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JPS55156941A - Micropattern forming method - Google Patents

Micropattern forming method

Info

Publication number
JPS55156941A
JPS55156941A JP6446479A JP6446479A JPS55156941A JP S55156941 A JPS55156941 A JP S55156941A JP 6446479 A JP6446479 A JP 6446479A JP 6446479 A JP6446479 A JP 6446479A JP S55156941 A JPS55156941 A JP S55156941A
Authority
JP
Japan
Prior art keywords
formula
photosensitive polymer
represented
monomer units
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6446479A
Other languages
Japanese (ja)
Other versions
JPS6361651B2 (en
Inventor
Yoichi Nakamura
Minoru Tsuda
Akira Yokota
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP6446479A priority Critical patent/JPS55156941A/en
Publication of JPS55156941A publication Critical patent/JPS55156941A/en
Publication of JPS6361651B2 publication Critical patent/JPS6361651B2/ja
Granted legal-status Critical Current

Links

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To form a micropattern exhibiting high resistance in dry etching or ion injection, by using a specified photosensitive polymer and specified wavelength irradiation rays.
CONSTITUTION: The photosensitive polymer to be used is polyglycidylmethacrylate consisting of monomer units represented by formula I and monomer units represented by formula II, having a molecular weight of 10,000W150,000, and containing the units (photosensitive residues) represented by formula I by 5W30mol% and cinnamic acid groups addition-polymerized. The about 1μ thin film of the above- mensioned photosensitive polymer is formed on a substrate, irradiated through a desired master mask by 1,160W300nm wavelength far ultraviolet rays, and after it is imagewise exposed, it is developed using a solvent (methyl cellosolve, lower ketone, or the like), thus a desired image being obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP6446479A 1979-05-24 1979-05-24 Micropattern forming method Granted JPS55156941A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6446479A JPS55156941A (en) 1979-05-24 1979-05-24 Micropattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6446479A JPS55156941A (en) 1979-05-24 1979-05-24 Micropattern forming method

Publications (2)

Publication Number Publication Date
JPS55156941A true JPS55156941A (en) 1980-12-06
JPS6361651B2 JPS6361651B2 (en) 1988-11-29

Family

ID=13258973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6446479A Granted JPS55156941A (en) 1979-05-24 1979-05-24 Micropattern forming method

Country Status (1)

Country Link
JP (1) JPS55156941A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
US4560640A (en) * 1983-06-13 1985-12-24 Director-General Of Agency Of Industrial Science & Technology Photosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereof
JPS61180235A (en) * 1985-02-06 1986-08-12 Mitsubishi Chem Ind Ltd photosensitive composition
JPS626254A (en) * 1985-07-02 1987-01-13 Mitsubishi Chem Ind Ltd photosensitive composition
JPS6480942A (en) * 1987-09-23 1989-03-27 Chiaki Azuma Photosensitive microgel particles
JP2011053384A (en) * 2009-09-01 2011-03-17 Showa Denko Kk Photosensitive resin

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
US4560640A (en) * 1983-06-13 1985-12-24 Director-General Of Agency Of Industrial Science & Technology Photosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereof
JPS61180235A (en) * 1985-02-06 1986-08-12 Mitsubishi Chem Ind Ltd photosensitive composition
JPH0535422B2 (en) * 1985-02-06 1993-05-26 Mitsubishi Chem Ind
JPS626254A (en) * 1985-07-02 1987-01-13 Mitsubishi Chem Ind Ltd photosensitive composition
JPS6480942A (en) * 1987-09-23 1989-03-27 Chiaki Azuma Photosensitive microgel particles
JP2011053384A (en) * 2009-09-01 2011-03-17 Showa Denko Kk Photosensitive resin

Also Published As

Publication number Publication date
JPS6361651B2 (en) 1988-11-29

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