SG130117A1 - Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed material - Google Patents
Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed materialInfo
- Publication number
- SG130117A1 SG130117A1 SG200605236-9A SG2006052369A SG130117A1 SG 130117 A1 SG130117 A1 SG 130117A1 SG 2006052369 A SG2006052369 A SG 2006052369A SG 130117 A1 SG130117 A1 SG 130117A1
- Authority
- SG
- Singapore
- Prior art keywords
- metal
- formed material
- plating formed
- positive
- producing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
- C08L101/06—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing oxygen atoms
- C08L101/08—Carboxyl groups
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12044—OLED
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005225969 | 2005-08-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG130117A1 true SG130117A1 (en) | 2007-03-20 |
Family
ID=37441562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200605236-9A SG130117A1 (en) | 2005-08-03 | 2006-08-03 | Positive-type radiation-sensitive resin composition for producing a metal- plating formed material, transcription film and production method of a metal-plating formed material |
Country Status (6)
Country | Link |
---|---|
US (2) | US20070031758A1 (ko) |
EP (1) | EP1750176A3 (ko) |
KR (1) | KR101266564B1 (ko) |
CN (1) | CN1908816B (ko) |
SG (1) | SG130117A1 (ko) |
TW (1) | TW200722924A (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1826612A1 (en) * | 2006-02-22 | 2007-08-29 | JSR Corporation | Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings |
JP5276264B2 (ja) * | 2006-07-03 | 2013-08-28 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法 |
JP5258237B2 (ja) * | 2006-09-14 | 2013-08-07 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、平版印刷版の製造方法、及び平版印刷版 |
JP5216573B2 (ja) * | 2008-03-31 | 2013-06-19 | 富士フイルム株式会社 | 感活性光線または感放射線性樹脂組成物及びそれを用いたパターン形成方法 |
EP2472321A1 (en) | 2010-12-31 | 2012-07-04 | Rohm and Haas Electronic Materials LLC | Method of preparing photoacid-generating monomer |
EP2472323A3 (en) * | 2010-12-31 | 2013-01-16 | Rohm and Haas Electronic Materials LLC | Polymerizable photoacid generators |
US20130125968A1 (en) * | 2011-11-18 | 2013-05-23 | Sunpreme, Ltd. | Low-cost solar cell metallization over tco and methods of their fabrication |
KR102115817B1 (ko) * | 2013-01-16 | 2020-05-27 | 제이에스알 가부시끼가이샤 | 경화막 형성용 열경화성 수지 조성물, 네가티브형 감방사선성 수지 조성물, 포지티브형 감방사선성 수지 조성물, 경화막, 그의 형성 방법, 반도체 소자 및 표시 소자 |
SG11202009505XA (en) * | 2018-03-27 | 2020-10-29 | Tokyo Ohka Kogyo Co Ltd | Method for manufacturing plated molded article |
CN120188109A (zh) * | 2022-11-15 | 2025-06-20 | 默克专利有限公司 | 厚膜化学增幅正型抗蚀剂组合物及使用其的制造抗蚀剂膜的方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6452139A (en) * | 1987-05-18 | 1989-02-28 | Konishiroku Photo Ind | Photosensitive composition |
JPH10209210A (ja) * | 1997-01-20 | 1998-08-07 | Sharp Corp | 半導体装置及びその製造方法並びにその検査方法 |
US6120972A (en) * | 1997-09-02 | 2000-09-19 | Jsr Corporation | Radiation-sensitive resin composition |
EP1811825A1 (en) * | 1998-02-26 | 2007-07-25 | Ibiden Co., Ltd. | Multilayer printed wiring board with filled viaholes |
JP3941268B2 (ja) * | 1998-11-10 | 2007-07-04 | Jsr株式会社 | 感放射線性樹脂組成物 |
JP3961139B2 (ja) * | 1998-12-24 | 2007-08-22 | 富士フイルム株式会社 | ポジ型感光性組成物 |
KR100362937B1 (ko) * | 1998-12-31 | 2003-10-04 | 주식회사 하이닉스반도체 | 신규의포토레지스트가교제,이를포함하는포토레지스트중합체및포토레지스트조성물 |
JP4150834B2 (ja) | 1999-03-04 | 2008-09-17 | Jsr株式会社 | 感光性樹脂組成物、感光性樹脂膜およびこれらを用いたバンプ形成方法 |
JP4019403B2 (ja) * | 1999-03-08 | 2007-12-12 | Jsr株式会社 | レジストパターンの形成方法 |
US20040151886A1 (en) * | 2000-03-06 | 2004-08-05 | Bobsein Barrett Richard | Binder composition |
JP4370668B2 (ja) | 2000-03-29 | 2009-11-25 | Jsr株式会社 | メッキ造形物製造用ポジ型感放射線性樹脂組成物およびメッキ造形物の製造方法 |
JP4403627B2 (ja) | 2000-03-29 | 2010-01-27 | Jsr株式会社 | ポジ型感放射線性樹脂組成物およびメッキ造形物の製造方法 |
JP3712047B2 (ja) * | 2000-08-14 | 2005-11-02 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
EP1182506B1 (en) * | 2000-08-21 | 2010-10-27 | Tokyo Ohka Kogyo Co., Ltd. | Crosslinked positive-working photoresist composition |
JP3787271B2 (ja) * | 2000-11-20 | 2006-06-21 | 東京応化工業株式会社 | 微細レジストホールパターン形成方法 |
ATE338640T1 (de) * | 2001-06-11 | 2006-09-15 | Fuji Photo Film Co Ltd | Flachdruckplattenvorläufer, substrat dafür und hydrophiles oberflächenmaterial |
JP2004029437A (ja) * | 2002-06-26 | 2004-01-29 | Toray Ind Inc | ポジ型感放射線性組成物 |
JP3767552B2 (ja) * | 2002-12-26 | 2006-04-19 | Jsr株式会社 | 感放射線性組成物、ブラックマトリクス、カラーフィルタおよびカラー液晶表示装置 |
WO2005091074A1 (ja) * | 2004-03-24 | 2005-09-29 | Jsr Corporation | ポジ型感放射線性樹脂組成物 |
-
2006
- 2006-08-02 US US11/497,300 patent/US20070031758A1/en not_active Abandoned
- 2006-08-02 EP EP06118340A patent/EP1750176A3/en not_active Withdrawn
- 2006-08-02 KR KR1020060073079A patent/KR101266564B1/ko active Active
- 2006-08-03 TW TW095128539A patent/TW200722924A/zh unknown
- 2006-08-03 CN CN2006101109365A patent/CN1908816B/zh active Active
- 2006-08-03 SG SG200605236-9A patent/SG130117A1/en unknown
-
2009
- 2009-07-30 US US12/512,211 patent/US20090288855A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP1750176A3 (en) | 2011-04-20 |
CN1908816B (zh) | 2012-09-05 |
KR20070017000A (ko) | 2007-02-08 |
EP1750176A2 (en) | 2007-02-07 |
KR101266564B1 (ko) | 2013-05-22 |
TW200722924A (en) | 2007-06-16 |
US20070031758A1 (en) | 2007-02-08 |
CN1908816A (zh) | 2007-02-07 |
US20090288855A1 (en) | 2009-11-26 |
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