999 initiator Substances 0.000 claims abstract description 21
- 230000009477 glass transition Effects 0.000 claims abstract description 16
- 230000001070 adhesive effect Effects 0.000 claims description 146
- 239000000853 adhesive Substances 0.000 claims description 145
- 239000000178 monomer Substances 0.000 claims description 76
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 71
- 239000003431 cross linking reagent Substances 0.000 claims description 54
- 238000000016 photochemical curing Methods 0.000 claims description 51
- 238000004132 cross linking Methods 0.000 claims description 50
- 238000011282 treatment Methods 0.000 claims description 39
- 230000004913 activation Effects 0.000 claims description 32
- 238000009832 plasma treatment Methods 0.000 claims description 29
- 239000004848 polyfunctional curative Substances 0.000 claims description 25
- 229920001721 polyimide Polymers 0.000 claims description 23
- 125000000524 functional group Chemical group 0.000 claims description 21
- 239000004593 Epoxy Substances 0.000 claims description 17
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 230000001965 increasing effect Effects 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims 2
- -1 isocyanate compound Chemical class 0.000 description 35
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 32
- 238000001723 curing Methods 0.000 description 29
- 239000000463 material Substances 0.000 description 24
- 238000012545 processing Methods 0.000 description 23
- 238000003860 storage Methods 0.000 description 21
- 229910052742 iron Inorganic materials 0.000 description 16
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 15
- 239000007983 Tris buffer Substances 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 13
- 239000000470 constituent Substances 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 13
- 239000010410 layer Substances 0.000 description 13
- 125000000217 alkyl group Chemical group 0.000 description 12
- 239000012948 isocyanate Substances 0.000 description 12
- 239000002313 adhesive film Substances 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 9
- 150000002513 isocyanates Chemical class 0.000 description 9
- 229920000058 polyacrylate Polymers 0.000 description 9
- 125000006850 spacer group Chemical group 0.000 description 9
- 229920001519 homopolymer Polymers 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 238000001035 drying Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 6
- 230000002787 reinforcement Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 150000002902 organometallic compounds Chemical class 0.000 description 5
- 229920000139 polyethylene terephthalate Polymers 0.000 description 5
- 239000005020 polyethylene terephthalate Substances 0.000 description 5
- 239000003505 polymerization initiator Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000012986 chain transfer agent Substances 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 150000003254 radicals Chemical class 0.000 description 4
- OSJIQLQSJBXTOH-UHFFFAOYSA-N 8-tricyclo[5.2.1.02,6]decanylmethyl prop-2-enoate Chemical compound C12CCCC2C2CC(COC(=O)C=C)C1C2 OSJIQLQSJBXTOH-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- DYHSMQWCZLNWGO-UHFFFAOYSA-N di(propan-2-yloxy)alumane Chemical compound CC(C)O[AlH]OC(C)C DYHSMQWCZLNWGO-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000011265 semifinished product Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 2
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SXVPFHXVKDPMIY-UHFFFAOYSA-N CC(=O)C.CC(=O)C.CC(=O)C.CC(=O)C.[Zr] Chemical compound CC(=O)C.CC(=O)C.CC(=O)C.CC(=O)C.[Zr] SXVPFHXVKDPMIY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- AKGGYBADQZYZPD-UHFFFAOYSA-N benzylacetone Chemical compound CC(=O)CCC1=CC=CC=C1 AKGGYBADQZYZPD-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000003851 corona treatment Methods 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 229920000193 polymethacrylate Polymers 0.000 description 2
- 229920005672 polyolefin resin Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- ZBBLRPRYYSJUCZ-GRHBHMESSA-L (z)-but-2-enedioate;dibutyltin(2+) Chemical compound [O-]C(=O)\C=C/C([O-])=O.CCCC[Sn+2]CCCC ZBBLRPRYYSJUCZ-GRHBHMESSA-L 0.000 description 1
- QUCXTQXIUAQSRT-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-one;propan-2-one Chemical compound CC(C)=O.FC(F)(F)C(=O)C(F)(F)F QUCXTQXIUAQSRT-UHFFFAOYSA-N 0.000 description 1
- BPXVHIRIPLPOPT-UHFFFAOYSA-N 1,3,5-tris(2-hydroxyethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound OCCN1C(=O)N(CCO)C(=O)N(CCO)C1=O BPXVHIRIPLPOPT-UHFFFAOYSA-N 0.000 description 1
- RTTZISZSHSCFRH-UHFFFAOYSA-N 1,3-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC(CN=C=O)=C1 RTTZISZSHSCFRH-UHFFFAOYSA-N 0.000 description 1
- VGHSXKTVMPXHNG-UHFFFAOYSA-N 1,3-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC(N=C=O)=C1 VGHSXKTVMPXHNG-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- HASUCEDGKYJBDC-UHFFFAOYSA-N 1-[3-[[bis(oxiran-2-ylmethyl)amino]methyl]cyclohexyl]-n,n-bis(oxiran-2-ylmethyl)methanamine Chemical compound C1OC1CN(CC1CC(CN(CC2OC2)CC2OC2)CCC1)CC1CO1 HASUCEDGKYJBDC-UHFFFAOYSA-N 0.000 description 1
- PHPRWKJDGHSJMI-UHFFFAOYSA-N 1-adamantyl prop-2-enoate Chemical compound C1C(C2)CC3CC2CC1(OC(=O)C=C)C3 PHPRWKJDGHSJMI-UHFFFAOYSA-N 0.000 description 1
- JWYVGKFDLWWQJX-UHFFFAOYSA-N 1-ethenylazepan-2-one Chemical compound C=CN1CCCCCC1=O JWYVGKFDLWWQJX-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- PBGPBHYPCGDFEZ-UHFFFAOYSA-N 1-ethenylpiperidin-2-one Chemical compound C=CN1CCCCC1=O PBGPBHYPCGDFEZ-UHFFFAOYSA-N 0.000 description 1
- LEWNYOKWUAYXPI-UHFFFAOYSA-N 1-ethenylpiperidine Chemical compound C=CN1CCCCC1 LEWNYOKWUAYXPI-UHFFFAOYSA-N 0.000 description 1
- BFYSJBXFEVRVII-UHFFFAOYSA-N 1-prop-1-enylpyrrolidin-2-one Chemical compound CC=CN1CCCC1=O BFYSJBXFEVRVII-UHFFFAOYSA-N 0.000 description 1
- XDOFQFKRPWOURC-UHFFFAOYSA-N 16-methylheptadecanoic acid Chemical compound CC(C)CCCCCCCCCCCCCCC(O)=O XDOFQFKRPWOURC-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- KFBXUKHERGLHLG-UHFFFAOYSA-N 2,4-Nonanedione Chemical compound CCCCCC(=O)CC(C)=O KFBXUKHERGLHLG-UHFFFAOYSA-N 0.000 description 1
- CEGGECULKVTYMM-UHFFFAOYSA-N 2,6-dimethylheptane-3,5-dione Chemical compound CC(C)C(=O)CC(=O)C(C)C CEGGECULKVTYMM-UHFFFAOYSA-N 0.000 description 1
- KKPXPUOMUHTLNO-UHFFFAOYSA-N 2-(2-hydroxyethylamino)ethanol;titanium Chemical compound [Ti].OCCNCCO KKPXPUOMUHTLNO-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N 2-Methylheptane Chemical compound CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 1
- WTYYGFLRBWMFRY-UHFFFAOYSA-N 2-[6-(oxiran-2-ylmethoxy)hexoxymethyl]oxirane Chemical compound C1OC1COCCCCCCOCC1CO1 WTYYGFLRBWMFRY-UHFFFAOYSA-N 0.000 description 1
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- XHHXXUFDXRYMQI-UHFFFAOYSA-N 2-[bis(2-hydroxyethyl)amino]ethanol;titanium Chemical compound [Ti].OCCN(CCO)CCO XHHXXUFDXRYMQI-UHFFFAOYSA-N 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- MZNSQRLUUXWLSB-UHFFFAOYSA-N 2-ethenyl-1h-pyrrole Chemical compound C=CC1=CC=CN1 MZNSQRLUUXWLSB-UHFFFAOYSA-N 0.000 description 1
- ZDHWTWWXCXEGIC-UHFFFAOYSA-N 2-ethenylpyrimidine Chemical compound C=CC1=NC=CC=N1 ZDHWTWWXCXEGIC-UHFFFAOYSA-N 0.000 description 1
- BOZRCGLDOHDZBP-UHFFFAOYSA-N 2-ethylhexanoic acid;tin Chemical compound [Sn].CCCCC(CC)C(O)=O BOZRCGLDOHDZBP-UHFFFAOYSA-N 0.000 description 1
- UUODQIKUTGWMPT-UHFFFAOYSA-N 2-fluoro-5-(trifluoromethyl)pyridine Chemical compound FC1=CC=C(C(F)(F)F)C=N1 UUODQIKUTGWMPT-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- KOKYZJXQQKRSJC-UHFFFAOYSA-N 3,3-diacetylheptane-2,4,6-trione;titanium Chemical compound [Ti].CC(=O)CC(=O)C(C(C)=O)(C(C)=O)C(C)=O KOKYZJXQQKRSJC-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- VNGLVZLEUDIDQH-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;2-methyloxirane Chemical compound CC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 VNGLVZLEUDIDQH-UHFFFAOYSA-N 0.000 description 1
- WPSWDCBWMRJJED-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]phenol;oxirane Chemical compound C1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WPSWDCBWMRJJED-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- PGFKZWFWBYNKGP-UHFFFAOYSA-N 5-ethenyl-2,3-dihydrofuran Chemical compound C=CC1=CCCO1 PGFKZWFWBYNKGP-UHFFFAOYSA-N 0.000 description 1
- KHZGUWAFFHXZLC-UHFFFAOYSA-N 5-methylhexane-2,4-dione Chemical compound CC(C)C(=O)CC(C)=O KHZGUWAFFHXZLC-UHFFFAOYSA-N 0.000 description 1
- CUXGDKOCSSIRKK-UHFFFAOYSA-N 7-methyloctyl prop-2-enoate Chemical compound CC(C)CCCCCCOC(=O)C=C CUXGDKOCSSIRKK-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- PINYNVLAWIOMPJ-UHFFFAOYSA-K C(C)CC(CC(=O)[O-])=O.C(C)CC(CC(=O)[O-])=O.C(C)CC(CC(=O)[O-])=O.[Fe+3] Chemical compound C(C)CC(CC(=O)[O-])=O.C(C)CC(CC(=O)[O-])=O.C(C)CC(CC(=O)[O-])=O.[Fe+3] PINYNVLAWIOMPJ-UHFFFAOYSA-K 0.000 description 1
- ABTYJEPXDJYLLB-UHFFFAOYSA-N C(C)NCCC([O-])C.[Ti+4].C(C)NCCC([O-])C.C(C)NCCC([O-])C.C(C)NCCC([O-])C Chemical compound C(C)NCCC([O-])C.[Ti+4].C(C)NCCC([O-])C.C(C)NCCC([O-])C.C(C)NCCC([O-])C ABTYJEPXDJYLLB-UHFFFAOYSA-N 0.000 description 1
- ADNMVZREHSHGSQ-UHFFFAOYSA-N CC(=O)C.CC(=O)C.CC(=O)C.[Fe] Chemical compound CC(=O)C.CC(=O)C.CC(=O)C.[Fe] ADNMVZREHSHGSQ-UHFFFAOYSA-N 0.000 description 1
- YKSQMRTWQPOQSL-UHFFFAOYSA-N CC(=O)C.[O-]CCCC.[O-]CCCC.[O-]CCCC.[Zr+3] Chemical compound CC(=O)C.[O-]CCCC.[O-]CCCC.[O-]CCCC.[Zr+3] YKSQMRTWQPOQSL-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- DCTLJGWMHPGCOS-UHFFFAOYSA-N Osajin Chemical compound C1=2C=CC(C)(C)OC=2C(CC=C(C)C)=C(O)C(C2=O)=C1OC=C2C1=CC=C(O)C=C1 DCTLJGWMHPGCOS-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- AEKNYBWUEYNWMJ-QWOOXDRHSA-N Pramiconazole Chemical compound O=C1N(C(C)C)CCN1C1=CC=C(N2CCN(CC2)C=2C=CC(OC[C@@H]3O[C@](CN4N=CN=C4)(CO3)C=3C(=CC(F)=CC=3)F)=CC=2)C=C1 AEKNYBWUEYNWMJ-QWOOXDRHSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 1
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 description 1
- GCTFWCDSFPMHHS-UHFFFAOYSA-M Tributyltin chloride Chemical compound CCCC[Sn](Cl)(CCCC)CCCC GCTFWCDSFPMHHS-UHFFFAOYSA-M 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical class NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- MUGVNPIYDSHWDY-UHFFFAOYSA-L [Cl-].[Cl-].CCCC[Ti++]CCCC Chemical compound [Cl-].[Cl-].CCCC[Ti++]CCCC MUGVNPIYDSHWDY-UHFFFAOYSA-L 0.000 description 1
- SHDWPVKUDGUFHQ-UHFFFAOYSA-L [Fe+2].C(CCC)C(C(=O)[O-])=C.C(CCC)C(C(=O)[O-])=C Chemical compound [Fe+2].C(CCC)C(C(=O)[O-])=C.C(CCC)C(C(=O)[O-])=C SHDWPVKUDGUFHQ-UHFFFAOYSA-L 0.000 description 1
- OAQREPNKHPSAKZ-UHFFFAOYSA-K [Fe+3].C(C)(C)(C)C(C(=O)[O-])=C.C(C)(C)(C)C(C(=O)[O-])=C.C(C)(C)(C)C(C(=O)[O-])=C Chemical compound [Fe+3].C(C)(C)(C)C(C(=O)[O-])=C.C(C)(C)(C)C(C(=O)[O-])=C.C(C)(C)(C)C(C(=O)[O-])=C OAQREPNKHPSAKZ-UHFFFAOYSA-K 0.000 description 1
- MEWVVGPFXILCHW-UHFFFAOYSA-K [Fe+3].C(C)(C)C(C(=O)[O-])CCC.C(C)(C)C(C(=O)[O-])CCC.C(C)(C)C(C(=O)[O-])CCC Chemical compound [Fe+3].C(C)(C)C(C(=O)[O-])CCC.C(C)(C)C(C(=O)[O-])CCC.C(C)(C)C(C(=O)[O-])CCC MEWVVGPFXILCHW-UHFFFAOYSA-K 0.000 description 1
- WLNZNEFEVSLPJY-UHFFFAOYSA-K [Fe+3].C(C)C(C(=O)[O-])=C.C(C)C(C(=O)[O-])=C.C(C)C(C(=O)[O-])=C Chemical compound [Fe+3].C(C)C(C(=O)[O-])=C.C(C)C(C(=O)[O-])=C.C(C)C(C(=O)[O-])=C WLNZNEFEVSLPJY-UHFFFAOYSA-K 0.000 description 1
- VDWGBEAWNSOHTB-UHFFFAOYSA-K [Fe+3].C(C)CCC(=O)CC(=O)[O-].C(C)CCC(=O)CC(=O)[O-].C(C)CCC(=O)CC(=O)[O-] Chemical compound [Fe+3].C(C)CCC(=O)CC(=O)[O-].C(C)CCC(=O)CC(=O)[O-].C(C)CCC(=O)CC(=O)[O-] VDWGBEAWNSOHTB-UHFFFAOYSA-K 0.000 description 1
- HDFSCJWUESEVOP-UHFFFAOYSA-K [Fe+3].C(C1=CC=CC=C1)CC(CC(=O)[O-])=O.C(C1=CC=CC=C1)CC(CC(=O)[O-])=O.C(C1=CC=CC=C1)CC(CC(=O)[O-])=O Chemical compound [Fe+3].C(C1=CC=CC=C1)CC(CC(=O)[O-])=O.C(C1=CC=CC=C1)CC(CC(=O)[O-])=O.C(C1=CC=CC=C1)CC(CC(=O)[O-])=O HDFSCJWUESEVOP-UHFFFAOYSA-K 0.000 description 1
- VPBMJTYJDGMVCL-UHFFFAOYSA-K [Fe+3].C(CC)C(C(=O)[O-])CCC.C(CC)C(C(=O)[O-])CCC.C(CC)C(C(=O)[O-])CCC Chemical compound [Fe+3].C(CC)C(C(=O)[O-])CCC.C(CC)C(C(=O)[O-])CCC.C(CC)C(C(=O)[O-])CCC VPBMJTYJDGMVCL-UHFFFAOYSA-K 0.000 description 1
- FCDJABKRJYWIOQ-UHFFFAOYSA-K [Fe+3].C(CCC)C(C(=O)[O-])CCC.C(CCC)C(C(=O)[O-])CCC.C(CCC)C(C(=O)[O-])CCC Chemical compound [Fe+3].C(CCC)C(C(=O)[O-])CCC.C(CCC)C(C(=O)[O-])CCC.C(CCC)C(C(=O)[O-])CCC FCDJABKRJYWIOQ-UHFFFAOYSA-K 0.000 description 1
- CPDFGXHAQPJSMI-UHFFFAOYSA-K [Fe+3].CC(C)CC([O-])=O.CC(C)CC([O-])=O.CC(C)CC([O-])=O Chemical compound [Fe+3].CC(C)CC([O-])=O.CC(C)CC([O-])=O.CC(C)CC([O-])=O CPDFGXHAQPJSMI-UHFFFAOYSA-K 0.000 description 1
- IXJUICKNVSYLFS-UHFFFAOYSA-H [Fe+6].CC(C(=O)[O-])(C(=O)[O-])C.CC(C(=O)[O-])(C(=O)[O-])C.CC(C(=O)[O-])(C(=O)[O-])C Chemical compound [Fe+6].CC(C(=O)[O-])(C(=O)[O-])C.CC(C(=O)[O-])(C(=O)[O-])C.CC(C(=O)[O-])(C(=O)[O-])C IXJUICKNVSYLFS-UHFFFAOYSA-H 0.000 description 1
- LALWCMLIISZBTP-UHFFFAOYSA-N [Fe].CCCCCCC.CCCCCCC.CCCCCCC Chemical compound [Fe].CCCCCCC.CCCCCCC.CCCCCCC LALWCMLIISZBTP-UHFFFAOYSA-N 0.000 description 1
- CHYAORCDVGOMRY-UHFFFAOYSA-N [Ti].C(C)(C)O.C(C)(C)O.CC(=O)C.CC(=O)C Chemical compound [Ti].C(C)(C)O.C(C)(C)O.CC(=O)C.CC(=O)C CHYAORCDVGOMRY-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- XQBCVRSTVUHIGH-UHFFFAOYSA-L [dodecanoyloxy(dioctyl)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCCCCCC)(CCCCCCCC)OC(=O)CCCCCCCCCCC XQBCVRSTVUHIGH-UHFFFAOYSA-L 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- ZIQPQYFSSSHQBP-UHFFFAOYSA-N acetyl 2,3-dihydroxypropanoate Chemical compound CC(=O)OC(=O)C(O)CO ZIQPQYFSSSHQBP-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- YBCVMFKXIKNREZ-UHFFFAOYSA-N acoh acetic acid Chemical compound CC(O)=O.CC(O)=O YBCVMFKXIKNREZ-UHFFFAOYSA-N 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- SMZOGRDCAXLAAR-UHFFFAOYSA-N aluminium isopropoxide Chemical compound [Al+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] SMZOGRDCAXLAAR-UHFFFAOYSA-N 0.000 description 1
- JPUHCPXFQIXLMW-UHFFFAOYSA-N aluminium triethoxide Chemical compound CCO[Al](OCC)OCC JPUHCPXFQIXLMW-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- GDFLGQIOWFLLOC-UHFFFAOYSA-N azane;2-hydroxypropanoic acid;titanium Chemical compound [NH4+].[Ti].CC(O)C([O-])=O GDFLGQIOWFLLOC-UHFFFAOYSA-N 0.000 description 1
- KRJUSWXDFZSJQD-UHFFFAOYSA-N benzoic acid;lead Chemical compound [Pb].OC(=O)C1=CC=CC=C1 KRJUSWXDFZSJQD-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- ZCGHEBMEQXMRQL-UHFFFAOYSA-N benzyl 2-carbamoylpyrrolidine-1-carboxylate Chemical compound NC(=O)C1CCCN1C(=O)OCC1=CC=CC=C1 ZCGHEBMEQXMRQL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- JRPRCOLKIYRSNH-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) benzene-1,2-dicarboxylate Chemical compound C=1C=CC=C(C(=O)OCC2OC2)C=1C(=O)OCC1CO1 JRPRCOLKIYRSNH-UHFFFAOYSA-N 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 description 1
- DEFMLLQRTVNBOF-UHFFFAOYSA-K butan-1-olate;trichlorotitanium(1+) Chemical compound [Cl-].[Cl-].[Cl-].CCCCO[Ti+3] DEFMLLQRTVNBOF-UHFFFAOYSA-K 0.000 description 1
- BSDOQSMQCZQLDV-UHFFFAOYSA-N butan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] BSDOQSMQCZQLDV-UHFFFAOYSA-N 0.000 description 1
- SHZIWNPUGXLXDT-UHFFFAOYSA-N caproic acid ethyl ester Natural products CCCCCC(=O)OCC SHZIWNPUGXLXDT-UHFFFAOYSA-N 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- QAEKNCDIHIGLFI-UHFFFAOYSA-L cobalt(2+);2-ethylhexanoate Chemical compound [Co+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O QAEKNCDIHIGLFI-UHFFFAOYSA-L 0.000 description 1
- GAYAMOAYBXKUII-UHFFFAOYSA-L cobalt(2+);dibenzoate Chemical compound [Co+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 GAYAMOAYBXKUII-UHFFFAOYSA-L 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 150000007973 cyanuric acids Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- RGHVMFZEKLHZBU-UHFFFAOYSA-N dibutoxyalumane Chemical compound C(CCC)O[AlH]OCCCC RGHVMFZEKLHZBU-UHFFFAOYSA-N 0.000 description 1
- RJGHQTVXGKYATR-UHFFFAOYSA-L dibutyl(dichloro)stannane Chemical compound CCCC[Sn](Cl)(Cl)CCCC RJGHQTVXGKYATR-UHFFFAOYSA-L 0.000 description 1
- JGFBRKRYDCGYKD-UHFFFAOYSA-N dibutyl(oxo)tin Chemical compound CCCC[Sn](=O)CCCC JGFBRKRYDCGYKD-UHFFFAOYSA-N 0.000 description 1
- JJPZOIJCDNHCJP-UHFFFAOYSA-N dibutyl(sulfanylidene)tin Chemical compound CCCC[Sn](=S)CCCC JJPZOIJCDNHCJP-UHFFFAOYSA-N 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- QSHZUFRQHSINTB-UHFFFAOYSA-L dibutyltin(2+);dibromide Chemical compound CCCC[Sn](Br)(Br)CCCC QSHZUFRQHSINTB-UHFFFAOYSA-L 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- LQRUPWUPINJLMU-UHFFFAOYSA-N dioctyl(oxo)tin Chemical compound CCCCCCCC[Sn](=O)CCCCCCCC LQRUPWUPINJLMU-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- KCHWKBCUPLJWJA-UHFFFAOYSA-N dodecyl 3-oxobutanoate Chemical compound CCCCCCCCCCCCOC(=O)CC(C)=O KCHWKBCUPLJWJA-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- ZFSQRSOTOXERMJ-UHFFFAOYSA-N ethanol;iron Chemical compound [Fe].CCO.CCO.CCO ZFSQRSOTOXERMJ-UHFFFAOYSA-N 0.000 description 1
- AAOWICMKJHPGAG-UHFFFAOYSA-N ethoxy(triethyl)stannane Chemical compound CCO[Sn](CC)(CC)CC AAOWICMKJHPGAG-UHFFFAOYSA-N 0.000 description 1
- XCRHYAQWBYDRGV-JXMROGBWSA-N ethyl (e)-3-(4-propan-2-ylphenyl)prop-2-enoate Chemical compound CCOC(=O)\C=C\C1=CC=C(C(C)C)C=C1 XCRHYAQWBYDRGV-JXMROGBWSA-N 0.000 description 1
- NVPXEWPKAICFCQ-UHFFFAOYSA-N ethyl acetate;titanium Chemical compound [Ti].CCOC(C)=O NVPXEWPKAICFCQ-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- QYCVBOXNHNZFKO-UHFFFAOYSA-N ethylideneazanide Chemical compound [CH2]C=[N] QYCVBOXNHNZFKO-UHFFFAOYSA-N 0.000 description 1
- 150000002193 fatty amides Chemical class 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 1
- QCUJTRLLCQCVFW-UHFFFAOYSA-K hexanoate;iron(3+) Chemical compound [Fe+3].CCCCCC([O-])=O.CCCCCC([O-])=O.CCCCCC([O-])=O QCUJTRLLCQCVFW-UHFFFAOYSA-K 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- MHRFUOIKSVIMSN-UHFFFAOYSA-N iron tridecane-6,8-dione Chemical compound [Fe].CCCCCC(=O)CC(=O)CCCCC.CCCCCC(=O)CC(=O)CCCCC.CCCCCC(=O)CC(=O)CCCCC MHRFUOIKSVIMSN-UHFFFAOYSA-N 0.000 description 1
- JXPNINVGPSRPMR-UHFFFAOYSA-N iron(3+) methanolate Chemical compound [Fe+3].[O-]C.[O-]C.[O-]C JXPNINVGPSRPMR-UHFFFAOYSA-N 0.000 description 1
- QUHDSMAREWXWFM-UHFFFAOYSA-N iron(3+);propan-2-olate Chemical compound [Fe+3].CC(C)[O-].CC(C)[O-].CC(C)[O-] QUHDSMAREWXWFM-UHFFFAOYSA-N 0.000 description 1
- IBEJQHFAFDBLPD-UHFFFAOYSA-N iron;1-phenylbutane-1,3-dione Chemical compound [Fe].CC(=O)CC(=O)C1=CC=CC=C1.CC(=O)CC(=O)C1=CC=CC=C1.CC(=O)CC(=O)C1=CC=CC=C1 IBEJQHFAFDBLPD-UHFFFAOYSA-N 0.000 description 1
- DAYRMUIPBVGVLS-UHFFFAOYSA-N iron;2,2,6,6-tetramethylheptane-3,5-dione Chemical compound [Fe].CC(C)(C)C(=O)CC(=O)C(C)(C)C.CC(C)(C)C(=O)CC(=O)C(C)(C)C.CC(C)(C)C(=O)CC(=O)C(C)(C)C DAYRMUIPBVGVLS-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- LRDFRRGEGBBSRN-UHFFFAOYSA-N isobutyronitrile Chemical compound CC(C)C#N LRDFRRGEGBBSRN-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- GIWKOZXJDKMGQC-UHFFFAOYSA-L lead(2+);naphthalene-2-carboxylate Chemical compound [Pb+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 GIWKOZXJDKMGQC-UHFFFAOYSA-L 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- KJGLZJQPMKQFIK-UHFFFAOYSA-N methanolate;tributylstannanylium Chemical compound CCCC[Sn](CCCC)(CCCC)OC KJGLZJQPMKQFIK-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 1
- SJPFBRJHYRBAGV-UHFFFAOYSA-N n-[[3-[[bis(oxiran-2-ylmethyl)amino]methyl]phenyl]methyl]-1-(oxiran-2-yl)-n-(oxiran-2-ylmethyl)methanamine Chemical compound C1OC1CN(CC=1C=C(CN(CC2OC2)CC2OC2)C=CC=1)CC1CO1 SJPFBRJHYRBAGV-UHFFFAOYSA-N 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZCYXXKJEDCHMGH-UHFFFAOYSA-N nonane Chemical compound CCCC[CH]CCCC ZCYXXKJEDCHMGH-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N normal nonane Natural products CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- BMOMBHKAYGMGCR-UHFFFAOYSA-N octadecyl 3-oxobutanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CC(C)=O BMOMBHKAYGMGCR-UHFFFAOYSA-N 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- KSCKTBJJRVPGKM-UHFFFAOYSA-N octan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-].CCCCCCCC[O-] KSCKTBJJRVPGKM-UHFFFAOYSA-N 0.000 description 1
- GJYXGIIWJFZCLN-UHFFFAOYSA-N octane-2,4-dione Chemical compound CCCCC(=O)CC(C)=O GJYXGIIWJFZCLN-UHFFFAOYSA-N 0.000 description 1
- IKYDDBGYKFPTGF-UHFFFAOYSA-N octyl 3-oxobutanoate Chemical compound CCCCCCCCOC(=O)CC(C)=O IKYDDBGYKFPTGF-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940049964 oleate Drugs 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000223 polyglycerol Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- RLJWTAURUFQFJP-UHFFFAOYSA-N propan-2-ol;titanium Chemical compound [Ti].CC(C)O.CC(C)O.CC(C)O.CC(C)O RLJWTAURUFQFJP-UHFFFAOYSA-N 0.000 description 1
- NICYNNGYHJJJMJ-UHFFFAOYSA-N propan-2-one;titanium Chemical compound [Ti].CC(C)=O NICYNNGYHJJJMJ-UHFFFAOYSA-N 0.000 description 1
- AMPWJYZVAULOEI-UHFFFAOYSA-N propan-2-one;zirconium Chemical compound [Zr].CC(C)=O AMPWJYZVAULOEI-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N tetraisopropyl titanate Substances CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- NXFZDTAAMQLJEC-UHFFFAOYSA-M tributyl-(2,2,2-trichloroacetyl)oxytin(1-) Chemical compound CCCC[Sn-](CCCC)(CCCC)OC(=O)C(Cl)(Cl)Cl NXFZDTAAMQLJEC-UHFFFAOYSA-M 0.000 description 1
- PWBHRVGYSMBMIO-UHFFFAOYSA-M tributylstannanylium;acetate Chemical compound CCCC[Sn](CCCC)(CCCC)OC(C)=O PWBHRVGYSMBMIO-UHFFFAOYSA-M 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- IFNXAMCERSVZCV-UHFFFAOYSA-L zinc;2-ethylhexanoate Chemical compound [Zn+2].CCCCC(CC)C([O-])=O.CCCCC(CC)C([O-])=O IFNXAMCERSVZCV-UHFFFAOYSA-L 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/15—Heterocyclic compounds having oxygen in the ring
- C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
- C08K5/1515—Three-membered rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
- C09J4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
- C09J5/02—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving pretreatment of the surfaces to be joined
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/25—Plastics; Metallised plastics based on macromolecular compounds obtained otherwise than by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/255—Polyesters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2467/00—Presence of polyester
- C09J2467/006—Presence of polyester in the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Laminated Bodies (AREA)
- Yarns And Mechanical Finishing Of Yarns Or Ropes (AREA)
Abstract
本發明之補強膜(10)具備膜基材、及固著積層於膜基材之一主面上之黏著劑層(2)。黏著劑層包含光硬化性組合物。構成黏著劑層之光硬化性組合物包含丙烯酸系基礎聚合物、丙烯酸系低聚物、光硬化劑、及光聚合起始劑。丙烯酸系低聚物包含羧基,且玻璃轉移溫度為0℃以上。The reinforcing film (10) of the present invention is provided with a film substrate and an adhesive layer (2) fixedly laminated on a main surface of the film substrate. The adhesive layer contains a photocurable composition. The photocurable composition constituting the adhesive layer includes an acrylic base polymer, an acrylic oligomer, a light curing agent, and a photopolymerization initiator. The acrylic oligomer contains a carboxyl group, and the glass transition temperature is 0°C or higher.
Description
本發明係關於一種膜基材與光硬化性之黏著劑層固著積層而成之補強膜。進而,本發明係關於一種於表面貼合有補強膜之裝置之製造方法、及於被黏著體之表面固著積層補強膜之補強方法。The present invention relates to a reinforcing film formed by a film base material and a photocurable adhesive layer fixedly laminated. Furthermore, the present invention relates to a method of manufacturing a device with a reinforcing film attached to the surface, and a reinforcing method of fixing a laminated reinforcing film on the surface of an adherend.
於顯示器等光學裝置或電子裝置之表面,存在為了表面保護或耐衝擊性賦予等而貼合黏著性膜之情況。此種黏著性膜通常係於膜基材之主面固著積層黏著劑層,且經由該黏著劑層貼合於裝置表面。On the surface of an optical device such as a display or an electronic device, an adhesive film may be attached for surface protection or impact resistance. Such an adhesive film is usually fixed with a laminated adhesive layer on the main surface of the film substrate, and is attached to the surface of the device via the adhesive layer.
於裝置之組裝、加工、輸送等使用前之狀態下,可藉由於裝置或裝置構成零件之表面暫黏黏著性膜而抑制被黏著體之損傷或破損。對如此以表面之暫時性保護為目的而暫黏之黏著性膜要求可容易地自被黏著體剝離,且不產生於被黏著體之糊劑殘留。In the state before the device is assembled, processed, transported, etc., the adhesive film can be temporarily adhered to the surface of the device or its constituent parts to prevent damage or breakage of the adherend. For such an adhesive film temporarily adhered for the purpose of temporary protection of the surface, it is required that it can be easily peeled off from the adherend and does not produce paste residue on the adherend.
於專利文獻1中揭示有一種黏著性膜,其除裝置之組裝、加工、輸送等以外,於裝置之使用時亦於貼合於裝置表面不變之狀態下使用。此種黏著性膜由於表面保護、以及對裝置之衝擊之分散、對撓性裝置之剛性賦予等而具有對裝置進行補強之功能。
於將黏著性膜貼合於被黏著體時,存在產生氣泡之混入或黏貼位置之偏移等貼合不良之情況。於產生貼合不良之情形時,進行如下作業(二次加工):自被黏著體將黏著性膜剝離並貼合另一黏著性膜。用作工程材料之黏著性膜由於係以自被黏著體之剝離為前提進行設計,因此容易二次加工。另一方面,以永久接著為前提之補強膜一般而言不假定自裝置剝離而是牢固地接著於裝置之表面,因此難以二次加工。When the adhesive film is attached to the adherend, there are cases of poor attachment such as the mixing of air bubbles or the offset of the attachment position. In the case of poor bonding, perform the following operations (secondary processing): peel the adhesive film from the adherend and attach another adhesive film. The adhesive film used as an engineering material is designed on the premise of peeling from the adherend, so it is easy to reprocess. On the other hand, the reinforcing film premised on permanent bonding generally does not assume peeling from the device but firmly adheres to the surface of the device, so it is difficult to perform secondary processing.
於專利文獻2中揭示有一種黏著性膜,其具備設計成剛與被黏著體貼合後為低黏著性且接著力經時性地上升之黏著劑層。以光或熱作為觸發器使接著力上升之黏著劑可任意地設定與被黏著體之貼合後之由硬化而引起之接著力上升之時點。又,由於剛貼合後(接著力上升處理前)接著力較小,故而容易自被黏著體剝離,可用作具有二次加工性之補強膜。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本專利特開2017-132977號公報 [專利文獻2]國際公開第2015/163115號[Patent Document 1] Japanese Patent Laid-Open No. 2017-132977 [Patent Document 2] International Publication No. 2015/163115
[發明所欲解決之問題][The problem to be solved by the invention]
存在對電漿裝置等被黏著體之表面於貼合補強膜之前,以被黏著體表面之潔淨化等為目的而進行電漿處理或電暈處理等表面活化處理的情況。若於表面活性處理後之被黏著體之表面貼合補強膜,則存在與於未進行表面活化處理之被黏著體貼合補強膜之情形時相比,接著力大幅上升,自被黏著體剝離補強膜(二次加工)變得困難的情況。There are cases where the surface of an adherend such as a plasma device or the like is subjected to surface activation treatment such as plasma treatment or corona treatment for the purpose of cleaning the surface of the adherend before laminating the reinforcing film. If the reinforcing film is attached to the surface of the adherend after the surface activation treatment, the adhesive strength will increase significantly compared with the case where the adherend without the surface activation treatment is attached to the reinforcing film, and the reinforcement will be peeled off from the adherend. When the film (secondary processing) becomes difficult.
鑒於該課題,本發明之目的在於提供一種即便藉由電漿等對被黏著體表面進行過活化處理之情形時,對被黏著體之初期接著力亦較低、二次加工性優異且接著力上升處理後能夠牢固地與被黏著體接著之補強膜。 [解決問題之技術手段]In view of this problem, the object of the present invention is to provide a method that has low initial adhesion to the adherend, excellent secondary processability, and adhesion even when the surface of the adherend is activated by plasma or the like. Reinforcement film that can firmly adhere to the adherend after the ascent treatment. [Technical means to solve the problem]
鑒於上述課題,本發明者等人進行研究,結果發現:藉由使用具有特定之組成之光硬化性黏著劑,由被黏著體之表面活化處理之有無而引起之初期接著力之差較小,對經表面活化處理之被黏著體亦具有優異之二次加工性,且於光硬化後對被黏著體表現出較高之接著力。In view of the above-mentioned problems, the inventors of the present invention conducted research and found that by using a light-curing adhesive with a specific composition, the difference in initial adhesion caused by the presence or absence of surface activation treatment of the adherend is small. It also has excellent secondary processing properties to the adherend after surface activation treatment, and shows a high adhesive force to the adherend after light curing.
本發明之補強膜具備固著積層於膜基材之一主面上之黏著劑層。黏著劑層包含含有基礎聚合物、低聚物、光硬化劑、及光聚合起始劑之光硬化性組合物。The reinforcing film of the present invention is provided with an adhesive layer fixedly laminated on a main surface of the film substrate. The adhesive layer contains a photocurable composition containing a base polymer, an oligomer, a photocuring agent, and a photopolymerization initiator.
作為黏著劑層之基礎聚合物,可使用丙烯酸系聚合物。丙烯酸系基礎聚合物可為實質上不含氮原子者。於基礎聚合物中較佳為導入有交聯結構。例如,基礎聚合物含有含羥基單體及/或含羧基單體作為單體單元,藉由多官能異氰酸酯化合物或多官能環氧化合物等交聯劑與該等官能基鍵結而被導入交聯結構。As the base polymer of the adhesive layer, an acrylic polymer can be used. The acrylic base polymer may contain substantially no nitrogen atoms. Preferably, a crosslinked structure is introduced into the base polymer. For example, the base polymer contains a hydroxyl group-containing monomer and/or a carboxyl group-containing monomer as a monomer unit, and is cross-linked by bonding a cross-linking agent such as a multifunctional isocyanate compound or a multifunctional epoxy compound to these functional groups. structure.
作為低聚物,可使用重量平均分子量為1000~30000且包含羧基之丙烯酸系低聚物。藉由使黏著劑層包含低聚物,存在即便於被黏著體表面藉由電漿處理等而進行過活化處理之情形時,亦可抑制對被黏著體之初期接著力之上升,且於使黏著劑層光硬化後,對經活化處理之被黏著體表現出較高之接著力的傾向。As the oligomer, an acrylic oligomer having a weight average molecular weight of 1,000 to 30,000 and containing a carboxyl group can be used. By making the adhesive layer contain oligomers, even when the surface of the adherend is activated by plasma treatment, etc., the increase in initial adhesion to the adherend can be suppressed, and After the adhesive layer is light-cured, it tends to show a higher adhesive force to the adherend after the activation treatment.
黏著劑層(光硬化性組合物)之凝膠分率可為50%以上。於交聯結構之導入時,可使用交聯促進劑。作為交聯促進劑,例如可使用有機金屬化合物。The gel fraction of the adhesive layer (photocurable composition) may be 50% or more. When the cross-linking structure is introduced, a cross-linking accelerator can be used. As the crosslinking accelerator, for example, an organometallic compound can be used.
黏著劑層之光硬化劑例如為多官能(甲基)丙烯酸酯。光硬化劑之官能基當量較佳為100~500 g/eq左右。The light curing agent of the adhesive layer is, for example, a multifunctional (meth)acrylate. The functional group equivalent of the light hardener is preferably about 100 to 500 g/eq.
將補強膜暫黏於被黏著體之表面後,藉由對黏著劑層照射活性光線,使黏著劑層光硬化,而使補強膜與被黏著體之接著力上升,獲得於被黏著體之表面固著積層補強膜而成之裝置。於被黏著體為聚醯亞胺膜之情形時,較佳為使黏著劑層光硬化之前(暫黏狀態),黏著劑層與聚醯亞胺膜之接著力為1 N/25 mm以下。亦可於將補強膜暫黏於被黏著體之前對被黏著體進行電漿處理等表面活化處理。 [發明之效果]After the reinforcing film is temporarily adhered to the surface of the adherend, the adhesive layer is irradiated with active light to light-harden the adhesive layer, so that the adhesive force between the reinforcing film and the adherend increases, and is obtained on the surface of the adherend It is a device made of fixed laminated reinforcement film. When the adherend is a polyimide film, it is preferable that the adhesive force between the adhesive layer and the polyimide film be 1 N/25 mm or less before the adhesive layer is photocured (temporary adhesion state). It is also possible to perform surface activation treatments such as plasma treatment on the adherend before temporarily adhering the reinforcing film to the adherend. [Effects of Invention]
本發明之補強膜中,黏著劑層包含光硬化性組合物,且於與被黏著體之接著後藉由使黏著劑層光硬化而使與被黏著體之接著力上升。於使黏著劑層光硬化前,對藉由電漿處理等而進行過活化處理之被黏著體之接著力亦較小,因此容易二次加工,光硬化後表現出較高之接著力。In the reinforcing film of the present invention, the adhesive layer contains a photocurable composition, and after bonding with the adherend, the adhesive layer is photocured to increase the adhesive force with the adherend. Before the adhesive layer is photocured, the adhesive force to the adherend that has been activated by plasma treatment or the like is also small, so it is easy to perform secondary processing, and exhibits a higher adhesive force after photocuring.
圖1係表示補強膜之一實施形態之剖視圖。補強膜10於膜基材1之一主面上具備黏著劑層2。黏著劑層2固著積層於基材膜1之一主面上。黏著劑層2係包含光硬化性組合物之光硬化性黏著劑,且藉由紫外線等活性光線之照射進行硬化,從而與被黏著體之接著力上升。Fig. 1 is a cross-sectional view showing an embodiment of a reinforcing film. The reinforcing
圖2係於黏著劑層2之主面上暫黏有隔離件5之補強膜之剖視圖。圖3係表示於裝置20之表面黏貼設置有補強膜10之狀態之剖視圖。2 is a cross-sectional view of a reinforcing film with a spacer 5 temporarily adhered to the main surface of the
自黏著劑層2之表面將隔離件5剝離去除,將黏著劑層2之露出面貼合於裝置20之表面,藉此於裝置20之表面黏貼設置補強膜10。該狀態係黏著劑層2為光硬化前且於裝置20上暫黏有補強膜10(黏著劑層2)之狀態。藉由使黏著劑層2進行光硬化,而使於裝置20與黏著劑層2之界面之接著力上升,使裝置20與補強膜10固著。The spacer 5 is peeled off from the surface of the
所謂「固著」,係指所積層之2層牢固地接著、不可能或難以於兩者之界面剝離之狀態。所謂「暫黏」,係指所積層之2層間之接著力較小、可容易地於兩者之界面剝離之狀態。The so-called "fixed" refers to the state where the two layers of the laminated layer are firmly connected, and it is impossible or difficult to peel off at the interface between the two layers. The so-called "temporary adhesion" refers to a state in which the adhesive force between the two layers of the laminated layer is small and can be easily peeled off at the interface between the two layers.
圖2所示之補強膜中,膜基材1與黏著劑層2固著,且隔離件5暫黏於黏著劑層2。若將膜基材1與隔離件5進行剝離,則於黏著劑層2與隔離件5之界面產生剝離,維持膜基材1上固著有黏著劑層2之狀態。於剝離後之隔離件5上不會殘存黏著劑。In the reinforced film shown in FIG. 2, the
圖3所示之黏貼設置有補強膜10之裝置於黏著劑層2之光硬化前,裝置20與黏著劑層2為暫黏狀態。若對膜基材1與裝置20進行剝離,則於黏著劑層2與裝置20之界面產生剝離,維持膜基材1上固著有黏著劑層2之狀態。由於在裝置20上不會殘存黏著劑,故而容易二次加工。於使黏著劑層2光硬化後,由於黏著劑層2與裝置20之接著力上升,故而難以自裝置20剝離膜1,若將兩者剝離,則存在產生黏著劑層2之凝集破壞之情況。In the pasting device shown in FIG. 3 provided with a reinforcing
[補強膜之構成]
<膜基材>
作為膜基材1,使用塑膠膜。為了使膜基材1及黏著劑層2固著,較佳為膜基材1之附設黏著劑層2之面未實施過脫模處理。[Composition of Reinforcing Film]
<Film base material>
As the
膜基材之厚度例如為4~500 μm左右。就藉由剛性賦予或衝擊緩和等對裝置進行補強之觀點而言,膜基材1之厚度較佳為12 μm以上,更佳為30 μm以上,進而較佳為45 μm以上。就使補強膜具有可撓性從而提高操作性之觀點而言,膜基材1之厚度較佳為300 μm以下,更佳為200 μm以下。就兼顧機械強度及可撓性之觀點而言,膜基材1之壓縮強度較佳為100~3000 kg/cm2
,更佳為200~2900 kg/cm2
,進而較佳為300~2800 kg/cm2
,尤佳為400~2700 kg/cm2
。The thickness of the film substrate is, for example, about 4 to 500 μm. From the viewpoint of reinforcement of the device by rigidity imparting or impact mitigation, the thickness of the
作為構成膜基材1之塑膠材料,可列舉聚酯系樹脂、聚烯烴系樹脂、環狀聚烯烴系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂等。於顯示器等光學裝置用之補強膜中,膜基材1較佳為透明膜。又,於自膜基材1側照射活性光線進行黏著劑層2之光硬化之情形時,膜基材1較佳為具有對黏著劑層之硬化所使用之活性光線之透明性。就兼備機械強度及透明性而言,可良好地使用聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯系樹脂。於自被黏著體側照射活性光線使黏著劑層硬化之情形時,被黏著體具有對活性光線之透明性即可,膜基材1對活性光線可不透明。Examples of the plastic material constituting the
於膜基材1之表面亦可設置易接著層、易滑層、脫模層、抗靜電層、硬塗層、抗反射層等功能性塗層。再者,如上所述,為了使膜基材1及黏著劑層2固著,於膜基材1之附設黏著劑層2之面較佳為未設置脫模層。Functional coatings such as an easy-to-adhesive layer, easy-slip layer, release layer, antistatic layer, hard coating layer, and anti-reflection layer can also be provided on the surface of the
<黏著劑層>
固著積層於膜基材11上之黏著劑層2包含含有基礎聚合物、光硬化劑及光聚合起始劑之光硬化性組合物。黏著劑層2由於光硬化前與裝置或裝置零件等被黏著體之接著力較小,因此容易二次加工。黏著劑層2由於與被黏著體之接著力藉由光硬化而提昇,因此於裝置之使用時,補強膜亦不易自裝置表面剝離,接著可靠性優異。<Adhesive layer>
The
於補強膜用於顯示器等光學裝置之情形時,黏著劑層2之全光線透過率較佳為80%以上,更佳為85%以上,進而較佳為90%以上。黏著劑層2之霧度較佳為2%以下,更佳為1%以下,進而較佳為0.7%以下,尤佳為0.5%以下。When the reinforcing film is used in an optical device such as a display, the total light transmittance of the
(基礎聚合物)
基礎聚合物係黏著劑組合物之主構成成分。就將硬化前之黏著劑層2之接著性設為適當之範圍之觀點而言,於基礎聚合物中較佳為導入有交聯結構。基礎聚合物之種類並無特別限定,適當地選擇丙烯酸系聚合物、聚矽氧系聚合物、胺基甲酸酯系聚合物、橡膠系聚合物等即可。尤其是就光學透明性及接著性優異、且容易控制接著性、與低聚物或光硬化劑之相溶性優異之方面而言,黏著劑組合物較佳為含有丙烯酸系聚合物作為基礎聚合物,較佳為黏著劑組合物之50重量%以上為丙烯酸系聚合物。(Base polymer)
The base polymer is the main component of the adhesive composition. From the viewpoint of setting the adhesiveness of the
作為丙烯酸系聚合物,可良好地使用包含(甲基)丙烯酸烷基酯作為主要單體成分者。再者,於本說明書中,所謂「(甲基)丙烯酸」,意指丙烯酸及/或甲基丙烯酸。As the acrylic polymer, those containing alkyl (meth)acrylate as a main monomer component can be used favorably. In addition, in this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid.
作為(甲基)丙烯酸烷基酯,可良好地使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。(甲基)丙烯酸烷基酯之烷基可為直鏈亦可具有支鏈。作為(甲基)丙烯酸烷基酯之例,可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸異十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸芳烷基酯等。As the alkyl (meth)acrylate, an alkyl (meth)acrylate whose alkyl group has 1 to 20 carbon atoms can be preferably used. The alkyl group of the alkyl (meth)acrylate may be linear or branched. Examples of alkyl (meth)acrylates include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, (meth) ) Second butyl acrylate, third butyl (meth)acrylate, pentyl (meth)acrylate, isoamyl (meth)acrylate, neopentyl (meth)acrylate, hexyl (meth)acrylate , Heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, (meth) Isononyl acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, isodecyl (meth)acrylate Tridecyl ester, tetradecyl (meth)acrylate, isotetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl (meth)acrylate, Heptadecyl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate, nonadecyl (meth)acrylate, (meth)acrylic acid Aralkyl esters and the like.
關於(甲基)丙烯酸烷基酯之含量,相對於構成基礎聚合物之單體成分總量較佳為40重量%以上,更佳為50重量%以上,進而較佳為55重量%以上。The content of the alkyl (meth)acrylate is preferably 40% by weight or more with respect to the total amount of monomer components constituting the base polymer, more preferably 50% by weight or more, and still more preferably 55% by weight or more.
丙烯酸系基礎聚合物較佳為含有具有能夠交聯之官能基之單體成分作為共聚成分。藉由於基礎聚合物中導入交聯結構,存在凝集力提昇,黏著劑層2之接著力提昇,並且二次加工時之於被黏著體之糊劑殘留減少之傾向。The acrylic base polymer preferably contains a monomer component having a crosslinkable functional group as a copolymer component. Due to the introduction of a cross-linked structure in the base polymer, the cohesive force increases, the adhesive force of the
作為具有能夠交聯之官能基之單體,可列舉含羥基單體、或含羧基單體。基礎聚合物之羥基或羧基成為與後述交聯劑之反應點。例如,於使用異氰酸酯系交聯劑之情形時,較佳為含有含羥基單體作為基礎聚合物之共聚成分。於使用環氧系交聯劑之情形時,較佳為含有含羧基單體作為基礎聚合物之共聚成分。Examples of the monomer having a crosslinkable functional group include a hydroxyl group-containing monomer or a carboxyl group-containing monomer. The hydroxyl group or carboxyl group of the base polymer becomes the reaction point with the crosslinking agent mentioned later. For example, when an isocyanate-based crosslinking agent is used, it is preferably a copolymerization component containing a hydroxyl-containing monomer as a base polymer. When an epoxy-based crosslinking agent is used, it is preferably a copolymer component containing a carboxyl group-containing monomer as a base polymer.
作為含羥基單體,可列舉(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、(甲基)丙烯酸4-(羥甲基)環己基甲酯等。作為含羧基單體,可列舉(甲基)丙烯酸、(甲基)丙烯酸2-羧基乙酯、(甲基)丙烯酸羧基戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸等。Examples of hydroxyl-containing monomers include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, and 6-hydroxyhexyl (meth)acrylate. Ester, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, 4-(hydroxymethyl)cyclohexylmethyl (meth)acrylate Ester etc. Examples of carboxyl group-containing monomers include (meth)acrylic acid, 2-carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, Butenoic acid and so on.
丙烯酸系基礎聚合物中,含羥基單體與含羧基單體之合計量相對於構成單體成分總量較佳為1~30重量%,更佳為2~25重量%,進而較佳為3~20重量%。尤佳為含羧基單體之含量為上述範圍。In the acrylic base polymer, the total amount of the hydroxyl group-containing monomer and the carboxyl group-containing monomer is preferably 1 to 30% by weight, more preferably 2 to 25% by weight, and still more preferably 3 relative to the total amount of constituent monomer components. ~20% by weight. It is particularly preferable that the content of the carboxyl group-containing monomer is in the above range.
丙烯酸系基礎聚合物亦可含有N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基𠰌啉、N-丙烯醯𠰌啉、N-乙烯基羧醯胺類、N-乙烯基己內醯胺等含氮單體作為構成單體成分。The acrylic base polymer may also contain N-vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperidine, vinylpyrrolidone, vinyl Nitrogen-containing monomers such as pyrrole, vinyl imidazole, vinyl azole, vinyl oxoline, N-acryloyl oxoline, N-vinyl carboxamide, N-vinyl caprolactam as constituent monomer components .
丙烯酸系基礎聚合物亦可包含除上述以外之單體成分。丙烯酸系基礎聚合物例如亦可包含乙烯酯單體、芳香族乙烯基單體、含環氧基單體、乙烯醚單體、含磺基單體、含磷酸基單體、含酸酐基單體等作為單體成分。The acrylic base polymer may also contain monomer components other than the above. The acrylic base polymer may also include, for example, vinyl ester monomers, aromatic vinyl monomers, epoxy group-containing monomers, vinyl ether monomers, sulfo group-containing monomers, phosphoric acid group-containing monomers, and acid anhydride group-containing monomers. Etc. as monomer components.
基礎聚合物亦可為實質上不含氮原子者。基礎聚合物之構成元素中之氮之比率亦可為0.1莫耳%以下、0.05莫耳%以下、0.01莫耳%以下、0.005莫耳%以下、0.001莫耳%以下、或0。藉由使用實質上不含氮原子之基礎聚合物,存在可抑制對被黏著體進行過表面活化處理之情形時之光硬化前之黏著劑層之接著力(初期接著力)上升的傾向。The base polymer may be substantially free of nitrogen atoms. The ratio of nitrogen in the constituent elements of the base polymer may be 0.1 mol% or less, 0.05 mol% or less, 0.01 mol% or less, 0.005 mol% or less, 0.001 mol% or less, or 0. By using a base polymer that does not substantially contain nitrogen atoms, there is a tendency to suppress the increase in the adhesive force (initial adhesive force) of the adhesive layer before photocuring when the adherend is subjected to surface activation treatment.
藉由不含含氰基單體、含內醯胺結構單體、含醯胺基單體、含𠰌啉環單體等含氮原子單體作為基礎聚合物之構成單體成分,可獲得實質上不含氮原子之基礎聚合物。再者,於基礎聚合物中導入有交聯結構之情形時,只要交聯結構導入前之聚合物為實質上不含氮原子者即可,交聯劑可包含氮原子。於基礎聚合物實質上不含氮原子之情形時,就提高黏著劑之凝集性之觀點而言,基礎聚合物較佳為包含含羧基單體作為單體成分。By not containing cyano group-containing monomers, internal amide structure monomers, amide group-containing monomers, 𠰌line ring-containing monomers and other nitrogen-containing monomers as the constituent monomer components of the basic polymer, the essential The base polymer does not contain nitrogen atoms. Furthermore, when a cross-linked structure is introduced into the base polymer, it is sufficient that the polymer before the introduction of the cross-linked structure contains substantially no nitrogen atoms, and the cross-linking agent may contain nitrogen atoms. In the case where the base polymer does not substantially contain nitrogen atoms, from the viewpoint of improving the cohesiveness of the adhesive, the base polymer preferably contains a carboxyl group-containing monomer as a monomer component.
光硬化前之黏著劑之接著特性容易受基礎聚合物之構成成分及分子量影響。有基礎聚合物之分子量越大,則黏著劑變得越硬之傾向。丙烯酸系基礎聚合物之重量平均分子量較佳為10萬~500萬,更佳為30萬~300萬,進而較佳為50萬~200萬。再者,於基礎聚合物中導入交聯結構之情形時,所謂基礎聚合物之分子量,係指交聯結構導入前之分子量。The adhesive properties of the adhesive before photocuring are easily affected by the composition and molecular weight of the base polymer. The greater the molecular weight of the base polymer, the harder the adhesive tends to become. The weight average molecular weight of the acrylic base polymer is preferably 100,000 to 5 million, more preferably 300,000 to 3 million, and still more preferably 500,000 to 2 million. Furthermore, when a cross-linked structure is introduced into the base polymer, the molecular weight of the base polymer refers to the molecular weight before the introduction of the cross-linked structure.
就使黏著劑具有適度之柔軟性之觀點而言,丙烯酸系基礎聚合物之玻璃轉移溫度較佳為-10℃以下,更佳為-15℃以下,進而較佳為-20℃以下。丙烯酸系基礎聚合物之玻璃轉移溫度亦可為-25℃以下或-30℃以下。丙烯酸系基礎聚合物之玻璃轉移溫度通常為-100℃以上,亦可為-80℃以上或-70℃以上。From the viewpoint of imparting moderate flexibility to the adhesive, the glass transition temperature of the acrylic base polymer is preferably -10°C or lower, more preferably -15°C or lower, and still more preferably -20°C or lower. The glass transition temperature of the acrylic base polymer can also be -25°C or lower or -30°C or lower. The glass transition temperature of the acrylic base polymer is usually -100°C or higher, but may also be -80°C or higher or -70°C or higher.
藉由使基礎聚合物包含高Tg單體作為構成單體成分,存在黏著劑之凝集力提昇、光硬化前二次加工性優異、光硬化後表現出較高之接著可靠性之傾向。所謂高Tg單體,意指均聚物之玻璃轉移溫度(Tg)較高之單體。作為均聚物之Tg為40℃以上之單體,可列舉:甲基丙烯酸環己酯(Tg:66℃)、甲基丙烯酸四氫糠酯(Tg:60℃)、甲基丙烯酸雙環戊酯(Tg:175℃)、丙烯酸雙環戊酯(Tg:120℃)、甲基丙烯酸異𦯉酯(Tg:173℃)、丙烯酸異𦯉酯(Tg:97℃)、甲基丙烯酸甲酯(Tg:105℃)、甲基丙烯酸1-金剛烷基酯(Tg:250℃)、丙烯酸1-金剛烷基酯(Tg:153℃)等(甲基)丙烯酸酯;甲基丙烯酸(Tg:228℃)、丙烯酸(Tg:106℃)等酸單體等。By including a high Tg monomer as a constituent monomer component in the base polymer, there is a tendency that the cohesive force of the adhesive is improved, the secondary processability before photocuring is excellent, and the adhesion reliability after photocuring is higher. The so-called high Tg monomer means a monomer with a higher glass transition temperature (Tg) of the homopolymer. Monomers with a Tg of 40°C or higher for homopolymers include cyclohexyl methacrylate (Tg: 66°C), tetrahydrofurfuryl methacrylate (Tg: 60°C), and dicyclopentyl methacrylate (Tg: 175°C), dicyclopentyl acrylate (Tg: 120°C), iso-methacrylate (Tg: 173°C), iso-acrylate (Tg: 97°C), methyl methacrylate (Tg: 105°C), 1-adamantyl methacrylate (Tg: 250°C), 1-adamantyl acrylate (Tg: 153°C) and other (meth)acrylates; methacrylic acid (Tg: 228°C) , Acrylic acid (Tg: 106°C) and other acid monomers.
丙烯酸系基礎聚合物中,均聚物之Tg為40℃以上之單體之含量相對於構成單體成分總量較佳為1重量%以上,更佳為2重量%以上,進而較佳為3重量%以上。為了形成具有適度之硬度而二次加工性優異之黏著劑層,作為基礎聚合物之單體成分,較佳為包含均聚物之Tg為80℃以上之單體成分,更佳為包含均聚物之Tg為100℃以上之單體成分。丙烯酸系基礎聚合物中,均聚物之Tg為100℃以上之單體之含量相對於構成單體成分總量較佳為0.1重量%以上,更佳為0.5重量%以上,進而較佳為1重量%以上,尤佳為2重量%以上。另一方面,就使黏著劑具有適度之柔軟性之觀點而言,均聚物之Tg為40℃以上之單體之含量相對於構成單體成分總量較佳為50重量%以下,更佳為40重量%以下,進而較佳為30重量%以下,亦可為20重量%以下或10重量%以下。就相同之觀點而言,均聚物之Tg為80℃以上之單體之含量相對於構成單體成分總量較佳為30重量%以下,更佳為25重量%以下,進而較佳為20重量%以下,亦可為15重量%以下、10重量%以下或5重量%以下。In the acrylic base polymer, the content of the monomer having a Tg of 40°C or higher in the homopolymer is preferably 1% by weight or more, more preferably 2% by weight or more, and still more preferably 3 relative to the total amount of constituent monomer components. More than weight%. In order to form an adhesive layer with moderate hardness and excellent secondary processability, the monomer component of the base polymer preferably includes a monomer component with a homopolymer having a Tg of 80°C or higher, and more preferably includes a homopolymer The Tg of the material is a monomer component above 100°C. In the acrylic base polymer, the content of the monomer having a Tg of 100°C or higher in the homopolymer is preferably 0.1% by weight or more, more preferably 0.5% by weight or more, and more preferably 1 % By weight or more, more preferably 2% by weight or more. On the other hand, from the viewpoint of imparting moderate flexibility to the adhesive, the content of the monomer whose Tg of the homopolymer is 40°C or higher is preferably 50% by weight or less relative to the total amount of constituent monomer components, and more preferably It is 40% by weight or less, more preferably 30% by weight or less, and may be 20% by weight or less or 10% by weight or less. From the same point of view, the content of the monomer having a Tg of 80°C or higher in the homopolymer is preferably 30% by weight or less, more preferably 25% by weight or less, and even more preferably 20% relative to the total amount of constituent monomer components. The weight% or less may also be 15 weight% or less, 10 weight% or less, or 5 weight% or less.
藉由將上述單體成分利用溶液聚合、乳化聚合、塊狀聚合等各種公知之方法進行聚合,可獲得作為基礎聚合物之丙烯酸系聚合物。就黏著劑之接著力、保持力等特性之平衡、或成本等觀點而言,較佳為溶液聚合法。作為溶液聚合之溶劑,使用乙酸乙酯、甲苯等。溶液濃度通常為20~80重量%左右。作為溶液聚合所使用之聚合起始劑,可使用偶氮系、過氧化物系等各種公知者。為了對分子量進行調整,可使用鏈轉移劑。反應溫度通常為50~80℃左右,反應時間通常為1~8小時左右。By polymerizing the above-mentioned monomer components by various known methods such as solution polymerization, emulsion polymerization, and bulk polymerization, an acrylic polymer as a base polymer can be obtained. From the viewpoint of the balance of properties such as adhesive force and retention force of the adhesive, or the viewpoint of cost, the solution polymerization method is preferred. As a solvent for solution polymerization, ethyl acetate, toluene, etc. are used. The concentration of the solution is usually about 20 to 80% by weight. As the polymerization initiator used in the solution polymerization, various known ones such as azo-based and peroxide-based can be used. In order to adjust the molecular weight, a chain transfer agent can be used. The reaction temperature is usually about 50 to 80°C, and the reaction time is usually about 1 to 8 hours.
(低聚物) 黏著劑組合物可除丙烯酸系基礎聚合物以外包含丙烯酸系低聚物。丙烯酸系低聚物含有(甲基)丙烯酸烷基酯作為主要構成單體成分,係重量平均分子量小於上述丙烯酸系基礎聚合物之成分。丙烯酸系低聚物之重量分子量為1000~30000左右,亦可為3000以上、5000以上或7000以上,亦可為25000以下、20000以下或15000以下。(Oligomer) The adhesive composition may contain an acrylic oligomer in addition to the acrylic base polymer. The acrylic oligomer contains alkyl (meth)acrylate as a main constituent monomer component, and is a component having a weight average molecular weight smaller than the above-mentioned acrylic base polymer. The weight molecular weight of the acrylic oligomer is about 1,000 to 30,000, and may also be 3,000 or more, 5,000 or more, or 7,000 or more, or 25,000 or less, 20,000 or less, or 15,000 or less.
作為丙烯酸系低聚物,可較佳地使用包含(甲基)丙烯酸烷基酯作為主要單體成分者。作為丙烯酸系低聚物之構成單體成分,可列舉作為構成丙烯酸系基礎聚合物之單體成分於上文所例示之單體。丙烯酸系低聚物之構成單體成分中之(甲基)丙烯酸烷基酯之含量較佳為相對於構成基礎聚合物之單體成分總量為40重量%以上,更佳為50重量%以上,進而較佳為55重量%以上。就提高低聚物之玻璃轉移溫度之觀點而言,較佳為包含均聚物之Tg為40℃以上之單體作為單體成分。具有羧基之低聚物包含含羧基單體作為單體成分。As the acrylic oligomer, those containing alkyl (meth)acrylate as a main monomer component can be preferably used. Examples of monomer components constituting the acrylic oligomer include the monomers exemplified above as the monomer components constituting the acrylic base polymer. The content of the alkyl (meth)acrylate in the monomer components constituting the acrylic oligomer is preferably 40% by weight or more, and more preferably 50% by weight or more, relative to the total amount of monomer components constituting the base polymer , And more preferably 55% by weight or more. From the viewpoint of increasing the glass transition temperature of the oligomer, it is preferable to include a monomer having a Tg of 40°C or higher as a monomer component. The carboxyl group-containing oligomer contains a carboxyl group-containing monomer as a monomer component.
就提高光硬化後之黏著劑層2之接著力之觀點而言,丙烯酸系低聚物之玻璃轉移溫度較佳為0℃以上,更佳為20℃以上,進而較佳為30℃以上。丙烯酸系低聚物之玻璃轉移溫度亦可為40℃以上或50℃以上。丙烯酸系低聚物之玻璃轉移溫度較佳為高於丙烯酸系基礎聚合物之玻璃轉移溫度。丙烯酸系低聚物之玻璃轉移溫度通常為200℃以下,可為160℃以下、140℃以下、或120℃以下。From the viewpoint of improving the adhesive force of the
丙烯酸系低聚物較佳為具有羧基。丙烯酸系低聚物之酸值例如為10~800 mgKOH/g左右,亦可為20~500 mgKOH/g、30~300 mgKOH/g、或40~200 mgKOH/g。藉由使光硬化性黏著劑組合物含有包含羧基之高Tg低聚物,存在即便於被黏著體表面藉由電漿處理等進行過活化處理之情形時,亦可抑制對被黏著體之初期接著力之上升的傾向。又,藉由使光硬化性黏著劑組合物含有包含羧基之高Tg低聚物,存在光硬化後之黏著劑對經活化處理之被黏著體表現出較高之接著力之傾向。The acrylic oligomer preferably has a carboxyl group. The acid value of the acrylic oligomer is, for example, about 10 to 800 mgKOH/g, and may also be 20 to 500 mgKOH/g, 30 to 300 mgKOH/g, or 40 to 200 mgKOH/g. By making the photocurable adhesive composition contain high Tg oligomers containing carboxyl groups, even when the surface of the adherend is activated by plasma treatment or the like, the initial stage of the adherend can be suppressed Then the tendency of strength to rise. In addition, by making the photocurable adhesive composition contain a high Tg oligomer containing a carboxyl group, there is a tendency for the adhesive after photocuring to exhibit a higher adhesive force to the adherend after the activation treatment.
丙烯酸系低聚物與丙烯酸系基礎聚合物同樣亦可包含能夠交聯之官能基。例如於使用環氧系交聯劑之情形時,若丙烯酸系低聚物具有羧基,則存在藉由丙烯酸系低聚物之羧基與交聯劑之環氧基之反應而被導入交聯結構之情況。The acrylic oligomer and the acrylic base polymer may also contain a functional group capable of crosslinking. For example, when an epoxy-based crosslinking agent is used, if the acrylic oligomer has a carboxyl group, there is a cross-linked structure introduced by the reaction between the carboxyl group of the acrylic oligomer and the epoxy group of the crosslinking agent Happening.
丙烯酸系低聚物亦可為實質上不含氮原子者。低聚物之構成元素中之氮之比率亦可為0.1莫耳%以下、0.05莫耳%以下、0.01莫耳%以下、0.005莫耳%以下、0.001莫耳%以下、或0。The acrylic oligomer may contain substantially no nitrogen atom. The ratio of nitrogen in the constituent elements of the oligomer may be 0.1 mol% or less, 0.05 mol% or less, 0.01 mol% or less, 0.005 mol% or less, 0.001 mol% or less, or 0.
丙烯酸系低聚物可藉由利用各種聚合方法使上述單體成分進行聚合而獲得。於丙烯酸系低聚物之聚合時,亦可使用各種聚合起始劑。又,亦可使用鏈轉移劑,以調整分子量。作為具有羧基丙烯酸系低聚物,亦可使用東亞合成製造之「ARUFON UC-3000」系列等市售品。The acrylic oligomer can be obtained by polymerizing the above-mentioned monomer components by various polymerization methods. In the polymerization of acrylic oligomers, various polymerization initiators can also be used. In addition, a chain transfer agent can also be used to adjust the molecular weight. As an acrylic oligomer having a carboxyl group, commercial products such as the "ARUFON UC-3000" series manufactured by Toagosei can also be used.
黏著劑組合物中之丙烯酸系低聚物之含量並無特別限定。就將光硬化前後之接著力調整為適當之範圍之觀點而言,低聚物相對於基礎聚合物100重量份之量較佳為0.1~20重量份,更佳為0.2~10重量份,進而較佳為0.3~5重量份。The content of the acrylic oligomer in the adhesive composition is not particularly limited. From the viewpoint of adjusting the adhesive force before and after photocuring to an appropriate range, the amount of the oligomer relative to 100 parts by weight of the base polymer is preferably 0.1 to 20 parts by weight, more preferably 0.2 to 10 parts by weight, and further Preferably it is 0.3-5 weight part.
丙烯酸系黏著劑中,有時使用丙烯酸系低聚物作為黏著賦予劑。用作黏著賦予劑之丙烯酸系低聚物之量相對於基礎聚合物100重量份為20重量%以上之情況較多。另一方面,於本發明之用途中,丙烯酸系低聚物之量為少量即可。藉由使用少量之丙烯酸系低聚物,存在對藉由電漿處理等進行過活化處理之被黏著體亦可抑制初期接著力之上升並且可提高光硬化後之接著力的傾向。低聚物相對於基礎聚合物100重量份之量亦可為4重量份以下、3重量份以下、2重量份以下、或1重量份以下。Among acrylic adhesives, acrylic oligomers are sometimes used as adhesion imparting agents. The amount of acrylic oligomer used as an adhesion imparting agent is often 20% by weight or more relative to 100 parts by weight of the base polymer. On the other hand, in the application of the present invention, the amount of acrylic oligomer may be small. By using a small amount of acrylic oligomer, there is a tendency for the adherend that has undergone activation treatment by plasma treatment or the like to suppress the increase in initial adhesion and increase the adhesion after photocuring. The amount of the oligomer relative to 100 parts by weight of the base polymer may be 4 parts by weight or less, 3 parts by weight or less, 2 parts by weight or less, or 1 part by weight or less.
(交聯劑) 就使黏著劑具有適度之凝集力之觀點而言,基礎聚合物中較佳為導入交聯結構。例如,藉由於使基礎聚合物進行聚合後之溶液中添加交聯劑並視需要進行加熱,而導入交聯結構。交聯劑於1分子中具有2個以上之交聯性官能基。交聯劑亦可為1分子中具有3個以上之交聯性官能基者。(Crosslinking agent) From the viewpoint of allowing the adhesive to have a moderate cohesive force, it is preferable to introduce a crosslinked structure into the base polymer. For example, a crosslinking structure is introduced by adding a crosslinking agent to the solution after polymerizing the base polymer and heating as necessary. The crosslinking agent has two or more crosslinkable functional groups in one molecule. The crosslinking agent may have 3 or more crosslinkable functional groups in one molecule.
作為交聯劑,可列舉異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、金屬螯合物系交聯劑等。該等交聯劑與導入至基礎聚合物中之羥基或羧基等官能基反應而形成交聯結構。就與基礎聚合物之羥基或羧基之反應性較高、容易導入交聯結構之方面而言,較佳為異氰酸酯系交聯劑及環氧系交聯劑。Examples of the crosslinking agent include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, azoline-based crosslinking agents, aziridine-based crosslinking agents, carbodiimide-based crosslinking agents, and metal chelate compounds. Department of crosslinking agent and so on. These crosslinking agents react with functional groups such as hydroxyl or carboxyl groups introduced into the base polymer to form a crosslinked structure. In terms of high reactivity with the hydroxyl group or carboxyl group of the base polymer and easy introduction of a crosslinked structure, isocyanate-based crosslinking agents and epoxy-based crosslinking agents are preferred.
作為異氰酸酯系交聯劑,使用1分子中具有2個以上異氰酸基之多異氰酸酯。異氰酸酯系交聯劑亦可為1分子中具有3個以上之異氰酸基者。作為異氰酸酯系交聯劑,例如可列舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族多異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲伸苯基二異氰酸酯、4,4'-二苯甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲伸苯基二異氰酸酯三聚物加成物(例如,Tosoh製造之「Coronate L」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(例如,Tosoh製造之「Coronate HL」)、苯二甲基二異氰酸酯之三羥甲基丙烷加成物(例如,三井化學製造之「Takenate D110N」)、六亞甲基二異氰酸酯之異氰尿酸酯體(例如,Tosoh製造之「Coronate HX」)等異氰酸酯加成物等。As the isocyanate-based crosslinking agent, a polyisocyanate having two or more isocyanate groups in one molecule is used. The isocyanate-based crosslinking agent may have three or more isocyanate groups in one molecule. As the isocyanate-based crosslinking agent, for example, lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; cyclopentyl diisocyanate, cyclohexyl diisocyanate, isophorone diisocyanate, etc. Alicyclic isocyanates; aromatic isocyanates such as 2,4-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, xylylene diisocyanate; trimethylolpropane/phenylene diisocyanate Diisocyanate trimer adduct (for example, "Coronate L" manufactured by Tosoh), trimethylolpropane/hexamethylene diisocyanate adduct (for example, "Coronate HL" manufactured by Tosoh), The trimethylolpropane adduct of xylylene diisocyanate (for example, "Takenate D110N" manufactured by Mitsui Chemicals), the isocyanurate body of hexamethylene diisocyanate (for example, "Coronate HX manufactured by Tosoh") ") and other isocyanate adducts.
作為環氧系交聯劑,可使用1分子中具有2個以上環氧基之多官能環氧化合物。環氧系交聯劑亦可為1分子中具有3個以上或4個以上之環氧基者。環氧系交聯劑之環氧基可為縮水甘油基。作為環氧系交聯劑,例如可列舉:N,N,N',N'-四縮水甘油基-間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油基胺基甲基)環己烷、1,6-己二醇二縮水甘油醚、新戊二醇二縮水甘油醚、乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、聚乙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、山梨糖醇聚縮水甘油醚、甘油聚縮水甘油醚、季戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚、山梨糖醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三(2-羥基乙基)異氰尿酸三縮水甘油酯、間苯二酚二縮水甘油醚、雙酚-S-二縮水甘油醚等。作為環氧系交聯劑,亦可使用Nagase chemteX製造之「DENACOL」、Mitsubishi Gas Chemical製造之「Tetrad X」「Tetrad C」等市售品。As the epoxy-based crosslinking agent, a polyfunctional epoxy compound having two or more epoxy groups in one molecule can be used. The epoxy-based crosslinking agent may have 3 or more or 4 or more epoxy groups in one molecule. The epoxy group of the epoxy-based crosslinking agent may be a glycidyl group. Examples of epoxy-based crosslinking agents include: N,N,N',N'-tetraglycidyl-meta-xylylenediamine, diglycidylaniline, 1,3-bis(N,N-di Glycidyl amino methyl) cyclohexane, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene two Alcohol diglycidyl ether, polypropylene glycol diglycidyl ether, sorbitol polyglycidyl ether, glycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether, sorbitan polyglycidyl ether, three Hydroxymethyl propane polyglycidyl ether, diglycidyl adipate, diglycidyl phthalate, tris(2-hydroxyethyl) isocyanurate triglycidyl, resorcinol diglycidyl ether , Bisphenol-S-diglycidyl ether, etc. As the epoxy-based crosslinking agent, commercially available products such as "DENACOL" manufactured by Nagase chemteX and "Tetrad X" and "Tetrad C" manufactured by Mitsubishi Gas Chemical can also be used.
即便於基礎聚合物實質上不含氮原子之情形時,交聯劑亦可包含氮原子。例如,可於實質上不含氮原子之基礎聚合物中藉由異氰酸酯交聯劑導入交聯結構。於基礎聚合物實質上不含氮原子之情形時,藉由使用環氧系交聯劑等不含氮原子之交聯劑,存在抑制由電漿處理等表面活化處理而引起之初期接著力上升之傾向。Even when the base polymer does not substantially contain nitrogen atoms, the crosslinking agent may contain nitrogen atoms. For example, a cross-linked structure can be introduced into a base polymer that does not substantially contain nitrogen atoms through an isocyanate cross-linking agent. When the base polymer contains substantially no nitrogen atoms, by using a crosslinking agent that does not contain nitrogen atoms, such as an epoxy-based crosslinking agent, it is possible to suppress the increase in initial adhesion caused by surface activation treatment such as plasma treatment The tendency.
交聯劑之使用量只要根據基礎聚合物之組成或分子量等適當地調整即可。交聯劑之使用量相對於基礎聚合物100重量份為0.01~10重量份左右,較佳為0.1~7重量份,更佳為0.2~6重量份,進而較佳為0.3~5重量份。又,交聯劑相對於基礎聚合物100重量份之使用量(重量份)除以交聯劑之官能基當量(g/eq)所得之值較佳為0.00015~0.11,更佳為0.001~0.077,進而較佳為0.003~0.055,尤佳為0.0045~0.044。藉由使交聯劑之使用量大於以永久接著為目的之普通之丙烯酸系之光學用透明黏著劑而使黏著劑具有適度之硬度,存在二次加工時之於被黏著體之糊劑殘留減少、二次加工性提昇之傾向。The amount of the crosslinking agent used may be appropriately adjusted according to the composition or molecular weight of the base polymer. The amount of the crosslinking agent used is about 0.01 to 10 parts by weight relative to 100 parts by weight of the base polymer, preferably 0.1 to 7 parts by weight, more preferably 0.2 to 6 parts by weight, and still more preferably 0.3 to 5 parts by weight. In addition, the amount (parts by weight) of the crosslinking agent used relative to 100 parts by weight of the base polymer divided by the functional group equivalent (g/eq) of the crosslinking agent is preferably 0.00015 to 0.11, more preferably 0.001 to 0.077 , More preferably 0.003 to 0.055, particularly preferably 0.0045 to 0.044. By making the use amount of crosslinking agent larger than the ordinary acrylic optical transparent adhesive for permanent bonding, the adhesive has moderate hardness, and the paste residue on the adherend during secondary processing is reduced. , The tendency of secondary processing to improve.
(交聯促進劑) 黏著劑組合物除交聯劑以外亦可包含交聯促進劑。藉由使用交聯促進劑,能夠使交聯反應(交聯結構向基礎聚合物之導入)有效率地進行。又,藉由使用交聯促進劑向基礎聚合物中導入交聯結構,存在補強膜之黏著劑層對表面進行過活化處理之被黏著體亦表現出較低之初期接著力之傾向。(Crosslinking accelerator) In addition to the crosslinking agent, the adhesive composition may also include a crosslinking accelerator. By using a cross-linking accelerator, the cross-linking reaction (introduction of the cross-linked structure to the base polymer) can proceed efficiently. In addition, by using a cross-linking accelerator to introduce a cross-linked structure into the base polymer, there is a tendency for the adherend whose surface has been activated by the adhesive layer of the reinforcing film to exhibit lower initial adhesion.
作為交聯促進劑,可列舉有機金屬錯合物(螯合物)、金屬與烷氧基之化合物、及金屬與醯氧基之化合物等有機金屬化合物;以及三級胺等。尤其是就抑制常溫之溶液狀態下之交聯反應之進行、確保黏著劑組合物之適用期之觀點而言,較佳為有機金屬化合物。又,就容易遍佈黏著劑層之整個厚度方向導入均一之交聯結構之方面而言,作為交聯促進劑,較佳為常溫下為液體之有機金屬化合物。As the crosslinking accelerator, organometallic compounds such as organometallic complexes (chelates), compounds of metals and alkoxy groups, and compounds of metals and alkoxy groups; and tertiary amines. In particular, from the viewpoint of suppressing the progress of the crosslinking reaction in a solution state at room temperature and ensuring the pot life of the adhesive composition, an organometallic compound is preferred. In addition, in terms of easily introducing a uniform crosslinking structure throughout the entire thickness direction of the adhesive layer, the crosslinking accelerator is preferably an organometallic compound that is liquid at room temperature.
作為有機金屬化合物之金屬,可列舉鐵、錫、鋁、鋯、鋅、鈦、鉛、鈷、鋅等。Examples of the metal of the organometallic compound include iron, tin, aluminum, zirconium, zinc, titanium, lead, cobalt, zinc, and the like.
作為鐵系交聯促進劑,可列舉:三(乙醯丙酮)鐵、三(己烷-2,4-二酮)鐵、三(庚烷-2,4-二酮)鐵、三(庚烷-3,5-二酮)鐵、三(5-甲基己烷-2,4-二酮)鐵、三(辛烷-2,4-二酮)鐵、三(6-甲基庚烷-2,4-二酮)鐵、三(2,6-二甲基庚烷-3,5-二酮)鐵、三(壬烷-2,4-二酮)鐵、三(壬烷-4,6-二酮)鐵、三(2,2,6,6-四甲基庚烷-3,5-二酮)鐵、三(十三烷-6,8-二酮)鐵、三(1-苯基丁烷-1,3-二酮)鐵、三(六氟乙醯丙酮)鐵、三(乙醯乙酸乙酯)鐵、三(乙醯乙酸正丙酯)鐵、三(乙醯乙酸異丙酯)鐵、三(乙醯乙酸正丁酯)鐵、三(乙醯乙酸第二丁酯)鐵、三(乙醯乙酸第三丁酯)鐵、三(丙醯乙酸甲酯)鐵、三(丙醯乙酸乙酯)鐵、三(丙醯乙酸正丙酯)鐵、三(丙醯乙酸異丙酯)鐵、三(丙醯乙酸正丁酯)鐵、三(丙醯乙酸第二丁酯)鐵、三(丙醯乙酸第三丁酯)鐵、三(乙醯乙酸苄酯)鐵、三(丙二酸二甲酯)鐵、三(丙二酸二乙酯)鐵、三甲醇鐵、三乙醇鐵、三異丙醇鐵等。Examples of iron-based crosslinking accelerators include tris(acetone) iron, tris(hexane-2,4-diketone) iron, tris(heptane-2,4-diketone) iron, tris(heptane) iron Alkane-3,5-dione)iron, tris(5-methylhexane-2,4-dione)iron, tris(octane-2,4-dione)iron, tris(6-methylheptane) Alkane-2,4-dione)iron, tris(2,6-dimethylheptane-3,5-dione)iron, tris(nonane-2,4-dione)iron, tris(nonane) -4,6-diketone) iron, tris(2,2,6,6-tetramethylheptane-3,5-dione) iron, tris(tridecane-6,8-dione) iron, Tris(1-phenylbutane-1,3-dione) iron, tris(hexafluoroacetone acetone) iron, tris(ethyl acetylacetate) iron, tris(n-propyl acetylacetate) iron, tris (Isopropyl Acetate) Iron, Tris(n-Butyl Acetate) Iron, Tris(Second Butyl Acetate) Iron, Tris(Tterbutyl Acetate) Iron, Tris(Acetyl Acetate) Methyl ester) iron, tris(ethyl acrylate) iron, tris(n-propyl propyl acetate) iron, tris(isopropyl propyl acetate) iron, tris(n-butyl propyl acetate) iron, tris( (2-butyl acrylate) iron, tris(tert-butyl acrylate) iron, tris(benzyl acetylacetate) iron, tris(dimethyl malonate) iron, tris(diethyl malonate) Ester) iron, iron trimethoxide, iron triethanol, iron triisopropoxide, etc.
作為錫系交聯促進劑,可列舉:二氯化二丁基錫、氧化二丁基錫、二溴化二丁基錫、馬來酸二丁基錫、二月桂酸二丁基錫、二乙酸二丁基錫、硫化二丁基錫、甲氧化三丁基錫、乙酸三丁基錫、乙氧化三乙基錫、乙氧化三丁基錫、氧化二辛基錫、二月桂酸二辛基錫、氯化三丁基錫、三氯乙酸三丁基錫、2-乙基己酸錫等。Examples of tin-based crosslinking accelerators include: dibutyltin dichloride, dibutyltin oxide, dibutyltin dibromide, dibutyltin maleate, dibutyltin dilaurate, dibutyltin diacetate, dibutyltin sulfide, methoxide Tributyl tin, tributyl tin acetate, triethyl tin ethoxide, tributyl tin ethoxide, dioctyl tin oxide, dioctyl tin dilaurate, tributyl tin chloride, tributyl tin trichloroacetate, 2-ethylhexanoic acid Tin etc.
作為鋁系交聯促進劑,可列舉:二異丙醇單第二丁醇鋁、第二丁醇鋁、異丙醇鋁、乙醇鋁、乙醯乙酸乙酯二異丙醇鋁、三乙醯乙酸乙酯鋁、乙醯乙酸烷基酯二異丙醇鋁、單乙醯丙酮雙(乙醯乙酸乙酯)鋁、三乙醯丙酮鋁等。Examples of aluminum-based crosslinking accelerators include: aluminum diisopropoxide, aluminum diisopropoxide, aluminum dibutoxide, aluminum isopropoxide, aluminum ethoxide, ethyl acetate, aluminum diisopropoxide, and triacetate. Aluminum ethyl acetate, Alkyl Acetate Acetate Aluminum Diisopropoxide, Monoacetone Bis(Acetate Acetate) Aluminum, Triacetone Aluminum, etc.
作為鋯系交聯促進劑,可列舉四乙醯丙酮鋯、單乙醯丙酮鋯、三丁醇單丙酮鋯、環烷酸鋯、丙醇鋯、丁醇鋯等。As the zirconium-based crosslinking accelerator, zirconium tetraacetone acetonate, zirconium monoacetone acetonate, zirconium tributoxide monoacetone, zirconium naphthenate, zirconium propoxide, zirconium butoxide, etc. may be mentioned.
作為鋅系交聯促進劑,可列舉環烷酸鋅、2-乙基己酸鋅等。Examples of the zinc-based crosslinking accelerator include zinc naphthenate, zinc 2-ethylhexanoate, and the like.
作為鈦系交聯促進劑,可列舉:二氯化二丁基鈦、鈦酸四丁酯、鈦酸四異丙酯、鈦酸四辛酯、三氯化丁醇鈦、乙醯丙酮鈦、四乙醯丙酮鈦、乙醯乙酸乙酯鈦、乳酸鈦銨鹽、三乙醇胺鈦、二異丙醇雙乙醯丙酮鈦、異硬脂酸鈦、二乙醇胺鈦、胺基乙基胺基乙醇鈦等。As the titanium-based crosslinking accelerator, dibutyl titanium dichloride, tetrabutyl titanate, tetraisopropyl titanate, tetraoctyl titanate, titanium butoxide trichloride, titanium acetone, Titanium tetraacetylacetone, titanium ethyl acetate, titanium ammonium lactate, titanium triethanolamine, titanium diisopropanol diacetone, titanium isostearate, titanium diethanolamine, titanium ethylaminoethyl ethoxide Wait.
作為鉛系交聯促進劑,可列舉油酸鉛、2-乙基己酸鉛、苯甲酸鉛、環烷酸鉛等。Examples of lead-based crosslinking accelerators include lead oleate, lead 2-ethylhexanoate, lead benzoate, and lead naphthenate.
作為鈷系交聯促進劑,可列舉2-乙基己酸鈷、苯甲酸鈷等。Examples of cobalt-based crosslinking accelerators include cobalt 2-ethylhexanoate and cobalt benzoate.
交聯促進劑之使用量只要根據交聯劑之種類及使用量、以及交聯促進劑之種類適當地調整即可。交聯促進劑之使用量一般相對於基礎聚合物100重量份為0.001~2重量份左右。The use amount of the crosslinking accelerator may be appropriately adjusted according to the type and amount of the crosslinking agent, and the type of crosslinking accelerator. The usage amount of the crosslinking accelerator is generally about 0.001 to 2 parts by weight relative to 100 parts by weight of the base polymer.
於對環氧系交聯劑使用交聯促進劑之情形時,交聯促進劑之使用量相對於基礎聚合物100重量份較佳為0.01~2.0重量份。對於環氧系交聯劑,較佳為使用非錫系有機金屬作為交聯促進劑。於對異氰酸酯系交聯劑使用交聯促進劑之情形時,交聯促進劑之使用量較佳為0.001~0.1重量份。When a crosslinking accelerator is used for the epoxy-based crosslinking agent, the amount of the crosslinking accelerator used is preferably 0.01 to 2.0 parts by weight relative to 100 parts by weight of the base polymer. For the epoxy-based crosslinking agent, it is preferable to use a non-tin-based organic metal as the crosslinking accelerator. When a crosslinking accelerator is used for the isocyanate-based crosslinking agent, the amount of the crosslinking accelerator used is preferably 0.001 to 0.1 parts by weight.
黏著劑組合物亦可除交聯促進劑以外包含交聯延遲劑。藉由添加交聯延遲劑,能夠抑制常溫之溶液狀態下之交聯反應之進行,從而使黏著劑組合物之適用期變長。作為交聯延遲劑,可列舉乙醯乙酸甲酯、乙醯乙酸乙酯、乙醯乙酸辛酯、乙醯乙酸油酯、乙醯乙酸月桂酯、乙醯乙酸硬脂酯等β-酮酯;乙醯丙酮、2,4-己二酮、苯甲醯基丙酮等β-二酮;第三丁醇等醇類。其中,較佳為β-二酮,尤佳為乙醯丙酮。交聯延遲劑之使用量相對於黏著劑組合物總量100重量份為0.1~30重量份左右,較佳為25重量份以下,更佳為20重量份以下。The adhesive composition may also include a crosslinking retarder in addition to the crosslinking accelerator. By adding a crosslinking retarder, the progress of the crosslinking reaction in a solution state at room temperature can be inhibited, thereby prolonging the pot life of the adhesive composition. As the crosslinking retarder, β-ketoesters such as methyl acetylacetate, ethyl acetylacetate, octyl acetylacetate, oleyl acetylacetate, lauryl acetylacetate, and stearyl acetylacetate; Β-diketones such as acetone, 2,4-hexanedione, and benzylacetone; alcohols such as tertiary butanol. Among them, β-diketone is preferred, and acetone is particularly preferred. The amount of the crosslinking retarder used is about 0.1-30 parts by weight relative to 100 parts by weight of the total adhesive composition, preferably 25 parts by weight or less, and more preferably 20 parts by weight or less.
(光硬化劑)
構成黏著劑層2之黏著劑組合物除基礎聚合物以外含有光硬化劑。包含光硬化性之黏著劑組合物之黏著劑層2若於與被黏著體貼合後進行光硬化,則與被黏著體之接著力提昇。(Light Hardener)
The adhesive composition constituting the
光硬化劑於1分子中具有2個以上聚合性官能基。作為聚合性官能基,較佳為具有基於光自由基反應之聚合性者,作為光硬化劑,較佳為於1分子中具有2個以上之乙烯性不飽和鍵之化合物。又,光硬化劑較佳為表現出與基礎聚合物之相溶性之化合物。就表現出與基礎聚合物之適度之相溶性之方面而言,光硬化劑較佳為常溫下為液體者。藉由使光硬化劑與基礎聚合物相溶且於組合物中均勻地分散,能夠確保與被黏著體之接觸面積,且能夠形成透明性較高之黏著劑層2。又,藉由使基礎聚合物與光硬化劑表現出適度之相溶性,容易於光硬化後之黏著劑層2內均勻地導入藉由光硬化劑而得之交聯結構,從而存在與被黏著體之接著力適當地上升之傾向。The light curing agent has two or more polymerizable functional groups in one molecule. As the polymerizable functional group, those having polymerizability based on photoradical reaction are preferred, and as the light curing agent, a compound having two or more ethylenically unsaturated bonds in one molecule is preferred. In addition, the light hardener is preferably a compound exhibiting compatibility with the base polymer. In terms of exhibiting moderate compatibility with the base polymer, the light hardener is preferably one that is liquid at room temperature. By dissolving the light hardener and the base polymer and uniformly dispersing in the composition, the contact area with the adherend can be ensured, and the
基礎聚合物與光硬化劑之相溶性主要受化合物之結構之影響。化合物之結構與相溶性例如可藉由Hansen溶解度參數進行評價,存在基礎聚合物與光硬化劑之溶解度參數之差越小,相溶性變得越高之傾向。The compatibility of the base polymer and the light hardener is mainly affected by the structure of the compound. The structure and compatibility of the compound can be evaluated by, for example, the Hansen solubility parameter. The smaller the difference between the solubility parameter of the base polymer and the light hardener, the higher the compatibility.
就與丙烯酸系基礎聚合物之相溶性較高之方面而言,較佳為使用多官能(甲基)丙烯酸酯作為光硬化劑。作為多官能(甲基)丙烯酸酯,可列舉:聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚四亞甲基二醇二(甲基)丙烯酸酯、雙酚A環氧乙烷改性二(甲基)丙烯酸酯、雙酚A環氧丙烷改性二(甲基)丙烯酸酯、烷二醇二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、乙氧化異三聚氰酸三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、乙氧化季戊四醇四(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇聚(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、(甲基)丙烯酸胺基甲酸酯、環氧(甲基)丙烯酸酯、丁二烯(甲基)丙烯酸酯、異戊二烯(甲基)丙烯酸酯等。該等之中,就與丙烯酸系基礎聚合物之相溶性優異之方面而言,較佳為聚乙二醇二(甲基)丙烯酸酯或聚丙二醇二(甲基)丙烯酸酯,尤佳為聚乙二醇二(甲基)丙烯酸酯。光硬化劑亦可將2種以上併用。In terms of high compatibility with the acrylic base polymer, it is preferable to use a polyfunctional (meth)acrylate as a light hardener. Examples of polyfunctional (meth)acrylates include polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, Bisphenol A ethylene oxide modified di(meth)acrylate, bisphenol A propylene oxide modified di(meth)acrylate, alkanediol di(meth)acrylate, tricyclodecane dimethanol Di(meth)acrylate, ethoxylated isocyanuric acid tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol di(meth)acrylate, trimethylolpropane tri(methyl) ) Acrylate, di-trimethylolpropane tetra(meth)acrylate, ethoxylated pentaerythritol tetra(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate, two Pentaerythritol hexa(meth)acrylate, neopentyl glycol di(meth)acrylate, glycerol di(meth)acrylate, (meth)acrylate urethane, epoxy (meth)acrylate, Butadiene (meth)acrylate, isoprene (meth)acrylate, etc. Among them, in terms of excellent compatibility with acrylic base polymers, polyethylene glycol di(meth)acrylate or polypropylene glycol di(meth)acrylate is preferred, and poly(meth)acrylate is particularly preferred. Ethylene glycol di(meth)acrylate. Two or more types of light hardeners may be used in combination.
基礎聚合物與光硬化劑之相溶性亦受化合物之分子量影響。存在光硬化性化合物之分子量越小,與基礎聚合物之相溶性變得越高之傾向。就與基礎聚合物之相溶性之觀點而言,光硬化劑之分子量較佳為1500以下,更佳為1000以下,進而較佳為500以下,尤佳為400以下。The compatibility of the base polymer and the light hardener is also affected by the molecular weight of the compound. There is a tendency that the lower the molecular weight of the photocurable compound, the higher the compatibility with the base polymer. From the viewpoint of compatibility with the base polymer, the molecular weight of the light hardener is preferably 1500 or less, more preferably 1000 or less, still more preferably 500 or less, and particularly preferably 400 or less.
就與基礎聚合物之相溶性較高、且提昇光硬化後之接著力之觀點而言,光硬化劑之官能基當量(g/eq)較佳為500以下,更佳為400以下,進而較佳為300以下,尤佳為200以下。另一方面,若光硬化劑之官能基當量過小,則存在光硬化後之黏著劑層之交聯點密度變高、接著性降低之情況。因此,光硬化劑之官能基當量較佳為80以上,更佳為100以上,進而較佳為130以上。From the viewpoint of high compatibility with the base polymer and improvement of the adhesive force after light curing, the functional group equivalent (g/eq) of the light curing agent is preferably 500 or less, more preferably 400 or less, and more Preferably it is 300 or less, particularly preferably 200 or less. On the other hand, if the functional group equivalent of the photocuring agent is too small, the crosslinking point density of the adhesive layer after photocuring may increase and the adhesiveness may decrease. Therefore, the functional group equivalent of the light hardener is preferably 80 or more, more preferably 100 or more, and still more preferably 130 or more.
於丙烯酸系基礎聚合物與多官能丙烯酸酯光硬化劑之組合中,於光硬化劑之官能基當量較小之情形時,存在基礎聚合物與光硬化劑之相互作用較強,初期接著力上升,而引起二次加工性之降低之情況。就使光硬化前之黏著劑層2與被黏著體之接著力保持為適當之範圍之觀點而言,亦較佳為光硬化劑之官能基當量為上述範圍內。In the combination of acrylic base polymer and multifunctional acrylate light hardening agent, when the functional group equivalent of the light hardening agent is small, the interaction between the base polymer and the light hardening agent is stronger, and the initial adhesive force increases , And cause the reduction of secondary processing. From the viewpoint of keeping the adhesive force between the
黏著劑組合物中之光硬化劑之含量相對於基礎聚合物100重量份較佳為10~50重量份。藉由將光硬化劑之調配量設為上述範圍,能夠將光硬化後之黏著劑層與被黏著體之接著性調整至適當之範圍。光硬化劑之含量相對於基礎聚合物100重量份更佳為15~45重量份,進而較佳為20~40重量份。The content of the light hardener in the adhesive composition is preferably 10-50 parts by weight relative to 100 parts by weight of the base polymer. By setting the blending amount of the light curing agent within the above range, the adhesiveness of the adhesive layer after light curing and the adherend can be adjusted to an appropriate range. The content of the light hardener is more preferably 15 to 45 parts by weight, and still more preferably 20 to 40 parts by weight relative to 100 parts by weight of the base polymer.
(光聚合起始劑) 光聚合起始劑係藉由活性光線之照射而產生活性種,促進光硬化劑之硬化反應。作為光聚合起始劑,可根據光硬化劑之種類等而使用光陽離子起始劑(光酸產生劑)、光自由基起始劑、光陰離子起始劑(光鹼產生劑)等。於使用多官能丙烯酸酯等乙烯性不飽和化合物作為光硬化劑之情形時,較佳為使用光自由基起始劑作為聚合起始劑。(Photopolymerization initiator) The photopolymerization initiator is irradiated with active light to generate active species to promote the hardening reaction of the light hardener. As the photopolymerization initiator, a photocation initiator (photoacid generator), a photoradical initiator, a photoanion initiator (photobase generator), etc. can be used according to the kind of the photohardener or the like. When using an ethylenically unsaturated compound such as a polyfunctional acrylate as a light hardening agent, it is preferable to use a photo radical initiator as a polymerization initiator.
光自由基起始劑係藉由活性光線之照射而生成自由基,並藉由自光自由基起始劑向光硬化劑之自由基轉移而促進光硬化劑之自由基聚合反應。作為光自由基起始劑(光自由基產生劑),較佳為藉由波長短於450 nm之可見光或紫外線之照射生成自由基者,可列舉羥基酮類、苯偶醯二甲基縮酮類、胺基酮類、醯基膦氧化物類、二苯甲酮類、含三氯甲基之三𠯤衍生物等。光自由基起始劑可單獨使用,亦可將2種以上混合使用。The photo-radical initiator generates free radicals by the irradiation of active light, and promotes the radical polymerization reaction of the photo-hardener by free radical transfer from the photo-radical initiator to the photohardener. As the photo-radical initiator (photo-radical generator), it is preferable to generate free radicals by irradiation of visible light or ultraviolet light with a wavelength shorter than 450 nm, and examples include hydroxy ketones and benzyl dimethyl ketals. Ketones, aminoketones, phosphine oxides, benzophenones, trichloromethyl-containing three 𠯤 derivatives, etc. The photo-radical initiator may be used alone or in combination of two or more kinds.
於對黏著劑層2要求透明性之情形時,光聚合起始劑較佳為對長於400 nm之波長之光(可見光)之感度較小,例如可良好地使用波長405 nm下之吸光係數為1×102
[mLg-1
cm-1
]以下之光聚合起始劑。When transparency is required for the
黏著劑層2中之光聚合起始劑之含量相對於基礎聚合物100重量份較佳為0.01~5重量份,更佳為0.02~3重量份,進而較佳為0.03~2重量份。黏著劑層2中之光聚合起始劑之含量相對於光硬化劑100重量份較佳為0.02~10重量份,更佳為0.05~7重量份,進而較佳為0.1~5重量份。The content of the photopolymerization initiator in the
(其他添加劑) 除上述例示之各成分以外,黏著劑層亦可於無損本發明之特性之範圍內含有矽烷偶合劑、黏著性賦予劑、塑化劑、軟化劑、抗氧化劑、抗劣化劑、填充劑、著色劑、紫外線吸收劑、界面活性劑、抗靜電劑等添加劑。(Other additives) In addition to the components exemplified above, the adhesive layer may also contain silane coupling agents, adhesiveness imparting agents, plasticizers, softeners, antioxidants, anti-deterioration agents, fillers, and coloring within the range that does not impair the characteristics of the present invention. Additives such as agents, ultraviolet absorbers, surfactants, and antistatic agents.
[補強膜之製作]
藉由於膜基材1上積層光硬化性之黏著劑層2,而獲得補強膜。黏著劑層2可於膜基材1上直接形成,亦可將於其他基材上片狀地形成之黏著劑層轉印至膜基材1上。[Production of Reinforcing Film]
The photocurable
藉由將上述黏著劑組合物利用輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥式刷塗、噴塗、浸漬輥塗佈、棒式塗佈、刮塗、氣刀刮塗、淋幕式塗佈、唇板塗佈、模嘴塗佈等塗佈於基材上,並視需要將溶劑進行乾燥去除,而形成黏著劑層。作為乾燥方法,可酌情採用適當之方法。加熱乾燥溫度較佳為40℃~200℃,更佳為50℃~180℃,進而較佳為70℃~170℃。乾燥時間較佳為5秒~20分鐘,更佳為5秒~15分鐘,進而較佳為10秒~10分鐘。By applying the above-mentioned adhesive composition using roll coating, touch roll coating, gravure coating, reverse coating, roll brushing, spraying, dipping roll coating, bar coating, blade coating, gas Knife coating, curtain coating, lip coating, die nozzle coating, etc. are coated on the substrate, and the solvent is dried and removed as needed to form an adhesive layer. As the drying method, an appropriate method can be adopted as appropriate. The heating and drying temperature is preferably 40°C to 200°C, more preferably 50°C to 180°C, and still more preferably 70°C to 170°C. The drying time is preferably 5 seconds to 20 minutes, more preferably 5 seconds to 15 minutes, and still more preferably 10 seconds to 10 minutes.
黏著劑層2之厚度例如為1~300 μm左右。存在黏著劑層2之厚度越大,與被黏著體之接著性越會提昇之傾向。另一方面,於黏著劑層2之厚度過大之情形時,存在光硬化前之流動性較高、操作變得困難之情況。因此,黏著劑層2之厚度較佳為5~100 μm,更佳為8~50 μm,進而較佳為10~40 μm,尤佳為13~30 μm。The thickness of the
於黏著劑組合物含有交聯劑之情形時,較佳為與溶劑之乾燥同時、或於溶劑之乾燥後藉由加熱或老化進行交聯。加熱溫度或加熱時間係根據使用之交聯劑之種類適當地設定,通常於20℃~160℃之範圍藉由1分鐘至7天左右之加熱進行交聯。用以將溶劑進行乾燥去除之加熱亦可兼作用於交聯之加熱。When the adhesive composition contains a crosslinking agent, it is preferable to perform crosslinking simultaneously with the drying of the solvent or by heating or aging after the drying of the solvent. The heating temperature or heating time is appropriately set according to the type of crosslinking agent used, and the crosslinking is usually performed by heating in the range of 20°C to 160°C for about 1 minute to 7 days. The heating used to dry and remove the solvent can also serve as the heating for crosslinking.
藉由於基礎聚合物中導入交聯結構,凝膠分率上升。存在凝膠分率越高,黏著劑越硬,於因二次加工等而自被黏著體剝離補強膜時,可抑制向被黏著體之糊劑殘留之傾向。光硬化前之黏著劑層2之凝膠分率較佳為30%以上,更佳為50%以上,進而較佳為60%以上,尤佳為65%以上。黏著劑層2之光硬化前之凝膠分率亦可為70%以上或75%以上。The introduction of a cross-linked structure into the base polymer increases the gel fraction. The higher the gel fraction, the harder the adhesive, and when the reinforcing film is peeled from the adherend due to secondary processing, etc., the tendency of the paste to remain on the adherend can be suppressed. The gel fraction of the
由於黏著劑含有未反應之光硬化劑,故而光硬化前之黏著劑層2之凝膠分率一般為90%以下。若光硬化前之黏著劑層2之凝膠分率過大,則存在對被黏著體之抓固力降低、初期接著力變得不充分之情況。因此,光硬化前之黏著劑層2之凝膠分率較佳為85%以下,更佳為80%以下。Since the adhesive contains an unreacted light hardening agent, the gel fraction of the
凝膠分率可作為對乙酸乙酯等溶劑之不溶物而求出,具體而言,作為將黏著劑層於乙酸乙酯中於23℃下浸漬7天後之不溶成分相對於浸漬前之試樣之重量分率(單位:重量%)而求出。一般而言,聚合物之凝膠分率與交聯度相等,聚合物中之經交聯之部分越多,凝膠分率變得越大。因此,存在交聯劑之使用量(交聯性官能基之含量)越多,凝膠分率變得越大之傾向。又,藉由使用交聯促進劑,交聯劑之未反應官能基之量會減少,因此存在凝膠分率變大之傾向。光硬化前之黏著劑層2中,由於光硬化劑為未反應之狀態,故而光硬化劑之量越多,凝膠分率變得越小。The gel fraction can be determined as the insoluble matter in a solvent such as ethyl acetate. Specifically, as the insoluble matter after immersing the adhesive layer in ethyl acetate at 23°C for 7 days compared to the test before immersion The weight fraction of the sample (unit: weight %) is calculated. Generally speaking, the gel fraction of a polymer is equal to the degree of crosslinking. The more crosslinked parts in the polymer, the greater the gel fraction. Therefore, the more the amount of crosslinking agent used (the content of crosslinkable functional groups), the greater the gel fraction tends to be. In addition, by using a crosslinking accelerator, the amount of unreacted functional groups of the crosslinking agent is reduced, so there is a tendency for the gel fraction to increase. In the
藉由交聯劑於聚合物中導入交聯結構後,光硬化劑亦維持未反應之狀態。因此,形成包含基礎聚合物及光硬化劑之光硬化性之黏著劑層2。於在膜基材1上形成黏著劑層2之情形時,較佳為以黏著劑層2之保護等為目的於黏著劑層2上附設隔離件5。亦可於黏著劑層2上附設隔離件5後進行交聯。After the crosslinking structure is introduced into the polymer by the crosslinking agent, the light hardener also maintains an unreacted state. Therefore, a photo-
於在其他基材上形成黏著劑層2之情形時,藉由於使溶劑乾燥後將黏著劑層2轉印至膜基材1上而獲得補強膜。亦可將黏著劑層之形成所使用之基材直接作為隔離件5。In the case of forming the
作為隔離件5,可良好地使用聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯膜等塑膠膜。隔離件之厚度通常為3~200 μm,較佳為10~100 μm左右。較佳為對隔離件5之與黏著劑層2之接觸面實施藉由聚矽氧系、氟系、長鏈烷基系、或者脂肪醯胺系等脫模劑、或二氧化矽粉等進行之脫模處理。藉由對隔離件5之表面進行脫模處理,於將膜基材1與隔離件5剝離時,可維持於黏著劑層2與隔離件5之界面產生剝離、於膜基材1上固著黏著劑層2之狀態。As the separator 5, plastic films such as polyethylene, polypropylene, polyethylene terephthalate, and polyester films can be suitably used. The thickness of the spacer is usually 3 to 200 μm, preferably about 10 to 100 μm. Preferably, the contact surface between the spacer 5 and the
[補強膜之使用] 本發明之補強膜係貼合於裝置或裝置構成零件而使用。供補強膜貼合之被黏著體並無特別限定,可列舉各種電子裝置、光學裝置及其構成零件等。補強膜可貼合於被黏著體之整個面,亦可選擇性地僅貼合於需要補強之部分。又,亦可將補強膜貼合於被黏著體之整個面之後,將無需補強之部位之補強膜切斷,並將補強膜剝離去除。只要為使黏著劑光硬化之前,則補強膜係暫黏於被黏著體表面之狀態,因此能夠自被黏著體之表面容易地將補強膜剝離去除。[Use of Reinforcing Film] The reinforcing film of the present invention is used by sticking to the device or device constituent parts. The adherend to which the reinforcing film is attached is not particularly limited, and various electronic devices, optical devices, and their constituent parts can be cited. The reinforcing film can be attached to the entire surface of the adherend, or can be selectively attached only to the part that needs reinforcement. In addition, after the reinforcing film is attached to the entire surface of the adherend, the reinforcing film at the part that does not need to be reinforced can be cut, and the reinforcing film can be peeled off. As long as it is before the adhesive is photocured, the reinforcing film is temporarily stuck to the surface of the adherend, so the reinforcing film can be easily peeled off from the surface of the adherend.
由於藉由貼合補強膜而賦予適度之剛性,因此可期待提昇操作性或防止破損效果。於裝置之製造步驟中,於對半成品貼合補強膜之情形時,可對切斷成製品尺寸之前之大的半成品貼合補強膜。亦可將補強膜以卷對卷(roll to roll)貼合於藉由卷對卷處理而製造之裝置之母輥。Since appropriate rigidity is imparted by laminating the reinforcing film, the effect of improving the operability and preventing damage can be expected. In the manufacturing steps of the device, when the reinforcing film is attached to the semi-finished product, the reinforcing film can be attached to the semi-finished product that is larger than the size of the product before being cut. The reinforcing film can also be attached to the mother roll of the device manufactured by the roll to roll process in roll to roll.
<光硬化前之黏著劑層之特性>
補強膜10中,黏著劑層2與膜基材1固著,於與被黏著體貼合後且光硬化前,對被黏著體之接著力較小。因此,光硬化前,補強膜自被黏著體之剝離較容易,二次加工性優異。又,光硬化前,將補強膜切斷並將被黏著體表面之一部分之區域之補強膜去除等加工亦可容易地進行。<Characteristics of the adhesive layer before light curing>
In the reinforcing
(接著力)
就使自被黏著體之剝離容易、防止向補強膜剝離後之被黏著體之糊劑殘留之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力(初期接著力)較佳為1 N/25 mm以下,更佳為0.7 N/25 mm以下,進而較佳為0.5 N/25 mm以下。光硬化前之黏著劑層2與被黏著體之接著力亦可為0.4 N/25 mm以下、0.3 N/25 mm以下或0.2 N/25 mm以下。就防止保管或操作時之補強膜之剝離之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力較佳為0.005 N/25 mm以上,更佳為0.01 N/25 mm以上,進而較佳為0.03 N/25 mm以上。初期接著力亦可為0.05 N/25 mm以上、0.07 N/25 mm以上或0.1 N/25 mm以上。(Adhesion)
From the standpoint of making it easy to peel from the adherend and preventing the paste remaining on the adherend after peeling off the reinforcing film, the
補強膜較佳為於使黏著劑層光硬化前之狀態下對聚醯亞胺膜之接著力為上述範圍內。於撓性顯示面板、撓性印刷配線板(FPC)、將顯示面板與配線板一體化而成之裝置等中,使用可撓性之基板材料,就耐熱性或尺寸穩定性之觀點而言,一般使用聚醯亞胺膜。黏著劑層對作為基板之聚醯亞胺膜具有上述接著力之補強膜於黏著劑之光硬化前容易剝離,光硬化後接著可靠性優異。The reinforcing film preferably has an adhesive force to the polyimide film in the state before the adhesive layer is photocured within the above range. In flexible display panels, flexible printed wiring boards (FPC), devices that integrate display panels and wiring boards, etc., flexible substrate materials are used. From the viewpoint of heat resistance or dimensional stability, Polyimide films are generally used. The adhesive layer has the above-mentioned adhesive force to the polyimide film as the substrate, and the reinforcing film is easily peeled off before the adhesive is photocured, and the adhesion reliability after photocuring is excellent.
亦可於貼合補強膜之前為了潔淨化等而對裝置表面之聚醯亞胺膜等被黏著體進行活化處理。作為表面活化處理,可列舉電漿處理、電暈處理、輝光放電處理等。尤其是就可於大氣壓之下進行處理、活化效果較高之方面而言,較佳為大氣壓電漿處理。It is also possible to activate the adherends such as the polyimide film on the surface of the device for the purpose of cleaning before attaching the reinforcing film. Examples of surface activation treatment include plasma treatment, corona treatment, glow discharge treatment, and the like. Especially in terms of processing under atmospheric pressure and high activation effect, atmospheric pressure slurry processing is preferable.
若對被黏著體進行表面活化處理,則存在與未進行表面活化處理之情形相比,光硬化前之黏著劑層2與被黏著體之接著力變高之傾向。若光硬化前之黏著劑層與被黏著體之接著力過大,則存在二次加工變得困難之情況。因此,進行過表面活化處理之被黏著體與光硬化前之黏著劑層之接著力較佳為未進行過表面活化處理之被黏著體與光硬化前之黏著劑層之接著力之2倍以下,更佳為1.5倍以下,進而較佳為1.4倍以下,亦可為1.3倍以下或1.2倍以下。If the surface activation treatment is performed on the adherend, the adhesion between the
於本發明中,藉由使黏著劑除基礎聚合物以外含有包含羧基之高Tg低聚物,即便於對被黏著體進行過表面活化處理之情形時,亦可將光硬化前之黏著劑層之接著力(初期接著力)抑制得較低。因此,即便於對聚醯亞胺膜等被黏著體進行過表面活化處理之情形時,亦與不進行表面活化處理之情形同樣地容易二次加工。又,藉由使黏著劑含有包含羧基之高Tg低聚物,存在光硬化後之黏著劑對進行過表面活化處理之被黏著體表現出較高之接著性之傾向,接著可靠性優異。In the present invention, by making the adhesive contain a high Tg oligomer containing a carboxyl group in addition to the base polymer, even when the adherend is subjected to surface activation treatment, the adhesive layer before photocuring can be The adhesive force (initial adhesive force) is suppressed low. Therefore, even when surface activation treatment is performed on an adherend such as a polyimide film, secondary processing is easy as in the case where the surface activation treatment is not performed. Furthermore, by making the adhesive contain a high Tg oligomer containing a carboxyl group, the adhesive after photocuring tends to exhibit higher adhesion to the adherend subjected to the surface activation treatment, and the bonding reliability is excellent.
藉由添加低聚物會抑制對經表面活化處理之被黏著體之初期接著力之上升並且提高光硬化後之接著力之原因並不確定,推定與如下情況相關:藉由添加少量之低聚物,不會大幅改變黏著劑之整體特性,但與被黏著體之接著界面之特性會產生變化。By adding oligomers, the increase in the initial adhesion to the surface-activated adherend and the increase in the adhesion after photocuring is not certain. It is presumed to be related to the following situation: By adding a small amount of oligomers It will not greatly change the overall characteristics of the adhesive, but the characteristics of the interface with the adherend will change.
(儲存模數)
黏著劑層2較佳為光硬化前之25℃下之剪切儲存模數G'i
為1×104
~1.2×105
Pa。剪切儲存模數(以下,僅記載為「儲存模數」)係藉由讀取依據JIS K7244-1「塑膠-動態機械特性之試驗方法」所記載之方法於頻率1 Hz之條件下於-50~150℃之範圍以升溫速度5℃/min進行測定時的特定溫度下之值而求出。(Storage modulus) The
於如黏著劑般表現出黏彈性之物質中,儲存模數G'用作表示硬度之程度之指標。黏著劑層之儲存模數與凝集力具有較高之關聯,存在黏著劑之凝集力越高,於被黏著體之抓固力變得越大之傾向。光硬化前之黏著劑層2之儲存模數只要為1×104
Pa以上,則黏著劑具有充分之硬度及凝集力,因此於自被黏著體將補強膜剝離時不易產生於被黏著體之糊劑殘留。又,於黏著劑層2之儲存模數較大之情形時,可抑制黏著劑自補強膜之端面溢出。光硬化前之黏著劑層2之儲存模數只要為1.2×105
Pa以下,則於黏著劑層2與被黏著體之界面之剝離容易,於進行二次加工之情形時,亦不易產生黏著劑層之凝集破壞或於被黏著體表面之糊劑殘留。In a substance that exhibits viscoelasticity like an adhesive, the storage modulus G'is used as an indicator of the degree of hardness. The storage modulus of the adhesive layer has a higher correlation with the cohesive force. The higher the cohesive force of the adhesive, the greater the gripping force of the adherend. As long as the storage modulus of the
就提高補強膜之二次加工性從而抑制二次加工時之於被黏著體之糊劑殘留之觀點而言,黏著劑層2之光硬化前之25℃下之儲存模數G'i 更佳為3×104 ~1×105 Pa,進而較佳為4×104 ~9.5×104 Pa。Secondary processing to improve the reinforcing of film to suppress the residual paste in view of the adhesion of the body in terms of secondary processing, storage under the adhesive layer of the front light 25 2 deg.] C and cured modulus G 'i better It is 3×10 4 to 1×10 5 Pa, more preferably 4×10 4 to 9.5×10 4 Pa.
<黏著劑層之光硬化>
藉由將補強膜貼合於被黏著體之後對黏著劑層2照射活性光線,而使黏著劑層光硬化。作為活性光線,可列舉紫外線、可見光、紅外線、X射線、α射線、β射線、及γ射線等。就能夠抑制保管狀態下之黏著劑層之硬化且容易硬化之方面而言,作為活性光線,較佳為紫外線。活性光線之照射強度或照射時間根據黏著劑層之組成或厚度等適當設定即可。對黏著劑層2之活性光線之照射可自膜基材1側及被黏著體側之任一面實施,亦可自兩面進行活性光線之照射。<Light hardening of adhesive layer>
After bonding the reinforcing film to the adherend, the
<光硬化後之黏著劑層之特性>
(接著力)
就裝置之實用時之接著可靠性之觀點而言,光硬化後之黏著劑層2與被黏著體之接著力較佳為2 N/25 mm以上,更佳為3 N/25 mm以上,進而較佳為5 N/25 mm以上。使黏著劑層光硬化後之補強膜與被黏著體之接著力亦可為6 N/25 mm以上、8 N/25 mm以上、10 N/25 mm以上、13 N/25 mm以上、15 N/25 mm以上、或20 N/25 mm以上。補強膜較佳為光硬化後之黏著劑層對聚醯亞胺膜具有上述範圍之接著力。光硬化後之黏著劑層2與被黏著體之接著力較佳為光硬化前之黏著劑層2與被黏著體之接著力之5倍以上,更佳為10倍以上。光硬化後之黏著劑層與被黏著體之接著力亦可為光硬化前之黏著劑層與被黏著體之接著力之20倍以上、50倍以上、80倍以上、100倍以上、120倍以上或140倍以上。<Characteristics of the adhesive layer after light curing>
(Adhesion)
From the viewpoint of the bonding reliability of the device in practical use, the bonding force between the
如上所述,藉由使黏著劑之基礎聚合物不含氮原子,存在可抑制因被黏著體之表面活化處理而引起之初期接著力之上升之傾向。另一方面,於對被黏著體進行過表面活化處理之情形時,與未進行被黏著體之表面活化處理之情形時相比,存在光硬化後之黏著劑層2與被黏著體之接著力變大之傾向。尤其是藉由使黏著劑組合物含有包含羧基之高Tg低聚物,存在可抑制因表面活化處理而引起之初期接著力之上升,且使黏著劑光硬化後之接著力上升的傾向。即,於使用具備具有特定組成之黏著劑層之補強膜之情形時,藉由對被黏著體實施電漿處理等表面活化處理,會抑制初期接著力之上升,確保二次加工性,並且於光硬化後會實現較高之接著力,可獲得補強膜之接著可靠性優異之裝置。As described above, by making the base polymer of the adhesive free of nitrogen atoms, there is a tendency to suppress the increase in the initial adhesive force caused by the surface activation treatment of the adherend. On the other hand, when the surface activation treatment is performed on the adherend, compared with the case where the surface activation treatment of the adherend is not performed, there is an adhesive force between the
(儲存模數)
黏著劑層2較佳為光硬化後之25℃下之儲存模數G'f
為1.0×105
Pa以上。只要光硬化後之黏著劑層2之儲存模數為1.0×105
Pa以上,則伴隨凝集力之增大,與被黏著體之接著力提昇,可獲得較高之接著可靠性。另一方面,於儲存模數過大之情形時,黏著劑難以潤濕擴展,與被黏著體之接觸面積變小。又,黏著劑之應力分散性降低,因此存在剝離力容易傳播至接著界面,與被黏著體之接著力降低之傾向。因此,黏著劑層2之光硬化後之25℃下之儲存模數G'f
較佳為2×106
Pa以下。就提高使黏著劑層光硬化後之補強膜之接著可靠性之觀點而言,G'f
更佳為1.1×105
~1.2×106
Pa,進而較佳為1.2×105
~1×106
Pa。(Storage modulus) The
黏著劑層2之光硬化前後之25℃下之儲存模數之比G'f
/G'i
較佳為2以上。只要G'f
為G'i
之2倍以上,則藉由光硬化之G'之增加變大,可兼顧光硬化前之二次加工性及光硬化後之接著可靠性。G'f
/G'i
更佳為4以上,進而較佳為8以上,尤佳為10以上。G'f
/G'i
之上限並無特別限定,於G'f
/G'i
過大之情形時,容易導致因光硬化前之G'較小而引起之初期接著不良、或因光硬化後之G'過大而引起之接著可靠性之降低。因此,G'f
/G'i
較佳為100以下,更佳為40以下,進而較佳為30以下,尤佳為25以下。The ratio of the storage modulus G'f /G' i at 25° C. before and after light curing of the
附設補強膜後之被黏著體存在進行以複數個積層構件之積層界面之親和性提昇等為目的之高壓釜處理處理、或用以接合電路構件之熱壓接等加熱處理的情況。於進行此種加熱處理時,較佳為補強膜與被黏著體之間之黏著劑不自端面流動。The adherend after the reinforcement film is attached may be subjected to autoclave treatment for the purpose of enhancing the affinity of the laminate interface of a plurality of laminate members, or heat treatment such as thermocompression bonding for bonding circuit members. When performing such heat treatment, it is preferable that the adhesive between the reinforcing film and the adherend does not flow from the end surface.
就抑制高溫加熱時之黏著劑之溢出之觀點而言,光硬化後之黏著劑層2之100℃下之儲存模數較佳為5×104
Pa以上,更佳為8×104
Pa以上,進而較佳為1×105
Pa以上。就防止加熱時之黏著劑之溢出、以及防止加熱時之接著力降低之觀點而言,光硬化後之黏著劑層2之100℃下之儲存模數較佳為50℃下之儲存模數之60%以上,更佳為65%以上,進而較佳為70%以上,尤佳為75%以上。From the viewpoint of suppressing the overflow of the adhesive during high-temperature heating, the storage modulus at 100°C of the
藉由貼合補強膜,可對作為被黏著體之半成品賦予適度之剛性,並且得以使應力緩和、分散,因此能夠抑制製造步驟中有可能產生之各種不良情況、提昇生產效率、改善良率。又,補強膜由於即便於對被黏著體進行過表面活化處理之情形時,於使黏著劑層光硬化之前,自被黏著體之剝離亦容易,故而於產生積層或貼合不良之情形時亦容易二次加工。使黏著劑層光硬化後,對被黏著體表現出較高之接著力,補強膜不易自裝置表面剝離,接著可靠性優異。 [實施例]By laminating the reinforcing film, moderate rigidity can be given to the semi-finished product as the adherend, and the stress can be relieved and dispersed. Therefore, various defects that may occur in the manufacturing step can be suppressed, production efficiency can be improved, and yield can be improved. In addition, since the reinforcing film is easily peeled from the adherend before the adhesive layer is photocured even when the adherend has been subjected to surface activation treatment, it is also easy to cause build-up or poor bonding. Easy secondary processing. After light-curing the adhesive layer, it exhibits a high adhesive force to the adherend, the reinforcing film is not easy to peel off the surface of the device, and the bonding reliability is excellent. [Example]
以下列舉實施例進一步進行說明,但本發明並不限定於該等實施例。Examples are listed below for further description, but the present invention is not limited to these examples.
[實施例1] <基礎聚合物之聚合> 於具備溫度計、攪拌機、回流冷凝管及氮氣導入管之反應容器中投入作為單體之丙烯酸丁酯(BA)95重量份及丙烯酸(AA)5重量份、作為熱聚合起始劑之偶氮雙異丁腈(AIBN)0.2重量份、以及作為溶劑之乙酸乙酯233重量份,並通入氮氣,一面攪拌一面進行約1小時氮氣置換。其後,加熱至60℃,反應7小時,獲得重量平均分子量60萬之丙烯酸系聚合物之溶液。[Example 1] <polymerization of basic polymer> Put 95 parts by weight of butyl acrylate (BA) as monomers and 5 parts by weight of acrylic acid (AA) as monomers into a reaction vessel equipped with a thermometer, agitator, reflux condenser and nitrogen introduction tube, and azobis as a thermal polymerization initiator. 0.2 parts by weight of isobutyronitrile (AIBN) and 233 parts by weight of ethyl acetate as a solvent were blown with nitrogen gas, and nitrogen replacement was performed for about 1 hour while stirring. Thereafter, it was heated to 60°C and reacted for 7 hours to obtain a solution of acrylic polymer with a weight average molecular weight of 600,000.
<黏著劑組合物之製備> 於丙烯酸系聚合物之溶液中添加含羧基丙烯酸系低聚物(東亞合成製造之「ARUFON UC-3000」;重量平均分子量:1萬,玻璃轉移溫度:65℃,酸值:74 mgKOH/g)1重量份、作為交聯劑之4官能環氧系化合物(Mitsubishi Gas Chemical製造之「Tetrad C」)0.5重量份、作為多官能丙烯酸系單體之新中村化學工業製造之「NK Ester A200」(聚乙二醇#200(n=4)二丙烯酸酯;分子量308,官能基當量154 g/eq)30重量份、及光聚合起始劑(BASF製造之「Irgacure 651」)0.1重量份,製備黏著劑組合物。<Preparation of adhesive composition> Add carboxyl-containing acrylic oligomer to the solution of acrylic polymer ("ARUFON UC-3000" manufactured by Toagosei; weight average molecular weight: 10,000, glass transition temperature: 65°C, acid value: 74 mgKOH/g) 1 part by weight of a 4-functional epoxy compound ("Tetrad C" manufactured by Mitsubishi Gas Chemical) as a crosslinking agent and 0.5 part by weight of a multifunctional acrylic monomer "NK Ester A200" manufactured by Shinnakamura Chemical Industry Co., Ltd. ( Polyethylene glycol #200 (n=4) diacrylate; molecular weight 308, functional group equivalent 154 g/eq) 30 parts by weight, and photopolymerization initiator ("Irgacure 651" manufactured by BASF) 0.1 parts by weight, prepared Adhesive composition.
<黏著劑組合物之塗佈及交聯> 於未經表面處理之厚度75 μm之聚對苯二甲酸乙二酯膜(Toray製造之「Lumirror S10」)上以乾燥後之厚度成為25 μm之方式使用槽輥塗佈上述黏著劑組合物。於130℃下乾燥1分鐘將溶劑去除,其後,於黏著劑之塗佈面貼合隔離件(表面進行過聚矽氧脫模處理之厚度25 μm之聚對苯二甲酸乙二酯膜)之脫模處理面。其後,於25℃之環境下進行4天之老化處理,進行交聯,而獲得於膜基材上固著積層有光硬化性黏著片且於其上暫黏有隔離件之補強膜。<Coating and crosslinking of adhesive composition> The adhesive composition was coated on a polyethylene terephthalate film with a thickness of 75 μm (“Lumirror S10” manufactured by Toray) without surface treatment so that the thickness after drying became 25 μm using a grooved roller. Dry at 130°C for 1 minute to remove the solvent. After that, paste the separator (25 μm thick polyethylene terephthalate film with silicone release treatment on the surface) on the coated surface of the adhesive. The demoulding surface. Thereafter, an aging treatment was carried out for 4 days in an environment of 25° C., and cross-linking was performed to obtain a reinforcing film with a photocurable adhesive sheet fixed on the film substrate and a separator temporarily adhered thereon.
[實施例2、3] 於黏著劑組合物之製備中,如表1所示地變更丙烯酸系低聚物之添加量,除此以外,以與實施例1相同之方式製作補強膜。[Examples 2, 3] In the preparation of the adhesive composition, the addition amount of the acrylic oligomer was changed as shown in Table 1. Except for this, the reinforcing film was produced in the same manner as in Example 1.
[實施例4] 於黏著劑組合物之製備中,於丙烯酸系聚合物之溶液中加入丙烯酸系低聚物、交聯劑、多官能丙烯酸系單體、及光聚合起始劑,並添加作為交聯促進劑之0.2重量份之四乙醯丙酮鋯(東京化成工業製造)。又,加入作為多官能丙烯酸系單體之「NK ESTER A200」30重量份,並添加新中村化學製造之「NK ESTER A600」(聚乙二醇#600(n=4)二丙烯酸酯;分子量708,官能基當量354 g/eq)5重量份。除該等變更以外,以與實施例1相同之方式製作補強膜。[Example 4] In the preparation of the adhesive composition, acrylic oligomer, crosslinking agent, multifunctional acrylic monomer, and photopolymerization initiator are added to the solution of acrylic polymer, and added as a crosslinking accelerator 0.2 parts by weight of tetrazirconium acetone (manufactured by Tokyo Chemical Industry). In addition, 30 parts by weight of "NK ESTER A200" as a multifunctional acrylic monomer was added, and "NK ESTER A600" (polyethylene glycol #600 (n=4) diacrylate made by Shinnakamura Chemical Co., Ltd.; molecular weight 708) was added. , Functional group equivalent 354 g/eq) 5 parts by weight. Except for these changes, a reinforcing film was produced in the same manner as in Example 1.
[比較例1] 於黏著劑組合物之製備中,不添加丙烯酸系低聚物,除此以外,以與實施例1相同之方式製作補強膜。[Comparative Example 1] In the preparation of the adhesive composition, the acrylic oligomer was not added, and the reinforcing film was produced in the same manner as in Example 1 except that the acrylic oligomer was not added.
[比較例2~4] 於黏著劑組合物之製備中,如表1所示地變更丙烯酸系低聚物之種類,除此以外,以與實施例4相同之方式製作補強膜。比較例2中所使用之「UC-3510」為液狀之含羧基丙烯酸系低聚物(東亞合成製造之「ARUFON UC-3510」,重量平均分子量:2000,玻璃轉移溫度:-50℃,酸值:70 mgKOH/g)。比較例3中所使用之「UP-1190」為不具有羧基之液狀丙烯酸系低聚物(東亞合成製造之「ARUFON UP-1190」,重量平均分子量:3000,玻璃轉移溫度:-77℃)。比較例4中所使用之「低聚物A」為藉由下述之製作例所獲得之重量平均分子量5100、玻璃轉移溫度144℃之丙烯酸系低聚物。[Comparative Examples 2~4] In the preparation of the adhesive composition, the type of acrylic oligomer was changed as shown in Table 1. Except for this, a reinforcing film was produced in the same manner as in Example 4. "UC-3510" used in Comparative Example 2 is a liquid carboxyl group-containing acrylic oligomer ("ARUFON UC-3510" manufactured by Toagosei, weight average molecular weight: 2000, glass transition temperature: -50°C, acid Value: 70 mgKOH/g). "UP-1190" used in Comparative Example 3 is a liquid acrylic oligomer without carboxyl group ("ARUFON UP-1190" manufactured by Toagosei, weight average molecular weight: 3000, glass transition temperature: -77°C) . The "oligomer A" used in Comparative Example 4 is an acrylic oligomer with a weight average molecular weight of 5100 and a glass transition temperature of 144°C obtained by the following production example.
<低聚物之製作例> 將甲基丙烯酸雙環戊酯(DCPMA)60重量份、甲基丙烯酸甲酯(MMA)40重量份、作為鏈轉移劑之α-硫甘油3.5重量份、及作為聚合溶劑之甲苯100重量份進行混合,於氮氣氛圍下在70℃下攪拌1小時。繼而,投入作為熱聚合起始劑之2,2'-偶氮雙異丁腈(AIBN)0.2重量份,並於70℃下反應2小時,其後,升溫至80℃反應2小時。其後,將反應液加熱至130℃,將甲苯、鏈轉移劑及未反應單體乾燥去除,而獲得固形狀之低聚物A。<Production example of oligomer> Mix 60 parts by weight of dicyclopentyl methacrylate (DCPMA), 40 parts by weight of methyl methacrylate (MMA), 3.5 parts by weight of α-thioglycerol as a chain transfer agent, and 100 parts by weight of toluene as a polymerization solvent. , Stir at 70°C for 1 hour under a nitrogen atmosphere. Then, 0.2 parts by weight of 2,2'-azobisisobutyronitrile (AIBN) as a thermal polymerization initiator was added and reacted at 70°C for 2 hours, and then heated to 80°C for 2 hours. After that, the reaction liquid was heated to 130° C., toluene, chain transfer agent, and unreacted monomer were dried and removed, and a solid oligomer A was obtained.
[對聚醯亞胺膜之接著力之測定] <光硬化前之接著力> 將厚度12.5 μm之聚醯亞胺膜(DU PONT-TORAY製造之「Kapton 50EN」)經由雙面膠帶(日東電工製造之「No.531」)貼附於玻璃板,獲得測定用聚醯亞胺膜基板。自切取為寬度25 mm×長度100 mm之補強膜之表面將隔離件剝離去除,並使用手壓輥貼合於測定用聚醯亞胺膜基板,製作接著力測定用試樣(無電漿處理)。[Measurement of the adhesion of polyimide film] <Adhesive force before light hardening> A polyimide film with a thickness of 12.5 μm ("Kapton 50EN" manufactured by DU PONT-TORAY) is attached to a glass plate via a double-sided tape ("No.531" manufactured by Nitto Denko) to obtain a polyimide for measurement Film substrate. The separator was peeled off from the surface of the reinforcing film with a width of 25 mm × a length of 100 mm, and was attached to the polyimide film substrate for measurement using a hand roller to prepare a sample for adhesion measurement (no plasma treatment) .
一面以搬送速度3 m/min搬送測定用聚醯亞胺基板一面使用常壓式電漿處理機以電極電壓160 V之條件對聚醯亞胺膜之表面實施電漿處理。於電漿處理後之測定用聚醯亞胺膜基板上使用手壓輥貼合補強膜,製作接著力測定用試樣(有電漿處理)。While conveying the polyimide substrate for measurement at a conveying speed of 3 m/min, the surface of the polyimide film was subjected to plasma treatment using an atmospheric-pressure plasma processor at an electrode voltage of 160 V. The reinforcing film was attached to the polyimide film substrate for measurement after the plasma treatment using a hand roller to prepare a sample for adhesion measurement (with plasma treatment).
使用該等試驗樣品,利用夾頭保持補強膜之聚對苯二甲酸乙二酯膜之端部,以拉伸速度300 mm/min進行補強膜之180°剝離試驗,並測定剝離強度。根據所獲得之結果,算出有電漿處理之情形時之接著力相對於無電漿處理之情形時之接著力的比(由電漿處理導致之接著力之增加率)。Using these test samples, the end of the polyethylene terephthalate film of the reinforced film was held by a chuck, and the 180° peel test of the reinforced film was performed at a tensile speed of 300 mm/min, and the peel strength was measured. Based on the obtained results, the ratio of the adhesive force when plasma treatment is applied to the adhesive force when there is no plasma treatment (the increase rate of adhesive force caused by plasma treatment) is calculated.
<光硬化後之接著力> 於聚醯亞胺膜基板(有電漿處理、及無電漿處理)上貼合補強膜,其後,使用波長365 nm之LED(Light Emitting Diode,發光二極體)光源自補強膜側(PET膜側)照射累計光量4000 mJ/cm2 之紫外線使黏著劑層光硬化。使用該試驗樣品與上述同樣地藉由180°剝離試驗對接著力進行測定。<Adhesive force after light curing> A reinforcing film is attached to the polyimide film substrate (with plasma treatment and without plasma treatment), and then a 365 nm LED (Light Emitting Diode) is used ) The light source irradiates ultraviolet rays with a cumulative light intensity of 4000 mJ/cm 2 from the side of the reinforcing film (the side of the PET film) to light-cur the adhesive layer. Using this test sample, the adhesive force was measured by a 180° peel test in the same manner as described above.
將各補強膜之黏著劑之組成(丙烯酸系低聚物之種類及添加量、光硬化劑之種類及添加量、交聯促進劑(四乙醯丙酮鋯)之添加量)、光硬化前後之對聚醯亞胺膜之接著力及光硬化前後之接著力之上升率、以及由電漿處理導致之初期接著力之增加率(「有電漿處理」之光硬化前之接著力相對於「無電漿處理」之光硬化前之接著力之比)示於表1。表1之組成中之添加量係相對於基礎聚合物100重量份之添加量(重量份)。The composition of the adhesive of each reinforcing film (the type and amount of acrylic oligomer, the type and amount of light hardener, the amount of crosslinking accelerator (zirconium tetraacetone)), before and after light curing Adhesion to the polyimide film and the increase rate of the adhesive force before and after photocuring, and the increase rate of the initial adhesive force caused by the plasma treatment (the adhesive force before the photocuring of "plasma treatment" is relative to " The ratio of the adhesive force before light hardening without plasma treatment is shown in Table 1. The addition amount in the composition of Table 1 is the addition amount (parts by weight) relative to 100 parts by weight of the base polymer.
[表1]
於任一實施例及比較例中,於對未進行過電漿處理之聚醯亞胺膜基板貼合補強膜之情形時,光硬化前後之接著力之上升均為100倍以下。於將進行過電漿處理之聚醯亞胺膜基板作為被黏著體之情形時,實施例1~4中,由於光硬化,接著力上升至120倍以上,實施例1、2、4中,接著力之上升率超過150倍。另一方面,黏著劑組合物不含低聚物之比較例1中,即便於將進行過電漿處理之聚醯亞胺膜基板作為被黏著體之情形時,接著力之上升率亦停留於90倍以下。添加有低Tg低聚物之比較例2、3及添加有不含羧基之高Tg低聚物之比較例4中,於將進行過電漿處理之聚醯亞胺膜作為被黏著體之情形時之光硬化前後之接著力之上升率亦為90倍以下。In any of the Examples and Comparative Examples, when a reinforcing film was attached to a polyimide film substrate that had not been subjected to plasma treatment, the increase in adhesive force before and after photocuring was 100 times or less. When using a plasma-treated polyimide film substrate as the adherend, in Examples 1 to 4, the adhesive force increased to 120 times or more due to photocuring. In Examples 1, 2, and 4, The rate of increase of subsequent force exceeds 150 times. On the other hand, in Comparative Example 1 in which the adhesive composition does not contain oligomers, even when the plasma-treated polyimide film substrate is used as the adherend, the increase rate of the adhesive force remains at Less than 90 times. In Comparative Examples 2 and 3 with the addition of low Tg oligomers and Comparative Example 4 with the addition of high Tg oligomers without carboxyl groups, in the case of using a plasma-treated polyimide film as the adherend The increase rate of the adhesive force before and after the time light hardens is also less than 90 times.
若著眼於初期接著力(光硬化前之接著力),則實施例1~4中,由電漿處理而引起之初期接著力之上升較小,相對於此,比較例1~4中,由電漿處理而引起之初期接著力之上升較大,尤其是比較例2~4中,由電漿處理而引起之初期接著力之上升較明顯。Focusing on the initial adhesive force (adhesive force before photocuring), the increase in the initial adhesive force caused by plasma treatment in Examples 1 to 4 is small. In contrast, in Comparative Examples 1 to 4, The increase in the initial adhesive force caused by the plasma treatment is relatively large, especially in Comparative Examples 2 to 4, the increase in the initial adhesive force caused by the plasma treatment is more obvious.
根據該等結果,可知:具備含有包含羧基之高Tg低聚物之光硬化性黏著劑層的補強膜對進行過電漿處理等活化處理之被黏著體之初期接著力較低,二次加工性優異,光硬化後表現出對被黏著體之較高之接著力,接著可靠性優異。According to these results, it can be seen that the reinforcing film with a photocurable adhesive layer containing a high Tg oligomer containing a carboxyl group has low initial adhesion to the adherend subjected to activation treatment such as plasma treatment, and secondary processing Excellent performance, showing high adhesion to the adherend after light curing, and excellent adhesion reliability.
1:膜基材 2:黏著劑層 5:隔離件 10:補強膜 20:被黏著體1: Film substrate 2: Adhesive layer 5: spacer 10: Reinforcing film 20: adherend
圖1係表示補強膜之積層構成之剖視圖。 圖2係表示補強膜之積層構成之剖視圖。 圖3係表示黏貼設置有補強膜之裝置之剖視圖。Fig. 1 is a cross-sectional view showing the laminated structure of the reinforcing film. Fig. 2 is a cross-sectional view showing the laminated structure of the reinforcing film. Fig. 3 is a cross-sectional view showing a device for sticking and installing a reinforcing film.
1:膜基材 1: Film substrate
2:黏著劑層 2: Adhesive layer
10:補強膜 10: Reinforcing film
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