TW201712885A - Sonar cell and a method of fabricating sonar cell - Google Patents
Sonar cell and a method of fabricating sonar cellInfo
- Publication number
- TW201712885A TW201712885A TW105123722A TW105123722A TW201712885A TW 201712885 A TW201712885 A TW 201712885A TW 105123722 A TW105123722 A TW 105123722A TW 105123722 A TW105123722 A TW 105123722A TW 201712885 A TW201712885 A TW 201712885A
- Authority
- TW
- Taiwan
- Prior art keywords
- sonar
- cell
- type
- region
- diffusing layer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
- Light Receiving Elements (AREA)
Abstract
A sonar cell provided by the present invention comprises: a p-type diffusion layer (2) formed on a light receiving side (1A), which is a first main surface, of an n-type single crystal silicon substrate (1); a n-type diffusing layer (5) formed on a back side (1B), which is a second main surface, oppositing to the light-receiving side (1A); a light receiving side electrode (4) coupled to the p-type diffusing layer (2); and a back side electrode (7) coupled to the n-type diffusing layer (5). The p-type diffusing layer (2) comprises: a first region (R1) having a first diffusing depth; a second region (R2), disposed as a strip-like structure along the periphery of the semiconductor substrate to surround the first region (R1) and the diffusing depth of the first dopant is deeper than the first region (R1). A sonar cell of reverse bias with low leaking can be thus obtained.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015151147 | 2015-07-30 | ||
PCT/JP2016/071320 WO2017018300A1 (en) | 2015-07-30 | 2016-07-20 | Solar cell and method for manufacturing solar cell |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201712885A true TW201712885A (en) | 2017-04-01 |
TWI606601B TWI606601B (en) | 2017-11-21 |
Family
ID=57884811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105123722A TWI606601B (en) | 2015-07-30 | 2016-07-27 | Solar cell and solar cell manufacturing method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6234633B2 (en) |
TW (1) | TWI606601B (en) |
WO (1) | WO2017018300A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110098265A (en) * | 2019-04-29 | 2019-08-06 | 南通天盛新能源股份有限公司 | A kind of N-type front electrode of solar battery method for metallising |
EP4287267B1 (en) * | 2022-06-01 | 2024-12-25 | Jinko Solar (Haining) Co., Ltd. | Photovoltaic cell and photovoltaic module |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3323514B2 (en) * | 1996-09-06 | 2002-09-09 | 三菱電機株式会社 | Transistor and manufacturing method thereof |
JP3676954B2 (en) * | 1999-11-08 | 2005-07-27 | シャープ株式会社 | Photoelectric conversion element and manufacturing method thereof |
JP5868290B2 (en) * | 2012-08-23 | 2016-02-24 | 三菱電機株式会社 | Photovoltaic device and manufacturing method thereof |
JP2014146766A (en) * | 2013-01-30 | 2014-08-14 | Mitsubishi Electric Corp | Method for manufacturing solar cell and solar cell |
JP2015130406A (en) * | 2014-01-07 | 2015-07-16 | 三菱電機株式会社 | Photovoltaic device, method of manufacturing the same, and photovoltaic module |
-
2016
- 2016-07-20 WO PCT/JP2016/071320 patent/WO2017018300A1/en active Application Filing
- 2016-07-20 JP JP2017508592A patent/JP6234633B2/en not_active Expired - Fee Related
- 2016-07-27 TW TW105123722A patent/TWI606601B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2017018300A1 (en) | 2017-02-02 |
JPWO2017018300A1 (en) | 2017-07-27 |
TWI606601B (en) | 2017-11-21 |
JP6234633B2 (en) | 2017-11-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3712945A3 (en) | Stacked backside illuminated spad array | |
MY198456A (en) | Hybrid Emitter All Back Contact Solar Cell | |
MY181191A (en) | Metal-foil-assisted fabrication of thin-silicon solar cell | |
PH12016501141A1 (en) | Solar cell emitter region fabrication with differentiated p-type and n-type region architectures | |
EP2620983A4 (en) | SEMICONDUCTOR ELEMENT AND METHOD OF MANUFACTURING THE SAME | |
MX373080B (en) | MANUFACTURING A SOLAR CELL EMITTING REGION USING ION IMPLANTATION. | |
EA201492235A1 (en) | SOLAR CELLS | |
WO2013049415A3 (en) | P-type doping layers for use with light emitting devices | |
IN2014MN00998A (en) | ||
PH12022551718A1 (en) | Solar cell with trench-free emitter regions | |
MX2010008075A (en) | PROCESS FOR THE MANUFACTURE OF SOLAR CELLS. | |
WO2009002463A3 (en) | Back-contact solar cell for high power-over-weight applications | |
PH12016502441B1 (en) | Passivation of light-receiving surfaces of solar cells with crystalline silicon | |
EP3584839A3 (en) | Image sensor | |
WO2012040013A3 (en) | Photovoltaic device containing an n-type dopant source | |
JP2019161047A5 (en) | ||
MY187483A (en) | Alignment free solar cell metallization | |
WO2011126209A3 (en) | Multi-solar cell having pn junction and schottky junction and manufacturing method thereof | |
TW201712885A (en) | Sonar cell and a method of fabricating sonar cell | |
MY171002A (en) | Electrostatic discharge devices and method of making the same | |
MY180755A (en) | Solar cell and manufacturing method of solar cell | |
IN2013MU03516A (en) | ||
WO2010049229A3 (en) | Method for producing a solar cell | |
AU2013364372A8 (en) | Solar cell emitter region fabrication using N-type doped silicon nano-particles | |
TW201613082A (en) | Semiconductor device and method of manufacturing same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |