[go: up one dir, main page]

SG130117A1 - Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed material - Google Patents

Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed material

Info

Publication number
SG130117A1
SG130117A1 SG200605236-9A SG2006052369A SG130117A1 SG 130117 A1 SG130117 A1 SG 130117A1 SG 2006052369 A SG2006052369 A SG 2006052369A SG 130117 A1 SG130117 A1 SG 130117A1
Authority
SG
Singapore
Prior art keywords
metal
formed material
plating formed
positive
producing
Prior art date
Application number
SG200605236-9A
Other languages
English (en)
Inventor
Kouji Nishikawa
Kousuke Mori
Masaru Ohta
Shin-Ichiro Iwanaga
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of SG130117A1 publication Critical patent/SG130117A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • C08L101/02Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • C08L101/02Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/06Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
    • C08L101/08Carboxyl groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01019Potassium [K]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/102Material of the semiconductor or solid state bodies
    • H01L2924/1025Semiconducting materials
    • H01L2924/10251Elemental semiconductors, i.e. Group IV
    • H01L2924/10253Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12042LASER
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200605236-9A 2005-08-03 2006-08-03 Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed material SG130117A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005225969 2005-08-03

Publications (1)

Publication Number Publication Date
SG130117A1 true SG130117A1 (en) 2007-03-20

Family

ID=37441562

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200605236-9A SG130117A1 (en) 2005-08-03 2006-08-03 Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed material

Country Status (6)

Country Link
US (2) US20070031758A1 (ko)
EP (1) EP1750176A3 (ko)
KR (1) KR101266564B1 (ko)
CN (1) CN1908816B (ko)
SG (1) SG130117A1 (ko)
TW (1) TW200722924A (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1826612A1 (en) * 2006-02-22 2007-08-29 JSR Corporation Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings
JP5276264B2 (ja) * 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
JP5258237B2 (ja) * 2006-09-14 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、平版印刷版の製造方法、及び平版印刷版
JP5216573B2 (ja) * 2008-03-31 2013-06-19 富士フイルム株式会社 感活性光線または感放射線性樹脂組成物及びそれを用いたパターン形成方法
EP2472321A1 (en) 2010-12-31 2012-07-04 Rohm and Haas Electronic Materials LLC Method of preparing photoacid-generating monomer
EP2472323A3 (en) * 2010-12-31 2013-01-16 Rohm and Haas Electronic Materials LLC Polymerizable photoacid generators
US20130125968A1 (en) * 2011-11-18 2013-05-23 Sunpreme, Ltd. Low-cost solar cell metallization over tco and methods of their fabrication
KR102115817B1 (ko) * 2013-01-16 2020-05-27 제이에스알 가부시끼가이샤 경화막 형성용 열경화성 수지 조성물, 네가티브형 감방사선성 수지 조성물, 포지티브형 감방사선성 수지 조성물, 경화막, 그의 형성 방법, 반도체 소자 및 표시 소자
SG11202009505XA (en) * 2018-03-27 2020-10-29 Tokyo Ohka Kogyo Co Ltd Method for manufacturing plated molded article
CN120188109A (zh) * 2022-11-15 2025-06-20 默克专利有限公司 厚膜化学增幅正型抗蚀剂组合物及使用其的制造抗蚀剂膜的方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6452139A (en) * 1987-05-18 1989-02-28 Konishiroku Photo Ind Photosensitive composition
JPH10209210A (ja) * 1997-01-20 1998-08-07 Sharp Corp 半導体装置及びその製造方法並びにその検査方法
US6120972A (en) * 1997-09-02 2000-09-19 Jsr Corporation Radiation-sensitive resin composition
EP1811825A1 (en) * 1998-02-26 2007-07-25 Ibiden Co., Ltd. Multilayer printed wiring board with filled viaholes
JP3941268B2 (ja) * 1998-11-10 2007-07-04 Jsr株式会社 感放射線性樹脂組成物
JP3961139B2 (ja) * 1998-12-24 2007-08-22 富士フイルム株式会社 ポジ型感光性組成物
KR100362937B1 (ko) * 1998-12-31 2003-10-04 주식회사 하이닉스반도체 신규의포토레지스트가교제,이를포함하는포토레지스트중합체및포토레지스트조성물
JP4150834B2 (ja) 1999-03-04 2008-09-17 Jsr株式会社 感光性樹脂組成物、感光性樹脂膜およびこれらを用いたバンプ形成方法
JP4019403B2 (ja) * 1999-03-08 2007-12-12 Jsr株式会社 レジストパターンの形成方法
US20040151886A1 (en) * 2000-03-06 2004-08-05 Bobsein Barrett Richard Binder composition
JP4370668B2 (ja) 2000-03-29 2009-11-25 Jsr株式会社 メッキ造形物製造用ポジ型感放射線性樹脂組成物およびメッキ造形物の製造方法
JP4403627B2 (ja) 2000-03-29 2010-01-27 Jsr株式会社 ポジ型感放射線性樹脂組成物およびメッキ造形物の製造方法
JP3712047B2 (ja) * 2000-08-14 2005-11-02 信越化学工業株式会社 レジスト材料及びパターン形成方法
EP1182506B1 (en) * 2000-08-21 2010-10-27 Tokyo Ohka Kogyo Co., Ltd. Crosslinked positive-working photoresist composition
JP3787271B2 (ja) * 2000-11-20 2006-06-21 東京応化工業株式会社 微細レジストホールパターン形成方法
ATE338640T1 (de) * 2001-06-11 2006-09-15 Fuji Photo Film Co Ltd Flachdruckplattenvorläufer, substrat dafür und hydrophiles oberflächenmaterial
JP2004029437A (ja) * 2002-06-26 2004-01-29 Toray Ind Inc ポジ型感放射線性組成物
JP3767552B2 (ja) * 2002-12-26 2006-04-19 Jsr株式会社 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置
WO2005091074A1 (ja) * 2004-03-24 2005-09-29 Jsr Corporation ポジ型感放射線性樹脂組成物

Also Published As

Publication number Publication date
EP1750176A3 (en) 2011-04-20
CN1908816B (zh) 2012-09-05
KR20070017000A (ko) 2007-02-08
EP1750176A2 (en) 2007-02-07
KR101266564B1 (ko) 2013-05-22
TW200722924A (en) 2007-06-16
US20070031758A1 (en) 2007-02-08
CN1908816A (zh) 2007-02-07
US20090288855A1 (en) 2009-11-26

Similar Documents

Publication Publication Date Title
SG130117A1 (en) Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed material
EP1855159A4 (en) COMPOSITION FOR THE LAYERING FILM OF RESIST AND PROCESS FOR ITS MANUFACTURE
EP1862491A4 (en) THERMOPLASTIC RESIN, MANUFACTURING METHOD AND MATERIAL
EP2045368B8 (en) Mold, process for manufacturing mold, and process for producing sheet
EP2196852A4 (en) PHOTOSENSITIVE RESIN COMPOSITION OF POSITIVE TYPE, AND METHOD OF FORMING CURED FILM USING THE SAME
EP1932884A4 (en) BIODEGRADABLE RESIN COMPOSITION, PROCESS FOR PRODUCING THE SAME, AND MOLDED ARTICLE USING SUCH COMPOSITION
IL191161A0 (en) Method of producing an impect-resistant thermoplastic resin
EP1867680A4 (en) RESIN COMPOSITION, MOLDED BODIES MADE THEREFROM AND METHOD FOR PRODUCING THE COMPOSITION AND THE SUBJECT MATTER
EP2201115A4 (en) MUTANTS WITH ABILITY TO PRODUCE 1,4-BUTANEDIOL AND PROCESS FOR THE PREPARATION OF 1,4-BANDANDIOL USED THEREOF
SI2014392T1 (sl) Zmes materiala za ulivanje, oblikovanec za livarske namene in postopek izdelave oblikovanca
EP2194093B8 (en) Resin composition, molding resin composition prepared by using the same, laminates, and process for the production of laminates
GB2454119B (en) Process for the fermentative production of ethanol from solid lignocellulosic material comprising a step of treating a solid lignocellulosic material
EP1854842A4 (en) STYRENE RESIN FORMULA AND PROCESS FOR PREPARING THE SAME
EP2070966A4 (en) POLYESTER RESIN COMPOSITION, PRODUCTION METHOD AND LAMINATED POLYESTER FOIL
EP1783166A4 (en) RESIN COMPOSITION AND PROCESS FOR PREPARING LAMINATES THEREWITH
EP2028222A4 (en) ORIENTED POLYMER FILM OF NORBORNENE COMPOUND ADDITION ONLY, PROCESS FOR PRODUCTION THEREOF, AND USE THEREOF
EP1690899A4 (en) RESIN COMPOSITION, FORM BODY THEREOF AND METHOD FOR PRODUCING THE RESIN COMPOSITION
EP1795560A4 (en) POLY (LACTIC ACID) RESIN COMPOSITION, MOLDS AND PROCESS FOR THE PRODUCTION THEREOF
EP1881371A4 (en) PROCESS FOR PREPARING A RADIATION-SENSITIVE RESIN COMPOSITION
EP2116902A4 (en) COMPOSITION FOR MANUFACTURING HARDENED FILM PATTERN AND METHOD FOR MANUFACTURING HARDENED FILM PATTERN USING THE SAME
EP1591487A4 (en) RESIN COMPOSITION AND PROCESS FOR PRODUCING RESIN MOLDING
FR2888852B1 (fr) Matiere a mouler et son procede de production
TWI319774B (en) Molding material, use thereof, and process for producing a forming material
EP1911812A4 (en) METHOD FOR PRODUCING MELANIN, MELLANIN PRODUCED BY THE METHOD, FUNCTIONAL FILM CONTAINING MELANIN, AND PROCESS FOR PRODUCING THE FILM
EP1881022A4 (en) FILM ROLL OF POLYAMIDE BASED MIXTURE RESIN AND METHOD OF MANUFACTURING THEREOF