KR102682916B1 - Photosensitive resin composition, photosensitive resin layer using the same and display device - Google Patents

Abstract

(A) a binder resin including a first binder resin and a second binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a black inorganic pigment, (E) an inorganic scattering agent, and (F) a solvent. wherein the first binder resin has a higher refractive index than the second binder resin, the first binder resin is contained in an amount equal to or less than that of the second binder resin, and the primary particle diameter of the inorganic pigment is 45 nm or less. A photosensitive resin composition, a photosensitive resin film manufactured using the same, and a display device including the photosensitive resin film are provided.

Description

Photosensitive resin composition, photosensitive resin film and display device manufactured using the same {PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND DISPLAY DEVICE}

This description relates to a photosensitive resin composition, a photosensitive resin film manufactured using the same, and a display device including the photosensitive resin film.

Black photosensitive resin composition is an essential material for the manufacture of display devices such as color filters, liquid crystal display materials, organic light emitting devices (EL), and display panel materials. 　For example, in color filters such as color liquid crystal displays, a black matrix or light-shielding partition is provided at the boundary between colored layers such as red, green, and blue to increase display contrast and color development effect. It is necessary, and it is mainly formed of a black photosensitive resin composition.

In particular, the recent development direction of liquid crystal displays is focused on high brightness and high color gamut, and as part of achieving the above physical properties, there are attempts to achieve high brightness and high color gamut by reducing the reflectance of light coming from outdoors. The main method being developed to reduce the reflectance of displays is to apply AR (Anti Reflective) film and AG (Anti Glare) film, which are anti-reflection films of polarizing films.

However, this method is not only expensive, but also has reached its limits, and efforts to reduce reflectance through other methods are continuing.

One embodiment is to provide a photosensitive resin composition that simultaneously implements light-shielding properties and low-reflection properties while also providing excellent surface roughness and straightness of a pattern.

Another embodiment is to provide a photosensitive resin film manufactured using the photosensitive resin composition.

Another embodiment is to provide a display device including the photosensitive resin film.

One embodiment includes (A) a binder resin including a first binder resin and a second binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a black inorganic pigment, (E) an inorganic scattering agent, and ( F) includes a solvent, wherein the first binder resin has a higher refractive index than the second binder resin, the first binder resin is contained in an amount equal to or less than the second binder resin, and 1 of the black inorganic pigment A photosensitive resin composition having a difference particle size of 45 nm or less is provided.

The second binder resin may have a refractive index of 1.55 or less.

The first binder resin may be a cardo-based binder resin, and the second binder resin may be an acrylic-based binder resin.

The content of the second binder resin may be twice or more than the content of the first binder resin.

The primary particle diameter of the black inorganic pigment may be 30 nm or less.

The black inorganic pigment may include carbon black.

The inorganic scattering agent may include SiO ₂ , TiO ₂ , ZrO ₂ , BaSO ₃ or a combination thereof.

The photosensitive resin composition may further include dye.

The dye may include red dye, yellow dye, violet dye, or a combination thereof.

The photosensitive resin composition includes 1% to 20% by weight of the (A) binder resin, 0.5% to 10% by weight of the (B) photopolymerizable monomer, and 0.1% by weight of the (C) photopolymerization initiator, based on the total amount of the photosensitive resin composition. % by weight to 5% by weight, 1% by weight to 20% by weight of the (D) black inorganic pigment, 0.1% by weight to 5% by weight of the (E) inorganic scattering agent, and 40% by weight to 80% by weight of the solvent (F) It can be included.

The photosensitive resin composition may further include malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a surfactant, or a combination thereof.

Another embodiment provides a photosensitive resin film manufactured using the photosensitive resin composition.

Another embodiment provides a display device including the photosensitive resin film.

Details of other aspects of the invention are included in the detailed description below.

The photosensitive resin composition according to one embodiment uses a certain amount of two types of binder resins having different refractive indices, limits the amount, and uses a black inorganic pigment with a primary particle size in a certain range, thereby improving light blocking and low Reflective characteristics can be implemented at the same time, and furthermore, excellent patterning can also be maintained.

Figure 1 is a scanning electron microscope photograph showing a pattern photograph of a photosensitive resin film manufactured using the photosensitive resin composition according to Example 1.
Figure 2 is a scanning electron microscope photograph showing a pattern photograph of a photosensitive resin film manufactured using the photosensitive resin composition according to Example 2.
Figure 3 is a scanning electron microscope photograph showing a pattern photograph of a photosensitive resin film manufactured using the photosensitive resin composition according to Comparative Example 1.
Figure 4 is a scanning electron microscope photograph showing a pattern photograph of a photosensitive resin film manufactured using the photosensitive resin composition according to Comparative Example 2.
Figure 5 is a scanning electron microscope photograph showing a pattern photograph of a photosensitive resin film manufactured using the photosensitive resin composition according to Comparative Example 3.
Figure 6 is a scanning electron microscope photograph showing a pattern photograph of a photosensitive resin film manufactured using the photosensitive resin composition according to Reference Example 1.

Hereinafter, embodiments of the present invention will be described in detail. 　However, this is presented as an example, and the present invention is not limited thereby, and the present invention is only defined by the scope of the claims to be described later.　

Unless otherwise specified herein, “alkyl group” refers to a C1 to C20 alkyl group, “alkenyl group” refers to a C2 to C20 alkenyl group, and “cycloalkenyl group” refers to a C3 to C20 cycloalkenyl group. , “Heterocycloalkenyl group” refers to a C3 to C20 heterocycloalkenyl group, “aryl group” refers to a C6 to C20 aryl group, “arylalkyl group” refers to a C6 to C20 arylalkyl group, and “alkylene group” means a C1 to C20 alkylene group, “arylene group” means a C6 to C20 arylene group, “alkylarylene group” means a C6 to C20 alkylarylene group, and “heteroarylene group” means a C3 to C20 heteroarylene group. It means an arylene group, and “alkoxylene group” means a C1 to C20 alkoxylene group.

Unless otherwise specified herein, “substitution” means that at least one hydrogen atom is replaced by a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, Azido group, amidino group, hydrazino group, hydrazono group, carbonyl group, carbamyl group, thiol group, ester group, ether group, carboxyl group or its salt, sulfonic acid group or its salt, phosphoric acid or its salt, C1 to C20 alkyl group, C2 to C20 alkenyl group, C2 to C20 alkynyl group, C6 to C20 aryl group, C3 to C20 cycloalkyl group, C3 to C20 cycloalkenyl group, C3 to C20 cycloalkynyl group, C2 to C20 heterocycloalkyl group, C2 to C20 heterocycloalkenyl group, C2 to C20 heterocycloalkynyl group, C3 to C20 heteroaryl group, or a combination thereof.

Also, unless otherwise specified herein, “hetero” means that at least one hetero atom among N, O, S, and P is included in the chemical formula.

Also, unless otherwise specified in the specification, “(meth)acrylate” means that both “acrylate” and “methacrylate” are possible, and “(meth)acrylic acid” means “acrylic acid” and “methacrylic acid.” "It means that both are possible.

Unless otherwise defined herein, “combination” means mixing or copolymerization. Additionally, “copolymerization” refers to block copolymerization to random copolymerization, and “copolymer” refers to block copolymerization to random copolymerization.

Unless otherwise defined in the chemical formulas in this specification, if a chemical bond is not drawn at a position where a chemical bond should be drawn, it means that a hydrogen atom is bonded at that position.

As used herein, cardo-based resin refers to a resin in which at least one functional group selected from the group consisting of the following formulas 2 to 12 is included in the backbone of the resin.

Unless otherwise defined herein, “*” means a part connected to the same or different atoms (including hydrogen atoms) or a chemical formula.

Unless otherwise defined in this specification, refractive index means the refractive index at a wavelength of 550 nm.

The photosensitive resin composition according to one embodiment includes (A) a binder resin including a first binder resin and a second binder resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a black inorganic pigment, (E) An inorganic scatterer and (F) a solvent, wherein the first binder resin has a higher refractive index than the second binder resin, and the first binder resin is contained in an amount equal to or less than that of the second binder resin, Since the primary particle size of the inorganic pigment is 45 nm or less, photosensitive resin films manufactured using it, such as black matrices or light-shielding partitions, can realize both light-shielding and low-reflection characteristics compared to conventional black matrices or light-shielding partitions. Performance (pattern surface roughness, pattern straightness, etc.) is also excellent.

Specifically, the photosensitive resin composition according to one embodiment is applied to a black matrix or a light-shielding partition wall for distinguishing between Red, Green, and Blue colors in a color filter. Conventionally, a black matrix or a light-shielding partition wall composition implements effective light-shielding properties. To achieve this, most compositions were composed of carbon black as the main ingredient. When carbon black is used as the main ingredient, the optical density is high and it is suitable for implementing light blocking properties, but there is a problem in that visibility is not improved. In addition, when the relative content of black inorganic pigments such as carbon black increases, there is a problem that the pattern surface becomes rough or the pattern straightness and resolution decrease, and when the relative content of carbon black is lowered, light blocking properties and optical density decrease, which is a general coating. There is a problem of not being able to achieve the minimum optical density required within the thickness (1㎛ to 1.3㎛). The present inventors recognized the above problems and proceeded with development to lower the reflectance of the panel to improve visibility, and completed the present invention after several trials and errors. In fact, a method of attaching a film (for example, a low-reflection polarizing film, etc.) to improve reflectance has been attempted. However, since the price of the polarizing film is high and the reflectance that can be achieved with the technology has already reached its lower limit, there are currently limits to additional film attachment methods, so the development of a composition for manufacturing a black matrix or light-shielding partition that can lower the reflectance in other directions This is being done. In particular, in the case of 8K high-resolution model TVs, the surface area of the black matrix increases by approximately twice that of 4K, so the lower the reflectance as well as the light blocking properties, the greater the effect of improving visibility.

Below, each component is described in detail.

(E) Inorganic scatterer

The photosensitive resin composition according to one embodiment includes an inorganic scatterer, specifically a dispersion containing an inorganic scatterer. There have been attempts in the past to add dispersions containing inorganic scatterers to the photosensitive resin composition, but in this case, the content of other inorganic substances used together inevitably increases in proportion to the amount of dispersions containing inorganic scatterers added, thereby imparting light blocking properties. As the relative content of the black colorant (e.g., black pigment, etc.) decreases, the optical density decreases, resulting in the problem that it cannot be manufactured as a black matrix or light-shielding partition.

However, the photosensitive resin composition according to one embodiment uses the dispersion containing the inorganic scatterer, but uses two types of binder resins having different refractive indices as described later, and further limits the content between the two types of binder resins. At the same time, the above-mentioned problem was solved by further limiting the primary particle size of the black inorganic pigment that serves as a black colorant. That is, when the photosensitive resin composition according to one embodiment is used, the problem of optical density deterioration may not occur even though it contains a dispersion containing inorganic scatterers.

For example, the inorganic scattering material may include SiO ₂ , TiO ₂ , ZrO ₂ , BaSO ₃ or a combination thereof, but is not necessarily limited thereto.

For example, the inorganic scattering agent may be included in an amount of 1% by weight or more based on the total amount of solids constituting the photosensitive resin composition according to one embodiment. In this case, the photosensitive resin film manufactured using the photosensitive resin composition according to one embodiment may have an optical density (unit: /1㎛) of 3.2 or more.

For example, the inorganic scattering agent may be included in an amount of 0.1% by weight to 5% by weight, for example, 0.1% by weight to 3% by weight, based on the total amount of the photosensitive resin composition. (Based on the inorganic scatterer dispersion, it may be included in an amount of 1% to 20% by weight, for example, 5% to 10% by weight, based on the total amount of the photosensitive resin composition.) When the inorganic scatterer is included in the above content range, low reflection characteristics And, while maintaining excellent pattern properties, light blocking properties can also be secured.

(A) Binder resin

The photosensitive resin composition according to one embodiment includes two types of binder resins having different refractive indices, wherein a binder resin (first binder resin) having a higher refractive index and a binder resin (second binder resin) having a lower refractive index. It is included in an amount equal to or less than. If the binder resin does not have this configuration, low-reflection characteristics cannot be realized.

Specifically, the second binder resin may have a refractive index of 1.55 or less. For example, the first binder resin may have a refractive index of 1.60 or more.

For example, the content of the second binder resin may be twice or more than the content of the first binder resin. In this case, developability and process margin can be improved.

For example, the first binder resin may be a cardo-based binder resin, and the second binder resin may be an acrylic-based binder resin. In this case, the heat resistance and chemical resistance of the photosensitive resin composition according to one embodiment may be improved, and, above all, it may be very advantageous in securing low-reflection characteristics.

The weight average molecular weight of the cardo-based binder resin may be 1,000 g/mol to 50,000 g/mol, specifically 3,000 g/mol to 35,000 g/mol.　If the weight average molecular weight of the cardo-based binder resin is within the above range, excellent patternability and developability can be obtained when manufacturing a black matrix or a partition for light blocking.

The cardo-based binder resin may be a compound containing a repeating unit represented by the following formula (1).

[Formula 1]

In Formula 1,

R ₂₄ to R ₂₇ may each independently be a hydrogen atom, a halogen atom, or a substituted or unsubstituted C1 to C20 alkyl group,

R ₂₈ and R ₂₉ may each independently be a hydrogen atom, or CH ₂ OR _a (R _a is a vinyl group, an acrylic group, or a methacryl group),

R ₃₀ may be a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C2 to C20 alkenyl group, an acrylic group, or a methacryl group,

Z ₁ is a single bond, O, CO, SO ₂ , CR _b R _c , SiR _d R _e (where R _b to R _e are the same or different from each other and represent a hydrogen atom, or a substituted or unsubstituted C1 to C20 alkyl group ), or any one selected from the group consisting of compounds represented by the following formulas 2 to 12,

Z ₂ may be an acid anhydride residue or an acid dianhydride residue.

[Formula 2]

[Formula 3]

[Formula 4]

[Formula 5]

[Formula 6]

In Formula 6 above,

R _f is a hydrogen atom, an ethyl group, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH=CH ₂ , or a phenyl group.

[Formula 7]

[Formula 8]

[Formula 9]

[Formula 10]

[Formula 11]

[Formula 12]

The cardo-based binder resin can be specifically obtained by reacting a compound represented by the following formula (13) with tetracarboxylic dianhydride.

[Formula 13]

The tetracarboxylic dianhydride may be aromatic tetracarboxylic dianhydride. Examples of the aromatic tetracarboxylic dianhydride include pyromelliic acid dianhydride, 3,3',4,4'-biphenyltetracarboxylic acid dianhydride, 2,3,3',4-biphenyltetracarboxylic acid dianhydride, 2, 2',3,3'-Biphenyl tetracarboxylic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride, 3,3',4,4'-biphenyl ether tetracarboxylic dianhydride, 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,5,6-naphthalenetetracarboxylic dianhydride, 2,3 ,6,7-naphthalenetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic dianhydride, 3,4,9,10-perylenetetra Carboxylic acid dianhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, etc. may be mentioned, but are not limited thereto.

The acrylic binder resin is a first ethylenically unsaturated monomer　and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin containing one or more acrylic repeating units.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group, and specific examples thereof include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.

The first ethylenically unsaturated monomer may be included in an amount of 5 to 50% by weight, specifically, 10 to 40% by weight, based on the total amount of the acrylic binder resin.

The second ethylenically unsaturated monomer may include aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, and vinylbenzylmethyl ether; Methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxy butyl (meth)acrylate, benzyl (meth)acrylate, Unsaturated carboxylic acid ester compounds such as cyclohexyl (meth)acrylate and phenyl (meth)acrylate; unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth)acrylate and 2-dimethylaminoethyl (meth)acrylate; Carboxylic acid vinyl ester compounds such as vinyl acetate and vinyl benzoate; Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth)acrylate; Vinyl cyanide compounds such as (meth)acrylonitrile; Unsaturated amide compounds such as (meth)acrylamide; These can be mentioned, and these can be used alone or in a mixture of two or more.

Specific examples of the acrylic binder resin include methacrylic acid/benzyl methacrylate copolymer, methacrylic acid/benzyl methacrylate/styrene copolymer, and methacrylic acid/benzyl methacrylate/2-hydroxyethyl methacrylate copolymer. Examples include polymers, methacrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymers, etc., but are not limited thereto, and these may be used alone or in combination of two or more types. 　

The weight average molecular weight of the acrylic binder resin may be 3,000 g/mol to 150,000 g/mol, specifically 5,000 g/mol to 50,000 g/mol, and more specifically 20,000 g/mol to 30,000 g/mol. It can be mol.　When the weight average molecular weight of the acrylic binder resin is within the above range, the photosensitive resin composition according to one embodiment has excellent physical and chemical properties, appropriate viscosity, and excellent adhesion to the substrate when manufacturing a black matrix or a light-shielding partition. .

The acid value of the acrylic binder resin may be 15 mgKOH/g to 60 mgKOH/g, specifically 20 mgKOH/g to 50 mgKOH/g. When the acid value of the acrylic binder resin is within the above range, the resolution of the pixel pattern is excellent.

The binder resin may be included in an amount of 1% to 20% by weight, for example, 3% to 15% by weight, based on the total amount of the photosensitive resin composition. When the binder resin is contained within the above range, the viscosity is appropriately maintained, and patternability, processability, and developability are excellent when manufacturing a black matrix or a partition for light blocking.

(B) Photopolymerizable monomer

The photopolymerizable monomer may be a mono- or multi-functional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond.

Since the acrylic photopolymerizable monomer has the ethylenically unsaturated double bond, sufficient polymerization occurs during exposure to light in the pattern formation process, thereby forming a pattern with excellent heat resistance, light resistance, and chemical resistance.

Specific examples of the photopolymerizable monomer include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, and neopentyl glycol. Di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate , pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth) Acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate, ethylene glycol monomethyl ether (meth)acrylate, trimethylol propane tri( Meta)acrylate, tris(meth)acryloyloxyethyl phosphate, novolac epoxy (meth)acrylate, etc. can be mentioned.

Examples of commercially available products of the photopolymerizable monomer are as follows. Examples of the monofunctional ester of (meth)acrylic acid include Aronix M-101 ^® , Aronix M-111 ^® , and Aronix M-114 ^® manufactured by Toagosei Chemical Co., Ltd.; Nippon Chemical Co., Ltd.'s KAYARAD TC-110S ^® , KAYARAD TC-120S ^® , etc.; Examples include V-158 ^® and V-2311 ^® manufactured by Osaka Yuki Chemical Co., Ltd. Examples of the above-mentioned difunctional ester of (meth)acrylic acid include Aronix M-210 ^® , Aronix M-240 ^® , and Aronix M-6200 ^® manufactured by Toagosei Chemical Co., Ltd.; KAYARAD HDDA ^® , KAYARAD HX-220 ^® , KAYARAD R-604 ^® , etc. from Nippon Chemical Co., Ltd.; Examples include V-260 ^® , V-312 ^® , and V-335 HP ^® manufactured by Osaka Yuki Chemical Co., Ltd. Examples of the trifunctional ester of (meth)acrylic acid include Aronix M-309 ^® , Aronix M-400 ^® , Aronix M-405 ^® , and Aronix M-450 ^® manufactured by Toagosei Chemical Co., Ltd. Aronix M-710 ^® , Aronix M-8030 ^® , Aronix M-8060 ^® , etc.; KAYARAD TMPTA ^® , KAYARAD DPCA-20 ^® , KAYARAD-30 ^® , KAYARAD-60 ^® , KAYARAD-120 ^® , etc. from Nippon Chemical Co., Ltd.; Examples include V-295 ^® , V-300 ^® , V-360 ^® , V-GPT ^® , V-3PA ^® , and V-400 ^® from Osaka Yuki Chemical Co., Ltd. The above products can be used alone or in combination of two or more types.

The photopolymerizable monomer may be used after being treated with an acid anhydride to provide better developability.

The photopolymerizable monomer may be included in an amount of 0.5% to 10% by weight, for example, 1% to 5% by weight, based on the total amount of the photosensitive resin composition. When the photopolymerizable monomer is included within the above range, sufficient curing occurs during exposure to light in the pattern formation process, resulting in excellent reliability and excellent developability in an alkaline developer.

(C) Photopolymerization initiator

The photopolymerization initiator may be an acetophenone-based compound, a benzophenone-based compound, a thioxanthone-based compound, a benzoin-based compound, a triazine-based compound, an oxime-based compound, or a combination thereof.

Examples of the acetophenone-based compounds include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloro acetophenone, p-t -Butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropane-1 -one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc.

Examples of the benzophenone-based compounds include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4 '-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc.

Examples of the thioxanthone-based compounds include thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diiso Propyl thioxanthone, etc. can be mentioned.

Examples of the benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, and benzyldimethyl ketal.

Examples of the triazine-based compounds include 2,4,6-trichloro-s-triazine, 2-phenyl 4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'- Dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-Biphenyl 4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, 2-(naphtho1-yl)-4,6 -bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichlor Romethyl)-6-piperonyl-s-triazine, 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine, etc. can be mentioned.

Examples of the oxime-based compounds include O-acyloxime-based compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime) -1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, 1-(3-Cyclopentyl-1-(9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl)propylideneaminooxy)ethanone, 2-(benzoyloxyimino)-3 -Cyclopentyl-1-(4-(phenylthio)phenyl)propan-1-one, etc. can be used. Specific examples of the O-acyloxime compounds include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butane- 1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione -2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate and 1-(4-phenylsulfanylphenyl)-butane-1-oneoxime- O-acetate, etc. can be used.

The photosensitive resin composition according to one embodiment may include a mixture of an oxime-based compound and an acetophenone-based compound as a photopolymerization initiator. At this time, the oxime-based compound may be included in a larger amount than the acetophenone-based compound.

In addition to the above compounds, the photopolymerization initiator may include carbazole-based compounds, diketone-based compounds, sulfonium borate-based compounds, diazo-based compounds, imidazole-based compounds, biimidazole-based compounds, and fluorene-based compounds.

The photopolymerization initiator may be included in an amount of 0.1% to 5% by weight, for example, 0.1% to 3% by weight, based on the total amount of the photosensitive resin composition.　When the photopolymerization initiator is included within the above range, photopolymerization sufficiently occurs during exposure in the pattern formation process, and the sensitivity of the manufactured black matrix or light-shielding partition becomes excellent.

(D) Black inorganic pigment

Considering compatibility with the above-mentioned inorganic scatterer-containing dispersion, in order to easily achieve black color by increasing light blocking, the black inorganic pigment constituting the black inorganic pigment dispersion has a primary particle size of 45 nm or less. A black inorganic pigment dispersion with a primary particle diameter of 45 nm or less is very suitable for use as a black colorant in the photosensitive resin composition according to one embodiment.

For example, the primary particle diameter of the black inorganic pigment may be 30 nm or less.

For example, the black inorganic pigment may include carbon black. For example, the black inorganic pigment may be carbon black.

For example, the content of the black inorganic pigment dispersion may be three times or more than the content of the dispersion containing the inorganic scattering agent. In this case, the optical density becomes higher, making it more advantageous to realize light blocking properties, and it can also be effective in reducing reflectance.

The black inorganic pigment can be used together with a dispersant. Specifically, the black inorganic pigment can be used by previously surface-treating it with a dispersant, or the dispersant can be added together with the black inorganic pigment when preparing the composition.

As the dispersant, a nonionic dispersant, an anionic dispersant, a cationic dispersant, etc. may be used. 　Specific examples of the dispersant include polyalkylene glycol and its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adduct, alcohol alkylene oxide adduct, sulfonic acid ester, sulfonate, carboxylic acid ester, and carboxylic acid salt. , alkyl amide, alkylene oxide adduct, alkyl amine, etc., and these can be used alone or in a mixture of two or more.

Examples of commercially available dispersants include BYK's DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, and DISPERBYK. -166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. from EFKA Chemicals; Zeneka's Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc.; Alternatively, there are Ajinomoto's PB711 and PB821.

The dispersant may be included in an amount of 0.1% to 15% by weight based on the total amount of the photosensitive resin composition. When the dispersant is included within the above range, the composition has excellent dispersibility, resulting in excellent stability, developability, and patternability when manufacturing a partition for light blocking.

The pigment may be used after pretreatment using a water-soluble inorganic salt and a wetting agent.　When the pigment is used after the above pretreatment, the average particle diameter of the pigment can be refined.

The pretreatment may be performed through the steps of kneading the pigment with a water-soluble inorganic salt and a wetting agent, and filtering and washing the pigment obtained in the kneading step.

The kneading may be performed at a temperature of 40°C to 100°C, and the filtration and washing may be performed by washing the inorganic salt with water or the like and then filtering.

Examples of the water-soluble inorganic salt include sodium chloride and potassium chloride, but are not limited thereto. 　The wetting agent serves as a medium through which the pigment and the water-soluble inorganic salt can be uniformly mixed and the pigment can be easily pulverized, examples of which include ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, etc. alkylene glycol monoalkyl ether; Alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerol, polyethylene glycol, etc. can be used alone or in a mixture of two or more.

The pigment that has gone through the kneading step may have an average particle diameter of 5 nm to 200 nm, for example, 5 nm to 150 nm. 　When the average particle diameter of the pigment is within the above range, stability in the pigment dispersion is excellent, and there is no concern about deterioration of pixel resolution.

Specifically, the black inorganic pigment may be included in an amount of 15% to 40% by weight, for example, 20% to 30% by weight, based on the total amount of the black inorganic pigment dispersion.

The black inorganic pigment may be included in an amount of 1 to 20% by weight, for example, 1 to 15% by weight, based on the total amount of the photosensitive resin composition. (Based on the black inorganic pigment dispersion, it may be included in an amount of 20% to 40% by weight, for example, 20% to 30% by weight, based on the total amount of the photosensitive resin composition.) When the black inorganic pigment is included within the above range, the effect of realizing black color and development performance becomes excellent.

(F) Solvent

The solvent may be a material that is compatible with but does not react with the above-described components and other additives described later.

Examples of the solvent include alcohols such as methanol and ethanol; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, and tetrahydrofuran; Glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and ethylene glycol dimethyl ether; Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; Carbitols such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, and diethylene glycol diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol methyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone ; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; Lactic acid esters such as methyl lactate and ethyl lactate; Alkyl oxyacetic acid esters such as methyl oxyacetate, ethyl oxyacetate, and butyl oxyacetate; Alkoxy acetic acid alkyl esters such as methyl methoxy acetate, ethyl methoxy acetate, butyl methoxy acetate, methyl ethoxy acetate, and ethyl ethoxy acetate; 3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, and methyl 3-ethoxypropionate; 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, and propyl 2-oxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, and methyl 2-ethoxypropionate; 2-oxy-2-methylpropionate esters such as methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, 2-methoxy-2-methylpropionate methyl, 2-ethoxy-2- Monooxymonocarboxylic acid alkyl esters of alkyl 2-alkoxy-2-methylpropionate such as ethyl methylpropionate; esters such as ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, ethyl hydroxyacetate, and methyl 2-hydroxy-3-methylbutanoate; Keto acid esters such as ethyl pyruvate, and others include N-methylformamide, N,N-dimethylformamide, N-methylformanilad, N-methylacetamide, and N,N-dimethylacetamide. , N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid. High boiling point solvents such as ethyl, diethyl oxalate, diethyl maleate, γ-butyrolactone, 3-methylbenzoic acid, 3-methoxybutyl acetate, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate can be mentioned.

Among these, considering compatibility and reactivity, ketones such as cyclohexanone are preferred; Glycol ethers such as ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, and diethylene glycol ethylmethyl ether; Ethylene glycol alkyl ether acetates such as ethyl cellosolve acetate; esters such as ethyl 2-hydroxypropionate; Carbitols such as diethylene glycol monomethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, 3-methylbenzoic acid, 3-methoxybutyl acetate, etc. may be used.

The solvent may be included in a residual amount, for example, 40% to 80% by weight, for example, 40% to 70% by weight, or for example, 40% to 65% by weight, relative to the total amount of the photosensitive resin composition. When the solvent is contained within the above range, the photosensitive resin composition has an appropriate viscosity, resulting in excellent processability when manufacturing a black matrix or a partition for light blocking.

(G) dye

The photosensitive resin composition according to one embodiment may further include dye. The dye may include red dye, yellow dye, violet dye, or a combination thereof.

When red dye, yellow dye, violet dye, or a combination thereof is additionally used, optical density can be further increased without damaging the pattern surface roughness and straightness.

Examples of the red dye include, but are not limited to, xanthene-based dyes, azo (pyridone-based, barbituric acid-based, etc.)-based dyes, disazo-based dyes, anthraquinone-based dyes, and methine-based dyes. Additionally, it may be in the form of a lake pigment obtained by laking such a dye, an inorganic salt of an acidic dye having an acidic group such as sulfonic acid or carboxylic acid, a salt-formation compound of an acidic dye and a nitrogen-containing compound, or a sulfonic acid amide compound of an acidic dye.

Examples of the yellow dye include, but are not limited to, quinoline-based dyes, azo-based (pyridone-based, barbituric acid-based metal complex-based, etc.) dyes, disazo-based dyes, and methine-based dyes.

Examples of the violet dye include C.I. Solvent Violet 2, C.I. Xanthene-based fat-soluble dyes such as Solvent Violet 10, C.I. Rhodamine-based fat-soluble dyes such as Solvent Violet 2, C.I. Xanthene basic dyes such as Basic Violet 10, C.I. Examples include xanthene-based acid dyes such as Acid Violet 9, but are not necessarily limited thereto.

The dye may be included in a smaller amount than the black inorganic pigment dispersion. For example, when the dye is included in a larger amount than the black inorganic pigment dispersion, the relative content of the black inorganic pigment dispersion is reduced, which may not be desirable because the optical density is lowered.

The dye may be included in a residual amount, for example, 1% to 10% by weight, for example, 3% to 8% by weight, relative to the total amount of the photosensitive resin composition. When the dye is included within the above range, the optical density of the photosensitive resin composition can be further increased, and low-reflection characteristics and excellent patterning properties can be achieved.

(H) Other additives

Meanwhile, the photosensitive resin composition may further include additives such as malonic acid, 3-amino-1,2-propanediol, silane-based coupling agent, leveling agent, surfactant, or a combination thereof.

The silane-based coupling agent may have a reactive substituent such as a vinyl group, carboxyl group, methacryloxy group, isocyanate group, or epoxy group in order to improve adhesion to the substrate.

Examples of the silane-based coupling agent include trimethoxysilylbenzoic acid, γmethacryloxypropyltrimethoxysilane, vinyltriacetoxysilane, vinyltrimethoxysilane, γisocyanatepropyltriethoxysilane, and γglycidoxypropyl. Trimethoxysilane, β-epoxycyclohexyl)ethyltrimethoxysilane, etc. can be used, and these can be used alone or in combination of two or more.

The silane-based coupling agent may be included in an amount of 0.01 to 10 parts by weight based on the total amount of the photosensitive resin composition. When the silane-based coupling agent is included within the above range, adhesion, storage, etc. are excellent.

In addition, the photosensitive resin composition may further include a surfactant, such as a fluorine-based surfactant and/or a silicone-based surfactant, if necessary, to improve coating properties and prevent defects.

Examples of the fluorine-based surfactants include BM-1000 ^® and BM-1100 ^® from BM Chemie; Mechapack F 142D ^® , Mechapack F 172 ^® , Mechapack F 173 ^® , Mechapack F 183 ^® , Mechapack F 554 ^® , etc. from Dainippon Inki Chemicals Co., Ltd.; Sumitomo 3M Co., Ltd.'s Prorad FC-135 ^® , Prorad FC-170C ^® , Prorad FC-430 ^® , Prorad FC-431 ^® , etc.; Asahi Grass Co., Ltd.'s Saffron S-112 ^® , Saffron S-113 ^® , Saffron S-131 ^® , Saffron S-141 ^® , Saffron S-145 ^® , etc.; Those commercially available under names such as SH-28PA ^® , SH-190 ^® , SH-193 ^® , SZ-6032 ^® , and SF-8428 ^® from Toray Silicone Co., Ltd. can be used.

The silicone-based surfactants include BYK-307, BYK-333, BYK-361N, BYK-051, BYK-052, BYK-053, BYK-067A, BYK-077, BYK-301, BYK-322, manufactured by BYK Chem. You can use one that is commercially available under names such as BYK-325.

The surfactant may be used in an amount of 0.001 to 5 parts by weight based on the total amount of the photosensitive resin composition.　When the surfactant is contained within the above range, coating uniformity is ensured, stains do not occur, and wetting on an IZO substrate or glass substrate is excellent.

Additionally, a certain amount of other additives such as antioxidants and stabilizers may be added to the photosensitive resin composition within the range that does not impair the physical properties.　

The photosensitive resin composition according to one embodiment may be a positive type or a negative type, but in order to more completely remove residues in the area where the pattern is exposed after exposure and development of the composition having light blocking properties, it is better to use the negative type. desirable.

Another embodiment provides a photosensitive resin film, such as a black matrix or a light blocking partition, manufactured by exposing, developing, and curing the above-described photosensitive resin composition.

The photosensitive resin film manufacturing method is as follows.

(1) Application and film formation stage

After applying the light-shielding barrier composition to a desired thickness using a method such as spin or slit coating, roll coating, screen printing, or applicator method on a substrate such as a glass substrate or ITO substrate that has undergone a predetermined pretreatment, 70 A coating film is formed by removing the solvent by heating (prebaking) at ℃ to 110℃ for 1 to 10 minutes.

(2) exposure step

In order to form the necessary pattern on the obtained coating film, a mask is interposed, and then exposure is performed by irradiating active rays of 200 nm to 500 nm. Light sources used for irradiation include low-pressure mercury lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, and argon gas lasers. In some cases, X-rays and electron beams can also be used.

The exposure amount varies depending on the type, mixing amount, and dry film thickness of each component of the composition, but when using a high-pressure mercury lamp, it is 500 mJ/cm ² (based on a 365 nm sensor) or less.

(3) Development stage

An alkaline aqueous solution is used as a developer to dissolve and remove unnecessary parts, leaving only the exposed parts remaining to form a pattern.

(4) Post-processing step

There is a post-heating process to obtain an image pattern obtained through development that is excellent in terms of heat resistance, adhesion, chemical resistance, etc. For example, after development, the image pattern obtained by development can be placed in a convection oven at 250°C and then heated (post-baking) for 1 hour.

Another embodiment provides a display device including the photosensitive resin film.

Hereinafter, preferred embodiments of the present invention will be described.　However, the following example is only a preferred example of the present invention, and the present invention is not limited by the following example.

(Photosensitive resin composition production)

Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1

After mixing the composition shown in Table 1 below and stirring for 6 hours, photosensitive resin compositions according to Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1 were prepared. Specifically, the photopolymerization initiator content was accurately measured, the solvent was added, and the mixture was sufficiently stirred until the initiator was completely dissolved. Afterwards, the binder resin and photopolymerizable monomer were sequentially added, and then stirred for another hour. Afterwards, the inorganic scatterer-containing dispersion and other additives were added, the black inorganic pigment dispersion was added, and finally the entire composition was stirred for more than 2 hours to prepare a photosensitive resin composition.

(Unit: g) Example 1 Example 2 Example 3 Comparative Example 1 Comparative Example 2 Comparative Example 3 Reference example 1 (A) Binder resin (A-1) 2.512 1.825 2.512 6.129 6.322 2.512 2.874 (A-2) 5.810 4.813 5.810 - - 5.810 6.316 (B) Photopolymerizable monomer 1.028 1.058 1.028 1.339 1.028 11.028 1.481 (C) Photopolymerization initiator (C-1) 0.451 0.477 0.451 0.531 0.451 0.451 0.555 (C-2) 0.129 0.159 0.129 0.274 0.19 0.129 0.185 (D) Black inorganic pigment dispersion (D-1) 21.528 21.165 - - 21.528 - 17.776 (D-2) - - 21.528 - - - - (D-3) - - - 23.349 - - - (D-4) - - - - - 21.528 - (E) Dispersion containing inorganic scatterers 7.044 7.044 7.044 - 7.341 7.341 7.395 (F) Solvent 61.020 56.833 61.020 68.191 63.020 61.020 63.230 (G) dye (G-1) - 2.930 - - - - - (G-2) - 3.513 - - - - - (H) Other additives 0.181 0.181 0.181 0.186 0.181 0.181 0.187

(A) Binder resin

(A-1) First binder resin

Cardo-based binder resin (KBR101, Kyungin Corporation, refractive index 1.6)

(A-2) Second binder resin

Acrylic binder resin (RY-25, Showadenko, refractive index 1.52)

(B) Photopolymerizable monomer

Dipentaerythritol hexa(meth)acrylate (DPHA, Japan Explosives)

(C) Photopolymerization initiator

(C-1) Oxime-based initiator (SPI-02, Samyang Co., Ltd.)

(C-2) Acetophenone initiator (IRG-369, BASF)

(D) Black inorganic pigment dispersion

(D-1) Mill base containing carbon black (SAKATA company; carbon black primary particle size 30nm, carbon black content: 25% by weight)

(D-2) Mill base containing carbon black (SAKATA company; carbon black primary particle size 45nm, carbon black content: 25% by weight)

(D-3) Mill base containing carbon black (SAKATA company; carbon black primary particle size 50nm, carbon black content: 25% by weight)

(D-4) Mill base containing carbon black (SAKATA company; carbon black primary particle size 70nm, carbon black content: 25% by weight)

(E) Dispersion containing inorganic scatterers

ZrO ₂ -containing dispersion (Mikuni; ZrO ₂ content: 20% by weight)

(F) Solvent

Propylene glycol monomethyl ether acetate (PGMEA, Biryong Co., Ltd.)

(G) dye

(G-1) Xanthene-based red dye (KISCO, RD-503)

(G-2) Azo series yellow dye (Kyungin Corporation, YDP-301)

(H) Other additives

γGlycidoxypropyl trimethoxysilane (S-510, Chisso)

(evaluation)

Reflectance evaluation

The photosensitive resin compositions prepared in Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1 were spin-coated on a glass substrate and pre-baked at about 100°C for 90 seconds to form a thickness of about 1.3㎛. It was applied thickly. Then, after cooling at room temperature (23°C) for 60 seconds, ultraviolet rays of 40 mJ/cm2 were irradiated with an ultra-high pressure mercury lamp to induce a photocuring reaction of the photosensitive portion. The exposed substrate was developed by spraying in a 0.043% KOH aqueous solution at room temperature and then washed with pure solvent for 60 seconds. Afterwards, it was dried at room temperature and then post-baked in a convection oven at 230°C for 30 minutes to obtain a patterned specimen. After forming the pattern specimen, in order to measure the reflectance, the reflectance of each pattern specimen was measured using MCPD (Otsuka) equipment based on a Cr substrate with 100% reflectance, and the results are shown in Table 2 below. It was.

(unit: %) Reflectance (@ 550nm, @1.2 ㎛) Example 1 1.51 Example 2 1.45 Example 3 1.50 Comparative Example 1 2.78 Comparative Example 2 1.93 Comparative Example 3 1.53 Reference example 1 1.38

Optical density evaluation

The photosensitive resin compositions of Examples 1 to 3, Comparative Examples 1 to 3, and Reference Example 1 were coated, exposed, developed, and post-baked, and the patterned specimen was measured for optical density per 1㎛ using an OD meter. was measured, and the results are shown in Table 3 below.

Optical density (/1㎛) Example 1 3.64 Example 2 3.73 Example 3 3.67 Comparative Example 1 3.86 Comparative Example 2 3.68 Comparative Example 3 3.61 Reference example 1 2.61

From Table 2, Table 3, and Figures 1 to 6, it can be seen that the photosensitive resin composition according to one embodiment simultaneously implements light-shielding properties and low-reflection characteristics, and also has very excellent patterning properties.

The present invention is not limited to the above-mentioned embodiments, but can be manufactured in various different forms, and those skilled in the art will be able to form other specific forms without changing the technical idea or essential features of the present invention. You will be able to understand that this can be implemented.　Therefore, the embodiments described above should be understood in all respects as illustrative and not restrictive.

Claims (13)

(A) a binder resin comprising a first binder resin and a second binder resin,
(B) photopolymerizable monomer,
(C) photopolymerization initiator,
(D) black inorganic pigment,
(E) inorganic scatterers and
(F) Solvent
Including,
The first binder resin has a higher refractive index than the second binder resin,
The content of the second binder resin is more than twice the content of the first binder resin,
The binder resin is included in an amount of 1% to 20% by weight based on the total amount of the photosensitive resin composition,
A photosensitive resin composition wherein the primary particle size of the black inorganic pigment is 45 nm or less.
According to paragraph 1,
The second binder resin is a photosensitive resin composition having a refractive index of 1.55 or less.
According to paragraph 1,
The first binder resin is a cardo-based binder resin,
The photosensitive resin composition wherein the second binder resin is an acrylic binder resin.
delete According to paragraph 1,
A photosensitive resin composition wherein the primary particle size of the black inorganic pigment is 30 nm or less.
According to paragraph 1,
The black inorganic pigment is a photosensitive resin composition containing carbon black.
According to paragraph 1,
The inorganic scattering material is a photosensitive resin composition comprising SiO ₂ , TiO ₂ , ZrO ₂ , BaSO ₃ or a combination thereof.
According to paragraph 1,
The photosensitive resin composition further includes a dye.
According to clause 8,
A photosensitive resin composition wherein the dye includes red dye, yellow dye, violet dye, or a combination thereof.
According to paragraph 1,
The photosensitive resin composition is, with respect to the total amount of the photosensitive resin composition,
1% to 20% by weight of (A) binder resin,
(B) 0.5% to 10% by weight of photopolymerizable monomer,
(C) 0.1% to 5% by weight of photopolymerization initiator,
(D) 1% to 20% by weight of black inorganic pigment,
(E) 0.1% to 5% by weight of inorganic scattering agent, and
40% to 80% by weight of the (F) solvent
A photosensitive resin composition containing a.
According to paragraph 1,
The photosensitive resin composition further includes malonic acid, 3-amino-1,2-propanediol, a silane-based coupling agent, a leveling agent, a surfactant, or a combination thereof.
A photosensitive resin film manufactured using the photosensitive resin composition according to any one of claims 1 to 3 and 5 to 11.
A display device comprising the photosensitive resin film of claim 12.