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SE8104133L - CREATION OF SURFACE SAMPLES - Google Patents

CREATION OF SURFACE SAMPLES

Info

Publication number
SE8104133L
SE8104133L SE8104133A SE8104133A SE8104133L SE 8104133 L SE8104133 L SE 8104133L SE 8104133 A SE8104133 A SE 8104133A SE 8104133 A SE8104133 A SE 8104133A SE 8104133 L SE8104133 L SE 8104133L
Authority
SE
Sweden
Prior art keywords
deep ultraviolet
window
resist composition
optical absorption
creation
Prior art date
Application number
SE8104133A
Other languages
Unknown language ( )
Swedish (sv)
Inventor
D L Ross
L A Barton
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of SE8104133L publication Critical patent/SE8104133L/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)

Abstract

A negative acting resist composition is used which comprises a novolak resin which has a window of low optical absorption in the deep ultraviolet range and an aromatic azide sensitizer which has a complementary peak of high optical absorption in the deep ultraviolet range. The resist composition is exposed with deep ultraviolet radiation in the window/peak region, for example, at about 250 to 265 nm, and is thereafter developed with an aqueous alkaline solvent to provide a negative surface relief pattern.
SE8104133A 1980-07-03 1981-07-02 CREATION OF SURFACE SAMPLES SE8104133L (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16575980A 1980-07-03 1980-07-03

Publications (1)

Publication Number Publication Date
SE8104133L true SE8104133L (en) 1982-01-04

Family

ID=22600342

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8104133A SE8104133L (en) 1980-07-03 1981-07-02 CREATION OF SURFACE SAMPLES

Country Status (6)

Country Link
JP (1) JPS5745239A (en)
DE (1) DE3125572A1 (en)
FR (1) FR2486259A1 (en)
GB (1) GB2079481B (en)
IT (1) IT1138814B (en)
SE (1) SE8104133L (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56162744A (en) * 1980-05-19 1981-12-14 Hitachi Ltd Formation of fine pattern
DE3234301A1 (en) * 1982-09-16 1984-03-22 Merck Patent Gmbh, 6100 Darmstadt NEW BISAZIDO COMPOUNDS, THESE LIGHT SENSITIVE COMPOSITIONS AND METHOD FOR PRODUCING RELIEF STRUCTURES
DE3337315A1 (en) * 1982-10-13 1984-04-19 Tokyo Ohka Kogyo Co., Ltd., Kawasaki, Kanagawa DOUBLE-LIGHT SENSITIVE COMPOSITIONS AND METHOD FOR PRODUCING IMAGE-PATTERNED PHOTORESIS LAYERS
JPS60107644A (en) * 1983-09-16 1985-06-13 フイリツプ　エイ．ハント　ケミカル　コ−ポレ−シヨン Developable water negative resist composition
US4551409A (en) * 1983-11-07 1985-11-05 Shipley Company Inc. Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
GB8611229D0 (en) * 1986-05-08 1986-06-18 Ucb Sa Forming positive pattern
JPH02254450A (en) * 1989-03-29 1990-10-15 Toshiba Corp Resist
DE4018427A1 (en) * 1990-06-14 1992-01-16 Samsung Electronics Co Ltd PHOTOLITOGRAPHY METHOD FOR TRAINING A FINELINE PATTERN

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1597614B2 (en) * 1967-07-07 1977-06-23 Hoechst Ag, 6000 Frankfurt LIGHT-SENSITIVE COPY DIMENSIONS
US3923522A (en) * 1973-07-18 1975-12-02 Oji Paper Co Photosensitive composition
JPS5140452B2 (en) * 1973-07-23 1976-11-04
JPS5934293B2 (en) * 1977-04-20 1984-08-21 王子製紙株式会社 photosensitive composition
DE2948324C2 (en) * 1978-12-01 1993-01-14 Hitachi, Ltd., Tokio/Tokyo Photosensitive composition containing a bisazide compound and method for forming patterns
JPS5677843A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS56162744A (en) * 1980-05-19 1981-12-14 Hitachi Ltd Formation of fine pattern

Also Published As

Publication number Publication date
JPS5745239A (en) 1982-03-15
GB2079481A (en) 1982-01-20
FR2486259A1 (en) 1982-01-08
IT1138814B (en) 1986-09-17
IT8122524A0 (en) 1981-06-23
GB2079481B (en) 1984-05-02
DE3125572A1 (en) 1982-07-29

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