TW201619671A - Liquid crystal display - Google Patents

Abstract

A liquid crystal display includes a thin film transistor positioned on a lower substrate; a plurality of color filter positioned on the thin film transistor and aligned to be spaced apart from each other; an insulation layer positioned on the plurality of color filter; a light-blocking layer positioned on the insulation layer; a transparent layer positioned on the light-blocking layer and having convex; an upper substrate facing the lower substrate; and a liquid crystal layer interposed between the lower substrate and the upper substrate, wherein the light-blocking layer includes an organic black pigment, and the transparent layer having the convex has a different shape from the light-blocking layer.

Description

LCD Monitor [Cross-Reference to Related Applications]

Priority is claimed on Korean Patent Application No. 10-2014-01619, filed on Jan.

The invention relates to a liquid crystal display (LCD).

A liquid crystal display (LCD) is one of the most widely used flat panel displays and is a display device that adjusts the amount of transmitted light by applying a voltage to an electrode by inserting a liquid crystal layer between the two display panels and making the liquid crystal layer The liquid crystal molecules are realigned to form.

One of the liquid crystal displays (LCDs) currently used has a structure in which field generating electrodes are respectively disposed in two display panels. Specifically, the main structure is that a plurality of thin film transistors and pixel electrodes are aligned in a matrix form in a display panel (hereinafter referred to as a "thin film transistor array panel"). On the other display panel (hereinafter referred to as "common electrode panel"), red, green, and blue filters are formed, and the common electrode covers the front side thereof.

However, because the pixel electrode and the color filter are formed on different display panels Medium and difficult to precisely align between them, so this liquid crystal display (LCD) may have alignment errors. In order to solve this problem, a structure in which a color filter and a pixel electrode are formed on the same display panel (color filter on array, COA) is proposed.

On the other hand, in consideration of the alignment limit when the thin film transistor array panel and the common electrode group are aligned, the formed light blocking layer is larger than a predetermined size.

In addition, the liquid crystal layer space between the two display panels is referred to as a liquid crystal layer gap, and the liquid crystal layer gap has an overall operational characteristic to the liquid crystal display (LCD) (eg, reaction speed, contrast ratio, viewing angle, brightness uniformity, etc.) )influential. When the gap of the liquid crystal layer is not uniform, a uniform image is not displayed on the entire screen, resulting in image quality defects.

Therefore, there is an increasing need to prevent a liquid crystal display (LCD) whose aperture is deteriorated due to an increase in the size of the light blocking layer and which maintains a uniform liquid crystal layer gap on the entire front side of the substrate.

One embodiment provides a liquid crystal display (LCD) that has excellent reliability by simultaneously forming a light blocking layer and a light blocking layer having a shape different from that of the transparent layer.

One embodiment provides a liquid crystal display (LCD), the liquid crystal display The device includes a thin film transistor on a lower substrate; a plurality of color filters disposed on the thin film transistor and spaced apart from each other; an insulating layer on the plurality of color filters; located in the insulating a light blocking layer on the layer; a transparent layer on the light blocking layer and having a convex; an upper substrate facing the lower substrate; and a liquid crystal layer interposed between the lower substrate and the upper substrate Wherein the light blocking layer comprises an organic black pigment, and the shape of the transparent layer having a convex surface is different from the shape of the light blocking layer.

The organic black pigment may contain a compound represented by the following Chemical Formula 1.

In Chemical Formula 1, R ¹¹ to R ^{20 are} independently hydrogen or a substituted or unsubstituted C1 to C10 alkyl group.

The transparent layer having a convex surface may cover all or a portion of the front surface of the light blocking layer.

The transparent layer can include a primary transparent layer and an auxiliary transparent layer.

The thickness of the primary transparent layer may be thicker than the thickness of the auxiliary transparent layer.

The primary transparent layer can support the gap between the upper substrate and the lower substrate.

A liquid crystal display (LCD) may further include a pixel electrode between the insulating layer and the light blocking layer.

The liquid crystal display (LCD) may further include a common electrode interposed between the upper substrate and the liquid crystal layer.

A liquid crystal display (LCD) may further comprise a common electrode directly on the lower substrate.

The optical density of the light blocking layer may be about 1.0 or greater than 1.0 for the optical density of the transparent layer.

The light blocking layer and the transparent layer can be manufactured by coating a light blocking layer composition and drying it, coating a transparent layer composition on the dried light blocking layer composition and drying it, and simultaneously exposing and developing the light blocking Layer composition and transparent layer composition.

The light blocking layer composition may include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, an organic black pigment, and a solvent.

The light blocking layer composition may comprise from about 1% by weight to about 30% by weight of the binder resin; from about 1% by weight to about 20% by weight of the reactive unsaturated compound; from about 0.05% by weight to about 5% by weight of the photopolymerization initiator; 1% by weight to about 30% by weight of organic black pigment, and a balanced amount of solvent.

The transparent layer composition may include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, and a solvent.

The transparent layer composition may further comprise a black pigment.

The transparent layer composition may comprise from about 3% by weight to about 70% by weight of the binder resin; from about 2% by weight to about 40% by weight of the reactive unsaturated compound; from about 0.1% by weight to about 5% by weight of the photopolymerization initiator; The amount of solvent.

Other embodiments of the invention are included in the detailed description that follows.

At the same time, a light blocking layer and a light blocking layer having a convex shape and a shape different from that of the transparent layer are formed to provide a liquid crystal display (LCD) having excellent reliability.

110a, 110b, 110c‧‧‧ color filters

111‧‧‧gate electrode

112‧‧‧ gate insulation

113‧‧‧ Semiconductor

114‧‧‧Source electrode

115‧‧‧汲electrode

116‧‧‧Protective layer

120‧‧‧Insulation

130‧‧‧pixel electrodes

140‧‧‧Light barrier

150‧‧‧ transparent layer

152‧‧‧Main transparent layer

153‧‧‧Auxiliary transparent layer

160‧‧‧Liquid layer

170‧‧‧Common electrode

200‧‧‧lower base

300‧‧‧ upper base

1 to 4 are cross-sectional views of a liquid crystal display (LCD), according to an exemplary embodiment.

Fig. 5 is a schematic view showing a structure of a light blocking layer and a transparent layer in a conventional liquid crystal display (LCD).

6 and 7 are schematic views illustrating a structure of a light blocking layer and a transparent layer in a liquid crystal display (LCD), according to an exemplary embodiment.

The invention will be described more fully hereinafter with reference to the accompanying drawings in which exemplary embodiments of the invention. However, the invention may be embodied in many different forms and should not be construed as being limited to the exemplary embodiments set forth herein. The exemplary embodiments disclosed in the specification are provided to be thorough and complete, and to fully convey the invention to those skilled in the art. ideal.

In the drawings, the thickness of layers and regions are exaggerated for clarity. In addition, the layers and regions illustrated in the drawings are schematic in nature and their shapes are not intended to describe the exact shape of the components, and are not intended to limit the scope of the invention. It will also be understood that when a layer is referred to as being "on" another layer or substrate, it may also have a third layer directly on or between another layer or substrate. Throughout the specification, the same drawing element symbols denote the same elements.

As used herein, when a specific definition is not otherwise provided, the term "alkyl" refers to a C1 to C20 alkyl group, the term "alkenyl" refers to a C2 to C20 alkenyl, and the term "cycloalkenyl" refers to a C3. To C20 cycloalkenyl, the term "heterocycloalkenyl" refers to C3 to C20 heterocycloalkenyl, "aryl" refers to C6 to C20 aryl, and the term "arylalkyl" refers to C6 to C20. Arylalkyl, the term "alkylene" refers to C1 to C20 alkyl, the term "strandyl" refers to C6 to C20 extended aryl, and the term "alkylene" refers to C6 to C20. The alkylene group, the term "heteroaryl" refers to a C3 to C20 heteroaryl group, and the term "alkyleneoxy" refers to a C1 to C20 alkyleneoxy group.

As used herein, when a specific definition is not otherwise provided, the term "substituted" means that the compound is substituted with at least one hydrogen selected from a substituent selected from halogen (F, CI, Br or I), hydroxyl, C1 to C20 alkane. Oxy, nitro, cyano, amino, imino, azide, sulfhydryl, fluorenyl, fluorenylene, carbonyl, carbamyl group, thiol, ester, ether, carboxyl Or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 To C20 aryl, C3 to C20 cycloalkyl, C3 to C20 cycloalkenyl, C3 to C20 cycloalkynyl, C2 to C20 heterocycloalkyl, C2 to C20 heterocycloalkenyl, C2 to C20 heterocycloalkynyl, C3 to C20 heteroaryl or a combination thereof.

As used herein, when a specific definition is not otherwise provided, the term "hetero" refers to a compound containing at least one hetero atom selected from N, O, S, and P in the formula.

As used herein, when a specific definition is not otherwise provided, the term "combination" refers to mixing or copolymerization.

As used herein, a cardo-based resin refers to a resin having at least one functional group selected from the following Chemical Formulas 2-1 to 2-11 in the main chain.

As used herein, unless a specific definition is additionally provided, when a chemical bond is not drawn, the hydrogen atom is bonded at a position where a bond will occur.

A liquid crystal display (LCD) according to an embodiment includes a thin film transistor on a lower substrate; a plurality of color filters positioned on the thin film transistor and spaced apart from each other; and the plurality of color filters are located An insulating layer; a light blocking layer on the insulating layer; a transparent layer having a convex surface on the light blocking layer; an upper substrate facing the lower substrate; and inserting the lower substrate and the upper portion a liquid crystal layer between the substrates, wherein the light blocking layer comprises an organic black pigment, and the shape of the transparent layer having a convex surface is different from a shape of the light blocking layer.

The light blocking layer and the transparent layer do not need to have the same thickness because they are different in shape. However, the light blocking layer and the transparent layer have different cross sections because they are different in shape.

Referring to Figure 5 below, on the light blocking layer in a conventional liquid crystal display (LCD) A transparent layer having the same shape as that of the light blocking layer is placed. However, referring to FIGS. 6 and 7 below, a transparent layer having a shape different from that of the light blocking layer is disposed on the light blocking layer in the liquid crystal display (LCD) according to an embodiment.

When the light blocking layer and the transparent layer in the liquid crystal display (LCD) have the following Figure 6 When the shape is provided, the fine pattern can be favorably formed by lowering the critical dimension (CD), and here, when the light blocking layer and the transparent layer in the liquid crystal display (LCD) have the shape provided in the following FIG. Can improve reliability.

1 to 4 are cross-sectional views of a liquid crystal display (LCD), according to an exemplary embodiment.

Referring to FIGS. 1 through 4, a thin film transistor is placed on the lower substrate 200. The thin film transistor can be composed of three terminals (control terminal, input terminal, and output terminal) as a switch. The thin film transistor may include a gate electrode 111, a gate insulating layer 112, a semiconductor 113, a source electrode 114, a drain electrode 115, and a protective layer 116.

Specifically, a gate line and a gate electrode 111 including a storage electrode line are formed on the lower substrate 200.

There may be more than one gate line and more than one gate electrode including the gate line. A plurality of gate lines extend in the horizontal direction and transmit a gate signal. A plurality of gate electrodes may be connected to each other and form one protruding portion.

The storage electrode line may exceed one, and mainly extends in the horizontal direction and transmits a predetermined voltage, such as a common voltage (Vcom) or the like.

A gate insulating layer 112 is formed on the gate electrode 111. Gate insulating layer 112 It may comprise tantalum nitride, cerium oxide or a combination thereof.

A semiconductor 113 is formed on the gate insulating layer 112, and the semiconductor 113 may be formed of amorphous germanium or crystalline germanium or the like. The semiconductor 113 extends mainly in the vertical direction and may extend toward the plurality of gate electrodes.

More than one pair of ohmic contact elements (not shown) are formed on the semiconductor 113. The ohmic contact element may be formed of, for example, a telluride or an n+ hydrogenated amorphous germanium doped with a high concentration of n-type impurities.

On the ohmic contact, a data conductor including the data line and the drain electrode 115 is formed.

The data line transmits the data signal and extends mainly in the vertical direction, and This intersects the gate line. Each of the data lines extends toward the gate electrode 111 and includes source electrodes 114 connected to each other.

On the thin film transistor, a plurality of color filters 110a and color filters are disposed The sheet 110b and the color filter 110c. The plurality of color filters 110a, the color filters 110b, and the color filters 110c include red filters, green filters, and blue filters that are spaced apart from each other. The plurality of color filters 110a, the color filters 110b, and the color filters 110c are spaced apart from each other in the horizontal direction, respectively, but may be formed in a strip shape in the vertical direction.

In the plurality of color filters 110a, color filters 110b, and color filters An insulating layer 120 is disposed on the sheet 110c. The insulating layer 120 may be located in a space between adjacent color filters. The insulating layer 120 may be formed as an organic layer or an inorganic layer, but an inorganic layer may be preferred. When the insulating layer 120 is formed as an organic layer, it is difficult to pass A step is formed by the light blocking layer and the transparent layer. In addition, the insulating layer 120 may not be patterned, and thus patterned by the photolithography process portion, unlike the overcoating layer, the finish layer is baked immediately after being applied to the front side.

A light blocking layer 140 is disposed on the insulating layer 120, and a transparent layer 150 is disposed on the light blocking layer 140.

A liquid crystal display (LCD) may further include an auxiliary light blocking layer (not shown) between the insulating layer 120 and the light blocking layer 140. Here, the auxiliary light blocking layer may be located in a space between adjacent color filters.

The light blocking layer 140 contains an organic black pigment to have a high optical density, and the organic black pigment may contain an intrinsic amine organic black such as a compound represented by the following Chemical Formula 1.

In Chemical Formula 1, R ¹¹ to R ^{20 are} independently hydrogen or a substituted or unsubstituted C1 to C10 alkyl group. For example, R ¹¹ to R ²⁰ may be hydrogen.

The transparent layer having a convex surface may cover all or a portion of the front surface of the light blocking layer.

The front side of the light blocking layer may refer to the side of the light blocking layer that is in contact with the transparent layer. For example, referring to FIG. 6 below, a transparent layer having a convex surface in a liquid crystal display (LCD) according to an exemplary embodiment covers a portion of a front side of the light blocking layer, and reference is made to FIG. 7 below, according to the exemplary A transparent layer having a convex surface in the liquid crystal display (LCD) of the embodiment covers the entire front side of the light blocking layer.

The transparent layer can be disposed on the front side of the light blocking layer by a photo halftone process as described below.

The transparent layer may include the main transparent layer 152 and the auxiliary transparent layer 153, and here, the main transparent layer and the auxiliary transparent layer are independently present, for example, the side of the main transparent layer or the like is not in contact with the side of the auxiliary transparent layer or the like.

The light blocking layer and the transparent layer are simultaneously formed as described below, and here, mainly The clear layer may function as a spacer that supports the space between the upper substrate and the lower substrate, and the auxiliary transparent layer may function as an auxiliary spacer that assists the primary transparent layer and supports the space between the upper substrate and the lower substrate. Thus, the primary transparent layer having the spacer function can be thicker than the auxiliary transparent layer having the auxiliary spacer function. In this way, when the transparent layer is separately formed as the main transparent layer and the auxiliary transparent layer, the main transparent layer supports the auxiliary transparent layer even when the buffering effect is deteriorated, and thus structural stability can be ensured.

On the other hand, an auxiliary pixel electrode may be formed on the insulating layer 120. The pixel electrode 130. The auxiliary pixel electrode may be spaced apart from each other by a plurality of gate lines and disposed at the top and bottom of each gate line, respectively, and thus adjacent to each other in the column direction. The auxiliary pixel electrode may have an overall quadrilateral shape.

On the upper substrate 300, for example, the upper substrate 300 and the liquid crystal layer 160 Between the common electrodes 170 may be formed, and between the common electrode 170 and the liquid crystal layer 160, an alignment layer (not shown) may be formed. The common electrode 170 can transmit a common voltage.

The common electrode 170 may be formed directly on the lower substrate 200 instead of the upper substrate 300, and a patterned electrode may be used instead of the common electrode 170.

The liquid crystal layer 160 has a negative dielectric anisotropy, and when no electric field is present, the liquid crystal molecules of the liquid crystal layer 160 are aligned with their long axes perpendicular to the surfaces of the two substrates (the upper substrate and the lower substrate). The liquid crystal layer 160 includes an alignment auxiliary agent containing a reactive mesogen, and the liquid crystal molecules may have a pretilt angle and a long axis thereof is substantially parallel to a longitudinal direction of the pixel electrode 130. The alignment aid can be included in the alignment layer instead of the liquid crystal layer.

On the other hand, the structure of the thin film transistor described with reference to FIGS. 1 to 4 is merely an example and can be modified into various structures including a thin film transistor structure.

The light blocking layer and the transparent layer may be formed by coating and drying the light blocking layer composition, drying and coating the transparent layer composition on the dried light blocking layer composition, and simultaneously exposing and developing the dried light blocking layer And transparent layer composition.

Exposure can be done by using a halftone mask. The halftone mask may comprise a region that transmits about 100% light during exposure, a region that transmits about 25% to about 35% light during exposure, a region that transmits about 15% to about 25% light during exposure, and an exposure The area where about 0% of light is transmitted during the period, but the structure of the halftone mask is not limited to these.

Because the transparent layer composition and the light blocking layer composition are simultaneously exposed and developed after coating the transparent layer composition to achieve a spacer and a step on the light blocking layer composition, The optical density is obtained without exposing and developing the light blocking layer composition, so the difference between the optical density per 1 micrometer of the light blocking layer and the optical density per 1 micrometer of the transparent layer is greater than or equal to about 1.0. For example, the difference between the optical density per 1 micron light blocking layer and the optical density per 1 micron transparent layer can be greater than or equal to about 1.0, such as about 1.5.

Specifically, the light blocking layer and the transparent layer on the light blocking layer can be manufactured as follows.

(1) Coating and film formation

Applying a light-blocking layer composition to a substrate having a predetermined pretreatment such as a glass substrate or an IZO substrate to a desired thickness by spin coating or slit coating, roll coating, screen printing, applicator method, or the like Then, the substrate is heated and heated at a temperature ranging from about 70 ° C to about 100 ° C for about 1 minute to about 10 minutes to remove the solvent. Next, the transparent layer composition was applied by the same method and heated (dried) to obtain a film.

(2) exposure

After placing a mask comprising a halftone portion for providing a light barrier layer pattern and a full tone portion for providing a transparent layer pattern, the resulting film is irradiated with an active ray of from about 200 nanometers to about 500 nanometers to form a desired pattern. Radiation is carried out by using, for example, a mercury lamp having a low pressure, a high pressure or an ultrahigh pressure, a metal halide lamp, an argon laser or the like. X-rays, electron beams, and the like can also be used depending on the situation.

When a high pressure mercury lamp is used, the exposure process uses, for example, a light dose of about 500 millijoules per square centimeter or less than 500 millijoules per square centimeter (using a 365 nanometer sensor). However, the light dose may vary depending on the kind of each component of the black photosensitive resin composition, the combination ratio thereof, and the dry film thickness.

(3) Development

After the exposure process, the exposed film is developed by dissolving and removing unnecessary portions other than the exposed portion using an alkaline aqueous solution, thereby forming an image pattern.

(4) Post processing

The developed image pattern can be heated again to achieve excellent qualities such as heat resistance, light resistance, close contact characteristics, crack resistance, chemical resistance, high strength, and storage stability.

Hereinafter, the light blocking layer composition and the transparent layer composition are described.

The light blocking layer composition contains a binder resin, a reactive unsaturated compound, a photopolymerization initiator, an organic black pigment, and a solvent.

The light blocking layer composition may further contain a color calibrating agent such as an anthraquinone pigment, an anthraquinone pigment, a phthalocyanine-based pigment, or an azo pigment.

The organic black pigment can be used together with a dispersant for dispersion. In particular, the pigment may be pretreated with a dispersant surface, or pigments and dispersants may be added together during the preparation of the light barrier layer composition.

The dispersant may be a nonionic dispersant, an anionic dispersant, a cationic dispersant or the like. Specific examples of the dispersing agent may be polyalkylene glycol or an ester thereof, a polyoxyalkylene, a polyhydric alcohol ester alkylene oxide addition product, an alcohol alkylene oxide addition product. (alcohol alkylene oxide addition product), sulfonate, sulfonate, carboxylic acid ester, carboxylate, alkyl amide alkylene oxide addition product, alkylamine, etc. And they can be alone or It is used in the form of a mixture of two or more.

Commercially available examples of dispersants may include BYK Co., Germany. Ltd.) DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK -171, DISPERBYK-182, DISPERBYK-2000 or DISPERBYK-2001; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA manufactured by EFKA Chemicals Co. -400 or EFKA-450; Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000 or Solsperse 28000 manufactured by Zeneka Co.; or Ajinomoto injection PB711 or PB821 manufactured by Ajinomoto Inc.

It may comprise from about 0.1% by weight to about 15% of the total weight of the light blocking layer composition A dispersant in an amount by weight %. When the dispersant in the range is included, the light-blocking layer composition has improved dispersion characteristics.

The organic black pigment can be pretreated with a water-soluble inorganic salt and a wetting agent. When the organic black pigment is pretreated, the average particle diameter of the organic black pigment becomes finer.

It can be obtained by blending pigments with water-soluble inorganic salts and wetting agents. The combined pigment is filtered and washed for pretreatment.

The twisting can be carried out at a temperature of from about 40 ° C to about 100 ° C, and can be passed The pigment is filtered and washed after washing off the inorganic salt with water or the like.

Examples of the water-soluble inorganic salt may be sodium chloride, potassium chloride, etc., but are not limited. For these. The humectant allows the pigment to be uniformly mixed with the water-soluble inorganic salt and pulverized. Examples of the humectant include an alkylene glycol monoalkyl ether such as ethylene glycol monoethylether, propylene glycol monomethylether, diethylene glycol monomethyl Diethylene glycol monomethylether, etc., and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerol polyethylene glycol (glycerine polyethylene glycol) and the like. These may be used singly or in the form of a mixture of two or more.

It may comprise from about 1% by weight to about 30 weights based on the total amount of the light blocking layer composition Amount %, for example, an organic black pigment in an amount of from about 2% by weight to about 20% by weight. When the pigments in the range are included, the resolution and pattern linearity are improved.

In some embodiments, the light blocking layer composition can comprise about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29 or 30 weight % of organic black pigment. Moreover, in accordance with some embodiments of the present invention, the amount of organic black pigment may range from about any value of the foregoing amount to about any of the foregoing amounts.

The adhesive resin may comprise a cation-based adhesive resin or an acryl-based adhesive resin. Or a combination thereof.

The adhesive resin may be an anode-based adhesive resin. When the adhesive resin is a positive base When the ring-like adhesive resin is used, the light-blocking layer composition containing the anode-based ring-like adhesive resin is It has excellent developability and sensitivity during photocuring, and thus has excellent fine pattern forming ability. Specifically, when an anode-based adhesive resin is used, the reliability of a liquid crystal display (LCD) can be ensured.

The cation-based adhesive resin may contain a repeating unit represented by the following Chemical Formula 2.

In Chemical Formula 2, R1 and R2 are independently a hydrogen atom or a substituted or unsubstituted (meth)acryloyloxy alkyl group, and R ³ and R ⁴ are each independently hydrogen. An atom, a halogen atom or a substituted or unsubstituted C1 to C20 alkyl group, and Z ¹ is a single bond, O, CO, SO ₂ , CR ⁷ R ⁸ , SiR ⁹ R ¹⁰ (wherein R ⁷ to R ¹⁰ independently It is one of a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group or a linking group represented by one of the following Chemical Formulas 2-1 to 2-11.

In Chemical Formula 2-5, R ^a is a hydrogen atom, an ethyl group, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH=CH ₂ or a phenyl group.

[Chemical Formula 2-9]

Z ² is an acid dianhydride residual group, and m1 and m2 are each independently an integer in the range of 0 to 4, and n is an integer in the range of 1 to 30.

The cation-based adhesive resin may contain a functional group represented by the following Chemical Formula 3 at at least one end of both ends.

In Chemical Formula 3, Z ^{3 is} represented by the following Chemical Formulas 3-1 to 3-7.

In Chemical Formula 3-1, R ^b and R ^c are each independently hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group.

In Chemical Formula 3-5, R ^d is O, S, NH, a substituted or unsubstituted C1 to C20 alkyl group, a C1 to C20 alkylamino group or a C2 to C20 enamine group.

The cation-based adhesive resin can be prepared, for example, by mixing at least two of: a fluorine-containing compound such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene (9,9-bis) (4-oxiranylmethoxyphenyl)fluorine, etc.; anhydride compounds, such as benzene tetracarboxylic acid dianhydride, naphthalene tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride , benzophenone tetracarboxylic acid dianhydride, pyromellitic dianhydride, cyclobutane tetracarboxylic acid dianhydride, perylene tetracarboxylic acid Dinarhydride), tetrahydrofuran tetracarboxylic acid dianhydride, tetrahydrophthalic anhydride, etc.; diol compounds such as ethylene glycol, propylene glycol, polyethylene glycol, etc.; alcohol compounds such as methanol, ethanol , propanol, n-butanol, cyclohexanol, benzyl alcohol, etc.; solvent compounds such as propylene glycol methyl ethyl acetate (propylene glyco l methylethylacetate), N-methylpyrrolidone, etc.; phosphorus compounds such as triphenylphosphine; and amine or ammonium compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyl Diethylamine, triethylamine, tributylamine, benzyltriethylammonium chloride, and the like.

The cation-based adhesive resin has a weight average molecular weight of from about 500 to about 50,000 g/mol, for example from about 1,000 to about 30,000 g/mol. When the weight average molecular weight of the cation-based adhesive resin is within the above range, the pattern can be well formed without losing the film thickness during development.

The acryl oxime-based binder resin is a copolymer of a first ethylenic unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including at least one propylene fluorene-based repeating unit.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer comprising at least one carboxyl group. Examples of the monomer include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

The first ethylenically unsaturated monomer may be included in an amount of from about 5% by weight to about 50% by weight, for example, from about 10% by weight to about 40% by weight, based on the total of the acryl-based resin.

The diene unsaturated monomer may be an aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether or the like; an unsaturated carboxylic acid ester compound such as (A) Methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate , benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) acrylate, etc.; carboxylic acid amino alkyl ester compound, such as (methyl) 2-aminoethyl acrylate, 2-dimethylaminoethyl (meth)acrylate, etc.; vinyl carboxylate compounds such as vinyl acetate, vinyl benzoate, etc.; carboxylic acid glycidyl ester a compound such as (meth) propylene An acid glycidyl ester or the like; a vinyl cyanide compound such as (meth)acrylonitrile; an unsaturated guanamine compound such as (meth)acrylamide; and the like. These may be used singly or in the form of a mixture of two or more.

A specific example of the acryl resin may be methacrylic acid/methacrylic acid Benzene methyl ester copolymer, methacrylic acid / benzyl methacrylate / styrene copolymer, methacrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, methacrylic acid / methyl Benzyl acrylate/styrene/2-hydroxyethyl methacrylate copolymer, etc., but is not limited thereto. These may be used singly or in the form of a mixture of two or more.

The propylene fluorene resin has a weight average molecular weight of from about 3,000 g/mol to about 150,000 grams per mole, such as from about 5,000 grams per mole to about 50,000 grams per mole or from about 7,000 grams per mole to about 30,000 grams per mole. When the weight average molecular weight of the acryl oxime resin is within the above range, the light-blocking layer composition may have excellent physical and chemical characteristics.

The acrylic resin may have an acid value of from about 15 mg KOH/g to about 150. Mg KOH/g, for example from about 80 mg KOH/g to about 130 mg KOH/g. When the acid value of the acryl resin is within the above range, the pixel pattern can have excellent resolution.

When the anode-based adhesive resin is mixed with the acryl-based adhesive resin, the first The weight ratio of the cation-based adhesive resin to the acryl-based adhesive resin in the composition may be from about 99:1 to about 50:50.

In some embodiments, the cation-based adhesive resin and the acryl-bonded tree The mixture of fats may comprise about 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96, An anode-based adhesive resin in an amount of 97, 98 or 99% by weight. Further, according to some embodiments of the present invention, the amount of the anode-based adhesive resin may range from about any value of the foregoing amount to about any of the foregoing amounts.

In some embodiments, the cation-based adhesive resin and the acryl-bonded tree The mixture of lipids may comprise about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, A acrylonitrile-based adhesive resin in an amount of 48, 49 or 50% by weight. Further, according to some embodiments of the present invention, the amount of the acryl-based adhesive resin may range from about any value of the foregoing amount to about any of the foregoing amounts.

When the amount of the acryl-based adhesive resin is more than the cation-based adhesive resin The chemical resistance and reliability may deteriorate.

It may comprise from about 1% by weight to about 30 weights based on the total amount of the light blocking layer composition Amount %, for example, an adhesive resin in an amount of from about 2% by weight to about 20% by weight. Specifically, the anode-based adhesive resin may be contained in an amount of from about 1% by weight to about 20% by weight based on the total of the light-blocking layer composition, and may include about 1 in total of the light-blocking layer composition. An acrylonitrile-based adhesive resin in an amount of from about 5% by weight to about 20% by weight. When the binder resin in the range is included, excellent resolution can be achieved.

In some embodiments, the light blocking layer composition can include about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, An adhesive resin in an amount of 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29 or 30% by weight. Moreover, in accordance with some embodiments of the present invention, the amount of binder resin may range from about any of the foregoing amounts to about any of the foregoing amounts.

The reactive unsaturated compound may be a monomer or oligomer and may be a monofunctional or polyfunctional ester of (meth)acrylic acid comprising at least one ethylenically unsaturated double bond.

The reactive unsaturated compound has an ethylenically unsaturated double bond, and thus, can cause sufficient polymerization during exposure during pattern formation and form a pattern having excellent heat resistance, light resistance, and chemical resistance.

The reactive unsaturated compound may be, for example, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylic acid. Ester, propylene glycol di(meth) acrylate, neopentyl glycol di(meth) acrylate, 1,4-butanediol di(meth) acrylate, 1,6-hexanediol di(methyl) Acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, Dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy (meth)acrylic acid Ester, ethylene glycol monomethyl ether (meth) acrylate, trimethylol propane tri (meth) acrylate, tris(methyl) propylene methoxyethyl phosphate Tris(meth)acryloyloxyethyl phosphate, novolac epoxy (A) Acrylate or a combination thereof.

Commercially available examples of reactive unsaturated compounds are as follows. The monofunctional (meth) acrylate may comprise Aronix M-101 ^® , M-111 ^® , M-114 ^® (Toagosei Chemistry Industry Co., Ltd.); KAYARAD TC-110S ^® , TC-120S ^® (Nippon Kayaku Co., Ltd.); V-158 ^® , V-2311 ^® (Osaka Organic Chemical Ind., Ltd.), and the like. Examples of difunctional (meth) acrylates may include Aronix M-210 ^® , M-240 ^® , M-6200 ^® (East Asia Synthetic Chemical Industry Co., Ltd.), KAYARAD HDDA ^® , HX-220 ^® , R-604 ^® ( Nippon Kayaku Co., Ltd.), V-260 ^® , V-312 ^® , V-335 HP ^® (Osaka Organic Chemical Industry Co., Ltd.), etc. Trifunctional (meth) acrylates may include ^{Aronix M-309 ®, M-} 400 ®, M-405 ®, M-450 ®, M-7100 ®, M-8030 ®, M-8060 ® ( Toagosei Chemical Industry Co., Ltd.), KAYARAD TMPTA ^® , DPCA-20 ^® , DPCA-30 ^® , DPCA-60 ^® , DPCA-120 ^® (Nippon Chemical Co., Ltd.), V-295 ^® , V-300 ^® , V-360 ^® , V-GPT ^® , V-3PA ^® , V-400 ^® (Osaka Organic Chemical Industry Co., Ltd.), etc. These may be used singly or in the form of a mixture of two or more.

The reactive unsaturated compound can be treated with an acid anhydride to improve developability.

The reactive unsaturated compound may be included in an amount of from about 1% by weight to about 20% by weight, such as from about 1% by weight to about 10% by weight, based on the total of the light-blocking layer composition. When a reactive unsaturated compound within the range is included, the reactive unsaturated compound is sufficiently cured during exposure of the pattern to improve reliability.

In some embodiments, the light blocking layer composition can include about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, A reactive unsaturated compound in an amount of 19 or 20% by weight. Moreover, in accordance with some embodiments of the present invention, the amount of reactive unsaturated compound can range from about any value of the foregoing amount to about any of the foregoing amounts.

The photopolymerization initiator may be a photopolymerization initiator generally used in a photosensitive resin composition, such as an acetophenone compound, a benzophenone compound, a thioxanthone-based compound, a benzoin compound. , terpenoids, etc.

Examples of the acetophenone compound may be 2,2'-diethoxy acetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2- 2-hydroxy-2-methylpropinophenone, pt-butyltrichloro acetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2 '-Dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinylpropan-1-one (2-methyl-1- (4-(methylthio)phenyl)-2-morpholinopropan-1-one), 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butan-1-one, and the like.

An example of a benzophenone compound may be benzophenone or benzoic acid benzoate. Benzoyl benzoate, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxybenzophenone, benzoated benzophenone, 4 , 4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-di Chlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone and the like.

Examples of the thioxanthone compound may be thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diiso Propyl thioxanthone, 2-chlorothioxanthone, and the like.

Examples of the benzoin compound may be benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethylketal or the like.

Examples of the triazine compound may be 2,4,6-trichloro-s-triazine (2,4,6-trichloro-s-triazine), 2-phenyl-4,6-bis(trichloromethyl) )-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxy Naphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2 -(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloro) Methyl)-6-styryl-s-triazine, 2-(naphthol 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxy Naphthol 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-mallowyl-s-triazine, 2-4- Bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine and the like.

An example of a terpenoid may be an O-mercaptopurine (O-acyloxime-based) compound, 2-(O-benzylidene fluorenyl)-1-[4-(phenylthio)phenyl]-1,2-octanedione (2-(O-benzoyloxime) 1-[4-(phenylthio)phenyl]-1,2-octandione), 1-(O-acetamido)-1-[9-ethyl-6-(2-methylbenzhydryl)- 9H-carboxime-1-yl-9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3 -yl]ethanone), O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, and the like. A specific example of the O-mercaptoquinone compound may be 1,2-octaneione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4- 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one, 1-(4-Phenylthiophenyl)-but-1,2-dione 2-indole-O-benzoate (1-(4-phenylsulfanylphenyl)-butane-1,2-dione 2-oxime -O-benzoate), 1-(4-phenylsulfanylphenyl)-octane-1,2-dione 2-indole-O-benzoate (1-(4-phenylsulfanyl phenyl)-octane-1 ,2-dione 2-oxime-O-benzoate), 1-(4-phenylthiophenyl)-oct-1-one oxime-O-acetate (1-(4-phenylsulfanyl phenyl)-octan-1 -one oxime-O-acetate), 1-(4-phenylsulfanylphenyl)-butan-1-one oxime-(o-acetate) (1-(4-phenylsulfanyl phenyl)-butan-1-one oxime- O-acetate) or a combination thereof.

The photopolymerization initiator may further comprise a carbazole compound, a diketone compound, a sulfonium borate-based compound, a diazo compound, an imidazole compound, or a biimidazole in addition to the compound. Based) compounds and the like.

The photopolymerization initiator may be used together with a photosensitizer capable of causing a chemical reaction by absorbing light and becoming excited and then transferring its energy.

Examples of the photosensitizer may be tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, Second season Dipentaerythritol tetrakis-3-mercapto propionate.

It may comprise from about 0.05% by weight to about 5 based on the total amount of the light blocking layer composition The photopolymerization initiator is in an amount of, for example, from about 0.1% by weight to about 5% by weight. When the photopolymerization initiator in the range is contained, excellent reliability can be ensured due to sufficient curing during exposure during pattern formation.

In some embodiments, the light blocking layer composition may comprise about 0.05, 0.06, 0.07, 0.08, 0.09, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 2, 3, 4 or An amount of photopolymerization initiator in an amount of 5% by weight. Moreover, in accordance with some embodiments of the present invention, the amount of photopolymerization initiator may range from about any of the foregoing amounts to about any of the foregoing amounts.

The solvent is a material that is compatible with, but not reactive with, the pigment, the binder resin, the reactive unsaturated compound, and the photopolymerization initiator.

Examples of the solvent may include an alcohol such as methanol, ethanol, etc.; an ether such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methyl phenyl ether, tetrahydrofuran or the like; a glycol ether such as ethylene glycol monomethyl ether, B Glycol monoethyl ether, etc.; ethylene glycol ethyl ether, such as methyl glycol acetate diethyl ether, ethyl glycol ethyl acetate diethyl ether, diethyl glycol acetate ethyl ether, etc.; carbitol, such as methyl ethyl carbene Alcohol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ether, diethylene glycol diethyl ether, etc.; propylene glycol alkane Ethyl acetate, such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, etc.; aromatic hydrocarbons such as toluene, xylene, etc.; ketones, such as methyl ethyl ketone, cyclohexanone, 4-hydroxy- 4-methyl-2-pentanone, methyl-n-acetone, Methyl-n-butanone, methyl-n-pentanone, 2-heptanone, etc.; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, etc.; lactate, For example, methyl lactate, ethyl lactate, etc.; alkyl oxyacetate, such as methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, etc.; alkyl alkoxyacetate, such as methoxyacetic acid Methyl ester, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.; alkyl 3-oxopropionate, such as 3-oxypropionic acid Ester, ethyl 3-oxopropionate, etc.; alkyl 3-alkoxypropionate, such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropane Ethyl acetate, methyl 3-ethoxypropionate, etc.; alkyl 2-oxopropionate, such as methyl 2-oxypropionate, ethyl 2-oxypropionate, 2-oxypropionic acid Propyl esters; etc.; alkyl 2-alkoxypropionates, such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, 2-ethoxy Methyl propyl propionate, etc.; 2-oxy-2-methylpropionate, such as methyl 2-oxy-2-methylpropanoate, 2-oxy-2-methyl Ethyl propionate or the like; alkyl monooxyalkylate of 2-alkoxy-2-methylpropanoate, such as methyl 2-methoxy-2-methylpropionate, 2- Ethyl ethoxy-2-methylpropionate; etc.; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate, 2-hydroxy-3 butyrate - methyl methyl ester or the like; or a keto ester such as ethyl pyruvate or the like. In addition, high boiling solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformamide, N-methylacetamide, N,N-di can also be used. Methylacetamide, N-methylpyrrolidone, dimethyl hydrazine, benzyl ether, dihexyl ether, acetamidine, isophorone, caproic acid, octanoic acid, 1-octanol, 1-nonanol, Benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenylethylene glycol Ethyl acetate and the like.

In view of mutual solubility and reactivity, it is preferred to use a glycol ether such as ethylene glycol. Monoethyl ether or the like; ethylene glycol alkyl ether acetate, such as ethyl glycol acetate ethyl ether; esters, such as 2-hydroxyethyl propionate; carbitol, such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetate, such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, and the like.

Use a solvent in a balanced amount, for example, based on the total amount of the light-blocking layer composition 40% by weight to about 90% by weight. When the solvent in the range is included, the light-blocking layer has an appropriate viscosity resulting in an improvement in workability.

In some embodiments, the light blocking layer composition may comprise about 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89 or 90% by weight Solvent. Moreover, in accordance with some embodiments of the present invention, the amount of solvent may range from about any of the foregoing amounts to about any of the foregoing amounts.

The light blocking layer composition may further comprise an additive such as malonic acid, 3-amino-1,2-propane An alcohol, a decane coupling agent, a leveling agent, a fluorine-based surfactant, a radical polymerization initiator, or a combination thereof.

The decane coupling agent may have a reactive substituent such as a vinyl group, a carboxyl group, or a group A propylene oxy group, an isocyanate group, an epoxy group or the like to improve the close contact property with the substrate.

Example Silane coupling agent may comprise silicon alkyl trimethoxy benzoic acid (trimethoxysilyl benzoic acid), γ- Bing Xixi methyl trimethoxysilane Silane (γ -methacryloxypropyl trimethoxysilane), vinyltris acetyl group Silane (vinyl triacetoxysilane), vinyl trimethoxy Silane (vinyl trimethoxysilane), γ- isocyanate propyl triethoxysilane Silane (γ -isocyanate propyl triethoxysilane), γ- glycidoxypropyl trimethoxy Silane (γ -glycidoxypropyltrimethoxysilane ), β- (3,4- epoxycyclohexyl) ethyltrimethoxysilane Silane (β - (3,4-epoxycyclohexyl) ethyltrimethoxysilane) and the like. These may be used singly or in the form of a mixture of two or more.

The decane type coupling agent may be contained in an amount of from about 0.01 part by weight to 10 parts by weight based on 100 parts by weight of the light-blocking layer composition.

In addition, the light blocking layer composition may further comprise an interfacing agent (for example, a fluorine-based surfactant) to improve coating properties and prevent defects if necessary.

Examples of fluorosurfactants may be commercial fluorosurfactants such as BM-1000 ^® and BM-1100 ^® (BM Chemie Inc.); MEGAFACE F 142D ^® , F 172 ^® , F 173 ^® And F 183 ^® Dainippon Ink Kagaku Kogyo Co., Ltd.); FULORAD FC-135 ^® , FULORAD FC-170C ^® , FULORAD FC-430 ^® and FULORAD FC-431 ^® (Sumitomo 3M) Sumitomo 3M Co., Ltd.); SURFLON S-112 ^® , SURFLON S-113 ^® , SURFLON S-131 ^® , SURFLON S-141 ^{® ,} and SURFLON S-145 ^® (Asahi Glass Co., Ltd.)); and SH-28PA ^® , SH-190 ^® , SH-193 ^® , SZ-6032 ^® and SF-8428 ^® (Toray Silicone Co., Ltd.) ).

The surfactant may be used in an amount of from about 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the light-blocking layer composition.

Further, a predetermined amount of other additives such as an antioxidant, a stabilizer, and the like may be contained unless these may deteriorate the characteristics of the light-blocking layer composition.

The transparent layer composition may include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, and a solvent.

The transparent layer composition achieves the spacers and steps but does not necessarily have a high optical density and therefore does not contain an organic black pigment. In other words, the transparent layer composition may contain a binder resin, a reactive unsaturated compound, a photopolymerization initiator, and a solvent, or, if necessary, an organic black pigment. Additionally, the transparent layer composition may further comprise an additive described for the light blocking layer composition.

The components composed of the binder resin, the reactive unsaturated compound, the photopolymerization initiator, the organic black pigment, and the solvent contained in the transparent layer composition are the same as those described in the light-blocking layer composition.

The binder resin contained in the transparent layer composition may be included in an amount of from about 3% by weight to about 70% by weight based on the total amount of the transparent layer composition, for example, from about 3% by weight to about 60% by weight. When the binder resin within the range is included, excellent resolution can be obtained.

In some embodiments, the transparent layer composition can comprise about 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21 , 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, An amount of 62, 63, 64, 65, 66, 67, 68, 69 or 70% by weight of the adhesive resin. Moreover, in accordance with some embodiments of the present invention, the amount of binder resin may range from about any of the foregoing amounts to about any of the foregoing amounts.

The reactive unsaturated compound contained in the transparent layer composition may be a transparent layer The total amount of the composition is included in an amount of from about 2% by weight to about 40% by weight, for example, from about 3% by weight to about 30% by weight. When the reactive unsaturated compound within the range is included, the transparent layer composition is sufficiently cured during the exposure of the pattern forming process to ensure excellent reliability.

In some embodiments, the transparent layer composition can comprise about 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, A reactive unsaturated compound in an amount of 32, 33, 34, 35, 36, 37, 38, 39 or 40% by weight. Moreover, in accordance with some embodiments of the present invention, the amount of reactive unsaturated compound can range from about any value of the foregoing amount to about any of the foregoing amounts.

It may comprise from about 0.1% by weight to about 5 weights based on the total amount of the transparent layer composition A photopolymerization initiator in an amount of, for example, from about 0.2% by weight to about 5% by weight. When the photopolymerization initiator in the range is included, the transparent layer composition is sufficiently cured during the exposure of the pattern forming process, and excellent reliability is obtained.

In some embodiments, the transparent layer composition can comprise about 0.1, 0.2, 0.3, Photopolymerization in an amount of 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 2, 3, 4 or 5 wt% Starter. Moreover, in accordance with some embodiments of the present invention, the amount of photopolymerization initiator may range from about any of the foregoing amounts to about any of the foregoing amounts.

The solvent is contained in a balanced amount, for example, about 40 in terms of the total amount of the transparent layer composition. The amount by weight to about 90% by weight. When a solvent within the range is included, the transparent layer composition has an appropriate viscosity to provide excellent processability.

In some embodiments, the light blocking layer composition may comprise about 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89 or 90% by weight Solvent. Moreover, in accordance with some embodiments of the present invention, the amount of solvent may range from about any of the foregoing amounts to about any of the foregoing amounts.

The solubility of the solvent of the transparent layer composition may be lower than that of the light blocking layer composition The solubility of the agent. For example, the solvent of the light blocking layer composition may include PGMEA, PGME, EDM, 3-MBA, EEP, etc., and the solvent of the transparent layer composition may include PGMEA, 3-MBA, n-butyl acetate, n-amyl acetate , n-hexyl acetate, etc., but the invention is not limited to these.

Hereinafter, the present invention will be described in more detail with reference to examples. However, these The examples are not to be construed as limiting the scope of the invention in any way.

(Preparation of light blocking layer and transparent layer) Preparation Examples 1 to 3

According to Preparation Example 1 to Preparation Example 3, each light blocking layer composition and transparent The layer composition was prepared by using the following components in the following compositions provided in Tables 1 to 3 below.

Specifically, the photopolymerization initiator is dissolved in a solvent and charged at room temperature. The mixture solution was stirred for 30 minutes or more, and a binder resin and a reactive unsaturated compound were sequentially added thereto, and the mixture was stirred at room temperature for about 1 hour. Subsequently, other additives were added to the stirred solution, the mixture was stirred for about 10 minutes, then a pigment was added thereto, and the obtained mixture was stirred at room temperature for 2 hours or more. Next, the product was filtered three times to remove impurities therein to obtain a light-blocking layer composition and a transparent layer composition.

Preparation Example 1: Preparation of a light blocking layer composition

(Mikuni, PWC 18%)

[Chemical Formula A]

Preparation Example 2: Preparation of a transparent layer composition

Preparation Example 3: Preparation of a transparent layer composition

(manufacturing light barrier and transparent layer) Preparation Example 4

(1) Coating the light-blocking layer composition of Example 1 onto a pretreated IZO substrate by spin coating or slit coating, roll coating, screen printing, using an applicator or the like to a thickness of 1.5 μm, and passed The hot plate was heated at 70 ° C to 100 ° C for 1 minute to 10 minutes to remove the solvent therein to dry.

(2) The transparent layer composition of Preparation Example 2 was coated on the dried light-blocking layer composition film by the same method as in the item (1), and dried to obtain a two-layer film.

(3) placing a halftone portion (transmission 15% to 70% light) for forming a light blocking layer pattern on the two-layer film and a full-tone region for forming a transparent layer pattern A part (transmission of 100% light) was irradiated with actinic rays of 200 nm to 500 nm using an exposure device (Ushio Inc. Motor Co., Ltd., HB-50110AA) to expose the front side. For the light source in the radiation, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, an argon laser, or the like can be used, and X-rays, electron beams, or the like can also be used as necessary. The exposure dose may vary depending on the type of component in the composition, the amount of mixing, and the film thickness during drying, but may be lower than or equal to 500 mJ/cm 2 (by using a 365 nm sensor) when using a high pressure mercury lamp.

(4) The exposed layer was developed with a 0.2% by weight aqueous potassium hydroxide (KOH) solution by using a developer (SVS Corporation, SSP-200), dissolved and removed unnecessary regions and left exposed regions, and thus patterned.

(5) The image pattern obtained by development was heated in an oven at 230 ° C for 30 minutes to prepare a sample including a light blocking layer and a transparent layer formed on the light blocking layer.

Preparation Example 5

A sample was produced according to the same method as Preparation Example 4, except that the transparent layer composition of Preparation Example 3 was used instead of the transparent layer composition of Preparation Example 2.

Comparative preparation example 1

A sample was fabricated according to the same method as in Preparation Example 4, but the light-blocking layer composition of Preparation Example 1 was applied to a thickness of 3.0 μm, and the transparent layer composition of Preparation Example 2 was not used.

Assessment 1: Evaluating Optical Density (Optical Depth: OD)

The light-blocking layer composition prepared in Preparation Example 1 and the transparent layer composition prepared in Preparation Example 2 and Preparation Example 3 were respectively applied using a spin coater (Mikasa Co., Ltd., Opticoat MS-A150). Each 10 cm × 10 cm IZO substrate was coated to a thickness of 1.5 μm, soft baked (or pre-baked) on a hot plate at 80 ° C for 150 seconds, and by using an exposer (Oxtail Electric Co., Ltd., HB-50110AA) And the mask is exposed with 50 mJ. Subsequently, the obtained organic coating (SVS, SSP-200) was developed in an aqueous solution of 0.2% by weight of potassium hydroxide (KOH) for 150 seconds, respectively, and hard baked (or post-baked) at 230 ° C in an oven 30 Minutes, each patterned sample was obtained. The optical density of the samples was measured and is shown in Table 4 below.

Assessment 2: Solvent resistance

The samples according to Preparation Example 4, Preparation Example 5, and Comparative Preparation Example 1 were cut into a size of 1 cm × 1 cm, placed in a glass bottle containing 5 ml of NMP, allowed to stand in an oven at 100 ° C for 15 minutes, and examined for occurrence. Decolorization, and the results are shown in Table 5 below.

Decolorization measurement

X: No discoloration when inspected with the naked eye

O: Highly discolored when inspected with the naked eye

Referring to Table 5, Preparation Example 4 and Preparation Example 5 showed superior solvent resistance as compared with Comparative Preparation Example 1, and showed no discoloration.

Although the present invention has been described in connection with the exemplary embodiments of the present invention, it is understood that the invention is not limited to the disclosed embodiments, but rather, the invention is intended to cover the spirit and scope of the appended claims. Various modifications and equivalent arrangements within the scope. Therefore, the above embodiments are to be considered as illustrative and not restrictive.

110a, 110b, 110c‧‧‧ color filters

111‧‧‧gate electrode

112‧‧‧ gate insulation

113‧‧‧ Semiconductor

114‧‧‧Source electrode

115‧‧‧汲electrode

116‧‧‧Protective layer

120‧‧‧Block film/insulation

130‧‧‧pixel electrodes

140‧‧‧Light barrier

150‧‧‧ transparent layer

160‧‧‧Liquid layer

170‧‧‧Common electrode

200‧‧‧lower base

300‧‧‧ upper base

Claims (16)

A liquid crystal display comprising: a thin film transistor on a lower substrate; a plurality of color filters disposed on the thin film transistor and aligned to be spaced apart from each other; and an insulating layer on the plurality of color filters; a light blocking layer on the insulating layer; a transparent layer on the light blocking layer and having a convex surface; an upper substrate facing the lower substrate; and a liquid crystal layer inserted into the lower substrate and the upper substrate And wherein the light blocking layer comprises an organic black pigment, and a shape of the transparent layer having the convex surface is different from a shape of the light blocking layer. The liquid crystal display of claim 1, wherein the organic black pigment comprises a compound represented by the following Chemical Formula 1: Here, in the above Chemical Formula 1, R ¹¹ to R ^{20 are} independently hydrogen or a substituted or unsubstituted C1 to C10 alkyl group. The liquid crystal display of claim 1, wherein the transparent layer having the convex surface covers all or a part of a front surface of the light blocking layer. The liquid crystal display of claim 1, wherein the transparent layer comprises a main transparent layer and an auxiliary transparent layer. The liquid crystal display of claim 4, wherein the thickness of the main transparent layer is thicker than the thickness of the auxiliary transparent layer. The liquid crystal display of claim 4, wherein the main transparent layer supports a gap between the upper substrate and the lower substrate. The liquid crystal display of claim 1, further comprising a pixel electrode between the insulating layer and the light blocking layer. The liquid crystal display of claim 1, further comprising a common electrode interposed between the upper substrate and the liquid crystal layer. The liquid crystal display of claim 1, further comprising a common electrode directly on the lower substrate. The liquid crystal display of claim 1, wherein the light-blocking layer has an optical density of about 1.0 or more than 1.0 of the optical density of the transparent layer. The liquid crystal display of claim 1, wherein the light blocking layer and the transparent layer are manufactured by coating a light blocking layer composition and drying the light blocking layer composition, in the drying Coating a transparent layer composition on the light blocking layer composition and drying the transparent layer composition, and The light blocking layer composition and the transparent layer composition are simultaneously exposed and developed. The liquid crystal display according to claim 11, wherein the light blocking layer composition comprises a binder resin, a reactive unsaturated compound, a photopolymerization initiator, the organic black pigment, and a solvent. The liquid crystal display of claim 12, wherein the light blocking layer composition comprises 1% by weight to 30% by weight of the adhesive resin; 1% by weight to 20% by weight of the reactive unsaturated compound; 0.05 From about 5% by weight of the photopolymerization initiator; from 1% to 30% by weight of the organic black pigment and a balance of the solvent. The liquid crystal display of claim 11, wherein the transparent layer composition comprises a binder resin, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. The liquid crystal display of claim 14, wherein the transparent layer composition further comprises a black pigment. The liquid crystal display of claim 14, wherein the transparent layer composition comprises from 3% by weight to 70% by weight of the binder resin; from 2% by weight to 40% by weight of the reactive unsaturated compound; 0.1 weight % to 5% by weight of the photopolymerization initiator; and a balance of the solvent.