TW201807842A - Electrode structure of LED capable of saving cost by reducing use amount of gold - Google Patents
Electrode structure of LED capable of saving cost by reducing use amount of gold Download PDFInfo
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- TW201807842A TW201807842A TW105126367A TW105126367A TW201807842A TW 201807842 A TW201807842 A TW 201807842A TW 105126367 A TW105126367 A TW 105126367A TW 105126367 A TW105126367 A TW 105126367A TW 201807842 A TW201807842 A TW 201807842A
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 229910052737 gold Inorganic materials 0.000 title claims abstract description 22
- 239000010931 gold Substances 0.000 title claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 42
- 239000002184 metal Substances 0.000 claims abstract description 42
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000010936 titanium Substances 0.000 claims abstract description 20
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 20
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 15
- 239000011651 chromium Substances 0.000 claims abstract description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 12
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052802 copper Inorganic materials 0.000 claims abstract description 7
- 239000010949 copper Substances 0.000 claims abstract description 7
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 7
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 7
- 239000010948 rhodium Substances 0.000 claims abstract description 7
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 7
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims abstract description 5
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims abstract description 5
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 claims abstract description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000010937 tungsten Substances 0.000 claims abstract description 5
- 239000010410 layer Substances 0.000 abstract description 118
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 239000012790 adhesive layer Substances 0.000 abstract description 5
- 238000003466 welding Methods 0.000 abstract 4
- 238000013508 migration Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 9
- 238000010586 diagram Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910002601 GaN Inorganic materials 0.000 description 2
- 229910008599 TiW Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
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- Led Devices (AREA)
Abstract
Description
本發明有關發光二極體,特別是指發光二極體的電極結構。The present invention relates to a light emitting diode, and particularly to an electrode structure of a light emitting diode.
發光二極體(Light Emitting Diode,LED),主要是由發光的半導體材料多重磊晶而成,以藍光發光二極體為例。其主要是由氮化鎵基(GaN-based)磊晶薄膜組成,堆疊形成主體結構包含N型半導體層、發光層、P型半導體層的三明治結構的發光主體,發光二極體依據其結構可以分為水平式、垂直式與覆晶式發光二極體等等,其主體結構包含N型半導體層、發光層、P型半導體層。發光二極體可以將電能轉換為光,而為了將電能輸入發光二極體的發光主體,需要於發光主體上設置二電極結構分別電性連接N型半導體層與P型半導體層。Light Emitting Diodes (LEDs) are mainly made of multiple epitaxial semiconductor materials, taking blue light emitting diodes as an example. It is mainly composed of gallium nitride-based (GaN-based) epitaxial thin film, stacked to form a light-emitting body with a sandwich structure including a N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer. The light-emitting diode can be based on its structure. Divided into horizontal, vertical and flip-chip light-emitting diodes, etc., its main structure includes an N-type semiconductor layer, a light-emitting layer, and a P-type semiconductor layer. The light emitting diode can convert electric energy into light, and in order to input electric energy into the light emitting body of the light emitting diode, a two-electrode structure needs to be provided on the light emitting body to electrically connect the N-type semiconductor layer and the P-type semiconductor layer, respectively.
請參閱「圖1」所示,為一種習知發光二極體的電極結構,其主要包含一附著層1與一銲墊層2,其中該附著層1包含一鉻層1A(18埃)、一第一金屬層1B(2500埃)與一第二金屬層1C(500埃),而該銲墊層2包含一鉑層2A(400埃)與一金層2B(18000埃),該銲墊層2為供打線使用,為了滿足打線的硬度與減少電致遷移的需求,其金層2B的厚度必須達到18000埃,顯然金的用量相當大,這是因為鋁的硬度過軟,不易進行打線,且大電流操作下會產生電致遷移現象;由於金的成本遠大於鋁,因此其製造成本高昂。Please refer to FIG. 1, which is a conventional electrode structure of a light emitting diode, which mainly includes an adhesion layer 1 and a pad layer 2, wherein the adhesion layer 1 includes a chromium layer 1A (18 angstroms), A first metal layer 1B (2500 angstroms) and a second metal layer 1C (500 angstroms), and the pad layer 2 includes a platinum layer 2A (400 angstroms) and a gold layer 2B (18000 angstroms). The bonding pads Layer 2 is used for wire bonding. In order to meet the requirements of wire hardness and reduce electromigration, the thickness of its gold layer 2B must reach 18000 angstroms. Obviously the amount of gold is quite large. This is because the hardness of aluminum is too soft and it is not easy to wire. In addition, electromigration will occur under high current operation; because the cost of gold is much larger than that of aluminum, its manufacturing cost is high.
為了降低製造成本,在不改變發光二極體的光電特性(或是達到近似的效果)的前提下,使用其他材料取代金,為目前的發展方向,如台灣公告第I497767號專利,其採取鋁合金的方式取代鋁,以解決大電流操作下會產生電致遷移現象,然而鋁合金的特性仍相當接近鋁,無法真正滿足打線時的硬度需求,也無法真正解決電致遷移現象。In order to reduce the manufacturing cost, without changing the photoelectric characteristics of the light-emitting diode (or achieving similar effects), using other materials instead of gold is the current development direction, such as Taiwan Announcement Patent No. I497767, which uses aluminum The alloy method replaces aluminum to solve the electromigration phenomenon under high current operation. However, the characteristics of aluminum alloy are still quite close to aluminum, which can not really meet the hardness requirements when wire bonding, nor can it really solve the electromigration phenomenon.
爰是,本發明之主要目的在於揭露一種電極結構,可減少金的用量,而節省成本。That is, the main purpose of the present invention is to disclose an electrode structure, which can reduce the amount of gold and save costs.
本發明為發光二極體的電極結構,應用於一發光二極體上,其包含一附著層與一銲墊層,其中該附著層堆疊於該發光二極體上,該銲墊層堆疊於該附著層上,其特徵在於該銲墊層具有依序交互堆疊的至少二層第一金屬層、至少二層第二金屬層與一設置於最外側的金層,該第一金屬層為選自鋁、鋁合金所組成的群組,該第二金屬層為選自鈦、鎳、鉻、鉑、鈀、氮化鈦、鈦鎢、鎢、銠、銅(Ti、Ni、Cr、Pt、Pd、TiN、TiW、W、Rh、Cu)所組成的群組。The invention is an electrode structure of a light emitting diode, which is applied to a light emitting diode and includes an adhesion layer and a pad layer, wherein the adhesion layer is stacked on the light emitting diode, and the pad layer is stacked on The adhesion layer is characterized in that the pad layer has at least two first metal layers, at least two second metal layers, and a gold layer disposed on the outermost side, which are sequentially and alternately stacked. The first metal layer is selected From the group consisting of aluminum and aluminum alloy, the second metal layer is selected from titanium, nickel, chromium, platinum, palladium, titanium nitride, titanium tungsten, tungsten, rhodium, copper (Ti, Ni, Cr, Pt, Pd, TiN, TiW, W, Rh, Cu).
據此,本創作該銲墊層的主體結構為第一金屬層與第二金屬層的層疊結構,該第一金屬層為選自鋁、鋁合金所組成的群組,其成本較低,而該第二金屬層為選自鈦、鎳、鉻、鉑、鈀、氮化鈦、鈦鎢、鎢、銠、銅所組成的群組,其硬度較硬,可以改善第一金屬層過軟而不易打線與電致遷移的問題,其可大幅漸少金的用量,相較習知結構而言,可減少製造成本,而滿足製造上的需要。According to this, the main structure of this pad layer is a laminated structure of a first metal layer and a second metal layer. The first metal layer is selected from the group consisting of aluminum and aluminum alloy, and the cost is low, and The second metal layer is selected from the group consisting of titanium, nickel, chromium, platinum, palladium, titanium nitride, titanium tungsten, tungsten, rhodium, and copper. Its hardness is relatively hard, which can improve the softness of the first metal layer. The problem of not being easy to wire and electromigration can greatly reduce the amount of gold. Compared with the conventional structure, it can reduce the manufacturing cost and meet the manufacturing needs.
茲有關本發明的詳細內容及技術說明,現以實施例來作進一步說明,但應瞭解的是,該等實施例僅為例示說明之用,而不應被解釋為本發明實施之限制。The detailed content and technical description of the present invention are further described by examples, but it should be understood that these examples are for illustrative purposes only and should not be construed as limitations of the implementation of the present invention.
請參閱「圖2」所示,本發明為發光二極體的電極結構,應用於一發光二極體(圖未示),其包含一附著層10與一銲墊層20,其中該附著層10堆疊於該發光二極體上,該銲墊層20堆疊於該附著層10上,其特徵在於該銲墊層20具有依序交互堆疊的至少二層第一金屬層21、至少二層第二金屬層22與一設置於最外側的金層23,該第一金屬層21為選自鋁、鋁合金所組成的群組,該第二金屬層22為選自鈦、鎳、鉻、鉑、鈀、氮化鈦、鈦鎢、鎢、銠、銅(Ti、Ni、Cr、Pt、Pd、TiN、TiW、W、Rh、Cu)所組成的群組。Please refer to FIG. 2, the present invention is an electrode structure of a light emitting diode, which is applied to a light emitting diode (not shown), and includes an adhesion layer 10 and a pad layer 20, wherein the adhesion layer 10 is stacked on the light-emitting diode, and the pad layer 20 is stacked on the adhesion layer 10, which is characterized in that the pad layer 20 has at least two first metal layers 21 and at least two first Two metal layers 22 and a gold layer 23 disposed on the outermost side. The first metal layer 21 is selected from the group consisting of aluminum and aluminum alloy. The second metal layer 22 is selected from the group consisting of titanium, nickel, chromium, and platinum. , Palladium, titanium nitride, titanium tungsten, tungsten, rhodium, copper (Ti, Ni, Cr, Pt, Pd, TiN, TiW, W, Rh, Cu).
又該銲墊層20可以更具有一鉑層24,該銲墊層20的該鉑層24為介於該第二金屬層22與該金層23之間。而該附著層10可以具有一鉻層11,且該附著層10可以更具有依序堆疊於該鉻層11的一鋁層12與一鈦層13,該附著層10為供黏著發光二極體的N型半導體層或P型半導體層上,避免電極結構脫落。即可作為發光二極體的N型電極或P型電極使用。The pad layer 20 may further have a platinum layer 24. The platinum layer 24 of the pad layer 20 is interposed between the second metal layer 22 and the gold layer 23. The adhesion layer 10 may have a chromium layer 11, and the adhesion layer 10 may further include an aluminum layer 12 and a titanium layer 13 sequentially stacked on the chromium layer 11. The adhesion layer 10 is a light emitting diode for adhesion. N-type semiconductor layer or P-type semiconductor layer, to prevent the electrode structure from falling off. It can be used as an N-type electrode or a P-type electrode of a light emitting diode.
請參閱「圖3」、「圖4」與「圖5」所示,為本發明電極結構與習知電極結構的功效比較圖表,其中本發明電極結構的附著層10與銲墊層20,其結構如「圖2」所示,於本發明提供的一實施例中,各層厚度與材料如下所述,該附著層10的鉻層11厚度:18埃、鋁層12厚度:2500埃、鈦層13厚度:500埃。該第一金屬層21與該第二金屬層22的材料為選用鋁與鈦,其中鋁厚度:10000埃,鈦厚度:500埃。而該銲墊層20的鉑層24厚度:400埃與金層23厚度:2000埃。Please refer to "Figure 3", "Figure 4" and "Figure 5" for a comparison chart of the efficacy of the electrode structure of the present invention and the conventional electrode structure, wherein the adhesion layer 10 and the pad layer 20 of the electrode structure of the present invention, The structure is shown in FIG. 2. In an embodiment provided by the present invention, the thickness and material of each layer are as follows. The thickness of the chromium layer 11 of the adhesion layer 10 is 18 Angstroms, the thickness of the aluminum layer 12 is 2500 Angstroms, and the titanium layer is as follows. 13 thickness: 500 angstroms. The first metal layer 21 and the second metal layer 22 are made of aluminum and titanium, wherein the thickness of aluminum is 10,000 angstroms and the thickness of titanium is 500 angstroms. The thickness of the platinum layer 24 of the pad layer 20 is 400 angstroms and the thickness of the gold layer 23 is 2000 angstroms.
而習知結構,如「圖1」所示,各層厚度依序為鉻層:18埃、鋁層:2500埃、鈦層:500埃、鉑層:400埃與金層:18000埃。For the conventional structure, as shown in FIG. 1, the thickness of each layer is in order: chromium layer: 18 angstroms, aluminum layer: 2500 angstroms, titanium layer: 500 angstroms, platinum layer: 400 angstroms, and gold layer: 18000 angstroms.
本發明將前述本發明與習知的電極結構,分別作為發光二極體的N型電極與P型電極使用,並量取不同正向電流(Forward current)下的消耗功率(power)、正向電壓(Forward Voltage)與轉換效率( walplugeficiency;WPE)的曲線比較圖,其中本發明電極結構曲線為A1、A2、A3、習知電極結構曲線為B1、B2、B3。In the present invention, the aforementioned electrode structure and the conventional electrode structure are respectively used as the N-type electrode and the P-type electrode of the light-emitting diode, and the power consumption and the forward direction under different forward currents are measured. A comparison chart of the curve of voltage (Forward Voltage) and conversion efficiency (Walplugeficiency; WPE), wherein the electrode structure curve of the present invention is A1, A2, A3, and the conventional electrode structure curve is B1, B2, B3.
由「圖3」可知,於消耗功率部分,本發明電極結構曲線A1在低正向電流時幾乎相同於習知電極結構曲線B1,隨著正向電流的增加,則消耗功率略為增加,但差異相當有限。It can be seen from "Figure 3" that in the power consumption part, the electrode structure curve A1 of the present invention is almost the same as the conventional electrode structure curve B1 at low forward current. As the forward current increases, the power consumption slightly increases, but the difference is Quite limited.
由「圖4」可知,於正向電壓部分,本發明電極結構曲線A2在低正向電流幾乎相同於習知電極結構曲線B2,隨著正向電流的增加,則正向電壓略為增加,但差異仍然相當有限。It can be seen from "Figure 4" that in the forward voltage part, the electrode structure curve A2 of the present invention is almost the same as the conventional electrode structure curve B2 at low forward current. As the forward current increases, the forward voltage slightly increases, but The differences are still quite limited.
由「圖5」可知,於轉換效率部分,本發明電極結構曲線A3幾乎相同於習知電極結構曲線B3。It can be seen from FIG. 5 that in the conversion efficiency part, the electrode structure curve A3 of the present invention is almost the same as the conventional electrode structure curve B3.
縱上所述,本發明讓該銲墊層的主體結構為第一金屬層與第二金屬層的層疊結構,可以改善第一金屬層過軟而不易打線與電致遷移的問題,可大幅漸少金的用量,相較習知結構而言,如圖3~圖5所示,其光電特性差異不大,就本發明提供的實施例而言,節省了厚度13000埃的金層,同時增加厚度1000埃的鈦層與厚度20000埃的鋁層,考量金屬的價錢後,兩者相減之下,可減少製造成本,而滿足製造上的需要。As mentioned above, the present invention allows the main structure of the pad layer to be a laminated structure of a first metal layer and a second metal layer, which can improve the problem that the first metal layer is too soft to be easily wired and electromigrated. Compared with the conventional structure, as shown in Figs. 3 to 5, the amount of gold is small, and the difference in photoelectric characteristics is not large. As far as the embodiment provided by the present invention is concerned, a gold layer with a thickness of 13,000 Angstroms is saved, and the thickness is increased. The thickness of the titanium layer with a thickness of 1000 angstroms and the aluminum layer with a thickness of 20,000 angstroms, after considering the price of the metal, can reduce the manufacturing cost and meet the manufacturing needs.
惟上述僅為本發明之較佳實施例而已,並非用來限定本發明實施之範圍。即凡依本發明申請專利範圍所做的均等變化與修飾,皆為本發明專利範圍所涵蓋。However, the above are only preferred embodiments of the present invention, and are not intended to limit the scope of implementation of the present invention. That is, all equal changes and modifications made in accordance with the scope of patent application of the present invention are covered by the scope of patent of the present invention.
習知
1‧‧‧附著層
1A‧‧‧鉻層
1B‧‧‧鋁層
1C‧‧‧鈦層
2‧‧‧銲墊層
2A‧‧‧鉑層
2B‧‧‧金層
本發明
A1、A2、A3、B1、B2、B3‧‧‧電極結構曲線
10‧‧‧附著層
11‧‧‧鉻層
12‧‧‧鋁層
13‧‧‧鈦層
20‧‧‧銲墊層
21‧‧‧第一金屬層
22‧‧‧第二金屬層
23‧‧‧金層
24‧‧‧鉑層Learn
1‧‧‧ adhesion layer
1A‧‧‧chrome layer
1B‧‧‧Aluminum layer
1C‧‧‧Titanium layer
2‧‧‧ pad
2A‧‧‧platinum
2B‧‧‧Gold layer invention
A1, A2, A3, B1, B2, B3‧‧‧ electrode structure curve
10‧‧‧ Adhesive layer
11‧‧‧chrome layer
12‧‧‧ aluminum layer
13‧‧‧ titanium layer
20‧‧‧Solder pad layer
21‧‧‧first metal layer
22‧‧‧Second metal layer
23‧‧‧Gold
24‧‧‧platinum
圖1,為習知發光二極體的電極結構圖。 圖2,為本發明發光二極體的電極結構圖。 圖3,為本發明與習知電極結構的消耗功率比較圖。 圖4,為本發明與習知電極結構的順向電壓比較圖。 圖5,為本發明與習知電極結構的轉換效率比較圖。FIG. 1 is a structural diagram of an electrode of a conventional light emitting diode. FIG. 2 is a structural diagram of an electrode of a light emitting diode of the present invention. FIG. 3 is a comparison diagram of power consumption of the present invention and a conventional electrode structure. FIG. 4 is a comparison diagram of forward voltages of the present invention and a conventional electrode structure. FIG. 5 is a comparison diagram of conversion efficiency between the present invention and a conventional electrode structure.
10‧‧‧附著層 10‧‧‧ Adhesive layer
11‧‧‧鉻層 11‧‧‧chrome layer
12‧‧‧鋁層 12‧‧‧ aluminum layer
13‧‧‧鈦層 13‧‧‧ titanium layer
20‧‧‧銲墊層 20‧‧‧Solder pad layer
21‧‧‧第一金屬層 21‧‧‧first metal layer
22‧‧‧第二金屬層 22‧‧‧Second metal layer
23‧‧‧金層 23‧‧‧Gold
24‧‧‧鉑層 24‧‧‧platinum
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TW105126367A TW201807842A (en) | 2016-08-18 | 2016-08-18 | Electrode structure of LED capable of saving cost by reducing use amount of gold |
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TW105126367A TW201807842A (en) | 2016-08-18 | 2016-08-18 | Electrode structure of LED capable of saving cost by reducing use amount of gold |
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TW201807842A true TW201807842A (en) | 2018-03-01 |
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2016
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