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TW200604552A - Method for manufacturing magnetic sensor, magnet array used in the method, and method for manufacturing the magnet array - Google Patents

Method for manufacturing magnetic sensor, magnet array used in the method, and method for manufacturing the magnet array

Info

Publication number
TW200604552A
TW200604552A TW094107366A TW94107366A TW200604552A TW 200604552 A TW200604552 A TW 200604552A TW 094107366 A TW094107366 A TW 094107366A TW 94107366 A TW94107366 A TW 94107366A TW 200604552 A TW200604552 A TW 200604552A
Authority
TW
Taiwan
Prior art keywords
magnet array
magnetic field
magnetic sensor
manufacturing
axis
Prior art date
Application number
TW094107366A
Other languages
English (en)
Other versions
TWI293372B (en
Inventor
Toshiyuki Oohashi
Kokichi Aiso
Original Assignee
Yamaha Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamaha Corp filed Critical Yamaha Corp
Publication of TW200604552A publication Critical patent/TW200604552A/zh
Application granted granted Critical
Publication of TWI293372B publication Critical patent/TWI293372B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Hall/Mr Elements (AREA)
  • Measuring Magnetic Variables (AREA)
  • Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
TW094107366A 2004-03-12 2005-03-10 Method for manufacturing magnetic sensor, magnet array used in the method, and method for manufacturing the magnet array TWI293372B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004070927A JP4557134B2 (ja) 2004-03-12 2004-03-12 磁気センサの製造方法、同磁気センサの製造方法に使用されるマグネットアレイ及び同マグネットアレイの製造方法

Publications (2)

Publication Number Publication Date
TW200604552A true TW200604552A (en) 2006-02-01
TWI293372B TWI293372B (en) 2008-02-11

Family

ID=34824631

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094107366A TWI293372B (en) 2004-03-12 2005-03-10 Method for manufacturing magnetic sensor, magnet array used in the method, and method for manufacturing the magnet array

Country Status (7)

Country Link
US (1) US7023310B2 (zh)
EP (1) EP1574870A3 (zh)
JP (1) JP4557134B2 (zh)
KR (1) KR100627212B1 (zh)
CN (2) CN2791885Y (zh)
HK (1) HK1080605B (zh)
TW (1) TWI293372B (zh)

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CN102540112B (zh) * 2011-04-06 2014-04-16 江苏多维科技有限公司 单一芯片推挽桥式磁场传感器
CN102435963B (zh) * 2011-04-06 2014-06-04 江苏多维科技有限公司 单片双轴桥式磁场传感器
CN102226835A (zh) * 2011-04-06 2011-10-26 江苏多维科技有限公司 单一芯片双轴磁场传感器及其制备方法
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CN102790613B (zh) * 2011-05-16 2015-04-29 江苏多维科技有限公司 一种开关传感器
JP5535139B2 (ja) * 2011-06-30 2014-07-02 株式会社ヴァレオジャパン 近接センサ
JP5866956B2 (ja) * 2011-10-17 2016-02-24 株式会社デンソー 磁気センサ
CN104094368A (zh) 2012-01-30 2014-10-08 三菱电机株式会社 磁路
US9880232B2 (en) * 2012-03-14 2018-01-30 Seagate Technology Llc Magnetic sensor manufacturing
WO2015010105A1 (en) * 2013-07-19 2015-01-22 Invensense, Inc. Application specific integrated circuit with integrated magnetic sensor
US9513347B2 (en) * 2013-10-31 2016-12-06 Invensense, Inc. Device with magnetic sensors with permanent magnets
TWI633321B (zh) 2015-03-30 2018-08-21 財團法人工業技術研究院 用於磁場感測之穿隧磁阻裝置
EP3104187A1 (en) * 2015-06-09 2016-12-14 International Iberian Nanotechnology Laboratory Magnetoresistive sensor
EP3385739B1 (en) * 2015-12-03 2021-10-06 Alps Alpine Co., Ltd. Magnetic detection device
WO2018199068A1 (ja) * 2017-04-25 2018-11-01 コニカミノルタ株式会社 磁気センサー
JP6605570B2 (ja) * 2017-12-27 2019-11-13 Ｔｄｋ株式会社 磁気センサ
WO2019142634A1 (ja) * 2018-01-17 2019-07-25 アルプスアルパイン株式会社 磁気検出装置およびその製造方法
US10666251B2 (en) * 2018-02-14 2020-05-26 General Equipment And Manufacturing Company, Inc. Target magnet mechanism for proximity switch
US11215681B2 (en) * 2019-07-10 2022-01-04 Allegro Microsystems, Llc Magnetic field sensor with stray field immunity and large air gap performance
CN110568385B (zh) * 2019-08-02 2021-03-30 潍坊歌尔微电子有限公司 一种磁传感器的制造方法及磁传感器
JP7285745B2 (ja) * 2019-09-18 2023-06-02 東京エレクトロン株式会社 成膜システム、磁化特性測定装置、および成膜方法
JP7532774B2 (ja) * 2019-12-26 2024-08-14 株式会社レゾナック 磁気センサ
CN113391116B (zh) * 2021-03-17 2022-11-25 清华大学 一种用于测量母线电流的传感器阵列
CN114089232B (zh) * 2021-11-25 2022-08-09 西安电子科技大学 一种磁场传感器及磁场测量方法
CN115267623B (zh) * 2022-09-23 2023-10-20 微传智能科技（常州）有限公司 一种磁阻磁开关传感器

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Also Published As

Publication number Publication date
EP1574870A2 (en) 2005-09-14
KR100627212B1 (ko) 2006-09-25
CN100536188C (zh) 2009-09-02
EP1574870A3 (en) 2010-03-03
HK1080605B (zh) 2009-12-31
HK1080605A1 (en) 2006-04-28
JP2005260064A (ja) 2005-09-22
CN2791885Y (zh) 2006-06-28
CN1694277A (zh) 2005-11-09
JP4557134B2 (ja) 2010-10-06
KR20060043874A (ko) 2006-05-15
TWI293372B (en) 2008-02-11
US20050200449A1 (en) 2005-09-15
US7023310B2 (en) 2006-04-04

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