[go: up one dir, main page]

SG10201910032WA - Wafer processing method - Google Patents

Wafer processing method

Info

Publication number
SG10201910032WA
SG10201910032WA SG10201910032WA SG10201910032WA SG10201910032WA SG 10201910032W A SG10201910032W A SG 10201910032WA SG 10201910032W A SG10201910032W A SG 10201910032WA SG 10201910032W A SG10201910032W A SG 10201910032WA SG 10201910032W A SG10201910032W A SG 10201910032WA
Authority
SG
Singapore
Prior art keywords
processing method
wafer processing
wafer
processing
Prior art date
Application number
SG10201910032WA
Inventor
Harada Shigenori
Matsuzawa Minoru
Kiuchi Hayato
Yodo Yoshiaki
Arakawa Taro
Agari Masamitsu
Kawamura Emiko
Fujii Yusuke
Miyai Toshiki
Ohmae Makiko
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201910032WA publication Critical patent/SG10201910032WA/en

Links

Classifications

    • H10P90/123
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • H10P10/12
    • H10P14/40
    • H10P54/00
    • H10P72/0428
    • H10P72/0431
    • H10P72/0436
    • H10P72/0442
    • H10P72/0602
    • H10P72/3206
    • H10P72/3212
    • H10P72/7402
    • H10P72/78
    • H10P90/1914
    • H10P95/90
    • H10W10/00
    • H10W10/01
    • H10W20/068
    • H10W95/00
    • H10P72/7416
    • H10P72/7442

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Dicing (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Laser Beam Processing (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG10201910032WA 2018-11-06 2019-10-26 Wafer processing method SG10201910032WA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018208629A JP7503886B2 (en) 2018-11-06 2018-11-06 Wafer Processing Method

Publications (1)

Publication Number Publication Date
SG10201910032WA true SG10201910032WA (en) 2020-06-29

Family

ID=70457809

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201910032WA SG10201910032WA (en) 2018-11-06 2019-10-26 Wafer processing method

Country Status (8)

Country Link
US (1) US11031234B2 (en)
JP (1) JP7503886B2 (en)
KR (1) KR102762080B1 (en)
CN (1) CN111146115B (en)
DE (1) DE102019217093B4 (en)
MY (1) MY194815A (en)
SG (1) SG10201910032WA (en)
TW (1) TWI826569B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7430515B2 (en) * 2019-11-06 2024-02-13 株式会社ディスコ Wafer processing method
KR20210133787A (en) 2020-04-29 2021-11-08 주식회사 엘지에너지솔루션 Battery Pack and Electronic Device Comprising the Same and Vehicle

Family Cites Families (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3076179B2 (en) 1993-07-26 2000-08-14 株式会社ディスコ Dicing equipment
JP3280876B2 (en) * 1996-01-22 2002-05-13 日本テキサス・インスツルメンツ株式会社 Wafer dicing / bonding sheet and method of manufacturing semiconductor device
JP3447518B2 (en) * 1996-08-09 2003-09-16 リンテック株式会社 Adhesive sheet sticking apparatus and method
JPH10305420A (en) 1997-03-04 1998-11-17 Ngk Insulators Ltd Processing method of base material composed of oxide single crystal and method of manufacturing functional device
KR100378094B1 (en) 1998-11-02 2003-06-02 앰코 테크놀로지 코리아 주식회사 Method and apparatus for manufacturing a semiconductor package
JP3076179U (en) 2000-09-07 2001-03-30 和雄 落合 Cup type bottle cap
JP4886937B2 (en) 2001-05-17 2012-02-29 リンテック株式会社 Dicing sheet and dicing method
JP2003152056A (en) 2001-11-08 2003-05-23 Sony Corp Semiconductor element holder and method of manufacturing the same
JP2003188195A (en) * 2001-12-19 2003-07-04 Nidec Tosok Corp Pickup assist device
JP4312419B2 (en) 2002-05-09 2009-08-12 リンテック株式会社 Semiconductor wafer processing method
KR100480628B1 (en) * 2002-11-11 2005-03-31 삼성전자주식회사 Chip pick-up method and device for manufacturing semiconductor device using air blowing
TWI310230B (en) * 2003-01-22 2009-05-21 Lintec Corp Adhesive sheet, method for protecting surface of semiconductor wafer and method for processing work
JP2005191297A (en) 2003-12-25 2005-07-14 Jsr Corp Dicing film and semiconductor wafer cutting method
JP4647228B2 (en) * 2004-04-01 2011-03-09 株式会社ディスコ Wafer processing method
JP4930679B2 (en) * 2005-12-14 2012-05-16 日本ゼオン株式会社 Manufacturing method of semiconductor device
JP2007250598A (en) * 2006-03-14 2007-09-27 Renesas Technology Corp Manufacturing method of semiconductor device
FI20060256A7 (en) * 2006-03-17 2006-03-20 Imbera Electronics Oy Circuit board manufacturing and circuit board containing the component
JP5027460B2 (en) * 2006-07-28 2012-09-19 東京応化工業株式会社 Wafer bonding method, thinning method, and peeling method
JP2008117943A (en) * 2006-11-06 2008-05-22 Nitto Denko Corp Adhesive sheet for water jet laser dicing
JP5047838B2 (en) * 2008-02-26 2012-10-10 株式会社ディスコ Tape applicator
US8507359B2 (en) * 2009-12-02 2013-08-13 Sharp Kabushiki Kaisha Semiconductor device, process for producing same, and display device
JP5496167B2 (en) 2010-11-12 2014-05-21 株式会社東京精密 Semiconductor wafer dividing method and dividing apparatus
JP5801046B2 (en) * 2010-12-06 2015-10-28 株式会社ディスコ Processing method of plate
JP5916295B2 (en) 2011-04-22 2016-05-11 古河電気工業株式会社 Wafer processing tape and method of manufacturing semiconductor device using wafer processing tape
US9559004B2 (en) * 2011-05-12 2017-01-31 STATS ChipPAC Pte. Ltd. Semiconductor device and method of singulating thin semiconductor wafer on carrier along modified region within non-active region formed by irradiating energy
WO2013047674A1 (en) * 2011-09-30 2013-04-04 リンテック株式会社 Dicing sheet with protective film forming layer and chip fabrication method
JP2013214434A (en) * 2012-04-03 2013-10-17 Sony Corp Laminate structure manufacturing method, laminate structure and electronic apparatus
TWI534238B (en) * 2012-04-24 2016-05-21 信越化學工業股份有限公司 Wafer processing body, wafer processing member, temporary processing material for wafer processing, and manufacturing method of thin wafer
US9230888B2 (en) * 2013-02-11 2016-01-05 Henkel IP & Holding GmbH Wafer back side coating as dicing tape adhesive
CN105143380B (en) 2013-03-28 2019-05-17 古河电气工业株式会社 Adhesive tapes and tapes for wafer processing
US9753357B2 (en) * 2014-02-27 2017-09-05 Intematix Corporation Compact solid-state camera flash
JP6425435B2 (en) * 2014-07-01 2018-11-21 株式会社ディスコ Tip spacing maintenance device
JP5862733B1 (en) * 2014-09-08 2016-02-16 富士ゼロックス株式会社 Manufacturing method of semiconductor piece
JP6539336B2 (en) * 2015-03-23 2019-07-03 リンテック株式会社 Semiconductor processing sheet and method of manufacturing semiconductor device
JP2018074123A (en) * 2016-11-04 2018-05-10 株式会社ディスコ Wafer processing method
TWI679691B (en) * 2016-11-30 2019-12-11 美商帕斯馬舍門有限責任公司 Method and apparatus for plasma dicing a semi-conductor wafer
KR102244291B1 (en) * 2017-02-24 2021-04-26 후루카와 덴키 고교 가부시키가이샤 Mask-integrated surface protection tape and method for producing semiconductor chip using same

Also Published As

Publication number Publication date
JP2020077681A (en) 2020-05-21
US20200144049A1 (en) 2020-05-07
CN111146115B (en) 2025-03-21
TW202018796A (en) 2020-05-16
DE102019217093B4 (en) 2025-04-30
KR20200052831A (en) 2020-05-15
MY194815A (en) 2022-12-16
US11031234B2 (en) 2021-06-08
JP7503886B2 (en) 2024-06-21
CN111146115A (en) 2020-05-12
DE102019217093A1 (en) 2020-05-07
TWI826569B (en) 2023-12-21
KR102762080B1 (en) 2025-02-04

Similar Documents

Publication Publication Date Title
SG10201905294RA (en) Wafer processing method
SG10201700915XA (en) Wafer processing method
SG10201904699RA (en) Wafer processing method
SG10201700072UA (en) Wafer processing method
SG10201906678TA (en) Wafer processing method
SG10202001003PA (en) Wafer processing method
SG10201911116YA (en) Wafer processing method
SG10201909279TA (en) Wafer processing method
SG10202009952SA (en) Wafer processing method
SG10202000576QA (en) Wafer processing method
SG10201904719TA (en) Wafer processing method
SG10201912832SA (en) Wafer processing method
SG10202007419YA (en) Processing method for wafer
SG10202006736YA (en) Wafer processing method
SG10202004876YA (en) Wafer processing method
SG10201909522RA (en) Wafer processing method
SG10201905936RA (en) Wafer processing method
SG10201905935VA (en) Wafer processing method
SG10202011109WA (en) Wafer processing method
SG10202003482RA (en) Wafer processing method
SG10202002649UA (en) Wafer processing method
SG10201910165QA (en) Wafer processing method
SG10202001231UA (en) Wafer processing method
SG10202000574XA (en) Wafer processing method
SG10201908036VA (en) Wafer processing method