SE9601175D0 - A method for producing a semiconductor device by the use of an implanting step and a device produced thereby - Google Patents
A method for producing a semiconductor device by the use of an implanting step and a device produced therebyInfo
- Publication number
- SE9601175D0 SE9601175D0 SE9601175A SE9601175A SE9601175D0 SE 9601175 D0 SE9601175 D0 SE 9601175D0 SE 9601175 A SE9601175 A SE 9601175A SE 9601175 A SE9601175 A SE 9601175A SE 9601175 D0 SE9601175 D0 SE 9601175D0
- Authority
- SE
- Sweden
- Prior art keywords
- producing
- forming
- conductivity type
- layer
- semiconductor device
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 5
- 239000010410 layer Substances 0.000 abstract 4
- 239000002344 surface layer Substances 0.000 abstract 2
- 239000002019 doping agent Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
- H10D62/832—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge being Group IV materials comprising two or more elements, e.g. SiGe
- H10D62/8325—Silicon carbide
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/62—Electrodes ohmically coupled to a semiconductor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/931—Silicon carbide semiconductor
Landscapes
- Electrodes Of Semiconductors (AREA)
- Thyristors (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9601175A SE9601175D0 (sv) | 1996-03-27 | 1996-03-27 | A method for producing a semiconductor device by the use of an implanting step and a device produced thereby |
US08/636,952 US5674765A (en) | 1996-03-27 | 1996-04-24 | Method for producing a semiconductor device by the use of an implanting step |
JP53433597A JP4691224B2 (ja) | 1996-03-27 | 1997-03-26 | 注入ステップを使用して半導体デバイスを製造する方法およびこの方法により製造されるデバイス |
EP97915824A EP0890187B1 (en) | 1996-03-27 | 1997-03-26 | A method for producing a semiconductor device by the use of an implanting step |
DE69736891T DE69736891T2 (de) | 1996-03-27 | 1997-03-26 | Verfahren zur herstellung eines halbleiterbauelementes mit einem implantierungsschritt |
PCT/SE1997/000534 WO1997036319A1 (en) | 1996-03-27 | 1997-03-26 | A method for producing a semiconductor device by the use of an implanting step and a device produced thereby |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9601175A SE9601175D0 (sv) | 1996-03-27 | 1996-03-27 | A method for producing a semiconductor device by the use of an implanting step and a device produced thereby |
US08/636,952 US5674765A (en) | 1996-03-27 | 1996-04-24 | Method for producing a semiconductor device by the use of an implanting step |
Publications (1)
Publication Number | Publication Date |
---|---|
SE9601175D0 true SE9601175D0 (sv) | 1996-03-27 |
Family
ID=26662560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9601175A SE9601175D0 (sv) | 1996-03-27 | 1996-03-27 | A method for producing a semiconductor device by the use of an implanting step and a device produced thereby |
Country Status (3)
Country | Link |
---|---|
US (1) | US5674765A (sv) |
SE (1) | SE9601175D0 (sv) |
WO (1) | WO1997036319A1 (sv) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE9700215L (sv) * | 1997-01-27 | 1998-02-18 | Abb Research Ltd | Förfarande för framställning av ett halvledarskikt av SiC av 3C-polytypen ovanpå ett halvledarsubstratskikt utnyttjas wafer-bindningstekniken |
SE9701724D0 (sv) * | 1997-05-09 | 1997-05-09 | Abb Research Ltd | A pn-diode of SiC and a method for production thereof |
JP4935741B2 (ja) * | 2008-04-02 | 2012-05-23 | 三菱電機株式会社 | 炭化珪素半導体装置の製造方法 |
JP6042658B2 (ja) * | 2011-09-07 | 2016-12-14 | トヨタ自動車株式会社 | SiC半導体素子の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4775882A (en) * | 1986-11-19 | 1988-10-04 | Rockwell International Corporation | Lateral bipolar transistor |
US4945394A (en) * | 1987-10-26 | 1990-07-31 | North Carolina State University | Bipolar junction transistor on silicon carbide |
US4947218A (en) * | 1987-11-03 | 1990-08-07 | North Carolina State University | P-N junction diodes in silicon carbide |
US5270554A (en) * | 1991-06-14 | 1993-12-14 | Cree Research, Inc. | High power high frequency metal-semiconductor field-effect transistor formed in silicon carbide |
-
1996
- 1996-03-27 SE SE9601175A patent/SE9601175D0/sv unknown
- 1996-04-24 US US08/636,952 patent/US5674765A/en not_active Expired - Lifetime
-
1997
- 1997-03-26 WO PCT/SE1997/000534 patent/WO1997036319A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US5674765A (en) | 1997-10-07 |
WO1997036319A1 (en) | 1997-10-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SE9802909L (sv) | Metod för framställning av en pn-övergång för en halvledaranordning av SiC samt en halvledaranordning av SiC med pn-övergång | |
TW374226B (en) | Graded-channel semiconductor device and method of manufacturing the same | |
WO1999021215A3 (en) | Methods of forming power semiconductor devices having merged split-well body regions therein and devices formed thereby | |
DE59712106D1 (de) | Silizium-germanium-heterobipolartransistor | |
KR950012775A (ko) | 좁은 밴드갭 특성을 갖는 탄소 도프 접합 실리콘 반도체 디바이스 및 그 형성 방법 | |
EP1976020A3 (en) | Silicon carbide metal-semiconductor field effect transistors and methods of fabricating silicon carbide metal-semiconductor field effect transistors | |
EP0272453A3 (en) | Merged bipolar/cmos technology using electrically active trench | |
EP0392954A3 (en) | A lateral transistor and method of making same | |
TW354430B (en) | Photodiode and method for fabricating the same | |
KR910019143A (ko) | 고성능 반도체 디바이스 및 그 제조방법 | |
KR920001655A (ko) | 바이폴라 트랜지스터용 자기정렬된 콜렉터 구조 및 이를 주입하는 방법 | |
SE0004377D0 (sv) | A semiconductor device and a method for production thereof | |
KR920005325A (ko) | 자기 정렬된 이질 접합 바이폴라 트랜지스터 제조 방법 | |
SE9601176D0 (sv) | A method for producing a semiconductor device having semiconductor layers of SiC by the use of an implanting step and a device produced thereby | |
SE9601175D0 (sv) | A method for producing a semiconductor device by the use of an implanting step and a device produced thereby | |
MY108622A (en) | Semiconductor device with shottky junction. | |
EP1168453A3 (en) | Semiconductor device with heavily-doped diffusion layer and method for fabricating the same | |
KR910010732A (ko) | 반도체 디바이스 및 그 제조방법 | |
KR970052997A (ko) | 바이폴라 트랜지스터 제조 방법 | |
JPS57201070A (en) | Semiconductor device | |
EP0337720A3 (en) | Process for producing a high performance bipolar structure | |
EP1168452A3 (en) | Semiconductor device having vertical bipolar transistor | |
JPS5745274A (en) | Semiconductor device | |
TW200501435A (en) | Semiconductor component and method of manufacturing same | |
JPS5513990A (en) | Semiconductor device |