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TW200948994A - Sputtering bracket and sputtering device using the same - Google Patents

Sputtering bracket and sputtering device using the same Download PDF

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Publication number
TW200948994A
TW200948994A TW97120083A TW97120083A TW200948994A TW 200948994 A TW200948994 A TW 200948994A TW 97120083 A TW97120083 A TW 97120083A TW 97120083 A TW97120083 A TW 97120083A TW 200948994 A TW200948994 A TW 200948994A
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Taiwan
Prior art keywords
substrate
guide groove
bracket
rotating shaft
holes
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TW97120083A
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Chinese (zh)
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TWI411697B (en
Inventor
Shih-Che Chien
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Hon Hai Prec Ind Co Ltd
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Priority to TW97120083A priority Critical patent/TWI411697B/en
Publication of TW200948994A publication Critical patent/TW200948994A/en
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Publication of TWI411697B publication Critical patent/TWI411697B/en

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Abstract

A sputtering bracket includes a main body, at least one substrate clamp and a turnover controlling device. The main body includes a rotation axis. The main body can rotate around the rotation axis. The main body includes a plurality of through holes defined therein. Each substrate clamp is fixed in each through hole correspondingly. The substrate clamp is connected to the main body by an axis. Each axis of the substrate clamp has a turnover guiding groove. The turnover controlling device includes at least one turnover pole and a controlling unit. The controlling unit is configured for controlling the turnover pole moving close to the turnover groove of the substrate clamp. When the main body is rotating around the rotation axis, the turnover pole will make the substrate clamp turn over by the guiding of the turnover groove. The present invention also provides a sputtering device using the sputtering bracket.

Description

200948994 1 九、發明說明: -【發明所屬之技術領域】 本發明涉及一種鍍膜裝置,尤其涉及一種鍍膜支架及 鍍膜機。 【先前技術】 通常,照相機、數位相機、照相手機鏡頭模組等光學 產品之各種光學鏡片(Lens)、滤光片等光學元件,因為要避 免入射光於經過每個元件時,部分入射光反射而導致之光 ❹能損耗’需要於每一個光學鏡片之兩面鍍抗反射膜,或是 於濾光片之一面鍍上可濾掉某區段光之薄膜(如紅外遽光 片’紫外濾光片)’而於另一面鍍上抗反射膜,通過這些光 學薄膜以增加光學元件之抗反射性能,防止光能損耗。 該光學薄膜之鍍膜方式多以熱蒸鍍或濺鍍方式進行。 當光學元件兩面都需鐘上光學薄膜時,其鑛膜過程中通常 包括:抽真空、加熱、一面鍍膜、冷卻、破真空、手動翻 ❹轉光學元件夾具、抽真空、加熱、另一面鍍膜、冷卻、破 真空、取出光學元件等步驟(參見蘇成彬等人發表於 年第2期之《儀錶技術與感測器》上之《空心圓柱面鍍膜 用旋轉支架》一文,介紹了一種用於圓柱形光學零件之铲 膜用支架及其使用方法)。該鍍膜過程中包括兩次抽真空二 加熱、鍍膜、冷卻以及破真空過程,占去相當多之製:時 間,所以如何避免該過程之重複進行,降低製程之時間, 對於兩面鍍膜之元件量產來講是極為重要之課題。曰 【發明内容】 6 200948994 有鑑於此,提供一種用於鍍膜設備令,可實現對鑛膜 '基片夾具自動翻面之鍍膜支架及鍍膜機實為必要。 一種鍍膜支架,其包括:一個支架本體,該支架本體 具有一中心轉軸,該支架本體可繞該中心轉軸旋轉,該支 架本體上設置有複數容置通孔;至少一基片夾具,該每個 基片夾具對應設置於每個容置通孔中,該基片夾具和該支 架本體之間通過轉轴連接,該每個基片夾具相連之轉軸處 设有一翻面導向槽;及一個翻面控制裝置,該翻面控制裝 置包括至少一翻面桿及一控制元件,該控制元件用於控制 該翻面桿移動至與該基片夾具之翻面導向槽接近之位置, 以使該支架本體繞該中心轉軸旋轉時,該翻面桿於該翻面 導向槽之導引下,帶動該基片夾具翻面。 一種鍍膜機,其包括:一個真空容器;設置於所述真 空容器内之至少一個靶;及與靶相對設置之鍍膜支架,該 鍍膜支架包括:一個支架本體,該支架本體具有一中心轉 ❹軸,該支架本體可繞該中心轉轴旋轉,該支架本體上設置 有複數個容置通孔;至少一基片夾具,該每個基片夾具對 應設置於每個容置通孔中,該基片夾具和該支架本體之間 通過轉軸連接,該每個基片夾具相連之轉軸處設有一翻面 導向槽;及一個翻面控制装置,該翻面控制裝置包括至少 一翻面桿及一控制元件,該控制元件用於控制該翻面桿移 動至亥基片夾具之翻面導向槽接近之位置,以使該支架 本體繞該中心轉軸旋轉時,該翻面桿在該翻面導向槽之導 引下’帶動該基片夾具翻面。 7 200948994 #目較於先刚技術’該鍍臈支架及鍍膜機可實現對鑛膜 基片夾/、自動翻面,可省去兩次抽真空、破真空之時間, 從而大量節省製程時間之優點。 【實施方式】 下面將結合附圖,對本發明作進一步之詳細說明。 如圖1所示,其為本發明實施例提供之鍍膜支架100。 該鑛膜支架100包括:一支架本體11〇、複數基片爽具12〇 及自翻面控制裝置130,該翻面控制裝置㈣用於控制該 V基片夾具120翻轉。 該支架本體110用導熱性能良好之金屬製成,其形狀 呈半圓球面狀,其材料可為銅、鋁或不銹鋼等金屬中之一 種或幾種。於本實施例中,該支架本體110為不銹鋼半圓 球。該支架本體110具有一中心轉軸101,該支架本體11〇 可繞該中心轉軸101旋轉。該支架本體110上設置有複數 容置通孔112,該複數容置通孔112之形狀為方形。當然, ❹其形狀亦可設置為扇形、圓形等形狀。該複數容置通孔ιΐ2 呈行列排布於該支架本體110上,每一行上之複數容置通 孔112位於同一條水準線上。 該每個基片夾具120對應設置於每個容置通孔U2 中。該基片夾具120採用導熱性能良好之金屬製成,其材 料可為銅、鋁或不銹鋼等金屬中之一種或幾種。當然,該 基片夾具120之材料還可為塑膠,例如:pc (聚碳酸脂) 加ABS (丙稀腈-丁二烯-苯乙烯共聚物)之合成材料,或 PC加玻璃纖維之合成材料等。該基片夾具ι20之形狀可為 8 200948994 * 扇形、圓形或方形等形狀,其原則是只要滿足可裝置於支 ' 架本體110之容置通孔112内,且翻轉時不會與支架本體 110碰撞即可。於本實施例中,該基片夾具120為方形。該 複數基片夾具120大小相同且對稱分佈於該支架本體110 上。 該每個基片夾具120設置有至少一個通孔122,用以收 容待鍍膜工件並暴露該待鍍膜工件之兩相對之待鍍表面。 該待鍍膜工件為玻璃鏡片或塑膠鏡片等。 ® 請一併參閱圖2,該每個基片夾具120和該支架本體 110之間通過轉軸124連接。本實施例中,轉軸124設於基 片夾具120之軸線位置。該每個容置通孔112相對設置有 兩個凹槽(圖未示),該每個基片夾具120之轉軸124可卡 置於對應之凹槽中從而固定於該容置通孔112内。該每個 基片夾具120對應之轉軸124上設有一翻面導向槽126。該 翻面導向槽126設置於每一基片夾具120之轉軸124末端 @之外側。 該翻面導向槽126為半月形,其由一第一擋塊1261及 一第二擋塊1262共同配合形成。該第一擋塊1261為半月 形,該第二擋塊1262 —端為圓弧形一端為方形,該第二擋 塊1262設置於該第一擋塊1261之半月形内部,且圓弧形 之一端靠裏,以使該第一擋塊1261與該第二擋塊1262配 合形成該翻面導向槽126。當然,該翻面導向槽126亦可為 圓弧形、U形、馬蹄形等形狀,只要可實現導引基片夾具 120翻轉之結構即可。 9 200948994 該翻面控制裝置130包括至少一翻面桿132及一控制 ' 元件134,該控制元件134用於控制該翻面桿132下移並相 對移至該基片夾具之翻面導向槽126中,從而當該支架本 體110轉動時,該基片夾具120會隨之翻轉。該控制元件 134為電動馬達、電磁泵或磁流電動機。 該控制元件134可控制該翻面桿132下移或上升,從 而使該翻面控制裝置130處於工作狀態或者非工作狀態。 由於該鍍膜支架100於鍍膜時,該支架本體110會不停地 ® 旋轉,例如:以逆時針方向旋轉。而支架本體110逆時針 旋轉就會使得固定於其上之每個基片夾具120從左向右地 於水準方向上移動。而此翻面控制裝置130正是利用這一 現象來實現基片夾具120之翻轉。 請一併參閱圖2至圖5,其為本發明實施例所提供之鍍 膜支架100之其中一個基片夾具120於翻轉時之一系列立 體示意圖。每一個圖裏之基片夾具120及翻面桿132分別 0處於不同之狀態。 請參閱圖2,其為該基片夾具120於未開始翻轉時之狀 態。由於該支架本體110逆時針旋轉會使得該基片夾具120 相對地從左向右移動。因此,該翻面桿132會相對地移動 到翻面導向槽126内,如圖3所示。 該翻面導向槽126之第一擋塊1261為半月形,其内侧 為圓弧狀。當該基片夾具120相對地移動時,由於翻面桿 132之抵觸,會使圓弧處存於一定擠壓力,而這種擠壓力會 使得基片夾具120開始翻轉,如圖4所示。 200948994 該基片夾具120翻轉到近似90度之位置時,該翻面桿 ' 132亦相對地移動到了翻面導向槽126之最裏面。基片夾具 120於支架本體110之旋轉之帶動下繼續移動,使得翻面桿 132不會停留於翻面導向槽126裏面,而是帶動基片夾具 120翻轉,如圖5所示。 該基片夾具120已經翻轉了 180度,而翻面桿132亦 相對於基片夾具120之位置正要離開翻面導向槽126。從而 該基片夾具120實現了自動翻面功能,而同一水平方向上 ® 之下一個經過此翻面桿132之基片夾具將會移動到翻面桿 132之位置,從而實現對另一個基片夾具進行翻面。 每一排基片夾具120都可相應設置一個翻面桿132,從 而由一個翻面桿132來帶動此一排之基片夾具120翻面。 於本實施例中,該支架本體110上設置有兩排基片夾具 120,而該翻面桿132亦相應地設置有兩個,從而實現對兩 排之基片夾具120進行翻面。 ^ 當所有之基片夾具120都翻面結束後,則可設定讓支 架本體110暫停轉動,並使用該控制元件134將該翻面桿 132向上提起,從而遠離該基片夾具120。然後,再啟動鍍 膜裝置,對待鍍膜工件進行另一面之鍍膜。 本發明還提供一個使用上述鍍膜支架100之鍍膜機(圖 未示)包括:一個真空容器(圖未示);設置於該真空容器 内之至少一個靶(圖未示);及與靶相對設置之鍍膜支架 100 ° 該鍍膜機於使用時,首先對待鍍膜基片進行一面鍍 11 200948994 ,膜,當一面鍍完後,只需使用該鍍膜支架100上之翻面押 制裝置130控制每一基片夾具12〇翻轉18〇度後,即可對 另一面進行鍍臈。由於翻面控制裝置13〇可採用電控或遙 控之裝置來控制其動作,故此基片夾具12〇之翻面動作可 自動進行。 相較於先前技術,該鍍膜支架及鍍膜機可實現對鍍臈 基片夾具自動翻面,可省去兩次抽真空、破真空之時間, 從而大量節省製程時間之優點。 ❹ 綜上所述,本發明確已符合發明專利之要件,遂依法 提出專利申請。惟,以上所述者僅為本發明之較佳實施方 式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案 技藝之人士援依本發明之精神所作之等效修飾或變化,皆 應涵蓋於以下申請專利範圍内。 【圖式簡單說明】 圖1係本發明實施例提供之鑛膜支架之立體示意圖。 〇圖2至圖5係圖1中之鍍膜支架之基片夹具於翻轉時位於 不同角度之立體示意圖。 【主要元件符號說明】 鍍膜支架 100 支架本體 110 基片夾具 120 翻面控制裝置 130 中心轉軸 101 容置通孔 112 12 200948994 通孔 122 轉軸 124 導向槽 126 第一擔塊 1261 第二擋塊 1262 翻面桿 132 控制元件 134200948994 1 IX. Description of the invention: - [Technical field to which the invention pertains] The present invention relates to a coating apparatus, and more particularly to a coating stent and a coating machine. [Prior Art] Generally, various optical lenses (Lens), filters, and the like of optical products such as cameras, digital cameras, and camera lens modules are required to prevent incident light from being reflected by incident light. The resulting diaphragm can be worn out. It is necessary to plate the anti-reflection film on both sides of each optical lens, or to coat one side of the filter with a film that can filter out a certain section of light (such as an infrared fluorescent film 'UV filter'). The film is coated with an anti-reflection film on the other side, and these optical films are used to increase the anti-reflection performance of the optical element and prevent loss of light energy. The coating method of the optical film is usually carried out by thermal evaporation or sputtering. When optical films are required on both sides of the optical element, the process of depositing the film usually includes: vacuuming, heating, coating, cooling, vacuum breaking, manual turning, optical component fixture, vacuuming, heating, coating on the other side, Cooling, vacuum breaking, removal of optical components, etc. (see Su Chengbin et al., "Instrument Technology and Sensors," in the second issue of "Instrument Technology and Sensors", "Rolling Brackets for Hollow Cylindrical Coatings", describes a type for cylinders. The bracket for the shovel film of the optical component and the method of using the same). The coating process includes two vacuuming, two heating, coating, cooling and vacuum breaking processes, which take up a considerable amount of time: so how to avoid the repetition of the process and reduce the time of the process, mass production of the components coated on both sides It is an extremely important issue.曰 【Contents】 6 200948994 In view of this, it is necessary to provide a coating device for the coating film holder and coating machine for the automatic turning of the mineral film substrate. A coated stent comprises: a bracket body having a central rotating shaft, the bracket body is rotatable about the central rotating shaft, the bracket body is provided with a plurality of receiving through holes; at least one substrate clamp, each of the a substrate holder correspondingly disposed in each of the receiving through holes, the substrate holder and the bracket body being connected by a rotating shaft, wherein each of the substrate holders is connected with a turning guide groove at a rotating shaft; and a turning surface a control device, the flip control device comprising at least one flip lever and a control element for controlling the flip lever to move to a position close to the flip guide groove of the substrate holder, so that the bracket body When the rotation of the center shaft is rotated, the flip lever is guided by the turning guide groove to drive the substrate fixture to turn over. A coating machine comprising: a vacuum container; at least one target disposed in the vacuum container; and a coating bracket disposed opposite the target, the coating bracket comprising: a bracket body having a central turning axis The holder body is rotatable about the central rotating shaft, and the bracket body is provided with a plurality of receiving through holes; at least one substrate holder, wherein each of the substrate holders is correspondingly disposed in each of the receiving through holes, the base The sheet clamp and the bracket body are connected by a rotating shaft, wherein each of the substrate clamps is connected with a turning guide groove at a rotating shaft; and a turning surface control device comprising at least one turning rod and a control An element for controlling movement of the flip lever to a position where the flip guide groove of the Hei chip holder approaches, so that the flip lever is in the flip guide groove when the bracket body rotates around the center shaft Guided to 'turn the substrate fixture to turn over. 7 200948994 #目比先刚技术' The rhodium-plated stent and coating machine can realize the automatic rewinding of the membrane substrate, and can save the time of vacuuming and vacuuming twice, thus saving a lot of process time. advantage. [Embodiment] Hereinafter, the present invention will be further described in detail with reference to the accompanying drawings. As shown in FIG. 1 , it is a coated stent 100 provided by an embodiment of the present invention. The film stent 100 includes a stent body 11〇, a plurality of substrate cooling devices 12〇, and a self-turning surface control device 130. The turning surface control device (4) is for controlling the V substrate fixture 120 to be inverted. The holder body 110 is made of a metal having good thermal conductivity and has a semi-spherical shape, and the material thereof may be one or more of metals such as copper, aluminum or stainless steel. In this embodiment, the bracket body 110 is a stainless steel semi-spherical ball. The bracket body 110 has a central rotating shaft 101 about which the bracket body 11 is rotatable. The bracket body 110 is provided with a plurality of receiving through holes 112, and the plurality of receiving through holes 112 are square in shape. Of course, the shape of the crucible can also be set to a shape such as a fan shape or a circle shape. The plurality of receiving through holes ι2 are arranged in a row on the bracket body 110, and the plurality of receiving through holes 112 on each row are on the same level line. Each of the substrate holders 120 is correspondingly disposed in each of the receiving through holes U2. The substrate holder 120 is made of a metal having good thermal conductivity, and the material may be one or more of metals such as copper, aluminum or stainless steel. Of course, the material of the substrate holder 120 may also be plastic, for example, a composite material of pc (polycarbonate) plus ABS (acrylonitrile-butadiene-styrene copolymer), or a composite material of PC plus glass fiber. Wait. The shape of the substrate holder ι20 may be 8 200948994 * a shape of a fan shape, a circle shape or a square shape, and the principle is that it can be installed in the receiving through hole 112 of the support body 110 and does not overlap with the support body. 110 collision can be. In the embodiment, the substrate holder 120 is square. The plurality of substrate holders 120 are the same size and symmetrically distributed on the holder body 110. Each of the substrate holders 120 is provided with at least one through hole 122 for containing the workpiece to be coated and exposing the opposite surfaces to be plated of the workpiece to be coated. The workpiece to be coated is a glass lens or a plastic lens. ® Referring to FIG. 2 together, each of the substrate holders 120 and the holder body 110 are connected by a rotating shaft 124. In this embodiment, the rotating shaft 124 is disposed at the axial position of the substrate holder 120. Each of the receiving through holes 112 is oppositely disposed with two grooves (not shown). The rotating shaft 124 of each of the substrate holders 120 can be locked in the corresponding groove to be fixed in the receiving through hole 112. . Each of the substrate holders 120 is provided with a turning guide groove 126 corresponding to the rotating shaft 124. The turned guide groove 126 is disposed at the outer side of the end of the rotating shaft 124 of each of the substrate holders 120. The turning guide groove 126 has a half moon shape, and is formed by a first block 1261 and a second block 1262 cooperating. The first block 1261 has a half moon shape, and the second block 1262 has a circular arc end and a square end. The second block 1262 is disposed inside the half moon of the first block 1261, and has a circular arc shape. The first end of the first block 1261 and the second block 1262 cooperate to form the turning guide groove 126. Of course, the turning guide groove 126 may have a circular arc shape, a U shape, a horseshoe shape, or the like, as long as the structure for guiding the substrate clamp 120 to be reversed can be realized. 9 200948994 The flip control device 130 includes at least one flip lever 132 and a control 'element 134 for controlling the flip lever 132 to move down and relatively move to the flip guide groove 126 of the substrate holder. Therefore, when the holder body 110 is rotated, the substrate holder 120 is turned over. The control element 134 is an electric motor, an electromagnetic pump or a magnetic current motor. The control element 134 can control the flip lever 132 to move down or up, thereby causing the flip control device 130 to be in an active or inoperative state. Since the coating holder 100 is coated, the holder body 110 is continuously rotated, for example, in a counterclockwise direction. Rotating the bracket body 110 counterclockwise causes each of the substrate holders 120 fixed thereto to move from left to right in the horizontal direction. This flip control device 130 utilizes this phenomenon to effect the flipping of the substrate holder 120. Referring to FIG. 2 to FIG. 5, FIG. 2 is a schematic view showing a series of vertical bodies of one of the substrate holders 120 of the coating holder 100 according to the embodiment of the present invention. The substrate holder 120 and the flip lever 132 in each of the figures are in different states. Please refer to Fig. 2, which is the state of the substrate holder 120 when it is not turned over. Since the holder body 110 rotates counterclockwise, the substrate holder 120 is relatively moved from left to right. Therefore, the flip lever 132 is relatively moved into the flip guide groove 126 as shown in FIG. The first stopper 1261 of the turning guide groove 126 has a half moon shape and an inner side thereof has an arc shape. When the substrate jig 120 is relatively moved, due to the resistance of the flip bar 132, a certain pressing force is generated in the arc, and the pressing force causes the substrate jig 120 to start to flip, as shown in FIG. Show. 200948994 When the substrate holder 120 is flipped to a position of approximately 90 degrees, the flip lever '132 is also relatively moved to the innermost side of the flip guide groove 126. The substrate holder 120 continues to move under the rotation of the holder body 110, so that the flip lever 132 does not stay inside the flip guide groove 126, but drives the substrate holder 120 to flip, as shown in FIG. The substrate holder 120 has been flipped 180 degrees and the flip lever 132 is also about to leave the flip guide slot 126 relative to the position of the substrate holder 120. Thus, the substrate holder 120 realizes an automatic flip function, and the substrate holder passing through the flip lever 132 in the same horizontal direction will move to the position of the flip lever 132, thereby realizing the other substrate. The fixture is turned over. Each row of substrate holders 120 can be provided with a flip bar 132 correspondingly, whereby a row of substrate holders 120 are turned by a flip bar 132. In this embodiment, the bracket body 110 is provided with two rows of the substrate holders 120, and the flipping rods 132 are correspondingly disposed two, thereby realizing the turning of the two rows of the substrate holders 120. ^ When all of the substrate holders 120 have been turned over, the holder body 110 can be set to pause and the flip member 132 is lifted up by the control member 134 to be away from the substrate holder 120. Then, the coating device is restarted, and the coated workpiece is coated on the other side. The present invention further provides a coating machine (not shown) using the above-mentioned coating stent 100, comprising: a vacuum container (not shown); at least one target (not shown) disposed in the vacuum container; and opposite to the target Coating stent 100 ° When the coating machine is used, the coated substrate is first plated 11 200948994, and after one side is plated, only the flipping device 130 on the coating holder 100 is used to control each base. After the sheet holder 12 is turned over 18 degrees, the other side can be plated. Since the flip control device 13 can be controlled by an electronically controlled or remotely controlled device, the flipping action of the substrate holder 12 can be automatically performed. Compared with the prior art, the coating holder and the coating machine can automatically flip the surface of the rhodium-plated substrate fixture, thereby eliminating the time of vacuuming and vacuuming, thereby greatly saving the advantages of the processing time.综 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application in accordance with the law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the present invention are intended to be included within the scope of the following claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic perspective view of a mineral film stent provided by an embodiment of the present invention. 2 to 5 are perspective views of the substrate holder of the coated stent of Fig. 1 at different angles when flipped. [Main component symbol description] Coated holder 100 Bracket body 110 Substrate clamp 120 Flip control device 130 Center shaft 101 Recepting through hole 112 12 200948994 Through hole 122 Rotary shaft 124 Guide groove 126 First load block 1261 Second stop 1262 Face bar 132 control element 134

1313

Claims (1)

200948994 十、申請專利範圍: • 1. 一種鍍膜支架,其包括: 一個支架本體’該支架本體具有一中心轉轴,該支架本體 可繞該中心轉轴旋轉,該支架本體上設置有複數個容置通 孔; 至少一基片夾具,該每個基片夾具對應設置於每個容置通 孔中’該基片夾具和該支架本體之間通過轉轴連接,該每 個基片夹具相連之轉軸處設有一翻面導向槽;及 ® 一個翻面控制裝置,該翻面控制裝置包括至少一翻面桿及 控制元件,該控制元件用於控制該翻面桿移動至與該基 片夾具之翻面導向槽接近之位置,以使該支架本體繞該中 心轉軸旋轉時,該翻面桿在該翻面導向槽之導引下,帶動 該基片夾具翻面。 2.如申請專利範圍第i項所述之鍍膜支架,其中,該翻面 導向槽設置於每一基片夾具之轉軸末端之外侧。 ❹3.如申請專利範圍第丄項所述之鍍膜支架,其中,該翻面 導向槽為圓弧形,由一第一擋塊及一第二檔塊共同配合形 成。 4·如申請專利範圍第3項所述之鍍膜支架,其中,該第一 擋塊為半月形,該第二擋塊一端為圓弧形一端為方形,該 第一擋塊設置於該第一擋塊之半月形内部,且圓弧形之一 端靠襄,以使該第一擋塊與該第二擋塊配合形成該翻面 向槽。 5.如申請專利範圍第丄項所述之鍍膜支架,其中,該支架 200948994 .本體為半圓球面狀,該複數個容置通孔呈行列排布於該支 ’、 ’母一行上之複數個容置通孔位於同一條水平線 上。 6.如申請專利範圍第1項所述之鍵膜支架,其中,該複數 個基片失具大小相同且對稱分佈於該支架本體上。 7·如申請專利範圍第1項所述之鍍膜支架,其中,該控制 兀件為電動馬達、電磁泵或磁流電動機。 ❾8·如申請專利範圍第1項所述之鍍膜支架,其中,該基片 夾具具有複數個通孔,用於容置待鍍膜工件。 9·如申請專利範圍第1項所述之鍍膜支架,其中,該基片 夾具材料選自銅、鋁、不銹鋼或塑膠中之一種或幾種。 ι〇.如申請專利範圍第1項所述之鍍膜支架,其中,該支架 本體材料選自銅、鋁及不銹鋼中之一種或幾種。 n.一種鍍膜機,其包括:一個真空容器;設置於所述真空 容器内之至少一個靶;及與靶相對設置之鍍膜支架,該鍍 ❹膜支架包括: 個支架本體,該支架本體具有一中心轉軸,該支架本體 可繞該中心轉軸旋轉,該支架本體上設置有複數個容置通 孔; 至少一基片夾具,該每個基片夾具對應設置於每個容置通 孔中,該基片夾具和該支架本體之間通過轉軸連接,該每 個基片夾具相連之轉軸處設有一翻面導向槽;及 一個翻面控制裝置,該翻面控制裝置包括至少一翻面桿及 一控制元件,該控制元件用於控制該翻面桿移動至與該基 15 200948994 片夾具之翻面導向槽接近之位置,以使該支架本體繞該中 Q轉轴旋轉時,該翻面桿在該翻面導向槽之導引下,帶動 5亥基片夹具翻面。 12. 如申請專利範圍第n項所述之鍍膜機,其中,該翻面導 向槽設置於每一基片夾具之轉軸末端之外侧。 13. 如申請專利範圍第11項所述之鍍膜機,其中,該翻面導 向槽為圓弧形’由-第-擋塊及—第二擋塊共同配合形成。200948994 X. Patent application scope: 1. A coated stent comprising: a bracket body having a central rotating shaft, the bracket body is rotatable about the central rotating shaft, and the bracket body is provided with a plurality of capacities a through hole; at least one substrate holder, each of the substrate holders correspondingly disposed in each of the receiving through holes. The substrate holder and the holder body are connected by a rotating shaft, and each of the substrate holders is connected a turning guide groove is provided at the rotating shaft; and a flip control device includes at least one flipping lever and a control element for controlling movement of the flip lever to the substrate fixture When the turning guide groove is close to the position, so that the bracket body rotates around the central rotating shaft, the turning rod is guided by the turning guiding groove to drive the substrate clamp to turn over. 2. The coated stent of claim i, wherein the turned guide groove is disposed on an outer side of the end of the shaft of each of the substrate holders. The coated stent according to claim 2, wherein the turned guide groove has a circular arc shape and is formed by a first stopper and a second stopper. 4. The coated stent of claim 3, wherein the first stopper is a half moon shape, the second stopper has a circular arc end and a square end, and the first stopper is disposed at the first The half moon-shaped inner portion of the stopper, and one end of the circular arc shape is abutted so that the first stopper and the second stopper cooperate to form the turn-facing groove. 5. The coated stent of claim 2, wherein the bracket 200948994 has a semi-spherical shape, and the plurality of receiving through holes are arranged in a plurality of rows on the branch and the female row. The through holes are located on the same horizontal line. 6. The key film holder of claim 1, wherein the plurality of substrates are the same size and symmetrically distributed on the body of the holder. 7. The coated stent of claim 1, wherein the control member is an electric motor, an electromagnetic pump or a magnetic current motor. The coated stent of claim 1, wherein the substrate holder has a plurality of through holes for receiving the workpiece to be coated. 9. The coated stent of claim 1, wherein the substrate holder material is selected from one or more of the group consisting of copper, aluminum, stainless steel, or plastic. The coated stent of claim 1, wherein the stent body material is selected from one or more of copper, aluminum, and stainless steel. a coating machine comprising: a vacuum container; at least one target disposed in the vacuum container; and a coating bracket disposed opposite the target, the ruthenium-plated stent comprises: a bracket body, the bracket body having a a central rotating shaft, the bracket body is rotatable about the central rotating shaft, the bracket body is provided with a plurality of receiving through holes; at least one substrate clamp, each of the substrate holding fixtures is correspondingly disposed in each of the receiving through holes, The substrate holder and the bracket body are connected by a rotating shaft, wherein each of the substrate clamps is connected with a turning guide groove at a rotating shaft; and a turning surface control device comprising at least one turning rod and a a control element for controlling movement of the flip lever to a position close to the flip guide groove of the base member of the 200948994 clip, such that the flip lever is rotated when the bracket body is rotated about the middle Q pivot Under the guidance of the turning guide groove, the 5 liter substrate clamp is turned over. 12. The coater of claim n, wherein the flip guide groove is disposed on an outer side of the end of the shaft of each of the substrate holders. 13. The coating machine of claim 11, wherein the turned guide groove is formed in a circular arc shape by a --block and a second block. 14. 如申請專利範圍第13項所述之鍍膜機,其中,該第一擋 塊為半月形,該第二檔塊一端為圓弧形一端為方形,該第 =塊設置於該第-播塊之半月形内部,且圓弧形之一端 靠裏,以使該第一擋塊與該第二擋塊配合形成該翻面導向 15.如申請專利範圍第u項所述之鍍膜機,其中,該支架本 =為半圓:求面狀’該複數個容置通孔呈行列排布於該:架 體上,每一行上之複數個容置通孔位於同一條水平線上。 ❹16.如申請專利範圍帛u項所述之鍵膜機,其中,該複數個 土片夾具大小相同且對稱分佈於該支架本體上。 申請專利_第11項所述之制機,其中,該控制元 為電動馬達、電磁泵或磁流電動機。 目如申請專利範圍帛項所述之鑛膜機,其中’該基片夾 有複數個通孔,用於容置待鍍膜工件。 ^、申清專利範圍第11項所述之錄膜機,其中,該基片夾 /、料選自銅、鋁、不銹鋼或塑膠中之一種或幾種。 〇·如申清專利範圍第u項所述之鍵膜機,其中,該支架本 16 200948994 ’ 體材料選自銅、鋁及不銹鋼中之一種或幾種14. The coating machine of claim 13, wherein the first block is a half moon shape, and the second block has a circular arc at one end and a square at one end, and the third block is disposed on the first broadcast. a half-moon-shaped inner portion of the block, and one end of the circular arc-shaped end, such that the first stop and the second stop cooperate to form the turning guide. The coating machine according to the invention of claim 5, wherein The bracket is = semi-circular: seeking a planar shape. The plurality of accommodating through holes are arranged in a row on the frame body, and the plurality of accommodating through holes on each row are on the same horizontal line.键16. The bonding machine of claim 1, wherein the plurality of soil clips are the same size and symmetrically distributed on the body of the bracket. The machine of claim 11, wherein the control element is an electric motor, an electromagnetic pump or a magnetic current motor. The film casting machine of claim 2, wherein the substrate has a plurality of through holes for accommodating the workpiece to be coated. The lining machine of claim 11, wherein the substrate holder is selected from one or more of copper, aluminum, stainless steel or plastic. The bonding machine described in the above-mentioned patent scope, wherein the body material is selected from one or more of copper, aluminum and stainless steel. 1717
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI480403B (en) * 2010-10-26 2015-04-11 Hon Hai Prec Ind Co Ltd Deposition device
TWI513842B (en) * 2011-11-22 2015-12-21 Hon Hai Prec Ind Co Ltd Support mechanism and vacuum coating machine using the same

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* Cited by examiner, † Cited by third party
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TWI280986B (en) * 2004-04-30 2007-05-11 Hon Hai Prec Ind Co Ltd Vacuum vapor deposition apparatus
TW200607877A (en) * 2004-08-18 2006-03-01 Hantek Technology Co Ltd Chip coating jig

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI480403B (en) * 2010-10-26 2015-04-11 Hon Hai Prec Ind Co Ltd Deposition device
TWI513842B (en) * 2011-11-22 2015-12-21 Hon Hai Prec Ind Co Ltd Support mechanism and vacuum coating machine using the same

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