CN106200089A - Liquid crystal display - Google Patents

Abstract

The present invention provides a liquid crystal display, comprising a thin film transistor located on a lower substrate; a plurality of color filters located on the thin film transistor and aligned to be spaced apart from each other; located on the plurality of color filters an insulating layer; a light blocking layer on the insulating layer; a transparent layer having a convex surface on the light blocking layer; an upper substrate facing the lower substrate; and interposing the lower substrate and the A liquid crystal layer between upper substrates, wherein the light-blocking layer includes an organic black pigment, and the shape of the transparent layer having the convex surface is different from that of the light-blocking layer. The present invention can provide a liquid crystal display with excellent reliability.

Description

LCD Monitor

Cross References to Related Applications

This application claims priority and benefit from Korean Patent Application No. 10-2014-0161934 filed with the Korean Intellectual Property Office on November 19, 2014, the entire contents of which are incorporated herein by reference.

technical field

The present invention relates to a liquid crystal display (LCD).

Background technique

A liquid crystal display (LCD) is one of the most widely used flat panel displays and is a display device that adjusts the amount of transmitted light by applying a voltage to electrodes that interpose a liquid crystal layer between two display panels and make the liquid crystal A layer of liquid crystal molecules is re-aligned to form.

One of currently used liquid crystal displays (LCDs) has a structure in which field generating electrodes are respectively disposed in two display panels. Specifically, the main structure is that a plurality of thin film transistors and pixel electrodes are arranged in a matrix form in one display panel (hereinafter referred to as "thin film transistor array panel"), and in another display panel (hereinafter referred to as "common electrode panel") ) to form red, green and blue color filters, and the common electrode covers its front side.

However, such liquid crystal displays (LCDs) may have alignment errors because pixel electrodes and color filters are formed in different display panels and it is difficult to precisely align them therebetween. In order to solve this problem, a structure in which color filters and pixel electrodes are formed on the same display panel (color filter on array, COA) is proposed.

On the other hand, considering the alignment limit when the thin film transistor array panel is aligned with the common electrode group, the formed light blocking layer is larger than the predetermined size.

In addition, the liquid crystal layer space between the two display panels is called the liquid crystal layer gap (cell gap), and the liquid crystal layer gap affects the overall operating characteristics of the liquid crystal display (LCD) (such as response speed, contrast ratio, viewing angle, brightness uniformity, etc. )influential. When the liquid crystal layer gap is not uniform, a uniform image is not displayed on the entire screen, resulting in defective image quality.

Accordingly, there is an increasing need for a liquid crystal display (LCD) that prevents the deterioration of the aperture ratio due to the increase in the size of the light blocking layer and maintains a uniform liquid crystal layer gap across the front side of the substrate.

Contents of the invention

One embodiment provides a liquid crystal display (LCD) having excellent reliability by simultaneously forming a light blocking layer and a light blocking layer having a shape different from that of a transparent layer.

One embodiment provides a liquid crystal display (LCD) comprising a thin film transistor on an underlying substrate; a plurality of color filters on the thin film transistor and aligned to be spaced apart from each other; An insulating layer on the first color filter; a light-blocking layer on the insulating layer; a transparent layer on the light-blocking layer and having a convex surface; an upper substrate facing the lower substrate; and a liquid crystal layer interposed between the lower substrate and the upper substrate, wherein the light blocking layer includes an organic black pigment, and the transparent layer having a convex surface has a shape different from that of the light blocking layer.

The organic black pigment may include a compound represented by Chemical Formula 1 below.

[chemical formula 1]

In Chemical Formula 1,

R ¹¹ to R ²⁰ are independently hydrogen or substituted or unsubstituted C1 to C10 alkyl.

The convex transparent layer may cover all or part of the front surface of the light blocking layer.

The transparent layer may include a main transparent layer and an auxiliary transparent layer.

The thickness of the main transparent layer may be thicker than that of the auxiliary transparent layer.

The primary transparent layer may support a gap between the upper substrate and the lower substrate.

A liquid crystal display (LCD) may further include a pixel electrode between the insulating layer and the light blocking layer.

A liquid crystal display (LCD) may further include a common electrode interposed between the upper substrate and the liquid crystal layer.

A liquid crystal display (LCD) may also include a common electrode directly on the underlying substrate.

The optical density of the light blocking layer may be about 1.0 or more than 1.0 greater than the optical density of the transparent layer.

The light-shielding layer and the clear layer can be produced by applying the light-shielding layer composition and drying it, coating the light-shielding layer composition on the dried light-shielding layer composition and drying it, and simultaneously exposing and developing A light blocking layer composition and a transparent layer composition.

The light blocking layer composition may include a binder resin, a reactive unsaturated compound, a photopolymerization initiator, an organic black pigment, and a solvent.

The light blocking layer composition may comprise about 1% by weight to about 30% by weight of a binder resin; about 1% by weight to about 20% by weight of a reactive unsaturated compound; about 0.05% by weight to about 5% by weight of a photopolymerization initiator; From about 1% to about 30% by weight of an organic black pigment, and the balance solvent.

The transparent layer composition may include an adhesive resin, a reactive unsaturated compound, a photopolymerization initiator, and a solvent.

The clear layer composition may further contain a black pigment.

The transparent layer composition may include about 3% by weight to about 70% by weight of a binder resin; about 2% by weight to about 40% by weight of a reactive unsaturated compound; about 0.1% by weight to about 5% by weight of a photopolymerization initiator; and Equilibrium amount of solvent.

Other embodiments of the invention are included in the following detailed description.

A light blocking layer and a light blocking layer having a convex surface and having a shape different from that of the transparent layer are simultaneously formed to provide a liquid crystal display (LCD) having excellent reliability.

Description of drawings

1 to 4 are cross-sectional views of a liquid crystal display (LCD) according to an exemplary embodiment.

FIG. 5 is a schematic diagram illustrating the structure of a light blocking layer and a transparent layer in a conventional liquid crystal display (LCD).

6 and 7 are schematic diagrams illustrating structures of a light blocking layer and a transparent layer in a liquid crystal display (LCD) according to an exemplary embodiment.

detailed description

The invention will be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the exemplary embodiments set forth herein. These exemplary embodiments disclosed in this specification are provided so that the disclosure will be thorough and complete, and will fully convey the ideals of the invention to those skilled in the art.

In the drawings, the thicknesses of layers and regions are exaggerated for clarity. In addition, the layers and regions shown in the drawings are schematic diagrams in nature, and their shapes are not intended to illustrate the exact shape of the composition of objects, and are not intended to limit the scope of the present invention. It will be understood that when a layer is referred to as being "on" another layer or substrate, it can be directly on the other layer or substrate, or a third layer may also be present therebetween. The same drawing reference numerals represent the same elements throughout the specification.

As used herein, when no specific definition is otherwise provided, the term "alkyl" refers to C1 to C20 alkyl, the term "alkenyl" refers to C2 to C20 alkenyl, and the term "cycloalkenyl" refers to C3 to C20 cycloalkenyl, the term "heterocycloalkenyl" refers to C3 to C20 heterocycloalkenyl, "aryl" refers to C6 to C20 aryl, and the term "arylalkyl" refers to C6 to C20 Arylalkyl, the term "alkylene" refers to C1 to C20 alkylene, the term "arylene" refers to C6 to C20 arylene, and the term "alkylarylene" refers to C6 to C20 For a C20 alkylarylene group, the term "heteroarylene" refers to a C3 to C20 heteroarylene group, and the term "alkyleneoxy" refers to a C1 to C20 alkyleneoxy group.

As used herein, when no specific definition is otherwise provided, the term "substituted" means that a compound is substituted for at least one hydrogen by a substituent selected from: halogen (F, CI, Br or I), hydroxyl, C1 to C20 alkane Oxygen, nitro, cyano, amino, imino, azido, amidino, hydrazino, hydrazino, carbonyl, carbamyl (carbamyl group), thiol, ester, ether, carboxyl or Its salt, sulfonic acid group or its salt, phosphoric acid or its salt, C1 to C20 alkyl, C2 to C20 alkenyl, C2 to C20 alkynyl, C6 to C20 aryl, C3 to C20 cycloalkyl, C3 to C20 ring Alkenyl, C3 to C20 cycloalkynyl, C2 to C20 heterocycloalkyl, C2 to C20 heterocycloalkenyl, C2 to C20 heterocycloalkynyl, C3 to C20 heteroaryl, or combinations thereof.

As used herein, when no specific definition is otherwise provided, the term "hetero" refers to a compound whose chemical formula contains at least one heteroatom selected from N, O, S, and P.

As used herein, when no specific definition is otherwise provided, the term "combination" refers to mixing or copolymerization.

As used herein, the cardo-based resin refers to a resin including at least one functional group selected from the following Chemical Formulas 2-1 to 2-11 in the main chain.

As used herein, unless a specific definition is provided otherwise, when no chemical bond is drawn, a hydrogen atom is bonded where the bond would occur.

A liquid crystal display (LCD) according to one embodiment includes a thin film transistor on a lower substrate; a plurality of color filters on the thin film transistor and aligned to be spaced apart from each other; on the plurality of color filters an insulating layer; a light-blocking layer on the insulating layer; a transparent layer having a convex surface on the light-blocking layer; an upper substrate facing the lower substrate; and inserting the lower substrate and the The liquid crystal layer between the upper substrates, wherein the light-blocking layer contains organic black pigment, and the shape of the transparent layer with a convex surface is different from that of the light-blocking layer.

The light blocking layer and the transparent layer do not need to be the same thickness because they are different shapes. However, the light-blocking layer and the transparent layer have different cross-sections because of their different shapes.

Referring to FIG. 5 below, a transparent layer having the same shape as the light-blocking layer is disposed on the light-blocking layer in a conventional liquid crystal display (LCD). However, referring to FIGS. 6 and 7 below, more than one transparent layer having a shape different from that of the light blocking layer is disposed on the light blocking layer in a liquid crystal display (LCD) according to an embodiment.

When the light blocking layer and the transparent layer in the liquid crystal display (LCD) have the shape provided in FIG. 6 below, fine patterns can be advantageously formed by reducing the critical dimension (CD), and here, when the liquid crystal display (LCD When the light-blocking layer and the transparent layer in ) have the shapes provided in Figure 7 below, the reliability can be improved.

1 to 4 are cross-sectional views of a liquid crystal display (LCD) according to an exemplary embodiment.

Referring to FIGS. 1 to 4 , a thin film transistor is located on a lower substrate 200 . A thin film transistor can be composed of three terminals (control terminal, input terminal and output terminal) as a switch. The thin film transistor may include a gate electrode 111 , a gate insulating layer 112 , a semiconductor 113 , a source electrode 114 , a drain electrode 115 and a protection layer 116 .

Specifically, gate lines and gate electrodes 111 including storage electrode lines are formed on the lower substrate 200 .

There may be more than one gate line, and more than one gate electrode including the gate line. A plurality of gate lines extend in a horizontal direction and transmit gate signals. A plurality of gate electrodes may be connected to each other and form one protrusion.

There may be more than one storage electrode line, which mainly extends in the horizontal direction and transmits a predetermined voltage, such as a common voltage (Vcom) and the like.

A gate insulating layer 112 is formed on the gate electrode 111 . The gate insulating layer 112 may include silicon nitride, silicon dioxide or a combination thereof.

A semiconductor 113 is formed on the gate insulating layer 112, and the semiconductor 113 may be formed of amorphous silicon, crystalline silicon, or the like. The semiconductor 113 mainly extends in the vertical direction and may extend towards a plurality of gate electrodes.

More than one pair of ohmic contact elements (not shown) are formed on semiconductor 113 . The ohmic contact elements may be formed of, for example, silicide or n+ hydrogenated amorphous silicon doped with a high concentration of n-type impurities.

On the ohmic contacts, data conductors including data lines and drain electrodes 115 are formed.

The data lines transmit data signals and mainly extend in a vertical direction, and thus cross the gate lines. Each data line extends toward the gate electrode 111 and includes source electrodes 114 connected to each other.

On the thin film transistor, a plurality of color filters 110a, 110b, and 110c are disposed. The plurality of color filters 110a, 110b, and 110c include red filters, green filters, and blue filters spaced apart from each other. The plurality of color filters 110 a , 110 b , and 110 c are spaced apart from each other in a horizontal direction, but may form stripes in a vertical direction.

An insulating layer 120 is disposed on the plurality of color filters 110a, 110b, and 110c. The insulating layer 120 may be located in a space between adjacent color filters. The insulating layer 120 may be formed as an organic layer or an inorganic layer, but an inorganic layer may be more preferable. When the insulating layer 120 is formed as an organic layer, it is difficult to form a step by using a light blocking layer and a transparent layer. In addition, the insulating layer 120 may not be patterned, and thus is partially patterned by a photolithography process, unlike an overcoating layer, which is baked immediately after coating on the front side.

The light blocking layer 140 is disposed on the insulating layer 120 , and the transparent layer 150 is disposed on the light blocking layer 140 .

A liquid crystal display (LCD) may further include an auxiliary light blocking layer (not shown) between the insulating layer 120 and the light blocking layer 140 . Here, the auxiliary light blocking layer may be located in a space between adjacent color filters.

The light blocking layer 140 includes an organic black pigment to have a high optical density, and the organic black pigment may include a lactam-based organic black, such as a compound represented by Chemical Formula 1 below.

[chemical formula 1]

In Chemical Formula 1,

R ¹¹ to R ²⁰ are independently hydrogen or substituted or unsubstituted C1 to C10 alkyl. For example, R ¹¹ to R ²⁰ can be hydrogen.

The convex transparent layer may cover all or part of the front surface of the light blocking layer.

The front side of the light blocking layer may refer to the side of the light blocking layer that is in contact with the transparent layer. For example, referring to FIG. 6 below, in a liquid crystal display (LCD) according to an exemplary embodiment, a transparent layer with a convex surface covers a part of the front side of the light blocking layer, and referring to FIG. 7 below, in accordance with the exemplary embodiment The transparent layer with a convex surface in the liquid crystal display (LCD) of the exemplary embodiment covers the entire front side of the light blocking layer.

A transparent layer may be placed on the front side of the light blocking layer by a photo halftone process as described below.

The transparent layer may include a main transparent layer 152 and an auxiliary transparent layer 153, and here, the main transparent layer and the auxiliary transparent layer exist independently, for example, the sides of the main transparent layer are not in contact with the sides of the auxiliary transparent layer.

The light blocking layer and the transparent layer are simultaneously formed as described below, and here, the main transparent layer may have the role of a spacer supporting the space between the upper substrate and the lower substrate, and the auxiliary transparent layer may have the role of helping the main transparent layer And the role of the auxiliary spacer supporting the space between the upper substrate and the lower substrate. Therefore, the main transparent layer having a spacer function may be thicker than the auxiliary transparent layer having an auxiliary spacer function. In this way, when the transparent layer is separately formed as the main transparent layer and the auxiliary transparent layer, the main transparent layer supports the auxiliary transparent layer even when the cushioning effect is deteriorated, and thus structural stability can be ensured.

On the other hand, a pixel electrode 130 including an auxiliary pixel electrode may be formed on the insulating layer 120 . The auxiliary pixel electrodes may be spaced apart from each other at intervals of a plurality of gate lines and disposed on top and bottom of each gate line respectively, and thus are adjacent to each other in a column direction. The auxiliary pixel electrode may have an overall quadrangular shape.

On the upper substrate 300 , for example, between the upper substrate 300 and the liquid crystal layer 160 , the common electrode 170 may be formed, and between the common electrode 170 and the liquid crystal layer 160 , an alignment layer (not shown) may be formed. The common electrode 170 can transmit a common voltage.

The common electrode 170 may be directly formed on the lower substrate 200 instead of the upper substrate 300 , and a patterned electrode may be used instead of the common electrode 170 .

The liquid crystal layer 160 has negative dielectric anisotropy, and liquid crystal molecules of the liquid crystal layer 160 are aligned with their long axes perpendicular to the surfaces of the two substrates (upper and lower substrates) when no electric field exists. The liquid crystal layer 160 includes an alignment assistant including reactive mesogens, and the liquid crystal molecules may have a pretilt angle and their long axes are substantially parallel to the length direction of the pixel electrode 130 . Alignment aids may be included in the alignment layer instead of the liquid crystal layer.

On the other hand, the structures of the thin film transistors described with reference to FIGS. 1 to 4 are merely examples and may be modified into various structures including the thin film transistor structures.

The light-shielding layer and the clear layer can be formed by applying and drying the light-shielding layer composition, drying and coating the clear layer composition on the dried light-shielding layer composition, and simultaneously exposing and developing the dried light-shielding layer composition. layer composition and transparent layer composition.

Exposure can be done by using a halftone mask. A halftone mask can contain areas that transmit about 100% of light during exposure, areas that transmit about 25% to about 35% of light during exposure, areas that transmit about 15% to about 25% of light during exposure, and areas that transmit A region where about 0% light is transmitted during, but the structure of the halftone mask is not limited to these.

Because the transparent layer composition and the light-shielding layer composition are simultaneously exposed and developed after coating the transparent layer composition, to realize spacers and steps on the light-shielding layer composition, and without exposing and developing the light-shielding layer composition The optical density is obtained under conditions such that the difference between the optical density per 1 micron of the light-blocking layer and the optical density per 1 micron of the transparent layer is greater than or equal to about 1.0. For example, the difference between the optical density per 1 micron of the light-blocking layer and the optical density per 1 micron of the transparent layer may be greater than or equal to about 1.0, such as about 1.5.

Specifically, the light blocking layer and the transparent layer on the light blocking layer can be manufactured as follows.

(1) Coating and film formation

Coating of a light-shielding layer composition on a substrate such as a glass substrate or an IZO substrate subjected to a predetermined pretreatment using a spin coating method or a slit coating method, a roll coating method, a screen printing method, an applicator method, etc. to a desired thickness, followed by heating the coated substrate at a temperature in the range of about 70°C to about 100°C for about 1 minute to about 10 minutes to remove the solvent. Next, the transparent layer composition was coated and heated (dried) using the same method to obtain a film.

(2) Exposure

After placing a mask comprising halftone portions for patterning the light blocking layer and full tone portions for patterning the clear layer, the resulting film is irradiated with active radiation from about 200 nanometers to about 500 nanometers to form the desired pattern. Irradiation is performed by using a light source such as a mercury lamp with low pressure, high pressure or ultrahigh pressure, a metal halide lamp, an argon laser, or the like. X-rays, electron beams, etc. may also be used as appropriate.

When using a high pressure mercury lamp, the exposure process uses, for example, a light dose of about 500 mJ/cm2 or less (using a 365 nm sensor). However, the light dose may vary depending on the kind of each component of the black photosensitive resin composition, the combination ratio thereof, and the dry film thickness.

(3) Development

After the exposure process, the exposed film is developed by dissolving and removing unnecessary portions other than the exposed portion using an alkaline aqueous solution, thereby forming an image pattern.

(4) post-processing

The developed image pattern can be reheated to achieve excellent qualities such as heat resistance, light resistance, close-contact characteristics, crack resistance, chemical resistance, high strength, and storage stability.

Hereinafter, the light blocking layer composition and the transparent layer composition are described.

The composition of the light-shielding layer includes an adhesive resin, a reactive unsaturated compound, a photopolymerization initiator, an organic black pigment and a solvent.

The light-shielding layer composition may further include color calibration agents such as anthraquinone-based pigments, perylene-based pigments, phthalocyanine-based pigments, and azo-based pigments.

Organic black pigments can be used together with dispersants for dispersion. Specifically, the pigment may be surface pretreated with a dispersant, or the pigment and dispersant may be added together during preparation of the light-blocking layer composition.

The dispersant may be a nonionic dispersant, anionic dispersant, cationic dispersant, or the like. Specific examples of the dispersant may be polyalkylene glycol or its ester, polyoxyalkylene, polyhydric alcohol ester alkylene oxide addition product, alcohol epoxy Alcohol alkylene oxide addition product, sulfonate, sulfonate, carboxylate, carboxylate, alkyl amide alkylene oxide addition product, alkylamine, etc. , and they may be used alone or in admixture of two or more.

Commercially available examples of the dispersant may include DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPERBYK-162, DISPERBYK- 163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000 or DISPERBYK-2001; EFKA-47 manufactured by EFKA Chemicals Co. Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000 manufactured by Zeneka Co. , Solsperse 20000, Solsperse 24000GR, Solsperse 27000, or Solsperse 28000; or PB711 or PB821 manufactured by Ajinomoto Inc.

The dispersant may be included in an amount of about 0.1% by weight to about 15% by weight based on the total amount of the light blocking layer composition. When the dispersant within the range is included, the light blocking layer composition has improved dispersion characteristics.

Organic black pigments can be pretreated with water soluble inorganic salts and wetting agents. When the organic black pigment is pretreated, the average particle size of the organic black pigment becomes finer.

Pretreatment may be performed by kneading the pigment with a water-soluble inorganic salt and a wetting agent, followed by filtering and washing the kneaded pigment.

The kneading may be performed at a temperature of about 40°C to about 100°C, and filtration and washing may be performed by filtering the pigment after washing away the inorganic salt with water or the like.

Examples of water-soluble inorganic salts may be sodium chloride, potassium chloride, etc., but are not limited to these. The wetting agent can uniformly mix and pulverize the pigment and the water-soluble inorganic salt. Examples of humectants include alkylene glycol monoalkyl ethers such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether ( diethylene glycol monomethylether), etc., and alcohols such as ethanol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerine polyethylene glycol (glycerine polyethylene glycol) etc. These may be used alone or in admixture of two or more.

The organic black pigment may be included in an amount of about 1 wt % to about 30 wt %, for example, about 2 wt % to about 20 wt %, based on the total amount of the light blocking layer composition. When the pigment within the range is included, resolution and pattern linearity are improved.

In some embodiments, the light blocking layer composition may comprise about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, Organic black pigment in an amount of 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29 or 30% by weight. In addition, according to some embodiments of the present invention, the amount of the organic black pigment may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

The adhesive resin may include a cationic adhesive resin, an acryl adhesive resin, or a combination thereof.

The binding resin may be a cationic binding resin. When the binder resin is a cationic binder resin, the light-shielding layer composition comprising the cationic binder resin has excellent developability and sensitivity during photocuring, and thus has excellent fine pattern formation ability. In particular, when the cationic ring-based adhesive resin is used, the reliability of a liquid crystal display (LCD) can be secured.

The cationic binder resin may include repeating units represented by Chemical Formula 2 below.

[chemical formula 2]

In Chemical Formula 2,

R ¹ and R ² are independently a hydrogen atom or a substituted or unsubstituted (meth)acryloyloxyalkyl group ((meth)acryloyloxyalkyl group),

R ³ and R ⁴ are each independently a hydrogen atom, a halogen atom, or a substituted or unsubstituted C1 to C20 alkyl group, and

Z ¹ is a single bond, O, CO, SO ₂ , CR ⁷ R ⁸ , SiR ⁹ R ¹⁰ (where R ⁷ to R ¹⁰ are independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group) or formed by One of the linking groups represented by one of the following Chemical Formulas 2-1 to 2-11.

[chemical formula 2-1]

[chemical formula 2-2]

[chemical formula 2-3]

[chemical formula 2-4]

[chemical formula 2-5]

In chemical formula 2-5,

R ^a is a hydrogen atom, an ethyl group, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH═CH ₂ or a phenyl group.

[chemical formula 2-6]

[chemical formula 2-7]

[chemical formula 2-8]

[chemical formula 2-9]

[chemical formula 2-10]

[chemical formula 2-11]

Z ² is an acid dianhydride residue (acid dianhydride residual group),

m1 and m2 are each independently an integer in the range 0 to 4, and

n is an integer ranging from 1 to 30.

The anionic ring-based adhesive resin may include a functional group represented by the following Chemical Formula 3 at at least one of two terminals.

[chemical formula 3]

In Chemical Formula 3,

Z ³ is represented by the following Chemical Formulas 3-1 to 3-7.

[chemical formula 3-1]

In Chemical Formula 3-1, R ^b and R ^c are each independently hydrogen, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group.

[chemical formula 3-2]

[chemical formula 3-3]

[chemical formula 3-4]

[chemical formula 3-5]

In Chemical Formula 3-5, R ^d is O, S, NH, substituted or unsubstituted C1 to C20 alkylene, C1 to C20 alkylamino, or C2 to C20 alkenylamino.

[chemical formula 3-6]

[chemical formula 3-7]

The anocylcyclic binding resin can be prepared, for example, by mixing at least two of: a fluorine-containing compound, such as 9,9-bis(4-oxiranylmethoxyphenyl)fluoro(9,9- bis(4-oxiranylmethoxyphenyl)fluorine), etc.; anhydride compounds, such as benzene tetracarboxylic acid dianhydride, naphthalenetetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride ), benzophenone tetracarboxylic acid dianhydride, pyromellitic dianhydride, cyclobutane tetracarboxylic acid dianhydride, perylenetetracarboxylic acid dianhydride ), tetrahydrofuran tetracarboxylic aciddianhydride (tetrahydrofuran tetracarboxylic aciddianhydride), tetrahydrophthalic anhydride (tetrahydrophthalic anhydride), etc.; diol compounds, such as ethylene glycol, propylene glycol, polyethylene glycol, etc.; alcohol compounds, such as methanol, Ethanol, propanol, n-butanol, cyclohexanol, benzyl alcohol, etc.; solvent compounds, such as propylene glycol methylethyl acetate, N-methylpyrrolidone, etc.; phosphorus Compounds such as triphenylphosphine, etc.; and amine or ammonium salt compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, benzyltriethylchloride Ammonium (benzyltriethylammonium chloride), etc.

The weight average molecular weight of the cationic binder resin is from about 500 to about 50,000 g/mole, for example from about 1,000 to about 30,000 g/mole. When the weight average molecular weight of the anionic cyclic binder resin is within the range, pattern formation can be well performed without loss of film thickness during development.

The acryl-based adhesive resin is a copolymer of a first ethylenic unsaturated monomer and a second ethylenic unsaturated monomer copolymerizable therewith, and is a resin including at least one acryl-based repeating unit.

The first ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing at least one carboxyl group. Examples of monomers include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or combinations thereof.

The first ethylenically unsaturated monomer may be included in an amount of about 5% to about 50% by weight, for example, about 10% to about 40% by weight, based on the total amount of the acryl resin.

The second ethylenically unsaturated monomer can be an aromatic vinyl compound, such as styrene, α-methylstyrene, vinyl toluene, vinyl benzyl methyl ether, etc.; an unsaturated carboxylic acid ester compound, such as (methyl styrene base) methyl (meth) acrylate (methyl (meth) acrylate), ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxy butyl (meth) acrylate , Benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate, etc.; unsaturated carboxylic acid amino alkyl ester (carboxylic acid amino alkyl ester) compounds, such as (meth) 2-aminoethyl acrylate, 2-dimethylaminoethyl (meth)acrylate, etc.; vinyl carboxylate compounds, such as vinyl acetate, vinyl benzoate, etc.; unsaturated carboxylic acid glycidyl ester ) compounds, such as glycidyl (meth)acrylate, etc.; vinyl cyanide compounds, such as (meth)acrylonitrile, etc.; unsaturated amide compounds, such as (meth)acrylamide, etc.; These may be used alone or in admixture of two or more.

Specific examples of acrylic resins may be methacrylic acid/benzyl methacrylate copolymer, methacrylic acid/benzyl methacrylate/styrene copolymer, methacrylic acid/benzyl methacrylate/methacrylic acid 2-hydroxyethyl methacrylate copolymer, methacrylic acid/benzyl methacrylate/styrene/2-hydroxyethyl methacrylate copolymer, etc., but not limited to these. These may be used alone or in admixture of two or more.

The weight average molecular weight of the acrylic resin is about 3,000 g/mole to about 150,000 g/mole, such as about 5,000 g/mole to about 50,000 g/mole or about 7,000 g/mole to about 30,000 g/mole. When the weight average molecular weight of the acryl resin is within the range, the light blocking layer composition may have excellent physical and chemical properties.

The acid value of the acrylic resin may be about 15 mgKOH/g to about 150 mgKOH/g, for example about 80 mgKOH/g to about 130 mgKOH/g. When the acid value of the acrylic resin is within the range, the pixel pattern may have excellent resolution.

When the cationic cyclic adhesive resin is mixed with the acryl adhesive resin, the (weight) ratio of the cationic cyclic adhesive resin to the acryl adhesive resin in the first composition may be about 99:1 to About 50:50.

In some embodiments, the mixture of cationic and acrylic binding resins may comprise about 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62 , 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87 , 88, 89, 90, 91, 92, 93, 94, 95, 96, 97, 98 or 99% by weight of the cationic ring-based binder resin. In addition, according to some embodiments of the present invention, the amount of the cationic binding resin may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

In some embodiments, the mixture of cationic and acrylic binding resins may comprise about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13 , 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38 , 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49 or 50% by weight of the acryl-based adhesive resin. In addition, according to some embodiments of the present invention, the amount of the acrylic adhesive resin may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

When the amount of the acrylic adhesive resin contained exceeds the amount of the cationic adhesive resin, chemical resistance and reliability may be deteriorated.

The binder resin may be included in an amount of about 1 wt % to about 30 wt %, for example, about 2 wt % to about 20 wt %, based on the total amount of the light blocking layer composition. Specifically, the anionic cyclic binder resin may be included in an amount of about 1% by weight to about 20% by weight based on the total amount of the light-shielding layer composition, and may include about Acryl-based binding resin in an amount of 1% to about 20% by weight. When the binder resin is contained within the range, excellent resolution can be achieved.

In some embodiments, the light blocking layer composition may comprise about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, The binder resin in an amount of 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29 or 30% by weight. In addition, according to some embodiments of the present invention, the amount of the binder resin may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

The reactive unsaturated compound may be a monomer or an oligomer and may be a monofunctional or polyfunctional ester of (meth)acrylic acid comprising at least one ethylenically unsaturated double bond.

The reactive unsaturated compound has an ethylenically unsaturated double bond, and thus, can cause sufficient polymerization and form a pattern having excellent heat resistance, light resistance, and chemical resistance during light exposure in a pattern forming process.

The reactive unsaturated compound may be, for example, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate , propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate ester, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, di Pentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate , Ethylene glycol monomethyl ether (meth)acrylate, trimethylol propane tri(meth)acrylate (trimethylol propane tri(meth)acrylate), tri(meth)acryloxyethyl phosphate (tris(meth)acryloyloxyethyl phosphate), novolak epoxy (meth)acrylate or combinations thereof.

Commercially available examples of reactive unsaturated compounds are as follows. Monofunctional (meth)acrylates can contain Aronix (Toagosei Chemistry Industry Co., Ltd.); KAYARAD (Nippon Kayaku Co., Ltd.); (Osaka Organic Chemical Ind., Ltd.) and the like. Examples of difunctional (meth)acrylates may include Aronix (Toa Gosei Chemical Industry Co., Ltd.), KAYARAD (Nippon Kayaku Co., Ltd.), V-335 (Osaka Organic Chemical Industry Co., Ltd.), etc. Examples of trifunctional (meth)acrylates may include Aronix (Toa Gosei Chemical Industry Co., Ltd.), KAYARAD (Nippon Kayaku Co., Ltd.), (Osaka Organic Chemical Industry Co., Ltd.), etc. These may be used alone or in admixture of two or more.

Reactive unsaturated compounds can be treated with anhydrides to improve developability.

The reactive unsaturated compound may be included in an amount of about 1 wt % to about 20 wt %, for example about 1 wt % to about 10 wt %, based on the total amount of the light blocking layer composition. When the reactive unsaturated compound is contained within the range, the reactive unsaturated compound is sufficiently cured during exposure for pattern formation to improve reliability.

In some embodiments, the light blocking layer composition may comprise about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, Reactive unsaturated compounds in an amount of 19 or 20% by weight. Furthermore, according to some embodiments of the present invention, the amount of the reactive unsaturated compound can range from about any of the aforementioned amounts to about any of the aforementioned amounts.

The photopolymerization initiator can be a photopolymerization initiator commonly used in photosensitive resin compositions, such as acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, benzoin-based compounds , oxime compounds, etc.

Examples of acetophenones can be 2,2'-diethoxyacetophenone (2,2'-diethoxy acetophenone), 2,2'-dibutoxyacetophenone, 2-hydroxy-2- 2-hydroxy-2-methylpropinophenone, p-t-butyltrichloroacetophenone, p-t-butyldichloroacetophenone, 4-chloroacetophenone, 2,2 '-Dichloro-4-phenoxyacetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one (2-methyl-1- (4-(methylthio)phenyl)-2-morpholinopropan-1-one), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc.

Examples of benzophenone compounds can be benzophenone, benzoyl benzoate (benzoyl benzoate), methyl benzoyl benzoate (methyl benzoyl benzoate), 4-phenylbenzophenone (4 -phenyl benzophenone), hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone and the like.

Examples of thioxanthone compounds can be thioxanthone, 2-methylthioxanthone (2-methylthioxanthone), isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diiso Propylthioxanthone, 2-chlorothioxanthone, etc.

Examples of the benzoin-based compound may be benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethylketal, and the like.

Examples of triazine compounds can be 2,4,6-trichloro-s-triazine (2,4,6-trichloro-s-triazine), 2-phenyl-4,6-bis(trichloromethyl )-s-triazine, 2-(3′,4′-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4′-methoxy Naphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2 -(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-s-triazine, bis(trichloromethyl) Methyl)-6-styryl-s-triazine, 2-(naphthol 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxy Naphthol 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-helianthyl-s-triazine, 2-4- Bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine and the like.

Examples of oxime compounds can be O-acyl oxime (O-acyloxime-based) compounds, 2-(O-benzoyl oxime)-1-[4-(phenylthio)phenyl]-1,2- Octandione (2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octandione), 1-(O-acetyloxime)-1-[9-ethyl-6-( 2-methylbenzoyl)-9H-carbazol-3-yl]ethanone (1-(O-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3- yl]ethanone), O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one (O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one), etc. Specific examples of O-acyl oxime compounds can be 1,2-octandione (1,2-octandione), 2-dimethylamino-2-(4-methylbenzyl)-1-(4- Lin-4-yl-phenyl)-butan-1-one (2-dimethylamino-2-(4-methylbenzyl)-l-(4-morpholin-4-yl-phenyl)-butan-1-one), 1 -(4-phenylsulfanylphenyl)-butane-1,2-dione 2-oxime-O-benzoate (1-(4-phenylsulfanyl phenyl)-butane-1,2-dione2-oxime-O -benzoate), 1-(4-phenylsulfanylphenyl)-octane-1,2-dione 2-oxime-O-benzoate (1-(4-phenylsulfanylphenyl)-octane-1,2- dione 2-oxime-O-benzoate), 1-(4-phenylthiophenyl)-octan-1-one oxime-O-acetate (1-(4-phenylsulfanyl phenyl)-octan-1-one oxime -O-acetate), 1-(4-phenylthiophenyl)-butan-1-one oxime-O-acetate (1-(4-phenylsulfanyl phenyl)-butan-1-one oxime-O-acetate ) or a combination thereof.

The photopolymerization initiator may also contain carbazole compounds, diketone compounds, sulfonium borate-based compounds, diazo compounds, imidazole compounds, biimidazole-based compounds, etc. based) compounds, etc.

The photopolymerization initiator may be used together with a photosensitizer capable of causing a chemical reaction by absorbing light and becoming excited and then transferring its energy.

Examples of the photosensitizer may be tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-3-mercapto propionate, di Pentaerythritol tetrakis-3-mercapto propionate, etc. (dipentaerythritol tetrakis-3-mercapto propionate).

The photopolymerization initiator may be included in an amount of about 0.05 wt % to about 5 wt %, for example, about 0.1 wt % to about 5 wt %, based on the total amount of the light blocking layer composition. When the photopolymerization initiator is contained within the range, excellent reliability can be secured due to sufficient curing during exposure during pattern formation.

In some embodiments, the light blocking layer composition may comprise about 0.05, 0.06, 0.07, 0.08, 0.09, 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 2, 3, 4 or A photopolymerization initiator in an amount of 5% by weight. In addition, according to some embodiments of the present invention, the amount of the photopolymerization initiator may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

The solvent is a material that is compatible with, but does not react with, pigments, binder resins, reactive unsaturated compounds, and photopolymerization initiators.

Examples of solvents may include alcohols such as methanol, ethanol, etc.; ethers such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, tetrahydrofuran, etc.; glycol ethers such as ethylene glycol monomethyl ether, ethyl Glycol monoethyl ether, etc.; Ethyl glycol acetate, such as methyl glycol acetate, ethyl glycol acetate, diethyl glycol acetate, etc.; carbitol, such as methyl ethyl carbit Alcohol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ether, diethylene glycol diethyl ether, etc.; propylene glycol alkane Ether acetates, such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, etc.; aromatic hydrocarbons, such as toluene, xylene, etc.; ketones, such as methyl ethyl ketone, cyclohexanone, 4-hydroxy- 4-methyl-2-pentanone, methyl-n-acetone, methyl-n-butanone, methyl-n-pentanone, 2-heptanone, etc.; saturated aliphatic monocarboxylic acid alkyl esters, such as ethyl acetate , n-butyl acetate, isobutyl acetate, etc.; lactate esters, such as methyl lactate, ethyl lactate, etc.; alkyl oxyacetates, such as methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate esters, etc.; alkyl alkoxyacetates, such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.; 3- Alkyl oxypropionate, such as methyl 3-oxypropionate, ethyl 3-oxypropionate, etc.; alkyl 3-alkoxypropionate, such as methyl 3-methoxypropionate, Ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, etc.; alkyl 2-oxypropionate, such as methyl 2-oxypropionate , ethyl 2-oxypropionate, propyl 2-oxypropionate, etc.; alkyl 2-alkoxypropionate, such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate Esters, ethyl 2-ethoxypropionate, methyl 2-ethoxypropionate, etc.; 2-oxy-2-methylpropionate, such as methyl 2-oxy-2-methylpropionate , ethyl 2-oxy-2-methylpropionate, etc.; alkyl monooxymonocarboxylates of alkyl 2-alkoxy-2-methylpropionate, such as 2-methoxy-2 - methyl methylpropionate, ethyl 2-ethoxy-2-methylpropionate, etc.; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyacetate ethyl ester, 2-hydroxy-3-methylmethyl butyrate, etc.; or keto esters, such as ethyl pyruvate, etc. In addition, high boiling point solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide can also be used. Amide, N-Methylpyrrolidone, Dimethylsulfoxide, Benzyl Ethyl Ether, Dihexyl Ether, Acetylacetone, Isophorone, Caproic Acid, Caprylic Acid, 1-Octanol, 1-Nonanol, Benzyl Alcohol, Benzyl Acetate Methyl ester, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenylglycol ethyl acetate, etc.

Considering miscibility and reactivity, it is preferable to use glycol ethers, such as ethylene glycol monoethyl ether, etc.; glycol alkyl ether acetates, such as ethyl glycol acetate ethyl ether, etc.; esters, such as 2-hydroxy propionate ethyl ester, etc.; carbitol, such as diethylene glycol monomethyl ether, etc.; propylene glycol alkyl ether acetate, such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, etc.

The solvent is used in a balanced amount, for example, from about 40% to about 90% by weight based on the total light blocking layer composition. When the solvent is contained within the range, the light blocking layer has an appropriate viscosity resulting in improved processability.

In some embodiments, the light blocking layer composition may comprise about 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, Solvent in an amount of 83, 84, 85, 86, 87, 88, 89 or 90% by weight. In addition, according to some embodiments of the present invention, the amount of the solvent may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

The composition of the light-shielding layer may further include additives such as malonic acid, 3-amino-1,2-propanediol, silane coupling agent, leveling agent, fluorine surfactant, radical polymerization initiator or a combination thereof.

The silane coupling agent may have reactive substituents such as vinyl, carboxyl, methacryloxy, isocyanate, epoxy, etc., to improve the close contact with the substrate.

Examples of silane coupling agents may include trimethoxysilyl benzoic acid (trimethoxysilyl benzoic acid), γ-methacryloxypropyl trimethoxysilane (γ-methacryloxypropyl trimethoxysilane), vinyltriacetoxysilane ( vinyl triacetoxysilane), vinyl trimethoxysilane (vinyl trimethoxysilane), γ-isocyanate propyl triethoxysilane (γ-isocyanate propyl triethoxysilane), γ-glycidoxypropyltrimethoxysilane (γ-glycidoxypropyltrimethoxysilane) , β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane (β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane), etc. These may be used alone or in admixture of two or more.

The silane-based coupling agent may be included in an amount of about 0.01 parts by weight to 10 parts by weight based on 100 parts by weight of the light-shielding layer composition.

In addition, the light blocking layer composition may further contain a surfactant such as a fluorine-based surfactant to improve coating characteristics and prevent defects when necessary.

Examples of fluorine-based surfactants can be commercial fluorine-based surfactants such as and (BM Chemie Inc.); MEGAFACE F f f and F Dainippon Ink Kagaku Kogyo Co., Ltd.); FULORAD FULORAD FULORAD and FULORAD (Sumitomo 3M Co., Ltd.); SURFLON SURFLON SURFLON SURFLON and SURFLON (Asahi Glass Co., Ltd.); and as well as etc. (Toray Silicone Co., Ltd.).

The surfactant may be used in an amount of about 0.001 parts by weight to 5 parts by weight based on 100 parts by weight of the light-blocking layer composition.

In addition, other additives such as antioxidants, stabilizers, etc. may be contained in predetermined amounts unless these may deteriorate the properties of the light-shielding layer composition.

The transparent layer composition may include an adhesive resin, a reactive unsaturated compound, a photopolymerization initiator, and a solvent.

The clear layer composition achieves spacers and steps but not necessarily high optical density, and therefore contains no organic black pigments. In other words, the transparent layer composition may contain a binder resin, a reactive unsaturated compound, a photopolymerization initiator, and a solvent, or, if necessary, an organic black pigment. In addition, the transparent layer composition may further contain the additives described for the light blocking layer composition.

Components consisting of an adhesive resin, a reactive unsaturated compound, a photopolymerization initiator, an organic black pigment, and a solvent contained in the transparent layer composition are the same as those described in the light-shielding layer composition.

The binder resin included in the transparent layer composition may be included in an amount of about 3 wt % to about 70 wt %, for example, about 3 wt % to about 60 wt %, based on the total amount of the transparent layer composition. When the binder resin is contained within the range, excellent resolution can be obtained.

In some embodiments, the clear layer composition may comprise about 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21 , 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46 , 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69 or 70% by weight amount of binding resin. In addition, according to some embodiments of the present invention, the amount of the binder resin may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

The reactive unsaturated compound contained in the transparent layer composition may be contained in an amount of about 2 wt % to about 40 wt %, for example, about 3 wt % to about 30 wt %, based on the total amount of the transparent layer composition. When the reactive unsaturated compound is contained within the range, the transparent layer composition is sufficiently cured during exposure in the pattern forming process, ensuring excellent reliability.

In some embodiments, the clear layer composition may comprise about 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20 , 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39 or 40% by weight of reactive unsaturated compounds . Furthermore, according to some embodiments of the present invention, the amount of the reactive unsaturated compound can range from about any of the aforementioned amounts to about any of the aforementioned amounts.

The photopolymerization initiator may be included in an amount of about 0.1 wt % to about 5 wt %, for example, about 0.2 wt % to about 5 wt %, based on the total amount of the transparent layer composition. When the photopolymerization initiator is contained within the range, the transparent layer composition is sufficiently cured during exposure in the pattern forming process, and excellent reliability is obtained.

In some embodiments, the clear layer composition may comprise a photopolymerization initiator in an amount of about 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, 2, 3, 4, or 5% by weight . In addition, according to some embodiments of the present invention, the amount of the photopolymerization initiator may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

The solvent is included in a balanced amount, for example, in an amount of about 40% by weight to about 90% by weight based on the total amount of the transparent layer composition. When the solvent is contained within the range, the transparent layer composition has an appropriate viscosity, providing excellent processability.

In some embodiments, the light blocking layer composition may comprise about 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, Solvent in an amount of 83, 84, 85, 86, 87, 88, 89 or 90% by weight. In addition, according to some embodiments of the present invention, the amount of the solvent may range from about any value of the aforementioned amount to about any value of the aforementioned amount.

The solubility of the solvent of the transparent layer composition may be lower than the solubility of the solvent of the light-shielding layer composition. For example, the solvent of the light-blocking layer composition may include PGMEA, PGME, EDM, 3-MBA, EEP, etc., and the solvent of the transparent layer composition may include PGMEA, 3-MBA, n-butyl acetate, n-pentyl acetate , n-hexyl acetate, etc., but the present invention is not limited to these.

Hereinafter, the present invention is explained in more detail with reference to Examples. However, these examples are not to be construed as limiting the scope of the invention in any sense.

(preparation of light-shielding layer and transparent layer)

Preparation Examples 1 to 3

Each of the light blocking layer composition and the transparent layer composition according to Preparation Example 1 to Preparation Example 3 was prepared by using the following components in the following compositions provided in Table 1 to Table 3 below.

Specifically, a photopolymerization initiator is dissolved in a solvent, the solution is sufficiently stirred at room temperature for 30 minutes or more, a binder resin and a reactive unsaturated compound are sequentially added thereto, and the mixture is stirred at room temperature for about 1 Hour. Subsequently, other additives are added to the stirred solution, the mixture is stirred for about 10 minutes, then the pigment is added thereto, and the resulting mixture is stirred at room temperature for greater than or equal to 2 hours. Next, the product is filtered three times to remove impurities therein to obtain a light-shielding layer composition and a transparent layer composition.

Preparation Example 1: Preparation of Light-shielding Layer Composition

(Table 1)

(unit: gram)

Preparation Example 2: Preparation of Transparent Layer Composition

(Table 2)

(unit: gram)

Preparation Example 3: Preparation of Transparent Layer Composition

(table 3)

(unit: gram)

(manufacturing light blocking layer and transparent layer)

Preparation Example 4

(1) Use spin coating method or slit coating method, roll coating method, screen printing method, use applicator, etc. to coat the light-shielding layer composition of Preparation Example 1 on the pretreated IZO substrate to a thickness of 1.5 microns , and dried by heating a hot plate at 70°C to 100°C for 1 minute to 10 minutes to remove the solvent therein.

(2) The transparent layer composition of Preparation Example 2 was coated on the dried light-shielding layer composition film using the same method as in item (1), and dried to obtain a two-layer film.

(3) A mask comprising a half-tone portion (15% to 70% light transmission) for forming a light-blocking layer pattern and a full-tone area portion (100% light transmission) for forming a transparent layer pattern is placed on the double-layer film. A mask was used to expose the front side by irradiating actinic rays of 200 nm to 500 nm using an exposure device (Ushio Inc., HB-50110AA). As a light source in radiation, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, an argon laser, etc. can be used, and X-rays, electron beams, etc. can also be used as necessary. The exposure dose can vary depending on the type of components in the composition, the mixing amount, and the film thickness during drying, but can be lower than or equal to 500 mJ/cm2 (by using a 365 nm sensor) when using a high-pressure mercury lamp.

(4) The exposed layer was developed with a 0.2% by weight potassium hydroxide (KOH) aqueous solution by using a developer (SVS Corporation, SSP-200), dissolving and removing unnecessary areas and leaving exposed areas, and thus forming a pattern.

(5) The image pattern obtained by development was heated in an oven at 230° C. for 30 minutes, and a sample including a light-shielding layer and a transparent layer formed on the light-shielding layer was produced.

Preparation Example 5

A sample was produced according to the same method as in Preparation Example 4, but using the transparent layer composition of Preparation Example 3 instead of that of Preparation Example 2.

Comparative Preparation Example 1

Samples were fabricated according to the same method as in Preparation Example 4, except that the light-blocking layer composition of Preparation Example 1 was coated to a thickness of 3.0 μm, and the transparent layer composition of Preparation Example 2 was not used.

Evaluation 1: Evaluation of Optical Density (Optical Depth: OD)

The light-shielding layer composition prepared in Preparation Example 1 and the transparent layer composition prepared in Preparation Example 2 and Preparation Example 3 were respectively used with a spin coater (Mikasa Co., Ltd., Opticoat MS-A150) Each 10 cm × 10 cm IZO substrate was coated to a thickness of 1.5 μm, soft-baked (or pre-baked) on a hot plate at 80 ° C for 150 seconds, and exposed by using an exposure device (Ushio Electric Co., Ltd., HB -50110AA) and a light mask with a 50 mJ exposure. Subsequently, the obtained organic coatings (SVS Company, SSP-200) were developed in 0.2% by weight potassium hydroxide (KOH) aqueous solution for 150 seconds, and hard-baked (or post-baked) in an oven at 230 ° C for 30 minutes to obtain each patterned sample. The optical density of the samples was measured and is shown in Table 4 below.

(Table 4)

Preparation Example 1 Preparation Example 2 Preparation example 3 Optical Density (OD) 2.2 0 0.3

Assessment 2: Solvent Resistance

The samples according to Preparation Example 4, Preparation Example 5 and Comparative Preparation Example 1 were cut into a size of 1 cm × 1 cm, placed in a glass bottle containing 5 milliliters of NMP, left standing in an oven at 100° C. for 15 minutes, and checked whether decolorization and the results are shown in Table 5 below.

decolorization measurement

X: No discoloration when inspected with the naked eye

O: Highly discolored when inspected with the naked eye

(table 5)

Preparation Example 4 Preparation Example 5 Comparative Preparation Example 1 bleaching x x o

Referring to Table 5, Preparation Example 4 and Preparation Example 5 showed excellent solvent resistance compared with Comparative Preparation Example 1, and had no discoloration.

While the invention has been described in connection with what are presently considered to be practicable exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but on the contrary, the invention is intended to encompass the spirit and scope of the appended claims Various modifications and equivalent arrangements within . Therefore, the above-mentioned embodiments should be understood as exemplary but not restrictive of the present invention in any way.

Claims (16)

1. a liquid crystal display, including:

Thin film transistor (TFT), is positioned in lower substrate；

Multiple colored filters, are positioned on described thin film transistor (TFT) and orientation is to be spaced apart from each other；

Insulating barrier, is positioned on the plurality of colored filter；

Light blocking layer, is positioned on described insulating barrier；

Clear layer, is positioned on described light blocking layer and has convex surface；

Upper substrate, in the face of described lower substrate；And

Liquid crystal layer, inserts between described lower substrate and described upper substrate,

Wherein said light blocking layer comprises organic black pigments, and

The shape of the described clear layer with described convex surface is different from the shape of described light blocking layer.

Liquid crystal display the most according to claim 1, wherein said organic black pigments includes being represented by formula 1 below Compound:

Wherein, in above-mentioned chemical formula 1,

R¹¹To R²⁰It is hydrogen or C1 to the C10 alkyl being substituted or being unsubstituted independently.

Liquid crystal display the most according to claim 1, the described clear layer wherein with described convex surface covers described light blocking layer All or part of of front surface.

Liquid crystal display the most according to claim 1, wherein said clear layer includes main clear layer and assists transparent Layer.

Liquid crystal display the most according to claim 4, the thickness of wherein said main clear layer is than described auxiliary clear layer Thickness is thick.

Liquid crystal display the most according to claim 4, wherein said main clear layer support described upper substrate with described under Gap between portion's substrate.

Liquid crystal display the most according to claim 1, the pixel being additionally included between described insulating barrier and described light blocking layer electricity Pole.

Liquid crystal display the most according to claim 1, also includes inserting being total between described upper substrate and described liquid crystal layer Use electrode.

Liquid crystal display the most according to claim 1, also includes the common electrode directly in described lower substrate.

Liquid crystal display the most according to claim 1, the optical density of wherein said light blocking layer is than the optical density of described clear layer Big 1.0 or greatly more than 1.0.

11. liquid crystal displays according to claim 1, wherein said light blocking layer and described clear layer are by following manufacture:

It is coated with light blocking layer constituent and makes described light blocking layer constituent be dried,

Dry described light blocking layer constituent is coated with clear layer constituent and makes described clear layer constituent be dried, and

Light blocking layer constituent described in simultaneous exposure and development and described clear layer constituent.

12. liquid crystal displays according to claim 11, wherein said light blocking layer constituent includes binder resin, reactivity Unsaturated compound, photopolymerization initiator, described organic black pigments and solvent.

13. liquid crystal displays according to claim 12, wherein said light blocking layer constituent includes that 1 weight % is to 30 weight Binder resin described in %；1 weight % is to unsaturated compound reactive described in 20 weight %；0.05 weight % is to described in 5 weight % Photopolymerization initiator；1 weight % is to organic black pigments described in 30 weight % and the described solvent of aequum.

14. liquid crystal displays according to claim 11, wherein said clear layer constituent includes binder resin, reactivity Unsaturated compound, photopolymerization initiator and solvent.

15. liquid crystal displays according to claim 14, wherein said clear layer constituent also includes black pigment.

16. liquid crystal displays according to claim 14, wherein said clear layer constituent includes that 3 weight % are to 70 weight Binder resin described in %；2 weight % are to unsaturated compound reactive described in 40 weight %；0.1 weight % is to light described in 5 weight % Polymerization initiators；And the described solvent of aequum.