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TW202002277A - Display device - Google Patents

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TW202002277A
TW202002277A TW108101440A TW108101440A TW202002277A TW 202002277 A TW202002277 A TW 202002277A TW 108101440 A TW108101440 A TW 108101440A TW 108101440 A TW108101440 A TW 108101440A TW 202002277 A TW202002277 A TW 202002277A
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pixel structure
opening
substrate
point
offset
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TW108101440A
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TWI733078B (en
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林育玄
陳建銓
陳鵬聿
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友達光電股份有限公司
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Abstract

A display device including a substrate and pixel structures is provided. The substrate has an internal area and a surrounding area outside the internal area. The pixel structures are disposed on the substrate. Each of the pixel structures includes a first electrode, a first bank layer, a second bank layer, an emissive layer and a second electrode. The first bank layer is disposed on the first electrode and has a first hole overlapping a portion of the first electrode. The second band layer is disposed on the first bank layer and has a second hole overlapping the first hole. The emissive layer is disposed on the portion of the first electrode and is located in the first hole of the first bank layer and the second hole of the second bank layer. The second electrode is disposed on the emissive layer. The pixel structure includes a first pixel structure disposed in the internal area and a second pixel structure disposed in the surrounding area. A first hole of the second pixel structure and a second hole of the second pixel structure has a first offset in a first direction.

Description

顯示裝置Display device

本發明是有關於一種顯示裝置。The invention relates to a display device.

隨著科技的進步,於有機發光二極體(ORGANIC LIGHT EMITTING DIODE;OLED)顯示裝置的製程中,可使用噴墨印刷製程(Ink Jet Printing;IJP)形成發光層。噴墨印刷製程是將液化的有機發光材料噴射或注入到由堤岸(bank)定義出的開口中,以形成發光層。然而,位於顯示裝置的基板邊緣處或基板內部的開口中的有機發光材料之揮發速度不一,造成顯示裝置的基板邊緣處或基板內部的有機發光層的膜厚不均,進而影響顯示面板的顯示品質。With the advancement of technology, in the process of organic light emitting diode (ORGANIC LIGHT EMITTING DIODE; OLED) display devices, an inkjet printing process (Ink Jet Printing; IJP) can be used to form a light emitting layer. The inkjet printing process is to spray or inject the liquefied organic light-emitting material into the opening defined by the bank to form a light-emitting layer. However, the volatilization rate of the organic light-emitting material at the edge of the substrate of the display device or in the opening inside the substrate is different, resulting in uneven film thickness of the organic light-emitting layer at the edge of the substrate of the display device or inside the substrate, which in turn affects the display panel Display quality.

本發明提供一種顯示裝置,性能佳。The invention provides a display device with good performance.

本發明的一種顯示裝置,包括基板以及多個畫素結構。基板具有內部區以及內部區外的周邊區。多個畫素結構設置於基板上。畫素結構的每一個包括第一電極、第一堤岸層、第二堤岸層、發光層以及第二電極。第一堤岸層設置於第一電極上,且具有與部分之第一電極重疊的第一開口。第二堤岸層設置於第一堤岸層上,且具有與第一開口重疊的第二開口。發光層設置於部分的第一電極上,且位於第一堤岸層的第一開口與第二堤岸層的第二開口。第二電極設置於發光層上。畫素結構包括設置於內部區的第一畫素結構以及設置於周邊區的第二畫素結構。第二畫素結構的第一開口與第二畫素結構的第二開口在第一方向上具有第一偏移量。A display device of the present invention includes a substrate and a plurality of pixel structures. The substrate has an inner area and a peripheral area outside the inner area. Multiple pixel structures are provided on the substrate. Each of the pixel structures includes a first electrode, a first bank layer, a second bank layer, a light emitting layer, and a second electrode. The first bank layer is disposed on the first electrode and has a first opening overlapping with a part of the first electrode. The second bank layer is disposed on the first bank layer and has a second opening overlapping with the first opening. The light emitting layer is disposed on part of the first electrode, and is located in the first opening of the first bank layer and the second opening of the second bank layer. The second electrode is disposed on the light emitting layer. The pixel structure includes a first pixel structure disposed in the inner area and a second pixel structure disposed in the peripheral area. The first opening of the second pixel structure and the second opening of the second pixel structure have a first offset in the first direction.

本發明的一種顯示裝置,包括基板以及多個畫素結構。基板具有內部區以及內部區外的周邊區。多個畫素結構設置於基板上。畫素結構的每一個包括至少一第一電極、第一堤岸層、第二堤岸層、發光層以及第二電極。第一堤岸層設置於第一電極上,且具有與部分之至少一第一電極重疊的至少一第一開口。第二堤岸層設置於第一堤岸層上,且具有與至少一第一開口重疊的第二開口。發光層設置於部分的第一電極上,且位於第一堤岸層的至少一第一開口與第二堤岸層的第二開口。第二電極設置於發光層上。畫素結構包括設置於內部區的第一畫素結構以及設置於周邊區的第二畫素結構。第二畫素結構之至少一第一開口於基板上的垂直投影面積大於第一畫素結構之至少一第一開口於基板上的垂直投影面積。A display device of the present invention includes a substrate and a plurality of pixel structures. The substrate has an inner area and a peripheral area outside the inner area. Multiple pixel structures are provided on the substrate. Each of the pixel structures includes at least a first electrode, a first bank layer, a second bank layer, a light emitting layer, and a second electrode. The first bank layer is disposed on the first electrode, and has at least one first opening overlapping with a portion of at least one first electrode. The second bank layer is disposed on the first bank layer and has a second opening overlapping with at least one first opening. The light emitting layer is disposed on part of the first electrode, and is located in at least one first opening of the first bank layer and the second opening of the second bank layer. The second electrode is disposed on the light emitting layer. The pixel structure includes a first pixel structure disposed in the inner area and a second pixel structure disposed in the peripheral area. The vertical projection area of the at least one first opening of the second pixel structure on the substrate is larger than the vertical projection area of the at least one first opening of the first pixel structure on the substrate.

基於上述,本發明一實施例的顯示裝置包括基板及多個畫素結構,其中基板具有內部區以及內部區外的周邊區,畫素結構包括設置於內部區的第一畫素結構以及設置於周邊區的第二畫素結構,且第二畫素結構的第一開口與第二畫素結構的第二開口在第一方向上具有第一偏移量。藉此,能改善顯示裝置的周邊區與內部區的畫素結構之發光層的固化速度不一的問題。另外,本發明另一實施例的顯示裝置藉由第二畫素結構之至少一第一開口於基板上的垂直投影面積大於第一畫素結構之至少一第一開口於基板上的垂直投影面積,亦能改善顯示裝置的周邊區與內部區的畫素結構之發光層的固化速度不一的問題。Based on the above, a display device according to an embodiment of the present invention includes a substrate and a plurality of pixel structures, wherein the substrate has an inner area and a peripheral area outside the inner area, the pixel structure includes a first pixel structure disposed in the inner area, and a pixel structure The second pixel structure in the peripheral area, and the first opening of the second pixel structure and the second opening of the second pixel structure have a first offset in the first direction. Thereby, the problem that the curing speed of the light emitting layer of the pixel structure in the peripheral area and the inner area of the display device is not the same can be improved. In addition, in the display device according to another embodiment of the present invention, the vertical projection area of the at least one first opening on the substrate of the second pixel structure is larger than the vertical projection area of the at least one first opening of the first pixel structure on the substrate It can also improve the problem that the curing speed of the light emitting layer of the pixel structure in the peripheral area and the inner area of the display device is different.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and understandable, the embodiments are specifically described below in conjunction with the accompanying drawings for detailed description as follows.

在下文中將參照附圖更全面地描述本發明,在附圖中示出了本發明的示例性實施例。如本領域技術人員將認識到的,可以以各種不同的方式修改所描述的實施例,而不脫離本發明的精神或範圍。Hereinafter, the present invention will be described more fully with reference to the accompanying drawings, in which exemplary embodiments of the present invention are shown. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」或「耦合」係可為二元件間存在其它元件。In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected" to another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to physical and/or electrical connections. Furthermore, "electrical connection" or "coupling" can mean that there are other components between the two components.

此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其它元件的「下」側的元件將被定向在其它元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下方」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「上面」或「下面」可以包括上方和下方的取向。In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship between one element and another element, as shown. It should be understood that relative terms are intended to include different orientations of the device than those shown in the figures. For example, if the device in one drawing is turned over, the element described as being on the "lower" side of the other element will be oriented on the "upper" side of the other element. Thus, the exemplary term "lower" may include "lower" and "upper" orientations, depending on the particular orientation of the drawings. Similarly, if the device in one drawing is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "above" or "below" can include an orientation of above and below.

本文使用的「約」、「近似」、或「實質上」包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,「約」可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的「約」、「近似」或「實質上」可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about", "approximately", or "substantially" includes the stated value and the average value within the acceptable deviation range of the specific value determined by those of ordinary skill in the art, taking into account the measurements and A certain amount of measurement-related errors (ie, measurement system limitations). For example, "about" may mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. In addition, "about", "approximately" or "substantially" used in this article can select a more acceptable range of deviation or standard deviation according to optical properties, etching properties or other properties, instead of applying one standard deviation to all properties .

本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或(and/or)公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制權利要求的範圍。Exemplary embodiments are described herein with reference to cross-sectional views that are schematic diagrams of idealized embodiments. Therefore, a change in the shape of the graph as a result of, for example, manufacturing techniques and/or tolerances can be expected. Therefore, the embodiments described herein should not be construed as being limited to the specific shapes of the regions as shown herein, but include deviations in shapes caused by manufacturing, for example. For example, an area shown or described as flat may generally have rough and/or non-linear characteristics. In addition, the acute angle shown may be round. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to show the precise shapes of the regions, and are not intended to limit the scope of the claims.

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of the relevant technology and the present invention, and will not be interpreted as idealized or excessive Formal meaning unless explicitly defined as such in this article.

現將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於所附圖式中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to exemplary embodiments of the present invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same element symbols are used in the drawings and description to denote the same or similar parts.

圖1A是依照本發明一實施例的顯示裝置的部分元件的上視示意圖。圖1B是根據圖1A的剖線A-A’繪示的顯示裝置的畫素結構的剖面示意圖。圖1C是根據圖1A的剖線C-C’繪示的顯示裝置的畫素結構的剖面示意圖。圖1D是根據圖1A的剖線B-B’繪示的顯示裝置的畫素結構的剖面示意圖。圖1E是根據圖1A的剖線D-D’繪示的顯示裝置的畫素結構的剖面示意圖。圖1F是圖1A的顯示面板的畫素結構200B的放大示意圖。圖1A省略圖1B至圖1E之主動元件層210、電洞注入層250、電洞傳輸層260、發光層270、電子傳輸層280、電子注入層290及第二電極300的繪示。FIG. 1A is a schematic top view of some components of a display device according to an embodiment of the invention. FIG. 1B is a schematic cross-sectional view of the pixel structure of the display device according to section line A-A' of FIG. 1A. 1C is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line C-C' of FIG. 1A. FIG. 1D is a schematic cross-sectional view of the pixel structure of the display device according to section line B-B' of FIG. 1A. FIG. 1E is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line D-D' of FIG. 1A. FIG. 1F is an enlarged schematic diagram of the pixel structure 200B of the display panel of FIG. 1A. FIG. 1A omits the active device layer 210, the hole injection layer 250, the hole transport layer 260, the light emitting layer 270, the electron transport layer 280, the electron injection layer 290, and the second electrode 300 of FIGS. 1B to 1E.

請參考圖1A,顯示裝置10包括基板100以及多個畫素結構200A~200M。基板100具有內部區110以及周邊區120。周邊區120位於內部區110外。舉例而言,在本實施例中,周邊區120圍繞內部區110,周邊區120為內部區110至基板100邊緣100a、100b的區域。舉例而言,本實施例的周邊區120的形狀例如是口字型,但不以此為限。在本實施例中,基板100例如為硬質基板(rigid substrate)。然而,本發明不限於此,在其它實施例中,基板100也可以是可撓式基板(flexible substrate)。舉例而言,上述之硬質基板的材質可為玻璃、石英或其它適當材料;上述之可撓式基板的材質可以是塑膠或其它適當材料。Referring to FIG. 1A, the display device 10 includes a substrate 100 and a plurality of pixel structures 200A-200M. The substrate 100 has an inner region 110 and a peripheral region 120. The peripheral area 120 is located outside the inner area 110. For example, in this embodiment, the peripheral region 120 surrounds the inner region 110, and the peripheral region 120 is the region from the inner region 110 to the edges 100a, 100b of the substrate 100. For example, the shape of the peripheral area 120 in this embodiment is, for example, a chevron shape, but it is not limited thereto. In the present embodiment, the substrate 100 is, for example, a rigid substrate. However, the present invention is not limited to this, and in other embodiments, the substrate 100 may also be a flexible substrate. For example, the material of the hard substrate can be glass, quartz or other suitable materials; the material of the flexible substrate can be plastic or other suitable materials.

請參考圖1A至圖1E,多個畫素結構200A~200M設置於基板100上。多個畫素結構200A~200M包括設置於內部區110的第一畫素結構200A以及設置於周邊區120的第二畫素結構200B、200C、200D、200E、200F、200G、200H、200I、200J、200K、200L、200M。本實施例的每一畫素結構200A~200M包括第一電極220、第一堤岸層230、第二堤岸層240、發光層270以及第二電極300。在本實施例中,每一畫素結構200A~200M還可包括主動元件層210、電洞注入層250、電洞傳輸層260、電子傳輸層280以及電子注入層290,但本發明不以此為限。Please refer to FIGS. 1A to 1E, a plurality of pixel structures 200A to 200M are disposed on the substrate 100. The plurality of pixel structures 200A-200M include a first pixel structure 200A disposed in the inner area 110 and a second pixel structure 200B, 200C, 200D, 200E, 200F, 200G, 200H, 200I, 200J disposed in the peripheral area 120 , 200K, 200L, 200M. Each pixel structure 200A-200M of this embodiment includes a first electrode 220, a first bank layer 230, a second bank layer 240, a light emitting layer 270, and a second electrode 300. In this embodiment, each pixel structure 200A-200M may further include an active device layer 210, a hole injection layer 250, a hole transport layer 260, an electron transport layer 280, and an electron injection layer 290, but the present invention does not Limited.

在本實施例中,主動元件層210設置於基板100上。舉例而言,在本實施例中,主動元件層210包括主動元件,主動元件包括至少一薄膜電晶體,具有閘極、半導體圖案、汲極與源極。In this embodiment, the active device layer 210 is disposed on the substrate 100. For example, in this embodiment, the active device layer 210 includes an active device. The active device includes at least one thin film transistor, and has a gate, a semiconductor pattern, a drain, and a source.

在本實施例中,第一電極220設置於主動元件層210上。第一電極220與主動元件層210中的主動元件電性連接。舉例而言,本實施例的第一電極220例如為畫素電極,電性連接於主動元件之至少一薄膜電晶體的汲極。In this embodiment, the first electrode 220 is disposed on the active device layer 210. The first electrode 220 is electrically connected to the active device in the active device layer 210. For example, the first electrode 220 of this embodiment is, for example, a pixel electrode, and is electrically connected to the drain of at least one thin film transistor of the active device.

第一堤岸層230設置於第一電極220上。第一堤岸層230具有與部分之第一電極220重疊的第一開口232。第一堤岸層230的材料包含氧化矽、氮化矽或其它合適的材料。The first bank layer 230 is disposed on the first electrode 220. The first bank layer 230 has a first opening 232 overlapping a portion of the first electrode 220. The material of the first bank layer 230 includes silicon oxide, silicon nitride, or other suitable materials.

第二堤岸層240設置於第一堤岸層230上。第二堤岸層240具有與第一開口232重疊的第二開口242。在本實施例中,第二堤岸層240的材質與第一堤岸層230的材質可以不相同;舉例來說,對同一有機發光材料而言(例如簡稱為墨),第一堤岸層230例如為親墨性,而第二堤岸層240例如為疏墨性,但本發明不限於此。在本實施例中,第二堤岸層240的材料例如是光阻,但本發明不限於此。The second bank layer 240 is disposed on the first bank layer 230. The second bank layer 240 has a second opening 242 overlapping the first opening 232. In this embodiment, the material of the second bank layer 240 and the material of the first bank layer 230 may be different; for example, for the same organic light-emitting material (for example, simply referred to as ink), the first bank layer 230 is, for example, The ink affinity, and the second bank layer 240 is, for example, ink repellent, but the invention is not limited thereto. In this embodiment, the material of the second bank layer 240 is, for example, photoresist, but the invention is not limited thereto.

未被第二堤岸層240覆蓋之部分第一堤岸層230於基板100上的垂直投影在第一方向d1上可具有寬度L1及寬度L2,而未被第二堤岸層240覆蓋之部分第一堤岸層230在第二方向d2上具有寬度L3及寬度L4,其中第一方向d1與第二方向d2交錯。舉例而言,在本實施例中,第一方向d1與第二方向d2可垂直。請參考圖1A,值得注意的是,第一畫素結構200A設置於內部區110,第一畫素結構200A之未被第二堤岸層240覆蓋的部分第一堤岸層230在第一方向d1上的寬度L1與寬度L2實質上可相等,且第一畫素結構200A之未被第二堤岸層240覆蓋的部分第一堤岸層230在第二方向上的寬度L3與寬度L4實質上可相等;第二畫素結構200B設置於周邊區120,第二畫素結構200B之未被第二堤岸層240覆蓋的部分第一堤岸層230在第一方向d1上的寬度L1與寬度L2不相等,且第二畫素結構200B之未被第二堤岸層240覆蓋的部分第一堤岸層230在第二方向d2上的寬度L3與寬度L4不相等。請參考圖1D及圖1E,舉例而言,以第二畫素結構200B為例,第二畫素結構200B之未被第二堤岸層240覆蓋的部分第一堤岸層230在第一方向d1上的寬度L2大於寬度L1,而第二畫素結構200B之未被第二堤岸層240覆蓋的部分第一堤岸層230在第二方向上的寬度L4大於寬度L3。也就是說,第二畫素結構200B的第一開口232可偏離第二開口242的幾何中心,而第一畫素結構200A的第一開口232的幾何中心實質上可對齊於第二開口242的幾何中心。The vertical projection of the portion of the first bank layer 230 on the substrate 100 that is not covered by the second bank layer 240 may have a width L1 and a width L2 in the first direction d1, while the portion of the first bank that is not covered by the second bank layer 240 The layer 230 has a width L3 and a width L4 in the second direction d2, where the first direction d1 and the second direction d2 are staggered. For example, in this embodiment, the first direction d1 and the second direction d2 may be perpendicular. Please refer to FIG. 1A. It is worth noting that the first pixel structure 200A is disposed in the inner region 110, and the portion of the first pixel structure 200A that is not covered by the second bank layer 240 is in the first direction d1 The width L1 and the width L2 may be substantially equal, and the width L3 and the width L4 of the first bank layer 230 in the second direction of the portion of the first pixel structure 200A that is not covered by the second bank layer 240 may be substantially equal; The second pixel structure 200B is disposed in the peripheral area 120. The width L1 and width L2 of the first bank layer 230 of the portion of the second pixel structure 200B not covered by the second bank layer 240 in the first direction d1 are not equal, and In the second pixel structure 200B, a portion of the first bank layer 230 that is not covered by the second bank layer 240 has a width L3 that is not equal to a width L4 in the second direction d2. Please refer to FIGS. 1D and 1E. For example, taking the second pixel structure 200B as an example, a portion of the first bank layer 230 of the second pixel structure 200B that is not covered by the second bank layer 240 is in the first direction d1 The width L2 is greater than the width L1, and the width L4 of the first bank layer 230 in the second direction of the portion of the second pixel structure 200B that is not covered by the second bank layer 240 is greater than the width L3. That is to say, the first opening 232 of the second pixel structure 200B may deviate from the geometric center of the second opening 242, and the geometric center of the first opening 232 of the first pixel structure 200A may be substantially aligned with the second opening 242 Geometric center.

發光層270設置於部分的第一電極220上,且位於第一堤岸層230的第一開口232與第二堤岸層240的第二開口242。舉例而言,在本實施例中,電洞注入層250、電洞傳輸層260與發光層270依序設置於所述部分的第一電極220上。電洞注入層250、電洞傳輸層260與發光層270位於第一堤岸層230的第一開口232與第二堤岸層240的第二開口242中。舉例而言,在本實施例中,電洞注入層250、電洞傳輸層260與發光層270依序設置於部分的第一電極220上的方法例如是利用噴墨印刷製程(Ink Jet Printing;IJP),但本發明不限於此。在本實施例中,發光層270的材料例如是有機發光材料或量子點發光材料,但本發明不限於此。The light emitting layer 270 is disposed on part of the first electrode 220 and is located in the first opening 232 of the first bank layer 230 and the second opening 242 of the second bank layer 240. For example, in this embodiment, the hole injection layer 250, the hole transport layer 260, and the light emitting layer 270 are sequentially disposed on the portion of the first electrode 220. The hole injection layer 250, the hole transport layer 260 and the light emitting layer 270 are located in the first opening 232 of the first bank layer 230 and the second opening 242 of the second bank layer 240. For example, in this embodiment, the method in which the hole injection layer 250, the hole transport layer 260, and the light-emitting layer 270 are sequentially disposed on part of the first electrode 220 is, for example, an inkjet printing process (Ink Jet Printing; IJP), but the invention is not limited to this. In this embodiment, the material of the light emitting layer 270 is, for example, an organic light emitting material or a quantum dot light emitting material, but the present invention is not limited thereto.

於垂直基板100的第三方向d3上,發光層270的頂面272具有與第二開口242之中心重疊的一點272a。發光層270的頂面272上的一點272a至第一電極220的頂面222的距離為第一距離T1。發光層270的頂面272與第二堤岸層240的交界邊270a至第一堤岸層230的頂面234的距離為第二距離T2。在本實施例中,第一距離T1小於或等於第二距離T2。舉例而言,第二距離T2小於或等於20倍的第一距離T1,即T1 ≤ T2 ≤ 20´T1,但本發明不以此為限。In the third direction d3 perpendicular to the substrate 100, the top surface 272 of the light emitting layer 270 has a point 272a that overlaps with the center of the second opening 242. The distance from a point 272a on the top surface 272 of the light-emitting layer 270 to the top surface 222 of the first electrode 220 is the first distance T1. The distance from the boundary surface 272 of the top surface 272 of the light emitting layer 270 and the second bank layer 240 to the top surface 234 of the first bank layer 230 is the second distance T2. In this embodiment, the first distance T1 is less than or equal to the second distance T2. For example, the second distance T2 is less than or equal to 20 times the first distance T1, that is, T1 ≤ T2 ≤ 20´T1, but the present invention is not limited to this.

在本實施例中,電子傳輸層280與電子注入層290依序設置於發光層270與第二堤岸層240上。舉例而言,在本實施例中,電子傳輸層280與電子注入層290的形成方式例如是利用蒸鍍製程,但本發明不限於此。In this embodiment, the electron transport layer 280 and the electron injection layer 290 are sequentially disposed on the light emitting layer 270 and the second bank layer 240. For example, in this embodiment, the electron transport layer 280 and the electron injection layer 290 are formed by, for example, a vapor deposition process, but the invention is not limited thereto.

第二電極300設置於發光層270上。舉例而言,在本實施例中,第二電極300設置於電子注入層290上。在本實施例中,於垂直基板100的第三方向d3上,第二電極300可具有大致上相同的膜厚。也就是說,於垂直基板100的第三方向d3上,發光層270的頂面272具有與第二開口242之中心重疊的一點272a,第二電極300的頂面302具有與第二開口242之中心重疊的一點302a。發光層270的頂面272上的一點272a位於與第一開口232及第二開口242重疊之部分的第一電極220的上方,第二電極300的頂面302上的一點302a位於一點272a的正上方,一點272a至一點302a在第三方向d3上的距離為第一距離H1。第二堤岸層240的頂面244與第二電極300的頂面302在第三方向d3上的距離為第二距離H2,第一距離H1約等於第二距離H2。也就是說,在本實施例中,由電子傳輸層280、電子注入層290及第二電極300構成的複合層具有大致上相同的膜厚,但本發明不以此為限。The second electrode 300 is disposed on the light emitting layer 270. For example, in this embodiment, the second electrode 300 is disposed on the electron injection layer 290. In this embodiment, in the third direction d3 perpendicular to the substrate 100, the second electrode 300 may have substantially the same film thickness. That is, in the third direction d3 perpendicular to the substrate 100, the top surface 272 of the light-emitting layer 270 has a point 272a overlapping with the center of the second opening 242, and the top surface 302 of the second electrode 300 has A point 302a overlapping in the center. A point 272a on the top surface 272 of the light-emitting layer 270 is located above the first electrode 220 in a portion overlapping the first opening 232 and the second opening 242, and a point 302a on the top surface 302 of the second electrode 300 is located at the positive point 272a Above, the distance from the point 272a to the point 302a in the third direction d3 is the first distance H1. The distance between the top surface 244 of the second bank layer 240 and the top surface 302 of the second electrode 300 in the third direction d3 is the second distance H2, and the first distance H1 is approximately equal to the second distance H2. That is, in this embodiment, the composite layer composed of the electron transport layer 280, the electron injection layer 290, and the second electrode 300 has substantially the same film thickness, but the present invention is not limited to this.

值得一提的是,第二畫素結構200B的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1。請參考圖1F,舉例而言,虛擬中心線232x穿過第一開口232的幾何中心且與第二方向d2平行,虛擬中心線242x穿過第二開口242的幾何中心且與第二方向d2平行,而第一開口232的虛擬中心線232x與第二開口242的虛擬中心線242x在第一方向d1上相隔第一距離,所述第一距離即為第一偏移量d1。另一方面,本實施例的第一畫素結構200A之第一開口232的幾何中心實質上對齊第一畫素結構200A之第二開口242的幾何中心,因此第一畫素結構200A的第一偏移量d1實質上為0。亦即,本實施例的第二畫素結構200B的第一偏移量d1大於第一畫素結構200A的第一偏移量d1。It is worth mentioning that the first opening 232 and the second opening 242 of the second pixel structure 200B have a first offset d1 in the first direction d1. Please refer to FIG. 1F. For example, the virtual center line 232x passes through the geometric center of the first opening 232 and is parallel to the second direction d2, and the virtual center line 242x passes through the geometric center of the second opening 242 and is parallel to the second direction d2 The virtual center line 232x of the first opening 232 and the virtual center line 242x of the second opening 242 are separated by a first distance in the first direction d1, and the first distance is the first offset d1. On the other hand, the geometric center of the first opening 232 of the first pixel structure 200A of this embodiment is substantially aligned with the geometric center of the second opening 242 of the first pixel structure 200A, so the first The offset d1 is substantially zero. That is, the first offset d1 of the second pixel structure 200B of this embodiment is greater than the first offset d1 of the first pixel structure 200A.

在本實施例中,第二畫素結構200B的第一開口232與其第二開口242在第二方向d2上還可具有第二偏移量d2。請參考圖1F,舉例而言,以第二畫素結構200B為例,虛擬中心線232y穿過第一開口232的幾何中心且與第一方向d1平行,虛擬中心線242y穿過第二開口242的幾何中心且與第一方向d1平行,而第一開口232的虛擬中心線232y與第二開口242的虛擬中心線242y在第二方向d2上相隔第二距離,所述第二距離即為第二偏移量d2。另一方面,本實施例的第一畫素結構200A之第一開口232的幾何中心實質上對齊第一畫素結構200A之第二開口242的幾何中心,因此第一畫素結構200A的第二偏移量d2實質上為0。亦即,本實施例的第二畫素結構200B的第二偏移量d2大於第一畫素結構200A的第二偏移量d2。In this embodiment, the first opening 232 and the second opening 242 of the second pixel structure 200B may further have a second offset d2 in the second direction d2. Please refer to FIG. 1F. For example, taking the second pixel structure 200B as an example, the virtual center line 232y passes through the geometric center of the first opening 232 and is parallel to the first direction d1, and the virtual center line 242y passes through the second opening 242 The geometric center of is parallel to the first direction d1, and the virtual centerline 232y of the first opening 232 and the virtual centerline 242y of the second opening 242 are separated by a second distance in the second direction d2. The second distance is the first Two offset d2. On the other hand, the geometric center of the first opening 232 of the first pixel structure 200A of this embodiment is substantially aligned with the geometric center of the second opening 242 of the first pixel structure 200A, so the second of the first pixel structure 200A The offset d2 is substantially zero. That is, the second offset d2 of the second pixel structure 200B of this embodiment is greater than the second offset d2 of the first pixel structure 200A.

請參考圖1A及圖1F,以第二畫素結構200B為例,其第一開口232的邊緣232s具有在第一方向d1上排列的第一點232a及第二點232b,第一點232a較第二點232b遠離基板100的邊緣100a;第一開口232的邊緣232s具有在第二方向d2上排列的第五點232c及第六點232d,第五點232c較第六點232d遠離基板100的邊緣100b;第二開口242之邊緣242s具有在第一方向d1上排列的第三點242a及第四點242b,第三點242a較第四點242b遠離基板100的邊緣100a;第二開口242之邊緣242s具有在第二方向d2上排列的第七點242c及第八點242d,第七點242c較第八點242d遠離基板100的邊緣100b。在第一方向d1上,第一點232a與第三點242a之間具有距離W1,第二點232b與第四點242b之間具有距離W2。在第二方向d2上,第五點232c與第七點242c之間具有距離W3,第六點232d與第八點242d之間具有距離W4。值得注意的是,在本實施例中,距離W2大於距離W1,且距離W4大於距離W3。也就是說,第二畫素結構200B之第一開口232的幾何中心相對於第二畫素結構200B之第二開口242的幾何中心朝基板100的內部區110偏移,而第二畫素結構200B之未被第二堤岸層240覆蓋之部分第一堤岸層230在靠近基板100邊緣100a及/或邊緣100b處具有較大的寬度。1A and 1F, taking the second pixel structure 200B as an example, the edge 232s of the first opening 232 has a first point 232a and a second point 232b arranged in the first direction d1, the first point 232a is relatively The second point 232b is away from the edge 100a of the substrate 100; the edge 232s of the first opening 232 has a fifth point 232c and a sixth point 232d arranged in the second direction d2, the fifth point 232c is farther from the substrate 100 than the sixth point 232d The edge 100b; the edge 242s of the second opening 242 has a third point 242a and a fourth point 242b arranged in the first direction d1, the third point 242a is farther from the edge 100a of the substrate 100 than the fourth point 242b; the second opening 242 is The edge 242s has a seventh point 242c and an eighth point 242d arranged in the second direction d2. The seventh point 242c is farther from the edge 100b of the substrate 100 than the eighth point 242d. In the first direction d1, there is a distance W1 between the first point 232a and the third point 242a, and a distance W2 between the second point 232b and the fourth point 242b. In the second direction d2, there is a distance W3 between the fifth point 232c and the seventh point 242c, and a distance W4 between the sixth point 232d and the eighth point 242d. It is worth noting that in this embodiment, the distance W2 is greater than the distance W1, and the distance W4 is greater than the distance W3. That is to say, the geometric center of the first opening 232 of the second pixel structure 200B is shifted toward the inner region 110 of the substrate 100 relative to the geometric center of the second opening 242 of the second pixel structure 200B, and the second pixel structure The portion of the first bank layer 230 of 200B that is not covered by the second bank layer 240 has a larger width near the edge 100 a and/or edge 100 b of the substrate 100.

請參考圖1A,本實施例的多個畫素結構200A~200M還可以包括設置於周邊區120的第二畫素結構200F、200I、200L以及設置於周邊區120的第三畫素結構200C、200D、200E、200G、200H、200J、200K、200M。Please refer to FIG. 1A. The plurality of pixel structures 200A-200M in this embodiment may further include second pixel structures 200F, 200I, 200L disposed in the peripheral area 120 and a third pixel structure 200C disposed in the peripheral area 120. 200D, 200E, 200G, 200H, 200J, 200K, 200M.

舉例而言,在本實施例中,方向d1與方向d2可劃分出四個象限,其中第二畫素結構200F與第三畫素結構200G位於第一象限,第二畫素結構200B與第三畫素結構200C位於第二象限,第二畫素結構200I與第三畫素結構200J位於第三象限,第二畫素結構200L與第三畫素結構200M位於第四象限。For example, in this embodiment, the direction d1 and the direction d2 can be divided into four quadrants, wherein the second pixel structure 200F and the third pixel structure 200G are located in the first quadrant, and the second pixel structure 200B and the third The pixel structure 200C is located in the second quadrant, the second pixel structure 200I and the third pixel structure 200J are located in the third quadrant, and the second pixel structure 200L and the third pixel structure 200M are located in the fourth quadrant.

位於第二象限之第一畫素結構200A、第二畫素結構200B以及第三畫素結構200C沿著由基板100之內部區110指向基板100之周邊區120的方向d12依序排列。舉例而言,第三畫素結構200C的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1,且第三畫素結構200C的第一偏移量d1大於第二畫素結構200B的第一偏移量d1。此外,第三畫素結構200C的第一開口232與其第二開口242在第二方向d2上具有第二偏移量d2,且第三畫素結構200C的第二偏移量d2大於第二畫素結構200B的第二偏移量d2。The first pixel structure 200A, the second pixel structure 200B, and the third pixel structure 200C located in the second quadrant are sequentially arranged along a direction d12 from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100. For example, the first opening 232 and the second opening 242 of the third pixel structure 200C have a first offset d1 in the first direction d1, and the first offset d1 of the third pixel structure 200C is greater than the first The first offset d1 of the two-pixel structure 200B. In addition, the first opening 232 and the second opening 242 of the third pixel structure 200C have a second offset d2 in the second direction d2, and the second offset d2 of the third pixel structure 200C is greater than the second The second offset d2 of the element structure 200B.

位於第三象限之第一畫素結構200A、第二畫素結構200I以及第三畫素結構200J沿著由基板100之內部區110指向基板100之周邊區120的方向d13依序排列。舉例而言,第三畫素結構200J的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1,且第三畫素結構200J的第一偏移量d1大於第二畫素結構200I的第一偏移量d1,第二畫素結構200I的第一偏移量d1大於第一畫素結構200A的第一偏移量d1。此外,第三畫素結構200J的第一開口232與其第二開口242在第二方向d2上具有第二偏移量d2,且第三畫素結構200J的第二偏移量d2大於第二畫素結構200I的第二偏移量d2,第二畫素結構200I的第二偏移量d2大於第一畫素結構200A的第二偏移量d2。The first pixel structure 200A, the second pixel structure 200I, and the third pixel structure 200J located in the third quadrant are sequentially arranged along a direction d13 from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100. For example, the first opening 232 and the second opening 242 of the third pixel structure 200J have a first offset d1 in the first direction d1, and the first offset d1 of the third pixel structure 200J is greater than the first The first offset d1 of the two-pixel structure 200I and the first offset d1 of the second pixel structure 200I are greater than the first offset d1 of the first pixel structure 200A. In addition, the first opening 232 and the second opening 242 of the third pixel structure 200J have a second offset d2 in the second direction d2, and the second offset d2 of the third pixel structure 200J is greater than the second The second offset d2 of the pixel structure 200I, the second offset d2 of the second pixel structure 200I is greater than the second offset d2 of the first pixel structure 200A.

位於第四象限之第一畫素結構200A、第二畫素結構200L以及第三畫素結構200M沿著由基板100之內部區110指向基板100之周邊區120的方向(例如:方向d12的反方向)依序排列。舉例而言,第三畫素結構200M的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1,且第三畫素結構200M的第一偏移量d1大於第二畫素結構200L的第一偏移量d1,第二畫素結構200L的第一偏移量d1大於第一畫素結構200A的第一偏移量d1。此外,第三畫素結構200M的第一開口232與其第二開口242在第二方向d2上具有第二偏移量d2,且第三畫素結構200M的第二偏移量d2大於第二畫素結構200L的第二偏移量d2,第二畫素結構200L的第二偏移量d2大於第一畫素結構200A的第二偏移量d2。The first pixel structure 200A, the second pixel structure 200L, and the third pixel structure 200M located in the fourth quadrant are along the direction from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100 (for example: the reverse of the direction d12 Direction) in order. For example, the first opening 232 and the second opening 242 of the third pixel structure 200M have a first offset d1 in the first direction d1, and the first offset d1 of the third pixel structure 200M is greater than the first The first offset d1 of the two-pixel structure 200L and the first offset d1 of the second pixel structure 200L are greater than the first offset d1 of the first pixel structure 200A. In addition, the first opening 232 and the second opening 242 of the third pixel structure 200M have a second offset d2 in the second direction d2, and the second offset d2 of the third pixel structure 200M is greater than the second The second offset d2 of the pixel structure 200L, the second offset d2 of the second pixel structure 200L is greater than the second offset d2 of the first pixel structure 200A.

位於第一象限之第一畫素結構200A、第二畫素結構200F以及第三畫素結構200G沿著由基板100之內部區110指向基板100之周邊區120的方向(例如:方向d13的反方向)依序排列。舉例而言,第三畫素結構200G的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1,且第三畫素結構200G的第一偏移量d1大於第二畫素結構200F的第一偏移量d1,第二畫素結構200F的第一偏移量d1大於第一畫素結構200A的第一偏移量d1。此外,第三畫素結構200G的第一開口232與其第二開口242在第二方向d2上具有第二偏移量d2,且第三畫素結構200G的第二偏移量d2大於第二畫素結構200F的第二偏移量d2,第二畫素結構200F的第二偏移量d2大於第一畫素結構200A的第二偏移量d2。The first pixel structure 200A, the second pixel structure 200F, and the third pixel structure 200G in the first quadrant are along the direction from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100 (for example: the reverse of the direction d13 Direction) in order. For example, the first opening 232 and the second opening 242 of the third pixel structure 200G have a first offset d1 in the first direction d1, and the first offset d1 of the third pixel structure 200G is greater than the first The first offset d1 of the two-pixel structure 200F and the first offset d1 of the second pixel structure 200F are greater than the first offset d1 of the first pixel structure 200A. In addition, the first opening 232 and the second opening 242 of the third pixel structure 200G have a second offset d2 in the second direction d2, and the second offset d2 of the third pixel structure 200G is greater than the second The second offset d2 of the pixel structure 200F, the second offset d2 of the second pixel structure 200F is greater than the second offset d2 of the first pixel structure 200A.

在本實施例中,第一畫素結構200A與第三畫素結構200D沿著由基板100之內部區110指向基板100之周邊區120的方向d1依序排列。舉例而言,在本實施例中,第三畫素結構200D的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1,且第三畫素結構200D的第一偏移量d1大於第一畫素結構200A的第一偏移量d1。另外,第三畫素結構200D的第一開口232與其第二開口242在第二方向d2上的第二偏移量d2實質上可為0。In this embodiment, the first pixel structure 200A and the third pixel structure 200D are sequentially arranged along the direction d1 from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100. For example, in this embodiment, the first opening 232 and the second opening 242 of the third pixel structure 200D have a first offset d1 in the first direction d1, and the first opening of the third pixel structure 200D The offset d1 is greater than the first offset d1 of the first pixel structure 200A. In addition, the second offset d2 of the first opening 232 and the second opening 242 of the third pixel structure 200D in the second direction d2 may be substantially zero.

在本實施例中,第一畫素結構200A與第三畫素結構200E沿著由基板100之內部區110指向基板100之周邊區120的方向d2依序排列。舉例而言,在本實施例中,第三畫素結構200E的第一開口232與其第二開口242在第二方向d2上具有第二偏移量d2,且第三畫素結構200E的第二偏移量d2大於第一畫素結構200A的第二偏移量d2。另外,第三畫素結構200E的第一開口232與其第二開口242在第一方向d1上的第一偏移量d1實質上可為0。In this embodiment, the first pixel structure 200A and the third pixel structure 200E are sequentially arranged along the direction d2 from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100. For example, in this embodiment, the first opening 232 and the second opening 242 of the third pixel structure 200E have a second offset d2 in the second direction d2, and the second opening of the third pixel structure 200E The offset d2 is greater than the second offset d2 of the first pixel structure 200A. In addition, the first offset d1 of the first opening 232 and the second opening 242 of the third pixel structure 200E in the first direction d1 may be substantially zero.

在本實施例中,第一畫素結構200A與第三畫素結構200K沿著由基板100之內部區110指向基板100之周邊區120的方向(例如:方向d1的反方向)依序排列。舉例而言,在本實施例中,第三畫素結構200K的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1,且第三畫素結構200K的第一偏移量d1大於第一畫素結構200A的第一偏移量d1。另外,第三畫素結構200D的第一開口232與其第二開口242在第二方向d2上的第二偏移量d2實質上可為0。In this embodiment, the first pixel structure 200A and the third pixel structure 200K are sequentially arranged along the direction from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100 (for example, the reverse direction of the direction d1). For example, in this embodiment, the first opening 232 and the second opening 242 of the third pixel structure 200K have a first offset d1 in the first direction d1, and the first opening of the third pixel structure 200K The offset d1 is greater than the first offset d1 of the first pixel structure 200A. In addition, the second offset d2 of the first opening 232 and the second opening 242 of the third pixel structure 200D in the second direction d2 may be substantially zero.

在本實施例中,第一畫素結構200A與第三畫素結構200H沿著由基板100之內部區110指向基板100之周邊區120的方向d2依序排列。舉例而言,在本實施例中,第三畫素結構200H的第一開口232與其第二開口242在第二方向d2上具有第二偏移量d2,且第三畫素結構200H的第二偏移量d2大於第一畫素結構200A的第二偏移量d2。另外,第三畫素結構200H的第一開口232與其第二開口242在第一方向d1上的第一偏移量d1實質上可為0。In this embodiment, the first pixel structure 200A and the third pixel structure 200H are sequentially arranged along the direction d2 from the inner region 110 of the substrate 100 to the peripheral region 120 of the substrate 100. For example, in this embodiment, the first opening 232 of the third pixel structure 200H and the second opening 242 have a second offset d2 in the second direction d2, and the second opening of the third pixel structure 200H The offset d2 is greater than the second offset d2 of the first pixel structure 200A. In addition, the first offset d1 of the first opening 232 and the second opening 242 of the third pixel structure 200H in the first direction d1 may be substantially zero.

值得一提的是,在本實施例中,由於位於周邊區120的第二、三畫素結構200B~200M的第一開口232與其第二開口242在第一方向d1上具有第一偏移量d1及/或第二偏移量d2,因此,顯示裝置10中設置於周邊區120的第二、三畫素結構200B~200M中的發光層270的固化速度可以與設置於內部區110的第一畫素結構200A中的發光層270的固化速度差異較小,進而改善顯示裝置10的顯示品質。It is worth mentioning that in this embodiment, since the first opening 232 and the second opening 242 of the second and three pixel structures 200B-200M located in the peripheral area 120 have a first offset in the first direction d1 d1 and/or the second offset d2, therefore, the curing speed of the light-emitting layer 270 in the second and three-pixel structures 200B to 200M provided in the peripheral area 120 of the display device 10 can be the same as that of the light provided in the inner area 110. The difference in the curing speed of the light-emitting layer 270 in a pixel structure 200A is small, thereby improving the display quality of the display device 10.

圖2A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。圖2B是根據圖2A的剖線E-E’繪示的顯示裝置的畫素結構的剖面示意圖。圖2A省略圖2B之主動元件層210、電洞注入層250、電洞傳輸層260、發光層270、電子傳輸層280、電子注入層290及第二電極300的繪示。在此必須說明的是,圖2A與圖2B的實施例沿用圖1A與圖1B的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。2A is a schematic top view of some components of a display device according to another embodiment of the invention. 2B is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line E-E' of FIG. 2A. 2A omits the illustration of the active device layer 210, the hole injection layer 250, the hole transport layer 260, the light emitting layer 270, the electron transport layer 280, the electron injection layer 290, and the second electrode 300 of FIG. 2B. It must be noted here that the embodiments of FIGS. 2A and 2B follow the element numbers and partial contents of the embodiments of FIGS. 1A and 1B, wherein the same or similar reference numbers are used to indicate the same or similar elements, and the same are omitted Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

請參考圖2A及圖2B,在本實施例的顯示裝置20中,多個畫素結構200A、200N包括設置於基板100的內部區110的第一畫素結構200A以及設置於周邊區120的第二畫素結構200N。舉例而言,在本實施例中,第二畫素結構200N可設置於基板100的角落,但不以此為限。2A and 2B, in the display device 20 of this embodiment, the plurality of pixel structures 200A, 200N include a first pixel structure 200A disposed in the inner region 110 of the substrate 100 and a first pixel structure 200A disposed in the peripheral region 120 Two pixel structure 200N. For example, in this embodiment, the second pixel structure 200N may be disposed at the corner of the substrate 100, but it is not limited thereto.

在本實施例中,第二畫素結構200N包括在第一方向d1上排列且相鄰的兩個子畫素結構200N-1與子畫素結構200N-2。在本實施例中,第二畫素結構200N之子畫素結構200N-1的第二開口242與子畫素結構200N-2的第二開口242相通。In this embodiment, the second pixel structure 200N includes two adjacent sub-pixel structures 200N-1 and 200N-2 arranged in the first direction d1 and adjacent to each other. In this embodiment, the second opening 242 of the sub-pixel structure 200N-1 of the second pixel structure 200N is in communication with the second opening 242 of the sub-pixel structure 200N-2.

在本實施例中,子畫素結構200N-1的第一開口232與子畫素結構200N-2的第一開口232彼此分離。也就是說,第二畫素結構200N的第一開口232為彼此分離的子畫素結構200N-1的第一開口232與子畫素結構200N-2的第一開口232。亦即,在本實施例中,第二畫素結構200N的至少一第一開口232於基板100上的垂直投影面積為子畫素結構200N-1的第一開口232與子畫素結構200N-2的第一開口232各自於基板100上的多個垂直投影面積的和。In this embodiment, the first opening 232 of the sub-pixel structure 200N-1 and the first opening 232 of the sub-pixel structure 200N-2 are separated from each other. That is to say, the first opening 232 of the second pixel structure 200N is the first opening 232 of the sub-pixel structure 200N-1 and the first opening 232 of the sub-pixel structure 200N-2 separated from each other. That is, in this embodiment, the vertical projection area of at least one first opening 232 of the second pixel structure 200N on the substrate 100 is the first opening 232 of the sub-pixel structure 200N-1 and the sub-pixel structure 200N- The first openings 232 of 2 are respectively the sum of the multiple vertical projection areas on the substrate 100.

需說明的是,由於子畫素結構200N-1的第二開口242與子畫素結構200N-2的第二開口242相通,因此可使用噴墨印刷製程的方法將一液滴同時配置於子畫素結構200N-1的第一電極220及子畫素結構200N-2的第一電極220上,進而形成子畫素結構200N-1與子畫素結構200N-2的發光層270。子畫素結構200N-1與子畫素結構200N-2的發光層270利用同一液滴形成,而子畫素結構200N-1與子畫素結構200N-2用以顯示相同的顏色。It should be noted that, since the second opening 242 of the sub-pixel structure 200N-1 communicates with the second opening 242 of the sub-pixel structure 200N-2, an inkjet printing process can be used to dispose a droplet at the same time On the first electrode 220 of the pixel structure 200N-1 and the first electrode 220 of the sub-pixel structure 200N-2, a light-emitting layer 270 of the sub-pixel structure 200N-1 and the sub-pixel structure 200N-2 is further formed. The light-emitting layers 270 of the sub-pixel structure 200N-1 and the sub-pixel structure 200N-2 are formed using the same droplet, and the sub-pixel structure 200N-1 and the sub-pixel structure 200N-2 are used to display the same color.

在本實施例中,由於第二畫素結構200N之至少一第一開口232(亦即,子畫素結構200N-1的第一開口232與子畫素結構200N-2的第一開口232)於基板110上的垂直投影面積大於第一畫素結構200A之第一開口232於基板110上的垂直投影面積,因此使用噴墨印刷製程的方法形成發光層270時,設置於第二畫素結構200N之至少一第一開口232的液滴量會多於設置於第一畫素結構200A之第一開口232的液滴量。In this embodiment, at least one first opening 232 of the second pixel structure 200N (that is, the first opening 232 of the sub-pixel structure 200N-1 and the first opening 232 of the sub-pixel structure 200N-2) The vertical projection area on the substrate 110 is larger than the vertical projection area of the first opening 232 of the first pixel structure 200A on the substrate 110. Therefore, when the light-emitting layer 270 is formed using the inkjet printing process, it is disposed on the second pixel structure The amount of droplets in at least one first opening 232 of 200N will be greater than the amount of droplets provided in the first opening 232 of the first pixel structure 200A.

值得一提的是,設置於周邊區120的第二畫素結構200N的液滴的揮發速度快,設置於內部區110的第一畫素結構200A的液滴的揮發速度慢,但由於設置於周邊區120的第二畫素結構200N上的液滴量大於設置於內部區110的第一畫素結構200A上的液滴量,使得第二畫素結構200N的發光層270的固化所需時間與第一畫素結構200A的發光層270的固化所需時間的差異能縮小。藉此,可以改善顯示面板20之周邊區120的第二畫素結構200N之發光層270與內部區110的第一畫素結構200A之發光層270的膜厚不一的問題,進而改善顯示裝置20的顯示品質。It is worth mentioning that the droplets of the second pixel structure 200N disposed in the peripheral area 120 have a fast volatilization speed, and the droplets of the first pixel structure 200A disposed in the inner area 110 have a slow volatilization speed. The amount of droplets on the second pixel structure 200N of the peripheral area 120 is greater than the amount of droplets disposed on the first pixel structure 200A of the inner area 110, so that the time required for the curing of the light emitting layer 270 of the second pixel structure 200N The difference in time required for curing the light emitting layer 270 of the first pixel structure 200A can be reduced. Thereby, the problem that the film thickness of the light-emitting layer 270 of the second pixel structure 200N in the peripheral area 120 of the display panel 20 and the light-emitting layer 270 of the first pixel structure 200A in the inner area 110 may be different, thereby improving the display device 20 display quality.

在本實施例中,第一堤岸層230包括子堤岸230’。子堤岸230’位於子畫素結構200N-1的第一開口232與子畫素結構200N-2的第一開口232之間。在本實施例中,子堤岸230’在第一方向d1上具有寬度L5,且寬度L5不為0。In this embodiment, the first bank layer 230 includes sub-banks 230'. The sub-bank 230' is located between the first opening 232 of the sub-pixel structure 200N-1 and the first opening 232 of the sub-pixel structure 200N-2. In this embodiment, the sub-bank 230' has a width L5 in the first direction d1, and the width L5 is not zero.

舉例而言,在本實施例中,第二畫素結構200N的至少一第一電極220可為彼此分離的多個第一電極220。具體而言,第二畫素結構200N的第一電極220為彼此分離的子畫素結構200N-1的第一電極220與子畫素結構200N-2的第一電極220。子畫素結構200N-1的第一電極220與子畫素結構200N-2的第一電極220可選擇性地各自連接到不同的薄膜電晶體。也就是說,在本實施例中,顯示裝置20於內部區110及周邊區120的解析度可以選擇性地一致,但不以此為限。子畫素結構200N-1與子畫素結構200N-2各自的第一電極220分別與子畫素結構200N-1與子畫素結構200N-2各自的第一開口232重疊。發光層270設置於子畫素結構200N-1的部分第一電極220上與子畫素結構200N-2的部分第一電極220上,且位於子畫素結構200N-1的第一開口232、子畫素結構200N-2的第一開口232、子畫素結構200N-1的第二開口242以及子畫素結構200N-2的第二開口242中。舉例而言,在本實施例中,由於子畫素結構200N-1的第二開口242與子畫素結構200N-2的第二開口242相通,因此子畫素結構200N-1與子畫素結構200N-2的電洞注入層250、電洞傳輸層260與發光層270可分別利用分佈於子畫素結構200N-1之第一開口232與子畫素結構200N-2之第一開口232的液滴,依序形成電洞注入層250、電洞傳輸層260與發光層270,形成於子畫素結構200N-1與子畫素結構200N-2的多個第一電極220上。電洞注入層250、電洞傳輸層260與發光層270位於子畫素結構200N-1的第一開口232、子畫素結構200N-2的第一開口232、子畫素結構200N-1的第二開口242以及子畫素結構200N-2的第二開口242中。For example, in this embodiment, at least one first electrode 220 of the second pixel structure 200N may be a plurality of first electrodes 220 separated from each other. Specifically, the first electrode 220 of the second pixel structure 200N is the first electrode 220 of the sub-pixel structure 200N-1 and the first electrode 220 of the sub-pixel structure 200N-2 separated from each other. The first electrode 220 of the sub-pixel structure 200N-1 and the first electrode 220 of the sub-pixel structure 200N-2 can be selectively connected to different thin film transistors. That is to say, in this embodiment, the resolutions of the display device 20 in the inner area 110 and the peripheral area 120 can be selectively consistent, but not limited to this. The first electrodes 220 of the sub-pixel structure 200N-1 and the sub-pixel structure 200N-2 respectively overlap the first openings 232 of the sub-pixel structure 200N-1 and the sub-pixel structure 200N-2, respectively. The light-emitting layer 270 is disposed on a portion of the first electrode 220 of the sub-pixel structure 200N-1 and a portion of the first electrode 220 of the sub-pixel structure 200N-2, and is located in the first opening 232 of the sub-pixel structure 200N-1. The first opening 232 of the sub-pixel structure 200N-2, the second opening 242 of the sub-pixel structure 200N-1, and the second opening 242 of the sub-pixel structure 200N-2. For example, in this embodiment, since the second opening 242 of the sub-pixel structure 200N-1 communicates with the second opening 242 of the sub-pixel structure 200N-2, the sub-pixel structure 200N-1 and the sub-pixel The hole injection layer 250, the hole transport layer 260 and the light emitting layer 270 of the structure 200N-2 can utilize the first opening 232 distributed in the sub-pixel structure 200N-1 and the first opening 232 of the sub-pixel structure 200N-2, respectively The droplets are sequentially formed into the hole injection layer 250, the hole transport layer 260 and the light emitting layer 270, and are formed on the plurality of first electrodes 220 of the sub-pixel structure 200N-1 and the sub-pixel structure 200N-2. The hole injection layer 250, the hole transport layer 260, and the light emitting layer 270 are located in the first opening 232 of the sub-pixel structure 200N-1, the first opening 232 of the sub-pixel structure 200N-2, and the sub-pixel structure 200N-1. The second opening 242 and the second opening 242 of the sub-pixel structure 200N-2.

在本實施例中,電洞注入層250、電洞傳輸層260與發光層270還可形成於子堤岸230’上。於垂直基板100的第三方向d3上,發光層270的頂面272具有與第二開口之中心重疊的一點272a以及與子堤岸230’之中心重疊的一點272b。發光層270的頂面272上的一點272a至第一電極220的頂面222的距離為第一距離T1。發光層270的頂面272上的一點272b至子堤岸230’的頂面234’具有距離T1’。在本實施例中,第一距離T1約等於距離T1’。In this embodiment, the hole injection layer 250, the hole transport layer 260, and the light emitting layer 270 may also be formed on the sub-bank 230'. In the third direction d3 perpendicular to the substrate 100, the top surface 272 of the light emitting layer 270 has a point 272a overlapping the center of the second opening and a point 272b overlapping the center of the sub-bank 230'. The distance from a point 272a on the top surface 272 of the light-emitting layer 270 to the top surface 222 of the first electrode 220 is the first distance T1. A point 272b on the top surface 272 of the light emitting layer 270 has a distance T1' from the top surface 234' of the sub-bank 230'. In this embodiment, the first distance T1 is approximately equal to the distance T1'.

電子傳輸層280、電子注入層290與第二電極300依序設置於發光層270與第二堤岸層240上。舉例而言,在本實施例中,電子傳輸層280、電子注入層290與第二電極300的每一者可以具有大致上相同的膜厚,但本發明不限於此。The electron transport layer 280, the electron injection layer 290, and the second electrode 300 are sequentially disposed on the light emitting layer 270 and the second bank layer 240. For example, in the present embodiment, each of the electron transport layer 280, the electron injection layer 290, and the second electrode 300 may have substantially the same film thickness, but the present invention is not limited thereto.

圖3A是依照本發明又一實施例的顯示裝置的部分元件的上視示意圖。圖3B是根據圖3A的剖線F-F’繪示的顯示裝置的畫素結構的剖面示意圖。圖3A省略圖3B之主動元件層210、電洞注入層250、電洞傳輸層260、發光層270、電子傳輸層280、電子注入層290及第二電極300的繪示。在此必須說明的是,圖3A與圖3B的實施例沿用圖2A與圖2B的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。3A is a schematic top view of some components of a display device according to yet another embodiment of the invention. 3B is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line F-F' of FIG. 3A. 3A omits the illustration of the active device layer 210, the hole injection layer 250, the hole transport layer 260, the light emitting layer 270, the electron transport layer 280, the electron injection layer 290, and the second electrode 300 of FIG. 3B. It must be noted here that the embodiments of FIGS. 3A and 3B follow the element numbers and partial contents of the embodiments of FIGS. 2A and 2B, wherein the same or similar reference numerals are used to indicate the same or similar elements, and the same is omitted Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

請參考圖3A及圖3B,在本實施例的顯示裝置30中,多個畫素結構200A、200P包括設置於基板100的內部區110的第一畫素結構200A以及設置於周邊區120的第二畫素結構200P。舉例而言,在本實施例中,第二畫素結構200P可設置於基板100的角落,但不以此為限。3A and 3B, in the display device 30 of this embodiment, the plurality of pixel structures 200A, 200P include a first pixel structure 200A disposed in the inner region 110 of the substrate 100 and a first pixel structure 200A disposed in the peripheral region 120 Two pixel structure 200P. For example, in this embodiment, the second pixel structure 200P may be disposed at the corner of the substrate 100, but it is not limited thereto.

在本實施例中,第二畫素結構200P包括在第一方向d1上排列且相鄰的三個子畫素結構200P-1、子畫素結構200P-2以及子畫素結構200P-3。在本實施例中,第二畫素結構200P之子畫素結構200P-1的第二開口242、子畫素結構200P-2的第二開口242與子畫素結構200P-3的第二開口242相通。In this embodiment, the second pixel structure 200P includes three adjacent sub-pixel structures 200P-1, sub-pixel structures 200P-2, and sub-pixel structures 200P-3 arranged in the first direction d1 and adjacent to each other. In this embodiment, the second opening 242 of the sub-pixel structure 200P-1 of the second pixel structure 200P, the second opening 242 of the sub-pixel structure 200P-2 and the second opening 242 of the sub-pixel structure 200P-3 Connected.

在本實施例中,子畫素結構200P-1的第一開口232、子畫素結構200P-2的第一開口232與子畫素結構200P-3的第一開口232彼此分離。也就是說,第二畫素結構200P的第一開口232為彼此分離的子畫素結構200P-1的第一開口232、子畫素結構200P-2的第一開口232與子畫素結構200P-3的第一開口232。亦即,在本實施例中,第二畫素結構200P的至少一第一開口232於基板100上的垂直投影面積為第二畫素結構200P中的子畫素結構200P-1的第一開口232、子畫素結構200P-2的第一開口232以及子畫素結構200P-3的第一開口232各自於基板100上的多個垂直投影面積的和。In this embodiment, the first opening 232 of the sub-pixel structure 200P-1, the first opening 232 of the sub-pixel structure 200P-2 and the first opening 232 of the sub-pixel structure 200P-3 are separated from each other. In other words, the first opening 232 of the second pixel structure 200P is the first opening 232 of the sub-pixel structure 200P-1, the first opening 232 of the sub-pixel structure 200P-2, and the sub-pixel structure 200P The first opening 232 of -3. That is, in this embodiment, the vertical projection area of at least one first opening 232 of the second pixel structure 200P on the substrate 100 is the first opening of the sub-pixel structure 200P-1 in the second pixel structure 200P 232, the first opening 232 of the sub-pixel structure 200P-2 and the first opening 232 of the sub-pixel structure 200P-3 are each the sum of a plurality of vertical projection areas on the substrate 100.

需說明的是,由於子畫素結構200P-1的第二開口242、子畫素結構200P-2的第二開口242與子畫素結構200P-3的第二開口242相通,因此可使用噴墨印刷製程的方法將一液滴同時配置於子畫素結構200P-1的第一電極220、子畫素結構200P-2的第一電極220及子畫素結構200P-3的第一電極220上,進而形成子畫素結構200P-1、子畫素結構200P-2與子畫素結構200P-3的發光層270。子畫素結構200P-1、子畫素結構200P-2及子畫素結構200P-3的發光層270利用同一液滴形成,而子畫素結構200P-1、子畫素結構200P-2及子畫素結構200P-3用以顯示相同的顏色。It should be noted that, since the second opening 242 of the sub-pixel structure 200P-1 and the second opening 242 of the sub-pixel structure 200P-2 are in communication with the second opening 242 of the sub-pixel structure 200P-3, a spray can be used In the ink printing process, a droplet is simultaneously disposed on the first electrode 220 of the sub-pixel structure 200P-1, the first electrode 220 of the sub-pixel structure 200P-2 and the first electrode 220 of the sub-pixel structure 200P-3 On top, the light-emitting layer 270 of the sub-pixel structure 200P-1, the sub-pixel structure 200P-2, and the sub-pixel structure 200P-3 is further formed. The light-emitting layers 270 of the sub-pixel structure 200P-1, the sub-pixel structure 200P-2 and the sub-pixel structure 200P-3 are formed using the same droplet, and the sub-pixel structure 200P-1, the sub-pixel structure 200P-2 and The sub-pixel structure 200P-3 is used to display the same color.

在本實施例中,由於第二畫素結構200P之至少一第一開口232(亦即,子畫素結構200P-1的第一開口232、子畫素結構200P-2的第一開口232與子畫素結構200P-3的第一開口232)於基板110上的垂直投影面積大於第一畫素結構200A之第一開口232於基板110上的垂直投影面積,因此使用噴墨印刷製程的方法形成發光層270時,設置於第二畫素結構200P之至少一第一開口232的液滴量會多於設置於第一畫素結構200A之第一開口232的液滴量。In this embodiment, since at least one first opening 232 of the second pixel structure 200P (ie, the first opening 232 of the sub-pixel structure 200P-1 and the first opening 232 of the sub-pixel structure 200P-2 are The vertical opening area of the first opening 232 of the sub-pixel structure 200P-3) on the substrate 110 is larger than the vertical projection area of the first opening 232 of the first pixel structure 200A on the substrate 110, so the inkjet printing process is used When the light-emitting layer 270 is formed, the amount of droplets provided in the at least one first opening 232 of the second pixel structure 200P is greater than the amount of droplets provided in the first opening 232 of the first pixel structure 200A.

值得一提的是,設置於周邊區120的第二畫素結構200P的液滴的揮發速度快,設置於內部區110的第一畫素結構200A的液滴的揮發速度慢,但由於設置於周邊區120的第二畫素結構200P上的液滴量大於設置於內部區110的第一畫素結構200A上的液滴量,使得第二畫素結構200P的發光層270的固化所需的時間與第一畫素結構200A的發光層270的固化所需的時間的差異能縮小。藉此,可以改善顯示面板30之周邊區120的第二畫素結構200P之發光層270與內部區110的第一畫素結構200A之發光層270的膜厚不一的問題,進而改善顯示裝置30的顯示品質。It is worth mentioning that the droplets of the second pixel structure 200P disposed in the peripheral area 120 have a fast volatilization speed, and the droplets of the first pixel structure 200A disposed in the inner area 110 have a slow volatilization speed. The amount of droplets on the second pixel structure 200P of the peripheral area 120 is greater than the amount of droplets provided on the first pixel structure 200A of the inner area 110, so that the curing of the light emitting layer 270 of the second pixel structure 200P is required The difference between the time and the time required for the curing of the light emitting layer 270 of the first pixel structure 200A can be reduced. Thereby, the problem that the film thickness of the light-emitting layer 270 of the second pixel structure 200P in the peripheral region 120 of the display panel 30 and the light-emitting layer 270 of the first pixel structure 200A in the inner region 110 are different can be improved, thereby improving the display device 30 display quality.

舉例而言,在本實施例中,第一堤岸層230包括子堤岸230’、230”。子堤岸230’位於子畫素結構200P-1的第一開口232與子畫素結構200P-2的第一開口232之間,而子堤岸230”位於子畫素結構200P-2的第一開口232與子畫素結構200P-3的第一開口232之間。在本實施例中,子堤岸230’及子堤岸230”各自在第一方向d1上具有寬度L5及寬度L5’,且寬度L5與寬度L5’皆不為0。在本實施例中,發光層270的頂面272上的一點272b至子堤岸230”的頂面234”具有距離T1”。在本實施例中,第一距離T1、距離T1’與距離T1”實質上相等。For example, in this embodiment, the first bank layer 230 includes sub-banks 230', 230". The sub-bank 230' is located between the first opening 232 of the sub-pixel structure 200P-1 and the sub-pixel structure 200P-2. Between the first openings 232, the sub-bank 230" is located between the first opening 232 of the sub-pixel structure 200P-2 and the first opening 232 of the sub-pixel structure 200P-3. In this embodiment, the sub-bank 230' and the sub-bank 230" each have a width L5 and a width L5' in the first direction d1, and neither the width L5 nor the width L5' is 0. In this embodiment, the light-emitting layer A point 272b on the top surface 272 of 270 has a distance T1" from the top surface 234" of the sub-bank 230". In this embodiment, the first distance T1, the distance T1' and the distance T1" are substantially equal.

在本實施例中,第二畫素結構200P中的子畫素結構200P-1的第一電極220、子畫素結構200P-2的第一電極220及子畫素結構200P-3的第一電極220彼此分離,子畫素結構200P-1、子畫素結構200P-2及子畫素結構200P-3各自的第一電極220分別與子畫素結構200P-1、子畫素結構200P-2及子畫素結構200P-3各自的第一開口232重疊。子畫素結構200P-1的第一電極220、子畫素結構200P-2的第一電極220與子畫素結構200P-3的第一電極220可選擇性地各自連接到不同的薄膜電晶體。也就是說,在本實施例中,顯示裝置30於內部區110及周邊區120的解析度可以選擇性地一致,但不以此為限。In this embodiment, the first electrode 220 of the sub-pixel structure 200P-1 in the second pixel structure 200P, the first electrode 220 of the sub-pixel structure 200P-2 and the first electrode of the sub-pixel structure 200P-3 The electrodes 220 are separated from each other, and the first electrodes 220 of the sub-pixel structure 200P-1, the sub-pixel structure 200P-2 and the sub-pixel structure 200P-3 are respectively separated from the sub-pixel structure 200P-1 and the sub-pixel structure 200P- 2 and the first openings 232 of the sub-pixel structures 200P-3 overlap. The first electrode 220 of the sub-pixel structure 200P-1, the first electrode 220 of the sub-pixel structure 200P-2 and the first electrode 220 of the sub-pixel structure 200P-3 can be selectively connected to different thin film transistors . That is to say, in this embodiment, the resolution of the display device 30 in the inner area 110 and the peripheral area 120 can be selectively consistent, but not limited to this.

圖4是依照本發明再一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖4的實施例沿用圖2A的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。4 is a schematic top view of some components of a display device according to yet another embodiment of the invention. It must be noted here that the embodiment of FIG. 4 uses the element numbers and partial contents of the embodiment of FIG. 2A, wherein the same or similar reference numerals are used to indicate the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

圖4的實施例與圖2A的實施例的主要差異在於:在圖4的實施例中,在第二方向d2上相鄰的兩子畫素結構200Q-1、200Q-2之各自的第二開口242彼此相通。圖4之顯示裝置40具有與前述圖2A之顯示裝置20類似的功效及優點,於此便不再重述。The main difference between the embodiment of FIG. 4 and the embodiment of FIG. 2A is that: in the embodiment of FIG. 4, the respective second sub-pixel structures 200Q-1 and 200Q-2 adjacent in the second direction d2 The openings 242 communicate with each other. The display device 40 of FIG. 4 has similar functions and advantages as the display device 20 of FIG. 2A described above, and will not be repeated here.

圖5是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖5的實施例沿用圖4的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。5 is a schematic top view of some components of a display device according to another embodiment of the invention. It should be noted here that the embodiment of FIG. 5 uses the element numbers and partial contents of the embodiment of FIG. 4, wherein the same or similar reference numerals are used to indicate the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

圖5的實施例與圖4的實施例的主要差異在於:在圖5的實施例中,第二畫素結構200R的至少一第一開口232與第二畫素結構200R的第二開口242在第一方向d1上具有不為0的第一偏移量d1。第二畫素結構200R的至少一第一開口232與第二畫素結構200R的第二開口242在第二方向d2上具有不為0的第二偏移量d2。The main difference between the embodiment of FIG. 5 and the embodiment of FIG. 4 is that in the embodiment of FIG. 5, at least one first opening 232 of the second pixel structure 200R and the second opening 242 of the second pixel structure 200R are The first direction d1 has a first offset d1 that is not 0. At least one first opening 232 of the second pixel structure 200R and the second opening 242 of the second pixel structure 200R have a second offset d2 that is not 0 in the second direction d2.

具體而言,在本實施例中,設置於周邊區120的第二畫素結構200R包括在第二方向d2上相鄰的子畫素結構200R-1與子畫素結構200R-2,子畫素結構200R-1的第二開口242與子畫素結構200R-2的第二開口242相通,而子畫素結構200R-1的第一開口232與子畫素結構200R-2的第一開口232彼此分離。虛擬中心線232x穿過子畫素結構200R-1的第一開口232及子畫素結構200R-2的第一開口232之整體的幾何中心且平行於第二方向d2,虛擬中心線242x穿過第二畫素結構200R的第二開口242的幾何中心,而第一偏移量d1為虛擬中心線232x與虛擬中心線242x在第一方向d1上的距離。虛擬中心線232y穿過子畫素結構200R-1的第一開口232及子畫素結構200R-2的第一開口232之整體的幾何中心且平行於第一方向d1,虛擬中心線242y穿過第二畫素結構200R的第二開口242的幾何中心,而第二偏移量d2為虛擬中心線232y與虛擬中心線242y在第二方向d2上的距離。Specifically, in this embodiment, the second pixel structure 200R disposed in the peripheral area 120 includes the sub-pixel structure 200R-1 and the sub-pixel structure 200R-2 adjacent in the second direction d2. The second opening 242 of the pixel structure 200R-1 communicates with the second opening 242 of the sub-pixel structure 200R-2, and the first opening 232 of the sub-pixel structure 200R-1 and the first opening of the sub-pixel structure 200R-2 232 separated from each other. The virtual center line 232x passes through the entire geometric center of the first opening 232 of the sub-pixel structure 200R-1 and the first opening 232 of the sub-pixel structure 200R-2 and is parallel to the second direction d2, and the virtual center line 242x passes through The geometric center of the second opening 242 of the second pixel structure 200R, and the first offset d1 is the distance between the virtual center line 232x and the virtual center line 242x in the first direction d1. The virtual center line 232y passes through the entire geometric center of the first opening 232 of the sub-pixel structure 200R-1 and the first opening 232 of the sub-pixel structure 200R-2 and is parallel to the first direction d1. The virtual center line 242y passes through The geometric center of the second opening 242 of the second pixel structure 200R, and the second offset d2 is the distance between the virtual center line 232y and the virtual center line 242y in the second direction d2.

圖5的顯示裝置50兼具圖4之顯示裝置50及圖1A之顯示裝置10的優點及功效,於此便不再重述。The display device 50 of FIG. 5 combines the advantages and functions of the display device 50 of FIG. 4 and the display device 10 of FIG. 1A, and will not be repeated here.

圖6是依照本發明又一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖6的實施例沿用圖4的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。6 is a schematic top view of some components of a display device according to yet another embodiment of the invention. It must be noted here that the embodiment of FIG. 6 follows the element numbers and partial contents of the embodiment of FIG. 4, wherein the same or similar reference numerals are used to indicate the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

圖6的實施例與圖4的實施例的主要差異在於:在圖6的實施例中,不但位於周邊區120之第二畫素結構200S的第二開口242於基板100上的垂直投影面積大於位於內部區110之第一畫素結構200A的第二開口242於基板100上的垂直投影面積,位於周邊區120之第二畫素結構200S的第一開口232於基板100上的垂直投影面積也大於位於內部區110之第一畫素結構200A的第一開口232於基板100上的垂直投影面積。此外,在本實施例中,顯示裝置60於內部區110及周邊區120的解析度可以選擇性地不一致,例如:內部區110的解析度可大於周邊區120的解析度,但不以此為限。圖6的顯示裝置60具有與圖4之顯示裝置40類似的優點及功效,於此便不再重述。The main difference between the embodiment of FIG. 6 and the embodiment of FIG. 4 is that in the embodiment of FIG. 6, the vertical projection area of the second opening 242 of the second pixel structure 200S not only located in the peripheral area 120 on the substrate 100 is greater than The vertical projection area of the second opening 242 of the first pixel structure 200A located in the inner area 110 on the substrate 100, and the vertical projection area of the first opening 232 of the second pixel structure 200S located in the peripheral area 120 on the substrate 100 are also The vertical projection area of the first opening 232 of the first pixel structure 200A located in the inner region 110 on the substrate 100 is larger. In addition, in this embodiment, the resolutions of the display device 60 in the inner area 110 and the peripheral area 120 may be selectively inconsistent, for example: the resolution of the inner area 110 may be greater than the resolution of the peripheral area 120, but not as limit. The display device 60 of FIG. 6 has similar advantages and effects as the display device 40 of FIG. 4 and will not be repeated here.

圖7是依照本發明再一實施例的顯示裝置的部分元件的上視示意圖。在此必須說明的是,圖7的實施例沿用圖4的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。7 is a schematic top view of some components of a display device according to yet another embodiment of the present invention. It must be noted here that the embodiment of FIG. 7 uses the element numbers and partial contents of the embodiment of FIG. 4, wherein the same or similar reference numerals are used to indicate the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

圖7的實施例與圖4的實施例的主要差異在於:在圖7的實施例中,顯示裝置70於內部區110及周邊區120的解析度可以選擇性地不一致,例如:周邊區120的解析度可大於內部區110的解析度,但不以此為限。The main difference between the embodiment of FIG. 7 and the embodiment of FIG. 4 is that in the embodiment of FIG. 7, the resolutions of the display device 70 in the inner area 110 and the peripheral area 120 may be selectively inconsistent, for example: The resolution may be greater than the resolution of the internal zone 110, but not limited thereto.

綜上所述,本發明一實施例的顯示裝置,包括基板以及多個畫素結構。基板具有內部區以及內部區外的周邊區。多個畫素結構設置於基板上。畫素結構的每一個包括第一電極、第一堤岸層、第二堤岸層、發光層以及第二電極。第一堤岸層設置於第一電極上,且具有與部分之第一電極重疊的第一開口。第二堤岸層設置於第一堤岸層上,且具有與第一開口重疊的第二開口。發光層設置於部分的第一電極上,且位於第一堤岸層的第一開口與第二堤岸層的第二開口。第二電極設置於發光層上。畫素結構包括設置於內部區的第一畫素結構以及設置於周邊區的第二畫素結構。特別是,第二畫素結構的第一開口與第二畫素結構的第二開口在第一方向上具有第一偏移量,或者第二畫素結構之至少一第一開口於基板上的垂直投影面積大於第一畫素結構之至少一第一開口於基板上的垂直投影面積。藉此,能改善顯示裝置的周邊區與內部區的畫素結構之發光層的膜厚不一的問題,進而改善顯示裝置的顯示品質。In summary, the display device according to an embodiment of the invention includes a substrate and a plurality of pixel structures. The substrate has an inner area and a peripheral area outside the inner area. Multiple pixel structures are provided on the substrate. Each of the pixel structures includes a first electrode, a first bank layer, a second bank layer, a light emitting layer, and a second electrode. The first bank layer is disposed on the first electrode and has a first opening overlapping with a part of the first electrode. The second bank layer is disposed on the first bank layer and has a second opening overlapping with the first opening. The light emitting layer is disposed on part of the first electrode, and is located in the first opening of the first bank layer and the second opening of the second bank layer. The second electrode is disposed on the light emitting layer. The pixel structure includes a first pixel structure disposed in the inner area and a second pixel structure disposed in the peripheral area. In particular, the first opening of the second pixel structure and the second opening of the second pixel structure have a first offset in the first direction, or at least one first opening of the second pixel structure is on the substrate The vertical projection area is larger than the vertical projection area of at least one first opening of the first pixel structure on the substrate. In this way, the problem that the film thickness of the light-emitting layer of the pixel structure in the peripheral area and the inner area of the display device is not the same, thereby improving the display quality of the display device.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to the scope defined in the appended patent application.

10、20、30、40、50、60、70‧‧‧顯示裝置 100‧‧‧基板 100a、100b‧‧‧邊緣 110‧‧‧內部區 120‧‧‧周邊區 200A‧‧‧第一畫素結構 200B、200F、200I、200L、200N、200P、200Q、200R、200S、200T‧‧‧第二畫素結構 200C、200D、200E、200G、200H、200J、200K、200M‧‧‧第三畫素結構 200N-1、200N-2、200P-1、200P-2、200P-3、200Q-1、200Q-2、200R-1、200R-2、200T-1、200T-2‧‧‧子畫素結構 210‧‧‧主動元件層 220‧‧‧第一電極 222‧‧‧頂面 230‧‧‧第一堤岸層 230’、230”‧‧‧子堤岸 232‧‧‧第一開口 232a‧‧‧第一點 232b‧‧‧第二點 232c‧‧‧第五點 232d‧‧‧第六點 232s‧‧‧邊緣 232x、232y‧‧‧虛擬中心線 234、234’、234”‧‧‧頂面 240‧‧‧第二堤岸層 242‧‧‧第二開口 242a‧‧‧第三點 242b‧‧‧第四點 242c‧‧‧第七點 242d‧‧‧第八點 242s‧‧‧邊緣 242x、242y‧‧‧虛擬中心線 244‧‧‧頂面 250‧‧‧電洞注入層 260‧‧‧電洞傳輸層 270‧‧‧發光層 270a‧‧‧交界邊 272‧‧‧頂面 272a、272b‧‧‧點 280‧‧‧電子傳輸層 290‧‧‧電子注入層 300‧‧‧第二電極 302‧‧‧頂面 302a‧‧‧點 A-A’、B-B’、C-C’、D-D’、E-E’、F-F’‧‧‧剖線 d1‧‧‧第一方向 d12、d13‧‧‧方向 d2‧‧‧第二方向 d3‧‧‧第三方向 H1‧‧‧第一距離 H2‧‧‧第二距離 L1、L2、L3、L4、L5、L5’‧‧‧寬度 T1‧‧‧第一距離 T1’、T1”、W1、W2、W3、W4‧‧‧距離 T2‧‧‧第二距離 d1‧‧‧第一偏移量 d2‧‧‧第二偏移量10, 20, 30, 40, 50, 60, 70 ‧‧‧ display device 100‧‧‧ substrate 100a, 100b‧‧‧edge 110‧‧‧Inner area 120‧‧‧ surrounding area 200A‧‧‧The first pixel structure 200B, 200F, 200I, 200L, 200N, 200P, 200Q, 200R, 200S, 200T ‧‧‧ second pixel structure 200C, 200D, 200E, 200G, 200H, 200J, 200K, 200M ‧‧‧ third pixel structure 200N-1, 200N-2, 200P-1, 200P-2, 200P-3, 200Q-1, 200Q-2, 200R-1, 200R-2, 200T-1, 200T-2 210‧‧‧Active component layer 220‧‧‧First electrode 222‧‧‧Top 230‧‧‧The first embankment 230’、230”‧‧‧Zidi Bank 232‧‧‧First opening 232a‧‧‧First point 232b‧‧‧Second point 232c‧‧‧The fifth point 232d‧‧‧Sixth point 232s‧‧‧edge 232x, 232y‧‧‧ Virtual centerline 234, 234’, 234” ‧‧‧ top 240‧‧‧Second embankment 242‧‧‧Second opening 242a‧‧‧The third point 242b‧‧‧point four 242c‧‧‧Point 7 242d‧‧‧Eighth 242s‧‧‧edge 242x, 242y ‧‧‧ virtual centerline 244‧‧‧Top 250‧‧‧hole injection layer 260‧‧‧Electric transmission layer 270‧‧‧luminous layer 270a‧‧‧Boundary 272‧‧‧Top 272a, 272b‧‧‧ point 280‧‧‧Electronic transmission layer 290‧‧‧Electron injection layer 300‧‧‧Second electrode 302‧‧‧Top 302a‧‧‧point A-A’, B-B’, C-C’, D-D’, E-E’, F-F’ d1‧‧‧First direction d12, d13‧‧‧ direction d2‧‧‧Second direction d3‧‧‧third direction H1‧‧‧ First distance H2‧‧‧Second distance L1, L2, L3, L4, L5, L5’‧‧‧Width T1‧‧‧ First distance T1’, T1”, W1, W2, W3, W4‧‧‧ distance T2‧‧‧Second distance d1‧‧‧ First offset d2‧‧‧Second offset

圖1A是依照本發明一實施例的顯示裝置的部分元件的上視示意圖。 圖1B是根據圖1A的剖線A-A’繪示的顯示裝置的畫素結構的剖面示意圖。 圖1C是根據圖1A的剖線C-C’繪示的顯示裝置的畫素結構的剖面示意圖。 圖1D是根據圖1A的剖線B-B’繪示的顯示裝置的畫素結構的剖面示意圖。 圖1E是根據圖1A的剖線D-D’繪示的顯示裝置的畫素結構的剖面示意圖。 圖1F是圖1A的顯示面板的畫素結構200B的放大示意圖。 圖2A是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖2B是根據圖2A的剖線E-E’繪示的顯示裝置的畫素結構的剖面示意圖。 圖3A是依照本發明又一實施例的顯示裝置的部分元件的上視示意圖。 圖3B是根據圖3A的剖線F-F’繪示的顯示裝置的畫素結構的剖面示意圖。 圖4是依照本發明再一實施例的顯示裝置的部分元件的上視示意圖。 圖5是依照本發明另一實施例的顯示裝置的部分元件的上視示意圖。 圖6是依照本發明又一實施例的顯示裝置的部分元件的上視示意圖。 圖7是依照本發明再一實施例的顯示裝置的部分元件的上視示意圖。FIG. 1A is a schematic top view of some components of a display device according to an embodiment of the invention. FIG. 1B is a schematic cross-sectional view of the pixel structure of the display device according to section line A-A' of FIG. 1A. 1C is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line C-C' of FIG. 1A. FIG. 1D is a schematic cross-sectional view of the pixel structure of the display device according to section line B-B' of FIG. 1A. FIG. 1E is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line D-D' of FIG. 1A. FIG. 1F is an enlarged schematic diagram of the pixel structure 200B of the display panel of FIG. 1A. 2A is a schematic top view of some components of a display device according to another embodiment of the invention. 2B is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line E-E' of FIG. 2A. 3A is a schematic top view of some components of a display device according to yet another embodiment of the invention. 3B is a schematic cross-sectional view of the pixel structure of the display device according to the cross-sectional line F-F' of FIG. 3A. 4 is a schematic top view of some components of a display device according to yet another embodiment of the invention. 5 is a schematic top view of some components of a display device according to another embodiment of the invention. 6 is a schematic top view of some components of a display device according to yet another embodiment of the invention. 7 is a schematic top view of some components of a display device according to yet another embodiment of the present invention.

10‧‧‧顯示裝置 10‧‧‧Display device

100‧‧‧基板 100‧‧‧ substrate

100a、100b‧‧‧邊緣 100a, 100b‧‧‧edge

110‧‧‧內部區 110‧‧‧Inner area

120‧‧‧周邊區 120‧‧‧ surrounding area

200A‧‧‧第一畫素結構 200A‧‧‧The first pixel structure

200B、200F、200I、200L‧‧‧第二畫素結構 200B, 200F, 200I, 200L ‧‧‧ second pixel structure

200C、200D、200E、200G、200H、200J、200K、200M‧‧‧第三畫素結構 200C, 200D, 200E, 200G, 200H, 200J, 200K, 200M ‧‧‧ third pixel structure

220‧‧‧第一電極 220‧‧‧First electrode

230‧‧‧第一堤岸層 230‧‧‧The first embankment

232‧‧‧第一開口 232‧‧‧First opening

240‧‧‧第二堤岸層 240‧‧‧Second embankment

242‧‧‧第二開口 242‧‧‧Second opening

A-A’、B-B’、C-C’、D-D’‧‧‧剖線 A-A’, B-B’, C-C’, D-D’

d1‧‧‧第一方向 d1‧‧‧First direction

d12、d13‧‧‧方向 d12, d13‧‧‧ direction

d2‧‧‧第二方向 d2‧‧‧Second direction

d3‧‧‧第三方向 d3‧‧‧third direction

Claims (15)

一種顯示裝置,包括: 一基板,具有一內部區以及該內部區外的一周邊區;以及 多個畫素結構,設置於該基板上,其中該些畫素結構的每一個包括: 一第一電極; 一第一堤岸層,設置於該第一電極上,且具有與部分之該第一電極重疊的一第一開口; 一第二堤岸層,設置於該第一堤岸層上,且具有與該第一開口重疊的一第二開口; 一發光層,設置於該部分的該第一電極上,且位於該第一堤岸層的該第一開口與該第二堤岸層的該第二開口;以及 一第二電極,設置於該發光層上; 其中,該些畫素結構包括設置於該內部區的一第一畫素結構以及設置於該周邊區的一第二畫素結構,且該第二畫素結構的一第一開口與該第二畫素結構的一第二開口在一第一方向上具有一第一偏移量。A display device, including: A substrate having an inner area and a peripheral area outside the inner area; and A plurality of pixel structures are provided on the substrate, and each of the pixel structures includes: A first electrode; A first bank layer, disposed on the first electrode, and having a first opening overlapping with part of the first electrode; A second bank layer, disposed on the first bank layer, and having a second opening overlapping with the first opening; A light-emitting layer disposed on the first electrode of the portion and located at the first opening of the first bank layer and the second opening of the second bank layer; and A second electrode disposed on the light-emitting layer; Wherein, the pixel structures include a first pixel structure disposed in the inner area and a second pixel structure disposed in the peripheral area, and a first opening of the second pixel structure and the second A second opening of the pixel structure has a first offset in a first direction. 如申請專利範圍第1項所述的顯示裝置,其中該第一畫素結構的一第一開口與該第一畫素結構的一第二開口在該第一方向上具有一第一偏移量,且該第二畫素結構的該第一偏移量大於該第一畫素結構的該第一偏移量。The display device as described in item 1 of the patent application range, wherein a first opening of the first pixel structure and a second opening of the first pixel structure have a first offset in the first direction , And the first offset of the second pixel structure is greater than the first offset of the first pixel structure. 如申請專利範圍第2項所述的顯示裝置,其中該些畫素結構還包括一第三畫素結構,該第一畫素結構、該第二畫素結構以及該第三畫素結構沿著由該基板之該內部區指向該基板之該周邊區的一方向依序排列;該第三畫素結構的一第一開口與該第三畫素結構的一第二開口在該第一方向上具有一第一偏移量,且該第三畫素結構的該第一偏移量大於該第二畫素結構的該第一偏移量。The display device as described in item 2 of the patent application scope, wherein the pixel structures further include a third pixel structure, the first pixel structure, the second pixel structure and the third pixel structure are along A direction from the inner region of the substrate to the peripheral region of the substrate is sequentially arranged; a first opening of the third pixel structure and a second opening of the third pixel structure are in the first direction It has a first offset, and the first offset of the third pixel structure is greater than the first offset of the second pixel structure. 如申請專利範圍第1項所述的顯示裝置,其中該第二畫素結構之該第一開口的一邊緣具有在該第一方向上排列的一第一點及一第二點,該第一點較該第二點遠離該基板的一邊緣;該第二畫素結構之該第二開口之一邊緣具有在該第一方向上排列的一第三點及一第四點,該第三點較該第四點遠離該基板的該邊緣,該第二點與該第四點在該第一方向上的一距離大於該第一點與該第三點在該第一方向上的一距離。The display device according to item 1 of the patent application scope, wherein an edge of the first opening of the second pixel structure has a first point and a second point arranged in the first direction, the first The point is farther from the edge of the substrate than the second point; an edge of the second opening of the second pixel structure has a third point and a fourth point arranged in the first direction, the third point The distance between the second point and the fourth point in the first direction is greater than the distance between the first point and the third point in the first direction than the fourth point is farther from the edge of the substrate. 如申請專利範圍第1項所述的顯示裝置,其中第二畫素結構的該第一開口與該第二畫素結構的該第二開口在一第二方向上具有一第二偏移量,且該第一方向與該第二方向交錯。The display device according to item 1 of the patent application scope, wherein the first opening of the second pixel structure and the second opening of the second pixel structure have a second offset in a second direction, And the first direction and the second direction are interleaved. 如申請專利範圍第5項所述的顯示裝置,其中該第一畫素結構的一第一開口與該第一畫素結構的一第二開口在該第二方向上具有一第二偏移量,且該第二畫素結構的該第二偏移量大於該第一畫素結構的該第二偏移量。The display device as described in item 5 of the patent application range, wherein a first opening of the first pixel structure and a second opening of the first pixel structure have a second offset in the second direction , And the second offset of the second pixel structure is greater than the second offset of the first pixel structure. 如申請專利範圍第6項所述的顯示裝置,其中該些畫素結構還包括一第三畫素結構,該第一畫素結構、該第二畫素結構以及該第三畫素結構沿著由該基板之該內部區指向該基板之該周邊區的一方向依序排列;該第三畫素結構的一第一開口與該第三畫素結構的一第二開口在該第二方向上具有一第二偏移量,且該第三畫素結構的該第二偏移量大於該第二畫素結構的該第二偏移量。The display device as described in item 6 of the patent application range, wherein the pixel structures further include a third pixel structure, the first pixel structure, the second pixel structure and the third pixel structure are along A direction from the inner area of the substrate to the peripheral area of the substrate is sequentially arranged; a first opening of the third pixel structure and a second opening of the third pixel structure are in the second direction There is a second offset, and the second offset of the third pixel structure is greater than the second offset of the second pixel structure. 如申請專利範圍第5項所述的顯示裝置,其中該第二畫素結構之該第一開口的一邊緣具有在該第二方向上排列的一第五點及一第六點,該第五點較該第六點遠離該基板的一邊緣;該第二畫素結構之該第二開口之一邊緣具有在該第二方向上排列的一第七點及一第八點,該第七點較該第八點遠離該基板的該邊緣,該第五點與該第七點在該第二方向上的一距離大於該第六點與該第八點在該第二方向上的一距離。The display device according to item 5 of the patent application scope, wherein an edge of the first opening of the second pixel structure has a fifth point and a sixth point arranged in the second direction, the fifth The point is farther from the edge of the substrate than the sixth point; an edge of the second opening of the second pixel structure has a seventh point and an eighth point arranged in the second direction, the seventh point Farther from the edge of the substrate than the eighth point, a distance between the fifth point and the seventh point in the second direction is greater than a distance between the sixth point and the eighth point in the second direction. 如申請專利範圍第1項所述的顯示裝置,其中於垂直該基板的一第三方向上,該發光層的一頂面具有與該第二開口之中心重疊的一點,該點至該第一電極的頂面的距離為一第一距離,該發光層的該頂面與該第二堤岸層的一交界邊至該第一堤岸層的一頂面的距離為一第二距離,該第一距離小於或等於該第二距離,且該第二距離小於或等於20倍的該第一距離。The display device as claimed in item 1 of the patent application, wherein a top surface of the light-emitting layer has a point overlapping with the center of the second opening in a third direction perpendicular to the substrate, from the point to the first electrode The distance of the top surface of is a first distance, and the distance between a boundary of the top surface of the light-emitting layer and the second bank layer to a top surface of the first bank layer is a second distance, the first distance Less than or equal to the second distance, and the second distance is less than or equal to 20 times the first distance. 一種顯示裝置,包括: 一基板,具有一內部區以及該內部區外的一周邊區;以及 多個畫素結構,設置於該基板上,其中該些畫素結構的每一個包括: 至少一第一電極; 一第一堤岸層,設置於該第一電極上,且具有與部分之該至少一第一電極重疊的一至少一第一開口; 一第二堤岸層,設置於該第一堤岸層上,且具有與該至少一第一開口重疊的一第二開口; 一發光層,設置於該部分的該第一電極上,且位於該第一堤岸層的該至少一第一開口與該第二堤岸層的該第二開口;以及 一第二電極,設置於該發光層上; 其中,該些畫素結構包括設置於該內部區的一第一畫素結構以及設置於該周邊區的一第二畫素結構,該第二畫素結構之至少一第一開口於該基板上的一垂直投影面積大於該第一畫素結構之至少一第一開口於該基板上的一垂直投影面積。A display device, including: A substrate having an inner area and a peripheral area outside the inner area; and A plurality of pixel structures are provided on the substrate, and each of the pixel structures includes: At least one first electrode; A first bank layer, disposed on the first electrode, and having at least one first opening overlapping with part of the at least one first electrode; A second bank layer disposed on the first bank layer and having a second opening overlapping the at least one first opening; A light-emitting layer disposed on the first electrode of the portion and located on the at least one first opening of the first bank layer and the second opening of the second bank layer; and A second electrode disposed on the light-emitting layer; The pixel structures include a first pixel structure disposed in the inner area and a second pixel structure disposed in the peripheral area, at least a first opening of the second pixel structure is on the substrate A vertical projection area of is greater than a vertical projection area of at least one first opening of the first pixel structure on the substrate. 如申請專利範圍第10項所述的顯示裝置,其中該第二畫素結構的至少一第一電極為彼此分離的多個第一電極,該第二畫素結構的至少一第一開口為彼此分離的多個第一開口,該第二畫素結構的該些第一電極分別與該第二畫素結構的該些第一開口重疊,而該第二畫素結構之該至少一第一開口於該基板上的該垂直投影面積為該第二畫素結構的該些第一開口於該基板上的多個垂直投影面積的和。The display device of claim 10, wherein at least one first electrode of the second pixel structure is a plurality of first electrodes separated from each other, and at least one first opening of the second pixel structure is each other A plurality of separated first openings, the first electrodes of the second pixel structure respectively overlap the first openings of the second pixel structure, and the at least one first opening of the second pixel structure The vertical projection area on the substrate is the sum of the vertical projection areas of the first openings of the second pixel structure on the substrate. 如申請專利範圍第10項所述的顯示裝置,其中該第二畫素結構的至少一第一開口與該第二畫素結構的一第二開口在一第一方向上具有一第一偏移量。The display device according to item 10 of the patent application scope, wherein at least one first opening of the second pixel structure and a second opening of the second pixel structure have a first offset in a first direction the amount. 如申請專利範圍第12項所述的顯示裝置,其中第二畫素結構的該至少一第一開口與該第二畫素結構的該第二開口在一第二方向上具有一第二偏移量,且該第一方向與該第二方向交錯。The display device as described in item 12 of the patent application range, wherein the at least one first opening of the second pixel structure and the second opening of the second pixel structure have a second offset in a second direction And the first direction and the second direction are interleaved. 如申請專利範圍第10項所述的顯示裝置,其中於垂直該基板的一第三方向上,該發光層的一頂面具有與該第二開口之中心重疊的一點,該點至該第一電極的頂面的距離為一第一距離,該發光層的該頂面與該第二堤岸層的一交界邊至該第一堤岸層的一頂面的距離為一第二距離,該第一距離小於或等於該第二距離,且該第二距離小於或等於20倍的該第一距離。The display device of claim 10, wherein in a third direction perpendicular to the substrate, a top surface of the light-emitting layer has a point overlapping the center of the second opening, and the point reaches the first electrode The distance of the top surface of is a first distance, and the distance between a boundary of the top surface of the light-emitting layer and the second bank layer to a top surface of the first bank layer is a second distance, the first distance Less than or equal to the second distance, and the second distance is less than or equal to 20 times the first distance. 如申請專利範圍第10項所述的顯示裝置,其中該第二畫素結構之一第二開口於該基板上的一垂直投影面積大於該第一畫素結構之一第二開口於該基板上的一垂直投影面積。The display device of claim 10, wherein a second projected area of a second opening of the second pixel structure on the substrate is larger than a second opening of the first pixel structure on the substrate A vertical projection area.
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